A rust-proof treatment process for plate surface

Abstract

The present invention relates to a rust-proof treatment process for the surface of a plate in the field of galvanized plates. The process first uses an etching device to etch the surface of the plate; then washes the plate and then performs galvanizing treatment; then uses an embossing device to perform embossing treatment on both sides of the galvanized plate; sprays the plate with a nanoparticle solution, and then uses a passivating agent spray to passivate the plate; and finally coats an organic film on the passivation layer. Effective protection of the galvanized layer is achieved. The interaction force between the galvanized layer and the plate is enhanced by etching treatment before galvanizing, and after the plate is galvanized, a passivation protective layer with nanoparticles is formed on the surface of the plate, which effectively protects the galvanized layer.

Description

Technical Field

[0001] The invention relates to a plate surface anti-rust treatment process, in particular to a plate surface anti-rust treatment process applied to the field of galvanized plates. Background Art

[0002] Galvanized sheet has attracted much attention for its excellent anti-rust ability. Its surface is covered with a uniform zinc layer, which is not only beautiful, but also effectively isolates the steel sheet from the outside world and prevents moisture and oxygen in the air from corroding the steel sheet. This special anti-corrosion treatment allows the galvanized sheet to maintain long-term durability in harsh environments such as humidity and rain, and is not easy to rust or corrode. Therefore, galvanized sheet is widely used in many fields such as construction, home appliances, and automobiles, and its excellent anti-rust performance and long-term durability have been widely recognized and praised.

[0003] When manufacturing galvanized sheets, it is often necessary to coat the sheets. Such coated galvanized sheets do not cause deterioration of the working environment on the user side; in recent years, from the perspective of cost reduction, environmental protection measures and rationalization of coating operations, even for the coating of the quality assurance side that requires the appearance design of the coated sheet, it is required to reduce the film thickness (thin film).

[0004] In order to solve the problem of rust prevention of sheet metal, a certain sheet metal processing process in the market adopts a paint protection design, which has a certain market share.

[0005] The specification of Chinese invention patent CN109530120B discloses a steel plate anti-rust treatment device, including a first sliding mechanism, a first paint spraying mechanism, a second paint spraying mechanism, a connecting plate, a second sliding mechanism and a grinding mechanism; the surfaces of the fixed plate and the supporting plate are relatively slidably connected to the first clamping plate and the second clamping plate, and the sides of the first clamping plate and the second clamping plate are respectively "Y"-shaped and inverted "Y"-shaped, so that the steel plate slides inside the first steel plate groove and the second steel plate groove, and the steel plate cooperates with the first sliding mechanism and the second sliding mechanism to move relative to each other when sliding inside the first clamping plate and the second clamping plate, thereby achieving that steel plates of different widths can slide inside the first clamping plate and cooperate with the first paint spraying mechanism and the second paint spraying mechanism to paint the sides of the steel plates, thereby increasing the service life of the steel plates and preventing the steel plates from rusting.

[0006] The coating thickness on the existing plate is reduced, which easily reduces the protective effect of the plate surface, and the surface coating is easily scratched, exposing the anti-rust layer, which easily accelerates the failure of the anti-rust layer. Summary of the invention

[0007] In view of the above-mentioned prior art, the technical problem to be solved by the present invention is that the thickness of the coating on the existing plate is thinned, which easily reduces the protective effect of the plate surface, and the surface coating is easily scratched, exposing the anti-rust layer, which easily accelerates the failure of the anti-rust layer.

[0008] In order to solve the above problems, the present invention provides a plate surface rust prevention treatment process, and the specific process flow includes:

[0009] S1, firstly, etching the surface of the plate using an etching device; the specific steps of the etching process are: firstly, coating the plate with an etching liquid, then baking the plate, and finally etching using the etching device;

[0010] S2, after cleaning the plate, galvanizing is performed to form a galvanized film on the surface of the plate;

[0011] S3, then using an embossing device to emboss the galvanized film on both sides of the galvanized sheet; the embossing is performed to calibrate the sheet positioning so that the embossing position matches the etching groove position, and the embossing depth matches the etching groove depth;

[0012] S4, spraying the plate with a nanoparticle solution, and then passivating the plate with a passivating agent spray;

[0013] S5, finally coating an organic film on the passivation layer.

