Alkaline polishing solution for high-aluminum glass as well as preparation method and application of alkaline polishing solution

Abstract

The invention discloses a high-alumina glass alkaline polishing solution and a preparation method and application thereof, and the high-alumina glass alkaline polishing solution comprises the following components by weight: 50-60% of an abrasive material; 0.2 to 0.65 percent of a pH value regulator; 0.1 to 0.7% of a surfactant; 0.3%-0.5% of a precipitation bulking agent; 0.2%-0.3% of a dispersing agent; 0.1%-0.15% of a thickening agent; 0.1 to 0.15% of a lubricant; 0.1%-0.15% of an activating auxiliary agent; 0.1%-0.15% of a preservative; and 48.8 to 37.25 percent of pure water. When the alkaline polishing solution for the high-aluminum glass is used for polishing the high-aluminum glass, secondary fine scratches are not easily generated, no polishing powder is left after cleaning, no foam is generated in the use process, and the alkaline polishing solution can be easily shaken up without influencing the use even if precipitates are generated after long-time placement.

Description

Technical Field

[0001] The invention relates to a high-aluminum glass alkaline polishing liquid and a preparation method and application thereof, belonging to the technical field of glass polishing. Background Art

[0002] Glass polishing refers to the process of surface finishing glass products on a specific polishing machine using appropriate polishing discs, polishing cloths, polishing brushes and other hardware equipment and facilities, and using appropriate polishing liquid to remove tiny scratches, bumps, wrinkles and tiny foreign objects.

[0003] At present, one type of polishing liquid on the market is based on zirconium oxide and iron oxide as the main polishing material, which is suitable for soft glass products, such as various lens glasses, etc. Another type is alkali-free glass polishing liquid based on rare earth as the main polishing material, which is suitable for thinning and surface finishing of alkali-free liquid crystal screen glass (TFT-LCD glass).

[0004] If the above-mentioned polishing liquid is used to polish high-aluminum alkali-containing glass, secondary fine scratches will be easily generated due to the "hardness" of the high-aluminum alkali-containing glass; or due to the "adhesion" phenomenon of the alkali in the high-aluminum alkali-containing glass, polishing powder will remain on the glass surface during cleaning to form "white frost", which will not only reduce the light transmittance of the glass but also have adverse effects on subsequent processing. Summary of the invention

[0005] In order to overcome the shortcomings of the polishing liquid in the prior art when polishing high-aluminum alkali-containing glass, the present invention provides a high-aluminum glass alkaline polishing liquid and its preparation method and application. The high-aluminum glass alkaline polishing liquid is used to polish high-aluminum glass, which is not easy to produce secondary fine scratches, no polishing powder remains after cleaning, no foam is generated during use, and even if precipitation is generated after being placed for a long time, it can be easily shaken up without affecting use.

[0006] To achieve the above-mentioned purpose, the present invention provides a high-aluminum glass alkaline polishing liquid, which comprises, by weight percentage: 50-60% abrasive; 0.2-0.65% pH regulator; 0.1-0.7% surfactant; 0.3-0.5% precipitating loosening agent; 0.2-0.3% dispersant; 0.1-0.15% thickener; 0.1-0.15% lubricant; 0.1-0.15% activating aid; 0.1-0.15% preservative; 48.8-37.25% pure water.

[0007] The purpose of the present invention and the technical problems to be solved can be further achieved by adopting the following technical measures.

[0008] Preferably, in the aforementioned high-aluminum glass alkaline polishing liquid, the particle size distribution of the abrasive meets the following requirements: D0≤10μm, D10≤4μm, D50 is 0.8-2μm, and D90≥0.5μm.

[0009] Preferably, in the aforementioned high-aluminum glass alkaline polishing liquid, the abrasive is selected from at least one of cerium oxide, lanthanum oxide, aluminum oxide and silicon oxide.

