Positive photoresist stripping liquid for display panel as well as preparation method and application of positive photoresist stripping liquid

Abstract

The invention relates to a positive photoresist stripping liquid for a display panel as well as a preparation method and application of the positive photoresist stripping liquid. The positive photoresist stripping liquid comprises the following components in parts by weight: 0.2-1 part of a water removal additive; 5 to 20 parts of organic amine; 20-60 parts of an organic solvent; and 0.2 to 0.8 part of a corrosion inhibitor. Alcohol amine hydrochloride and an ester compound are adopted as water removal additives and have the dual functions of removing water and stabilizing the stripping liquid, the water removal function can reduce the hydrolysis probability of alcohol amine, amide or alcohol ether, and the stabilizing function is to adjust the pH value of the system and ensure the effective components of the stripping liquid, so that the stripping capacity of the stripping liquid is continuous, and the stripping effect of the stripping liquid is improved. Therefore, the system has a longer service life, and the stripping liquid is prevented from corroding metal while the photoresist is stripped.

Description

Technical Field

[0001] The invention belongs to the field of electronic component cleaning, and in particular relates to a positive photoresist stripping solution for a display panel, and a preparation method and application thereof. Background Art

[0002] Currently, in the manufacturing process of liquid crystal panels and touch screens, multiple layers of precise microcircuits are formed on silicon wafers or glass substrates through multiple processes such as graphic mask irradiation, exposure and etching. After the microcircuits are formed, the photoresist stripping liquid will remove the photoresist coated on the microcircuits as a mask.

[0003] However, with the development of integrated circuit technology, metal wiring has changed to a double-layer or triple-layer structure, and its structure has become more and more miniaturized, which has put forward higher requirements on the stripping ability of the photoresist stripping solution, and at the same time requires that the stripping solution should minimize the corrosion of the metal wiring.

[0004] Existing positive photoresist stripping solutions usually contain alcohol amines, amides or alcohol ethers, which are easy to absorb water, causing the water content of the stripping solution to gradually increase during use. The alcohol amines, amides or alcohol ethers will decompose when they come into contact with water, and the hydroxide ions in the stripping solution will corrode the metal layer; at the same time, the decomposition of alcohol amines will cause the stripping solution's ability to strip photoresist to decrease, affecting the life and use cycle of the stripping solution.

[0005] Therefore, the present invention proposes a positive photoresist stripping solution and its application which can remove the moisture in the stripping solution and does not corrode the metal layer. Summary of the invention

[0006] The technical problem solved by the present invention is that the organic solvents contained in the existing positive photoresist stripping solution are all easy to absorb water, and the alcohol amine, amide or alcohol ether will decompose when it comes into contact with water, and the hydroxide ions in the stripping solution will corrode the metal layer; the decomposition of the alcohol amine will cause the stripping ability of the stripping solution to the photoresist to decrease, affecting the life and service life of the stripping solution.

[0007] In view of the technical problems existing in the prior art, the present invention designs a positive photoresist stripping solution for a display panel and a preparation method and application thereof.

[0008] It should be noted that, in the present invention, unless otherwise specified, the specific meaning of "including" in relation to composition limitations and descriptions includes both open-ended "including", "comprising" and similar meanings, and closed-ended "consisting of..." and similar meanings.

[0009] In order to solve the above-mentioned technical problems, the present invention adopts the following solutions:

[0010] A positive photoresist stripping solution for a display panel, characterized in that it comprises the following components in parts by weight:

[0011] 0.2-1 part of water removal additive;

[0012] 5-20 parts of organic amine;

[0013] 20-60 parts of organic solvent;

[0014] Corrosion inhibitor 0.2-0.8 parts.

[0015] Furthermore, the water removal additive includes alcoholamine hydrochloride and ester compounds.

[0016] Furthermore, the mass ratio of the alcoholamine hydrochloride to the ester compound is 1:1-1:5.

