Glass with easy-to-clean surface function and preparation method thereof

Abstract

The present invention relates to the field of glass technology, and in particular to a glass with a surface easy-to-clean function and a preparation method thereof, comprising the following steps: cleaning treatment with a cleaning agent: adjusting the working air pressure of a polishing machine to 0.5 MPa, holding a pressing handle with the right hand and an auxiliary handle with the left hand, so that the polishing machine sponge and the easy-to-clean surface of the glass are in a vertical state; then pressing the air source key of the pressing handle, polishing each piece of glass 7-10 times, with a rotation speed of 2500-3000 rpm. The glass with the easy-to-clean function of the present invention adopts a water ultrasonic cleaning treatment for the glass body first, and then is coated with an easy-to-clean coating, and the additives added to the easy-to-clean coating adopt bisphenol A epoxy resin, acetone solvent, acrylic emulsion, self-cleaning modifier, and curing agent to be adjusted and improved, and the self-cleaning modifier and nano-silicon dioxide regulator are coordinated and coordinated to enhance the effect together, and the product has a significant effect on the easy-to-clean functional effect of the glass, and the product has obvious acid and alkali resistance and scratch resistance stability.

Description

Technical Field

[0001] The invention relates to the technical field of glass, and in particular to glass with a surface easy-to-clean function and a preparation method thereof. Background Art

[0002] As people's living standards continue to improve, people's requirements for living environment are constantly increasing, the indoor environment has also become the focus of people's attention, and people's requirements for shower room glass are getting higher and higher. At present, the outer surface of the commonly used glass is directly in contact with water and dust in the air. Stains are easily left on the glass surface, affecting the cleanliness of the glass.

[0003] The existing glass has poor easy-to-clean functionality, and the acid and alkali resistance and scratch resistance of the product are poor, which limits the use efficiency of the product. Based on this, the present invention further improves it. Summary of the invention

[0004] In view of the defects of the prior art, the object of the present invention is to provide a glass with an easy-to-clean surface and a preparation method thereof, so as to solve the problems raised in the above background technology.

[0005] The present invention solves the technical problem by adopting the following technical solution:

[0006] The present invention provides a method for preparing glass with a surface easy-to-clean function, comprising the following steps:

[0007] Step 1: Cleaning treatment with cleaning agent:

[0008] (1) Adjust the working pressure of the polisher to 0.5 MPa, hold the pressing handle with your right hand and the auxiliary handle with your left hand, so that the polisher sponge and the easy-to-clean surface of the glass are vertical;

[0009] (2) Then press the air source button on the handle and polish each piece of glass 7-10 times at a speed of 2500-3000 rpm;

[0010] (3) Mix the detergent stock solution with water in a ratio of 1:6-1:7, shake well for 3-5 minutes before use, and sprinkle the detergent back and forth on the glass twice at a uniform speed. The amount of detergent used is 10g / ㎡-15g / ㎡ relative to the area of ​​the glass;

[0011] Step 2: Preparation of easy-to-clean coating:

[0012] First, the raw materials are weighed according to weight percentage: 40-50% of perfluoroalkyl ether, 20-30% of fluorinated polyether compound, 10-20% of methanol and the remainder of additives; then the above raw materials are mixed well to obtain an easy-to-clean coating;

[0013] The additive raw materials include the following raw materials by weight:

[0014] 40-45 parts by weight of bisphenol A epoxy resin, 20-30 parts by weight of acetone solvent, 5-10 parts by weight of acrylic emulsion, 2-5 parts by weight of self-cleaning modifier, 2-4 parts by weight of curing agent, and 3-4 parts by weight of nano-silicon dioxide regulator;

[0015] Step three: spray the easy-clean coating of step two on the glass surface of step one, with a coating thickness of 8-10nm, to obtain glass containing the easy-clean coating, and then bake the glass containing the easy-clean coating to obtain glass with surface easy-clean function.

[0016] The ingredients of the cleaning agent stock solution are: sodium dodecylbenzene sulfonate surfactant, content is 6%; sodium gluconate, content is 4%; triacetamide, content is 2.5%; sodium carboxymethyl cellulose, content is 4%; water, content is 83.5%.

[0017] Preferably, the surface viscosity of the glass with easy-to-clean surface function is 1.0 at an ambient temperature of 23 degrees;

[0018] The oleic acid contact angle of the glass with easy-to-clean surface is 76 degrees, and the oleic acid sliding angle is 2 degrees;

[0019] The dynamic friction coefficient of the glass with the easy-to-clean surface function is 0.02-0.03;

[0020] The plasma machine processing method is: equipped with 2-3 plasmas, the power is 800-1200W, the conveyor belt speed is adjusted to 12-17mm / s, the plasma moving speed is adjusted to 500-800mm / s, the plasma pressure is 0.4-0.8Mpa, the vertical distance between the plasma nozzle and the glass surface is 5-8mm, and the plasma is turned on in advance when the glass is 20-30cm away from the plasma. The plasma basically runs in a straight line.

