Hydrofluoric acid polishing solution formula for touch screen processing

Abstract

The invention discloses a hydrofluoric acid polishing solution formula for touch screen processing, and particularly relates to the technical field of polishing solutions. 1%-2% of ammonium bifluoride; 3%-6% of sulfuric acid; 2%-4% of nitric acid; 4%-6% of glucose; 75%-80% of pure water; 0.5%-1% of sodium hydroxide; 1%-3% of polyvinyl alcohol; 0.5%-2% of a surfactant; 0.5%-1% of phosphoric acid; the sodium hydroxide and the sulfuric acid are used for adjusting the pH value of the polishing solution to a proper range; the polyvinyl alcohol is used for adjusting the viscosity of the polishing solution; the surfactant and the phosphoric acid are used for interacting with components in the polishing solution to form a stable colloid system, and particle precipitation and viscosity change are prevented. The hydrofluoric acid polishing solution prepared by the invention is relatively high in stability, and is not easy to deteriorate after being exposed in air for a long time, so that the actual use effect of the hydrofluoric acid polishing solution prepared by the invention is relatively ideal.

Description

Technical Field

[0001] The invention relates to the technical field of polishing liquid, and more specifically to a hydrofluoric acid polishing liquid formula for touch screen processing. Background Art

[0002] Hydrofluoric acid polishing liquid is mainly used for touch screen surface treatment. It can remove burrs, scratches and dirt on the touch screen surface, improve the smoothness and flatness of the touch screen surface. Hydrofluoric acid polishing liquid can also change the microstructure of the touch screen surface, improve the wear resistance and anti-fingerprint performance of the touch screen.

[0003] Although the hydrofluoric acid polishing liquid in the prior art can be used normally, it still has many disadvantages in actual use. For example, the hydrofluoric acid polishing liquid in the prior art is not stable enough and is prone to deterioration when exposed to the air for a long time. This results in the actual use effect of the hydrofluoric acid polishing liquid in the prior art being less than ideal. Summary of the invention

[0004] In order to overcome the above-mentioned defects of the prior art, an embodiment of the present invention provides a hydrofluoric acid polishing liquid formula for touch screen processing. The prepared hydrofluoric acid polishing liquid has high stability and is not prone to deterioration when exposed to air for a long time, so as to solve the problems raised in the above-mentioned background technology.

[0005] To achieve the above object, the present invention provides the following technical solution: a hydrofluoric acid polishing liquid formula for touch screen processing, comprising the following components in mass fractions: Hydrofluoric acid 4%-6%; Ammonium bifluoride 1%-2%; Sulfuric acid 3%-6%; Nitric acid 2%-4%; Glucose 4%-6%; Pure water 75%-80%; Sodium hydroxide 0.5%-1%; Polyvinyl alcohol 1%-3%; Surfactant 0.5%-2%; Phosphoric acid 0.5%-1%.

[0006] In a preferred embodiment, the sodium hydroxide is used to adjust the pH value of the polishing liquid to an appropriate range.

[0007] In a preferred embodiment, the sulfuric acid is used to adjust the pH value of the polishing liquid to an appropriate range.

[0008] In a preferred embodiment, the polyvinyl alcohol is used to adjust the viscosity of the polishing liquid.

[0009] In a preferred embodiment, the surfactant is used to interact with the components in the polishing liquid to form a stable colloidal system to prevent particle precipitation and viscosity changes.

[0010] In a preferred embodiment, the phosphoric acid is used to interact with the components in the polishing liquid to form a stable colloidal system to prevent particle precipitation and viscosity changes.

[0011] Technical effects and advantages of the present invention: The present invention comprises 4%-6% hydrofluoric acid, 1%-2% ammonium bifluoride, 3%-6% sulfuric acid, 2%-4% nitric acid, 4%-6% glucose, 75%-80% pure water, 0.5%-1% sodium hydroxide, 1%-3% polyvinyl alcohol, 0.5%-2% surfactant, and 0.5%-1% phosphoric acid. The sodium hydroxide is used to adjust the pH value of the polishing liquid to an appropriate range, the sulfuric acid is used to adjust the pH value of the polishing liquid to an appropriate range, the polyvinyl alcohol is used to adjust the viscosity of the polishing liquid, the surfactant is used to interact with the components in the polishing liquid to form a stable colloidal system to prevent particle precipitation and viscosity change, and the phosphoric acid is used to interact with the components in the polishing liquid to form a stable colloidal system to prevent particle precipitation and viscosity change. Therefore, the hydrofluoric acid polishing liquid prepared by the present invention has high stability, is not easy to deteriorate when exposed to the air for a long time, and the actual use effect of the hydrofluoric acid polishing liquid prepared by the present invention is relatively ideal. DETAILED DESCRIPTION

[0012] The technical solutions in the embodiments of the present invention are described clearly and completely below. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0013] Example 1 The present invention provides a hydrofluoric acid polishing liquid formula for touch screen processing, comprising the following components in mass fractions: Hydrofluoric acid 4%; Ammonium bifluoride 1%; Sulfuric acid 6%; Nitric acid 4%; Glucose 4%; Pure water 75%; Sodium hydroxide 1%; Polyvinyl alcohol 2%; Surfactant 2%; Phosphoric acid 1%.

[0014] The sodium hydroxide is used to adjust the pH value of the polishing liquid to an appropriate range.

[0015] The sulfuric acid is used to adjust the pH value of the polishing liquid to an appropriate range.

