An efficient etching liquid ammonia evaporation integrated reaction tank device

Abstract

The present invention discloses an efficient etching liquid ammonia evaporation integrated reaction tank device, which relates to the technical field of etching waste liquid recovery and reuse, including a reaction tank, a heating tube is arranged at the bottom of the inner cavity of the reaction tank, and multiple driving mechanisms are arranged on the top and inside of the reaction tank. The outer side of the multiple driving mechanism is sequentially arranged with a heat exchange condensation mechanism, a guide cover, an auxiliary driving mechanism and a multiple stirring mechanism from top to bottom, and a continuous feeding mechanism is fixedly nested at the bottom of the reaction tank. The present invention uses external etching waste liquid as a cooling medium, which can reduce the recovery cost and preheat the external etching waste liquid, thereby recovering excess heat while realizing continuous treatment, and can better stir the etching waste liquid, thereby allowing ammonia vapor to be discharged faster and improving the liquid ammonia recovery efficiency.

Description

Technical Field

[0001] The invention relates to the technical field of recycling and reusing etching waste liquid, and in particular to a high-efficiency etching liquid ammonia evaporation integrated reaction tank device. Background Art

[0002] In the production process of printed circuit boards, etching is a very important processing step. Etching refers to removing the unnecessary copper on the copper-clad substrate by chemical reaction with etching liquid, so that the required circuit pattern is formed on the surface of the copper-clad substrate. In order to reduce the production cost of printed circuit boards, manufacturers usually recycle and reuse the ammonia in the etching waste liquid.

[0003] In the prior art, when recovering ammonia in etching waste liquid, the etching waste liquid needs to be added to a recovery device first, and then the etching waste liquid is heated in the recovery device. At this time, the ammonia in the etching waste liquid is mixed with water to form ammonia vapor, which evaporates upward, and is then cooled by the condensing equipment at the top of the inner cavity of the recovery device to form liquid ammonia for recovery.

[0004] When the above-mentioned recovery device is actually used, a large amount of condensate is needed to cool the ammonia vapor, which results in a high actual recovery cost of liquid ammonia. At the same time, the heat in the ammonia vapor is wasted. In addition, the existing recovery device cannot continuously process the etching waste liquid, so that after each recovery process is completed, it is necessary to discharge and re-feed, and the actual processing efficiency is not ideal.

[0005] In addition, the stirring method for the etching waste liquid is relatively simple, which cannot better enable the ammonia vapor in the etching waste liquid to be discharged faster.

[0006] Therefore, it is necessary to invent an efficient etching liquid ammonia evaporation integrated reaction tank device to solve the above problems. Summary of the invention

[0007] The object of the present invention is to provide a high-efficiency etching liquid ammonia evaporation integrated reaction tank device to solve the problems raised in the above background technology.

[0008] To achieve the above-mentioned object, the present invention provides the following technical solutions: an efficient etching liquid ammonia evaporation integrated reaction tank device, comprising a reaction tank, a heating tube is arranged at the bottom of the inner cavity of the reaction tank, a multiple driving mechanism is arranged on the top and inside of the reaction tank, a heat exchange condensation mechanism, a flow guide cover, an auxiliary driving mechanism and a multiple stirring mechanism are arranged on the outside of the multiple driving mechanism from top to bottom, and a continuous feeding mechanism is fixedly nested at the bottom of the reaction tank;

[0009] The multi-drive mechanism comprises a drive motor, a drive shaft, a threaded sleeve, a rotating sleeve, a transverse shaft and a lifting sleeve;

[0010] The driving motor is fixedly arranged on the top of the reaction tank, the driving shaft is located inside the reaction tank and is drivingly connected to the driving motor, the threaded sleeve is sleeved on the outer bottom of the driving shaft and is drivingly connected to the driving shaft through a reciprocating thread, the rotating sleeve is rotatably sleeved on the outer side of the threaded sleeve through a bearing, two transverse shafts and two lifting sleeves are each provided, the two transverse shafts are respectively fixedly arranged on both sides of the rotating sleeve, and the two lifting sleeves are respectively fixedly arranged on the two ends of the transverse shaft;

[0011] The heat exchange condensation mechanism comprises an annular heat exchange shell, an etching waste liquid input pipe, an etching waste liquid output pipe, a threaded collar, an extension rod and a lifting ring;