[0021] Preferably, the preparation method of the self-cleaning modifier is:

[0022] S1: irradiate the flake graphene in a proton irradiation box for 5-10 minutes at an irradiation power of 350-400W. After the irradiation is completed, preheat the graphene at 55-60°C for 10-20 minutes to obtain a graphene agent.

[0023] S2: The graphene agent is immersed in a sodium silicate solution with a volume of 3-5 times the total volume of the graphene agent and stirred. After stirring, the solution is filtered and dried to obtain dry flaky graphene.

[0024] S3: Add 2-4 parts of silane coupling agent KH560 and 1-3 parts of nano-silica sol to 4-7 parts of chitosan solution, and then add 2-4 parts of silicon nitride and continue to mix thoroughly to obtain a regulating solution;

[0025] S4: The dried flake graphene in S2 and the regulating liquid are mixed in a weight ratio of 5:3 and ball-milled at a ball-milling speed of 1000-1500 r / min for 2 h. After the ball-milling is completed, the mixture is washed with water and dried to obtain a self-cleaning modifier.

[0026] Preferably, the mass fraction of the sodium silicate solution is 2-5%; the mass fraction of the chitosan solution is 4-7%; the stirring speed of the stirring treatment is 450-550 r / min, and the stirring is performed for 20-30 min.

[0027] Preferably, the preparation method of the nano silicon dioxide regulator is:

[0028] S11: adding nano-silicon dioxide into the phosphate buffer solution at a weight ratio of 2:5, stirring and mixing thoroughly to obtain nano-silicon dioxide liquid;

[0029] S12: 5-8 parts of nano-silicon dioxide liquid, 2-4 parts of silicon carbide whiskers, 1-3 parts of lanthanum oxide, 2-3 parts of silane coupling agent KH550 and 2-3 parts of compounding agent are mixed and stirred, and after stirring, the mixture is washed with water and dried to obtain a nano-silicon dioxide regulator; the pH value of the phosphate buffer solution is 5.5.

[0030] Preferably, the stirring speed of the blending and stirring process is 450-550 r / min, and the stirring time is 20-30 min.

[0031] Preferably, the compounding agent is hydroxyapatite.

[0032] Preferably, the curing agent is 2-phenylimidazole curing agent.

[0033] A method for preparing glass with an easy-to-clean surface and glass for a shower room.

[0034] Compared with the prior art, the present invention has the following beneficial effects:

[0035] The glass with easy-cleaning function of the present invention is firstly treated with water ultrasonic cleaning for the glass body, and then coated with easy-cleaning coating. The additives added to the easy-cleaning coating are improved by blending bisphenol A epoxy resin, acetone solvent, acrylic emulsion, self-cleaning modifier and curing agent. The self-cleaning modifier and nano-silicon dioxide regulator are coordinated and coordinated to enhance the effect together. The product has significant effect of easy-cleaning function of the glass, and the product has significant effect of acid and alkali resistance, scratch resistance and stability.

[0036] The self-cleaning modifier uses flake graphene that has been irradiated with protons to optimize its activity performance, and then improves its activity through preheating. After being stirred in a sodium silicate solution, the coordination between graphene and the conditioning solution is improved. At the same time, the silane coupling agent KH560, nano-silica sol, chitosan solution and silicon nitride in the conditioning solution are mixed and formulated to enhance the self-cleaning surface points, improve the self-cleaning property of the product, and improve the product performance stability;

[0037] The nano-silica regulator is prepared by mixing nano-silica with a phosphate buffer solution, and at the same time, mixing and stirring with silicon carbide whiskers, lanthanum oxide, silane coupling agent KH550 and hydroxyapatite. The obtained nano-silica regulator is better coordinated with the self-cleaning modifier, so that the self-cleaning performance of the product is further improved, and the product performance stability is enhanced. DETAILED DESCRIPTION

[0038] The following is a clear and complete description of the technical solutions in the embodiments of the present invention in conjunction with specific embodiments. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0039] The present invention provides a method for preparing glass with an easy-to-clean surface. In a dust-free environment of Class 100,000 or higher, the glass is cleaned with a glass cleaning agent, then cleaned with water, then ultrasonically cleaned, and then dried to obtain clean glass with a contact angle of ≤12°; in a dust-free environment of Class 100,000 or higher, the clean glass is activated with a plasma machine to obtain activated glass, and the method further includes the following steps:

