Low-radiation functional glass, hollow glass and preparation method

Abstract

The invention relates to the technical field of glass, and discloses low-radiation functional glass, hollow glass and a preparation method, the low-radiation functional glass comprises a glass substrate and a low-radiation functional film, and the glass substrate comprises a first area and a second area; the low-radiation functional film is connected to the glass substrate and covers the first area and the second area; wherein the low-radiation functional film located in the first area is of a hollow structure and is provided with a plurality of first grooves penetrating through the low-radiation functional film in the thickness direction; the low-radiation functional film located in the second area is of a hollow structure and is provided with a plurality of second grooves penetrating through the low-radiation functional film in the thickness direction, and the groove width of the first grooves is larger than that of the second grooves, so that the problem that transmission of signals in the low-radiation functional glass is blocked can be solved, signals with different wavelengths can penetrate through the low-radiation functional glass, and the transmission efficiency of the low-radiation functional glass is improved. And the permeability of signals in the low-radiation functional glass is further improved.

Description

Technical Field

[0001] The present invention relates to the technical field of glass, and in particular to low-radiation functional glass, hollow glass and a preparation method thereof. Background Art

[0002] Low-emissivity functional glass is a type of glass with a low-emissivity functional film on its surface. The low-emissivity functional film can improve the heat insulation and cold insulation performance of the low-emissivity functional glass, thereby reducing the loss of heat or cold in buildings and mobile vehicles to achieve the purpose of energy saving.

[0003] However, low-radiation functional films can easily cause obstruction in the transmission of communication signals, affecting user experience. Summary of the invention

[0004] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, the present invention provides a low-radiation functional glass, which can improve the problem of signal transmission being blocked in the low-radiation functional glass.

[0005] According to the first aspect of the embodiment of the present invention, the low-emissivity functional glass includes a glass substrate and a low-emissivity functional film, the glass substrate includes a first area and a second area; the low-emissivity functional film is connected to the glass substrate and covers the first area and the second area; wherein the low-emissivity functional film located in the first area is a hollow structure, and is provided with a plurality of first grooves penetrating the low-emissivity functional film along the thickness direction; the low-emissivity functional film located in the second area is a hollow structure, and is provided with a plurality of second grooves penetrating the low-emissivity functional film along the thickness direction, and the groove width of the first groove is greater than the groove width of the second groove.

[0006] According to the embodiment of the present invention, the low-radiation functional glass has at least the following beneficial effects: the low-radiation functional film located in the first area is provided with a plurality of hollow structures penetrating the low-radiation functional film along the thickness direction, and the low-radiation functional film located in the first area is provided with a plurality of first grooves; the low-radiation functional film located in the second area is a hollow structure, and the low-radiation functional film located in the second area is provided with a plurality of second grooves penetrating the low-radiation functional film along the thickness direction, so that the low-radiation functional film at the position of the first groove and the second groove is removed, and the signal can pass through the low-radiation functional glass from the position of the first groove and the second groove, so that the low-radiation functional glass can not only have better heat insulation and cold insulation performance, but also improve the signal transmittance in the low-radiation functional glass, and improve the situation where the signal is blocked in the low-radiation functional glass. In addition, the groove width of the first groove is greater than the groove width of the second groove, so that the first groove and the second groove can allow signals of different wavelengths to pass through, further improving the signal transmittance in the low-radiation functional glass.

[0007] According to some embodiments of the present invention, the width of the first groove is ≥1 mm, and / or the width of the second groove is ≥15 μm and ≤30 μm.

[0008] According to some embodiments of the present invention, the glass substrate also includes a third region, the first region and the third region are respectively located on opposite sides along the height direction of the glass substrate, the second region is located between the first region and the third region, and the low-emissivity functional film also covers the third region; the low-emissivity functional film located in the third region is a hollow structure, and is provided with a plurality of third grooves that penetrate the low-emissivity functional film along the thickness direction, and the groove width of the third groove is greater than the groove width of the second groove.

[0009] According to some embodiments of the present invention, an area of ​​the second region is larger than an area of ​​the first region, and / or an area of ​​the second region is larger than an area of ​​the third region.

[0010] According to the preparation method of the second aspect of the present invention, the preparation method is applied to the low-emissivity functional glass in any of the above-mentioned embodiments, and the preparation method includes: providing a glass substrate, the glass substrate includes a first area and a second area; forming a low-emissivity functional film on the surface of the glass substrate, the low-emissivity functional film covering the first area and the second area; processing a plurality of first grooves penetrating the low-emissivity functional film along the thickness direction on the low-emissivity functional film located in the first area to form a hollow structure; and processing a plurality of second grooves penetrating the low-emissivity functional film along the thickness direction on the low-emissivity functional film located in the second area to form a hollow structure, wherein the groove width of the first groove is greater than the groove width of the second groove.