[0017] Furthermore, the alcoholamine hydrochloride is one or more of ethanolamine hydrochloride, N,N-diethylethanolamine hydrochloride, ethanolamine benzoic acid hydrochloride, and 6-amino-2-methyl-2-heptanol hydrochloride;

[0018] The ester compound is ethyl acetate or ethyl butyrate.

[0019] Furthermore, the organic amine is one or more of ethanolamine, dimethylethanolamine, N-methylformamide, and N-ethylformamide.

[0020] Furthermore, the organic solvent is one or more of diethylene glycol monobutyl ether, dimethyl sulfoxide, and diethylene glycol methyl ether.

[0021] Furthermore, the corrosion inhibitor is one or more of benzotriazole, toluenetriazole, and methylbenzotriazole.

[0022] The present invention also provides a method for preparing the positive photoresist stripping solution for display panels, which is characterized by comprising the following steps:

[0023] Step 1: Weigh each component in its respective amount;

[0024] Step 2: Stir all components except the water additive at room temperature until all materials are evenly mixed, then slowly add the water additive and stir until it is even and transparent, thus obtaining the positive photoresist stripping solution for the display panel.

[0025] The present invention also provides a method for using the positive photoresist stripping solution for a display panel, which is characterized by comprising the following steps:

[0026] Step 1: Heat the display panel with a positive photoresist stripping solution to 40-60° C., and after the temperature stabilizes, place the substrate in the stripping solution and continuously shake it;

[0027] Step 2: Rinse the substrate after the shaking treatment with ultrapure water at least twice to remove the residual stripping solution, and finally blow dry with nitrogen to complete the stripping treatment to obtain a substrate with the photoresist removed.

[0028] The present invention also provides a use of the positive photoresist stripping solution for display panels in positive photoresist stripping.

[0029] In the present invention, the mass ratio of the alcoholamine hydrochloride to the ester compound is preferably 1:2.

[0030] In the present invention, the alcoholamine hydrochloride is preferably ethanolamine hydrochloride; and the ester compound is preferably ethyl acetate.

[0031] In the present invention, the organic amine is preferably ethanolamine or dimethylethanolamine; the organic solvent is preferably diethylene glycol monobutyl ether; and the corrosion inhibitor is preferably methylbenzotriazole.

[0032] In the method for using the positive photoresist stripping solution of the present invention, the heating temperature in step 1 can be preferably 50° C., and the oscillation stripping time is generally different for photoresists of different thicknesses, generally about 1 minute. The cleaning time in step 2 is about 1 minute.

[0033] The water removal additive of the present invention has unique advantages:

[0034] Alcoholamine hydrochloride and ester compounds have the dual functions of removing water and stabilizing the stripping solution. The water removal function can reduce the hydrolysis probability of alcoholamine, amide or alcohol ether.

[0035] The stabilizing function is to adjust the pH of the system, ensure the effective ingredients of the stripping solution, and maintain the stripping ability of the stripping solution, thereby making the system have a longer service life.

[0036] The water removal mechanism of the ester compounds of the present invention:

[0037] Esters are hydrolyzed in an alkaline environment to generate corresponding acid and alcohol compounds, wherein the acid compounds react with the base to neutralize, which not only avoids the side reactions caused by excessive ethanolamine content, but also makes the ester hydrolysis reaction complete. The two form a benign complement to achieve the effect of stabilizing the stripping solution.

[0038] The water removal mechanism of the alcoholamine hydrochloride of the present invention:

[0039] The hydroxyl group has a good ability to adsorb water molecules; the amine generated by its hydrolysis increases the stripping ability of the stripping solution and reduces the moisture content.

[0040] The present invention provides a positive photoresist stripping solution for a display panel and a preparation method and application thereof, which have the following beneficial effects:

[0041] 1. The present invention uses alcoholamine hydrochloride and ester compounds as water-removing additives, which have the dual functions of water removal and stripping solution stabilization. The water-removing function can reduce the hydrolysis probability of alcoholamine, amide or alcohol ether, while the stabilizing function is to adjust the pH of the system, ensure the effective ingredients of the stripping solution, so that the stripping ability of the stripping solution is sustained, thereby making the stripping solution have a longer service life.