[0040] Step 1: Cleaning treatment with cleaning agent:

[0041] (1) Adjust the working pressure of the polisher to 0.5 MPa, hold the pressing handle with your right hand and the auxiliary handle with your left hand, so that the polisher sponge and the easy-to-clean surface of the glass are vertical;

[0042] (2) Then press the air source button on the handle and polish each piece of glass 7-10 times at a speed of 2500-3000 rpm;

[0043] (3) Mix the detergent stock solution with water in a ratio of 1:6-1:7, shake well for 3-5 minutes before use, and sprinkle the detergent back and forth on the glass twice at a uniform speed. The amount of detergent used is 10g / ㎡-15g / ㎡ relative to the area of ​​the glass;

[0044] Step 2: Preparation of easy-to-clean coating:

[0045] First, weigh the raw materials according to weight percentage: 40-50% perfluoroalkyl ether, 20-30% fluorinated polyether compound, 10-20% methanol and the balance as additives; then mix the above raw materials to obtain an easy-to-clean coating; the fluorinated polyether compound disclosed in the patent document CN106496521B;

[0046] The additive raw materials include the following raw materials by weight:

[0047] 40-45 parts by weight of bisphenol A epoxy resin, 20-30 parts by weight of acetone solvent, 5-10 parts by weight of acrylic emulsion, 2-5 parts by weight of self-cleaning modifier, 2-4 parts by weight of curing agent, and 3-4 parts by weight of nano-silicon dioxide regulator;

[0048] Step three: spray the easy-clean coating of step two on the glass surface of step one, with a coating thickness of 8-10nm, to obtain glass containing the easy-clean coating, and then bake the glass containing the easy-clean coating to obtain glass with surface easy-clean function.

[0049] The ingredients of the cleaning agent stock solution are: sodium dodecylbenzene sulfonate surfactant, content is 6%; sodium gluconate, content is 4%; triacetamide, content is 2.5%; sodium carboxymethyl cellulose, content is 4%; water, content is 83.5%.

[0050] The surface viscosity of glass with easy-to-clean function is 1.0 at an ambient temperature of 23 degrees;

[0051] The oleic acid contact angle of the glass with easy-to-clean surface is 76 degrees, and the oleic acid sliding angle is 2 degrees;

[0052] The dynamic friction coefficient of the glass with the easy-to-clean surface function is 0.02-0.03;

[0053] The plasma machine processing method is: equipped with 2-3 plasmas, the power is 800-1200W, the conveyor belt speed is adjusted to 12-17mm / s, the plasma moving speed is adjusted to 500-800mm / s, the plasma pressure is 0.4-0.8Mpa, the vertical distance between the plasma nozzle and the glass surface is 5-8mm, and the plasma is turned on in advance when the glass is 20-30cm away from the plasma. The plasma basically runs in a straight line.

[0054] The preparation method of the self-cleaning modifier of the present embodiment is:

[0055] S1: irradiate the flake graphene in a proton irradiation box for 5-10 minutes at an irradiation power of 350-400W. After the irradiation is completed, preheat the graphene at 55-60°C for 10-20 minutes to obtain a graphene agent.

[0056] S2: The graphene agent is immersed in a sodium silicate solution with a volume of 3-5 times the total volume of the graphene agent and stirred. After stirring, the solution is filtered and dried to obtain dry flaky graphene.

[0057] S3: Add 2-4 parts of silane coupling agent KH560 and 1-3 parts of nano-silica sol to 4-7 parts of chitosan solution, and then add 2-4 parts of silicon nitride and continue to mix thoroughly to obtain a regulating solution;

[0058] S4: The dried flake graphene in S2 and the regulating liquid are mixed in a weight ratio of 5:3 and ball-milled at a ball-milling speed of 1000-1500 r / min for 2 h. After the ball-milling is completed, the mixture is washed with water and dried to obtain a self-cleaning modifier.

[0059] The mass fraction of the sodium silicate solution in this embodiment is 2-5%; the mass fraction of the chitosan solution is 4-7%.

[0060] The stirring speed of the stirring process in this embodiment is 450-550 r / min, and the stirring time is 20-30 min.

[0061] The preparation method of the nano silicon dioxide regulator of this embodiment is:

[0062] S11: adding nano-silicon dioxide into the phosphate buffer solution at a weight ratio of 2:5, stirring and mixing thoroughly to obtain nano-silicon dioxide liquid;

[0063] S12: 5-8 parts of nano-silicon dioxide liquid, 2-4 parts of silicon carbide whiskers, 1-3 parts of lanthanum oxide, 2-3 parts of silane coupling agent KH550 and 2-3 parts of compounding agent are mixed and stirred, and after the stirring is completed, the mixture is washed with water and dried to obtain a nano-silicon dioxide regulator.

