A PVD universal flat target support device

Abstract

The present invention belongs to the technical field of vacuum coating machine equipment, and provides a PVD universal planar target seat device. A PVD universal planar target seat device. A process switching platform is used to move the permanent magnet, and the magnetic field strength on the target surface is adjusted to meet the process requirements of the magnetic field strength on the target surface during magnetron coating and arc coating; a mobile drive assembly is used to move the target and cathode carrier assembly, and the distance between the target and the workpiece is adjusted to meet the distance requirements between the target and the workpiece to be coated during magnetron coating and arc coating. The above-mentioned arrangement avoids the need to dismantle and replace the target seat for magnetron coating and arc coating, thereby reducing the operating cost of the equipment; avoids re-leakage inspection of the vacuum chamber after each dismantling and replacement, thereby reducing maintenance costs; and avoids oxidation and deterioration of the base coating due to the vacuum breaking and the product coming into contact with air, thereby affecting the subsequent outer coating.

Description

Technical Field

[0001] The invention relates to the technical field of vacuum coating machine equipment, and in particular provides a PVD universal planar target seat device. Background Art

[0002] At present, in order to improve the surface properties of tools, molds and parts, surface treatment is often used to enhance their hardness, wear resistance, corrosion resistance, etc. Common surface treatment methods include magnetron coating, arc coating, etc. In the surface treatment and modification of tools, magnetron coating has the advantages of uniform film layer, high deposition rate, and a wide range of plating materials, and is widely used in various fields. Arc coating is a process that uses the high temperature generated by arc discharge to evaporate the target material and deposit it on the surface of the workpiece to form a thin film. During the arc discharge process, electrons move rapidly toward the anode, forming a positive ion accumulation layer in front of the cathode target, thereby generating a strong electric field near the cathode. The ionized positive ions move toward the cathode under the action of the strong electric field, hit the surface of the cathode target, and generate high temperature on the surface of the target material, forming a tiny evaporation source. These evaporation sources move regularly on the cathode target surface under the action of the magnetic field and electric field. The ejected particles move toward the substrate workpiece under the action of the bias voltage and condense into a metal or metal ceramic film on the workpiece. Magnetron coating uses the confinement effect of magnetic field on charged particles to make plasma do spiral motion near the target surface, increasing the probability of collision between electrons and gas molecules and the ionization rate, thereby depositing high-quality thin films on the surface of the workpiece. The working principle of magnetron coating is that in a vacuum chamber, the target material made of the material to be plated is used as the cathode, the workpiece is used as the anode, and a DC or AC power supply is added between the two poles to ionize inert gases such as argon into positive ions. The positive ions are accelerated to collide with the target material under the action of the electric field, and the target atoms are sputtered out and deposited on the surface of the workpiece to form a thin film. There are similarities and differences in hardware and process requirements between planar magnetron target and planar arc target: in terms of power supply, the power supply of planar magnetron target is usually a DC power supply or a pulse power supply, which is used to provide stable current and voltage, while the power supply of planar arc target is a high-current DC power supply, which is used to generate arc discharge; in terms of target surface magnetic field layout, the magnetic field strength of planar magnetron target is usually between hundreds of gauss and thousands of gauss, while the magnetic field strength of planar arc target is usually between tens of gauss and hundreds of gauss; in terms of the distance between the workpiece to be coated, the distance between the planar magnetron target and the workpiece is 60-100mm, while the distance between the planar arc target and the workpiece is 160-200mm. In the limited space of the vacuum chamber, multiple sets of planar magnetron target holders or planar arc target holders are needed to meet the coating speed. To improve the coating efficiency, it is difficult to install enough planar magnetron target holders and planar arc target holders at the same time. At the same time, the target holder needs to be replaced for coating in the two-step method, but the overall target holder weighs 200-300KG, which is inconvenient to replace. Each replacement requires the vacuum chamber to be re-tested for leaks, which is very time-consuming. At the same time, the product is in the two-step process. The vacuum is broken, the product is exposed to the atmosphere, and the primer coating may oxidize and deteriorate, affecting the subsequent outer coating.Prior art CN101407906B provides a vacuum coating device, the vacuum coating device provided includes a vacuum chamber, the vacuum chamber has a door for workpieces to enter and exit, arc targets, magnetron targets, heating devices and workpiece racks are installed in the vacuum chamber, and the workpiece rack is installed in the vacuum chamber through a planetary gear mechanism; the arc targets have 28 to 60 and are evenly distributed on the vacuum chamber wall in four rows, and the arc targets are powered by an inverter power supply; the magnetron targets are a pair of cylindrical targets and are arranged in parallel at the center of the vacuum chamber, and the magnetron targets are powered by a medium frequency power supply. The overall equipment structure is complex, which increases the equipment manufacturing cost and maintenance cost. The cylindrical magnetron target seat in the center allows the workpiece rack to enter and exit the vacuum chamber. In a hoisting manner, it is necessary to open the top of the entire vacuum chamber furnace body and enter from the top, which has certain requirements on the floor height of the equipment plant. The inventor believes that there is a large room for improvement in the prior art. Summary of the invention