[0011] According to some embodiments of the present invention, a plurality of first grooves penetrating the low-radiation functional film along the thickness direction are processed in the low-radiation functional film located in the first area, including: using a mask etching method to etch a plurality of first grooves penetrating the low-radiation functional film along the thickness direction in the low-radiation functional film located in the first area; and / or, a plurality of second grooves penetrating the low-radiation functional film along the thickness direction are processed in the low-radiation functional film located in the second area to form a hollow structure, including: using a laser etching method to etch a plurality of second grooves penetrating the low-radiation functional film along the thickness direction in the low-radiation functional film located in the second area to form a hollow structure.

[0012] According to some embodiments of the present invention, a plurality of first grooves penetrating the low-emissivity functional film along the thickness direction are processed in the low-emissivity functional film located in the first area, including: coating a hollow mask coating in the first area; plating the low-emissivity functional film on the surface of the mask coating, the low-emissivity functional film covering the first area and the second area, the mask coating being located between the low-emissivity functional film and the glass substrate; and removing the mask coating and the low-emissivity functional film on the surface of the mask coating using a solvent to form a plurality of first grooves penetrating the low-emissivity functional film along the thickness direction in the low-emissivity functional film located in the first area.

[0013] According to some embodiments of the present invention, the area of ​​the mask coating on the surface of the glass substrate accounts for ≥5% and ≤20%, and / or the thickness of the mask coating is ≥30 μm and ≤35 μm.

[0014] According to some embodiments of the present invention, the glass substrate also includes a third region, the first region and the third region are respectively located on opposite sides along the height direction of the glass substrate, the second region is located between the first region and the third region, and the low-emissivity functional film also covers the third region. The preparation method also includes: using a mask etching method to etch a plurality of third grooves that penetrate the low-emissivity functional film along the thickness direction in the low-emissivity functional film located in the third region, and the groove width of the third groove is greater than the groove width of the second groove.

[0015] According to the insulating glass of the embodiment of the third aspect of the present invention, the insulating glass includes a first glass and a second glass that are relatively connected, a cavity for accommodating an inert gas is provided between the first glass and the second glass, and at least one of the first glass and the second glass is the low-emissivity functional glass in any of the above embodiments.

[0016] Additional aspects and advantages of the present invention will be given in part in the following description and in part will be obvious from the following description, or will be learned through practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] The present invention will be further described below with reference to the accompanying drawings and embodiments, wherein:

[0018] Figure 1 A schematic diagram of the structure of the insulating glass provided by an embodiment of the present invention is shown;

[0019] Figure 2 A schematic diagram of the structure of the low-emissivity functional glass provided by an embodiment of the present invention is shown;

[0020] Figure 3 A schematic structural diagram of low-emissivity functional glass provided by another embodiment of the present invention is shown;

[0021] Figure 4 A schematic structural diagram of low-emissivity functional glass provided by another embodiment of the present invention is shown;

[0022] Figure 5 A schematic flow chart of a method for preparing glass provided in an embodiment of the present invention is shown.

[0023] Reference numerals:

[0024] Insulating glass 100; first glass 110; second glass 130; cavity 150;

[0025] Low-emissivity functional glass 170 ; glass substrate 171 ; first region 1711 ; second region 1713 ; third region 1715 ; low-emissivity functional film 173 ; first groove 1731 ; second groove 1733 ; third groove 1735 ; height direction Y. DETAILED DESCRIPTION

[0026] Embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

[0027] In the description of the present invention, it should be understood that descriptions involving orientations, such as up, down, front, back, left, right, etc., and orientations or positional relationships indicated are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0028] In the description of the present invention, "several" means more than one, "many" means more than two, "greater than", "less than", "exceed", etc. are understood to exclude the number itself, and "above", "below", "within", etc. are understood to include the number itself. If there is a description of "first" or "second", it is only used for the purpose of distinguishing the technical features, and cannot be understood as indicating or implying the relative importance or implicitly indicating the number of the indicated technical features or implicitly indicating the order of the indicated technical features.

[0029] In the description of the present invention, unless otherwise clearly defined, terms such as setting, installing, connecting, etc. should be understood in a broad sense, and technicians in the relevant technical field can reasonably determine the specific meanings of the above terms in the present invention based on the specific content of the technical solution.

[0030] In the description of the present invention, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner.

[0031] See also Figure 1 to Figure 2 The embodiment of the present application provides a hollow glass 100, which can be used for doors and windows of buildings, windshields and windows of vehicles, etc.

[0032] For ease of description, the following explanation will be given by taking the insulating glass 100 applied to doors and windows of a building as an example.

[0033] The insulating glass 100 may be light-transmissive and reduce the loss of heat or cold in the building, reduce the energy consumption of the indoor heating or cooling system, and contribute to energy conservation and emission reduction. For example, the cooling system may refer to an air conditioner or other cooling system, and the heating system may refer to an air conditioner, a radiator, a floor heating system or other heating system.