[0064] The pH value of the phosphate buffer solution in this example is 5.5.

[0065] The stirring speed of the blending and stirring process in this embodiment is 450-550r / min, and the stirring time is 20-30min.

[0066] The compounding agent in this embodiment is hydroxyapatite.

[0067] The curing agent in this embodiment is 2-phenylimidazole curing agent.

[0068] Example 1.

[0069] The present invention provides a method for preparing glass with an easy-to-clean surface. In a dust-free environment of Class 100,000 or higher, the glass is cleaned with a glass cleaning agent, then cleaned with water, then ultrasonically cleaned, and then dried to obtain clean glass with a contact angle of ≤12°; in a dust-free environment of Class 100,000 or higher, the clean glass is activated with a plasma machine to obtain activated glass, and the method further includes the following steps:

[0070] Step 1: Cleaning treatment with cleaning agent:

[0071] (1) Adjust the working pressure of the polisher to 0.5 MPa, hold the pressing handle with your right hand and the auxiliary handle with your left hand, so that the polisher sponge and the easy-to-clean surface of the glass are vertical;

[0072] (2) Then press the air source button on the handle, polish each piece of glass 7 times, at a speed of 2500 rpm;

[0073] (3) Mix the detergent stock solution with water in a ratio of 1:6, shake well for 3 minutes before use, and sprinkle the detergent on the glass back and forth twice at a uniform speed. The amount of detergent used is 10 / ㎡ relative to the area of ​​the glass;

[0074] Step 2: Preparation of easy-to-clean coating:

[0075] First, the raw materials are weighed according to weight percentage: 40% perfluoroalkyl ether, 20% fluorinated polyether compound, 10% methanol and the balance is additive; then the above raw materials are mixed to obtain an easy-to-clean coating; the fluorinated polyether compound disclosed in the patent document CN106496521B;

[0076] The additive raw materials include the following raw materials by weight:

[0077] 40 parts by weight of bisphenol A epoxy resin, 20 parts by weight of acetone solvent, 5 parts by weight of acrylic emulsion, 2 parts by weight of self-cleaning modifier, 2 parts by weight of curing agent, and 3 parts by weight of nano-silicon dioxide regulator;

[0078] Step three: spray the easy-clean coating of step two on the glass surface of step one, with a coating thickness of 8nm, to obtain glass containing the easy-clean coating, and then bake the glass containing the easy-clean coating to obtain glass with surface easy-clean function.

[0079] The ingredients of the cleaning agent stock solution are: sodium dodecylbenzene sulfonate surfactant, content is 6%; sodium gluconate, content is 4%; triacetamide, content is 2.5%; sodium carboxymethyl cellulose, content is 4%; water, content is 83.5%.

[0080] The surface viscosity of glass with easy-to-clean function is 1.0 at an ambient temperature of 23 degrees;

[0081] The oleic acid contact angle of the glass with easy-to-clean surface is 76 degrees, and the oleic acid sliding angle is 2 degrees;

[0082] The dynamic friction coefficient of the glass with the easy-to-clean surface function is 0.02-0.03;

[0083] The plasma treatment method is: equipped with 2-3 plasmas, the power is 800W, the conveyor belt speed is adjusted to 12mm / s, the plasma moving speed is adjusted to 500mm / s, the plasma pressure is 0.4Mpa, the vertical distance between the plasma nozzle and the glass surface is 5mm, the plasma is turned on in advance when the glass is 20cm away from the plasma, and the plasma basically runs in a straight line.

[0084] The preparation method of the self-cleaning modifier of the present embodiment is:

[0085] S1: irradiate the flake graphene in a proton irradiation box for 5 minutes at an irradiation power of 350W. After the irradiation is completed, preheat the graphene at 55°C for 10 minutes to obtain a graphene agent.

[0086] S2: The graphene agent is immersed in a sodium silicate solution with a volume 3 times the total volume of the graphene agent and stirred. After stirring, the solution is filtered and dried to obtain dry flake graphene.

[0087] S3: Add 2 parts of silane coupling agent KH560 and 1 part of nano-silica sol to 4 parts of chitosan solution, and then add 2 parts of silicon nitride and continue to mix thoroughly to obtain a regulating solution;

[0088] S4: The dried flake graphene in S2 and the regulating liquid are mixed in a weight ratio of 5:3 and ball-milled at a speed of 1000 r / min for 2 h. After the ball milling is completed, the mixture is washed with water and dried to obtain a self-cleaning modifier.

[0089] The mass fraction of the sodium silicate solution in this embodiment is 2%; the mass fraction of the chitosan solution is 4%.

[0090] The stirring speed of the stirring process in this embodiment is 450 r / min, and the stirring is performed for 20 minutes.

