Organic light emitting display apparatus

Abstract

An organic light emitting display apparatus is provided. The organic light emitting display apparatus has a plurality of first electrodes corresponding to a plurality of pixel regions, an intermediate layer, and a second electrode. The first electrodes are spaced apart from each other, the second electrode is spaced apart from each other, and the intermediate layer is spaced apart from each other. A conductive protection layer is formed above the second electrode, and a connection electrode layer is formed above the conductive protection layer and electrically connects the second electrode.

Description

[0001] This application is a divisional application of the invention patent application filed on January 22, 2016, with application number 201610044555.5 and title "Organic Light Emitting Display Device".

[0002] Cross-reference to related applications

[0003] Korean Patent Application No. 10-2015-0025912, filed on February 24, 2015, entitled "Organic Light Emitting Display Device and Method for Manufacturing Organic Light Emitting Display Device", is incorporated herein by reference in its entirety. Technical Field

[0004] The described one or more embodiments relate to organic light-emitting display devices. Background Technology

[0005] Compared to other types of display devices, organic light-emitting displays are lightweight and thin, and offer wide viewing angles, fast response times, and reduced power consumption. To achieve full-color displays, different color pixels can have optical resonant structures with different optical path lengths. Summary of the Invention

[0006] According to one or more embodiments, an organic light-emitting display device includes: a substrate including a plurality of pixel regions; a plurality of first electrodes corresponding to and spaced apart from the pixel regions; a plurality of intermediate layers corresponding to and spaced apart from the pixel regions; a plurality of second electrodes corresponding to and spaced apart from the pixel regions; a conductive protective layer above the second electrodes; and a connecting electrode layer above the conductive protective layer and electrically connected to the second electrodes.

[0007] The connecting electrode layer can be formed as a single unit for multiple pixel regions to cover those regions. The second electrode and the connecting electrode layer may include a semi-transparent metal layer. The thickness of the conductive protective layer can be greater than the thickness of each of the second electrodes and the thickness of the connecting electrode layer. The conductive protective layer can be a semi-transparent layer.

[0008] The intermediate layer and the second electrode corresponding to the pixel region can have substantially the same pattern. The distance between the second electrode corresponding to at least one of the pixel regions and the connecting electrode layer can correspond to the optical resonant distance of light emitted from at least one of the pixel regions. At least one of the distance between the first electrode and the second electrode corresponding to at least one of the pixel regions and the distance between the first electrode and the connecting electrode layer corresponding to at least one of the pixel regions can correspond to the optical resonant distance of light emitted from at least one of the pixel regions.

[0009] The pixel region may include a first pixel region corresponding to the emission of light of a first color and a second pixel region corresponding to the emission of light of a second color. The thickness of the second electrode corresponding to the first pixel region may be different from the thickness of the second electrode corresponding to the second pixel region. The conductive protective layer may be integrally formed with respect to the second electrode. The display device may include a pixel defining layer between adjacent pixel regions in the pixel region, wherein at least a portion of the top surface of the pixel defining layer may be in direct contact with the conductive protective layer. The conductive protective layer may have a thickness based on the optical resonant distance of light emitted from one of the pixel regions.

[0010] The conductive protective layer may have an island pattern corresponding to the pixel regions of the substrate. Each of the island patterns may substantially correspond to the island pattern of the second electrode. The display device may include a pixel defining layer between adjacent pixel regions in the pixel regions, wherein at least a portion of the top surface of the pixel defining layer may be in direct contact with the connecting electrode layer.

[0011] The pixel region may include a first pixel region corresponding to the emission of light of a first color and a second pixel region corresponding to the emission of light of a second color. The thickness of the conductive protective layer corresponding to the first pixel region may be different from the thickness of the conductive protective layer corresponding to the second pixel region. The first electrode may be an anode, and the second electrode may be a cathode. The display device may include a protective layer on the connecting electrode layer. Each of the intermediate layers may include a first intermediate layer adjacent to the first electrode and an emission layer on the first intermediate layer. The first intermediate layer may include a hole transport layer.

[0012] According to one or more other embodiments, a method for manufacturing an organic light-emitting display device is provided, the method comprising: preparing a substrate including a plurality of pixel regions; patterning first electrodes spaced apart from each other and corresponding to the pixel regions of the substrate; forming an intermediate layer and a second electrode, each of the intermediate layer and the second electrode having an island-shaped pattern corresponding to and spaced apart from the plurality of pixel regions of the substrate; forming a conductive protective layer covering the second electrode; and forming a connecting electrode layer integrally formed with the pixel regions and electrically connected to the second electrode on the conductive protective layer.

[0013] The second electrode and the connecting electrode layer may include a semi-transparent metal layer. The thickness of the conductive protective layer may be greater than the thickness of each of the second electrodes and the thickness of the connecting electrode layer. The conductive protective layer may be a semi-transparent layer.

[0014] Forming the intermediate layer and the second electrode may include: forming a masking pattern on a substrate having an opening that exposes a first electrode corresponding to a first pixel region, the first pixel region corresponding to light emission of a first color; forming an intermediate layer on the surface of the substrate including the masking pattern; forming a second electrode on the intermediate layer; and removing the masking pattern such that the intermediate layer and the second electrode in the island-shaped pattern are retained corresponding to the first pixel region.

[0015] The conductive protective layer can be formed such that a portion of the conductive protective layer corresponding to the first pixel region for emitting light of the first color has a thickness based on the optical resonance distance of the light emitted from the first pixel region. The conductive protective layer can be integrally formed with respect to the second electrode. The conductive protective layer can have an island-shaped pattern substantially corresponding to each of the second electrodes.