[0014] In the above-mentioned plate surface anti-rust treatment process, after the plate is galvanized, a passivation protective layer with nanoparticles is formed on the surface of the plate, which effectively protects the galvanized layer.

[0015] As a further improvement of the present application, the organic film is a phosphate film, and the thickness of the phosphate film is 2.0-10.0 μm.

[0016] As a further improvement of the present application, the embossing device includes an installation box installed on the electric guide rail, in which an electric push rod and a hydraulic device are installed, an embossing mechanism is fixedly connected to the power output end of the electric push rod, the embossing mechanism includes a mounting beam, a fixing plate is fixedly connected to the bottom end of the mounting beam, a plurality of evenly distributed strip tool holders are fixedly connected to the fixing plate, an embossing tool head is clamped on the bottom end of the strip tool holder, a leveling frame is fixedly connected to the power output end of the hydraulic device, the leveling frame includes a main body bracket, a leveling plate is fixedly connected to the bottom end of the main body bracket, and a plurality of through holes matching the strip tool holder are opened on the leveling plate.

[0017] As a further improvement of the present application, the nanoparticle solution includes nano titanium dioxide particles, an impurity remover and deionized water, the concentration of the nano titanium dioxide particles is 0.5-1 g / L, and the particle size of the nano titanium dioxide particles is 20-50 nanometers.

[0018] As another improvement of the present application, the etching grooves are arranged at equal intervals, the interval between two adjacent etching grooves is 2-5 mm, and the interval between the through holes matches the interval between the etching grooves.

[0019] As another improvement of the present application, a conveying device for conveying the plate is arranged at the lower side of the embossing device, and a calibration baffle is installed on the conveying device. The calibration baffle includes a strip plate, and lifting frames are installed at both ends of the strip plate. A pressure sensing film is laid on the strip plate.

[0020] As another improved supplement of the present application, a control system is also included, the control system includes a processor, an image acquisition device is installed on the output end of the etching device, the calibration baffle, the image acquisition device, the electric guide rail, the electric push rod and the hydraulic device are all electrically connected to the processor, and the processor is connected to an image analysis module, a data acquisition module and a control module;

[0021] The data acquisition module is used to collect the pressure data of the calibration baffle and the image data collected by the image acquisition module; the image analysis module is used to process and analyze the image data.

[0022] As another improvement of the present application, during the embossing process, the conveying device transports the plate forward until it contacts the calibration baffle. When the pressure sensing membrane detects the pressure applied by the plate, the processor analyzes and obtains the distance between the etching groove near the plate and the boundary of the plate based on the plate image collected at the end of the etching process, and then drives the electric guide rail to move the installation box according to the distance value, so that the embossing tool head close to the calibration baffle is aligned with the middle of the etching groove, and then drives the embossing mechanism to press down to emboss the plate. After the embossing is completed, the embossing mechanism is reset, and at this time the leveling frame is driven to be pressed down as a whole to flatten the galvanized film as a whole.

[0023] In summary, the galvanized layer can be effectively protected. The interaction force between the galvanized layer and the sheet can be enhanced by etching before galvanizing. After the sheet is galvanized, a passivation protective layer with nanoparticles is formed on the surface of the sheet, which effectively protects the galvanized layer. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 This is a process flow chart for the first and second embodiments;

[0025] Figure 2 A three-dimensional diagram of an embossing device according to the first and second embodiments;

[0026] Figure 3 It is a partial side view of the embossing device of the first and second embodiments when working;

[0027] Figure 4 for Figure 3 The structural diagram at A in the middle;

[0028] Figure 5 It is a cross-sectional view of the embossing device of the first and second embodiments;

[0029] Figure 6It is a partial cross-sectional view of the plate after being processed in the first and second embodiments;

[0030] Figure 7 Schematic diagram of structural changes during the plate processing process of the first and second implementation modes.

[0031] Description of the numbers in the figure:

[0032] 1 installation box, 2 electric push rod, 3 hydraulic device, 4 embossing mechanism, 401 installation beam, 402 fixing plate, 403 strip tool holder, 5 leveling frame, 501 main support, 502 leveling plate, 6 embossing tool head, 7 calibration baffle, 701 strip plate, 702 lifting frame. DETAILED DESCRIPTION

[0033] The following describes two implementation modes of the present application in detail with reference to the accompanying drawings.