[0003] The main purpose of the present invention is to achieve the completion of magnetron coating and arc coating of the workpiece in sequence according to the process while keeping the vacuum chamber closed, so as to form a high-quality coating on the surface of the workpiece. Secondly, the installation method of the target seat device and the workpiece rack is simplified to reduce the operating cost and maintenance cost of the equipment; the target seat device is switched between the magnetron target seat and the arc target seat, the manufacturing cost of the equipment is reduced, and the space utilization rate of the vacuum chamber is increased. To this end, the present invention provides a PVD universal planar target seat device, including a target material, a cathode carrier assembly and a permanent magnet group, the permanent magnet group includes a permanent magnet, a process switching platform is provided at the bottom of the permanent magnet group, the permanent magnet is fixed on the process switching platform, a rotating drive assembly is provided at the bottom of the process switching platform, and the process switching platform can be moved away from and close to the target material under the action of the rotating drive assembly; a mobile drive assembly is provided below the cathode carrier assembly, and the mobile end of the mobile drive assembly is connected to the cathode carrier assembly, and the mobile drive assembly can drive the target material and the cathode carrier assembly to move as a whole. The process switching platform is used to move the permanent magnet and adjust the magnetic field strength on the target surface to meet the process requirements of the magnetic field strength on the target surface during magnetron coating and arc coating. The mobile drive assembly is used to move the target and cathode carrier assembly to adjust the distance between the target and the workpiece to meet the distance requirements between the target and the workpiece to be coated during magnetron coating and arc coating. The above settings avoid the need to dismantle and replace the target holder for magnetron coating and arc coating, reducing the operating cost of the equipment; avoid re-leakage inspection of the vacuum chamber after each dismantling and replacement, reducing maintenance costs; avoid oxidation and deterioration of the base coating due to the vacuum breaking and the product coming into contact with air, affecting the subsequent outer coating.

[0004] Preferably, the target seat device also includes an anode plate assembly, the anode plate assembly includes a fixed anode plate and a movable anode plate, the movable anode plate and the target material are fixed, and the fixed anode plate and the movable anode plate are connected by a transmission wire. Since the distance between the target material and the workpiece to be plated is required to change during the switching process, the cathode carrier assembly and the anode plate assembly need to move with the target material, and the anode plate assembly includes a movable anode plate, and the movable anode plate moves with the target material. A fixed anode plate is provided, and a transmission wire is used to connect the fixed anode plate and the movable anode plate to ensure the stability of the conductive contact. The transmission wire uses a conductive copper braided wire to prevent the transmission wire from being repeatedly pulled and deformed during the repeated changes in the distance between the movable anode plate and the fixed anode plate, resulting in damage or even breakage, thereby ensuring the stability of current transmission.

[0005] Preferably, the target base device also includes a large integral flange of the target base, the fixed anode plate is fixed on the top surface of the large integral flange of the target base, and the fixed end of the mobile drive assembly is connected to the large integral flange of the target base. The large integral flange of the target base is used to fix the main parts of the target base device, which is convenient for disassembly and assembly of the target base device; the large integral flange of the target base is used to cooperate with the vacuum chamber furnace body to reduce the installation joint between the target base device and the vacuum chamber furnace body, which is convenient for ensuring the sealing of the vacuum chamber furnace body; the control components, such as the cylinder of the mobile drive assembly and the servo motor of the rotary drive assembly, are fixed on the outside of the large integral flange of the target base, and the switching of the target base device between the magnetron target base and the arc target base is completed while ensuring the sealing of the vacuum chamber, so as to avoid repeated opening and closing of the vacuum chamber for leak detection.