[0042] 2. The ester compounds of the present invention are hydrolyzed in an alkaline environment to generate corresponding acid and alcohol compounds, wherein the acid compounds react with the base to undergo a neutralization reaction, which not only avoids the side reactions caused by excessive ethanolamine content, but also makes the ester hydrolysis reaction complete. The two form a benign complement to achieve the effect of stabilizing the stripping solution.

[0043] 3. The hydroxyl group of the alcoholamine hydrochloride of the present invention has a good function of adsorbing water molecules; the ethanolamine generated by its hydrolysis increases the stripping ability of the stripping solution and reduces the water content.

[0044] The positive photoresist stripping solution of the present invention can effectively solve the problems that the existing organic solvents are easy to absorb water, the alcohol amine, amide or alcohol ether will decompose when in contact with water, and the hydroxide ions in the stripping solution will corrode the metal layer, and can better ensure the photoresist stripping ability of the stripping solution and ensure the service life. BRIEF DESCRIPTION OF THE DRAWINGS

[0045] Figure 1 : A SEM image of the substrate surface after being treated with the stripping solution (water content 30%) of Example 1 of the present invention, magnified 40,000 times;

[0046] Figure 2 : A SEM image of a cross section of a substrate after being treated with the stripping solution (30% water) of Example 1 of the present invention, magnified 40,000 times;

[0047] Figure 3 : This is a SEM image of the substrate surface magnified 40,000 times after being treated with the stripping solution (30% water) of Comparative Example 1 of the present invention;

[0048] Figure 4 : A SEM image of a cross section of a substrate magnified 40,000 times after being treated with the stripping solution (30% water) of Comparative Example 1 of the present invention;

[0049] Figure 5 : A SEM image of the substrate surface after being treated with the stripping solution (90% water) of Example 1 of the present invention, magnified 40,000 times;

[0050] Figure 6 : A SEM image of a cross section of a substrate after being treated with the stripping solution (90% water) of Example 1 of the present invention, magnified 40,000 times;

[0051] Figure 7: This is a SEM image of the substrate surface magnified 40,000 times after being treated with the stripping solution (90% water) of Comparative Example 1 of the present invention;

[0052] Figure 8 : This is a SEM image of the cross section of the substrate after being treated with the stripping solution (90% water) of Comparative Example 1 of the present invention, magnified 40,000 times. DETAILED DESCRIPTION

[0053] The present invention will be further described below in conjunction with specific embodiments and accompanying drawings:

[0054] Table 1 Example

[0055]

[0056] Table 2 Comparative Examples

[0057]

[0058] Table 3 Test data

[0059]

[0060] About the preparation method of the stripping solution of the present invention:

[0061] The present invention involves a plurality of groups of stripping solutions in the embodiments and comparative examples, and all are prepared by referring to the following method:

[0062] Step 1: Weigh each component in its respective amount;

[0063] Step 2: Stir all components except the water additive at room temperature until all materials are evenly mixed, then slowly add the water additive and stir until it is uniform and transparent to obtain the photoresist stripping solution.

[0064] How to use the peeling solution:

[0065] Step 1: Heat the display panel to 50° C. with a positive photoresist stripping solution, and after the temperature stabilizes, place the substrate in the stripping solution and continue shaking for 1 minute;

[0066] Step 2: Rinse the substrate after the shaking treatment with ultrapure water three times to remove the residual stripping solution, and finally blow dry with nitrogen to complete the stripping treatment to obtain a substrate with the photoresist removed.

[0067] About performance testing and description:

[0068] Performance 1 Metal corrosion and photoresist residue test

[0069] Using substrates of the same thickness specifications ( After distilled water and the stripping solutions in the examples and comparative examples were mixed evenly in proportions (0%, 10%, 30%, 90%), the temperature was raised to 50°C.

