OLED display panel and manufacturing method thereof, OLED display module

Abstract

The present application provides an OLED display panel and a manufacturing method thereof, and an OLED display module. The OLED display panel includes a TFT array substrate and a light-emitting device layer. The TFT array substrate includes a TFT located in a pixel area. The light-emitting device layer is arranged on the TFT array substrate, and the light-emitting device layer includes a first light-emitting device located in the pixel area and connected to the TFT, and a second light-emitting device located in the light-transmitting area and connected to the first light-emitting device. The second light-emitting device includes a first transparent electrode, a second OLED functional layer arranged on the first transparent electrode, and a second transparent electrode arranged on the second OLED functional layer. That is, by arranging the second light-emitting device in the light-transmitting area, the second light-emitting device can not only emit light on both sides, but also the second light-emitting device is connected to the first light-emitting device in the pixel area, and there is no need to arrange a driving circuit in the light-transmitting area, reducing the light-blocking structure, thereby improving the transmittance of the CUP area, and then improving the photosensitivity of the photosensitive element.

Description

Technical Field

[0001] The present application relates to the technical field of display devices, and in particular to an OLED display panel and a manufacturing method thereof, and an OLED display module. Background Art

[0002] OLEDs have the advantages of simple preparation process, low cost, high luminous efficiency, easy formation of flexible structure, low power consumption, high color saturation and wide viewing angle. Display technology using OLEDs has become an important display technology.

[0003] OLED is a current-type light-emitting device, which mainly includes an anode, a cathode and an OLED functional layer. The main working principle of OLED is that the OLED functional layer emits light through carrier injection and recombination under the drive of the electric field formed by the anode and the cathode.

[0004] In recent years, full-screen display devices have received widespread attention in the market and have broad application prospects. The prior art realizes full-screen display devices by setting under-screen photosensitive elements, such as cameras, light sensors, fingerprint sensors, etc., under the display area. The display area corresponding to the photosensitive elements is called the camera under panel (CUP) area. However, the multiple pixels in the CUP area of ​​the full-screen display device in the prior art will lead to the problem of low transmittance of the CUP area and poor photosensitivity. Summary of the invention

[0005] The present application provides an OLED display panel and a manufacturing method thereof, and an OLED display module to solve the problem of low transmittance of a CUP area in the prior art.

[0006] In a first aspect, the present application provides an OLED display panel, comprising a display area and a CUP area located in the display area, wherein the CUP area includes a plurality of pixel areas arranged at intervals, and a light-transmitting area located between two adjacent pixel areas, and the OLED display panel includes:

[0007] A TFT array substrate, wherein the TFT array substrate includes TFTs located in the pixel area;

[0008] a light emitting device layer, the light emitting device layer being disposed on the TFT array substrate, and the light emitting device layer comprising a first light emitting device located in the pixel area and connected to the TFT, and a second light emitting device located in the light-transmitting area and connected to the first light emitting device;

[0009] The second light emitting device includes a first transparent electrode, a second OLED functional layer disposed on the first transparent electrode, and a second transparent electrode disposed on the second OLED functional layer.

[0010] In some possible implementations, the first light emitting device includes a first electrode, a first OLED functional layer disposed on the first electrode, and a second electrode disposed on the first OLED functional layer;

[0011] The first transparent electrode is connected to the first electrode; and the second transparent electrode is connected to the second electrode.

[0012] In some possible implementations, the first transparent electrode is integrally formed with the first electrode, and the second transparent electrode is integrally formed with the second electrode.

[0013] In some possible implementations, the second OLED functional layer and the first OLED functional layer are integrally formed.

[0014] In some possible implementations, the first electrode includes a first transparent metal oxide layer, a metal layer disposed on the first transparent metal oxide layer, and a second transparent metal oxide layer disposed on the metal layer;

[0015] The first transparent electrode and the first transparent metal oxide layer are integrally formed.

[0016] In some possible implementations, the TFT array substrate further includes a reflection unit disposed in the pixel area, and a refraction unit disposed in the light-transmitting area;

[0017] The refraction unit is located directly below the second light emitting device, and is used to refract part of the light emitted by the second light emitting device and / or part of the external light onto the reflection unit, and refract the light reflected back by the reflection unit to the outside of the OLED display panel.