[0010] Preferably, in the aforementioned high-aluminum glass alkaline polishing liquid, the pH regulator consists of a saturated potassium hydroxide solution and lactic acid.

[0011] Preferably, in the aforementioned high-aluminum glass alkaline polishing liquid, the surfactant is ethylene glycol.

[0012] Preferably, in the aforementioned high-aluminum glass alkaline polishing liquid, the precipitation loosening agent is at least one of polyethylene glycol 200, ethylene glycol, glycerol and polyethylene glycol 400.

[0013] Preferably, in the aforementioned high-aluminum glass alkaline polishing liquid, the dispersant is at least one of polyvinyl alcohol propylene ether C-201 and sodium trimetaphosphate.

[0014] Preferably, in the aforementioned high-aluminum glass alkaline polishing liquid, the thickener is sodium chloride or propylene glycol.

[0015] Preferably, in the aforementioned high-aluminum glass alkaline polishing liquid, the lubricant is glycerol or cyclodimethylsiloxane.

[0016] Preferably, in the aforementioned high-aluminum glass alkaline polishing liquid, the activating aid is triethanolamine.

[0017] Preferably, in the aforementioned high-aluminum glass alkaline polishing liquid, the preservative is sodium chloride or sodium gluconate.

[0018] The purpose of the present invention and the technical problem to be solved are achieved by adopting the following technical solutions. A method for preparing a high-aluminum glass alkaline polishing liquid proposed by the present invention comprises the following steps:

[0019] a. In percentage by weight, 0.1-0.7% of a surfactant, 0.1-0.15% of an activating aid, 0.2-0.3% of a dispersant, 0.3-0.5% of a precipitating agent, 0.1-0.15% of a lubricant, and 0.1-0.15% of a preservative are sequentially added into 48.8-37.25% pure water at 70-100° C., dissolved, and stirred to obtain a solution;

[0020] b. Add 50-60% of the abrasive by weight to the solution obtained in step a, and stir to obtain a mixed solution;

[0021] c. Add 0.2-0.65% by weight of a pH regulator to the mixed solution in step b while stirring, so that the pH value of the mixed solution reaches 8-12, stop stirring, and let it stand for aging.

[0022] The purpose of the present invention and the technical problems to be solved can be further achieved by adopting the following technical measures.

[0023] Preferably, in the aforementioned method for preparing the high-aluminum glass alkaline polishing liquid, in step b, the stirring time is not less than 20 minutes; in step c, the static aging time is 24 to 26 hours.

[0024] The purpose of the present invention and the solution to the technical problem can also be achieved by adopting the following technical measures. A polishing method of high-aluminum glass proposed by the present invention comprises the following steps:

[0025] The high-aluminum glass alkaline polishing liquid is mixed with water to prepare a polishing solution, and the high-aluminum glass is polished.

[0026] The purpose of the present invention and the technical problems to be solved can be further achieved by adopting the following technical measures.

[0027] Preferably, in the aforementioned polishing method for high-aluminum glass, the high-aluminum glass alkaline polishing liquid comprises, by weight percentage: 50-60% abrasive; 0.2-0.65% pH regulator; 0.1-0.7% surfactant; 0.3-0.5% precipitating loosening agent; 0.2-0.3% dispersant; 0.1-0.15% thickener; 0.1-0.15% lubricant; 0.1-0.15% activating aid; 0.1-0.15% preservative; 48.8-37.25% pure water.

[0028] Preferably, in the aforementioned high-aluminum glass polishing method, the mass percentage concentration of the polishing solution is 15% to 25%.

[0029] Preferably, in the aforementioned high-aluminum glass polishing method, the aluminum content of the high-aluminum glass is 10-20wt%.

