Surface drying and cooling treatment process in treatment-free CTP offset plate production

Abstract

The invention relates to a surface drying and cooling treatment process in treatment-free CTP offset plate production. The process comprises the steps of preheating treatment, heat preservation conveying, high-temperature drying, rapid cooling, drying treatment and secondary cooling. The preheating chamber is arranged, segmented heating preheating helps uniform heating of the CTP plate, the quality problem caused by uneven temperature is avoided, meanwhile, secondary flattening treatment is conducted on the coating surface through the roller shaft, and uneven coating of the coating liquid caused by the fact that the coating liquid is left from the edge of the plate due to the influence of gravity is prevented; by arranging the first cooling chamber, the high temperature at the feeding port is effectively neutralized, and the skinning effect caused by too large temperature change is avoided; through the arrangement of the drying chamber, the phenomena that water vapor on the surface of the CTP plate is condensed and a hydrophilic coating easily absorbs water to get damp due to overlarge environment temperature difference after the high-heat CTP plate is rapidly cooled are formed, so that the drying chamber is arranged to carry out small-amplitude temperature rise and secondary temperature rise drying on the CTP plate, and the dryness of the CTP plate is ensured.

Description

Technical Field

[0001] The invention relates to the technical field of treatment technology for treatment-free CTP plate materials, in particular to a surface drying and cooling treatment process in the production of treatment-free CTP offset printing plate materials. Background Art

[0002] Treatment-free CTP plates refer to plates that can be printed on the machine without any subsequent processing steps after being exposed and imaged on the direct platemaking equipment. They do not require chemical development and rinsing treatment. They are truly treatment-free plates. The production process of treatment-free CTP plates includes unwinding, alkali washing and neutralization, electrolytic oxidation, coating and drying, cutting and packaging. In the existing production process, the plates after coating and drying are naturally air-dried and cooled, which is inefficient and affects the production process of the next cutting process. In addition, the coated surface of the plate is hydrophilic and is prone to moisture in the natural air-drying and cooling process in humid climates. Therefore, we have developed a surface drying and cooling treatment process for the production of treatment-free CTP offset plates.

[0003] Patent number CN200610017719.1 is a Chinese invention patent, which discloses a method for preparing a photosensitive lithographic plate material, which mainly adopts a five-stage drying method: the drying part can be divided into five parts: drying stage 1, drying stage 2, drying stage 3, drying stage 4, and drying stage 5; in the invention, the photosensitive lithographic plate material uses different drying temperatures and time controls in different drying stages, and is coated with a photosensitive lithographic plate coating liquid suitable for this drying method to prepare a photosensitive lithographic plate; through the above method for preparing a photosensitive lithographic plate, To make the manufactured photosensitive lithographic printing plate; the surface quality, printing resistance, solvent resistance, development tolerance and other properties achieve satisfactory results and reduce environmental pollution, but the invention has the following problems: first, it does not have an anti-moisture design for the plate, the coated surface of the plate is hydrophilic, and the water vapor of the plate will evaporate and adhere to the inner wall of the chamber during the drying process. The plate is easy to absorb water and moisture during the cooling process. Secondly, the plate does not have a design for rapid heating and cooling during the drying process. The traditional natural air drying and cooling method is inefficient and affects the production process of the next cutting process. Summary of the invention

[0004] The purpose of the present invention is to solve the technical problems in the production of existing untreated CTP offset printing plates, such as large temperature changes that make the plate surface easy to get damp, uneven liquid coating caused by the coating liquid being easily left from the side when preheating, and long cooling time after the plate is dried, by setting a preheating chamber, a first cooling chamber and a drying chamber.

[0005] To achieve the above object, the present invention provides the following technical solutions:

[0006] A surface drying and cooling treatment process in the production of treatment-free CTP offset printing plate material, the process comprising the following steps:

[0007] Step 1: After the surface of the CTP plate is sprayed with a photosensitive coating, it is scraped and leveled, and then enters the preheating chamber for plate preheating treatment. The temperature is controlled at 50-180 degrees Celsius for 20-60 seconds.