[0018] In some possible implementations, the TFT array substrate further includes:

[0019] A first insulating layer, wherein the first insulating layer is disposed on the TFT, a side surface of the first insulating layer is an inclined surface, and the reflecting unit is located on the inclined surface;

[0020] A second insulating layer is provided on the TFT, the reflecting unit and the first insulating layer, and the refractive unit is located on the second insulating layer.

[0021] In some possible implementations, the TFT array substrate further includes a light shielding layer located under the TFT, and the reflection unit is located directly above the light shielding layer.

[0022] In a second aspect, the present application further provides an OLED display module, comprising the above-mentioned OLED display panel, and a photosensitive element, wherein the photosensitive element is located below the CUP area.

[0023] In a third aspect, the present application further provides a method for manufacturing an OLED display panel, comprising:

[0024] A TFT array substrate is provided, wherein the TFT array substrate has a display area and a CUP area located in the display area, wherein the CUP area includes a plurality of pixel areas arranged at intervals and a light-transmitting area located between two adjacent pixel areas, and the TFT array substrate includes a TFT located in the pixel area;

[0025] A light-emitting device layer is manufactured on the TFT array substrate, wherein the light-emitting device layer includes a first light-emitting device located in the pixel area and connected to the TFT, and a second light-emitting device located in the light-transmitting area and connected to the first light-emitting device; the second light-emitting device includes a first transparent electrode, a second OLED functional layer disposed on the first transparent electrode, and a second transparent electrode disposed on the second OLED functional layer.

[0026] The OLED display panel provided in the present application has a display area and a CUP area located in the display area, the CUP area includes a plurality of pixel areas arranged at intervals, and a light-transmitting area located between two adjacent pixel areas, and the OLED display panel includes a TFT array substrate and a light-emitting device layer. The TFT array substrate includes a TFT located in the pixel area. The light-emitting device layer is arranged on the TFT array substrate, and the light-emitting device layer includes a first light-emitting device located in the pixel area and connected to the TFT, and a second light-emitting device located in the light-transmitting area and connected to the first light-emitting device. The second light-emitting device includes a first transparent electrode, a second OLED functional layer arranged on the first transparent electrode, and a second transparent electrode arranged on the second OLED functional layer. That is, by arranging the second light-emitting device in the light-transmitting area, the second light-emitting device can not only emit light on both sides, but also is connected to the first light-emitting device in the pixel area, and there is no need to arrange a driving circuit in the light-transmitting area, reducing the light-blocking structure, thereby improving the transmittance of the CUP area, and further improving the photosensitivity of the photosensitive element. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.

[0028] Figure 1is a schematic diagram of an OLED display panel provided in one embodiment of the present application;

[0029] Figure 2 is a schematic diagram of a CUP area of ​​an OLED display panel provided in an embodiment of the present application;

[0030] Figure 3 This is provided by an embodiment of the present application Figure 2 The cross-sectional view at AA of FIG.

[0031] Figure 4 Another embodiment of the present application provides Figure 2 The cross-sectional view at AA of FIG.

[0032] Figure 5a is a schematic diagram of a reflection unit of an OLED display panel provided in an embodiment of the present application;

[0033] Figure 5b is a schematic diagram of a reflection unit of an OLED display panel provided in another embodiment of the present application;

[0034] Figure 5c is a schematic diagram of a reflection unit of an OLED display panel provided in another embodiment of the present application;

[0035] Figure 6 is a schematic diagram of an OLED display module provided in one embodiment of the present application;

[0036] Figure 7 is a schematic diagram of an OLED display module provided by another embodiment of the present application;

[0037] Figure 8 It is a flow chart of a method for manufacturing an OLED display panel provided in one embodiment of the present application. DETAILED DESCRIPTION

[0038] The technical solutions in the embodiments of the present application will be described clearly and completely below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the present application.

[0039] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application. In addition, the terms "first" and "second" are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "multiple" is two or more, unless otherwise clearly and specifically defined.

[0040] In the description of this application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, an electrical connection, or mutual communication; it can be a direct connection, or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0041] In the present application, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may include that the first and second features are in direct contact, or may include that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, a first feature being "above", "above" and "above" a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being "below", "below" and "below" a second feature includes that the first feature is directly below and obliquely below the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0042] The disclosure below provides many different embodiments or examples to realize the different structures of the present application. In order to simplify the disclosure of the present application, the parts and settings of specific examples are described below. Of course, they are only examples, and the purpose is not to limit the present application. In addition, the present application can repeat reference numbers and / or reference letters in different examples, and this repetition is for the purpose of simplification and clarity, which itself does not indicate the relationship between the various embodiments discussed-and / or settings. In addition, the various specific processes and material examples provided by the present application, but those of ordinary skill in the art can be aware of the application of other processes and / or the use of other materials.