[0030] Compared with the prior art, the high-aluminum glass alkaline polishing liquid and its preparation method and application described in the present invention have the following beneficial effects:

[0031] The present invention uses the high-aluminum glass alkaline polishing liquid to polish the high-aluminum glass, and the polishing yield can reach about 95%. The polishing liquid is not easy to produce secondary fine scratches during the polishing process, no polishing powder remains after cleaning, no foam is generated during use, and even if precipitation is generated after being left for a long time, it can be easily shaken up without affecting use.

[0032] The above description is only an overview of the technical solution of the present invention. In order to more clearly understand the technical means of the present invention and implement it according to the contents of the specification, the preferred embodiments of the present invention are described in detail as follows. DETAILED DESCRIPTION

[0033] In order to further explain the technical means and effects adopted by the present invention to achieve the predetermined invention purpose, the following is a detailed description of a high aluminum glass alkaline polishing liquid and its preparation method and its specific implementation method, structure, characteristics and effects proposed by the present invention in combination with the preferred embodiments. In the following description, different "one embodiment" or "embodiment" does not necessarily refer to the same embodiment. In addition, specific features, structures or characteristics in one or more embodiments may be combined in any suitable form.

[0034] Unless otherwise specified, the materials, reagents, etc. involved below are all commercially available products well known to those skilled in the art; unless otherwise specified, the methods described are all methods known in the art. Unless otherwise defined, the technical terms or scientific terms used should have the usual meanings understood by ordinary technicians in the field to which the present invention belongs. If no specific experimental steps or conditions are specified below, the operations or conditions of the conventional experimental steps described in the literature in the field can be followed.

[0035] Some embodiments of the present invention provide a high-aluminum glass alkaline polishing liquid, which comprises, by weight percentage:

[0036] Abrasive 50-60%; pH regulator 0.2-0.65%; surfactant 0.1-0.7%; precipitating loosening agent 0.3-0.5%; dispersant 0.2-0.3%; thickener 0.1-0.15%; lubricant 0.1-0.15%; activating aid 0.1-0.15%; preservative 0.1-0.15%; pure water 48.8-37.25%.

[0037] It should be noted that the content and functions of the above components are as follows:

[0038] 1) If the abrasive content is less than 50%, the grinding amount decreases and the polishing efficiency decreases, resulting in time cost loss; if the abrasive content is higher than 60%, the surface emulsification effect of some abrasives is insufficient, which will increase the proportion of secondary fine scratches during the polishing process;

[0039] 2) When the organic components such as surfactants, precipitating loosening agents, dispersants, and activating aids are lower than the formula ratio, the emulsification effect of some abrasive surfaces will be insufficient, and the proportion of secondary fine scratches will increase during the polishing process; when it is higher than the formula ratio, coagulation and precipitation are likely to occur, which is not conducive to the long-term storage and use of the polishing liquid.

[0040] In the above technical solution, the particle size distribution of the abrasive is evaluated using a universal powder material particle size testing device Malvetn Instruments or Beckman Coulter Count. When evaluated using Beckman Coulter Count, the particle size should meet the following requirements: D0≤10μm, D10≤4μm, D50 is 0.8-2μm, and D90≥0.5μm.

[0041] When D0>10μm, D10>4μm, the high-aluminum alkali glass being polished is prone to secondary fine scratches due to the coarse particles. When D50 exceeds the range of 0.8~2μm, and D90<0.5μm, insufficient polishing may cause low efficiency, or excessive polishing may cause secondary fine scratches and the surface roughness of the high-aluminum alkali glass being polished may exceed the standard, and the polishing liquid may precipitate in a mud-like manner and be difficult to loosen.

[0042] In some embodiments, optionally, the abrasive is selected from at least one of cerium oxide, lanthanum oxide, aluminum oxide and silicon oxide, wherein the grade of cerium oxide is 1306-38-3, the grade of lanthanum oxide is 1312-81-8, the grade of aluminum oxide is 1344-28-1, and the grade of silicon oxide is 14808-60-7.