[0091] The preparation method of the nano silicon dioxide regulator of this embodiment is:

[0092] S11: adding nano-silicon dioxide into the phosphate buffer solution at a weight ratio of 2:5, stirring and mixing thoroughly to obtain nano-silicon dioxide liquid;

[0093] S12: 5 parts of nano-silicon dioxide liquid, 2 parts of silicon carbide whiskers, 1 part of lanthanum oxide, 2 parts of silane coupling agent KH550 and 2 parts of compounding agent are mixed and stirred, and after the stirring is completed, the mixture is washed with water and dried to obtain a nano-silicon dioxide regulator.

[0094] The pH value of the phosphate buffer solution in this example is 5.5.

[0095] The stirring speed of the blending and stirring process in this embodiment is 450r / min, and the stirring time is 20min.

[0096] The compounding agent in this embodiment is hydroxyapatite.

[0097] The curing agent in this embodiment is 2-phenylimidazole curing agent.

[0098] Example 2.

[0099] The present invention provides a method for preparing glass with an easy-to-clean surface. In a dust-free environment of Class 100,000 or higher, the glass is cleaned with a glass cleaning agent, then cleaned with water, then ultrasonically cleaned, and then dried to obtain clean glass with a contact angle of ≤12°; in a dust-free environment of Class 100,000 or higher, the clean glass is activated with a plasma machine to obtain activated glass, and the method further includes the following steps:

[0100] Step 1: Cleaning treatment with cleaning agent:

[0101] (1) Adjust the working pressure of the polisher to 0.5 MPa, hold the pressing handle with your right hand and the auxiliary handle with your left hand, so that the polisher sponge and the easy-to-clean surface of the glass are vertical;

[0102] (2) Then press the air source button on the handle and polish each piece of glass 10 times at a speed of 2500-3000 rpm;

[0103] (3) Mix the detergent stock solution with water in a ratio of 1:7, shake well for 5 minutes before use, and sprinkle the detergent on the glass back and forth twice at a uniform speed. The amount of detergent used is 15g / ㎡ relative to the area of ​​the glass;

[0104] Step 2: Preparation of easy-to-clean coating:

[0105] First, the raw materials are weighed according to weight percentage: 50% perfluoroalkyl ether, 30% fluorinated polyether compound, 15% methanol and the balance is additive; then the above raw materials are mixed to obtain an easy-to-clean coating; the fluorinated polyether compound disclosed in the patent document CN106496521B;

[0106] The additive raw materials include the following raw materials by weight:

[0107] 45 parts by weight of bisphenol A epoxy resin, 30 parts by weight of acetone solvent, 10 parts by weight of acrylic emulsion, 5 parts by weight of self-cleaning modifier, 4 parts by weight of curing agent, and 4 parts by weight of nano-silicon dioxide regulator;

[0108] Step three: spray the easy-clean coating of step two on the surface of the glass in step one, with a coating thickness of 10 nm, to obtain glass containing the easy-clean coating, and then bake the glass containing the easy-clean coating to obtain glass with surface easy-clean function.

[0109] The ingredients of the cleaning agent stock solution are: sodium dodecylbenzene sulfonate surfactant, content is 6%; sodium gluconate, content is 4%; triacetamide, content is 2.5%; sodium carboxymethyl cellulose, content is 4%; water, content is 83.5%.

[0110] The surface viscosity of glass with easy-to-clean function is 1.0 at an ambient temperature of 23 degrees;

[0111] The oleic acid contact angle of the glass with easy-to-clean surface is 76 degrees, and the oleic acid sliding angle is 2 degrees;

[0112] The dynamic friction coefficient of the glass with the easy-to-clean surface function is 0.03;

[0113] The plasma treatment method is: equipped with 3 plasmas, the power is 1200W, the conveyor belt speed is adjusted to 17mm / s, the plasma moving speed is adjusted to 800mm / s, the plasma pressure is 0.8Mpa, the vertical distance between the plasma nozzle and the glass surface is 8mm, the plasma is turned on in advance when the glass is 30cm away from the plasma, and the plasma basically runs in a straight line.

[0114] The preparation method of the self-cleaning modifier of the present embodiment is:

[0115] S1: irradiate the flake graphene in a proton irradiation box for 10 minutes at an irradiation power of 400 W. After the irradiation is completed, preheat the graphene at 60° C. for 20 minutes. After the preheating is completed, a graphene agent is obtained.

[0116] S2: The graphene agent is immersed in a sodium silicate solution with a volume of 5 times the total volume of the graphene agent and stirred. After stirring, the solution is filtered and dried to obtain dry flaky graphene.