[0008] Step 2: After the preheating treatment, the CTP plate enters the No. 1 insulation chamber. The roller in the No. 1 insulation chamber smoothes it again and then transports it to the drying room with insulation. The temperature in the No. 1 insulation chamber is controlled at 120-180 degrees Celsius, and the flow time of the CTP plate is 5-8 seconds;

[0009] Step 3: After step 2, the CTP plate enters the No. 1 drying room. The No. 1 drying room adopts quartz tube heating method, the temperature is controlled at 190-200 degrees Celsius, and the time is 2-20 seconds;

[0010] Step 4: After drying, the CTP plate enters the No. 1 cooling chamber. A quenching device is used in the No. 1 cooling chamber to rapidly cool down the dried CTP plate. The cooling rate is 5-25 degrees Celsius per minute, and the time is 5-29 minutes. The temperature of the CTP plate drops to 55 degrees Celsius.

[0011] Step 5: After the rapid cooling treatment in step 4, the CTP plate enters the drying room for dehumidification and drying. The temperature is controlled at 65-75 degrees Celsius for 6-10 seconds.

[0012] Step 6: After step 5, the CTP plate enters the second cooling chamber, so that the surface temperature of the CTP plate is reduced to 35-45 degrees Celsius for 1-8 minutes.

[0013] As a preference, the preheating chamber includes a No. 1 preheating chamber and a No. 2 preheating chamber. The CTP plate in the No. 1 preheating chamber is a horizontal flow section of the coating liquid. The temperature is set between 50-70 degrees Celsius, the heating time is 2-15 seconds, and the CTP plate is initially heated and cured.

[0014] As a preferred embodiment, the CTP plate is pre-baked in the second preheating chamber, the temperature is set between 120-180 degrees Celsius, and the pre-baking time is 10-40 seconds.

[0015] As a preferred embodiment, a heat-insulating transport warehouse is provided between the No. 1 preheating chamber and the No. 2 preheating chamber, and the CTP plate is roller-flattened and heat-insulated transported in the heat-insulating transport warehouse, and the temperature in the heat-insulating transport warehouse is the same as that in the No. 1 preheating chamber.

[0016] As a preferred embodiment, the temperature in the No. 1 insulation chamber is the same as the temperature in the No. 2 preheating chamber, and the cabin of the No. 1 insulation chamber is composed of a combination of polyurethane spraying and polyurethane insulation cabin boards.

[0017] As a preferred embodiment, the backs of the preheating chamber and the first drying chamber are connected to the exhaust gas recovery device, and the upper and lower sides of the preheating chamber are vertically provided with drying ports.

[0018] Preferably, the drying chamber is controlled by negative pressure, and the negative pressure is controlled to be 0-100 mmHg.

[0019] As a preferred embodiment, the No. 2 cooling chamber adopts air cooling to cool down, the unit area mass of the photosensitive layer of the unprocessed CTP offset printing plate is 0.10 g / m2, and the plate thickness is 0.15-0.40 mm.

[0020] Beneficial effects of the present invention:

[0021] (1) In the present invention, a preheating chamber is provided and a segmented preheating method is adopted to heat the coated CTP plate, so that the CTP plate can reach the required temperature more quickly in the subsequent processing process, which is helpful for uniform heating of the CTP plate and avoids quality problems caused by uneven temperature. In addition, a heat preservation and transportation warehouse is provided between the No. 1 preheating chamber and the No. 2 preheating chamber because the CTP plate in the No. 1 preheating chamber is the horizontal flow section of the coating liquid. The coating liquid is affected by gravity and flows from the edge of the plate, which will cause uneven coating of the coating liquid. Therefore, a roller flattening process is provided in the heat preservation and transportation warehouse to roll and flatten the uncured coating liquid to ensure the uniformity of the coating liquid and to reduce bubbles and improve the yield.

[0022] (2) In the present invention, by setting up a cooling chamber No. 1, the high-temperature CTP plate is rapidly cooled down, which effectively neutralizes the high temperature at the feed inlet and avoids excessive temperature changes, thereby ensuring uniform drying of the coating and avoiding the skinning effect caused by uneven heating and excessive heating.

[0023] (3) In the present invention, a drying chamber is arranged behind the first cooling chamber. The high-temperature CTP plate will form condensation on the surface of the CTP plate due to the large temperature difference between the environment after rapid cooling. The hydrophilic coating is easy to absorb water and become damp. Therefore, a drying chamber is arranged to slightly increase the temperature of the CTP plate, and then the plate is dried by secondary heating to ensure the dryness of the CTP plate.

[0024] In summary, the invention has the advantages of high yield, fast cooling speed and high drying degree, and is particularly suitable for the field of treatment-free CTP plate processing technology. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other accompanying drawings can be obtained based on these accompanying drawings without paying creative work.

[0026] Figure 1 Schematic diagram of the overall process of surface drying and cooling treatment in the production of treatment-free CTP offset printing plates.

