A single-side wet process system to avoid contamination of the bottom surface of the substrate

Abstract

The present invention discloses that the technical solution of the present invention is to adopt a single-sided wet system to avoid contamination of the bottom surface of the substrate, including: a supporting transmission mechanism; an adsorption mechanism; a transmission handshake mechanism; a rinsing mechanism; and an air-drying mechanism. The single-sided wet system with the above structure effectively solves the protection of the back chip and effectively isolates the contact problem with the liquid medicine, and can be mainly applied to chips with single-sided wet processes (such as corrosion, doping, and reaction). Each functional part exists independently, and each component cooperates in a linkage manner, which has great application expansion capabilities, and at the same time, the space occupied by the mechanism is smaller. This system can be used not only for wet rinsing processes, but also for corrosion processes, doping processes, single-sided cleaning processes, and reaction processes.

Description

Technical Field

[0001] The invention relates to a system for performing single-side wet processing on solar cells. Background Art

[0002] In many areas of science and engineering, the use of etching and other micromachining techniques to manufacture miniaturized microstructures has become increasingly common. Semiconductor materials can be used not only to manufacture discrete and integrated electronic circuits, but also to manufacture sensors, actuators, and other devices that have new properties due to the miniaturization of the materials used and the scale. In the processing of solar cell substrates, it is often necessary to use anisotropic wet etching to remove a large amount of silicon to form microstructures such as cavities, grooves, bridge structures, etc. with different morphologies. If the etching is limited to one side of the substrate, the other side of the substrate needs to be effectively protected for a long time to prevent the etching liquid from drilling into the other side and causing damage to the structure. However, the existing single-sided wet system cannot effectively protect the back, and there is often backflow and contamination of the bottom. Summary of the invention

[0003] In view of this, the present invention provides a single-sided wet process system for preventing contamination of the bottom surface of a substrate, which can effectively prevent the bottom surface of the substrate from being contaminated by a chemical solution when performing single-sided wet process on the substrate.

[0004] In order to solve the above technical problems, the technical solution of the present invention is to adopt a single-sided wet system to avoid contamination of the bottom surface of the substrate, including: a support and transmission mechanism for conveying the substrate; an adsorption mechanism for adsorbing the substrate and shielding the bottom surface of the substrate to prevent the bottom surface of the substrate from being corroded by the liquid medicine; a transmission handshake mechanism for transferring the substrate between the support and transmission mechanism and the adsorption mechanism; a rinse mechanism for spraying the liquid medicine to rinse the substrate; and an air-drying mechanism for air-drying the rinsed substrate. The principle of the present invention is to adsorb the substrate on the table through vacuum adsorption during rinsing, so that its bottom is shielded by the table to avoid corrosion by the liquid medicine.

[0005] As an improvement, the adsorption mechanism includes a bottom plate and a vacuum adsorption table laid on the bottom plate; the vacuum adsorption table is provided with a plurality of exhaust holes connected to a vacuum generating device; and also includes a plurality of lifting rods for lifting the substrate, the lifting rods pass through the bottom plate and the vacuum adsorption table, and can extend out of the top surface of the vacuum adsorption table.

[0006] As a further improvement, a sealing ring is inlaid on the bottom plate around the vacuum adsorption platform.

[0007] As a further improvement, a heating device is provided on the bottom plate below the vacuum adsorption table.

[0008] As another further improvement, the transmission handgrip mechanism includes left and right horizontally arranged support rods above the adsorption mechanism, the support rods are parallel to each other and arranged along the transmission direction of the support transmission mechanism; a plurality of transmission rollers are arranged side by side on the support rods, and the transmission direction of the transmission rollers is consistent with the transmission direction of the support transmission mechanism; and it also includes a driving device for driving the support rod to rotate around its axis.

[0009] As an improvement, the support rod can drive the transport roller to switch between a horizontal position and a vertical downward position.

[0010] As an improvement, the rinsing mechanism includes a spray pipe spanning above the adsorption mechanism, and a plurality of nozzles are installed on the spray pipe; the air-drying mechanism is an air knife.

[0011] As an improvement, sliding support rods are arranged on both sides of the adsorption mechanism along the transmission direction of the supporting transmission mechanism, and the sliding support rods are provided with lifting support rods that can slide back and forth along them, and the two ends of the spray pipe and the wind knife are fixed on the lifting support rods.

[0012] As an improvement, the supporting transmission mechanism is divided into two sections, which are respectively arranged at the front and rear ends of the adsorption mechanism.

[0013] As an improvement, the supporting transmission mechanism is composed of a plurality of conveying rollers, and the conveying plane height of the conveying rollers is consistent with the conveying plane height of the transmission handgrip mechanism.