[0016] The first electrode can be an anode, and the second electrode can be a cathode. Each of the intermediate layers can include a first intermediate layer adjacent to the first electrode and an emitter layer on the first intermediate layer. The first intermediate layer can include a hole transport layer. The method can include forming a protective layer on the connecting electrode layer. Attached Figure Description

[0017] The features will become apparent to those skilled in the art from the detailed description of the exemplary embodiments with reference to the accompanying drawings, in which:

[0018] Figure 1 An embodiment of an organic light-emitting display device is shown;

[0019] Figure 2 It shows along Figure 1 View of section line II-II;

[0020] Figures 3 to 13 Different stages of an embodiment of a method for manufacturing an organic light-emitting display device are shown;

[0021] Figure 14 Another embodiment of an organic light-emitting display is shown;

[0022] Figure 15 Another embodiment of an organic light-emitting display is shown;

[0023] Figures 16 to 22 It shows the manufacturing process. Figure 15 Different stages of an embodiment of the method for an organic light-emitting display device; and

[0024] Figure 23 Another embodiment of an organic light-emitting display is shown. Detailed Implementation

[0025] Exemplary embodiments will be described more fully below with reference to the accompanying drawings; however, exemplary embodiments may be embodied in different forms and should not be considered as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey exemplary implementation methods to those skilled in the art. Embodiments may be combined to form other embodiments.

[0026] It will also be understood that when a layer or element is referred to as being "on" another layer or substrate, it can be directly on that layer or substrate, or there may be intermediate layers. Furthermore, it will be understood that when a layer is referred to as being "below" another layer, it can be directly below, or there may be one or more intermediate layers. Additionally, it will be understood that when a layer is referred to as being "between" two layers, it can be the only layer between the two layers, or there may be one or more intermediate layers. Throughout the text, the same reference numerals refer to the same elements.

[0027] Figure 1 An embodiment of an organic light-emitting display device comprising multiple pixel regions P1, P2, and P3 is shown. Pixel regions P1, P2, and P3 can be arranged to form a matrix and emit light of different colors. For example, pixel regions P1, P2, and P3 can emit blue light, green light, and red light, respectively. For ease of illustration, an example of the first pixel region P1 emitting blue light, the second pixel region P2 emitting green light, and the third pixel region P3 emitting red light will be described below. (In another embodiment, as long as a full-color display is implemented, the display device can emit different combinations of colors. Furthermore, another embodiment can have a different number of pixel regions; for example, it can include a combination of four pixels emitting blue, green, red, and white light.)

[0028] The patterned stacked structure 200 is present in each of the pixel regions P1, P2, and P3. See, for example... Figure 2 The stacked structure 200 may include a first electrode 210, an intermediate layer 220, and a second electrode 230. The second electrode 230 of the stacked structure 200 is electrically connected via a connecting electrode layer 250, and a conductive protective layer 240 of predetermined thickness is located between the stacked structure 200 and the connecting electrode layer 250.

[0029] For example Figure 1 As shown, pixel regions P1, P2, and P3 are arranged to form a matrix. According to another exemplary embodiment, pixel regions P1, P2, and P3 can be arranged to have various other shapes, such as a pentile shape.

[0030] Figure 2 It shows along Figure 1 A sectional view taken along line II-II. (Reference) Figure 2A pixel circuit PC is formed on a substrate 100, and an insulating layer 150 is located on the pixel circuit PC. The substrate 100 may comprise, for example, a glass material, a metal material, or a plastic material such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), or polyimide. According to one embodiment, the substrate 100 may have increased flexibility when formed of a plastic or metal material compared to when the substrate 100 is formed of a glass material. A buffer layer formed of, for example, SiO2 and / or SiNx may be present on the substrate 100 to prevent impurities from penetrating into the substrate 100.

[0031] The pixel circuit PC includes thin-film transistors (TFTs) and capacitors, which can be electrically connected to a first electrode 210 on each of the pixel regions P1, P2, and P3. The top surface of the pixel circuit PC may be covered by a nearly flat insulating layer 150.

[0032] The first electrode 210 is located in each of the pixel regions P1, P2, and P3. The first electrode 210 is patterned into an island shape corresponding to each of the pixel regions P1, P2, and P3. The first electrode 210 is an anode electrode used as a reflective electrode. The first electrode 210 may be a single reflective metal layer comprising, for example, silver (Ag), aluminum (Al), gold (Au), platinum (Pt), chromium (Cr), or an alloy containing these. According to one embodiment, the first electrode 210 may be a double or triple layer comprising, for example, indium tin oxide (ITO) or indium zinc oxide (IZO) on top of and / or on the bottom of the aforementioned single reflective metal layer.

[0033] The pixel defining layer 180 includes openings OP corresponding to pixel regions P1, P2, and P3. The top surface of the first electrode 210 is exposed through the openings OP of the pixel defining layer 180. The edges of the first electrode 210 may be covered by the pixel defining layer 180. The pixel defining layer 180 may include an organic insulating layer formed of acrylic resin. The pixel defining layer 180 may increase the distance between the end of the first electrode 210 and the second electrode 230 and / or between the end of the first electrode 210 and the connecting electrode layer 250, thereby preventing the generation of electric arcs or the like at the end of the first electrode 210.

[0034] Intermediate layer 220 is formed in each of pixel regions P1, P2 and P3. Intermediate layer 220 may be patterned as an island in each of pixel regions P1, P2 and P3, and may include a first intermediate layer 221, emission layers 222B, 222G and 222R, and a second intermediate layer 223 stacked sequentially.

[0035] The first intermediate layer 221 may be adjacent to the first electrode 210 and may have a single-layer or multi-layer structure. For example, when the first intermediate layer 221 comprises a high molecular weight material, the first intermediate layer 221 may be a hole transport layer (HTL) with a single-layer structure, such as poly(3,4)-ethylene-dihydroxythiophene (PEDOT) or polyaniline (PANI). When the first intermediate layer 221 comprises a low molecular weight material, the first intermediate layer 221 may include a hole injection layer (HIL) and an HTL.