[0027] Figure 2 This is a flow chart of the preheating chamber part.

[0028] Figure 3 This is a schematic diagram of the waste gas treatment and drying process in the preheating chamber and the No. 1 drying chamber. DETAILED DESCRIPTION

[0029] The technical solutions in the embodiments of the present invention are clearly and completely described below in conjunction with the accompanying drawings.

[0030] Embodiment 1

[0031] like Figures 1 to 3 As shown, the present invention provides a surface drying and cooling treatment process in the production of treatment-free CTP offset printing plate material, and the process comprises the following steps:

[0032] Step 1: After the surface of the CTP plate is sprayed with photosensitive coating, it is scraped and leveled, and then enters the preheating room for plate preheating. The temperature is controlled at 50-180 degrees Celsius for 20-60 seconds. The coated CTP plate is heated so that the CTP plate can reach the required temperature faster in the subsequent processing, which helps the CTP plate to be evenly heated and avoids quality problems caused by uneven temperature.

[0033] Step 2: After the preheating treatment, the CTP plate enters the No. 1 insulation chamber. The roller in the No. 1 insulation chamber smoothes it again and then transports it to the drying room for insulation. The temperature in the No. 1 insulation chamber is controlled at 120-180 degrees Celsius. The flow time of the CTP plate is 5-8 seconds. There is a gap between the preheating chamber and the No. 1 drying chamber. In order to reduce the loss of heat and simplify energy consumption, the No. 1 insulation chamber is set as a receiving warehouse, and the roller is designed in the No. 1 insulation chamber to smooth it again, reduce the bubbles formed by the evaporation of water in the coating liquid, and ensure the flatness of the CTP plate coating surface;

[0034] Step 3: After step 2, the CTP plate enters the No. 1 drying room. The No. 1 drying room adopts quartz tube heating method, the temperature is controlled at 190-200 degrees Celsius, and the time is 2-20 seconds. The traditional drying room is heated by wind heat, which is noisy and easy to form water accumulation indoors, increasing the probability of CTP plate moisture. We use quartz tube heating method, which is efficient and energy-saving, high working temperature, fast heating, small thermal inertia, high temperature resistance, corrosion resistance, good thermochemical performance stability, long service life, high insulation strength, and no pollution;

[0035] Step 4: After drying, the CTP plate enters the No. 1 cooling chamber. A quenching device is used in the No. 1 cooling chamber to rapidly cool down the dried CTP plate. The cooling rate is 5-25 degrees Celsius per minute, and the time is 5-29 minutes. The temperature of the CTP plate drops to 55 degrees Celsius. The high-temperature CTP plate is rapidly cooled down, which effectively neutralizes the high temperature at the feed inlet and avoids excessive temperature changes, thereby ensuring uniform drying of the coating and avoiding the skinning effect caused by uneven heating and excessive heating.

[0036] Step 5: After the rapid cooling treatment in step 4, the CTP plate enters the drying room for dehumidification and drying. The temperature is controlled at 65-75 degrees Celsius for 6-10 seconds. The high-temperature CTP plate will form condensation on the surface of the CTP plate due to the large temperature difference in the environment after rapid cooling. The hydrophilic coating is easy to absorb water and dehumidify. Therefore, the drying room is set to slightly increase the temperature of the CTP plate, and then dry it twice to ensure the dryness of the CTP plate.

[0037] Step 6: After step 5, the CTP plate enters the second cooling chamber, so that the surface temperature of the CTP plate drops to 35-45 degrees Celsius for 1-8 minutes. The CTP plate after secondary drying is air-cooled to improve the cooling efficiency and increase the dryness, so that the plate can be further cut.

[0038] Further, if Figure 2 As shown, the preheating chamber includes a No. 1 preheating chamber and a No. 2 preheating chamber. The CTP plate in the No. 1 preheating chamber is the horizontal flow section of the coating liquid. The temperature is set between 50-70 degrees Celsius, and the heating time is 2-15 seconds to perform preliminary heating and curing on the CTP plate.

[0039] Furthermore, the CTP plate is pre-baked in the No. 2 preheating chamber, the temperature is set between 120-180 degrees Celsius, the pre-baking time is 10-40 seconds, and the No. 2 preheating chamber and the No. 1 drying chamber heat the CTP plate in stages, effectively controlling the temperature rise rate and temperature gradient to avoid the CTP plate from peeling due to excessive heating.

