Rotating device and heat treatment equipment

Abstract

The invention provides a rotating device and heat treatment equipment, and relates to the field of semiconductor processing. The rotating device comprises a stator, the stator comprises a first mounting hole and a first mounting part, the first mounting part is located on the outer side, away from the central axis of the rotating device, of the first mounting hole, and a bearing is arranged in the first mounting hole; the rotor comprises a second mounting part and a second mounting hole, the second mounting hole is located in the outer side of the second mounting part, the second mounting part is inserted into the first mounting hole, and the second mounting hole is matched with the first mounting part; the rotary table is provided with a third mounting hole, and the rotor and the stator are mounted in the third mounting hole; and a first gap is formed between the rotor and the hole wall of the third mounting hole, the first gap communicates with the first mounting hole, and the first gap is used for containing particulate matter overflowing from the first mounting hole and is further used for guiding the particulate matter to the particulate matter outlet. The movement stability of the rotating device can be improved, and the influence of particulate matter on the quality of workpieces can be reduced or even avoided.

Description

Technical Field

[0001] The present disclosure relates to the field of semiconductor processing technology, and in particular to a rotating device and a heat treatment equipment. Background Art

[0002] Rapid thermal processing (RTP) is a common semiconductor process that can quickly raise the temperature of the wafer to the temperature required by the process. Thermal processing equipment used to achieve rapid thermal processing is usually equipped with a rotating device that can carry the wafer and drive the wafer to rotate together. How to reasonably equip the rotating device to reduce the impact on wafer quality is one of the problems that need to be solved in the industry. Summary of the invention

[0003] The present disclosure provides a rotating device and a heat treatment equipment.

[0004] According to one aspect of the present disclosure, a rotating device is provided, comprising: a stator, the stator comprising a first mounting hole and a first mounting portion, the first mounting portion being located on the outside of the first mounting hole away from the central axis of the rotating device, and a bearing being arranged in the first mounting hole; a rotor, the rotor comprising a second mounting portion and a second mounting hole, the second mounting hole being located on the outside of the second mounting portion, the second mounting portion being inserted into the first mounting hole, and the second mounting hole being matched with the first mounting portion; a turntable, the turntable being provided with a third mounting hole, the rotor and the stator being mounted in the third mounting hole, and the rotor being fixedly connected to the turntable; a first gap being provided between the rotor and the hole wall of the third mounting hole, the first gap being connected to the first mounting hole, the first gap being used to accommodate particulate matter overflowing from the first mounting hole, and the first gap being also used to guide the particulate matter to a particulate matter outlet, so that the particulate matter can be discharged outside the rotating device under the action of an adsorption force.

[0005] In some embodiments, the rotating device also includes: a cover plate, which is covered at the upper end of the third mounting hole; the cover plate includes a cover plate body and a first shielding portion, the first shielding portion is connected to the lower surface of the cover plate body, and the first shielding portion is arranged close to the outer edge of the cover plate body, and there is a second gap between the first shielding portion and the turntable, so that the particulate matter can be discharged from the second gap; wherein the second gap is located between the lower end surface of the first shielding portion and the upper end surface of the turntable to form the particulate matter outlet.

[0006] In some embodiments, the rotating device further includes: a first support member, wherein the first support member is supported and disposed between the cover plate and the rotor.

[0007] In some embodiments, the rotating device also includes: a second support member, the second support member is connected to the lower end of the first support member, the lower end of the second support member is connected to the upper end surface of the rotor, and the upper end of the first support member is connected to the lower surface of the cover plate body in the cover plate; wherein the material of at least one of the first support member and the second support member includes: thermal insulation material; the material of at least one of the first support member and the second support member includes elastic material.

[0008] In some embodiments, the first support member and the second support member are respectively columnar; there are multiple first support members, and the multiple first support members are distributed at intervals along the circumference of the rotor; the number and distribution positions of the second support members correspond to those of the first support members.

[0009] In some embodiments, the turntable includes: a turntable base, the upper end surface of the turntable base is connected to a first protruding portion protruding upward, the first protruding portion is located between the first shielding portion and the first support member, and the upper end surface of the first protruding portion is lower than the upper end surface of the first support member.

[0010] In some embodiments, a second shielding portion extending downward is further connected to the lower surface of the cover body, and the second shielding portion is located on the inner side of the first support member.

[0011] In some embodiments, the stator includes a stator base, an upper end surface of the stator base is connected to a second protruding portion protruding upward, and the second protruding portion is located between the second shielding portion and the first support member.

[0012] In some embodiments, a first cooling channel is provided in the stator, and the first cooling channel is provided near the upper end of the stator; wherein the first cooling channel has a first liquid inlet and a first liquid outlet, and the distance between the first liquid inlet and the first liquid outlet is less than a preset distance.

[0013] In some embodiments, a second cooling channel is provided in the stator, and at least a portion of the second cooling channel extends along the axial direction of the rotating device.

[0014] In some embodiments, the second cooling channel has a second liquid inlet and a second liquid outlet, and the second liquid inlet is located below the second liquid outlet.

[0015] In some embodiments, a portion of the second cooling channel is located inside the first mounting hole; a portion of the second cooling channel is located outside the first mounting hole.

[0016] In some embodiments, a third cooling channel is provided in the turntable, and at least a portion of the third cooling channel extends along the axial direction of the rotating device.