[0043] See also Figures 1 to 7 The embodiment of the present application provides an OLED display panel 100, which has a display area 101 and a CUP area 102 located in the display area 101, wherein the CUP area 102 includes a plurality of pixel areas 1021 arranged at intervals, and a light-transmitting area 1022 located between two adjacent pixel areas 1021. The OLED display panel 100 includes:

[0044] A TFT (thin film transistor) array substrate 1, wherein the TFT array substrate 1 includes a TFT 11 located in a pixel area 1021;

[0045] A light emitting device layer 2, the light emitting device layer 2 is provided on the TFT array substrate 1, and the light emitting device layer 2 includes a first light emitting device 21 located in the pixel area 1021 and connected to the TFT 11, and a second light emitting device 22 located in the light-transmitting area 1022 and connected to the first light emitting device 21;

[0046] The second light emitting device 22 includes a first transparent electrode 221 , a second OLED functional layer 222 disposed on the first transparent electrode 221 , and a second transparent electrode 223 disposed on the second OLED functional layer 222 .

[0047] It should be noted that the CUP area 102 refers to the area corresponding to the photosensitive element 200. Except for the CUP area 102 in the display area 101, the rest of the area is the conventional display area 103. Compared with the multiple pixel units in the conventional display area 103, the spacing between the multiple pixel units in the CUP area 102 is larger, so that the CUP area 102 can transmit more light and enable the photosensitive element 200 to work normally. However, since there are still multiple pixel units in the CUP area 102, the multiple pixel units will block the light, so the transmittance of the CUP area 102 is low, and the photosensitivity of the photosensitive element 200 is poor.

[0048] The multiple pixel areas 1021 in the CUP area 102 refer to the area where the pixel unit in the CUP area 102 is located, that is, one pixel area 1021 corresponds to one pixel unit, and one pixel unit contains multiple sub-pixels (for example, three, four or six sub-pixels). The TFT11 located in the pixel area 1021 refers to the TFT11 of a sub-pixel in the pixel area 1021, and a TFT11 and a first light-emitting device 21 constitute a sub-pixel. The present application sets a second light-emitting device 22 in the light-transmitting area 1022, and the second light-emitting device 22 has a first transparent electrode 221 and a second transparent electrode 223. The second light-emitting device 22 can not only emit light on both sides (that is, the second light-emitting device 22 can emit light upward and downward), but also external light can pass through the second light-emitting device 22, thereby improving the transmittance of the CUP area 102. In addition, the second light-emitting device 22 is also connected to the first light-emitting device 21 in the pixel area 1021, that is, the second light-emitting device 22 is driven by the sub-pixel adjacent to the second light-emitting device 22. There is no need to set a driving circuit in the light-transmitting area 1022, thereby reducing the light-blocking structure, thereby improving the transmittance of the CUP area 102, and further improving the photosensitivity of the photosensitive element 200.

[0049] In addition, the number of second light-emitting devices 22 can be multiple, and each second light-emitting device 22 is driven by an adjacent sub-pixel. The second light-emitting device 22 located in the light-transmitting area 1022 is equivalent to a sub-pixel that can transmit light, which can increase the pixel density of the CUP area 102, improve the display resolution (PPI), and reduce the display difference between the CUP area 102 and the conventional display area 103, so as to improve the display effect.

[0050] The embodiment of the present application does not impose any specific restrictions on the applicability of the OLED display panel 100, which can be any product or component with a display function, such as a television, a laptop computer, a tablet computer, a wearable display device (such as a smart bracelet, a smart watch, etc.), a mobile phone, a virtual reality device, an augmented reality device, a car display, an advertising light box, etc.

[0051] In some embodiments, see Figure 3 and Figure 4 The OLED display panel 100 further includes a pixel definition layer 3 disposed on the light-emitting device layer 2 , and the pixel definition layer 3 may define an area (ie, pixel area 1021 ) for accommodating the first light-emitting device 21 and an area for accommodating the second light-emitting device 22 .