[0014] The benefit of the present invention lies in that the single-sided wet process system with the above structure effectively solves the protection of the back chip and effectively isolates the contact problem with the liquid medicine, and can be mainly applied to chips with single-sided wet process (such as corrosion, doping, reaction) process. Each functional part exists independently, and each component cooperates with each other, which has great application expansion capabilities, and at the same time, the space occupied by the mechanism is smaller. This system can be used not only for wet leaching process, but also for corrosion process, doping process, single-sided cleaning process and reaction process, etc. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a front view of the present invention.

[0016] Figure 2 It is a top view of the present invention.

[0017] Markings in the figure: 11 conveying roller, 21 bottom plate, 22 heating plate, 23 sealing ring, 24 vacuum adsorption table, 25 lifting rod, 26 exhaust hole, 31 support rod, 32 transmission roller, 33 flip motor, 34 conveying motor, 41 sliding support rod, 42 lifting support rod, 43 spray pipe, 44 nozzle, 45 air knife, 100 substrate. DETAILED DESCRIPTION

[0018] In order to enable those skilled in the art to better understand the technical solution of the present invention, the present invention is further described in detail below in conjunction with specific implementation methods.

[0019] like Figure 1 , Figure 2 As shown, the present invention includes a supporting and conveying mechanism for conveying a substrate 100; an adsorption mechanism for adsorbing the substrate 100 and shielding the bottom surface of the substrate to prevent the bottom surface of the substrate 100 from being corroded by a chemical solution; a transmission handshake mechanism for transferring the substrate 100 between the supporting and conveying mechanism and the adsorption mechanism; a rinsing mechanism for spraying a chemical solution to rinse the substrate 100; and an air-drying mechanism for air-drying the rinsed substrate 100.

[0020] Specifically, the supporting transmission mechanism is divided into two sections, which are arranged at the front and rear ends of the adsorption mechanism respectively. And the supporting transmission mechanism is composed of a plurality of conveying rollers 11, and the conveying plane height of the conveying rollers 11 is consistent with the conveying plane height of the transmission handshake mechanism.

[0021] The adsorption mechanism includes a bottom plate 21 and a vacuum adsorption platform 24 placed above the bottom plate 21; the vacuum adsorption platform 24 is provided with a plurality of exhaust holes 26 connected to a vacuum generating device; and also includes a plurality of lifting rods 25 for lifting the substrate 100, the lifting rods 25 penetrate the bottom plate 21 and the vacuum adsorption platform 24, and can extend out of the top surface of the vacuum adsorption platform 24. The vacuum adsorption platform 24 is made of polymer material, and the size of the exhaust hole can be determined according to the requirements. The main function is to perform vacuum suction to tightly adsorb the substrate on the platform.

[0022] In addition, a sealing ring 23 is embedded around the vacuum adsorption platform 24 on the bottom plate. The sealing ring 23 mainly compensates for the leakage at the edge after the substrate is adsorbed to prevent the liquid from flowing back or flowing back. The sealing ring 23 is embedded in the bottom plate 21, and only 2-3mm of thickness is exposed. After cooperating with the air extraction hole 26, the bottom surface of the substrate 100 is protected.

[0023] A heating device is provided on the bottom plate 21 below the vacuum adsorption table 24. In this embodiment, the heating device is a heating plate 22. The heating plate 22 mainly provides a certain temperature for the bottom base, so that the solution and the chip can be in contact more effectively, improving the process optimization effect; it can also perform a heating reaction action of the reaction solution.

[0024] The transmission hand-gripping mechanism includes left and right horizontally arranged support rods 31 arranged above the adsorption mechanism, the support rods 31 are parallel to each other and arranged along the transmission direction of the supporting transmission mechanism; a plurality of transmission rollers 32 are arranged side by side on the support rods 31, and the transmission direction of the transmission rollers 32 is consistent with the transmission direction of the supporting transmission mechanism; the transmission rollers 32 are driven by a conveying motor 34. It also includes a driving device for driving the support rods 31 to rotate around its axis, and the support rods 31 can rotate 90° under the drive of the driving device, and the driving device is a flip motor 33. The support rods 31 can drive the transmission rollers 32 to switch between a horizontal position and a vertical downward position.

[0025] The rinsing mechanism includes a spray pipe 43 across the top of the adsorption mechanism, and a plurality of nozzles 44 are installed on the spray pipe 43; the air drying mechanism is an air knife 45. Sliding support rods 41 are arranged on both sides of the adsorption mechanism along the transmission direction of the supporting transmission mechanism, and the sliding support rods 41 are provided with lifting support rods 42 that can slide forward and backward along the sliding support rods 41, and the two ends of the spray pipe 43 and the air knife 45 are fixed on the lifting support rods 42. The lifting support rods 42 can be raised and lowered to adjust the height of the spray pipe 43 and the air knife 45, and the lifting support rods 42 can slide forward and backward to adjust the horizontal position of the spray pipe 43 and the air knife 45.