[0036] The emission layer 222B of the first pixel region P1 can correspond to blue light emission and is patterned into an island shape corresponding to the first pixel region P1. According to one embodiment, the emission layer 222B of the first pixel region P1 may include a fluorescent material selected from the group consisting of DPVBi, spirocyclic DPVBi, spiro-6P, distyrylbenzene (DSB), distyrylarylene (DSA), PFO polymers, and PPV polymers. According to another embodiment, the emission layer 222B may include anthracene derivatives or carbazole compounds as the host material, and may include a phosphorescent material as a dopant material, such phosphorescent material including F2Irpic, (F2ppy)2Ir(TMD), or Ir(dfppz)3.

[0037] The emission layer 222G of the second pixel region P2 can correspond to green light emission and is patterned into an island shape corresponding to the second pixel region P2. According to one embodiment, the emission layer 222G of the second pixel region P2 may include anthracene derivatives or carbazole compounds as the host material, and may include a phosphorescent material as a dopant material, such as Ir(PPY)3 (facial tris(2-phenylpyridine)iridium). According to another embodiment, the emission layer 222G may include a fluorescent material such as tris(8-hydroxyquinoline)aluminum (Alq3).

[0038] The emission layer 222R of the third pixel region P3 can correspond to red light emission and is patterned into an island shape corresponding to the third pixel region P3. According to one embodiment, the emission layer 222R of the third pixel region P3 may include anthracene derivatives or carbazole compounds as the host material, and may include a phosphorescent material as a dopant material, the phosphorescent material including one or more materials selected from the group consisting of PIQIr(acac) (bis(1-phenylisoquinoline)acetylacetone iridium), PQIr(acac) (bis(1-phenylquinoline)acetylacetone iridium), PQIr (tris(1-phenylquinoline)iridium), and PtPEP (octaethylporphyrin platinum). According to another embodiment, the emission layer 222R may include a fluorescent material such as PED:Eu(DBM)3(Phen) or dinaphthalene-based phenylene oxide.

[0039] The second intermediate layer 223 is patterned to correspond to each of the emitting layers 222B, 222G, and 222R, covering each of the emitting layers 222B, 222G, and 222R. In alternative embodiments, the second intermediate layer 223 may be omitted. For example, when the first intermediate layer 221 and the emitting layers 222B, 222G, and 222R comprise high molecular weight materials, the second intermediate layer 223 may be omitted. When the first intermediate layer 221 and the emitting layers 222B, 222G, and 222R comprise low molecular weight materials, the second intermediate layer 223 may be formed to achieve excellent light-emitting properties. In this case, the second intermediate layer 223 may have a monolayer or multilayer structure and may include an electron transport layer (ETL) and / or an electron injection layer (EIL).

[0040] A second electrode 230 is formed in each of the pixel regions P1, P2, and P3. The second electrode 230 is located on the intermediate layer 220 and is patterned into an island shape corresponding to each of the pixel regions P1, P2, and P3. The second electrode 230 is a cathode electrode that is both translucent and reflective. For example, the second electrode 230 may include a translucent metal layer. The second electrode 230 can transmit or reflect a portion of the light emitted from the emitting layers 222B, 222G, and 222R by appropriately adjusting the thickness of the translucent metal layer. According to an exemplary embodiment, the second electrode 230 may form a microcavity structure with the first electrode 210 and / or the connecting electrode layer 250, thereby improving the light efficiency of the organic light-emitting display device.

[0041] According to one embodiment, the second electrode 230 may include, for example, Ag and Mg. For instance, the second electrode 230 may be formed of an Ag-Mg alloy in which the amount of Ag is greater than the amount of Mg. According to another embodiment, the second electrode 230 may include any one selected from magnesium (Mg), silver (Ag), lithium (Li), sodium (Na), calcium (Ca), strontium (Sr), and alloys thereof.

[0042] A conductive protective layer 240 may be present on the second electrode 230. The conductive protective layer 240 electrically connects the patterned second electrode 230 in each of the pixel regions P1, P2, and P3 to the connecting electrode layer 250 and is transparent, allowing light emitted from the emitting layers 222B, 222G, and 222R to be emitted to the outside. The conductive protective layer 240 may, for example, comprise oxides such as ITO, IZO, WOx, MoOx, and InOx, or conductive polymers such as PEDOT, and may be formed as a single layer or multiple layers.

[0043] The conductive protective layer 240 can be integrally formed to cover the second electrode 230 of each of the pixel regions P1, P2, and P3. The conductive protective layer 240 can cover the display area. The display area corresponds, for example, to all areas of the organic light-emitting display device that can emit light, such as all areas of the organic light-emitting display device except for the edges where the controller is located. When there are no dead zones on the entire surface of the organic light-emitting display device, the entire surface of the organic light-emitting display device can be the display area.

[0044] The connecting electrode layer 250 can be formed as a single unit for pixel regions P1, P2 and P3 to cover the display area, and is electrically connected to the second electrode 230, which is patterned into an island shape corresponding to pixel regions P1, P2 and P3.

[0045] The connecting electrode layer 250 can be both translucent and reflective. For example, the connecting electrode layer 250 may include a semi-transparent metal layer. The connecting electrode layer 250 can transmit or reflect a portion of the light emitted from the emitting layers 222B, 222G, and 222R by appropriately adjusting the thickness of the semi-transparent metal layer. The connecting electrode layer 250 can form a microcavity structure with the first electrode 210 and / or the second electrode 230, thereby improving the light efficiency of the organic light-emitting display device.