[0034] The first implementation method:

[0035] Figure 1-7 A process for rust prevention treatment of plate surface is shown, and its specific process flow includes:

[0036] S1, firstly, use an etching device to etch the surface of the plate, so that etching grooves arranged at equal intervals are formed on the surface of the plate, the etching grooves are arranged at equal intervals, and the spacing between two adjacent etching grooves is 2-5 mm;

[0037] The specific steps of the etching treatment are: firstly, the plate is coated with an etching liquid by an etchant, then the plate is baked, and finally, an etching device is used for etching, so as to further ensure that etching grooves of a certain width are formed on the plate at equal intervals;

[0038] S2, after cleaning the plate, galvanizing is performed to form a galvanized film on the surface of the plate. The galvanizing process of this scheme uses the existing technology and is not described in detail in this scheme. The specific steps and operations of galvanizing do not belong to the protection scope of this scheme;

[0039] S3, after the galvanizing treatment, the galvanized film on both sides of the galvanized sheet is embossed using an embossing device; the specific steps of the embossing treatment are: embossing to calibrate the positioning of the sheet, when the conveying device transports the sheet forward to contact the calibration baffle 7, and the pressure sensing film 703 detects the pressure applied by the sheet, the processor analyzes and obtains the spacing between the etching groove near the sheet and the sheet boundary according to the sheet image collected at the end of the etching process, and then drives the electric guide rail to move the installation box 1 according to the spacing value, so that the embossing knife head 6 near the calibration baffle 7 is aligned with the middle of the etching groove, and then drives the embossing mechanism 4 to press down to emboss the sheet, and after the embossing is completed, the embossing mechanism 4 is reset, and at this time, the leveling frame 5 is driven to be pressed down as a whole to flatten the galvanized film as a whole;

[0040] The embossing position matches the etching groove position, and the embossing depth matches the etching groove depth. By setting the embossing at the etching groove, it is ensured that the embossing has a sufficient depth so that sufficient nanoparticles can be accommodated in the embossing.

[0041] S4, spraying the plate with a nanoparticle solution (the nanoparticle solution includes nano-titanium dioxide particles, an impurity remover and deionized water, the concentration of the nano-titanium dioxide particles is 0.5-1g / L, the particle size of the nano-titanium dioxide particles is 20-50 nanometers, and the nano-titanium dioxide particles are used to improve the stability of the galvanized plate), and then passivating the plate with a passivating agent spray;

[0042] S5, finally coating an organic film on the passivation layer, the organic film is a phosphate film, and the thickness of the phosphate film is 2.0-10.0 μm.

[0043] In this embodiment, by embossing at the etching groove position, tiny concave and convex structures are formed, which increase the contact area between the coating and the plate, thereby significantly enhancing the adhesion between the coating and the galvanized plate. This enhanced adhesion helps to ensure that the coating is not easy to fall off or peel off during long-term use.

[0044] Due to the equidistant arrangement of the etching grooves, the embossing process can be carried out precisely according to the position and depth of the etching grooves, thus ensuring a more uniform distribution of the coating on the surface of the sheet.

[0045] The grooves formed by the embossing process can accommodate more nanoparticles, especially when spraying the nanoparticle solution, these grooves can serve as "containers" for the nanoparticles, making the distribution of nanoparticles on the surface of the sheet more dense and uniform. This optimized distribution helps to improve the stability and corrosion resistance of the galvanized sheet.

[0046] Since the position of the etching groove is known, the plate positioning and calibration system can accurately find the position of the etching groove during embossing and perform the corresponding embossing. The accuracy of this positioning and calibration helps to improve the efficiency and accuracy of the entire processing process.

[0047] In summary, in the surface coating treatment process of galvanized sheet, the advantages of setting the embossing treatment at the etching groove position are mainly reflected in enhancing coating adhesion, improving coating uniformity, optimizing nanoparticle distribution, improving sheet performance, and facilitating positioning and calibration. These advantages make this treatment process have important application value in manufacturing high-quality galvanized sheet products.