[0034] The insulating glass 100 includes a first glass 110 and a second glass 130 that are relatively connected. A cavity 150 is provided between the first glass 110 and the second glass 130. The cavity 150 can be used to accommodate an inert gas, thereby reducing the thermal conductivity of the insulating glass 100, reducing heat loss, reducing condensation, maintaining light transmittance, and reducing the temperature and humidity changes inside the insulating glass 100, thereby improving the structural stability of the insulating glass 100.

[0035] Along the direction from the first glass 110 to the second glass 130 , the thickness of the cavity may be 6 mm, 9 mm, 12 mm, 16 mm, 18 mm, 20 mm or 24 mm.

[0036] As an example, the cavity 150 may be filled with argon gas, or the cavity 150 may be filled with other inert gases.

[0037] At least one of the first glass 110 and the second glass 130 is a low-emissivity functional glass 170 (Low-E glass). The low-emissivity functional glass 170 can reflect infrared rays and can reflect and absorb electromagnetic waves, thereby reducing the loss of indoor heat or cold and reducing the energy consumption of the indoor heating or cooling system.

[0038] See also Figures 2 to 3 In some embodiments, the low-emissivity functional glass 170 may be a single-functional layer of low-emissivity functional glass 170 or a multi-functional layer of low-emissivity functional glass 170 .

[0039] The low-emissivity functional glass 170 includes a glass substrate 171 and a low-emissivity functional film 173 .

[0040] The glass substrate 171 may be made of light-transmitting glass, for example, the glass substrate 171 may be made of white glass or other glass.

[0041] The glass substrate 171 includes a first region 1711 and a second region 1713 .

[0042] As an example, the first region 1711 and the second region 1713 may be located on the same surface of the glass substrate 171. The first region 1711 may be located near a side region of the glass substrate 171, and the second region 1713 may be located in a middle region of the glass substrate 171.

[0043] The first region 1711 and the second region 1713 may be connected or spaced apart.

[0044] The first region 1711 and the second region 1713 may be connected to completely cover the surface of the glass substrate 171 , or the first region 1711 and the second region 1713 may be connected to cover a portion of the surface of the glass substrate 171 , or the first region 1711 and the second region 1713 may be spaced apart to cover a portion of the surface of the glass substrate 171 .

[0045] The low-radiation functional film 173 is connected to the glass substrate 171 and covers the first area 1711 and the second area 1713. The low-radiation functional film 173 can be used to reflect infrared rays and can reflect and absorb electromagnetic waves, thereby improving the heat insulation and cold insulation performance of the low-radiation functional glass 170 and reducing light pollution.

[0046] The low-emissivity functional film 173 may be formed by compounding multiple film layers.

[0047] As an example, taking the low-radiation functional glass 170 as a single-functional layer, the low-radiation functional film 173 may include a first dielectric layer, a dielectric combination layer, a first functional protective layer, a functional layer, a second functional protective layer, a second dielectric layer, and a third dielectric layer, which are sequentially distributed. Among them, the first dielectric layer may be a SiNx layer, the dielectric combination layer may be a ZnAlO layer, the first functional protective layer and the second functional protective layer may both be NiCr layers, the functional layer may be a silver layer (Ag layer), the second dielectric layer may be a ZnOx layer, and the third dielectric layer may be a SiNx layer.

[0048] It is understandable that the above structure of the low-emissivity functional film 173 is only an example, and the low-emissivity functional film 173 may also adopt other structures, for example, the functional layer may also adopt a copper layer, a gold layer or other metal layer.

[0049] The low-emissivity functional film 173 located in the first area 1711 is provided with a plurality of hollow structures penetrating the low-emissivity functional film 173 along the thickness direction, and the low-emissivity functional film 173 located in the first area 1711 is provided with a plurality of first grooves 1731; the low-emissivity functional film 173 located in the second area 1713 is a hollow structure, and the low-emissivity functional film 173 located in the second area 1713 is provided with a plurality of second grooves 1733 penetrating the low-emissivity functional film 173 along the thickness direction. In this way, the low-emissivity functional film 173 at the positions of the first grooves 1731 and the second grooves 1733 is removed, and the signal can pass through the low-emissivity functional glass 170 from the positions of the first grooves 1731 and the second grooves 1733, so that the low-emissivity functional glass 170 can not only have better heat insulation and cold insulation performance, but also improve the transmittance of the signal in the low-emissivity functional glass 170, thereby improving the problem of obstruction of signal transmission in the low-emissivity functional glass 170.

[0050] The thickness direction is the direction from the first glass 110 to the second glass 130 .

[0051] The width of the first groove 1731 is greater than the width of the second groove 1733 , so that the first groove 1731 and the second groove 1733 can allow signals of different wavelengths to pass through, further improving the transmittance of the signal in the low-emissivity functional glass 170 .

[0052] Specifically, for low-frequency signals and high-frequency signals, the wavelength of low-frequency signals is longer than that of high-frequency signals, and the width of the first groove 1731 is large, so that low-frequency signals are more likely to pass through the low-emissivity functional glass 170 from the first groove 1731, while the width of the second groove 1733 is narrow, which can facilitate the passage of high-frequency signals. In addition, since the groove width of the second groove 1733 is narrow, the area occupied by the second groove 1733 on the surface of the glass substrate 171 can be reduced, which helps to ensure that the low-emissivity functional film 173 has a sufficiently large coverage area on the surface of the glass substrate 171, and helps to ensure the heat insulation and cold insulation performance of the low-emissivity functional glass 170.

