Battery cutting edge passivation method, battery, photovoltaic module and photovoltaic system

Abstract

The invention is suitable for the technical field of solar energy, and provides a cutting edge passivation method of a battery, the battery, a photovoltaic module and a photovoltaic system. The passivation method for the cutting edge of the battery comprises the following steps: providing a battery piece which comprises a front surface and a back surface which are opposite to each other, and a cutting edge connected between the front surface and the back surface; forming mask layers on the front surface and the back surface; forming a passivation layer on the cutting edge; and removing the mask layers on the front surface and the back surface. According to the method for passivating the cutting edge of the battery, the passivation layer can be formed on the cutting edge, water, oxygen and other environments are isolated through the passivation layer, the cutting edge is prevented from being corroded, the photoelectric conversion efficiency of the battery in use is guaranteed, and the use performance is guaranteed.

Description

Technical Field

[0001] The present invention belongs to the technical field of solar energy, and in particular relates to a method for passivating the cut edge of a battery, a battery, a photovoltaic module and a photovoltaic line system. Background Art

[0002] Solar power generation, as a green, clean, environmentally friendly, and pollution-free technology, has become a widespread technology that has penetrated thousands of households. The production process of solar cells, such as perovskite cells, involves a cutting step. However, after the cells are cut, if the cut edges are not passivated, the perovskite layer, for example, is susceptible to corrosion from environmental factors (such as moisture and oxygen), causing hydrolysis or oxidation reactions. Furthermore, charge recombination at the cut edges can reduce the cell's photoelectric conversion efficiency, leading to decreased cell performance. Summary of the Invention

[0003] The cut edge passivation method of a battery provided in an embodiment of the present invention aims to solve the problems of corrosion reaction and charge recombination occurring at the cut edge of a battery cell in the prior art.

[0004] In a first aspect, an embodiment of the present invention provides a method for passivating a cut edge of a battery, comprising:

[0005] Providing a battery cell, the battery cell comprising a front side and a back side opposite to each other, and a cut edge connected between the front side and the back side;

[0006] forming a mask layer on the front surface and the back surface;

[0007] forming a passivation layer on the cutting edge;

[0008] The mask layers on the front side and the back side are removed.

[0009] Furthermore, before the step of forming a mask layer on the front surface and the back surface, the cutting edge passivation method further comprises:

[0010] The cutting damage on the cutting edge is subjected to corrosion pretreatment.

[0011] Furthermore, after the step of forming the mask layer on the front surface and the back surface and before the step of forming the passivation layer on the cutting edge, the cutting edge passivation method further includes:

[0012] The mask material adhered to the cutting edge is cleaned.

[0013] Furthermore, the step of forming a mask layer on the front surface and the back surface includes:

[0014] applying a mask material on the front surface and the back surface;

[0015] The mask material is cured on the cell under preset conditions to obtain a mask layer.

[0016] Furthermore, the preset conditions include:

[0017] The battery cell is heated using hot air at 80-120° C. for 10-20 minutes.

[0018] Furthermore, the material of the mask layer is photoresist.

[0019] Furthermore, forming a passivation layer on the cutting edge includes:

[0020] The cell is placed in a deposition device to deposit a passivation layer.

[0021] Furthermore, the material of the passivation layer is aluminum oxide.

[0022] Furthermore, the thickness of the aluminum oxide is in the range of 10 nm to 200 nm.

[0023] Furthermore, removing the mask layers on the front surface and the back surface includes:

[0024] The cell is placed in a corrosion solution to corrode and remove the mask layers on the front and back surfaces.

[0025] In a second aspect, an embodiment of the present invention provides a battery, which is prepared by using the above-mentioned method for passivating the cut edge of the battery.

[0026] In a third aspect, an embodiment of the present invention provides a photovoltaic module comprising the above-mentioned battery.

[0027] In a fourth aspect, an embodiment of the present invention provides a photovoltaic system, comprising the above-mentioned photovoltaic assembly.