[0046] According to one embodiment, the connecting electrode layer 250 may include, for example, Ag and Mg. For instance, the connecting electrode layer 250 may include an Ag-Mg alloy in which the amount of Ag is greater than the amount of Mg. According to another embodiment, the connecting electrode layer 250 may include any one selected from magnesium (Mg), silver (Ag), lithium (Li), sodium (Na), calcium (Ca), strontium (Sr), and alloys thereof.

[0047] The intermediate layer 220 and the second electrode 230 are patterned into islands corresponding to each of the pixel regions P1, P2, and P3, while the conductive protective layer 240 and the connecting electrode layer 250 are formed integrally with respect to the pixel regions P1, P2, and P3. Therefore, a portion of the top surface of the pixel defining layer 180 between the pixel regions P1, P2, and P3 can be in direct contact with the conductive protective layer 240.

[0048] At least one of the pixel regions P1, P2 and P3 may have an optical resonant structure, such as a microcavity.

[0049] According to one embodiment, one of the pixel regions P1, P2, and P3 may have a first optical resonant distance between the second electrode 230 and the connecting electrode layer 250 (e.g., from the second electrode 230 to the connecting electrode layer 250). For example, the conductive protective layer 240 may have a thickness corresponding to the optical resonant distance of light realized in one of the pixel regions P1, P2, and P3 (e.g., the first pixel region P1).

[0050] The intermediate layer 220 and the second electrode 230 can be independently patterned in each of the pixel regions P1, P2 and P3 during manufacturing. Therefore, the thickness of the intermediate layer 220 and the thickness of the second electrode 230 in each of the pixel regions P1, P2 and P3 can be independently selected, for example, the thicknesses can have different values.

[0051] By adjusting the thickness of the intermediate layer 220 and / or the second electrode 230, each of the pixel regions P1, P2 and P3 can have a second optical resonance distance from the first electrode 210 to the second electrode 230 and / or a third optical resonance distance from the first electrode 210 to the connecting electrode layer 250.

[0052] The thickness of the second electrode 230 and the connecting electrode layer 250 can be smaller than the thickness of the conductive protective layer 240. For example, the thickness of the conductive protective layer 240 can be greater than the thickness of the second electrode 230 and the connecting electrode layer 250. When the thickness of the second electrode 230 and the connecting electrode layer 250, which are formed of metal, is large (e.g., greater than one or more corresponding predetermined values), especially when the thickness of the connecting electrode layer 250, which is formed integrally for pixel regions P1, P2, and P3, is large, the resistance of the connecting electrode layer 250 can be reduced, and the light transmittance may be reduced, thus potentially degrading the light efficiency of the organic light-emitting display device. However, according to one embodiment, the thickness of the conductive protective layer 240 is relatively thick, and the thickness of the second electrode 230 and the connecting electrode layer 250 is relatively thin, thereby improving translucency while reducing resistance.

[0053] Figures 3 to 13 It shows the use of manufacturing, for example Figure 2 Cross-sectional views of different stages of an embodiment of a method for an organic light-emitting display device.

[0054] refer to Figure 3A substrate 100, including pixel regions P1, P2, and P3, is fabricated. A buffer layer is disposed on the substrate 100 to prevent impurities from penetrating into the substrate 100. A pixel circuit PC, including TFTs and capacitors, is formed on the buffer layer. The pixel circuit PC is formed in each of the pixel regions P1, P2, and P3 and may have a top surface covered by a nearly flat insulating layer 150.

[0055] Subsequently, a first electrode 210 is formed in each of the pixel regions P1, P2, and P3 by forming and patterning a metal layer on the insulating layer 150. The first electrode 210 is patterned into an island shape corresponding to each of the pixel regions P1, P2, and P3. The first electrode 210 is a reflective electrode. According to one embodiment, the first electrode 210 may be a single reflective metal layer comprising silver (Ag), aluminum (Al), gold (Au), platinum (Pt), chromium (Cr), or an alloy containing them. According to another embodiment, the first electrode 210 may be formed as a double or triple layer comprising ITO or IZO on top and / or at the bottom of the aforementioned single reflective metal layer.

[0056] The pixel defining layer 180 is formed by forming and patterning an organic insulating layer on a substrate 100 on which the first electrode 210 is formed. The pixel defining layer 180 includes an opening OP that exposes at least a portion of the top surface of the first electrode 210.

[0057] refer to Figure 4 The first masking pattern M1 is formed to cover pixel regions P2 and P3, excluding the first pixel region P1. The first masking pattern M1 may comprise a polymer material. The type of material for the first masking pattern M1 may differ in another embodiment, provided that the material is well soluble in a solvent during the stripping process described later and can reduce or minimize the impact on the intermediate layer 220.

[0058] refer to Figure 5 Intermediate layer 220 and second electrode 230 are sequentially formed on substrate 100 on which first masking pattern M1 is provided. Intermediate layer 220 may include first intermediate layer 221, blue emission layer 222B and second intermediate layer 223.

[0059] The first intermediate layer 221 may be an HTL with a single-layer structure. According to another embodiment, the first intermediate layer 221 may include a HIL adjacent to the first electrode 210 and an HTL located on the HIL.

[0060] As a material corresponding to blue light emission, the emitting layer 222B may include a fluorescent material comprising materials selected from the group consisting of DVBbi, spirocyclic DVBbi, spiro-6P, stilbene (DSB), stilbene aromatic (DSA), PFO polymers, and PPV polymers. According to another embodiment, the emitting layer 222B may include anthracene derivatives or carbazole compounds as the host material, and may include a phosphorescent material as a dopant material, such phosphorescent material including F₂Irpic, (F₂ppy)₂Ir(TMD), or Ir(dfppz)₃.