[0048] Second implementation method:

[0049] Figure 2-5As shown, the embossing device includes an installation box 1 installed on an electric guide rail, an electric push rod 2 and a hydraulic device 3 are installed in the installation box 1, an embossing mechanism 4 is fixedly connected to the power output end of the electric push rod 2, the embossing mechanism 4 includes a mounting beam 401, a fixing plate 402 is fixedly connected to the bottom end of the mounting beam 401, a plurality of evenly distributed strip tool holders 403 are fixedly connected to the fixing plate 402, an embossing cutter head 6 is clamped at the bottom end of the strip tool holder 403, a leveling frame 5 is fixedly connected to the power output end of the hydraulic device 3, the leveling frame 5 includes a main support 501, a leveling plate 502 is fixedly connected to the bottom end of the main support 501, a plurality of through holes matching the strip tool holder 403 are opened on the leveling plate 502, and the spacing of the through holes matches the spacing of the etching grooves;

[0050] The galvanized sheet is surface treated by an embossing device, so that an embossing matching the position of the etching groove can be formed on the galvanized sheet, ensuring that a sufficient amount of nanoparticles can cover the galvanized film without affecting the thickness of the film layer. A conveying device for conveying the sheet is arranged at the lower side of the embossing device, and a calibration baffle 7 is installed on the conveying device. The calibration baffle 7 includes a strip plate 701, and lifting frames 702 are installed at both ends of the strip plate 701. A pressure sensing film 703 is laid on the strip plate 701. The conveyed sheet is further detected by the pressure sensing film 703, so that the installation box 1 can adjust the position of the installation box 1 based on the collected image of the sheet after etching and with the strip plate 701 as the reference position, so that the embossing tool head 6 is aligned with the etching groove.

[0051] The present solution also includes a control system, which includes a processor, an image acquisition device is installed on the output end of the etching device, the calibration baffle 7, the image acquisition device, the electric guide rail, the electric push rod 2 and the hydraulic device 3 are all electrically connected to the processor, and the processor is connected to an image analysis module, a data acquisition module and a control module;

[0052] The data acquisition module is used to collect the pressure data of the calibration baffle 7 and the image data acquired by the image acquisition module; the image analysis module is used to process and analyze the image data.

[0053] The embossing device of this embodiment realizes automated and precise operation, and significantly improves the efficiency and accuracy of the surface treatment of the galvanized sheet.

[0054] First, the image of the plate after etching is collected in real time by an image acquisition device, and the image data is transmitted to the processor, and processed and analyzed by the image analysis module to obtain the specific position and depth information of the etching groove, so as to adjust the position of the embossing tool head 6 and the embossing depth;

[0055] When the plate moves forward through the conveyor, when the plate contacts the calibration baffle, the pressure sensing film 703 detects the pressure applied by the plate and transmits the pressure data to the data acquisition module; the processor accurately calculates the distance between the etching groove of the plate and the boundary of the plate based on the plate image collected at the end of the etching process and the pressure data;

[0056] Then, the processor drives the electric guide rail through the control module to adjust the position of the installation box to ensure that the embossing knife head is accurately aligned with the middle of the etching groove. Once the position alignment is completed, the electric push rod will drive the embossing mechanism to press down and emboss the plate. After the embossing is completed, the embossing mechanism is reset, and the hydraulic device drives the leveling frame to press down as a whole to flatten the galvanized film as a whole, ensuring the flatness and uniformity of the coating.

[0057] Throughout the process, the control system ensures the accuracy and consistency of the embossing process through precise data acquisition, image analysis and position adjustment. This not only improves the performance of the galvanized sheet, but also enhances the adhesion between the coating and the sheet, making the galvanized sheet product have better stability and corrosion resistance.

[0058] The embossing device and control system of this embodiment have important application value in the surface coating treatment process of galvanized sheet. Through accurate data acquisition, image analysis and position adjustment, they realize the automation and precision treatment of the sheet, and improve the quality and performance of the product. At the same time, they also improve the efficiency and precision of the treatment by optimizing the structure and function of the device, and provide strong support for the manufacture of high-quality galvanized sheet products.