[0017] In some embodiments, the third cooling channel has a third liquid inlet and a third liquid outlet, and the third liquid inlet is located below the third liquid outlet.

[0018] According to another aspect of the present disclosure, a heat treatment device is provided, comprising: a rotating device as described in any one of the above, and a vacuum device; the vacuum device is used to provide an adsorption force for adsorbing particulate matter.

[0019] The rotating device provided by the embodiment of the present disclosure can improve the stability of the movement of the rotating device and can reduce or even avoid the influence of particulate matter on the quality of the workpiece.

[0020] It should be understood that the content described in this section is not intended to identify the key or important features of the embodiments of the present disclosure, nor is it intended to limit the scope of the present disclosure. Other features of the present disclosure will become easily understood through the following description. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The accompanying drawings are used to better understand the present solution and do not constitute a limitation of the present disclosure.

[0022] Figure 1 is a schematic structural diagram of a rotating device according to an embodiment of the present disclosure;

[0023] Figure 2 is a schematic diagram of a partial structure of a rotating device according to an embodiment of the present disclosure;

[0024] Figure 3 is a schematic structural diagram of a stator according to an embodiment of the present disclosure;

[0025] Figure 4 is a schematic structural diagram of a rotor according to an embodiment of the present disclosure;

[0026] Figure 5 is a schematic structural diagram of a turntable according to an embodiment of the present disclosure;

[0027] Figure 6 is a schematic structural diagram of a rotating device according to an embodiment of the present disclosure;

[0028] Figure 7 yes Figure 6 Schematic cross-section at AA;

[0029] Figure 8 yes Figure 6 An enlarged schematic diagram of part B.

[0030] Explanation of reference numerals: 100-stator; 110-turntable base; 111-first mounting hole; 112-first mounting portion; 120-second protrusion; 130-first cooling channel; 140-second cooling channel; 141-first vertical sub-channel; 142-first horizontal sub-channel; 143-second vertical sub-channel; 144-second horizontal sub-channel; 145-third vertical sub-channel; 146-third horizontal sub-channel; 200-rotor; 210-rotor base; 211-second mounting hole; 212-second mounting portion; 213-second mounting portion; 214-second mounting portion; 215-second mounting portion; 216-second mounting portion; 217-second mounting portion; 218-second mounting portion; 219-second mounting portion; 220-second mounting portion; 221-second mounting portion; 222-second mounting portion; 223-second mounting portion; 224-second mounting portion; 225-second mounting portion; 226-second mounting portion; 227-second mounting portion; 228-second mounting portion; 229-second mounting portion; 230-second mounting portion; 231-second mounting portion; 232-second mounting portion; 233-second mounting portion; 234-second mounting portion; 235-second mounting portion; 236-second mounting portion; 237-second mounting portion; 238-second mounting portion; 239-second mounting portion; 240-second mounting portion; 241-second mounting portion; 242-second mounting portion; 243-second Mounting part; 212-second mounting hole; 300-turntable; 310-turntable base; 311-third mounting hole; 312-particle outlet; 320-first protrusion; 330-third cooling channel; 331-fourth vertical sub-channel; 332-fourth horizontal sub-channel; 333-fifth horizontal sub-channel; 400-cover plate; 401-cover plate body; 402-first shielding part; 403-second shielding part; 501-bearing; 502-first support member; 503-second support member. DETAILED DESCRIPTION

[0031] The following is a description of exemplary embodiments of the present disclosure in conjunction with the accompanying drawings, including various details of the embodiments of the present disclosure to facilitate understanding, which should be considered as merely exemplary. Therefore, it should be recognized by those of ordinary skill in the art that various changes and modifications may be made to the embodiments described herein without departing from the scope and spirit of the present disclosure. Similarly, for the sake of clarity and conciseness, descriptions of well-known functions and structures are omitted in the following description.

[0032] In the related technology, the rotating device used in the heat treatment equipment mainly uses air-floating turntable technology or magnetic-floating turntable technology, both of which are non-contact rotation technologies. However, the motion stability of heat treatment equipment using air-floating turntable technology or magnetic-floating turntable technology is poor, and it is difficult to ensure the quality of the wafer. For example, factors such as the robot transporting wafers can easily affect the working environment of the turntable, causing the wafer to tremble during rotation, thereby affecting the quality of the wafer. If contact rotation technology is used, particulate matter will be generated due to friction, thus affecting the quality of the wafer.

[0033] The embodiment of the present disclosure provides a rotating device, by arranging a bearing in the first mounting hole of the stator, so that the rotor cooperates with the stator in a contact-type rotation through the bearing, thereby improving the stability of the movement of the rotating device, and by arranging a channel between the stator and the rotor, and between the rotor and the turntable, which can accommodate and guide the discharge of particles generated by the contact-type rotation, thereby reducing or even avoiding the influence of particles on the quality of workpieces. The workpiece includes wafers and other semiconductor devices.

[0034] The structure, function and implementation process of the rotating device provided in this embodiment are described below with reference to the accompanying drawings. For ease of description, the gravity direction is taken as downward and the direction toward the central axis of the rotating device is taken as the inner side.