[0053] In some embodiments, the shape of the first groove 1731 can be selected in a variety of ways. For example, the shape of the first groove 1731 can be circular (eg, Figure 3 As shown), bars (as Figure 4 As shown), ellipse, polygon, semicircle or other shapes.

[0054] As an example, Figure 3 As shown, the first groove 1731 may be a circular groove, and a plurality of circular grooves may be distributed in the first area 1711 at intervals.

[0055] As another example, Figure 4As shown, the first groove 1731 may be a strip-shaped groove, and the strip-shaped grooves may be distributed at intervals. For example, the strip-shaped grooves may be distributed in sequence at intervals along the height direction Y of the low-emissivity functional glass 170 in the first region 1711 .

[0056] It is understandable that the plurality of first grooves 1731 may be evenly distributed or unevenly distributed. Some of the plurality of first grooves 1731 may be interconnected, or two adjacent grooves in the plurality of grooves may be spaced apart from each other. The positions of the plurality of first grooves 1731 in the first region 1711 may be designed as required to form a hollow structure with different patterns, for example, the pattern may be a dot pattern (such as Figure 3 ), honeycomb pattern, grid pattern, stripe pattern (as shown in Figure 4 as shown) or other shapes.

[0057] Similarly, there are many options for the shape of the second groove 1733. For example, the shape of the second groove 1733 can be circular, bar-shaped, elliptical, polygonal, semicircular or other shapes.

[0058] As an example, the second groove 1733 may be a circular groove, and a plurality of circular grooves may be distributed in the second area 1713 at intervals.

[0059] As another example, the second groove 1733 may be a strip-shaped groove, and the strip-shaped grooves may be distributed at intervals. For example, the strip-shaped grooves may be distributed in sequence at intervals along the height direction Y of the low-emissivity functional glass 170 in the second region 1713 .

[0060] It is understandable that the plurality of second grooves 1733 may be evenly distributed or unevenly distributed. Some of the plurality of second grooves 1733 may be interconnected, or two adjacent grooves in the plurality of grooves may be spaced apart from each other. The positions of the plurality of second grooves 1733 in the second region 1713 may be designed as required to form hollow structures of different patterns, for example, the pattern may be a dot pattern, a honeycomb pattern, a grid pattern, a stripe pattern or a pattern of other shapes.

[0061] In some embodiments, the width of the first groove 1731 is ≥ 1 mm. In this way, the minimum width of the first groove 1731 is controlled, and the width of the first groove 1731 is controlled at the millimeter level, which helps to ensure the transmittance of high-frequency signals and facilitates processing.

[0062] As an example, the width of the first groove 1731 may be 1 mm, 1.5 mm, 2 mm, 5 mm or other values.

[0063] It can be understood that the width of the first groove 1731 can be designed according to actual needs. For example, the width of the first groove 1731 can be designed according to the actual size of the low-emissivity functional glass 170 .

[0064] In some embodiments, the width of the second groove 1733 is ≥15μm and ≤30μm. In this way, the width of the second groove 1733 is controlled within a suitable range. Controlling the width of the second groove 1733 at the micron level helps to ensure the transmittance of low-frequency signals and reduce the impact of the second groove 1733 on the transmittance of the low-emissivity functional glass 170.

[0065] As an example, the width of the second groove 1733 may be 15 μm, 18 μm, 22 μm, 30 μm, or other values ​​in the range of [15 μm, 30 μm].

[0066] It can be understood that the width of the second groove 1733 can be designed according to actual needs. For example, the width of the second groove 1733 can be designed according to the actual size of the low-emissivity functional glass 170 .

[0067] In some embodiments, the glass substrate 171 may further include a third region 1715, the first region 1711 and the third region 1715 are respectively located on opposite sides along the height direction Y of the glass substrate 171, the second region 1713 is located between the first region 1711 and the third region 1715, the low-emissivity functional film 173 also covers the third region 1715, the low-emissivity functional film 173 located in the third region 1715 is a hollow structure, and the low-emissivity functional film 173 located in the third region 1715 is provided with a plurality of third grooves 1735 penetrating the low-emissivity functional film 173 along the thickness direction, in this way, the low-emissivity functional film 173 at the position of the third groove 1735 is removed, which helps the signal to pass through the low-emissivity functional glass 170 from the third groove 1735.

[0068] The width of the third groove 1735 is greater than the width of the second groove 1733, so that the third groove 1735 and the second groove 1733 can allow signals of different wavelengths to pass through, further improving the transmittance of the signal in the low-emissivity functional glass 170. For example, the width of the third groove 1735 is larger, and low-frequency signals are more likely to pass through the low-emissivity functional glass 170 from the third groove 1735.