[0006] Preferably, the fixed anode plate is annular, the movable anode plate is sleeved with the fixed anode plate, and the connection point of the power transmission wire between the fixed anode plate and the movable anode plate is located outside the anode plate assembly. The movable anode plate and the fixed anode plate are sleeved with each other to seal the target base device, preventing debris from entering the target base device and affecting the magnetic field strength and electric field strength on the target surface; the connection point of the power transmission wire between the fixed anode plate and the movable anode plate is located outside the anode plate assembly, and the power transmission wire is easily damaged due to repeated pulling, bending and strong current passing through, which facilitates the inspection and replacement of the power transmission wire; because the power transmission wire has a large number of redundant parts during the repeated movement of the target material, especially when the connection point of the power transmission wire between the movable anode plate and the fixed anode plate is at the shortest distance, the power transmission wire is arranged outside the target base device, which can prevent the redundant part of the power transmission wire from contacting other parts of the target base device and causing damage to the target base device.

[0007] Preferably, a cylinder is provided at the fixed end of the mobile drive assembly, the cylinder is fixed on the bottom surface of the large flange of the target base, and a copper back cooling assembly is provided on the bottom surface of the large flange of the target base. The bottom surface of the large flange of the target base is located outside the vacuum chamber, which is conducive to controlling the inlet and outlet of the cylinder from the outside of the vacuum chamber to complete the overall control of the cathode carrier assembly, the anode plate assembly and the target material, avoiding opening and closing the vacuum chamber, repeatedly checking the vacuum chamber for leaks, and reducing operating costs.

[0008] Preferably, the rotary drive assembly includes a hollow screw and a spline shaft, a hollow fixed spline sleeve is provided between the hollow screw and the spline shaft, one end of the hollow fixed spline sleeve is connected to the hollow screw, and the other end is connected to the spline shaft. The permanent magnet group is connected to the rotary drive assembly through the hollow screw, the hollow fixed spline sleeve and the spline shaft. The rotary drive assembly uses a servo motor as a control component to provide rotary power, drive the spline shaft to rotate, drive the hollow fixed spline sleeve to rotate, drive the hollow screw to rotate, realize the movement of the process switching platform, adjust the distance between the permanent magnet and the target material, change the magnetic field strength on the surface of the target material, and make the target material suitable for a magnetron target seat or an arc target seat.

[0009] Preferably, the rotary drive assembly further comprises a servo motor, a hollow screw is connected to the process switching platform, and a spline shaft is connected to the servo motor. The hollow screw is used to move the fixed platform back and forth, so that the moving distance of the process switching platform can be accurately controlled, thereby adjusting the magnetic field strength on the target surface and improving the accuracy of the magnetic field strength on the target surface; the servo motor control is used to improve the response rate of the rotary drive assembly and improve the accuracy of the moving distance of the process switching platform.

[0010] Preferably, the rotary drive assembly passes through the cathode carrier assembly, and the hollow fixed spline sleeve cooperates with the cathode carrier assembly to limit the maximum moving distance of the process switching platform, prevent the process switching platform from colliding with the cathode carrier assembly, avoid surface defects such as scratches on the surface of the cathode carrier assembly, and avoid damage to the permanent magnet on the process switching platform.

[0011] Preferably, the target base device is fixed on the vacuum chamber furnace body, the vacuum chamber furnace body is provided with a hinged door, the process switching platform is located inside the vacuum chamber furnace body, and the fixed end of the mobile drive assembly and the servo motor of the rotary drive assembly are located outside the vacuum chamber. The mobile drive assembly and the rotary drive assembly in the target base device require external equipment for control and operation. The mobile drive assembly and the rotary drive assembly are located outside the vacuum chamber, which can avoid the control and operation process affecting the vacuum degree of the vacuum chamber, avoid repeated leak detection, and shorten the working hours required for processing; the furnace door of the vacuum chamber furnace body adopts a flat hinged door, which is convenient for opening the vacuum chamber and moving the workpiece rack horizontally, avoiding the use of hoisting to disassemble the workpiece rack, and saving the floor space of the vacuum chamber.