[0012] The annular heat exchange shell is fixedly arranged on the top of the inner cavity of the reaction tank, the etching waste liquid input pipe is fixedly penetrated and arranged on the top of the right side of the annular heat exchange shell, and the etching waste liquid output pipe is fixedly penetrated and arranged on the bottom of the left side of the annular heat exchange shell. The threaded ring is sleeved on the outside of the drive shaft and is connected to the drive shaft through a reciprocating thread. There are multiple extension rods, and the multiple extension rods are evenly fixed on the outside of the threaded ring. The lifting ring is fixedly sleeved and arranged on the outside of multiple extension rods. The extension rods are evenly fixed with multiple sliding blocks, and the sliding blocks are slidably nested on the inner wall of the annular heat exchange shell.

[0013] Preferably, the auxiliary driving mechanism comprises a sliding rod, a connecting ring and a lifting sleeve;

[0014] There are two sliding rods, which are fixedly arranged on both sides of the bottom of the lifting ring respectively. The two sliding rods pass through both sides of the top of the air deflector respectively and are slidably connected to the air deflector. The connecting ring is fixedly arranged at the bottom ends of the two sliding rods, and the lifting sleeve is rotatably arranged on the inner side of the connecting ring through a bearing.

[0015] Preferably, the multiple stirring mechanism comprises an annular rotating seat, a driving top plate and two sets of stirring components, and the stirring components comprise a stirring main rod, an impeller, a longitudinal slide groove, a slide rod, a mounting collar, a stirring support rod and a spring;

[0016] The annular rotating seat is rotatably nested at the bottom of the inner cavity of the reaction tank through a bearing, the driving top plate is slidably nested at the outside of the driving shaft, the stirring main rod penetrates the driving top plate and is slidably connected to the driving top plate, the bottom end of the stirring main rod is rotatably nested at the top of the annular rotating seat through a bearing, the lifting sleeve is slidably sleeved at the outside of the stirring main rod, the impeller is fixedly sleeved at the bottom of the outside of the stirring main rod, the longitudinal slide groove is opened on the front of the stirring main rod, and multiple sliding rods, mounting rings, stirring support rods and springs are all provided, multiple sliding rods are evenly slidably arranged on the inner side of the longitudinal slide groove, multiple mounting rings are evenly slidably sleeved on the outside of the stirring main rod, and are respectively fixedly connected to multiple sliding rods, multiple stirring support rods are evenly fixedly arranged on both sides of multiple mounting rings, multiple springs are evenly sleeved on the outside of the stirring main rod, and any one of the springs is located between two adjacent mounting rings.

[0017] Preferably, the continuous feeding mechanism comprises a feeding shell, a feeding piston and a discharge pipe;

[0018] The feed shell is fixedly nested at the bottom of the reaction tank, the feed piston is slidably arranged inside the feed shell and fixedly connected to the threaded sleeve, a plurality of discharge pipes are arranged, and the plurality of discharge pipes are evenly fixed and penetrated through the outside of the feed shell, and a one-way valve is arranged on the discharge pipe and the etching waste liquid output pipe.

[0019] The present invention also provides a method for treating waste etching liquid from an efficient etching liquid ammonia evaporation integrated reaction tank device, which is characterized in that it specifically comprises the following steps:

[0020] S1. Adding etching waste liquid into the reaction tank through the pipe in the middle of the right side of the reaction tank, starting the heating tube to heat the etching waste liquid, and starting the driving motor at the same time. After the driving motor is started, it drives the driving shaft to rotate. When the driving shaft rotates, it drives the driving top plate to rotate continuously. When the driving top plate rotates, it drives the two stirring main rods to rotate with the driving shaft as the axis to stir the etching waste liquid;

[0021] S2. When the driving shaft rotates, the threaded sleeve repeatedly rises and falls, and drives the rotating sleeve to repeatedly rise and fall. When the threaded sleeve rises and falls, it drives the feed piston to repeatedly rise and fall inside the feed shell. At this time, the external etching waste liquid enters the annular heat exchange shell through the etching waste liquid input pipe under the suction action of the feed piston, and then enters the inside of the feed shell through the etching waste liquid output pipe. Finally, it is pushed by the feed piston and sprayed to the impeller through multiple discharge pipes, so that the impeller drives the stirring main rod to rotate continuously;