[0061] The second intermediate layer 223 may include ETL and / or EIL. When the first intermediate layer 221 and the emitter layer 222B comprise polymer materials, the second intermediate layer 223 may be omitted.

[0062] The second electrode 230 can be used as a semi-transparent metal layer. According to one embodiment, the second electrode 230 may include, for example, Ag and Mg. For example, the second electrode 230 may contain an Ag-Mg alloy in a greater amount of Ag than Mg. According to another embodiment, the second electrode 230 may include any one selected from magnesium (Mg), silver (Ag), lithium (Li), sodium (Na), calcium (Ca), strontium (Sr), and alloys thereof.

[0063] According to one embodiment, the thickness of the first masking pattern M1 may be greater than the sum of the thicknesses of the intermediate layer 220 and the second electrode 230. Therefore, the intermediate layer 220 and the second electrode 230 on the first pixel region P1 may be formed discontinuously with the intermediate layer 220 and the second electrode 230 on the first masking pattern M1.

[0064] refer to Figure 6 The first masking pattern M1 is removed by a stripping process. When the first masking pattern M1 is removed, the intermediate layer 220, which is patterned as an island, and the second electrode 230 remain on the first pixel region P1.

[0065] refer to Figure 7 The second masking pattern M2 is formed to cover pixel regions P1 and P3, excluding the second pixel region P2. The second masking pattern M2 may include a polymer material. However, the type of material of the second masking pattern M2 may be different in another embodiment, as long as the material is well soluble in a solvent during the stripping process described later and can reduce or minimize the impact on the intermediate layer 220.

[0066] refer to Figure 8Intermediate layer 220 and second electrode 230 are sequentially formed on substrate 100 on which second masking pattern M2 is provided. Intermediate layer 220 may include first intermediate layer 221, green emission layer 222G and second intermediate layer 223.

[0067] The first intermediate layer 221 may be formed as an HTL with a single-layer structure. According to another embodiment, the first intermediate layer 221 may include a HIL adjacent to the first electrode 210 and an HTL located on the HIL. The second intermediate layer 223 may include or omit an ETL and / or an EIL.

[0068] The emitting layer 222G may include anthracene derivatives or carbazole compounds as the host material, and may include phosphorescent materials as dopants, such as Ir(PPY)3 (planar tris(2-phenylpyridine)iridium). According to another embodiment, the emitting layer 222G may include a fluorescent material such as tris(8-hydroxyquinoline)aluminum (Alq3).

[0069] The second electrode 230 can be formed as a semi-transparent metal layer. According to one embodiment, the second electrode 230 may include, for example, Ag and Mg. For instance, the second electrode 230 may include an Ag-Mg alloy in which the amount of Ag is greater than the amount of Mg. According to another embodiment, the second electrode 230 may include any one selected from magnesium (Mg), silver (Ag), lithium (Li), sodium (Na), calcium (Ca), strontium (Sr), and alloys thereof.

[0070] According to one embodiment, the thickness of the second masking pattern M2 may be greater than the sum of the thicknesses of the intermediate layer 220 and the second electrode 230. Therefore, the intermediate layer 220 and the second electrode 230 on the second pixel region P2 may be formed discontinuously with the intermediate layer 220 and the second electrode 230 on the second masking pattern M2.

[0071] refer to Figure 9 The second masking pattern M2 can be removed by a stripping process. When the second masking pattern M2 is removed, the intermediate layer 220, which is patterned as an island, and the second electrode 230 remain on the second pixel region P2.

[0072] refer to Figure 10 The third masking pattern M3 is formed to cover pixel regions P1 and P2, excluding the third pixel region P3. The third masking pattern M3 may include a polymer material. However, the type of material of the third masking pattern M3 may be different in another embodiment, as long as the material is well soluble in a solvent during the stripping process described later and can reduce or minimize the impact on the intermediate layer 220.

[0073] refer to Figure 11Intermediate layer 220 and second electrode 230 are sequentially formed on substrate 100 on which third masking pattern M3 is provided. Intermediate layer 220 may include first intermediate layer 221, red emitting layer 222R and second intermediate layer 223.

[0074] The first intermediate layer 221 may be formed as an HTL with a single-layer structure. According to another embodiment, the first intermediate layer 221 may include a HIL adjacent to the first electrode 210 and an HTL located on the HIL. The second intermediate layer 223 may include or omit an ETL and / or an EIL.

[0075] The emitting layer 222R may include anthracene derivatives or carbazole compounds as the host material, and may include phosphorescent materials as dopants, the phosphorescent materials including one or more materials selected from the group consisting of PIQIr(acac) (bis(1-phenylisoquinoline)acetylacetone iridium), PQIr(acac) (bis(1-phenylquinoline)acetylacetone iridium), PQIr (tris(1-phenylquinoline)iridium), and PtPEP (octaethylporphyrin platinum). According to another embodiment, the emitting layer 222R may include fluorescent materials such as PED:Eu(DBM)3(Phen) or dinaphthalene-based phenylene oxide.

[0076] The second electrode 230 may be formed as a semi-transparent metal layer. According to some embodiments, the second electrode 230 may include, for example, Ag and Mg. For example, the second electrode 230 may include an Ag-Mg alloy in which the amount of Ag is greater than the amount of Mg. According to another embodiment, the second electrode 230 may include any one selected from magnesium (Mg), silver (Ag), lithium (Li), sodium (Na), calcium (Ca), strontium (Sr), and alloys thereof.

[0077] According to one embodiment, the thickness of the third masking pattern M3 may be greater than the sum of the thicknesses of the intermediate layer 220 and the second electrode 230. Therefore, the intermediate layer 220 and the second electrode 230 formed on the third pixel region P3 may be formed discontinuously from the intermediate layer 220 and the second electrode 230 formed on the third masking pattern M3.