[0012] Preferably, the vacuum chamber includes a circular workpiece rack, and the vacuum chamber furnace body is a regular polygon. The regular polygon furnace body is installed with a target seat device, which can control the distance between each target seat device and the workpiece to be processed in the workpiece rack to be equal, which is conducive to uniformly adjusting the distance between the target seat device and the workpiece to be processed; the regular polygon furnace body is used for the installation of the target seat device, and the installation position is a plane, which is conducive to the installation of the target seat device; it is convenient to set the sealing structure to fill the sealing filler, and at the same time it is conducive to ensuring the sealing of the joint between the target seat device and the vacuum chamber furnace body, and ensuring the sealing of the vacuum chamber.

[0013] The present invention provides a PVD universal planar target base device, which can realize magnetron coating and arc coating of a workpiece in sequence according to the process while keeping the vacuum chamber closed, so as to form a high-quality coating on the surface of the workpiece; simplify the installation method of the target base device and the workpiece rack, and reduce the operation cost and maintenance cost of the equipment; realize the mutual switching of the target base device between the magnetron target base and the arc target base, reduce the manufacturing cost of the equipment, increase the space utilization rate of the vacuum chamber, and have the following beneficial effects: avoid the transmission wire from being repeatedly pulled and deformed to cause damage or even breakage during the process of repeated changes in the distance between the moving anode plate and the fixed anode plate, and ensure the current transmission Stability; the air in and out of the cylinder is controlled from the outside of the vacuum chamber to complete the overall control of the cathode carrier assembly, the anode plate assembly and the target material, avoiding the opening and closing of the vacuum chamber, repeated leak detection of the vacuum chamber, and reducing the operating cost; the furnace door of the vacuum chamber furnace body adopts a flat hinged door, which is convenient for opening the vacuum chamber and moving the workpiece rack out horizontally, avoiding the use of hoisting to disassemble the workpiece rack, saving the floor space of the vacuum chamber; the installation position of the polygonal furnace body is flat, which is conducive to the installation of the target seat device's overall large flange, and at the same time it is convenient to set the sealing structure to fill the sealing filler, which is conducive to ensuring the sealing of the joint between the target seat device and the vacuum chamber furnace body, and ensuring the sealing of the vacuum chamber. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] In order to more clearly illustrate the implementation methods of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for the implementation methods or the description of the prior art. Obviously, the drawings described below are only exemplary, and for ordinary technicians in this field, other implementation drawings can be derived from the provided drawings without creative work.

[0015] Figure 1 It is a structural schematic diagram of the present invention;

[0016] Figure 2 It is a structural schematic diagram of the arc target seat working condition of the present invention;

[0017] Figure 3 It is a structural schematic diagram of the working condition of the magnetron target seat of the present invention;

[0018] Figure 4 It is a structural schematic diagram of the rotary drive assembly of the present invention;

[0019] Figure 5 It is a schematic structural diagram of the vacuum chamber of the present invention;

[0020] Figure 6 It is a schematic structural diagram of the vacuum chamber furnace body of the present invention when it is opened.

[0021] Explanation of the reference numerals: 1 target material; 2 anode plate assembly; 3 transmission wire; 4 permanent magnet group; 5 cathode carrier assembly; 6 rotation drive assembly; 7 target base integral large flange; 8 cylinder; 9 servo motor; 10 copper back cooling assembly; 11 permanent magnet; 12 process switching platform; 13 hollow screw; 14 hollow fixed spline sleeve; 15 spline shaft; 16 workpiece rack; 17 hinged door; 18 vacuum chamber furnace body; 19 target material position marking line for magnetron target base working condition; 20 target material position marking line for arc target base working condition. DETAILED DESCRIPTION

[0022] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.