[0069] In addition, since the second groove 1733 of the second area 1713 is a micron-sized groove, the visual effect on the low-emissivity functional glass 170 is weak, and the appearance of the low-emissivity functional glass 170 is less affected. When the low-emissivity functional glass 170 is installed, the first area 1711 and the third area 1715 are located at the upper and lower sides of the height direction Y of the low-emissivity functional glass 170, and the second area 1713 is located in the middle of the low-emissivity functional glass 170. The second area 1713 is the main viewing area, and it is easier for users to observe the other side of the low-emissivity functional glass 170 through the second area 1713, and the micron-sized second groove 1733 used in the second area 1713 has less visual impact on users.

[0070] As an example, the pattern of the hollow structure formed by the low-emissivity functional film 173 located in the first area 1711 and the pattern of the hollow structure formed by the low-emissivity functional film 173 located in the third area 1715 can be substantially the same, and the width of the first groove 1731 and the width of the third groove 1735 can be substantially equal.

[0071] It should be noted that when the first groove 1731, the second groove 1733 or the third groove 1735 is a circular groove, the groove width may refer to the diameter or radius of the circular groove; when the first groove 1731, the second groove 1733 or the third groove 1735 is a polygonal groove, the first groove 1731 may refer to the diameter or radius of the inscribed circle, or the diameter or radius of the circumscribed circle.

[0072] also, Figure 2 , Figure 3 and Figure 4 The dotted lines are only used as the dividing lines between the first area 1711 and the second area 1713, and between the second area 1713 and the third area 1715, for easy understanding. In the low-emissivity functional glass 170 actually produced, there may or may not be dividing lines between the areas, which can be set according to actual needs.

[0073] In some embodiments, the area of ​​the second region 1713 is larger than that of the first region 1711 , ensuring that the low-emissivity functional film 173 has a sufficiently large coverage area on the glass substrate 171 , helping to ensure the heat-insulating and cold-insulating properties of the low-emissivity functional glass 170 , and also helping to reduce the visual impact of the first groove 1731 on the low-emissivity functional glass 170 .

[0074] In some embodiments, the area of ​​the second region 1713 is larger than the area of ​​the third region 1715 , ensuring that the low-emissivity functional film 173 has a sufficiently large coverage area on the glass substrate 171 , helping to ensure the heat and cold insulation performance of the low-emissivity functional glass 170 , and also helping to reduce the visual impact of the third groove 1735 on the low-emissivity functional glass 170 .

[0075] In some embodiments, the area of ​​the first region 1711 and the area of ​​the third region 1715 can be the same, and the width of the first groove 1731 and the width of the second groove 1733 can also be the same, so that the low-emissivity functional glass 170 can be more symmetrical, the aesthetics of the low-emissivity functional glass 170 can be improved, and the first groove 1731 and the third groove 1735 can be easier to process.

[0076] In some embodiments, the first region 1711 and the third region 1715 can respectively occupy 1 / 4 of the surface area of ​​the glass substrate 171, and the second region 1713 can occupy 1 / 2 of the surface area of ​​the low-emissivity functional glass 170, which helps the second region 1713 to have a sufficiently large area, ensures that the low-emissivity functional film 173 has a sufficiently large coverage area on the glass substrate 171, ensures the heat insulation and cold insulation performance of the low-emissivity functional glass 170, and also helps to reduce the visual impact of the first groove 1731 and the third groove 1735 on the low-emissivity functional glass 170.

[0077] See also Figure 2 , Figure 3 and Figure 5 The embodiment of the present application further provides a preparation method, which can be applied to the low-emissivity functional glass 170 in the above embodiment. The preparation method includes steps S10, S20, S30 and S40.

[0078] S10 : providing a glass substrate 171 , wherein the glass substrate 171 includes a first region 1711 and a second region 1713 .

[0079] The glass substrate 171 may be made of tempered glass, for example, the glass substrate 171 may be made of tempered and light-transmissive white glass.

[0080] S20 : ​​forming a low-emissivity functional film 173 on the surface of the glass substrate 171 , wherein the low-emissivity functional film 173 covers the first region 1711 and the second region 1713 .

[0081] The low-emissivity functional film 173 completely covers and connects to the surface of the glass substrate 171 . The low-emissivity functional film 173 may also only cover and connect to the first region 1711 and the second region 1713 of the glass substrate 171 .

[0082] The low-emissivity functional film 173 can be used to improve the heat and cold insulation performance of the low-emissivity functional glass 170 and can also reduce light pollution.

[0083] The film layer structure of the low-emissivity functional film 173 may refer to the above-mentioned embodiment and will not be described in detail here.

[0084] S30: processing a plurality of first grooves 1731 penetrating the low-emissivity functional film 173 along the thickness direction on the low-emissivity functional film 173 located in the first region 1711 to form a hollow structure.