[0052] In some embodiments, see Figure 3 and Figure 4The first light emitting device 21 includes a first electrode 211, a first OLED functional layer 212 disposed on the first electrode 211, and a second electrode 213 disposed on the first OLED functional layer 212. The first transparent electrode 221 is connected to the first electrode 211; the second transparent electrode 223 is connected to the second electrode 213, so that the TFT 11 located in the pixel area 1021 can drive the first light emitting device 21 and the second light emitting device 22 at the same time, thereby realizing that the sub-pixel adjacent to the second light emitting device 22 drives the second light emitting device 22, and there is no need to set a driving circuit in the light-transmitting area 1022, reducing the light-blocking structure, thereby improving the transmittance of the CUP area 102, and further improving the photosensitivity of the photosensitive element 200.

[0053] In this embodiment, the first transparent electrode 221 is integrally formed with the first electrode 211, and the second transparent electrode 223 is integrally formed with the second electrode 213. That is, the first transparent electrode 221 and the first electrode 211 are material layers manufactured at the same time, and the second transparent electrode 223 and the second electrode 213 are integrally formed with the second electrode 213 as a material layer manufactured at the same time, thereby simplifying the process and ensuring that the second light-emitting device 22 can be driven by the sub-pixel adjacent to the second light-emitting device 22.

[0054] In this embodiment, the second OLED functional layer 222 is integrally formed with the first OLED functional layer 212. That is, the second OLED functional layer 222 and the first OLED functional layer 212 are material layers that are manufactured at the same time, which can simplify the process, and can also make the light-emitting color and brightness of the second light-emitting device 22 and the first light-emitting device 21 close to or the same, thereby improving the display uniformity of the CUP area 102.

[0055] In this embodiment, the first transparent electrode 221 and the first electrode 211 may be anodes, and the second transparent electrode 223 and the second electrode 213 may be cathodes. The second OLED functional layer 222 and the first OLED functional layer 212 include a hole transport layer, a light emitting layer disposed on the hole transport layer, and an electron transport layer of the hole transport layer disposed on the light emitting layer.

[0056] In addition, in order to improve the light emitting efficiency, the second OLED functional layer 222 and the first OLED functional layer 212 may further include a hole injection layer disposed under the hole transport layer, and an electron injection layer disposed on the electron transport layer.

[0057] In this example, see Figure 3The first electrode 211 includes a first transparent metal oxide layer 2111, a metal layer 2112 disposed on the first transparent metal oxide layer 2111, and a second transparent metal oxide layer 2113 disposed on the metal layer 2112. The first transparent electrode 221 and the first transparent metal oxide layer 2111 are integrally formed. The metal layer 2112 can reflect light, so that the first light-emitting device 21 in the pixel area 1021 emits light in one direction (such as upward), and can also improve the luminous efficiency of the first light-emitting device 21. In addition, the first electrode 211 is a stacked multilayer structure, which can reduce the voltage drop (IR drop). The first transparent electrode 221 and the first transparent metal oxide layer 2111 are material layers made at the same time, which can simplify the process, and can also make the first transparent electrode 221 transparent, improve the transmittance of the CUP area 102, and then improve the photosensitivity of the photosensitive element 200.

[0058] In this embodiment, the material of the first transparent electrode 221 and the first transparent metal oxide layer 2111 may be indium tin oxide (ITO). Of course, other materials may also be used, such as indium zinc oxide, and the present application does not limit this.

[0059] The material of the metal layer 2112 may be silver (Ag). Of course, it may also be other materials, such as copper, aluminum, molybdenum, titanium and other metals, which are not limited in the present application.

[0060] The material of the second transparent metal oxide layer 2113 can be indium tin oxide. Of course, it can also be other materials, such as indium zinc oxide, which is not limited in the present application.

[0061] In some embodiments, see Figure 4 and Figure 7 , the TFT array substrate 1 also includes a reflection unit 12 disposed in the pixel area 1021, and a refraction unit 13 disposed in the light-transmitting area 1022. The refraction unit 13 is located directly below the second light-emitting device 22, and is used to refract part of the light emitted by the second light-emitting device 22 and / or part of the external light onto the reflection unit 12, and refract the light reflected back by the reflection unit 12 to the outside of the OLED display panel 100. That is, by setting the refraction unit 13, the present application can avoid setting the reflection unit 12 in the light-transmitting area 1022, thereby avoiding affecting the transmittance of the CUP area 102, and through the cooperation of the refraction unit 13 and the reflection unit 12, part of the light propagating downward can be reflected back to the second light-emitting device 22, and emitted to the outside of the OLED display panel 100, so as to compensate for the light loss of the light passing through the first transparent electrode 221, reduce the display difference between the second light-emitting device 22 and the first light-emitting device 21, and improve the display effect.