[0078] refer to Figure 12 The third masking pattern M3 can be removed by a stripping process. When the third masking pattern M3 is removed, the intermediate layer 220, which is patterned as an island, and the second electrode 230 remain on the third pixel region P3.

[0079] refer to Figure 13A conductive protective layer 240 and a connecting electrode layer 250, which are integrally formed to cover pixel regions P1, P2 and P3, are formed on the intermediate layer 220 and the second electrode 230. The intermediate layer 220 and the second electrode 230 are patterned into island shapes in each of the pixel regions P1, P2 and P3.

[0080] The conductive protective layer 240 includes a transparent material that allows light emitted from the emitting layers 222B, 222G, and 222R to travel. For example, the conductive protective layer 240 may include oxides such as ITO, IZO, WOx, MoOx, and InOx, or conductive polymers such as PEDOT.

[0081] The connecting electrode layer 250 may be formed as a semi-transparent metal layer. According to one embodiment, the connecting electrode layer 250 may include, for example, Ag and Mg. For example, the connecting electrode layer 250 may include, for example, an Ag-Mg alloy in which the amount of Ag is greater than the amount of Mg. According to another embodiment, the connecting electrode layer 250 may include any one selected from magnesium (Mg), silver (Ag), lithium (Li), sodium (Na), calcium (Ca), strontium (Sr), and alloys thereof.

[0082] The thickness of the second electrode 230 and the connecting electrode layer 250 can be less than the thickness of the conductive protective layer 240.

[0083] The conductive protective layer 240 may have a thickness corresponding to the optical resonant distance of one of the pixel regions P1, P2, and P3. According to one embodiment, the conductive protective layer 240 may have a thickness corresponding to the optical resonant distance of blue light, so that a microcavity may be formed between the second electrode 230 in the first pixel region P1 and the connecting electrode layer 250.

[0084] For reference Figures 4 to 12 The intermediate layer 220 and the second electrode 230 of each of the pixel regions P1, P2, and P3 are formed by separate processes. Therefore, the thickness of the intermediate layer 220 and the second electrode 230 of each of the pixel regions P1, P2, and P3 can be formed independently. The thickness of the intermediate layer 220 and / or the second electrode 230 is formed differently in each of the pixel regions P1, P2, and P3. Therefore, the optical resonant distance corresponding to the color to be achieved in the corresponding pixel region can be formed in each of the pixel regions P1, P2, and P3.

[0085] According to a non-limiting embodiment, a first pixel region P1 with relatively low efficiency can achieve a first optical resonance distance between the second electrode 230 and the connecting electrode layer 250 by controlling the thickness of the conductive protective layer 240, and a second optical resonance distance and a third optical resonance distance respectively formed between the first electrode 210 and the second electrode 230 and between the first electrode 210 and the connecting electrode layer 250 can be achieved by controlling the thickness of the intermediate layer 220 and / or the second electrode 230. The second pixel region P2 and the third pixel region P3 can achieve optical resonance distances respectively between the first electrode 210 and the second electrode 230 and between the first electrode 210 and the connecting electrode layer 250 by controlling the thickness of the intermediate layer 220 and / or the second electrode 230 of each of the second pixel region P2 and the third pixel region P3.

[0086] Figure 14 A cross-sectional view of another embodiment of an organic light-emitting display device is shown. (Reference) Figure 14 The organic light-emitting display device may include a protective layer 260 on the connecting electrode layer 250. When the connecting electrode layer 250, which is formed as a semi-transparent metal layer, is exposed to oxygen during the manufacturing process of the organic light-emitting display device, its translucency may deteriorate due to oxidation. To prevent this, the organic light-emitting display device may include a protective layer 260 that may contain organic and / or inorganic materials with translucency.

[0087] Figure 15 A cross-sectional view of another embodiment of an organic light-emitting display device is shown. (Reference) Figure 15 The conductive protective layer 240' can be patterned into island shapes corresponding to each of the pixel regions P1, P2, and P3. The conductive protective layer 240' can be patterned together with the intermediate layer 220 and the second electrode 230, such that the intermediate layer 220, the second electrode 230, and the conductive protective layer 240' can have substantially the same pattern. Therefore, the stacked structure 200' including the first electrode 210, the intermediate layer 220, the second electrode 230, and the conductive protective layer 240' is located in each of the pixel regions P1, P2, and P3.

[0088] The intermediate layer 220, the second electrode 230, and the conductive protective layer 240' are patterned into island shapes corresponding to each of the pixel regions P1, P2, and P3. The connecting electrode layer 250 is formed integrally with respect to the pixel regions P1, P2, and P3. Therefore, a portion of the top surface of the pixel defining layer 180 between the pixel regions P1, P2, and P3 can be in direct contact with the connecting electrode layer 250.

[0089] Reference Figure 2In the described organic light-emitting display device, the conductive protective layer 240 is formed integrally with respect to pixel regions P1, P2, and P3. Therefore, the first optical resonant distance formed between the second electrode 230 and the connecting electrode layer 250 by adjusting the thickness of the conductive protective layer 240 can be determined taking into account the light emitted from one of the pixel regions P1, P2, and P3.

[0090] However, according to one or more embodiments of the organic light-emitting display device, the conductive protective layer 240' is patterned in each of the pixel regions P1, P2, and P3. Therefore, the thickness of the conductive protective layer 240' can be independently controlled in each of the pixel regions P1, P2, and P3. Thus, the optical resonant distance from the second electrode 230 to the connecting electrode layer 250 can be set by adjusting the thickness of the conductive protective layer 240' patterned corresponding to the corresponding pixel in each of the pixel regions P1, P2, and P3.