[0028] The beneficial effects achieved by the cell cut edge passivation method, cell, photovoltaic module and photovoltaic line system of the present invention are as follows:

[0029] First, the cutting damage generated at the cutting edge is pre-treated by corrosion to improve the stability of the subsequent passivation layer setting and improve the problem of low battery conversion efficiency caused by the recombination formed at the cutting edge interface during laser cutting; a mask layer is formed on the front and back of the battery cell to prevent the passivation material from adhering to the front and back of the battery cell when the passivation layer is subsequently set; then the mask material that may adhere to the cutting edge is removed to ensure the adhesion stability of the passivation layer on the cutting edge when the passivation layer is formed on the cutting edge, and finally an aluminum oxide passivation layer is formed on the cutting edge. Due to the density and stable properties of aluminum oxide, the cutting edge of the battery cell is effectively protected to avoid erosion by water and oxygen and charge recombination, thereby ensuring the photoelectric conversion efficiency of the battery during use and ensuring performance; finally, the mask layer on the front and back of the battery cell is removed to expose the battery cell to the air to ensure subsequent photoelectric conversion efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 is a schematic structural diagram of a battery cell provided by an embodiment of the present invention;

[0031] Figure 2 yes Figure 1 Schematic diagram of the structure of the battery after the mask layer is formed;

[0032] Figure 3 yes Figure 1 Schematic diagram of the structure after the passivation layer is formed on the cut edge of the battery cell;

[0033] Figure 4 It is a schematic flow chart of a cutting edge passivation method provided in an embodiment of the present invention.

[0034] Explanation of the main component symbols: 100-battery cell, 10-front, 20-back, 30-cutting edge, 40-mask layer, 50-passivation layer. DETAILED DESCRIPTION

[0035] In order to make the purpose, technical solutions and advantages of the present invention more clearly understood, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.

[0036] Briefly describe the distinguishing features between the present invention and the prior art, which constitute the inventive concept of the present invention

[0037] Solar cells, such as perovskite cells, are cut by laser during the manufacturing process. After being cut to the required size, they are then made into photovoltaic modules. In this way, the cut edges 30 are exposed to the air and react with moisture and oxygen in the air. At the same time, charge recombination occurs at the edges. The edge recombination is serious, resulting in a serious loss of conversion efficiency. Therefore, in order to solve the above technical problems, please refer to Figures 1 to 4 , the present invention provides a method 200 for passivating the cut edge of a battery.

[0038] Example 1

[0039] S1, see Figure 1 , providing a battery cell 100 , the battery cell 100 includes a front side 10 and a back side 20 opposite to each other, and a cutting edge 30 connected between the front side 10 and the back side 20 .

[0040] Among them, the battery cell 100 described in this embodiment refers to a perovskite battery, which includes a transparent conductive layer, an electron transport layer, a perovskite functional layer, a hole transport layer, and a top electrode layer in sequence. When exposed to sunlight, the perovskite functional layer acts as a photoelectric conversion material and can convert sunlight into electrical energy. The perovskite layer first absorbs photons to generate electron-hole pairs. These uncombined electrons and holes are collected by the electron transport layer and the hole transport layer, respectively. That is, electrons are transported from the perovskite layer to the electron transport layer and collected by the transparent conductive layer; holes are transported from the perovskite layer to the hole transport layer and collected by the metal electrode. Finally, the transparent conductive layer and the metal electrode are connected through an external circuit to generate photocurrent.

[0041] Among them, the transparent conductive layer has high transparency and good conductivity, allowing light to enter the battery. The relevant materials can be indium tin oxide (ITO), fluorine-doped tin oxide (FTO), aluminum zinc oxide (AZO), gallium zinc oxide (GZO) and indium zinc oxide (IZO) and other materials, which serve as electron collection points; the electron transport layer plays the role of electron transport, and often uses materials such as titanium dioxide (TiO2) or zinc oxide (ZnO); the perovskite functional layer is used to receive photons to generate electron-hole pairs. The general structural formula of the perovskite light-absorbing layer is ABX3, where A is a cation and A is selected from MA+, FA+, One or more of Rb+, Cs+; B is a cation and B is selected from one or more of Pb2+, Sn2+; C is an anion and is selected from one or more of Cl-, Br-, and I-; the hole transport layer is used to transport holes, promote the transmission of photogenerated holes from the perovskite layer to the electrode (or called the positive electrode, anode), and at the same time block the reverse flow of electrons. Inorganic materials such as NiO can be used, which can effectively extract and transport photogenerated holes, thereby improving the photoelectric performance of the battery; the top electrode layer is arranged on the top of the battery, for example, any one of Ag, Cu, and Au can be used to guide current to the external circuit.

[0042] The perovskite functional layer has poor stability, is not resistant to high temperatures and light, is easily hydrolyzed and oxidized, and is prone to secondary reactions when exposed to the environment. Furthermore, charge recombination is prone to occur at the cut edges. Therefore, it is necessary to passivate the edges.