[0062] In addition, the refraction unit 13 will only refract a portion of the light incident on the refraction unit 13, and the other portion of the light will pass through the refraction unit 13 and the CUP area 102 and be emitted toward the photosensitive element 200. Therefore, when the second light-emitting device 22 does not emit light, the photosensitive element 200 can still receive the light to maintain a high information collection efficiency and maintain a good imaging effect.

[0063] In this example, see Figure 5a to Figure 5c The cross-sectional shape of the refraction unit 13 can be a triangle, such as an isosceles triangle or a right triangle. Of course, it can also be other shapes that can be refracted, such as an ellipse or a semi-ellipse, and the present application does not limit this. The material of the refraction unit 13 can be silicone, polydimethylsiloxane (PDMS) or polymethyl methacrylate (PMAA), and of course, the material of the refraction unit 13 can also be other materials, and the present application does not limit this.

[0064] The reflection unit 12 may be a metal having a reflection function, such as copper or aluminum, and the present application does not limit this.

[0065] In this example, see Figure 4 , the TFT array substrate 1 further includes: a first insulating layer 14, the first insulating layer 14 is disposed on the TFT 11, the side of the first insulating layer 14 is an inclined surface, and the reflective unit 12 is located on the inclined surface; a second insulating layer 15, the second insulating layer 15 is disposed on the TFT 11, the reflective unit 12 and the first insulating layer 14, and the refractive unit 13 is located on the second insulating layer 15. That is, the present application sets the side of the first insulating layer 14 as an inclined surface, and the inclined surface is located in the pixel area 1021, and the reflective unit 12 is located on the inclined surface, so that the reflective unit 12 can be tilted toward the refractive unit 13, ensuring that the reflective unit 12 can reflect the light refracted by the refractive unit 13, so as to compensate for the light loss of the light passing through the first transparent electrode 221.

[0066] In addition, the TFT array substrate 1 further includes a third insulating layer 16, which is disposed on the second insulating layer 15 and the refraction unit 13. The light emitting device layer 2 is disposed on the third insulating layer 16. The second insulating layer 15 and the third insulating layer 16 can serve as a planar layer 114.

[0067] In this example, see Figure 4 The TFT array substrate 1 further includes a light shielding layer 17 located under the TFT 11, and the reflective unit 12 is located directly above the light shielding layer 17. The light shielding layer 17 and the reflective unit 12 can block light at the same time, preventing the light from irradiating the active layer 111 in the TFT 11, preventing the TFT 11 from failing, and improving the reliability of the TFT 11.

[0068] In addition, the refractive index of the refractive unit 13 can be controlled according to the relative position between the refractive unit 13 and the reflective unit 12, so that all the light refracted by the refractive unit 13 is incident on the reflective unit 12 instead of being incident on the TFT 11. This can not only further improve the reliability of the TFT 11, but also improve the effect of compensating for light loss.

[0069] In this example, see Figure 3 and Figure 4 TFT11 includes an active layer 111 disposed on the light shielding layer 17, a gate insulating layer 112 disposed on the active layer 111, a gate electrode 113 disposed on the gate insulating layer 112, a planar layer 114 disposed on the gate insulating layer 112 and the gate electrode 113, and a source electrode 115 and a drain electrode 116 disposed on the planar layer 114, wherein the source electrode 115 and the drain electrode 116 are both connected to the active layer 111. The first electrode 211 is connected to the drain electrode 116.

[0070] In addition, the area of ​​the light shielding layer 17 is larger than the area of ​​the active layer 111 to improve the light shielding effect.

[0071] In some embodiments, see Figure 3 and Figure 4 , the OLED display panel 100 further includes a substrate 4, and the TFT array substrate 1 is disposed on the substrate 4. If the OLED display panel 100 is rigid, the substrate 4 may be a rigid material, such as glass. If the OLED display panel 100 is flexible, the substrate 4 may be a flexible material, for example, the substrate 4 may be a structure in which an inorganic barrier layer and an organic buffer layer are stacked. The material of the inorganic barrier layer may be a combination of one or more of silicon nitride, silicon oxide, or silicon oxynitride. The material of the organic buffer layer may be polyimide (PI), polyethylene terephthalate (PET), or polydimethylsiloxane (PDMS).