[0022] S3, the ammonia vapor quickly floats up under the stirring action and enters the inner side of the annular heat exchange shell under the guidance of the guide cover, and then exchanges heat with the etching waste liquid inside the annular heat exchange shell, and turns into liquid droplets attached to the inner wall of the annular heat exchange shell. At this time, the etching waste liquid inside the annular heat exchange shell is preheated;

[0023] S4, when the driving shaft rotates, it drives the threaded collar to repeatedly rise and fall. When the threaded collar is repeatedly raised and lowered, the threaded collar drives the lifting ring to repeatedly rise and fall on the inner side of the annular heat exchange shell through the threaded collar, so that the lifting ring pushes the liquid droplets attached to the inner wall of the annular heat exchange shell downward, and the liquid droplets flow to the top of the guide cover to be collected;

[0024] S5, when the rotating sleeve is repeatedly lifted and lowered, the lifting sleeve is driven to be repeatedly lifted and lowered through the horizontal axis, and the limit of the lowest mounting ring is released when the lifting sleeve is lifted and lowered, and the compressed spring is gradually reset, thereby driving multiple stirring support rods to be lifted and lowered at one time through multiple mounting rings;

[0025] S6, when the lifting ring is repeatedly lifted and lowered, the lifting sleeve is driven to be repeatedly lifted and lowered through the sliding rod and the connecting ring, and when the lifting sleeve is lifted and lowered, the driving top plate is driven to be repeatedly lifted and lowered, and when the driving top plate is lifted and lowered, the uppermost installation sleeve ring is pushed, so that the multiple installation sleeve rings drive the multiple stirring support rods to be lifted and lowered twice;

[0026] S7. When the impeller drives the stirring main rod to rotate, the stirring main rod drives the plurality of stirring support rods to rotate around the stirring main rod through the sliding rod and the mounting collar, so that the plurality of stirring support rods continuously stir the etching waste liquid during the revolution, rotation and lifting process;

[0027] S8. The liquid ammonia finally collected is discharged through the pipe on one side of the deflector, and the waste at the bottom of the inner cavity of the reaction tank is discharged through the pipe at the bottom of the right side of the reaction tank.

[0028] Technical effects and advantages of the present invention:

[0029] The present invention is provided with a multiple driving mechanism, a heat exchange condensation mechanism, an auxiliary driving mechanism, a multiple stirring mechanism and a continuous feeding mechanism, so that the continuous feeding mechanism is driven by the multiple driving mechanism, so that the continuous feeding mechanism sucks the external etching waste liquid. At this time, the external etching waste liquid passes through the heat exchange condensation mechanism and the continuous feeding mechanism and enters the reaction tank. The ammonia vapor generated in the reaction tank is liquefied by the heat exchange condensation mechanism, and the external etching waste liquid entering the reaction tank is also preheated. Then the multiple driving mechanism drives the heat exchange condensation mechanism, so that the liquid droplets on the heat exchange condensation mechanism are quickly separated, and the multiple stirring mechanism is driven by the auxiliary driving mechanism. At this time, the multiple stirring mechanism cooperates with the driving of the multiple driving mechanism and the continuous feeding mechanism, and stirs the etching waste liquid in all directions when it is driven by three times. Compared with the same type of device in the prior art, the present invention uses the external etching waste liquid as a cooling medium, reduces the recovery cost, and can preheat the external etching waste liquid, so that while realizing continuous treatment, the excess heat is recovered, and the etching waste liquid can be better stirred, so that the ammonia vapor is discharged faster, and the liquid ammonia recovery efficiency is improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 It is a schematic diagram of the overall front view structure of the present invention.

[0031] Figure 2 It is a schematic diagram of the overall front cross-sectional structure of the present invention.

[0032] Figure 3 It is a front cross-sectional structural schematic diagram of the heat exchange condensation mechanism and the auxiliary drive mechanism of the present invention.

[0033] Figure 4 It is a front cross-sectional structural schematic diagram of the continuous feeding mechanism of the present invention.

[0034] Figure 5 It is a front cross-sectional structural schematic diagram of the multiple stirring mechanism of the present invention.