[0035] Figure 1 is a schematic diagram of a rotating device cut along a cutting plane parallel to its central axis (i.e., along Figure 6 AA direction cross-sectional diagram); Figure 2 is a schematic diagram of a partial structure of a rotating device according to an embodiment of the present disclosure; Figure 3 is a schematic structural diagram of a stator according to an embodiment of the present disclosure; Figure 4 is a schematic structural diagram of a rotor according to an embodiment of the present disclosure; Figure 5 is a schematic diagram of the structure of a turntable according to an embodiment of the present disclosure. Figures 3 to 5 The cutting direction and Figure 1 The cutting direction is the same. Figure 1 and Figure 2 The dotted arrows in the figure are used to indicate the direction of movement of particles.

[0036] Please refer to Figures 1 to 5 The rotating device provided in this embodiment includes: a stator 100, a rotor 200 and a turntable 300. The stator 100, the rotor 200 and the turntable 300 are columnar structures respectively. The stator 100 is rotatably connected to the rotor 200, and the rotor 200 is fixedly connected to the turntable 300.

[0037] The stator 100 includes a first mounting hole 111 and a first mounting portion 112 . The first mounting portion 112 is located outside the first mounting hole 111 away from the central axis of the rotating device. A bearing 501 is disposed in the first mounting hole 111 .

[0038] Exemplarily, the stator 100 includes a stator base 110, which is cylindrical; a first mounting hole 111 is opened in the stator base 110, and the first mounting hole 111 is extended along the axial direction of the rotating device, and the opening of the first mounting hole 111 is located at the lower end surface of the stator base 110; the part of the stator base 110 located outside the first mounting hole 111 forms a first mounting portion 112.

[0039] The rotor 200 includes a second mounting portion 211 and a second mounting hole 212 . The second mounting hole 212 is located outside the second mounting portion 211 . The second mounting portion 211 is inserted into the first mounting hole 111 . The second mounting hole 212 matches the first mounting portion 112 .

[0040] Exemplarily, the rotor 200 includes a rotor base 210, which is cylindrical; the rotor base 210 is provided with a second mounting hole 212, the second mounting hole 212 extends along the axial direction of the rotating device, the opening of the second mounting hole 212 is located on the upper end surface of the rotor base 210, and the first mounting portion 112 is inserted into the second mounting hole 212; the portion of the rotor base 210 located on the inner side of the second mounting hole 212 forms a second mounting portion 211.

[0041] The second mounting portion 211 is inserted into the first mounting hole 111, and a bearing 501 is provided between the second mounting portion 211 and the hole wall of the first mounting hole 111. The bearing 501 may be located inside the second mounting portion 211. The bearing 501, as a rotating support, may be a ceramic bearing with oil-free lubrication, high hardness and high wear resistance.

[0042] In order to improve the motion stability and reliability, the second mounting portion 211 can be rotatably connected to the stator 100 through a plurality of bearings 501, and the plurality of bearings 501 are distributed at intervals along the axial direction of the rotating device. For example, the second mounting portion 211 is rotatably connected to the stator 100 through two bearings 501, one of which is disposed near the upper end of the second mounting portion 211, and the other is disposed near the lower end of the second mounting portion 211. The inner side surface of the second mounting portion 211 is connected with a folded edge, which is disposed near the upper end of the second mounting portion 211, and is located above the bearing 501 disposed near the upper end of the second mounting portion 211, and the folded edge is used to limit the bearing 501.

[0043] In order to improve the installation reliability of the bearing 501, a first positioning sleeve and a second positioning sleeve are arranged between two adjacent bearings 501, the first positioning sleeve corresponds to the inner ring of the bearing 501, and the second positioning sleeve corresponds to the outer ring of the bearing 501. In addition, a coil and a magnet are also arranged in the first installation hole 111, and the coil and the magnet can be located between the two bearings 501.

[0044] The structure or position of the components in the first mounting hole 111 can avoid particles. For example, the bearing 501 has an avoidance structure for particles to pass through, and there is a gap between the positioning sleeve, coil, etc. and the adjacent components for particles to pass through, so that the particles can fall to the bottom of the first mounting hole 111 and be discharged.

[0045] The turntable 300 is provided with a third mounting hole 311, the rotor 200 is mounted in the third mounting hole 311, and the rotor 200 is fixedly connected to the turntable 300. Exemplarily, the turntable 300 includes a turntable base 310, and the turntable base 310 is columnar. The turntable base 310 is provided with a third mounting hole 311, the third mounting hole 311 extends along the axial direction of the rotating device, and the orifice of the third mounting hole 311 is located at the upper end surface of the turntable base 310. The rotor base 210 and the stator base 110 are inserted into the third mounting hole 311.

[0046] The portion of the rotor base 210 located outside the second mounting hole 212 has a first gap with the hole wall of the third mounting hole 311, and the first gap is connected to the first mounting hole 111 so that particles falling to the bottom of the first mounting hole 111 can be discharged through the first gap. The specific size of the first gap can be set according to actual needs. Exemplarily, the first gap includes a first section and a second section; the first section is connected between the first mounting hole 111 and the second section, the first section extends in the radial direction of the rotating device, and the second section extends in the axial direction of the rotating device, and the first section and the second section can be annular spaces.

[0047] The first gap is used to accommodate the particles overflowing from the first mounting hole 111, and the first gap is also used to guide the particles to the particle outlet 312 (see Figure 8 ), so that the particles can be discharged out of the rotating device under the action of the adsorption force. Wherein, the particle outlet 312 is arranged near the upper end of the third mounting hole 311.