[0023] Embodiment 1

[0024] like Figure 1 As shown, a PVD universal planar target base device includes a target material 1, an anode plate assembly 2, a power transmission wire 3, a cathode carrier assembly 5, a permanent magnet group 4, a rotation drive assembly 6, a target base integral large flange 7, a cylinder 8, a servo motor 9 and a copper back cooling assembly 10. The permanent magnet group 4 includes a permanent magnet 11. A process switching platform 12 is provided at the bottom of the permanent magnet group 4. The permanent magnet 11 is fixed on the process switching platform 12. A rotation drive assembly 6 is provided at the bottom of the process switching platform 12. The process switching platform 12 can move away from and approach the target material 1 under the action of the rotation drive assembly 6; a mobile drive assembly is provided below the cathode carrier assembly 5, and the mobile end of the mobile drive assembly is connected to the cathode carrier assembly 5. The mobile drive assembly can drive the target material 1 and the cathode carrier assembly 5 to move as a whole. Through the above arrangement, while keeping the vacuum chamber closed, the workpiece can be subjected to magnetron coating and arc coating in sequence according to the process, thereby forming a high-quality coating on the surface of the workpiece; the installation method of the target seat device and the workpiece rack 16 is simplified, and the operation cost and maintenance cost of the equipment are reduced; the target seat device can be switched between the magnetron target seat and the arc target seat, which reduces the manufacturing cost of the equipment and increases the space utilization rate of the vacuum chamber; the process switching platform 12 is used to move the permanent magnet 11 to adjust the magnetic field strength on the surface of the target material 1 to meet the process requirements of the magnetic field strength on the surface of the target material 1 during magnetron coating and arc coating; the mobile drive component is used to move the target material 1 and the cathode carrier component 5 to adjust the distance between the target material 1 and the workpiece to meet the distance requirement between the target material 1 and the coated workpiece during magnetron coating and arc coating. By adopting the above-mentioned arrangement, the need to dismantle and replace the target holder for magnetron coating and arc coating can be avoided, thereby reducing the operating cost of the equipment; it is avoided that the vacuum chamber needs to be re-tested for leaks after each replacement, thereby reducing maintenance costs; and it is avoided that the base coating is prevented from oxidizing and deteriorating due to the product coming into contact with air due to the vacuum being broken, thereby affecting the subsequent outer coating.

[0025] Combination Figure 1 and Figure 3 As shown, the target seat device also includes an anode plate assembly 2, and the anode plate assembly 2 includes a fixed anode plate and a movable anode plate. The movable anode plate and the target material 1 are fixed, and the fixed anode plate and the movable anode plate are connected by a transmission wire 3. Since the distance between the target material 1 and the workpiece to be plated is required to change during the switching process, the cathode carrier assembly 5 and the anode plate assembly 2 need to move with the target material 1, and the anode plate assembly 2 includes a movable anode plate, and the movable anode plate moves with the target material 1. A fixed anode plate is set, and the fixed anode plate and the movable anode plate are connected by a transmission wire 3 to ensure the stability of the conductive contact. The transmission wire 3 uses a conductive copper braided wire to prevent the transmission wire 3 from being repeatedly pulled and deformed during the repeated change of the distance between the movable anode plate and the fixed anode plate, resulting in damage or even breakage, thereby ensuring the stability of current transmission.

[0026] The target base device also includes a target base integral large flange 7, a fixed anode plate is fixed on the top surface of the target base integral large flange 7, and a fixed end of the mobile drive assembly is connected to the target base integral large flange 7. The target base integral large flange 7 is used to fix the main parts of the target base device, which is convenient for disassembly and assembly of the target base device; the target base integral large flange 7 is used to cooperate with the vacuum chamber furnace body 18 to reduce the installation joint between the target base device and the vacuum chamber furnace body 18, which is convenient for ensuring the sealing of the vacuum chamber furnace body 18; the control components, such as the cylinder 8 of the mobile drive assembly and the servo motor 9 of the rotary drive assembly 6, are fixed on the outer side of the target base integral large flange 7, and the switching of the target base device between the magnetron target base and the arc target base is completed while ensuring the sealing of the vacuum chamber, so as to avoid repeated opening and closing of the vacuum chamber for leak detection.