[0035] In the figure: 1. reaction tank; 2. multiple driving mechanism; 21. driving motor; 22. driving shaft; 23. threaded sleeve; 24. rotating sleeve; 25. horizontal axis; 26. lifting sleeve; 3. heat exchange condensation mechanism; 31. annular heat exchange shell; 32. etching waste liquid input pipe; 33. etching waste liquid output pipe; 34. threaded collar; 35. extension rod; 36. lifting ring; 4. guide cover; 5. auxiliary driving mechanism; 51. sliding rod; 52. connecting ring; 53. lifting sleeve; 6. multiple stirring mechanism; 61. annular rotating seat; 62. driving top plate; 63. stirring main rod; 64. impeller; 65. longitudinal slide groove; 66. sliding rod; 67. mounting collar; 68. stirring support rod; 69. spring; 7. continuous feeding mechanism; 71. feeding shell; 72. feeding piston; 73. discharge pipe. DETAILED DESCRIPTION

[0036] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0037] Example 1

[0038] The present invention provides Figure 1-5 The shown embodiment is an integrated reaction tank device for ammonia evaporation of an efficient etching liquid, comprising a reaction tank 1, a heating tube being arranged at the bottom of the inner cavity of the reaction tank 1, a multiple driving mechanism 2 being arranged on the top and inside of the reaction tank 1, a heat exchange condensation mechanism 3, a flow guide cover 4, an auxiliary driving mechanism 5 and a multiple stirring mechanism 6 being arranged on the outside of the multiple driving mechanism 2 in sequence from top to bottom, and a continuous feeding mechanism 7 being fixedly nested at the bottom of the reaction tank 1.

[0039] like Figure 3 , Figure 4 and Figure 5 As shown, the multiple driving mechanism 2 includes a driving motor 21, a driving shaft 22, a threaded sleeve 23, a rotating sleeve 24, a transverse axis 25 and a lifting sleeve 26, wherein the driving motor 21 is fixedly arranged on the top of the reaction tank 1, the driving shaft 22 is located inside the reaction tank 1, and is transmission-connected to the driving motor 21, the threaded sleeve 23 is sleeved on the outer bottom of the driving shaft 22, and is transmission-connected to the driving shaft 22 through a reciprocating thread, the rotating sleeve 24 is rotationally sleeved on the outer side of the threaded sleeve 23 through a bearing, and two transverse axes 25 and two lifting sleeves 26 are each provided, and the two transverse axes 25 are respectively fixedly arranged on both sides of the rotating sleeve 24, and the two lifting sleeves 26 are respectively fixedly arranged at the ends of the two transverse axes 25.

[0040] By setting the above mechanism, the driving motor 21 can drive the driving shaft 22 to rotate and drive the threaded sleeve 23 to repeatedly rise and fall. When the threaded sleeve 23 is repeatedly raised and lowered, the lifting sleeve 26 is driven to repeatedly rise and fall by rotating the sleeve 24 and the horizontal axis 25.

[0041] like Figure 3As shown, the heat exchange condensation mechanism 3 includes an annular heat exchange shell 31, an etching waste liquid input pipe 32, an etching waste liquid output pipe 33, a threaded collar 34, an extension rod 35 and a lifting ring 36, wherein the annular heat exchange shell 31 is fixedly arranged on the top of the inner cavity of the reaction tank 1, the etching waste liquid input pipe 32 is fixedly penetrated and arranged on the right top of the annular heat exchange shell 31, and the etching waste liquid output pipe 33 is fixedly penetrated and arranged on the left bottom of the annular heat exchange shell 31. The threaded collar 34 is sleeved on the outside of the drive shaft 22 and is transmission-connected to the drive shaft 22 through a reciprocating thread. A plurality of extension rods 35 are provided, and the plurality of extension rods 35 are evenly fixedly arranged on the outside of the threaded collar 34. The lifting ring 36 is fixedly sleeved and arranged on the outside of the plurality of extension rods 35. The extension rod 35 is evenly fixedly provided with a plurality of sliding blocks, and the sliding blocks are slidably nested on the inner wall of the annular heat exchange shell 31.

[0042] like Figure 3 As shown, the auxiliary driving mechanism 5 includes a sliding rod 51, a connecting ring 52 and a lifting sleeve 53, wherein two sliding rods 51 are provided, and the two sliding rods 51 are respectively fixedly provided on both sides of the bottom of the lifting ring 36, and the two sliding rods 51 respectively penetrate both sides of the top of the air deflector 4, and are both slidably connected to the air deflector 4, the connecting ring 52 is fixedly provided at the bottom ends of the two sliding rods 51, and the lifting sleeve 53 is rotatably provided on the inner side of the connecting ring 52 through a bearing.