[0048] In specific implementation, when the rotor 200 drives the turntable 300 to rotate relative to the stator 100, the particles generated by the friction of the bearing 501 in the first mounting hole 111 move downward under the action of their own gravity and enter the first section of the first gap. As the number of particles increases, some particles will enter the second section of the first gap and gradually move toward the particle outlet 312. A vacuum device is provided at the particle outlet 312, and the vacuum device is used to provide an adsorption force, which can absorb the particles moving to the particle outlet 312 to reduce the particles in the rotating device, thereby reducing or even preventing the particles from affecting the rotating device to perform rotational motion, and can reduce or even prevent the particles from entering the chamber where the workpiece is located and affecting the quality of the workpiece.

[0049] It is understandable that when the adsorption force provided by the vacuum device is large enough, the adsorption force can act on the particles entering the first gap, so that the particles gradually move along the first gap toward the particle outlet 312, thereby reducing the particles accumulated in the rotating device.

[0050] In addition, an O-ring is provided between the portion of the stator base 110 located inside the first mounting hole 111 and the turntable base 310 to prevent particles from propagating inward from the connection between the stator base 110 and the turntable base 310. A structure that cooperates with each other is provided between the turntable base 310 and the rotor base 210 to ensure that the turntable base 310 and the rotor base 210 rotate synchronously. For example, a positioning protrusion is provided on one of the lower end surface of the rotor base 210 and the bottom wall of the third mounting hole 311, and a positioning groove is provided on the other.

[0051] In other embodiments, other devices capable of adsorbing particles may also be provided at the particle outlet 312. In other embodiments, the particle outlet 312 may also be located near the lower end of the rotating device. For example, the first gap includes a first section extending in the radial direction of the rotating device, and the particle outlet 312 may be provided on the outer side or lower end surface of the turntable 300. The turntable 300 and the rotor 200 are provided with a through hole for particles to pass through, and the through hole connects the first gap with the particle outlet 312.

[0052] The rotating device provided in this embodiment, through the above-mentioned arrangement, the rotor 200 cooperates with the stator 100 in a contact rotation manner through the bearing 501, thereby being able to improve the stability of the rotational motion, and by setting a first gap between the portion of the rotor 200 located outside the second mounting hole 212 and the turntable 300, and making the first gap connected to the first mounting hole 111 where the bearing 501 is located, in this way, the first gap can accommodate and guide the particles generated by the contact rotation to move toward the particle outlet 312, so that the particles can be discharged outside the rotating device under the action of the adsorption force, thereby being able to reduce or even avoid the influence of the particles on the quality of the workpiece.

[0053] Figure 6 is a schematic structural diagram of a rotating device according to an embodiment of the present disclosure; Figure 7 yes Figure 6 Schematic cross-section at AA; Figure 8 yes Figure 6 An enlarged schematic diagram of part B.

[0054] Please refer to Figures 6 to 8 , and continue to refer to Figures 1 to 5 In some embodiments, the rotating device includes a cover plate 400, and the cover plate 400 is disposed on the upper end of the third mounting hole 311. The cover plate 400 is fixedly connected to the turntable 300, so that the turntable 300 can drive the cover plate 400 to rotate together.

[0055] Exemplarily, the cover plate 400 may be a quartz plate. A support member for supporting the cover plate 400 is provided in the third mounting hole 311. The support member contacts the lower surface of the cover plate body 401 to ensure the installation reliability of the cover plate 400. In other examples, the upper end surface of the stator 100 or the turntable 300 is provided with a support structure for supporting the cover plate 400.

[0056] A matching structure may be provided between the turntable base 310 and the cover plate 400 to ensure synchronous rotation of the turntable base 310 and the cover plate 400. For example, a positioning protrusion is provided on one of the upper end surface of the turntable base 310 and the lower end surface of the cover plate 400, and a positioning groove is provided on the other.

[0057] In some examples, the cover 400 includes a cover body 401 and a first shielding portion 402, the first shielding portion 402 is connected to the lower surface of the cover body 401, the first shielding portion 402 is arranged close to the outer edge of the cover body 401, and there is a second gap between the first shielding portion 402 and the turntable 300, the second gap is connected to the end of the first gap away from the first mounting hole 111, so that particulate matter can be discharged from the second gap.

[0058] The shape of the cover plate body 401 can be adapted to the shape of the turntable 300. For example, when the turntable 300 is a cylindrical structure, the cover plate body 401 is a circular plate body. The first shielding portion 402 is folded downward relative to the cover plate body 401, so that the first shielding portion 402 can shield and guide the discharged particles, which is beneficial to prevent the particles from moving toward the upper surface of the cover plate 400 and affecting the quality of the workpiece.

[0059] Along the circumference of the rotating device, there is a second gap between at least part of the first shielding portion 402 and the turntable 300. The specific size of the second gap can be set according to actual needs. Exemplarily, the first shielding portion 402 can be an annular structure extending along the circumference of the cover plate body 401; along the circumference of the cover plate 400, there is a gap between the lower end surface of the first shielding portion 402 and the upper end surface of the turntable 300, and the gap forms a particle outlet 312; that is, the particle outlet 312 can be an annular space extending along the circumference of the cover plate 400. In other examples, the particle outlet 312 does not extend along the entire circumference of the cover plate 400, for example, the particle outlet 312 includes a semi-annular space, or the particle outlet 312 includes a plurality of openings spaced apart along the circumference of the turntable 300.