[0117] S3: adding 4 parts of silane coupling agent KH560 and 3 parts of nano-silica sol to 7 parts of chitosan solution, and then adding 4 parts of silicon nitride and continuing to mix thoroughly to obtain a regulating solution;

[0118] S4: The dried flake graphene in S2 and the regulating liquid are mixed in a weight ratio of 5:3 and ball-milled at a speed of 1500 r / min for 2 h. After the ball milling is completed, the mixture is washed with water and dried to obtain a self-cleaning modifier.

[0119] The mass fraction of the sodium silicate solution in this embodiment is 5%; the mass fraction of the chitosan solution is 7%.

[0120] The stirring speed of the stirring process in this embodiment is 550 r / min, and the stirring is carried out for 30 minutes.

[0121] The preparation method of the nano silicon dioxide regulator of this embodiment is:

[0122] S11: adding nano-silicon dioxide into the phosphate buffer solution at a weight ratio of 2:5, stirring and mixing thoroughly to obtain nano-silicon dioxide liquid;

[0123] S12: 8 parts of nano-silicon dioxide liquid, 4 parts of silicon carbide whiskers, 3 parts of lanthanum oxide, 3 parts of silane coupling agent KH550 and 3 parts of compounding agent are mixed and stirred, and after the stirring is completed, the mixture is washed with water and dried to obtain a nano-silicon dioxide regulator.

[0124] The pH value of the phosphate buffer solution in this example is 5.5.

[0125] The stirring speed of the blending and stirring process in this embodiment is 550r / min, and the stirring time is 30min.

[0126] The compounding agent in this embodiment is hydroxyapatite.

[0127] The curing agent in this embodiment is 2-phenylimidazole curing agent.

[0128] Example 3.

[0129] The present invention provides a method for preparing glass with an easy-to-clean surface. In a dust-free environment of Class 100,000 or higher, the glass is cleaned with a glass cleaning agent, then cleaned with water, then ultrasonically cleaned, and then dried to obtain clean glass with a contact angle of ≤12°; in a dust-free environment of Class 100,000 or higher, the clean glass is activated with a plasma machine to obtain activated glass, and the method further includes the following steps:

[0130] Step 1: Cleaning treatment with cleaning agent:

[0131] (1) Adjust the working pressure of the polisher to 0.5 MPa, hold the pressing handle with your right hand and the auxiliary handle with your left hand, so that the polisher sponge and the easy-to-clean surface of the glass are vertical;

[0132] (2) Then press the air source button on the handle and polish each piece of glass 8 times at a speed of 2500-3000 rpm;

[0133] (3) Mix the detergent stock solution with water in a ratio of 1:6, shake well for 4 minutes before use, and sprinkle the detergent on the glass back and forth twice at a uniform speed. The amount of detergent used is 12g / ㎡ relative to the area of ​​the glass;

[0134] Step 2: Preparation of easy-to-clean coating:

[0135] First, the raw materials are weighed according to weight percentage: 45% of perfluoroalkyl ether, 25% of fluorinated polyether compound, 15% of methanol and the balance of additives; then the above raw materials are mixed to obtain an easy-to-clean coating; the fluorinated polyether compound disclosed in the patent document CN106496521B;

[0136] The additive raw materials include the following raw materials by weight:

[0137] 42.5 parts by weight of bisphenol A epoxy resin, 25 parts by weight of acetone solvent, 7.5 parts by weight of acrylic emulsion, 3.5 parts by weight of self-cleaning modifier, 3 parts by weight of curing agent, and 3.5 parts by weight of nano-silicon dioxide regulator;

[0138] Step three: spray the easy-clean coating of step two on the glass surface of step one, with a coating thickness of 9 nm, to obtain glass containing the easy-clean coating, and then bake the glass containing the easy-clean coating to obtain glass with surface easy-clean function.

[0139] The ingredients of the cleaning agent stock solution are: sodium dodecylbenzene sulfonate surfactant, content is 6%; sodium gluconate, content is 4%; triacetamide, content is 2.5%; sodium carboxymethyl cellulose, content is 4%; water, content is 83.5%.

[0140] The surface viscosity of glass with easy-to-clean function is 1.0 at an ambient temperature of 23 degrees;

[0141] The oleic acid contact angle of the glass with easy-to-clean surface is 76 degrees, and the oleic acid sliding angle is 2 degrees;

[0142] The dynamic friction coefficient of the glass with the easy-to-clean surface function is 0.025;

[0143] The plasma treatment method is: equipped with 2 plasmas, the power is 1000W, the conveyor belt speed is adjusted to 15mm / s, the plasma moving speed is adjusted to 650mm / s, the plasma pressure is 0.6Mpa, the vertical distance between the plasma nozzle and the glass surface is 6.5mm, the plasma is turned on in advance when the glass is 25cm away from the plasma, and the plasma basically runs in a straight line.