[0085] In this way, the low-emissivity functional film 173 at the position of the first groove 1731 is removed in the first area 1711, and the signal can easily pass through the low-emissivity functional glass 170 from the first groove 1731, so that the low-emissivity functional glass 170 can not only have better heat insulation and cold insulation performance, but also improve the transmittance of the signal in the low-emissivity functional glass 170, thereby improving the situation where the signal transmission in the low-emissivity functional glass 170 is blocked.

[0086] The shape and distribution of the first grooves 1731 can be designed according to the requirements to form hollow structures with different patterns. For details, please refer to the above embodiments, which will not be described here.

[0087] In some embodiments, step S30 may include the step of: etching a plurality of first grooves 1731 penetrating the low-emissivity functional film 173 along the thickness direction in the low-emissivity functional film 173 located in the first region 1711 using a mask etching method.

[0088] In this way, the mask etching method can more conveniently etch the first groove 1731 with sufficient width, which helps to improve the processing speed and save the processing cost.

[0089] In some embodiments, step S30 may include the following steps:

[0090] 1) A hollow mask coating is applied to the first area 1711 .

[0091] 2) A low-emissivity functional film 173 is plated on the surface of the mask coating. The low-emissivity functional film 173 covers the first region 1711 and the second region 1713 . The mask coating is located between the low-emissivity functional film 173 and the glass substrate 171 .

[0092] 3) Using a solvent to remove the mask coating and the low-emissivity functional film 173 on the surface of the mask coating, so as to form a plurality of first grooves 1731 penetrating the low-emissivity functional film 173 in the thickness direction in the low-emissivity functional film 173 located in the first region 1711 .

[0093] In this way, this embodiment coats a hollow mask coating on the surface of the glass substrate 171, covers the surface of the mask coating with a low-radiation functional film 173, and then removes the mask coating and the low-radiation functional film 173 on the surface of the mask coating through solvent cleaning. A plurality of first grooves 1731 for facilitating signal transmission are formed at the location of the mask coating, and the processing is relatively simple, which improves the processing speed and reduces the processing cost.

[0094] Specifically, the mask coating may include a coating area and a first hollow area, the coating area may be covered with a coating, and the coating may be a composite coating composed of organic components and inorganic components. For example, the coating may include components such as surfactants, pigments, resins, additives, etc. The first hollow area may refer to a plurality of hole structures distributed in the coating area.

[0095] After coating, the low-emissivity functional glass 170 is dried. The drying temperature can be controlled at 215° C. to 225° C., the speed can be 20 mm / s, and the drying time can be 8 min to 10 min to ensure that the mask coating is fully cured.

[0096] After the mask coating is cured, a low-emissivity functional film 173 is deposited. The low-emissivity functional film 173 covers both the coating area and the first hollow area, that is, the low-emissivity functional film 173 is connected to the mask coating in the coating area, and the low-emissivity functional film 173 is connected to the glass substrate 171 in the first hollow area.

[0097] After coating the low-emissivity functional film 173, the glass substrate 171 is cleaned with a solvent to remove the low-emissivity functional film 173 in the coating area and on the surface of the coating area, and retain the low-emissivity functional film 173 in the first hollow area, thereby forming a groove (i.e., the first groove 1731) in the original coating area.

[0098] When cleaning the low-emissivity functional glass 170, thinner can be used for cleaning. Thinner can be dissolved in various organic solvents and can effectively clean the solidified coating. Among them, thinner can include toluene, butyl acetate, cyclohexanone, isopentyl acetate, ethylene glycol ethyl ether acetate and other components.

[0099] After cleaning the low-emissivity functional glass 170 with thinner water, you can use pure water to clean the low-emissivity functional glass 170 to remove the residue.

[0100] In some embodiments, the above step of coating the hollow mask coating in the first area 1711 includes the steps of: printing the hollow mask coating in the first area 1711 by screen printing or spraying.

[0101] In this way, in this embodiment, the mask coating is printed in the first area 1711 through the screen printing process, which helps to improve the processing speed and save the processing cost.

[0102] Specifically, the hollowed-out mask coating is printed in the first area 1711 by using a screen printing process, including the following steps:

[0103] 1) preparing a printing mold, wherein the printing mold comprises a shielding area and a second hollow area;

[0104] 2) Place the printing mold above the glass substrate 171 and spray paint onto the printing mold. Part of the paint is blocked by the blocking area, and part of the paint can pass through the second hollow area and adhere to the surface of the glass substrate 171 to form a mask coating.

[0105] In some embodiments, the area ratio of the mask coating on the surface of the glass substrate 171 is ≥5% and ≤20%. In this way, controlling the area ratio of the mask coating on the glass substrate 171 within an appropriate range helps to ensure that the first groove 1731 has sufficient area to facilitate signal transmission, and also helps to ensure that the low-emissivity functional film 173 has sufficient area to ensure the heat insulation and cold insulation performance of the low-emissivity functional glass 170.

[0106] As an example, the area proportion of the mask coating on the surface of the low-emissivity functional glass 170 may be 5%, 8%, 13%, 20% or other values ​​in the interval [5%, 20%].