[0040] Further, if Figure 2 As shown, a heat preservation transport warehouse is provided between the No. 1 preheating chamber and the No. 2 preheating chamber, and the CTP plate is roller-flattened and heat-insulated for transport in the heat preservation transport warehouse. The temperature in the heat preservation transport warehouse is the same as that in the No. 1 preheating chamber. Because the CTP plate in the No. 1 preheating chamber is the advection section of the coating liquid, the coating liquid is affected by gravity and remains on the edge of the plate, which will cause uneven coating of the coating liquid. Therefore, a roller-flattening process is provided in the heat preservation transport warehouse to roll and flatten the uncured coating liquid to ensure the uniformity of the coating liquid, reduce bubbles, and improve the yield rate.

[0041] Furthermore, the temperature in the No. 1 insulation chamber is the same as the temperature in the No. 2 preheating chamber, and the cabin of the No. 1 insulation chamber is composed of a combination of polyurethane spraying and polyurethane insulation panels, and has excellent insulation performance, good waterproof performance, fire safety, and environmental protection properties.

[0042] Further, if Figure 3 As shown, the backs of the preheating room and the No. 1 drying room are connected to the waste gas recovery device. Since the coating liquid of the CTP plate will generate waste gas during the heating process, the direct discharge of the waste gas has a great impact on the environment. Therefore, a waste gas recovery device is set up to recover the waste gas and wastewater to the waste gas and wastewater treatment station in the park for centralized treatment. Drying ports are vertically arranged on the upper and lower sides of the preheating chamber, and chemical desiccant and filtering structure are arranged inside to absorb a large amount of moisture formed on the inner wall of the preheating chamber, and the moisture is filtered out by the filtering structure and discharged to the outside, thereby reducing the possibility of the coating liquid of the CTP plate absorbing water and becoming damp again.

[0043] Furthermore, the drying chamber is controlled by negative pressure, and the negative pressure is controlled to be 0-100 mmHg.

[0044] Furthermore, the second cooling chamber adopts air cooling to cool down, the unit area mass of the photosensitive layer of the unprocessed CTP offset printing plate is 0.10 grams per square meter, and the plate thickness is 0.15-0.40 mm.

[0045] Working process: First, the coated CTP plate is scraped and leveled, and then enters the preheating room for plate preheating. The temperature is controlled at 50-180 degrees Celsius for 20-60 seconds. The coated CTP plate is heated so that the CTP plate can reach the required temperature faster in the subsequent processing, which helps the CTP plate to be heated evenly and avoids quality problems caused by uneven temperature. Furthermore, the preheated CTP plate enters the No. 1 insulation room, where the rollers in the No. 1 insulation room level it again and then transport it to the drying room for insulation. The temperature control in the No. 1 insulation room At 120-180 degrees Celsius, the CTP plate flow time is 5-8 seconds. There is a gap between the preheating room and the No. 1 drying room. In order to reduce the loss of heat and simplify energy consumption, the No. 1 insulation room is set as a receiving warehouse, and a roller is designed in the No. 1 insulation room to smooth it again, reducing the bubbles formed by the evaporation of water in the coating liquid, ensuring the flatness of the CTP plate coating surface; further, the CTP plate after step 2 enters the No. 1 drying room, which adopts a quartz tube heating method, and the temperature is controlled at 190-200 degrees Celsius for 2-20 seconds; further, the CTP plate after drying The plate enters the No. 1 cooling room, where a rapid cooling device is used to rapidly cool the dried CTP plate at a rate of 5-25 degrees Celsius per minute for 5-29 minutes. The temperature of the CTP plate drops to 55 degrees Celsius. The high-temperature CTP plate is rapidly cooled, which effectively neutralizes the high temperature at the feed inlet and avoids excessive temperature changes, thereby ensuring uniform drying of the coating and avoiding the crusting effect caused by uneven heating and excessive heating. Furthermore, the CTP plate after rapid cooling enters the drying room for dehumidification and drying, and the temperature is controlled at 65-75 degrees Celsius. , the time is 6-10 seconds. The high-temperature CTP plate will form condensation on the surface of the CTP plate due to the large temperature difference in the environment after rapid cooling. The hydrophilic coating is easy to absorb water and become damp. Therefore, a drying room is set to slightly increase the temperature of the CTP plate, and then dry it for the second time to ensure the dryness of the CTP plate. Further, the CTP plate enters the No. 2 cooling room, so that the surface temperature of the CTP plate drops to 35-45 degrees Celsius for 1-8 minutes. The CTP plate after the second drying is air-cooled to improve the cooling efficiency and increase the dryness, so that the plate can be further cut.