[0043] In some embodiments, optionally, the pH regulator is composed of a saturated potassium hydroxide solution and lactic acid. The brand of the saturated potassium hydroxide solution is 1310-58-3.

[0044] In some embodiments, optionally, the surfactant is ethylene glycol, and its brand is CP / AR.

[0045] In some embodiments, optionally, the precipitating loosening agent is selected from at least one of polyethylene glycol 200, ethylene glycol, glycerol and polyethylene glycol 400, wherein the brand of polyethylene glycol 200 is CP / AR; the brand of ethylene glycol is CAS No.107-21-1; the brand of glycerol is CAS No.56-81-5; the brand of polyethylene glycol 400 is CAS No.25322-68-3.

[0046] In some embodiments, optionally, the dispersant is at least one of polyvinyl alcohol propylene ether C-201 and sodium trimetaphosphate, the brand of the polyvinyl alcohol propylene ether C-201 is C-201, and the brand of the sodium trimetaphosphate is 7785-84-4.

[0047] In some embodiments, optionally, the thickening agent is sodium chloride or propylene glycol.

[0048] In some embodiments, optionally, the lubricant is glycerin or cyclodimethylsiloxane.

[0049] In some embodiments, optionally, the activation aid is triethanolamine.

[0050] In some embodiments, optionally, the preservative is sodium chloride or sodium gluconate.

[0051] Some embodiments of the present invention also provide a method for preparing a high-aluminum glass alkaline polishing liquid, comprising the following steps:

[0052] S1 Take the formulated amount of pure water at 70-100°C; if the temperature of the pure water is lower than 70°C, the emulsification effect will be insufficient;

[0053] S2: taking surfactant, activating aid, dispersant, precipitating loosening agent, lubricant and preservative according to the formula, adding them into the pure water of step S1 in sequence, dissolving and stirring evenly; the stirring time is not less than 20 minutes, the purpose of which is to ensure that each component is fully dispersed.

[0054] S3 takes abrasive according to the formula, adds it to the above solution, and stirs evenly;

[0055] S4 adds the formulated amount of pH regulator while stirring to make the pH value of the above mixed solution reach 8-12; the purpose of stirring is to fully disperse the materials and ensure uniform mixing.

[0056] S5: Stop stirring and let the mixture stand for 24 to 26 hours. If the aging time is less than 24 hours, the surface of the polishing powder cannot be fully emulsified, which reduces the emulsification effect and causes more scratches during the polishing process. If the aging time is more than 26 hours, the time cost will be increased.

[0057] Some embodiments of the present invention also provide a polishing method for high-aluminum glass, comprising the following steps:

[0058] The above-mentioned high-aluminum glass alkaline polishing liquid is mixed with water to form a polishing solution, and the high-aluminum glass is polished; the mass percentage concentration of the polishing solution is 15% to 25%. When the concentration is lower than 15%, the polishing efficiency is low, resulting in a waste of time cost; when the concentration is higher than 25%, the fluidity of the polishing solution deteriorates, and the solid components are prone to accumulation and clogging of the pipeline.

[0059] Furthermore, the aluminum content of the high-aluminum glass may be 10-20 wt %, for example, it may be panda glass.

[0060] The present invention will be further described below in conjunction with specific embodiments, but this should not be construed as limiting the scope of protection of the present invention. Some non-essential improvements and adjustments made to the present invention by technicians in this field based on the above-mentioned contents of the present invention still fall within the scope of protection of the present invention.

[0061] The specific formulas of the high aluminum glass alkaline polishing liquid of Examples 1 to 4 and Comparative Example 1 are shown in Table 1 (by weight percentage).

[0062] Table 1

[0063]

[0064]

[0065] The abrasives in the above-mentioned Examples 1 to 4 and Comparative Example 1 are composed of 65% cerium oxide, 35% lanthanum oxide, 5% aluminum oxide, and 5% silicon oxide by weight percentage, wherein the grade of cerium oxide is 1306-38-3, the grade of lanthanum oxide is 1312-81-8, the grade of aluminum oxide is 1344-28-1, and the grade of silicon oxide is 14808-60-7.