[0026] When working, the support transmission mechanism transports the substrate 100 to the front end of the adsorption mechanism. At this time, the transmission roller 32 of the transmission handgrip mechanism is in a horizontal state, and the substrate 100 transitions from the support transmission mechanism to the transmission handgrip mechanism. When the substrate 100 is completely located on the transmission roller 32, the transmission roller 32 stops rotating, and the lifting rod 25 rises from the bottom to support the substrate 100. At this time, the transmission roller 32 flips to a vertical downward state to eliminate the support for the substrate 100. The lifting rod 25 descends to drop the substrate 100 onto the vacuum adsorption table 24, and the vacuum generating device starts to extract air through the exhaust hole 26 to firmly adsorb the substrate 100. At the same time, the rinsing device starts to work to rinse the top surface of the substrate 100, while the bottom surface of the substrate 100 is in close contact with the surface of the vacuum adsorption table 24, so that the liquid cannot contact it. After rinsing, the wind knife 45 blows the substrate 100 dry, and after drying, the vacuum generating device stops working, and the lifting rod 25 rises again to lift the substrate 100. The conveying roller 32 is restored from the vertical downward state to the horizontal state, and the lifting rod 25 is retracted to complete the handover. The conveying roller 32 is operated to convey the substrate 100 to the supporting conveying mechanism behind the adsorption mechanism.

[0027] The above are only preferred embodiments of the present invention. It should be noted that the above preferred embodiments should not be regarded as limiting the present invention, and the protection scope of the present invention should be based on the scope defined by the claims. For ordinary technicians in this technical field, several improvements and modifications can be made without departing from the spirit and scope of the present invention, and these improvements and modifications should also be regarded as the protection scope of the present invention.

Claims

1. A single-side wet process system for avoiding contamination of the bottom surface of a substrate, characterized in that include: A supporting transmission mechanism for conveying a substrate; The adsorption mechanism is used to adsorb the substrate and shield the bottom surface of the substrate to prevent the bottom surface of the substrate from being corroded by the chemical solution; The transmission hand-grip mechanism is used to transfer the substrate between the support transmission mechanism and the adsorption mechanism; A rinse mechanism, used for spraying liquid to rinse the substrate; An air-drying mechanism, used for air-drying the washed substrate; The adsorption mechanism includes a bottom plate and a vacuum adsorption platform laid on the bottom plate; the vacuum adsorption platform is provided with a plurality of exhaust holes connected to a vacuum generating device; and also includes a plurality of lifting rods for lifting the substrate, the lifting rods penetrate the bottom plate and the vacuum adsorption platform, and can extend out of the top surface of the vacuum adsorption platform; the bottom plate is inlaid with sealing rings around the vacuum adsorption platform; The transmission hand-gripping mechanism includes left and right horizontally arranged support rods arranged above the adsorption mechanism, the support rods are parallel to each other and arranged along the transmission direction of the supporting transmission mechanism; a plurality of transmission rollers are arranged side by side on the support rods, and the transmission direction of the transmission rollers is consistent with the transmission direction of the supporting transmission mechanism; and also includes a driving device for driving the support rod to rotate around its axis.

2. A single-side wet process system for avoiding contamination of the bottom surface of a substrate according to claim 1, characterized in that: A heating device is arranged on the bottom plate below the vacuum adsorption platform.

3. A single-side wet process system for avoiding substrate bottom surface contamination according to claim 1, characterized in that: The support rod can drive the transmission roller to switch between a horizontal position and a vertical downward position.

4. A single-side wet process system for avoiding contamination of the bottom surface of a substrate according to claim 1, characterized in that: The rinsing mechanism comprises a spray pipe spanning above the adsorption mechanism, and a plurality of spray heads are installed on the spray pipe; the air drying mechanism is an air knife.

5. A single-side wet process system for avoiding substrate bottom surface contamination according to claim 4, characterized in that: Sliding support rods are arranged on both sides of the adsorption mechanism along the transmission direction of the supporting transmission mechanism, and the sliding support rods are provided with lifting support rods that can slide back and forth along them, and the two ends of the spray pipe and the wind knife are fixed on the lifting support rods.

6. A single-side wet process system for avoiding substrate bottom surface contamination according to claim 1, characterized in that: The supporting transmission mechanism is divided into two sections, which are respectively arranged at the front and rear ends of the adsorption mechanism.

7. A single-side wet process system for avoiding substrate bottom surface contamination according to claim 6, characterized in that: The supporting transmission mechanism is composed of a plurality of conveying rollers, and the conveying plane height of the conveying rollers is consistent with the conveying plane height of the transmission handgrip mechanism.

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