[0043] By setting the heat exchange condensation mechanism 3 and the auxiliary driving mechanism 5, the external etching waste liquid can enter the annular heat exchange shell 31 through the etching waste liquid input pipe 32, thereby cooling the ammonia vapor. At the same time, the threaded ring 34 is repeatedly lifted and lowered under the drive of the driving shaft 22. When the threaded ring 34 is lifted and lowered, the lifting ring 36 is repeatedly lifted and lowered through the extension rod 35. During the lifting process of the lifting ring 36, the liquid droplets on the inner wall of the annular heat exchange shell 31 are pushed and the sliding rod 51 is driven to lift and lower. When the sliding rod 51 is lifted and lowered, the lifting sleeve 53 is driven to lift and lower through the connecting ring 52.

[0044] like Figure 4 and Figure 5As shown, the multiple stirring mechanism 6 includes an annular rotating seat 61, a driving top plate 62 and two groups of stirring components, and the stirring components include a stirring main rod 63, an impeller 64, a longitudinal slide groove 65, a slide rod 66, a mounting collar 67, a stirring support rod 68 and a spring 69, wherein the annular rotating seat 61 is rotatably nested at the bottom of the inner cavity of the reaction tank 1 through a bearing, the driving top plate 62 is slidably nested at the outside of the driving shaft 22, the stirring main rod 63 penetrates the driving top plate 62 and is slidably connected to the driving top plate 62, the bottom end of the stirring main rod 63 is rotatably nested at the top of the annular rotating seat 61 through a bearing, and the lifting sleeve 26 is slidably sleeved on the stirring main rod 63 On the outside, the impeller 64 is fixedly sleeved and arranged on the bottom of the outside of the stirring main rod 63, the longitudinal slide groove 65 is opened on the front of the stirring main rod 63, and the sliding rod 66, the mounting ring 67, the stirring support rod 68 and the spring 69 are all provided in plurality. The plurality of sliding rods 66 are evenly slidably arranged on the inner side of the longitudinal slide groove 65, the plurality of mounting rings 67 are evenly slidably sleeved and arranged on the outside of the stirring main rod 63, and are respectively fixedly connected with the plurality of sliding rods 66, the plurality of stirring support rods 68 are evenly fixedly arranged on both sides of the plurality of mounting rings 67, the plurality of springs 69 are evenly sleeved and arranged on the outside of the stirring main rod 63, and any one of the springs 69 is located between two adjacent mounting rings 67.

[0045] By setting the above-mentioned mechanism, when the driving shaft 22 rotates, the multiple stirring main rods 63 are driven to rotate by driving the top plate 62. When the lifting sleeve 26 descends, the lifting sleeve 26 releases the limit on the lowest mounting ring 67. At this time, the compressed spring 69 is gradually reset, and then the multiple stirring support rods 68 are driven to rise and fall once through the multiple mounting rings 67. When the driving top plate 62 descends, the driving top plate 62 pushes the uppermost mounting ring 67 when it is lifted and lowered, so that the multiple mounting rings 67 drive the multiple stirring support rods 68 to rise and fall twice.

[0046] like Figure 4 As shown, the continuous feeding mechanism 7 includes a feeding shell 71, a feeding piston 72 and a discharge pipe 73, wherein the feeding shell 71 is fixedly nested at the bottom of the reaction tank 1, the feeding piston 72 is slidably arranged inside the feeding shell 71, and is fixedly connected to the threaded sleeve 23, and a plurality of the discharge pipes 73 are arranged, and the plurality of the discharge pipes 73 are evenly fixed and penetrated through the outside of the feeding shell 71, and a one-way valve is arranged on the discharge pipe 73 and the etching waste liquid output pipe 33.

[0047] By setting the above-mentioned mechanism, when the feed piston 72 is repeatedly raised and lowered, the external etching waste liquid is sucked through the etching waste liquid output pipe 33, and then the external etching waste liquid enters the feed shell 71 and is sprayed out through multiple discharge pipes 73. The sprayed liquid flow drives the stirring main rod 63 to rotate through the impeller 64.