[0043] Among them, when preparing the battery cell 100, the entire battery is first cut into pieces, for example, by laser cutting or water cutting. After cutting, the battery cell 100 includes a front side 10, a back side 20, and a cutting edge 30 connected between the front side 10 and the back side 20, so that each layer is exposed to the air on the side.

[0044] Specifically, when laser cutting is used, a high-power density laser beam is used to irradiate the battery cell 100, so that the irradiated area of ​​the battery cell 100 is heated to the vaporization temperature, evaporated to form holes, and as the light beam moves on the battery cell 100, the holes continuously form a very narrow slit, for example, a slit of about 0.1 mm, to complete the cutting of the material; when water cutting is used, a high-pressure water flow impacts the battery cell 100, generating an impact force on the battery cell 100 to achieve the cutting of the battery cell 100.

[0045] S2, performing corrosion pretreatment on the cutting damage of the cutting edge 30.

[0046] Furthermore, since there will be cutting damage on the cutting edge 30 when the battery cell 100 is cut, the damaged edge needs to be corroded and pre-treated after the cutting is completed to remove the corroded part caused by the cutting, so as to improve the setting stability of the subsequent passivation layer 50 in the subsequent film forming step, and improve the problem of low battery conversion efficiency caused by the composite formed at the interface of the cutting edge 30 during laser cutting.

[0047] For example, the cutting edge 30 can be corroded by a corrosive solution. Other suitable alkaline corrosive solutions such as KOH solution can be used. The concentration of the corrosive solution can be 10%-50%, and the temperature can be 20-70°C. The cutting edge 30 is contacted with the corrosive solution for 4-7 minutes. The corrosion depth from the edge to the center can be about 1-3 μm to eliminate the aforementioned laser cutting damage area and remove the edge of charge recombination.

[0048] After the damaged edge is removed, in order to prevent the corrosive solution from remaining on the cut edge 30, the front surface 10 and the back surface 20, the entire surface of the battery cell 100 can be cleaned, for example, using distilled water or deionized water to clean the cut edge 30, the front surface 10 and the back surface 20 to remove the corrosive solution remaining on the battery surface in the above-mentioned corrosion step.

[0049] S3, forming a mask layer 40 on the front surface 10 and the back surface 20, see Figure 2 .

[0050] After the cell 100 is cut, a mask layer 40 is formed on the front side 10 and the back side 20 of the cell 100 in this step to protect the front side 10 and the back side 20 of the cell 100 .

[0051] Specifically, when the mask layer 40 is formed on the front surface 10 and the back surface 20 of the entire cell 100, the following steps are included:

[0052] Masking material is applied to the front side 10 and the back side.

[0053] In this embodiment, the mask layer 40 is made of photoresist. Specifically, photoresist is a light-sensitive liquid mixture composed of three main components: a photosensitive resin, a sensitizer, and a solvent. When exposed to ultraviolet light, electron beams, ion beams, X-rays, or other light, its solubility changes, and it is used as a corrosion-resistant coating material, characterized by its stable properties. In another embodiment, the photoresist can be cured by heating.

[0054] Specifically, when the photoresist is coated on the surface of the cell 100 , it can be coated on the surface of the cell 100 by spin coating, scraping or slit coating.

[0055] Among them, when forming the mask material on the surface of the battery cell 100 by spin coating, liquid photoresist material is dripped on the battery cell 100, and then the battery cell 100 is rotated to evenly distribute the photoresist material, and finally a uniform thin film is formed; when forming the mask material on the surface of the battery cell 100 by scraping, the photoresist material is evenly coated on the battery cell 100 by a scraper, and then a photoresist layer is formed by volatilization of the solvent; when forming the mask on the surface of the battery cell 100 by slit coating, the mask material is gradually coated on the surface of the battery cell 100 through a slit die head, and a mask is formed after solidification.

[0056] After the mask material is applied, in the next step, the cell 100 is placed under predetermined conditions to solidify the mask material to form a mask layer 40 .

[0057] Specifically, in this embodiment, after the mask material is coated, the cell 100 is heated with heated air at 80-120° C. for 10-20 minutes. The mask material is cured by this temperature and time drying method, thereby obtaining a cured mask layer 40. In other embodiments, curing can also be performed by light-sensitive means, such as by irradiation or radiation with ultraviolet light, electron beam, ion beam, X-ray, etc., to change the solubility of the photoresist and cure it into an etch-resistant thin film material.

[0058] S4, cleaning the mask material adhered to the cutting edge 30.