[0072] In some embodiments, see Figure 3 and Figure 4 The OLED display panel 100 further includes an encapsulation layer 5 disposed on the light-emitting device layer 2 , and a protective cover plate 6 disposed on the encapsulation layer 5 .

[0073] See also Figure 6 and Figure 7 Based on the above-mentioned OLED display panel 100 , the embodiment of the present application further provides an OLED display module, including the above-mentioned OLED display panel 100 , and a photosensitive element 200 , wherein the photosensitive element 200 is located below the CUP area 102 .

[0074] It should be noted that, in the present application, by setting a second light-emitting device 22 in the light-transmitting area 1022, the second light-emitting device 22 has a first transparent electrode 221 and a second transparent electrode 223. The second light-emitting device 22 can not only emit light from both sides, but also external light can pass through the second light-emitting device 22, so as to improve the transmittance of the CUP area 102. In addition, the second light-emitting device 22 is also connected to the first light-emitting device 21 in the pixel area 1021, that is, the second light-emitting device 22 is driven by the sub-pixel adjacent to the second light-emitting device 22, and there is no need to set a driving circuit in the light-transmitting area 1022, thereby reducing the light-blocking structure, thereby improving the transmittance of the CUP area 102, and further improving the photosensitivity of the photosensitive element 200.

[0075] In addition, the number of second light-emitting devices 22 can be multiple, and each second light-emitting device 22 is driven by an adjacent sub-pixel. The second light-emitting device 22 located in the light-transmitting area 1022 is equivalent to a sub-pixel that can transmit light, which can increase the pixel density of the CUP area 102, improve the display resolution (PPI), and reduce the display difference between the CUP area 102 and the conventional display area 103, so as to improve the display effect.

[0076] See also Figure 8 Based on the above-mentioned OLED display panel 100, the embodiment of the present application further provides a method for manufacturing the OLED display panel 100, including:

[0077] Step S1, providing a TFT array substrate 1, wherein the TFT array substrate 1 has a display area 101 and a CUP area 102 located in the display area 101, the CUP area 102 includes a plurality of pixel areas 1021 arranged at intervals, and a light-transmitting area 1022 located between two adjacent pixel areas 1021, and the TFT array substrate 1 includes a TFT 11 located in the pixel area 1021;

[0078] Step S2, manufacturing a light-emitting device layer 2 on the TFT array substrate 1, the light-emitting device layer 2 includes a first light-emitting device 21 located in the pixel area 1021 and connected to the TFT 11, and a second light-emitting device 22 located in the light-transmitting area 1022 and connected to the first light-emitting device 21; the second light-emitting device 22 includes a first transparent electrode 221, a second OLED functional layer 222 disposed on the first transparent electrode 221, and a second transparent electrode 223 disposed on the second OLED functional layer 222.

[0079] It should be noted that, in the present application, by setting a second light-emitting device 22 in the light-transmitting area 1022, the second light-emitting device 22 has a first transparent electrode 221 and a second transparent electrode 223. The second light-emitting device 22 can not only emit light from both sides, but also external light can pass through the second light-emitting device 22, so as to improve the transmittance of the CUP area 102. In addition, the second light-emitting device 22 is also connected to the first light-emitting device 21 in the pixel area 1021, that is, the second light-emitting device 22 is driven by the sub-pixel adjacent to the second light-emitting device 22, and there is no need to set a driving circuit in the light-transmitting area 1022, thereby reducing the light-blocking structure, thereby improving the transmittance of the CUP area 102, and further improving the photosensitivity of the photosensitive element 200.

[0080] In addition, the number of second light-emitting devices 22 can be multiple, and each second light-emitting device 22 is driven by an adjacent sub-pixel. The second light-emitting device 22 located in the light-transmitting area 1022 is equivalent to a sub-pixel that can transmit light, which can increase the pixel density of the CUP area 102, improve the display resolution (PPI), and reduce the display difference between the CUP area 102 and the conventional display area 103, so as to improve the display effect.