[0027] The fixed anode plate is annular, the movable anode plate is sleeved with the fixed anode plate, and the connection point of the transmission wire 3 between the fixed anode plate and the movable anode plate is located outside the anode plate assembly 2. The movable anode plate and the fixed anode plate are sleeved with each other to close the target base device, so as to prevent debris from entering the target base device and affecting the magnetic field strength and electric field strength on the surface of the target material 1; the connection point of the transmission wire 3 between the fixed anode plate and the movable anode plate is located outside the anode plate assembly 2, and the transmission wire 3 is easily damaged due to repeated pulling, bending and strong current passing through, so it is convenient to inspect and replace the transmission wire 3; because the transmission wire 3 has a large number of redundant parts during the repeated movement of the target material 1, especially when the connection point of the transmission wire 3 between the movable anode plate and the fixed anode plate is at the shortest distance, the transmission wire 3 is arranged outside the target base device, which can avoid the redundant part of the transmission wire 3 from contacting other parts of the target base device, resulting in damage to the target base device.

[0028] like Figure 1As shown, the fixed end of the mobile drive assembly is provided with a cylinder 8, the bottom surface of the large flange 7 of the target seat is fixed with the cylinder 8, and the bottom surface of the large flange 7 of the target seat is provided with a copper back cooling assembly 10. Since the cathode carrier assembly 5, the anode plate assembly 2 and other components of the target seat device have a large current passing through, it is easy to generate a lot of heat, and the cathode carrier assembly 5, the anode plate assembly 2 and other components are located inside the vacuum chamber, and the heat dissipation effect is poor. The copper back cooling assembly is provided with a heat conducting rod extending into the interior of the target seat device and connected to the process switching platform 12, so as to conduct heat to the permanent magnet group 4, the cathode carrier assembly 5 and the anode plate assembly 2 and other components, thereby improving the heat dissipation efficiency. The bottom surface of the large flange 7 of the target seat is located outside the vacuum chamber, which is conducive to controlling the air inlet and outlet of the cylinder 8 from the outside of the vacuum chamber to complete the overall control of the cathode carrier assembly 5, the anode plate assembly 2 and the target material 1, avoiding the opening and closing of the vacuum chamber, repeated leak detection of the vacuum chamber, and reducing the operating cost.

[0029] like Figure 4 As shown, the rotary drive assembly 6 includes a hollow screw 13 and a spline shaft 15, a hollow fixed spline sleeve 14 is provided between the hollow screw 13 and the spline shaft 15, one end of the hollow fixed spline sleeve 14 is connected to the hollow screw 13, and the other end is connected to the spline shaft 15. The rotary drive assembly 6 also includes a servo motor 9, the hollow screw 13 is connected to the process switching platform 12, and the spline shaft 15 is connected to the servo motor 9. The permanent magnet group 4 is connected to the rotary drive assembly 6 through the hollow screw 13, the hollow fixed spline sleeve 14 and the spline shaft 15. The rotary drive assembly 6 uses the servo motor 9 as a control component to provide rotary power, drive the spline shaft 15 to rotate, drive the hollow fixed spline sleeve 14 to rotate, and drive the hollow screw 13 to rotate.

[0030] The above arrangement is adopted to realize the movement of the process switching platform 12, adjust the distance between the permanent magnet 11 and the target material 1, change the magnetic field strength on the surface of the target material 1, and make the target material 1 suitable for the magnetron target seat or the arc target seat. The hollow screw 13 is adopted to move the fixed platform back and forth, and the moving distance of the process switching platform 12 can be accurately controlled, thereby adjusting the magnetic field strength on the surface of the target material 1 and improving the accuracy of the magnetic field strength on the surface of the target material 1; the servo motor 9 is adopted to control, improve the response rate of the rotary drive assembly 6, and improve the accuracy of the moving distance of the process switching platform 12.

[0031] The rotary drive assembly 6 passes through the cathode carrier assembly 5, and the hollow fixed spline sleeve 14 cooperates with the cathode carrier assembly 5. The maximum moving distance of the process switching platform 12 is limited to prevent the process switching platform 12 from colliding with the cathode carrier assembly 5, avoid surface defects such as scratches on the surface of the cathode carrier assembly 5, and avoid damage to the permanent magnet 11 on the process switching platform 12.