[0048] Example 2

[0049] The present invention also provides a method for treating waste etching liquid from an efficient etching liquid ammonia evaporation integrated reaction tank device, which is characterized in that it specifically comprises the following steps:

[0050] S1, adding the etching waste liquid into the reaction tank 1 through the pipeline in the middle of the right side of the reaction tank 1, starting the heating tube to heat the etching waste liquid, and starting the driving motor 21 at the same time. After the driving motor 21 is started, it drives the driving shaft 22 to rotate, and when the driving shaft 22 rotates, it drives the driving top plate 62 to rotate continuously. When the driving top plate 62 rotates, it drives the two stirring main rods 63 to rotate with the driving shaft 22 as the axis, so as to stir the etching waste liquid;

[0051] S2, when the driving shaft 22 rotates, the threaded sleeve 23 repeatedly rises and falls, and drives the rotating sleeve 24 to repeatedly rise and fall. When the threaded sleeve 23 rises and falls, it drives the feed piston 72 to repeatedly rise and fall inside the feed shell 71. At this time, the external etching waste liquid enters the annular heat exchange shell 31 through the etching waste liquid input pipe 32 under the suction action of the feed piston 72, and then enters the inside of the feed shell 71 through the etching waste liquid output pipe 33. Finally, under the push of the feed piston 72, it is sprayed to the impeller 64 through multiple discharge pipes 73, so that the impeller 64 drives the stirring main rod 63 to rotate continuously;

[0052] S3, the ammonia vapor quickly floats up under the stirring action and enters the inner side of the annular heat exchange shell 31 under the guidance of the flow guide cover 4, and then exchanges heat with the etching waste liquid inside the annular heat exchange shell 31, and turns into liquid droplets attached to the inner wall of the annular heat exchange shell 31, at this time, the etching waste liquid inside the annular heat exchange shell 31 is preheated;

[0053] S4, when the driving shaft 22 rotates, it drives the threaded collar 34 to repeatedly rise and fall. When the threaded collar 34 repeatedly rises and falls, the threaded collar 34 drives the lifting ring 36 to repeatedly rise and fall on the inner side of the annular heat exchange shell 31, so that the lifting ring 36 pushes the liquid droplets attached to the inner wall of the annular heat exchange shell 31 downward, and the liquid droplets flow to the top of the guide cover 4 to be collected;

[0054] S5, when the rotating sleeve 24 is repeatedly lifted and lowered, the lifting sleeve 26 is driven to be repeatedly lifted and lowered through the horizontal shaft 25. When the lifting sleeve 26 is lifted and lowered, the limit of the lowest mounting ring 67 is released, and the compressed spring 69 is gradually reset, and then the multiple stirring support rods 68 are driven to be lifted and lowered at one time through the multiple mounting rings 67;

[0055] S6, when the lifting ring 36 is repeatedly lifted and lowered, the lifting sleeve 53 is driven to be repeatedly lifted and lowered through the sliding rod 51 and the connecting ring 52, and when the lifting sleeve 53 is lifted and lowered, the driving top plate 62 is driven to be repeatedly lifted and lowered, and when the driving top plate 62 is lifted and lowered, the uppermost mounting sleeve 67 is pushed, so that the multiple mounting sleeves 67 drive the multiple stirring support rods 68 to be lifted and lowered for the second time;

[0056] S7, when the impeller 64 drives the stirring main rod 63 to rotate, the stirring main rod 63 drives the plurality of stirring support rods 68 to rotate around the stirring main rod 63 as the axis through the sliding rod 66 and the mounting collar 67, so that the plurality of stirring support rods 68 continuously stir the etching waste liquid during the revolution, rotation and lifting process;

[0057] S8. The liquid ammonia finally collected is discharged through the pipe on one side of the deflector 4, and the waste at the bottom of the inner cavity of the reaction tank 1 is discharged through the pipe at the bottom of the right side of the reaction tank 1.