[0081] In some embodiments, the first light emitting device 21 includes a first electrode 211, a first OLED functional layer 212 disposed on the first electrode 211, and a second electrode 213 disposed on the first OLED functional layer 212. The first transparent electrode 221 is connected to the first electrode 211; the second transparent electrode 223 is connected to the second electrode 213, so that the TFT 11 located in the pixel area 1021 can drive the first light emitting device 21 and the second light emitting device 22 at the same time, thereby realizing that the sub-pixel adjacent to the second light emitting device 22 drives the second light emitting device 22, and there is no need to set a driving circuit in the light-transmitting area 1022, reducing the light-blocking structure, thereby improving the transmittance of the CUP area 102, and further improving the photosensitivity of the photosensitive element 200.

[0082] In this embodiment, the first transparent electrode 221 is integrally formed with the first electrode 211, and the second transparent electrode 223 is integrally formed with the second electrode 213. That is, in the manufacturing process of the light-emitting device layer 2 in step S2, the first transparent electrode 221 and the first electrode 211 are material layers manufactured at the same time, and the second transparent electrode 223 and the second electrode 213 are integrally formed with the material layers manufactured at the same time, thereby simplifying the process and ensuring that the second light-emitting device 22 can be driven by the sub-pixel adjacent to the second light-emitting device 22.

[0083] In this embodiment, that is, during the manufacturing process of the light emitting device layer 2 in step S2, the second OLED functional layer 222 is integrally formed with the first OLED functional layer 212. That is, the second OLED functional layer 222 and the first OLED functional layer 212 are material layers manufactured at the same time, which can simplify the process, and can also make the light emitting color and brightness of the second light emitting device 22 and the first light emitting device 21 close to or the same, thereby improving the display uniformity of the CUP area 102.

[0084] In this embodiment, the first electrode 211 includes a first transparent metal oxide layer 2111, a metal layer 2112 disposed on the first transparent metal oxide layer 2111, and a second transparent metal oxide layer 2113 disposed on the metal layer 2112. The first transparent electrode 221 and the first transparent metal oxide layer 2111 are integrally formed. The metal layer 2112 can reflect light, so that the first light-emitting device 21 in the pixel area 1021 emits light in one direction (such as upward), and can also improve the luminous efficiency of the first light-emitting device 21. And the first electrode 211 is a stacked multilayer structure, which can reduce the voltage drop (IR drop). That is, in the manufacturing process of the light-emitting device layer 2 in step S2, the first transparent electrode 221 and the first transparent metal oxide layer 2111 are material layers manufactured at the same time, which can simplify the process, and can also make the first transparent electrode 221 transparent, improve the transmittance of the CUP area 102, and then improve the photosensitivity of the photosensitive element 200.

[0085] In some embodiments, the TFT array substrate 1 further includes a reflection unit 12 disposed in the pixel area 1021, and a refraction unit 13 disposed in the light-transmitting area 1022. The refraction unit 13 is located directly below the second light-emitting device 22, and is used to refract part of the light emitted by the second light-emitting device 22 and / or part of the light from the outside to the reflection unit 12, and refract the light reflected back by the reflection unit 12 to the outside of the OLED display panel 100. That is, by setting the refraction unit 13, the present application can avoid setting the reflection unit 12 in the light-transmitting area 1022, thereby avoiding affecting the transmittance of the CUP area 102, and by the cooperation of the refraction unit 13 and the reflection unit 12, part of the light propagating downward can be reflected back to the second light-emitting device 22, and emitted to the outside of the OLED display panel 100, so as to compensate for the light loss of the light passing through the first transparent electrode 221, reduce the display difference between the second light-emitting device 22 and the first light-emitting device 21, and improve the display effect.

[0086] In addition, the refraction unit 13 will only refract a portion of the light incident on the refraction unit 13, and the other portion of the light will pass through the refraction unit 13 and the CUP area 102 and be emitted toward the photosensitive element 200. Therefore, when the second light-emitting device 22 does not emit light, the photosensitive element 200 can still receive the light to maintain a high information collection efficiency and maintain a good imaging effect.

[0087] In this embodiment, the method for manufacturing the TFT array substrate 1 in step S1 includes:

[0088] A first insulating layer 14 is formed on the TFT 11 and patterned so that a side surface of the first insulating layer 14 is an inclined surface, and the inclined surface is located in the pixel region 1021;

[0089] Making a reflection unit 12 on the inclined surface;

[0090] A second insulating layer 15 is formed on the TFT 11, the reflective unit 12 and the first insulating layer 14;

[0091] A refraction unit 13 is fabricated on the second insulating layer 15 so that the refraction unit 13 is located directly below the second light emitting device 22;

[0092] A third insulating layer 16 is formed on the second insulating layer 15 and the refraction unit 13 .