[0060] In some examples, the rotating device further includes: a first support member 502, which is supported and disposed between the cover plate 400 and the rotor 200. The first support member 502 is specifically located between the lower surface of the cover plate body 401 and the upper end surface of the rotor 200, and is used to support the cover plate 400.

[0061] The first support member 502 may be a cylindrical structure or a prismatic structure, and there are multiple first support members 502, which are spaced apart along the circumference of the rotor 200. In other examples, the first support member 502 may be a circular ring structure extending along the circumference of the rotor 200.

[0062] The material of the first support member 502 includes: heat insulation material to prevent the heat in the chamber where the workpiece is located from being transferred downward, thereby preventing high temperature from affecting the normal operation of the rotating device. In addition, the material of the first support member 502 can also include elastic material to make the first support member 502 elastic, thereby alleviating the impact of the impact vibration of the rotor 200 on the workpiece.

[0063] In some examples, the rotating device further includes: a second support member 503 connected to the lower end of the first support member 502, and the lower end of the second support member 503 is connected to the upper end surface of the rotor 200. The upper end of the first support member 502 is connected to the lower surface of the cover body 401 in the cover 400.

[0064] The second support member 503 may be a cylindrical structure or a prismatic structure, and there are multiple second support members 503, which are spaced apart along the circumference of the rotor 200. In other examples, the second support member 503 may be a circular ring structure extending along the circumference of the rotor 200.

[0065] The specific shape and distribution of the second support member 503 correspond to the first support member 502. Exemplarily, the first support member 502 and the second support member 503 are columnar respectively; there are multiple first support members 502, and the multiple first support members 502 are distributed at intervals along the circumference of the rotor 200; the number and distribution position of the second support members 503 correspond to the first support members 502. For example, there are 3 or 4 or 5 or 6 or more first support members 502, and each first support member 502 is spaced and evenly distributed along the circumference of the rotor 200; the number of the second support members 503 is the same as the number of the first support members 502, and each second support member 503 is respectively arranged corresponding to the first support member 502.

[0066] The material of at least one of the first support member 502 and the second support member 503 includes: thermal insulation material. The material of at least one of the first support member 502 and the second support member 503 includes elastic material. Exemplarily, the material of the first support member 502 includes thermal insulation material; the material of the second support member 503 includes thermal insulation material and elastic material; wherein the thermal insulation performance of the second support member 503 may be higher than the thermal insulation performance of the first support member 502. In other examples, the material of the first support member 502 includes thermal insulation material and elastic material; the material of the second support member 503 includes thermal insulation material.

[0067] In order to improve the connection reliability between the first support member 502 and the cover plate 400, a mounting groove may be provided on the lower surface of the cover plate body 401 of the cover plate 400, and the upper end of the first support member 502 may be inserted into the mounting groove. Alternatively, one of the first support member 502 and the cover plate body 401 is provided with a protrusion, and the other is provided with a groove that matches the protrusion. Alternatively, the first support member 502 and the cover plate 400 are fixed by bonding.

[0068] In order to improve the connection reliability between the second support member 503 and the turntable 300, a mounting groove may be provided on the upper surface of the turntable 300, and the lower end of the second support member 503 may be inserted into the mounting groove. Alternatively, one of the second support member 503 and the turntable 300 is provided with a protrusion, and the other is provided with a groove that matches the protrusion. Alternatively, the second support member 503 and the turntable 300 are fixed by bonding.

[0069] In order to improve the installation reliability of the first support member 502 and the second support member 503, one of the first support member 502 and the second support member 503 is provided with a protrusion, and the other is provided with a groove matching the protrusion. Alternatively, the first support member 502 and the second support member 503 are fixed by bonding.

[0070] In some embodiments, the upper end surface of the turntable base 310 is connected with a first protruding portion 320 protruding upward, the first protruding portion 320 is located on the inner side of the first shielding portion 402, the first protruding portion 320 is located on the outer side of the first support member 502, and the upper end surface of the first protruding portion 320 is lower than the upper end surface of the first support member 502. There is a third gap between the upper end surface of the first protruding portion 320 and the lower surface of the cover body 401; a part of the second gap is located between the outer side surface of the first protruding portion 320 and the inner side surface of the first shielding portion 402, and another part of the second gap is located between the lower end surface of the first shielding portion 402 and the upper end surface of the turntable base 310.

[0071] In addition, there is a fourth gap between the first support member 502 and the hole wall of the third mounting hole 311, and there is a fifth gap between the second gap and the hole wall of the third mounting hole 311. Along the moving direction of the particles, the first mounting hole 111, the first gap, the fifth gap, the fourth gap, the third gap and the second gap are arranged in sequence and in communication to form a channel for the particles to be discharged. In addition, the upper end surface of the turntable base 310 located outside the cover plate 400 can be used as a connecting surface, which is used to be sealed and connected to the chamber where the workpiece is located.

[0072] In this embodiment, through the above-mentioned arrangement, the structure of the channel for discharging particles is made more complex, which plays the role of a labyrinth seal, preventing particles from propagating in unexpected directions, thereby preventing particles from affecting the operation of the rotating device and the quality of the workpiece.

[0073] In some examples, the lower surface of the cover body 401 is further connected with a second shielding portion 403 extending downward, and the second shielding portion 403 is located on the inner side of the first support member 502. The second shielding portion 403 can be an annular structure. The second shielding portion 403 blocks the particles and prevents the particles from propagating toward the central axis of the rotating device.