[0058] Finally, it should be noted that the above is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, it is still possible for those skilled in the art to modify the technical solutions described in the aforementioned embodiments or to make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A high-efficiency etching liquid ammonia evaporation integrated reaction tank device, comprising a reaction tank (1), wherein a heating tube is arranged at the bottom of the inner cavity of the reaction tank (1). Features: The top and the interior of the reaction tank (1) are provided with a multiple driving mechanism (2); the outer side of the multiple driving mechanism (2) is provided with a heat exchange condensation mechanism (3), a flow guide cover (4), an auxiliary driving mechanism (5) and a multiple stirring mechanism (6) in order from top to bottom; and the bottom of the reaction tank (1) is provided with a continuous feeding mechanism (7) fixedly nested therein; The multi-drive mechanism (2) comprises a drive motor (21), a drive shaft (22), a threaded sleeve (23), a rotating sleeve (24), a transverse shaft (25), and a lifting sleeve (26); The driving motor (21) is fixedly arranged on the top of the reaction tank (1); the driving shaft (22) is located inside the reaction tank (1) and is drivingly connected to the driving motor (21); the threaded sleeve (23) is sleeved on the outer bottom of the driving shaft (22) and is drivingly connected to the driving shaft (22) via a reciprocating thread; the rotating sleeve (24) is rotatably sleeved on the outer side of the threaded sleeve (23) via a bearing; two transverse shafts (25) and two lifting sleeves (26) are each provided; the two transverse shafts (25) are respectively fixedly arranged on both sides of the rotating sleeve (24); and the two lifting sleeves (26) are respectively fixedly arranged on the ends of the two transverse shafts (25); The heat exchange condensation mechanism (3) comprises an annular heat exchange shell (31), an etching waste liquid input pipe (32), an etching waste liquid output pipe (33), a threaded collar (34), an extension rod (35) and a lifting ring (36); The annular heat exchange shell (31) is fixedly arranged on the top of the inner cavity of the reaction tank (1); the etching waste liquid input pipe (32) is fixedly arranged through the top of the right side of the annular heat exchange shell (31); the etching waste liquid output pipe (33) is fixedly arranged through the bottom of the left side of the annular heat exchange shell (31); the threaded collar (34) is sleeved on the outside of the drive shaft (22) and is transmission-connected to the drive shaft (22) through a reciprocating thread; a plurality of extension rods (35) are provided, and the plurality of extension rods (35) are uniformly fixedly arranged on the outside of the threaded collar (34); the lifting ring (36) is fixedly sleeved on the outside of the plurality of extension rods (35); the extension rods (35) are uniformly fixedly arranged with a plurality of sliding blocks, and the sliding blocks are slidably nested on the inner wall of the annular heat exchange shell (31).

2. According to claim 1, a high-efficiency etching liquid ammonia evaporation integrated reaction tank device, Features: The auxiliary drive mechanism (5) comprises a sliding rod (51), a connecting ring (52) and a lifting sleeve (53); Two sliding rods (51) are provided, and the two sliding rods (51) are respectively fixedly provided at two sides of the bottom of the lifting ring (36), and the two sliding rods (51) respectively penetrate two sides of the top of the air deflector (4) and are both slidably connected to the air deflector (4). The connecting ring (52) is fixedly provided at the bottom ends of the two sliding rods (51), and the lifting sleeve (53) is rotatably provided on the inner side of the connecting ring (52) via a bearing.

3. According to claim 2, a high-efficiency etching liquid ammonia evaporation integrated reaction tank device, Features: The multiple stirring mechanism (6) comprises an annular rotating seat (61), a driving top plate (62) and two sets of stirring components, wherein the stirring components comprise a stirring main rod (63), an impeller (64), a longitudinal slide groove (65), a slide rod (66), a mounting collar (67), a stirring support rod (68) and a spring (69); The annular rotating seat (61) is rotatably nested in the bottom of the inner cavity of the reaction tank (1) through a bearing, the driving top plate (62) is slidably nested on the outside of the driving shaft (22), the stirring main rod (63) penetrates the driving top plate (62) and is slidably connected to the driving top plate (62), the bottom end of the stirring main rod (63) is rotatably nested in the top of the annular rotating seat (61) through a bearing, the lifting sleeve (26) is slidably sleeved on the outside of the stirring main rod (63), the impeller (64) is fixedly sleeved on the outside bottom of the stirring main rod (63), and the longitudinal slide groove (65) is opened at the front of the stirring main rod (63). The sliding rod (66), the mounting collar (67), the stirring support rod (68) and the spring (69) are all provided in plurality, the sliding rods (66) are evenly slidably arranged on the inner side of the longitudinal slide groove (65), the mounting collars (67) are evenly slidably sleeved on the outer side of the stirring main rod (63) and are respectively fixedly connected to the sliding rods (66), the stirring support rods (68) are evenly fixedly arranged on both sides of the mounting collars (67), the springs (69) are evenly sleeved on the outer side of the stirring main rod (63), and any one of the springs (69) is located between two adjacent mounting collars (67).