[0093] In the above embodiments, the description of each embodiment has its own emphasis. For parts not described in detail in a certain embodiment, please refer to the relevant description of other embodiments. In specific implementation, the above units or structures can be implemented as independent entities, or can be arbitrarily combined and implemented as the same or several entities. The specific implementation of the above units or structures can refer to the previous method embodiments, which will not be repeated here.

[0094] The above is a detailed introduction to an OLED display panel and a manufacturing method thereof, and an OLED display module provided in the embodiments of the present application. Specific examples are used in this article to illustrate the principles and implementation methods of the embodiments of the present application. The description of the above embodiments is only used to help understand the technical solutions and core ideas of the embodiments of the present application. Ordinary technicians in this field should understand that they can still modify the technical solutions recorded in the aforementioned embodiments, or replace some of the technical features therein with equivalents; and these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. An OLED display panel, characterized in that: The OLED display panel comprises a display area and a CUP area located in the display area, wherein the CUP area comprises a plurality of pixel areas arranged at intervals and a light-transmitting area located between two adjacent pixel areas. The OLED display panel comprises: A TFT array substrate, wherein the TFT array substrate includes TFTs located in the pixel area; a light emitting device layer, the light emitting device layer being disposed on the TFT array substrate, and the light emitting device layer comprising a first light emitting device located in the pixel area and connected to the TFT, and a second light emitting device located in the light-transmitting area and connected to the first light emitting device; The second light emitting device comprises a first transparent electrode, a second OLED functional layer disposed on the first transparent electrode, and a second transparent electrode disposed on the second OLED functional layer; Wherein, the TFT array substrate further comprises a reflection unit arranged in the pixel area, and a refraction unit arranged in the light-transmitting area; The refraction unit is located directly below the second light emitting device, and is used to refract part of the light emitted by the second light emitting device and / or part of the external light onto the reflection unit, and refract the light reflected back by the reflection unit to the outside of the OLED display panel.

2. The OLED display panel according to claim 1, characterized in that: The first light emitting device includes a first electrode, a first OLED functional layer disposed on the first electrode, and a second electrode disposed on the first OLED functional layer; The first transparent electrode is connected to the first electrode; and the second transparent electrode is connected to the second electrode.

3. The OLED display panel according to claim 2, characterized in that: The first transparent electrode is integrally formed with the first electrode, and the second transparent electrode is integrally formed with the second electrode.

4. The OLED display panel according to claim 3, characterized in that: The second OLED functional layer is integrally formed with the first OLED functional layer.

5. The OLED display panel according to claim 2, characterized in that: The first electrode includes a first transparent metal oxide layer, a metal layer disposed on the first transparent metal oxide layer, and a second transparent metal oxide layer disposed on the metal layer; The first transparent electrode and the first transparent metal oxide layer are integrally formed.

6. The OLED display panel according to any one of claims 1 to 5, characterized in that: The TFT array substrate further comprises: A first insulating layer, wherein the first insulating layer is disposed on the TFT, a side surface of the first insulating layer is an inclined surface, and the reflecting unit is located on the inclined surface; A second insulating layer is provided on the TFT, the reflecting unit and the first insulating layer, and the refractive unit is located on the second insulating layer.

7. The OLED display panel according to claim 6, characterized in that: The TFT array substrate further includes a light shielding layer located under the TFT, and the reflection unit is located directly above the light shielding layer.

8. An OLED display module, characterized in that: It comprises the OLED display panel as described in any one of claims 1 to 7, and a photosensitive element, wherein the photosensitive element is located below the CUP area.

9. A method for manufacturing an OLED display panel, characterized in that: For preparing the OLED display panel according to any one of claims 1 to 7, the manufacturing method comprises: A TFT array substrate is provided, wherein the TFT array substrate has a display area and a CUP area located in the display area, wherein the CUP area includes a plurality of pixel areas arranged at intervals and a light-transmitting area located between two adjacent pixel areas, and the TFT array substrate includes a TFT located in the pixel area; A light-emitting device layer is manufactured on the TFT array substrate, wherein the light-emitting device layer includes a first light-emitting device located in the pixel area and connected to the TFT, and a second light-emitting device located in the light-transmitting area and connected to the first light-emitting device; the second light-emitting device includes a first transparent electrode, a second OLED functional layer disposed on the first transparent electrode, and a second transparent electrode disposed on the second OLED functional layer.

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