[0091] Figures 16 to 22 It shows the manufacturing process. Figure 15 Cross-sectional views of different stages of an embodiment of a method for an organic light-emitting display device.

[0092] refer to Figure 16 A first masking pattern M1 is formed on a substrate 100 on which the pixel circuit PC and the first electrode 210 are formed. The first masking pattern M1 covers pixel regions P2 and P3, excluding the first pixel region P1.

[0093] Intermediate layer 220, second electrode 230, and conductive protective layer 240' are sequentially formed on substrate 100 on which first masking pattern M1 is formed. Intermediate layer 220 may include first intermediate layer 221, blue light emitting layer 222B, and second intermediate layer 223. The specific construction of intermediate layer 220, second electrode 230, and conductive protective layer 240' may be the same as described above.

[0094] According to one embodiment, the thickness of the first masking pattern M1 may be greater than the sum of the thicknesses of the intermediate layer 220, the second electrode 230, and the conductive protective layer 240'. Therefore, the intermediate layer 220, the second electrode 230, and the conductive protective layer 240' on the first pixel region P1 may be formed discontinuously with the intermediate layer 220, the second electrode 230, and the conductive protective layer 240' formed on the first masking pattern M1.

[0095] refer to Figure 17 The first masking pattern M1 is removed by a stripping process. When the first masking pattern M1 is removed, the intermediate layer 220, the second electrode 230, and the conductive protective layer 240', which are patterned as islands, remain on the first pixel region P1.

[0096] refer to Figure 18 The second masking pattern M2 is formed to cover pixel regions P1 and P3, excluding the second pixel region P2. Subsequently, an intermediate layer 220, a second electrode 230, and a conductive protective layer 240' are sequentially formed on the substrate 100 on which the second masking pattern M2 is formed. The intermediate layer 220 may include a first intermediate layer 221, a green emitting layer 222G, and a second intermediate layer 223. The specific construction of the intermediate layer 220, the second electrode 230, and the conductive protective layer 240' can be the same as described above.

[0097] According to one embodiment, the thickness of the second masking pattern M2 can be greater than the sum of the thicknesses of the intermediate layer 220, the second electrode 230, and the conductive protective layer 240'. Therefore, the intermediate layer 220, the second electrode 230, and the conductive protective layer 240' on the second pixel region P2 can be formed discontinuously with the intermediate layer 220, the second electrode 230, and the conductive protective layer 240' formed on the second masking pattern M2.

[0098] refer to Figure 19 The second masking pattern M2 is removed by a stripping process. When the second masking pattern M2 is removed, the intermediate layer 220, the second electrode 230, and the conductive protective layer 240', which are patterned as islands, remain on the second pixel region P2.

[0099] refer to Figure 20 The third masking pattern M3 is formed to cover pixel regions P1 and P2, excluding the third pixel region P3. Subsequently, an intermediate layer 220, a second electrode 230, and a conductive protective layer 240' are sequentially formed on the substrate 100 on which the third masking pattern M3 is formed. The intermediate layer 220 may include a first intermediate layer 221, a red-emitting layer 222R, and a second intermediate layer 223. The specific construction of the intermediate layer 220, the second electrode 230, and the conductive protective layer 240' can be the same as described above.

[0100] According to one embodiment, the thickness of the third masking pattern M3 can be greater than the sum of the thicknesses of the intermediate layer 220, the second electrode 230, and the conductive protective layer 240'. Therefore, the intermediate layer 220, the second electrode 230, and the conductive protective layer 240' on the third pixel region P3 can be formed discontinuously with the intermediate layer 220, the second electrode 230, and the conductive protective layer 240' formed on the third masking pattern M3.

[0101] refer to Figure 21 The third masking pattern M3 is removed by a stripping process. When the third masking pattern M3 is removed, the intermediate layer 220, the second electrode 230, and the conductive protective layer 240', which are patterned as islands, remain on the third pixel region P3.

[0102] refer to Figure 22 A connection electrode layer 250, integrally formed to cover pixel regions P1, P2, and P3, is formed on the intermediate layer 220, the second electrode 230, and the conductive protective layer 240'. The connection electrode layer 250 is integrally formed for pixel regions P1, P2, and P3. Therefore, a portion of the top surface of the pixel defining layer 180 between pixel regions P1, P2, and P3 can directly contact the connection electrode layer 250.

[0103] According to the reference Figures 16 to 21 In the described process, the second electrode 230 is patterned while a conductive protective layer 240' is formed thereon, thereby effectively preventing the degradation of transmittance caused by the second electrode 230, which is formed as a semi-transparent metal layer during the stripping process or other processes, being exposed to oxygen and oxidized.

[0104] Since the intermediate layer 220, the second electrode 230, and the conductive protective layer 240' are patterned in each of the pixel regions P1, P2, and P3, the organic light-emitting display device according to this embodiment can individually set various resonant distances in each of the pixel regions P1, P2, and P3. For example, the thickness of the intermediate layer 220, the second electrode 230, and the conductive protective layer 240' can be independently set in each of the pixel regions P1, P2, and P3. For example, each of the pixel regions P1, P2, and P3 may include at least one of a first optical resonant distance from the second electrode 230 to the connecting electrode layer 250, a second optical resonant distance from the first electrode 210 to the second electrode 230, and a third optical resonant distance from the first electrode 210 to the connecting electrode layer 250.

[0105] Figure 23 A cross-sectional view of another embodiment of an organic light-emitting display device is shown. (Reference) Figure 23 The organic light-emitting display device may include a protective layer 260 formed on the connecting electrode layer 250. When the connecting electrode layer 250, which is formed as a semi-transparent metal layer, is exposed to oxygen during the manufacturing process of the organic light-emitting display device, its translucency may deteriorate due to oxidation of the connecting electrode layer 250. To prevent this, the organic light-emitting display device may include a protective layer 260 comprising organic and / or inorganic materials with translucency.