[0032] Combination Figure 5 and Figure 6As shown, the vacuum chamber includes a circular workpiece rack 16, and the vacuum chamber furnace body 18 is a regular polygon. The target seat device is fixed on the vacuum chamber furnace body 18, and the vacuum chamber furnace body 18 is provided with a hinged door 17. The process switching platform 12 is located inside the vacuum chamber furnace body 18. The fixed end of the mobile drive assembly and the servo motor 9 of the rotary drive assembly 6 are located outside the vacuum chamber. The cylinder 8 and the servo motor 9 at the operating fixed end can drive the target seat device to switch between the magnetron target seat and the arc target seat. The mobile drive assembly changes the position of the target material 1, and the position of the target material 1 switches between the target position mark 19 of the magnetron target seat working condition and the target position mark 20 of the arc target seat working condition. In the arc target seat working condition, the mobile drive assembly drives the target material 1 to reach the target position mark 20 of the arc target seat working condition, and the rotary drive assembly 6 drives the process switching platform 12 away from the target material 1, so that the permanent magnet 11 carried by the process switching platform 12 is away from the target material 1, thereby reducing the magnetic field strength on the surface of the target material 1, as shown in FIG. Figure 2 When the magnetron target seat is in working condition, the mobile driving assembly drives the target 1 to reach the target position mark 19 of the magnetron target seat working condition, and the rotating driving assembly 6 drives the process switching platform 12 to approach the target 1, so that the permanent magnet 11 carried by the process switching platform 12 is close to the target 1, thereby increasing the magnetic field strength on the surface of the target 1. Figure 3 shown.

[0033] Through the above arrangement, the cylinder 8 in the mobile drive assembly and the servo motor 9 of the rotary drive assembly 6 in the target base device need external equipment for control and operation. The mobile drive assembly and the rotary drive assembly 6 are located outside the vacuum chamber, which can avoid the control and operation process affecting the vacuum degree of the vacuum chamber; the furnace door of the vacuum chamber furnace body 18 adopts a flat hinged door 17, which is convenient for opening the vacuum chamber and moving the workpiece rack 16 for disassembly and assembly, avoiding the use of a hoisting method to disassemble and assemble the workpiece rack 16, saving the floor space of the vacuum chamber. The target base device is installed in the regular polygon furnace body, which can control the distance between each target base device and the workpiece to be processed in the workpiece rack 16 to be equal, which is conducive to uniformly adjusting the distance between the target base device and the workpiece to be processed; the installation position of the regular polygon furnace body is a plane, which is conducive to installing the target base integral large flange 7 of the target base device; it is convenient to set up a sealing structure to fill the sealing filler, and at the same time it is conducive to ensuring the sealing of the joint between the target base device and the vacuum chamber furnace body 18, and ensuring the sealing of the vacuum chamber.

[0034] The present invention provides a PVD universal planar target base device, which can realize magnetron coating and arc coating of a workpiece in sequence according to the process while keeping the vacuum chamber closed, so as to form a high-quality coating on the surface of the workpiece; simplify the installation method of the target base device and the workpiece rack 16, and reduce the operation cost and maintenance cost of the equipment; realize the mutual switching of the target base device between the magnetron target base and the arc target base, reduce the manufacturing cost of the equipment, increase the space utilization rate of the vacuum chamber, and have the following beneficial effects: avoid the transmission wire 3 from being repeatedly pulled and deformed and damaged or even broken during the process of repeated changes in the distance between the moving anode plate and the fixed anode plate, and ensure the stability of current transmission; from the vacuum The air inlet and outlet of the outdoor control cylinder 8 are used to complete the overall control of the cathode carrier assembly 5, the anode plate assembly 2 and the target material 1, avoiding the opening and closing of the vacuum chamber, repeated leak detection of the vacuum chamber, and reducing the operating cost; the furnace door of the vacuum chamber furnace body 18 adopts a flat hinged door 17, which is convenient for opening the vacuum chamber and moving the workpiece rack 16 for disassembly and assembly, avoiding the use of a hoisting method to disassemble and assemble the workpiece rack 16, saving the floor space of the vacuum chamber; the installation position of the polygonal furnace body is a plane, which is conducive to the installation of the target seat integral large flange 7 of the target seat device, and at the same time, it is convenient to set the sealing structure to fill the sealing filler, which is conducive to ensuring the sealing of the joint between the target seat device and the vacuum chamber furnace body 18, and ensuring the sealing of the vacuum chamber.