[0066] The use effects of the high-aluminum glass alkaline polishing liquid of Examples 1 to 4 and Comparative Example 1 are shown in Table 2, wherein the high-aluminum glass alkaline polishing liquid is mixed with water to form a polishing solution, and the high-aluminum glass is polished; the mass percentage concentration of the above-mentioned polishing solution is 20%; the high-aluminum glass is panda glass, and its aluminum content is 15wt%.

[0067] Table 2

[0068]

[0069] It can be seen from the data in Table 2 that the polishing amount increases with the increase of the abrasive content, but when the amount of abrasive exceeds the formula range of the present invention, it will lead to an increase in fine scratches on the surface of the polished glass. The reason is that when the abrasive content is higher than 60%, the emulsification effect of some abrasive surfaces is insufficient, which will increase the proportion of secondary fine scratches during the polishing process, see Comparative Example 1.

[0070] It can be seen from the data of Examples 1-4 that the abrasive dosage within the formulation range of the present invention achieves the expected polishing amount, number of fine scratches, surface roughness, polishing powder residue, and dispersion and suspension effect requirements.

[0071] The precipitation loosening agent used in Examples 5 to 7 and Comparative Examples 2 to 3 was used to form a mixed solution according to the formula ratio, and the precipitation loosening effect was investigated by changing the addition amount. The specific formula is shown in Table 3.

[0072] Table 3

[0073]

[0074] The abrasives in the above-mentioned Examples 5-7 and Comparative Examples 2-3 are composed of 65% cerium oxide, 35% lanthanum oxide, 5% aluminum oxide, and 5% silicon oxide by weight percentage, wherein the grade of cerium oxide is 1306-38-3, the grade of lanthanum oxide is 1312-81-8, the grade of aluminum oxide is 1344-28-1, and the grade of silicon oxide is 14808-60-7.

[0075] The use effects of the high-aluminum alkali-containing glass polishing liquid of Examples 5 to 7 and Comparative Examples 2 to 3 are shown in Table 4, wherein the above-mentioned high-aluminum glass alkaline polishing liquid is mixed with water to form a polishing solution, and the high-aluminum glass is polished; the mass percentage concentration of the above-mentioned polishing solution is 20%; the high-aluminum glass is panda glass, and its aluminum content is 15wt%.

[0076] Table 4

[0077]

[0078]

[0079] It can be seen from the data in Table 4 that if the amount of precipitation loosening agent in Comparative Example 2 is too low, the abrasive powder will be quickly deposited and the effect cannot be achieved, while if the amount of precipitation loosening agent in Comparative Example 3 is too high, agglomeration will occur. The reason is that if the precipitation loosening agent is lower than the formula ratio, the emulsification effect on the surface of some abrasives is insufficient, the suspension of the polishing powder is reduced, and it is easy to sink to the bottom; if the precipitation loosening agent is higher than the formula component ratio, the organic components are easily condensed and precipitated, which is not conducive to the long-term storage and use of the polishing liquid.

[0080] By testing the use effect of the precipitation loosening agent in accordance with the formula of the present invention, the expected polishing amount, number of fine scratches, surface roughness, dispersion and suspension effect, and polishing powder residue requirements were achieved, see Examples 5-7.

[0081] The above embodiments are only used to explain the content of the present invention, and are not intended to limit the present invention. Simple technical variations within the technical concept of the present invention should be considered to be covered by the content disclosed by the present invention and belong to the protection scope of the present invention.

[0082] In the specification of the present invention, a lot of specific details are described. However, it is understood that embodiments of the present invention can be practiced without these specific details. In some embodiments, well-known methods, structures and techniques are not shown in detail so as not to obscure the understanding of this specification.