[0074] Among them, the lower end surface of the second shielding portion 403 can be flush with the lower end surface of the first shielding portion 402; or, the lower end surface of the second shielding portion 403 is slightly lower than the lower end surface of the first shielding portion 402, and there is a gap between the lower end surface of the second shielding portion 403 and the upper end surface of the stator base 110 to avoid contact friction between the second shielding portion 403 and the stator base 110.

[0075] In some examples, the upper end surface of the stator base 110 is connected with a second protruding portion 120 protruding upward, and the second protruding portion 120 is located between the second shielding portion 403 and the first support member 502, and there are gaps between the second protruding portion 120 and the second shielding portion 403 and the first support member 502. The second protruding portion 120 can be an annular structure. The second protruding portion 120 blocks the particles and prevents the particles from propagating toward the central axis of the rotating device.

[0076] Among them, the upper end surface of the second protrusion 120 can be flush with the upper end surface of the first protrusion 320; or, the upper end surface of the second protrusion 120 is slightly higher than the upper end surface of the first protrusion 320, and the upper end surface of the second protrusion 120 is slightly lower than the upper end surface of the first support member 502, so as to avoid contact friction between the second protrusion 120 and the cover body 401.

[0077] In addition, the cover plate 400 is detachable to facilitate cleaning or replacement of the stator base 110, the rotor base 210 and the turntable base 310. The turntable base 310 and the cover plate 400 may be provided with mutually cooperating positioning structures, such as protrusions and grooves, so that the cover plate 400 can rotate synchronously with the turntable base 310.

[0078] In addition, reflective layers are respectively attached to the upper end surfaces of the turntable base 310 , the rotor base 210 and the stator base 110 , so as to improve the absorption utilization rate of the workpiece to the light source at low temperature.

[0079] Please refer to Figure 3 and Figure 7In some embodiments, a first cooling channel 130 is provided in the stator base 110, and the first cooling channel 130 is provided near the upper end of the stator base 110. Exemplarily, the stator base 110 includes an annular portion and a connecting portion, and the connecting portion is covered on the upper end of the annular portion. Among them, at least part of the first mounting hole 111 is located in the annular portion. The first cooling channel 130 is located in the connecting portion. The first cooling channel 130 may include an annular channel extending along the circumference of the connecting portion; or, the first cooling channel 130 includes a plurality of channels extending along the radial direction of the connecting portion; or, the first cooling channel 130 may include a circular channel extending in the horizontal direction.

[0080] In this embodiment, the fluid entering the first cooling channel 130 is used to cool the lower end surface of the workpiece and can cool the connection portion between the cover plate 400 and the stator base 110. The fluid may be gas or liquid or a gas-liquid mixture.

[0081] In some examples, the first cooling channel 130 has a first liquid inlet and a first liquid outlet, and the distance between the first liquid inlet and the first liquid outlet is less than the preset distance. In this way, the first liquid inlet and the first liquid outlet can be arranged side by side, which is conducive to reducing the temperature difference between the area corresponding to the first liquid inlet and the area corresponding to the first liquid outlet, thereby facilitating ensuring the consistency of the temperature of the lower end surface of the workpiece. In other examples, the first liquid inlet and the first liquid outlet can also be located on opposite sides of the connecting portion.

[0082] Figure 3 The dotted arrows in the figure are used to indicate the direction of fluid movement. Figure 3 In some embodiments, a second cooling channel 140 is provided in the stator base 110 , and the second cooling channel 140 is located below the first cooling channel 130 . The fluid entering the second cooling channel 140 is used to cool the stator base 110 .

[0083] In some examples, at least a portion of the second cooling channel 140 extends along the axial direction of the rotating device, which helps to ensure the uniformity of the temperature of the stator base 110 .

[0084] In some examples, the second cooling channel 140 has a second liquid inlet and a second liquid outlet, and the second liquid inlet is located below the second liquid outlet. For example, the second liquid inlet is arranged near the lower end of the first cooling channel 130, and the second liquid outlet is arranged near the upper end of the cooling channel. In this way, the fluid entering the second cooling channel 140 flows from bottom to top, which is conducive to the fluid fully exchanging heat with the stator matrix 110, thereby improving the cooling effect. In other examples, the second liquid inlet is located above the second liquid outlet.

[0085] In some examples, part of the second cooling channel 140 is located inside the first mounting hole 111; part of the second cooling channel 140 is located outside the first mounting hole 111, which is conducive to ensuring the uniformity of the temperature of the stator base 110 and can cool the rotor base 210 and the components located in the first mounting hole 111. In other examples, the second cooling channel 140 can also be located inside the first mounting hole 111, or outside the first mounting hole 111.

[0086] Exemplarily, the second cooling channel 140 includes: a first vertical sub-channel 141, a second vertical sub-channel 143, a third vertical sub-channel 145, a first horizontal sub-channel 142, a second horizontal sub-channel 144 and a third horizontal sub-channel 146; the first vertical sub-channel 141 is located on the inner side of the first mounting hole 111, the lower end of the first vertical sub-channel 141 is communicated with the second liquid inlet, the upper end of the first vertical sub-channel 141 is communicated with the first horizontal sub-channel 142, the first horizontal sub-channel 142 is located above the first mounting hole 111, and the first horizontal sub-channel 142 is also communicated with the second vertical sub-channel 143, The second vertical sub-channel 143 is located outside the first mounting hole 111, and the lower end of the second vertical sub-channel 143 is connected to the third horizontal sub-channel 146, and the third horizontal sub-channel 146 is also connected to the third vertical sub-channel 145, and the third vertical sub-channel 145 is located outside the second vertical sub-channel 143, and the upper end of the third vertical sub-channel 145 is higher than the upper end of the second vertical sub-channel 143, and the upper end of the third vertical sub-channel 145 is connected to the upper end of the third horizontal sub-channel 146, and the third horizontal sub-channel 146 is located above the second horizontal sub-channel 144, and the third horizontal sub-channel 146 is connected to the second liquid outlet.