[0035] The above embodiments and / or implementation methods are only used to illustrate the preferred embodiments and / or implementation methods for realizing the technology of the present invention, and are not intended to limit the implementation methods of the technology of the present invention in any form. Any technical personnel in this field may make slight changes to other equivalent embodiments without departing from the scope of the technical means disclosed in the content of the present invention, but they should still be regarded as technologies or embodiments that are essentially the same as the present invention.

Claims

1. A PVD universal planar target base device, comprising a target material (1), a cathode carrier assembly (5) and a permanent magnet group (4), wherein the permanent magnet group (4) comprises a permanent magnet (11), characterized in that: A process switching platform (12) is provided at the bottom of the permanent magnet group (4), the permanent magnet (11) is fixed on the process switching platform (12), a rotation drive component (6) is provided at the bottom of the process switching platform (12), and the process switching platform (12) can move away from and approach the target material (1) under the action of the rotation drive component (6); The target base device also includes an anode plate assembly (2), the anode plate assembly (2) including a fixed anode plate and a movable anode plate, the movable anode plate and the target material (1) are fixed, and the fixed anode plate and the movable anode plate are connected by a power transmission wire (3); a movable drive assembly is provided below the cathode carrier assembly (5), the movable end of the movable drive assembly is connected to the cathode carrier assembly (5), and the movable drive assembly can drive the target material (1) and the cathode carrier assembly (5) to move as a whole.

2. A PVD universal planar target base device according to claim 1, characterized in that: The target base device further comprises a target base integral large flange (7), the fixed anode plate is fixed to the top surface of the target base integral large flange (7), and the fixed end of the movable drive assembly is connected to the target base integral large flange (7).

3. A PVD universal planar target holder device according to claim 1, characterized in that: The fixed anode plate is annular in shape, the movable anode plate is sleeved on the fixed anode plate, and the connection point of the power transmission wire (3) between the fixed anode plate and the movable anode plate is located outside the anode plate assembly (2).

4. A PVD universal planar target base device according to claim 2, characterized in that: A cylinder (8) is provided at the fixed end of the mobile drive assembly, the cylinder (8) is fixed to the bottom surface of the integral large flange (7) of the target base, and a copper back cooling assembly (10) is provided on the bottom surface of the integral large flange (7) of the target base.

5. The PVD universal planar target holder device according to claim 1, characterized in that: The rotary drive assembly (6) comprises a hollow screw (13) and a spline shaft (15), wherein a hollow fixed spline sleeve (14) is provided between the hollow screw (13) and the spline shaft (15), and wherein one end of the hollow fixed spline sleeve (14) is connected to the hollow screw (13) and the other end is connected to the spline shaft (15).

6. A PVD universal planar target holder device according to claim 5, characterized in that: The rotary drive assembly (6) further comprises a servo motor (9), the hollow screw (13) is connected to the process switching platform (12), and the spline shaft (15) is connected to the servo motor (9).

7. The PVD universal planar target holder device according to claim 5, characterized in that: The rotary drive assembly (6) passes through the cathode carrier assembly (5), and the hollow fixed spline sleeve (14) and the cathode carrier assembly (5) are matched.

8. A vacuum chamber, suitable for a PVD universal planar target holder device according to any one of claims 1 to 7, comprising a vacuum chamber furnace body (18), characterized in that: The target base device is fixed on the vacuum chamber furnace body (18), the vacuum chamber furnace body (18) is provided with a hinged door (17), and the fixed end of the mobile drive assembly and the servo motor (9) of the rotary drive assembly (6) are located outside the vacuum chamber.

9. A vacuum chamber according to claim 8, characterized in that: The vacuum chamber comprises a circular workpiece rack (16), and the vacuum chamber furnace body (18) is a regular polygon.

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