[0070] After the temperature stabilized, the substrates were placed in the above-mentioned stripping solution containing distilled water for shaking treatment, and the shaking time was 1 minute.

[0071] After cleaning and drying the substrate, SEM inspection was performed. The test results are shown in Figure 1-8 and Table 3.

[0072] Performance 2 Stripping fluid water absorption test

[0073] The moisture content of each stripping solution in Tables 1 and 2 was tested respectively. The testing method was as follows: the stripping solution was left exposed at room temperature for 24 hours, and the moisture content of the initial and 24-hour stripping solution of the composition was tested respectively. The moisture content was tested by a Karl Fischer titrator. The test results are shown in Table 3.

[0074] Analysis of the test results:

[0075] Based on Table 3, it can be seen that the stripping solution prepared in the embodiment of the present invention does not produce photoresist residues, and there is no metal corrosion when the water content is as high as 90%.

[0076] The stripping solution prepared in the comparative example had photoresist residue and slight metal corrosion at 30% water content. The photoresist residue may be due to the decomposition of amine, which leads to a decrease in the photoresist stripping ability of the stripping solution, affecting the life and service life of the stripping solution.

[0077] By comparison, it can be seen that under the same etching conditions, the water removal additive can effectively inhibit the metal corrosion phenomenon during the etching process of the substrate with the same process, which fully demonstrates the effectiveness of the water removal additive.

[0078] In Comparative Example 1, due to the lack of addition of amine hydrochloride, the water content of the system increased after 24 hours of storage. At the same time, due to the lack of addition of amine substances, the pH of the system could not be adjusted, resulting in photoresist residues and slight metal corrosion.

[0079] In Comparative Example 2, due to the lack of the addition of ester compounds, the ethanolamine content is too high to cause side reactions, the stripping ability is reduced, and the photoresist cannot be completely stripped, and there is photoresist residue. In addition, due to the high water content in the stripping solution, the ethanolamine decomposes when it comes into contact with water, and the hydroxide ions in the stripping solution will cause slight corrosion to the metal layer.

[0080] In Comparative Example 3, no water-removing additive is added at all, so it is impossible to suppress the decomposition of the alcohol amine when it comes into contact with water, so the hydroxide ions in the stripping solution will corrode the metal layer.

[0081] As can be seen from Table 3, under the same temperature and time conditions, the stripping solutions of Examples 1-5 stripped the photoresist cleanly without residue and without metal corrosion; while Comparative Examples 1-3 had photoresist residue and metal corrosion, indicating that the stripping solution of the comparative example was hydrolyzed, and the alcohol amine content was too high or reduced, further resulting in poor stripping effect and photoresist residue after stripping. Metal corrosion may be due to the fact that the alcohol amine in the stripping solution decomposes when it encounters water, releasing a large amount of hydroxide ions, which corrodes the metal layer.

[0082] From the data comparison in Table 3, it can be seen that after the stripping liquids of Examples 1-5 were left open for 24 hours, the moisture content did not increase substantially; while in Comparative Examples 1-3, since the stripping liquids absorbed moisture from the air during the placement process, the moisture content increased after being left open for 24 hours, indicating that the water-removing additive of the present invention has the function of absorbing moisture in the stripping liquid.

[0083] Further comparison is made through the attached drawings in the specification:

[0084] Figure 1 This is a SEM image of the substrate surface magnified 40,000 times after being treated with the stripping solution (30% water) of Example 1 of the present invention; Figure 2 This is a SEM image of a cross section of a substrate magnified 40,000 times after being treated with the stripping solution (30% water) of Example 1 of the present invention.

[0085] Figure 3 This is a SEM image of the substrate surface magnified 40,000 times after being treated with the stripping solution (30% water) of Comparative Example 1 of the present invention; Figure 4 This is a SEM image of a cross section of a substrate magnified 40,000 times after being treated with the stripping solution (30% water) of Comparative Example 1 of the present invention.