[0107] It can be understood that the area ratio of the mask coating on the surface of the glass substrate 171 can also refer to the sum of the area ratios of the mask coating in the first area 1711 and the mask coating in the third area 1715, that is, the area ratio of the mask coating in the first area 1711 and the mask coating in the third area 1715 on the surface of the glass substrate 171 is ≥5% and ≤20%.

[0108] In some embodiments, the thickness of the mask coating is ≥30 μm and ≤35 μm. In this way, controlling the thickness of the mask coating within an appropriate range helps to avoid the mask coating being too thin, which may affect the glass substrate 171 when a solvent is subsequently used to remove the mask coating. It can also avoid the mask coating being too thick, which may make it difficult to remove.

[0109] S40 : processing a plurality of second grooves 1733 penetrating the low-emissivity functional film 173 in the thickness direction on the low-emissivity functional film 173 located in the second region 1713 to form a hollow structure, wherein the groove width of the first groove 1731 is greater than the groove width of the second groove 1733 .

[0110] In this way, in the second area 1713, the low-emissivity functional film 173 at the position of the second groove 1733 is removed, and the signal can easily pass through the low-emissivity functional glass 170 from the second groove 1733, so that the low-emissivity functional glass 170 can not only have better heat insulation and cold insulation performance, but also improve the transmittance of the signal in the low-emissivity functional glass 170, thereby improving the situation where the signal transmission in the low-emissivity functional glass 170 is blocked.

[0111] In addition, the first groove 1731 and the second groove 1733 have different groove widths, so that the first groove 1731 and the second groove 1733 can allow signals of different wavelengths to pass through, further improving the transmittance of the signal in the low-emissivity functional glass 170. Specifically, for low-frequency signals and high-frequency signals, the wavelength of the low-frequency signal is longer than that of the high-frequency signal, the width of the first groove 1731 is larger, and the low-frequency signal is easier to pass through the low-emissivity functional glass 170 from the first groove 1731, while the width of the second groove 1733 is narrower, which can facilitate the passage of high-frequency signals. In addition, since the groove width of the second groove 1733 is narrower, the area occupied by the second groove 1733 on the surface of the glass substrate 171 can be reduced, which helps to ensure that the low-emissivity functional film 173 has a sufficiently large coverage area on the surface of the glass substrate 171, and helps to ensure the heat insulation and cold insulation performance of the low-emissivity functional glass 170.

[0112] In some embodiments, step S40 may further include the step of: using laser etching to etch a plurality of second grooves 1733 penetrating the low-emissivity functional film 173 in the thickness direction in the low-emissivity functional film 173 located in the second region 1713 to form a hollow structure.

[0113] The laser etching method can etch a smaller and more precise second groove 1733 on the surface of the low-emissivity functional film 173 , which helps to etch a micron-level second groove 1733 with higher precision, reduce the visual impact of the second groove 1733 on the low-emissivity functional glass 170 , and help ensure the light transmittance of the low-emissivity functional glass 170 .

[0114] In some embodiments, the preparation method may further include the steps of: using a mask etching method to etch a plurality of third grooves 1735 penetrating the low-radiation functional film 173 along the thickness direction in the low-radiation functional film 173 located in the third region 1715 , wherein the width of the third groove 1735 is greater than the width of the second groove 1733 .

[0115] The formation method of the third groove 1735 can refer to the formation method of the first groove 1731, and will not be repeated here.

[0116] It should be noted that after the step of coating the low-emissivity functional film 173, the steps of forming the first groove 1731 and the third groove 1735 can be performed simultaneously or sequentially, that is, the first groove 1731 is formed first, the third groove 1735 is formed, and then the second groove 1733 is formed; or the third groove 1735 is formed first, then the first groove 1731 is formed, and then the second groove 1733 is formed; or the first groove 1731 and the third groove 1735 are formed simultaneously, and then the second groove 1733 is formed. It is understandable that the second groove 1733 can also be formed first, and then the first groove 1731 and the third groove 1735 are formed.

[0117] In the low-emissivity functional glass 170, the hollow glass 100 and the preparation method provided by the embodiments of the present application, the low-emissivity functional film 173 located in the first area 1711 is provided with a plurality of hollow structures penetrating the low-emissivity functional film 173 along the thickness direction, and the low-emissivity functional film 173 located in the first area 1711 is provided with a plurality of first grooves 1731; the low-emissivity functional film 173 located in the second area 1713 is a hollow structure, and the low-emissivity functional film 173 located in the second area 1713 is provided with a plurality of second grooves 1733 penetrating the low-emissivity functional film 173 along the thickness direction. In this way, the low-emissivity functional film 173 at the positions of the first grooves 1731 and the second grooves 1733 is removed, and the signal can pass through the low-emissivity functional glass 170 from the positions of the first grooves 1731 and the second grooves 1733, so that the low-emissivity functional glass 170 can not only have better heat insulation and cold insulation performance, but also improve the transmittance of the signal in the low-emissivity functional glass 170, and improve the situation where the signal transmission in the low-emissivity functional glass 170 is blocked. In addition, the width of the first groove 1731 is greater than the width of the second groove 1733 , so that the first groove 1731 and the second groove 1733 can allow signals of different wavelengths to pass through, further improving the transmittance of the signal in the low-emissivity functional glass 170 .