[0144] The preparation method of the self-cleaning modifier of the present embodiment is:

[0145] S1: irradiate the flake graphene in a proton irradiation box for 7.5 minutes at an irradiation power of 375 W. After the irradiation is completed, preheat the graphene at 57° C. for 15 minutes. After the preheating is completed, a graphene agent is obtained.

[0146] S2: The graphene agent is immersed in a sodium silicate solution with a volume of 4 times the total volume of the graphene agent and stirred. After stirring, the solution is filtered and dried to obtain dry flake graphene.

[0147] S3: Add 3 parts of silane coupling agent KH560 and 2 parts of nano-silica sol to 5.5 parts of chitosan solution, and then add 3 parts of silicon nitride and continue to mix thoroughly to obtain a regulating solution;

[0148] S4: The dried flake graphene in S2 and the regulating liquid are mixed in a weight ratio of 5:3 and ball-milled at a speed of 1250 r / min for 2 h. After the ball milling is completed, the mixture is washed with water and dried to obtain a self-cleaning modifier.

[0149] The mass fraction of the sodium silicate solution in this embodiment is 3.5%; the mass fraction of the chitosan solution is 5.5%.

[0150] The stirring speed of the stirring process in this embodiment is 500 r / min, and the stirring is performed for 25 minutes.

[0151] The preparation method of the nano silicon dioxide regulator of this embodiment is:

[0152] S11: adding nano-silicon dioxide into the phosphate buffer solution at a weight ratio of 2:5, stirring and mixing thoroughly to obtain nano-silicon dioxide liquid;

[0153] S12: 6.5 parts of nano-silicon dioxide liquid, 3 parts of silicon carbide whiskers, 2 parts of lanthanum oxide, 2.5 parts of silane coupling agent KH550 and 2.5 parts of compounding agent are mixed and stirred, and after the stirring is completed, the mixture is washed with water and dried to obtain a nano-silicon dioxide regulator.

[0154] The pH value of the phosphate buffer solution in this example is 5.5.

[0155] The stirring speed of the blending and stirring process in this embodiment is 500 r / min, and the stirring time is 25 min.

[0156] The compounding agent in this embodiment is hydroxyapatite.

[0157] The curing agent in this embodiment is 2-phenylimidazole curing agent.

[0158] Comparative Example 1.

[0159] The difference from Example 3 is that no self-cleaning modifier is added.

[0160] Comparative Example 2.

[0161] The difference from Example 3 is that the flaky graphene dried in S2 in the self-cleaning modifier is replaced by graphene.

[0162] Comparative Example 3.

[0163] The difference from Example 3 is that no conditioning liquid is added to the self-cleaning modifier.

[0164] Comparative Example 4.

[0165] The difference from Example 3 is that no nano silicon dioxide regulator is added.

[0166] Comparative Example 5.

[0167] The difference from Example 3 is that silicon carbide whiskers and lanthanum oxide are not added in the preparation of the nano-silicon dioxide regulator.

[0168] Comparative Example 6.

[0169] The difference from Example 3 is that no silane coupling agent KH550 and a compounding agent are added in the preparation of the nano-silica regulator.

[0170] The product performance tests of Examples 1-3 and Comparative Examples 1-6 were conducted. The products were scraped 100 times with a load of 10N, placed in a 2% hydrochloric acid mist for 24 hours, and then placed in a 2% sodium hydroxide mist for 24 hours. The tests were repeated 5 times to test the acid and alkali stability of the products. The tests were as follows:

[0171]

[0172] It can be seen from Comparative Examples 1-6 and Example 3 that the product of Example 3 has excellent easy-to-clean performance, and the product has significant acid and alkali resistance and scratch resistance stability.

[0173] The product does not contain self-cleaning modifiers or nano-silica regulators, and the performance of the product deteriorates significantly. The synergistic effect of the two is the most obvious.

[0174] The S2 dried flaky graphene in the self-cleaning modifier is replaced by graphene, no regulating liquid is added to the self-cleaning modifier, silicon carbide whiskers and lanthanum oxide are not added in the preparation of the nano-silica modifier, and no silane coupling agent KH550 and compounding agent are added in the preparation of the nano-silica modifier. The performance of the products tends to deteriorate. Only the product raw material obtained by the method of the present invention has the most significant product performance effect.

[0175] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above and that the present invention can be implemented in other specific forms without departing from the spirit or essential features of the present invention. Therefore, the embodiments should be considered exemplary and non-restrictive in all respects, and the scope of the present invention is defined by the appended claims rather than the above description, and it is intended that all changes falling within the meaning and scope of the equivalent elements of the claims be included in the present invention.