[0059] After completing the preparation of the above-mentioned mask layer 40, since some mask material may be attached to the surface of the cutting edge 30 when the mask material is coated on the front surface 10 and the back surface 20, the cutting edge 30 needs to be cleaned to remove the mask material on the cutting edge 30, so that the cutting edge 30 can be exposed for the step of setting the passivation layer 50.

[0060] Specifically, when removing the mask layer 40 of the cutting edge 30 , the cell 100 is placed in a corrosive solution to remove the mask material of the cutting edge 30 .

[0061] The etching solution can be an acetone or isopropyl alcohol solution. The acetone or isopropyl alcohol gradually dissolves or decomposes the photoresist. To ensure the dissolution effect, the concentration of acetone or isopropyl alcohol is greater than 99%. Thus, using a high-concentration etching solution can achieve better photoresist removal. Furthermore, when etching the photoresist with the acetone or isopropyl alcohol solution, the acetone or isopropyl alcohol can be slightly heated, for example, to 40°C to 50°C. The higher temperature of the etching solution helps to accelerate the etching rate. The etching contact time can be 2-5 minutes to adhere to the mask material on the cutting edge 30.

[0062] Furthermore, in order to ensure the thoroughness of the photoresist removal, ultrasonic and external force wiping methods can be further added to ensure the accuracy of the photoresist removal. In another embodiment, a plasma removal method, such as microwave plasma removal, can be used to achieve an efficient removal effect.

[0063] Furthermore, to avoid corrosion of the mask layer 40 on the front surface 10 and the back surface 20, mask etching or laser cutting can be used when etching the mask material at the cut edge 30 to control the size of the exposed area, thereby ensuring the accuracy of edge removal. For example, a photolithography mask designed with the same size as the cell 100 can be used to selectively block or allow light to pass through, ensuring that only the required edge area around the cell 100 is exposed, thereby achieving the effect of removing the mask material only at the cut edge 30.

[0064] S5, forming a passivation layer 50 on the cutting edge 30, see Figure 3 .

[0065] After the photoresist at the cutting edge 30 is removed, a passivation layer 50 is formed on the cutting edge 30 in this step.

[0066] Specifically, the passivation layer 50 is formed on the cut edge 30 of the cell 100 by placing the cell 100 in a deposition device, such as an atomic layer deposition device, and depositing a substance layer by layer on the surface of the cell 100 in the form of a single atomic film to form the passivation layer 50. In this embodiment, the passivation layer 50 is aluminum oxide. Aluminum oxide has strong stability, corrosion resistance, and insulation properties, and is also relatively low in cost. In other embodiments, the passivation layer 50 may also be deposited by chemical vapor deposition or physical vapor deposition.

[0067] Specifically, when forming the aluminum oxide passivation layer 50 on the cutting edge 30, in this embodiment, it is formed in an atomic deposition device by using trimethylaluminum as a precursor and water as a reaction source, and is carried out at a temperature of 200°C-250°C. Trimethylaluminum and water react to eventually form methane and an aluminum oxide film (Al2O3). The aluminum oxide film covers the surface of the cutting edge 30, and excess methane is purged from the reaction chamber by nitrogen. For example, trimethylaluminum and water are circulated at 250°C to prepare an aluminum oxide layer of a preset thickness, and multiple depositions are performed. The thickness of the passivation layer 50 formed by the aluminum oxide is precisely controlled by the number of depositions. After the deposition of the aluminum oxide is completed, a rapid annealing furnace can be used to perform a rapid annealing treatment on the deposited cell 100. For example, the annealing time can be set to 30-360s, and the annealing temperature can be set to 300-360°C.

[0068] Furthermore, the thickness of the aluminum oxide layer in this embodiment ranges from 10 to 200 nm. This thickness avoids the passivation layer 50 being too thin to achieve the desired water and oxygen isolation effect, and also avoids the passivation layer 50 being too thick, which would increase deposition costs. The thickness of the aluminum oxide layer can be set to 10 nm, 50 nm, 100 nm, 150 nm, or 200 nm, but is not limited thereto.

[0069] S6 , removing the mask layer 40 on the front surface 10 and the back surface 20 .

[0070] After the deposition of the passivation layer 50 in the above step is completed, the mask layer 40 on the front surface 10 and the back surface 20 is removed in this step to ensure that the solar cell 100 can perform normal photoelectric conversion efficiency.