[0118] The embodiments of the present invention are described in detail above in conjunction with the accompanying drawings, but the present invention is not limited to the above embodiments. Various changes can be made within the knowledge of ordinary technicians in the relevant technical field without departing from the purpose of the present invention. In addition, the embodiments of the present invention and the features in the embodiments can be combined with each other without conflict.

Claims

1. A low-emissivity functional glass, characterized in that: include: A glass substrate, the glass substrate comprising a first region and a second region; as well as A low-emissivity functional film, the low-emissivity functional film is connected to the glass substrate and covers the first area and the second area; Among them, the low-radiation functional film located in the first area is a hollow structure, and is provided with a plurality of first grooves penetrating the low-radiation functional film along the thickness direction; the low-radiation functional film located in the second area is a hollow structure, and is provided with a plurality of second grooves penetrating the low-radiation functional film along the thickness direction, and the groove width of the first groove is greater than the groove width of the second groove.

2. The low-emissivity functional glass according to claim 1, characterized in that: The groove width of the first groove is ≥1 mm, and / or the groove width of the second groove is ≥15 μm and ≤30 μm.

3. The low-emissivity functional glass according to claim 1, characterized in that: The glass substrate further includes a third region, the first region and the third region are respectively located at two opposite sides along the height direction of the glass substrate, the second region is located between the first region and the third region, and the low-emissivity functional film also covers the third region; The low-emissivity functional film located in the third area is a hollow structure, and is provided with a plurality of third grooves penetrating the low-emissivity functional film along the thickness direction, and the groove width of the third groove is greater than the groove width of the second groove.

4. The low-emissivity functional glass according to claim 3, characterized in that: The area of ​​the second region is larger than that of the first region, and / or the area of ​​the second region is larger than that of the third region.

5. A preparation method, characterized in that: Applied to the low-emissivity functional glass according to any one of claims 1 to 4, the preparation method comprises: Providing a glass substrate, the glass substrate comprising a first region and a second region; forming a low-emissivity functional film on the surface of the glass substrate, wherein the low-emissivity functional film covers the first region and the second region; Processing a plurality of first grooves penetrating the low-emissivity functional film in a thickness direction on the low-emissivity functional film located in the first region to form a hollow structure; and A plurality of second grooves penetrating the low-emissivity functional film along the thickness direction are processed in the low-emissivity functional film located in the second region to form a hollow structure, and the groove width of the first groove is greater than the groove width of the second groove.

6. The preparation method according to claim 5, characterized in that: The step of processing a plurality of first grooves penetrating the low-radiation functional film in the first region along a thickness direction comprises: etching a plurality of first grooves penetrating the low-radiation functional film in the first region along a thickness direction using a mask etching method; And / or, a plurality of second grooves penetrating the low-radiation functional film along the thickness direction are processed in the low-radiation functional film located in the second area to form a hollow structure, including: using laser etching to etch a plurality of second grooves penetrating the low-radiation functional film along the thickness direction in the low-radiation functional film located in the second area to form a hollow structure.

7. The preparation method according to claim 5, characterized in that: The step of processing a plurality of first grooves penetrating the low-emissivity functional film in a thickness direction on the low-emissivity functional film located in the first region includes: Applying a hollowed-out mask coating to the first region; Coating a low-emissivity functional film on the surface of the mask coating, wherein the low-emissivity functional film covers the first region and the second region, and the mask coating is located between the low-emissivity functional film and the glass substrate; and The mask coating and the low-emissivity functional film on the surface of the mask coating are removed by using a solvent, so as to form a plurality of first grooves penetrating the low-emissivity functional film in a thickness direction in the low-emissivity functional film located in the first region.

8. The preparation method according to claim 7, characterized in that: The mask coating accounts for ≥5% and ≤20% of the surface area of ​​the glass substrate, and / or the mask coating has a thickness of ≥30 μm and ≤35 μm.

9. The preparation method according to claim 5, characterized in that: The glass substrate further includes a third region, the first region and the third region are respectively located at two opposite sides along the height direction of the glass substrate, the second region is located between the first region and the third region, and the low-emissivity functional film also covers the third region, and the preparation method further includes: A mask etching method is used to etch a plurality of third grooves penetrating the low-emissivity functional film in the thickness direction in the low-emissivity functional film located in the third region, wherein the groove width of the third groove is greater than the groove width of the second groove.

10. A hollow glass, characterized in that: The insulating glass comprises a first glass and a second glass which are relatively connected, a cavity for accommodating an inert gas is provided between the first glass and the second glass, and at least one of the first glass and the second glass is the low-emissivity functional glass according to any one of claims 1 to 4.

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