[0086] from Figure 1-4 It can be seen that the stripping solution of Comparative Example 1 has photoresist residue and slight metal corrosion when the water content is 30%.

[0087] Figure 5 This is a SEM image of the substrate surface magnified 40,000 times after being treated with the stripping solution (90% water) of Example 1 of the present invention; Figure 6 This is a SEM image of a cross section of a substrate magnified 40,000 times after being treated with the stripping solution (90% water) of Example 1 of the present invention.

[0088] Figure 7 This is a SEM image of the substrate surface magnified 40,000 times after being treated with the stripping solution (90% water) of Comparative Example 1 of the present invention; Figure 8 This is a SEM image of a cross section of a substrate magnified 40,000 times after being treated with the stripping solution (90% water) of Comparative Example 1 of the present invention.

[0089] from Figure 5-8 It can be seen that when the water content of the stripping solution of Example 1 of the present invention reaches 90%, no metal corrosion occurs.

[0090] The positive photoresist stripping solution of the present invention can effectively solve the problems that the existing organic solvents are easy to absorb water, the alcohol amine will decompose when it meets water, and the hydroxide ions in the stripping solution will corrode the metal layer, and can better ensure the stripping ability of the stripping solution for photoresist and ensure the service life.

[0091] The present invention is described exemplarily above in conjunction with the embodiments and drawings. It is obvious that the implementation of the present invention is not limited to the above-mentioned methods. As long as various improvements are made using the method concept and technical solution of the present invention, or the concept and technical solution of the present invention are directly applied to other occasions without improvement, they are all within the protection scope of the present invention.

Claims

1. A positive photoresist stripping solution for a display panel, It is characterized in that Calculated by weight, it includes the following components:

2. The positive photoresist stripping solution for display panel according to claim 1, Features: The water removal additives include alcoholamine hydrochloride and ester compounds.

3. The positive photoresist stripping solution for display panel according to claim 2, Features: The mass ratio of the alcoholamine hydrochloride to the ester compound is 1:1-1:

5.

4. The positive photoresist stripping solution for display panel according to claim 3, Features: The alcoholamine hydrochloride is one or more of ethanolamine hydrochloride, N,N-diethylethanolamine hydrochloride, ethanolamine benzoic acid hydrochloride, and 6-amino-2-methyl-2-heptanol hydrochloride; The ester compound is ethyl acetate or ethyl butyrate.

5. The positive photoresist stripping solution for display panel according to claim 1, Features: The organic amine is one or more of ethanolamine, dimethylethanolamine, N-methylformamide and N-ethylformamide.

6. The positive photoresist stripping solution for display panel according to claim 1, Features: The organic solvent is one or more of diethylene glycol monobutyl ether, dimethyl sulfoxide and diethylene glycol methyl ether.

7. The positive photoresist stripping solution for display panel according to claim 1, Features: The corrosion inhibitor is one or more of benzotriazole, toluenetriazole and methylbenzotriazole.

8. A method for preparing the positive photoresist stripping solution for display panels according to any one of claims 1 to 7, Features The following steps are involved: Step 1: Weigh each component in its respective amount; Step 2: Stir all components except the water additive at room temperature until all materials are evenly mixed, then slowly add the water additive and stir until it is even and transparent, thus obtaining the positive photoresist stripping solution for the display panel.

9. A method for using the positive photoresist stripping solution for display panels according to any one of claims 1 to 7, Features The following steps are involved: Step 1: Heat the display panel with a positive photoresist stripping solution to 40-60° C., and after the temperature stabilizes, place the substrate in the stripping solution and continuously shake it; Step 2: Rinse the substrate after the shaking treatment with ultrapure water at least twice to remove the residual stripping solution, and finally blow dry with nitrogen to complete the stripping treatment to obtain a substrate with the photoresist removed.

10. Use of the positive photoresist stripping solution for display panels according to any one of claims 1 to 7 in positive photoresist stripping.

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