[0087] The first vertical sub-channel 141, the second vertical sub-channel 143 and the third vertical sub-channel 145 all extend along the axial direction of the rotating device and are all annular. The first horizontal sub-channel 142, the second horizontal sub-channel 144 and the third horizontal sub-channel 146 all extend in the horizontal direction; the first horizontal sub-channel 142 and the second horizontal sub-channel 144 can be annular respectively, for connecting the corresponding vertical sub-channels; the third horizontal sub-channel 146 can be a circular channel, and the third horizontal sub-channel 146 is located inside the third vertical sub-channel 145.

[0088] It is understandable that the number of vertical sub-channels and horizontal sub-channels in the second cooling channel 140 is not limited to this, and this embodiment is only used as an example. For example, there are five or seven vertical sub-channels and horizontal sub-channels respectively.

[0089] In addition, the stator matrix 110 may include a plurality of plates, each of which is sealed and connected, and the gap between two radially adjacent plates may form a sub-channel. Alternatively, the stator matrix 110 may be a cylindrical matrix, and a sub-channel may be machined in the matrix using deep hole machining technology.

[0090] Figure 5 The dotted arrows in the figure are used to indicate the direction of fluid movement. Figure 5 and Figure 7 In some embodiments, a third cooling channel 30 is provided in the turntable base 310, and the fluid entering the third cooling channel 30 is used to cool the turntable 300. At least a portion of the third cooling channel 30 extends along the axial direction of the rotating device to ensure uniform temperature of the turntable 300 and also cool the rotor base 210.

[0091] The third cooling channel 30 has a third liquid inlet and a third liquid outlet, and the third liquid inlet is located below the third liquid outlet. In this way, the fluid entering the third cooling channel 30 flows from bottom to top, which is conducive to the fluid fully exchanging heat with the turntable base 310, thereby improving the cooling effect. In other examples, the third liquid inlet is located above the third liquid outlet.

[0092] Exemplarily, the third cooling channel 30 includes: a fourth vertical sub-channel 331, a fourth horizontal sub-channel and a fifth horizontal sub-channel, the fourth horizontal sub-channel is connected to the lower end of the fourth vertical sub-channel 331, and the fourth horizontal sub-channel is located on the inner side of the fourth vertical sub-channel 331, and the fourth horizontal sub-channel is connected to the third liquid inlet; the fifth horizontal sub-channel is connected to the upper end of the fourth vertical sub-channel 331, and the fifth horizontal sub-channel is located on the outer side of the fourth vertical sub-channel 331, and the fifth horizontal sub-channel is connected to the third liquid outlet.

[0093] The fourth vertical sub-channel 331 extends along the axial direction of the rotating device and is annular. The fourth horizontal sub-channel and the fifth horizontal sub-channel extend in the horizontal direction and are also annular. It can be understood that the number of vertical sub-channels and horizontal sub-channels in the third cooling channel 30 is not limited to this, and this embodiment is only used as an example.

[0094] In addition, the first liquid inlet, the second liquid inlet and the third liquid inlet can be connected to the cooling source through pipelines, respectively. The pipelines connected to the first liquid inlet, the second liquid inlet and the third liquid inlet are provided with a switch valve and a flow regulating valve, and the opening and closing of each liquid inlet and the fluid flow rate can be independently controlled. The first liquid outlet, the second liquid outlet and the third liquid outlet can be connected to the coolant recovery device through pipelines, respectively. The pipelines connected to the first liquid outlet, the second liquid outlet and the third liquid outlet are provided with a switch valve and a flow regulating valve, and the opening and closing of the cooling channel corresponding to each liquid outlet and the fluid flow rate can be independently controlled.

[0095] In other embodiments, a fourth cooling channel may be provided in the rotor base 210 , and at least a portion of the fourth cooling channel extends along the axial direction of the rotating device to improve the cooling effect on the rotor base 210 .

[0096] This embodiment also provides a heat treatment device, comprising: a rotating device as in any of the above embodiments, and a vacuum device; the vacuum device is used to provide adsorption force for adsorbing particles. In addition, the heat treatment device also includes a chamber, the chamber is used to accommodate the workpiece and perform heat treatment on the workpiece, and the chamber is sealed and connected to the connection surface of the turntable base 310. The specific structure of the vacuum device and the chamber can be set according to actual needs.

[0097] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present disclosure. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner.

[0098] In the description of the present disclosure, it is necessary to understand that the terms "upper", "lower", "vertical", "horizontal", "top", "bottom", "inside", "outside", "axial", "radial", "circumferential", etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present disclosure.