[0071] Specifically, when removing the mask layer 40 from the front 10 and back 20 of the cell 100, an etching solvent is also used, and the cell 100 is placed in the etching solution. The etching solution can be acetone or isopropyl alcohol, which gradually dissolves or decomposes the photoresist, thereby achieving the effect of removing the photoresist. To ensure the dissolution effect, the concentration of acetone or isopropyl alcohol is greater than 99%. Thus, using a high-concentration etching solution achieves better photoresist removal.

[0072] Furthermore, when etching the photoresist using an acetone or isopropyl alcohol solution, the acetone or isopropyl alcohol can be slightly heated, for example, to 40°C to 50°C. A higher temperature etching solution helps to accelerate the etching rate. The etching contact time can be 2-5 minutes to allow the mask material to adhere to the cutting edge 30. Furthermore, to ensure the thoroughness of photoresist removal, ultrasonic and external force wiping methods can be added to ensure the certainty of photoresist removal. In another embodiment, a plasma removal method, such as microwave plasma removal, can be used to achieve efficient removal results.

[0073] Furthermore, in order to ensure the light conversion efficiency of the cell 100 , after the mask layer 40 on the front surface 10 and the back surface 20 is removed, the method for passivating the cut edge 30 of the cell further includes: cleaning the front surface 10 and the back surface 20 .

[0074] After the mask layer 40 on the front side 10 and the back side 20 is removed in the above steps, in order to avoid organic materials remaining on the surface of the cell 100, the surface of the cell 100 is cleaned in this step, for example, by laser cleaning, to remove the remaining impurities, thereby ensuring the cleanliness of the cell surface.

[0075] The above-mentioned method for passivating the cutting edge 30 of the battery first performs corrosion pretreatment on the cutting damage generated at the cutting edge 40 to improve the stability of the subsequent setting of the passivation layer 50 and improve the problem of low battery conversion efficiency caused by the composite formed at the interface of the cutting edge 30 during laser cutting; by forming a mask layer 40 on the front 10 and the back 20 of the battery cell 100 to prevent the passivation material from adhering to the front 10 and the back of the battery cell 100 when the passivation layer is subsequently set; then the mask material that may adhere to the cutting edge 30 is removed to form a passivation layer on the cutting edge 40 50, ensure the adhesion stability of the passivation layer 50 on the cutting edge 40, and finally form an aluminum oxide passivation layer on the cutting edge 40. Due to the density and stable properties of aluminum oxide, the cutting edge 30 of the battery cell 100 is effectively protected to avoid erosion by water and oxygen and charge recombination, thereby ensuring the photoelectric conversion efficiency of the battery during use and ensuring the performance of use; finally, the mask layer 40 on the front side 10 and the back side 20 of the battery cell 100 is removed to expose the battery cell 100 to the air to ensure the subsequent photoelectric conversion efficiency.

[0076] Example 2

[0077] The present invention further provides a battery in a second embodiment, which is prepared by using the above-mentioned method for passivating the cut edges of the battery.

[0078] The cell may be a crystalline silicon cell, an amorphous silicon cell, a perovskite cell or other type of solar cell, which is not limited here.

[0079] The above-mentioned battery has a passivation layer provided on the cut edge of the battery, which effectively protects the cut edge of the battery cell, avoids corrosion by water and oxygen and charge recombination, ensures the photoelectric conversion efficiency of the battery during use, and ensures the performance of the battery.

[0080] Example 3:

[0081] In a third embodiment, the present invention further provides a photovoltaic assembly comprising the above-mentioned battery.

[0082] Among them, the photovoltaic module can also include a backboard, photovoltaic glass and a film. The above-mentioned battery is sandwiched between the backboard and the photovoltaic glass, and a film is provided on the upper and lower surfaces of the battery to achieve the effect of isolating the battery from water and oxygen. As a filler, it can be a transparent colloid with good light transmittance and aging resistance to avoid affecting the battery's absorption of light.

[0083] Photovoltaic glass can cover the encapsulation layer on the front side of the cell. The photovoltaic glass can be ultra-white glass, which has high light transmittance, high transparency, and excellent physical, mechanical and optical properties. For example, the light transmittance of ultra-white glass can reach more than 92%, which can protect the cell without affecting the efficiency of the cell as much as possible.

[0084] The backsheet can be attached to the film on the back of the solar cell. It protects and supports the solar cell and offers reliable insulation, water resistance, and aging resistance. Multiple backsheet options are available, typically including tempered glass, organic glass, and aluminum alloy TPT composite film. The specific backsheet configuration can be tailored to the specific situation and is not a limitation here. The backsheet, solar cell, film, and photovoltaic glass assembly can be mounted on a metal frame. The metal frame serves as the primary external support structure for the entire photovoltaic module and provides stable support and installation. For example, the metal frame allows the solar cell module to be installed in the desired location.