[0176] In addition, it should be understood that although the present specification is described according to implementation modes, not every implementation mode contains only one independent technical solution. This description of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment may also be appropriately combined to form other implementation modes that can be understood by those skilled in the art.

Claims

1. A method for preparing glass with easy-to-clean surface, characterized in that: The following steps are involved: Step 1: Cleaning treatment with cleaning agent: (1) Adjust the working pressure of the polisher to 0.5 MPa, hold the pressing handle with your right hand and the auxiliary handle with your left hand, so that the polisher sponge is vertical to the easy-to-clean surface of the glass; (2) Then press the air source button on the handle and polish each piece of glass 7-10 times at a speed of 2500-3000 rpm; (3) Mix the detergent stock solution with water in a ratio of 1:6-1:7, shake well for 3-5 minutes before use, and sprinkle the detergent back and forth on the glass twice at a uniform speed. The amount of detergent used is 10g / ㎡-15g / ㎡ relative to the area of ​​the glass; Step 2: Preparation of easy-to-clean coating: First, the raw materials are weighed according to weight percentage: 40-50% of perfluoroalkyl ether, 20-30% of fluorinated polyether compound, 10-20% of methanol and the remainder of additives; then the above raw materials are mixed well to obtain an easy-to-clean coating; The additive raw materials include the following raw materials by weight: 40-45 parts by weight of bisphenol A epoxy resin, 20-30 parts by weight of acetone solvent, 5-10 parts by weight of acrylic emulsion, 2-5 parts by weight of self-cleaning modifier, 2-4 parts by weight of curing agent, and 3-4 parts by weight of nano-silicon dioxide regulator; Step 3: spray the easy-clean coating of step 2 on the surface of the glass in step 1 to a coating thickness of 8-10 nm to obtain glass with the easy-clean coating, and then bake the glass with the easy-clean coating to obtain glass with a surface easy-clean function; The preparation method of the self-cleaning modifier is: S1: irradiate the flake graphene in a proton irradiation box for 5-10 minutes at an irradiation power of 350-400W. After the irradiation is completed, preheat the graphene at 55-60°C for 10-20 minutes to obtain a graphene agent. S2: The graphene agent is immersed in a sodium silicate solution with a volume of 3-5 times the total volume of the graphene agent and stirred. After stirring, the solution is filtered and dried to obtain dry flake graphene. S3: Add 2-4 parts of silane coupling agent KH560 and 1-3 parts of nano-silica sol to 4-7 parts of chitosan solution, and then add 2-4 parts of silicon nitride and continue to mix thoroughly to obtain a regulating solution; S4: The dried flake graphene in S2 and the regulating solution are mixed in a weight ratio of 5:3 and ball-milled at a speed of 1000-1500 r / min for 2 h. After the ball milling is completed, the mixture is washed with water and dried to obtain a self-cleaning modifier; The preparation method of the nano silicon dioxide regulator is: S11: adding nano-silicon dioxide into the phosphate buffer solution at a weight ratio of 2:5, stirring and mixing thoroughly to obtain nano-silicon dioxide liquid; S12: 5-8 parts of nano-silicon dioxide liquid, 2-4 parts of silicon carbide whiskers, 1-3 parts of lanthanum oxide, 2-3 parts of silane coupling agent KH550 and 2-3 parts of compounding agent are mixed and stirred, and after the stirring is completed, the mixture is washed with water and dried to obtain a nano-silicon dioxide regulator; the pH value of the phosphate buffer solution is 5.5; The compounding agent is hydroxyapatite.

2. The method for preparing glass with easy-to-clean surface according to claim 1, characterized in that: The original cleaning agent contains: sodium dodecylbenzene sulfonate surfactant, content is 6%; sodium gluconate, content is 4%; triacetamide, content is 2.5%; sodium carboxymethyl cellulose, content is 4%; Water, content is 83.5%.

3. The method for preparing glass with easy-to-clean surface according to claim 1, characterized in that: The mass fraction of the sodium silicate solution is 2-5%; the mass fraction of the chitosan solution is 4-7%; the stirring speed of the stirring treatment is 450-550 r / min, and the stirring is performed for 20-30 minutes.

4. The method for preparing glass with easy-to-clean surface according to claim 1, characterized in that: The stirring speed of the blending and stirring process in the preparation of the nano-silicon dioxide regulator is 450-550r / min, and the stirring time is 20-30min.

5. The method for preparing glass with easy-to-clean surface function according to claim 1, characterized in that: The curing agent is 2-phenylimidazole curing agent.

6. Glass prepared by the method for preparing glass with easy-to-clean surface function as claimed in any one of claims 1 to 5.

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