[0046] In the description of the present invention, it is necessary to understand that the directions or positional relationships indicated by the terms "front and back", "left and right", etc. are based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or component referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as a limitation on the invention.

[0047] Of course, in the present technical solution, those skilled in the art should understand that the term "one" should be understood as "at least one" or "one or more", that is, in one embodiment, the number of an element may be one, while in another embodiment, the number of the element may be multiple, and the term "one" should not be understood as a limitation on the quantity.

[0048] The above is only a preferred specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any changes or substitutions that can be easily thought of by a person skilled in the art under the technical guidance of the present invention should be included in the protection scope of the present invention. Therefore, the protection scope of the present invention should be based on the protection scope of the claims.

Claims

1. A surface drying and cooling process for processing free CTP offset printing plate production, characterized in that: The process includes the following steps: Step 1: After the surface of the CTP plate is sprayed with a photosensitive coating, it is scraped and leveled, and then enters the preheating chamber for plate preheating treatment. The temperature is controlled at 50-180 degrees Celsius for 20-60 seconds. Step 2: After the preheating treatment, the CTP plate enters the No. 1 insulation chamber. The roller in the No. 1 insulation chamber smoothes it again and then transports it to the drying room with insulation. The temperature in the No. 1 insulation chamber is controlled at 120-180 degrees Celsius, and the flow time of the CTP plate is 5-8 seconds; Step 3: After step 2, the CTP plate enters the No. 1 drying room. The No. 1 drying room adopts quartz tube heating method, the temperature is controlled at 190-200 degrees Celsius, and the time is 2-20 seconds; Step 4: After drying, the CTP plate enters the No. 1 cooling chamber. A quenching device is used in the No. 1 cooling chamber to rapidly cool down the dried CTP plate. The cooling rate is 5-25 degrees Celsius per minute, and the time is 5-29 minutes. The temperature of the CTP plate drops to 55 degrees Celsius. Step 5: After the rapid cooling treatment in step 4, the CTP plate enters the drying room for dehumidification and drying. The temperature is controlled at 65-75 degrees Celsius for 6-10 seconds. Step 6: After step 5, the CTP plate enters the second cooling chamber, so that the surface temperature of the CTP plate is reduced to 35-45 degrees Celsius for 1-8 minutes.

2. The surface drying and cooling treatment process in the production of treatment-free CTP offset printing plate according to claim 1, characterized in that: The preheating chamber includes a No. 1 preheating chamber and a No. 2 preheating chamber. The CTP plate in the No. 1 preheating chamber is the advection section of the coating liquid. The temperature is set between 50-70 degrees Celsius and the heating time is 2-15 seconds to perform preliminary heating and curing on the CTP plate.

3. The surface drying and cooling treatment process in the production of treatment-free CTP offset printing plate according to claim 2, characterized in that: The CTP plate is pre-baked in the second preheating chamber, the temperature is set between 120-180 degrees Celsius, and the pre-baking time is 10-40 seconds.

4. The surface drying and cooling treatment process in the production of treatment-free CTP offset printing plate according to claim 2, characterized in that: A heat preservation and transportation warehouse is arranged between the first preheating chamber and the second preheating chamber, and the CTP plate is roller-flattened and heat-insulated for transportation in the heat preservation and transportation warehouse, and the temperature in the heat preservation and transportation warehouse is the same as that in the first preheating chamber.

5. The surface drying and cooling treatment process in the production of treatment-free CTP offset printing plate according to claim 2, characterized in that: The temperature in the No. 1 insulation chamber is the same as the temperature in the No. 2 preheating chamber, and the cabin of the No. 1 insulation chamber is composed of a combination of polyurethane spraying and polyurethane insulation cabin boards.

6. The surface drying and cooling process for processing free CTP offset printing plate production according to claim 2, characterized in that: The backs of the preheating chamber and the first drying chamber are connected to the waste gas recovery device, and the upper and lower sides of the preheating chamber are vertically provided with drying ports.

7. The surface drying and cooling treatment process in the production of treatment-free CTP offset printing plate according to claim 1, characterized in that: The drying chamber is controlled by negative pressure, and the negative pressure is controlled to be 0-100 mmHg.

8. The surface drying and cooling process for processing free CTP offset printing plate production according to claim 1, characterized in that: The second cooling chamber adopts air cooling to cool down. The unit area mass of the photosensitive layer of the unprocessed CTP offset printing plate is 0.10 grams per square meter, and the plate thickness is 0.15-0.40 mm.

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