[0085] The above-mentioned photovoltaic module has a passivation layer set on the cut edge of the battery, which effectively protects the cut edge of the battery cell, avoids corrosion by water and oxygen and charge recombination, ensures the photoelectric conversion efficiency of the battery during use, and ensures the performance of use, thus making the photovoltaic module more stable in use.

[0086] Example 4:

[0087] In a fourth embodiment, the present invention further provides a photovoltaic system including the above-mentioned photovoltaic assembly.

[0088] Among them, photovoltaic systems can be used in photovoltaic power stations, such as ground power stations, rooftop power stations, water surface power stations, etc., and can also be used in equipment or devices that use solar energy to generate electricity, such as user solar power supplies, solar street lights, solar cars, solar buildings, etc. Of course, it is understandable that the application scenarios of photovoltaic systems are not limited to this, that is to say, photovoltaic systems can be used in all fields that require solar energy to generate electricity. Taking the photovoltaic power generation system network as an example, the photovoltaic system may include a photovoltaic array, a junction box and an inverter. The photovoltaic array can be an array combination of multiple photovoltaic modules. For example, multiple photovoltaic modules can form multiple photovoltaic arrays. The photovoltaic array is connected to the junction box. The junction box can converge the current generated by the photovoltaic array. The converged current flows through the inverter to be converted into the alternating current required by the mains power grid and then connected to the mains power network to achieve solar power supply.

[0089] The above-mentioned photovoltaic system has a passivation layer set on the cut edge of the battery when preparing the battery of the photovoltaic module, which effectively protects the cut edge of the battery cell to avoid corrosion by water and oxygen and charge recombination, thereby ensuring the photoelectric conversion efficiency of the battery during use and ensuring the performance of use. In this way, the photovoltaic system is more stable in use.

[0090] It is understandable that those skilled in the art can, under the guidance of the above embodiments, combine various implementation methods in the above embodiments to obtain technical solutions of multiple implementation methods.

[0091] The above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A method for passivating the cutting edge of a battery, characterized in that: include: Providing a battery cell, the battery cell comprising a front side and a back side opposite to each other, and a cutting edge connected between the front side and the back side; forming a mask layer on the front surface and the back surface; forming a passivation layer on the cutting edge; The mask layers on the front side and the back side are removed.

2. The method for passivating the cut edge of a battery according to claim 1, characterized in that: Before the step of forming a mask layer on the front side and the back side, the cutting edge passivation method further comprises: The cutting damage of the cutting edge is pre-treated by corrosion.

3. The method for passivating the cut edge of a battery according to claim 1, characterized in that: After the step of forming a mask layer on the front surface and the back surface and before the step of forming a passivation layer on the cutting edge, the cutting edge passivation method further comprises: The mask material adhered to the cutting edge is cleaned.

4. The method for passivating the cut edge of a battery according to claim 1, characterized in that: The step of forming a mask layer on the front side and the back side comprises: Applying a mask material to the front side and the back side; The mask material is cured on the cell under preset conditions to obtain a mask layer.

5. The method for passivating the cut edge of a battery as claimed in claim 4, characterized in that: The preset conditions include: The battery cell is heated by hot air at 80-120° C. for 10-20 minutes.

6. The method for passivating the cut edge of a battery according to claim 1, characterized in that: The material of the mask layer is photoresist.

7. The method for passivating the cut edge of a battery according to claim 1, characterized in that: Forming a passivation layer on the cutting edge comprises: The cell is placed in a deposition device to deposit a passivation layer.

8. The method for passivating the cut edge of a battery according to claim 1, characterized in that: The material of the passivation layer is aluminum oxide.

9. The method for passivating the cut edge of a battery according to claim 8, characterized in that: The thickness of the aluminum oxide is in the range of 10 nm to 200 nm.

10. The method for passivating the cut edge of a battery according to claim 1, characterized in that: Removing the mask layers on the front side and the back side, comprising: The battery cell is placed in a corrosion solution to remove the mask layers on the front and back sides through corrosion.

11. A battery, characterized in that The battery is prepared by the cut edge passivation method of the battery according to any one of claims 1 to 10.

12. A photovoltaic module, characterized in that Comprising the battery of claim 11.

13. A photovoltaic system, characterized in that Comprising the photovoltaic module as claimed in claim 12.

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