[0059] In summary, this solution can achieve effective protection for the galvanized layer. Through etching treatment before galvanizing, the interaction force between the galvanized layer and the sheet is enhanced. After the sheet is galvanized, a passivation protective layer with nanoparticles is formed on the surface of the sheet, which effectively protects the galvanized layer.

[0060] In view of current practical needs, the above-mentioned implementation mode adopted in this application is not limited to the scope of protection. Various changes made within the knowledge scope of technical personnel in this field without departing from the concept of this application still fall within the scope of protection of the present invention.

Claims

1. A process for rust prevention of plate surface, characterized in that: The specific process includes: S1, firstly, etching the surface of the plate using an etching device; the specific steps of the etching process are: firstly, coating the plate with an etching liquid, then baking the plate, and finally etching using the etching device; S2, after cleaning the plate, galvanizing is performed to form a galvanized film on the surface of the plate; S3, then using an embossing device to emboss the galvanized film on both sides of the galvanized sheet; the embossing is performed to calibrate the sheet positioning so that the embossing position matches the etching groove position, and the embossing depth matches the etching groove depth; The embossing device comprises a mounting box (1) mounted on an electric guide rail, wherein an electric push rod (2) and a hydraulic device (3) are mounted in the mounting box (1), an embossing mechanism (4) is fixedly connected to the power output end of the electric push rod (2), the embossing mechanism (4) comprises a mounting beam (401), a fixing plate (402) is fixedly connected to the bottom end of the mounting beam (401), a plurality of evenly distributed strip tool holders (403) are fixedly connected to the fixing plate (402), an embossing tool head (6) is clamped to the bottom end of the strip tool holder (403), a leveling frame (5) is fixedly connected to the power output end of the hydraulic device (3), the leveling frame (5) comprises a main frame (501), a leveling plate (502) is fixedly connected to the bottom end of the main frame (501), and a plurality of through holes matching the strip tool holders (403) are opened on the leveling plate (502); A conveying device for conveying a plate is provided at the lower side of the embossing device, a calibration baffle (7) is installed on the conveying device, the calibration baffle (7) comprises a strip plate (701), lifting frames (702) are installed at both ends of the strip plate (701), and a pressure sensing film (703) is laid on the strip plate (701); Also included is a control system, the control system comprising a processor, an image acquisition device is installed on the output end of the etching device, the calibration baffle (7), the image acquisition device, the electric guide rail, the electric push rod (2) and the hydraulic device (3) are all electrically connected to the processor, and the processor is connected to an image analysis module, a data acquisition module and a control module; The data acquisition module is used to collect pressure data of the calibration baffle (7) and image data acquired by the image acquisition module; the image analysis module is used to process and analyze the image data; During the embossing process, the conveying device conveys the plate forward until it contacts the calibration baffle (7). When the pressure sensing film (703) detects the pressure applied by the plate, the processor analyzes and obtains the distance between the etching groove near the plate and the plate boundary based on the plate image collected at the end of the etching process, and then drives the electric guide rail to move the installation box (1) according to the distance value, so that the embossing knife head (6) near the calibration baffle (7) is aligned with the middle of the etching groove, and then drives the embossing mechanism (4) to press down to emboss the plate. After the embossing is completed, the embossing mechanism (4) is reset, and at this time, the leveling frame (5) is driven to press down as a whole to flatten the galvanized film as a whole; S4, spraying the plate with a nanoparticle solution, and then passivating the plate with a passivating agent spray; S5, finally coating an organic film on the passivation layer.

2. The process for anti-rust treatment of plate surface according to claim 1, characterized in that: The organic film is a phosphate film, and the thickness of the phosphate film is 2.0-10.0 μm.

3. The process for anti-rust treatment of plate surface according to claim 1, characterized in that: The nano-particle solution comprises nano-titanium dioxide particles, an impurity remover and deionized water. The concentration of the nano-titanium dioxide particles is 0.5-1 g / L, and the particle size of the nano-titanium dioxide particles is 20-50 nanometers.

4. The process for anti-rust treatment of plate surface according to claim 1, characterized in that: The etching grooves are arranged at equal intervals, and the interval between two adjacent etching grooves is 2-5 mm. The interval between the through holes matches the interval between the etching grooves.

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