[0106] As described above, the light efficiency can be improved by using one or more organic light-emitting display devices and methods for manufacturing organic light-emitting display devices according to the above exemplary embodiments.

[0107] Example embodiments have been disclosed herein, and although specific terminology has been used, they are used and interpreted in a general and descriptive sense only and not for limiting purposes. In some cases, as will be apparent to those skilled in the art upon which this application is made, features, characteristics, and / or elements described in connection with particular embodiments may be used alone or in combination with features, characteristics, and / or elements described in connection with other embodiments, unless expressly stated otherwise. Therefore, those skilled in the art will understand that various changes in form and detail may be made without departing from the spirit and scope of the invention as set forth in the following claims.

Claims

1. A method for manufacturing an organic light-emitting display device, the method comprising: Prepare a substrate comprising a first pixel region and a second pixel region; The first electrodes, which are spaced apart from each other and respectively correspond to the first pixel region and the second pixel region, are patterned. A pixel defining layer is formed on the first electrode, the pixel defining layer including openings spaced apart from each other and overlapping the first electrode respectively; A first masking pattern is formed on the substrate, having an opening that exposes the first electrode corresponding to the first pixel region; Using the first masking pattern, an intermediate layer, a second electrode, and a conductive protective layer are formed on the substrate in the first pixel region; Remove the first masking pattern; A second masking pattern is formed on the substrate, having an opening that exposes the first electrode corresponding to the second pixel region; Using the second masking pattern, an intermediate layer, a second electrode, and a conductive protective layer are formed on the substrate in the second pixel region; Remove the second masking pattern; and A connection electrode layer is formed on the conductive protective layer, which is spaced apart from each other and corresponds to the first pixel region and the second pixel region respectively. The second electrode formed in the first pixel region and the second pixel region includes a semi-transparent metal layer, and the conductive protective layer formed in the first pixel region and the second pixel region includes a transparent material.

2. The method according to claim 1, wherein, The bottom surface of the second masking pattern contacts the upper surface of the conductive protective layer in the first pixel region.

3. The method of claim 1, wherein the thickness of the conductive protective layer in the first pixel region is greater than the thickness of the second electrode in the first pixel region.

4. The method of claim 1, wherein the distance between the edge of the first electrode and the edge of the second electrode in the first pixel region is greater than the distance between the first electrode and the second electrode corresponding to the opening in the first pixel region.

5. The method of claim 1, wherein the thickness of the conductive protective layer in the first pixel region is different from the thickness of the conductive protective layer in the second pixel region.

6. The method of claim 1, wherein the thickness of the intermediate layer in the first pixel region is different from the thickness of the intermediate layer in the second pixel region.

7. The method of claim 1, wherein the thickness of the second electrode in the first pixel region is different from the thickness of the second electrode in the second pixel region.

8. The method of claim 1, wherein each of the conductive protective layers in the first pixel region and the second pixel region comprises an oxide material or a conductive polymer.

9. The method of claim 1, wherein each of the second electrodes in the first pixel region and the second electrodes in the second pixel region comprises at least one selected from magnesium (Mg), silver (Ag), lithium (Li), sodium (Na), calcium (Ca), strontium (Sr) and alloys thereof.

10. The method of claim 1, further comprising: A protective layer is formed on the connecting electrode layer.

11. A method for manufacturing an organic light-emitting display device, the method comprising: Prepare a substrate comprising a first pixel region and a second pixel region; The first electrodes, which are spaced apart from each other and correspond to the first pixel region and the second pixel region of the substrate respectively, are patterned; A pixel defining layer is formed on the first electrode, the pixel defining layer including openings spaced apart from each other and overlapping the first electrode respectively; A first masking pattern is formed on the substrate, having an opening that exposes the first electrode corresponding to the first pixel region; Using the first masking pattern, an intermediate layer and a second electrode are formed on the substrate; Remove the first masking pattern; A second masking pattern is formed on the substrate, having an opening that exposes the first electrode corresponding to the second pixel region; Using the second masking pattern, an intermediate layer and a second electrode are formed on the substrate in the second pixel region; Remove the second masking pattern; A conductive protective layer is formed on the second electrodes, which are spaced apart from each other and correspond to the first pixel region and the second pixel region respectively. The second electrodes formed in the first pixel region and the second pixel region include a semi-transparent metal layer, and the conductive protective layer formed in the first pixel region and the second pixel region includes a transparent material; and A connecting electrode layer is formed on top of the conductive protective layer. The conductive protective layer is integrally formed with respect to the second electrode, the conductive protective layer has a thickness greater than the thickness of the second electrode in the first pixel region and each of the second electrodes in the second pixel region, and the thickness of the conductive protective layer is greater than the thickness of the connecting electrode layer.

12. The method according to claim 11, wherein, The bottom surface of the second masking pattern contacts the upper surface of the second electrode in the first pixel region.

13. The method of claim 11, wherein the distance between the edge of the first electrode and the edge of the second electrode in the first pixel region is greater than the distance between the first electrode and the second electrode corresponding to the opening in the first pixel region.

14. The method of claim 11, wherein the conductive protective layer has a thickness based on the optical resonance distance of light emitted from one of the first pixel region and the second pixel region.

15. The method of claim 11, wherein each of the conductive protective layers in the first pixel region and the second pixel region comprises an oxide material or a conductive polymer.

16. The method of claim 11, wherein each of the second electrodes in the first pixel region and the second electrode in the second pixel region comprises at least one selected from magnesium (Mg), silver (Ag), lithium (Li), sodium (Na), calcium (Ca), strontium (Sr) and alloys thereof.

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