[0083] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, the present invention will not further describe various possible combinations.

[0084] In addition, various embodiments of the present invention may be arbitrarily combined, and as long as they do not violate the concept of the present invention, they should also be regarded as the contents disclosed by the present invention.

[0085] The above description is only a preferred embodiment of the present invention and does not limit the present invention in any form. Any simple modification, equivalent change and modification made to the above embodiment according to the technical essence of the present invention still falls within the scope of the technical solution of the present invention.

Claims

1. A high-aluminum glass alkaline polishing liquid, characterized in that: By weight percentage, it contains: Abrasive 50-60%; pH regulator 0.2-0.65%; surfactant 0.1-0.7%; precipitating loosening agent 0.3-0.5%; dispersant 0.2-0.3%; thickener 0.1-0.15%; lubricant 0.1-0.15%; activating aid 0.1-0.15%; preservative 0.1-0.15%; pure water 48.8-37.25%.

2. The high aluminum glass alkaline polishing liquid according to claim 1, characterized in that: The particle size distribution of the abrasive meets the following requirements: D0≤10μm, D10≤4μm, D50 is 0.8-2μm, and D90≥0.5μm.

3. The high aluminum glass alkaline polishing liquid according to claim 1, characterized in that: The abrasive is selected from at least one of cerium oxide, lanthanum oxide, aluminum oxide and silicon oxide; and the pH regulator is composed of a saturated potassium hydroxide solution and lactic acid.

4. The high aluminum glass alkaline polishing liquid according to claim 1, characterized in that: The surfactant is ethylene glycol; the precipitation loosening agent is at least one of polyethylene glycol 200, ethylene glycol, glycerol and polyethylene glycol 400; the dispersant is at least one of polyvinyl alcohol propylene ether C-201 and sodium trimetaphosphate.

5. The high aluminum glass alkaline polishing liquid according to claim 1, characterized in that: The thickener is sodium chloride or propylene glycol; the activating aid is triethanolamine; and the preservative is sodium chloride or sodium gluconate.

6. A method for preparing a high-aluminum glass alkaline polishing liquid, characterized in that: The following steps are involved: a. In percentage by weight, 0.1-0.7% of a surfactant, 0.1-0.15% of an activating aid, 0.2-0.3% of a dispersant, 0.3-0.5% of a precipitating agent, 0.1-0.15% of a lubricant, and 0.1-0.15% of a preservative are sequentially added into 48.8-37.25% pure water at 70-100° C., dissolved, and stirred to obtain a solution; b. Add 50-60% of the abrasive by weight to the solution obtained in step a, and stir to obtain a mixed solution; c. Add 0.2-0.65% by weight of a pH regulator to the mixed solution in step b while stirring, so that the pH value of the mixed solution reaches 8-12, stop stirring, and let it stand for aging.

7. The method for preparing the high aluminum glass alkaline polishing liquid according to claim 6, characterized in that: In step b, the stirring time is not less than 20 minutes; in step c, the static aging time is 24 to 26 hours.

8. A polishing method for high-aluminum glass, characterized in that: The following steps are involved: The high-aluminum glass alkaline polishing liquid is mixed with water to prepare a polishing solution, and the high-aluminum glass is polished.

9. The polishing method for high aluminum glass according to claim 8, characterized in that: The high-aluminum glass alkaline polishing liquid comprises, by weight percentage: 50-60% abrasive; 0.2-0.65% pH regulator; 0.1-0.7% surfactant; 0.3-0.5% precipitating loosening agent; 0.2-0.3% dispersant; 0.1-0.15% thickener; 0.1-0.15% lubricant; 0.1-0.15% activating aid; 0.1-0.15% preservative; 48.8-37.25% pure water; the mass percentage concentration of the polishing solution is 15%-25%.

10. The polishing method for high aluminum glass according to claim 8, characterized in that: The aluminum content of the high aluminum glass is 10-20wt%.

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