[0099] In addition, the terms "first", "second", etc. used in the embodiments of the present disclosure are only used for descriptive purposes and should not be understood as indicating or implying relative importance, or implicitly indicating the number of technical features indicated in the embodiments. Therefore, the features defined by the terms "first", "second", etc. in the embodiments of the present disclosure may explicitly or implicitly indicate that at least one of the features is included in the embodiment. In the description of the present disclosure, the word "multiple" means at least two or two or more, such as two, three, four, etc., unless otherwise clearly and specifically defined in the embodiments.

[0100] In the present disclosure, unless otherwise clearly specified or limited in the embodiments, the terms "installed", "connected", "connected" and "fixed" etc. appearing in the embodiments should be understood in a broad sense. For example, the connection can be a fixed connection, a detachable connection, or an integrated connection. It can be understood that it can also be a mechanical connection, an electrical connection, etc.; of course, it can also be a direct connection, or an indirect connection through an intermediate medium, or it can be the internal connection of two elements, or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present disclosure can be understood according to the specific implementation situation.

[0101] In the present disclosure, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being "above", "above" or "above" a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being "below", "below" or "below" a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0102] Although the embodiments of the present disclosure have been shown and described above, it is to be understood that the above embodiments are exemplary and are not to be construed as limitations of the present disclosure. A person skilled in the art may change, modify, replace and vary the above embodiments within the scope of the present disclosure.

Claims

1. A rotating device, comprising: A stator, the stator comprising a first mounting hole and a first mounting portion, the first mounting portion being located outside the first mounting hole away from the central axis of the rotating device, and a bearing being arranged in the first mounting hole; A rotor, the rotor comprising a second mounting portion and a second mounting hole, the second mounting hole being located outside the second mounting portion, the second mounting portion being inserted into the first mounting hole, and the second mounting hole being matched with the first mounting portion; A turntable, wherein the turntable is provided with a third mounting hole, the rotor and the stator are mounted in the third mounting hole, and the rotor is fixedly connected to the turntable; a first gap is provided between the rotor and the hole wall of the third mounting hole, the first gap is connected to the first mounting hole, the first gap is used to accommodate particulate matter overflowing from the first mounting hole, and the first gap is also used to guide the particulate matter to the particulate matter outlet, so that the particulate matter can be discharged outside the rotating device under the action of adsorption force.

2. The rotating device according to claim 1, further comprising: A cover plate, the cover plate being arranged on the upper end of the third mounting hole; The cover plate includes a cover plate body and a first shielding portion, wherein the first shielding portion is connected to the lower surface of the cover plate body, the first shielding portion is arranged close to the outer edge of the cover plate body, and a second gap is provided between the first shielding portion and the turntable, so that the particles can be discharged from the second gap; Wherein, the part of the second gap located between the lower end surface of the first shielding portion and the upper end surface of the turntable forms the particle outlet.

3. The rotating device according to claim 2, further comprising: A first support member is provided between the cover plate and the rotor.

4. The rotating device according to claim 3, further comprising: a second support member, the second support member being connected to the lower end of the first support member, and the lower end of the second support member being connected to the upper end surface of the rotor; The upper end of the first support member is connected to the lower surface of the cover plate body in the cover plate; Wherein, the material of at least one of the first support member and the second support member includes: heat insulation material; the material of at least one of the first support member and the second support member includes elastic material.

5. The rotating device according to claim 4, wherein: The first support member and the second support member are respectively in a column shape; There are a plurality of the first support members, which are distributed at intervals along the circumferential direction of the rotor; the number and distribution positions of the second support members correspond to those of the first support members.

6. The rotating device according to claim 3, wherein: The turntable includes a turntable base, the upper end surface of which is connected to a first protruding portion protruding upward, the first protruding portion is located between the first shielding portion and the first support member, and the upper end surface of the first protruding portion is lower than the upper end surface of the first support member.

7. The rotating device according to claim 3, wherein: The lower surface of the cover body is also connected to a second shielding portion extending downward, and the second shielding portion is located on the inner side of the first support member.

8. The rotating device according to claim 7, wherein: The stator comprises a stator base body, an upper end surface of the stator base body is connected with a second protruding portion protruding upward, and the second protruding portion is located between the second shielding portion and the first supporting member.

9. The rotating device according to claim 1, wherein: A first cooling channel is provided in the stator, and the first cooling channel is provided near the upper end of the stator; wherein the first cooling channel has a first liquid inlet and a first liquid outlet, and the distance between the first liquid inlet and the first liquid outlet is smaller than a preset distance.

10. The rotating device according to claim 1, wherein: A second cooling channel is provided in the stator, and at least a portion of the second cooling channel extends along the axial direction of the rotating device.

11. The rotating device according to claim 10, wherein: The second cooling channel has a second liquid inlet and a second liquid outlet, and the second liquid inlet is located below the second liquid outlet.

12. The rotating device according to claim 10, wherein: A portion of the second cooling channel is located inside the first mounting hole; A portion of the second cooling channel is located outside the first mounting hole.

13. The rotating device according to claim 1, wherein: A third cooling channel is provided in the turntable, and at least a portion of the third cooling channel extends along the axial direction of the rotating device.

14. The rotating device according to claim 13, wherein: The third cooling channel has a third liquid inlet and a third liquid outlet, and the third liquid inlet is located below the third liquid outlet.

15. A heat treatment device comprising: The rotating device according to any one of claims 1 to 14, and a vacuum device; The vacuum device is used to provide adsorption force for adsorbing particulate matter.

Images