4. According to claim 3, a high-efficiency etching liquid ammonia evaporation integrated reaction tank device, Features: The continuous feeding mechanism (7) comprises a feeding shell (71), a feeding piston (72) and a discharge pipe (73); The feed shell (71) is fixedly nested at the bottom of the reaction tank (1), the feed piston (72) is slidably arranged inside the feed shell (71) and fixedly connected to the threaded sleeve (23), a plurality of discharge pipes (73) are provided, and the plurality of discharge pipes (73) are evenly fixed and penetrated outside the feed shell (71), and both the discharge pipe (73) and the etching waste liquid output pipe (33) are provided with a one-way valve.

5. A method for treating etching waste liquid according to any one of claims 1 to 4, It is characterized in that The specific steps include: S1, adding etching waste liquid into the reaction tank (1) through the pipe in the middle of the right side of the reaction tank (1), starting the heating tube to heat the etching waste liquid, and starting the driving motor (21) at the same time. After the driving motor (21) is started, it drives the driving shaft (22) to rotate. When the driving shaft (22) rotates, it drives the driving top plate (62) to rotate continuously. When the driving top plate (62) rotates, it drives two stirring main rods (63) to rotate with the driving shaft (22) as the axis, so as to stir the etching waste liquid; S2, when the driving shaft (22) rotates, the threaded sleeve (23) repeatedly rises and falls, and drives the rotating sleeve (24) to repeatedly rise and fall. When the threaded sleeve (23) rises and falls, it drives the feed piston (72) to repeatedly rise and fall inside the feed shell (71). At this time, the etching waste liquid from the outside enters the annular heat exchange shell (31) through the etching waste liquid input pipe (32) under the suction action of the feed piston (72), and then enters the inside of the feed shell (71) through the etching waste liquid output pipe (33). Finally, under the push of the feed piston (72), the waste liquid is sprayed toward the impeller (64) through the multiple discharge pipes (73), so that the impeller (64) drives the stirring main rod (63) to rotate continuously; S3, the ammonia vapor quickly floats up under the stirring action and enters the inner side of the annular heat exchange shell (31) under the guidance of the flow guide cover (4), then exchanges heat with the etching waste liquid inside the annular heat exchange shell (31), and turns into liquid droplets and adheres to the inner wall of the annular heat exchange shell (31), at which time the etching waste liquid inside the annular heat exchange shell (31) is preheated; S4, when the driving shaft (22) rotates, the threaded collar (34) is driven to repeatedly rise and fall, and when the threaded collar (34) is repeatedly raised and lowered, the threaded collar (34) drives the lifting ring (36) to repeatedly rise and fall on the inner side of the annular heat exchange shell (31), thereby causing the lifting ring (36) to push the liquid droplets attached to the inner wall of the annular heat exchange shell (31) downward, and the liquid droplets flow to the top of the guide cover (4) to be collected; S5, when the rotating sleeve (24) is repeatedly raised and lowered, the lifting sleeve (26) is driven to be repeatedly raised and lowered through the horizontal shaft (25), and when the lifting sleeve (26) is raised and lowered, the limit of the lowest mounting ring (67) is released, and at this time, the compressed spring (69) is gradually reset, thereby driving the multiple stirring support rods (68) to be raised and lowered at one time through the multiple mounting rings (67); S6, when the lifting ring (36) is repeatedly lifted and lowered, the lifting sleeve (53) is driven to be repeatedly lifted and lowered through the sliding rod (51) and the connecting ring (52), and when the lifting sleeve (53) is lifted and lowered, the driving top plate (62) is driven to be repeatedly lifted and lowered, and when the driving top plate (62) is lifted and lowered, the uppermost mounting sleeve ring (67) is pushed, so that the plurality of mounting sleeve rings (67) drive the plurality of stirring support rods (68) to be lifted and lowered for a second time; S7, when the impeller (64) drives the stirring main rod (63) to rotate, the stirring main rod (63) drives the plurality of stirring support rods (68) to rotate around the stirring main rod (63) as the axis through the sliding rod (66) and the mounting collar (67), so that the plurality of stirring support rods (68) continuously stir the etching waste liquid during the revolution, rotation and lifting process; S8. The liquid ammonia finally collected is discharged through the pipe on one side of the deflector (4), and the waste at the bottom of the inner cavity of the reaction tank (1) is discharged through the pipe at the bottom of the right side of the reaction tank (1).

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