[0016] The polyvinyl alcohol is used to adjust the viscosity of the polishing liquid.

[0017] The surfactant is used to interact with the components in the polishing liquid to form a stable colloidal system and prevent particle precipitation and viscosity change.

[0018] The phosphoric acid is used to interact with the components in the polishing liquid to form a stable colloidal system to prevent particle precipitation and viscosity change.

[0019] The hydrofluoric acid polishing liquid prepared in this embodiment has higher stability and is not prone to deterioration when exposed to air for a long time.

[0020] Example 2 The present invention provides a hydrofluoric acid polishing liquid formula for touch screen processing, comprising the following components in mass fractions: Hydrofluoric acid 5%; Ammonium bifluoride 2%; Sulfuric acid 3%; Nitric acid 4%; Glucose 6%; Pure water 75%; Sodium hydroxide 1%; Polyvinyl alcohol 3%; Surfactant 0.5%; Phosphoric acid 0.5%.

[0021] The sodium hydroxide is used to adjust the pH value of the polishing liquid to an appropriate range.

[0022] The sulfuric acid is used to adjust the pH value of the polishing liquid to an appropriate range.

[0023] The polyvinyl alcohol is used to adjust the viscosity of the polishing liquid.

[0024] The surfactant is used to interact with the components in the polishing liquid to form a stable colloidal system and prevent particle precipitation and viscosity change.

[0025] The phosphoric acid is used to interact with the components in the polishing liquid to form a stable colloidal system to prevent particle precipitation and viscosity change.

[0026] The hydrofluoric acid polishing liquid prepared in this embodiment has higher stability and is not prone to deterioration when exposed to air for a long time.

[0027] Example 3 The present invention provides a hydrofluoric acid polishing liquid formula for touch screen processing, comprising the following components in mass fractions: Hydrofluoric acid 6%; Ammonium bifluoride 2%; Sulfuric acid 3%; Nitric acid 2%; Glucose 6%; Pure water 75%; Sodium hydroxide 1%; Polyvinyl alcohol 2%; Surfactant 2%; Phosphoric acid 1%.

[0028] The sodium hydroxide is used to adjust the pH value of the polishing liquid to an appropriate range.

[0029] The sulfuric acid is used to adjust the pH value of the polishing liquid to an appropriate range.

[0030] The polyvinyl alcohol is used to adjust the viscosity of the polishing liquid.

[0031] The surfactant is used to interact with the components in the polishing liquid to form a stable colloidal system and prevent particle precipitation and viscosity change.

[0032] The phosphoric acid is used to interact with the components in the polishing liquid to form a stable colloidal system to prevent particle precipitation and viscosity change.

[0033] The hydrofluoric acid polishing liquid prepared in this embodiment has higher stability and is not prone to deterioration when exposed to air for a long time.

[0034] The present invention comprises 4%-6% hydrofluoric acid, 1%-2% ammonium bifluoride, 3%-6% sulfuric acid, 2%-4% nitric acid, 4%-6% glucose, 75%-80% pure water, 0.5%-1% sodium hydroxide, 1%-3% polyvinyl alcohol, 0.5%-2% surfactant, and 0.5%-1% phosphoric acid. The sodium hydroxide is used to adjust the pH value of the polishing liquid to an appropriate range, the sulfuric acid is used to adjust the pH value of the polishing liquid to an appropriate range, the polyvinyl alcohol is used to adjust the viscosity of the polishing liquid, the surfactant is used to interact with the components in the polishing liquid to form a stable colloidal system to prevent particle precipitation and viscosity change, and the phosphoric acid is used to interact with the components in the polishing liquid to form a stable colloidal system to prevent particle precipitation and viscosity change. Therefore, the hydrofluoric acid polishing liquid prepared by the present invention has high stability, is not easy to deteriorate when exposed to the air for a long time, and the actual use effect of the hydrofluoric acid polishing liquid prepared by the present invention is relatively ideal.

[0035] Finally: The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A hydrofluoric acid polishing liquid formula for touch screen processing, characterized in that: The following components are included in mass fraction: Hydrofluoric acid 4%-6%; Ammonium bifluoride 1%-2%; Sulfuric acid 3%-6%; Nitric acid 2%-4%; Glucose 4%-6%; Pure water 75%-80%; Sodium hydroxide 0.5%-1%; Polyvinyl alcohol 1%-3%; Surfactant 0.5%-2%; Phosphoric acid 0.5%-1%.

2. The hydrofluoric acid polishing liquid formulation for touch screen processing according to claim 1, characterized in that: The sodium hydroxide is used to adjust the pH value of the polishing liquid to an appropriate range.

3. The hydrofluoric acid polishing liquid formulation for touch screen processing according to claim 1, characterized in that: The sulfuric acid is used to adjust the pH value of the polishing liquid to an appropriate range.

4. The hydrofluoric acid polishing liquid formulation for touch screen processing according to claim 1, characterized in that: The polyvinyl alcohol is used to adjust the viscosity of the polishing liquid.

5. The hydrofluoric acid polishing liquid formulation for touch screen processing according to claim 1, characterized in that: The surfactant is used to interact with the components in the polishing liquid to form a stable colloid system and prevent particle precipitation and viscosity change.

6. The hydrofluoric acid polishing liquid formulation for touch screen processing according to claim 1, characterized in that: The phosphoric acid is used to interact with the components in the polishing liquid to form a stable colloidal system to prevent particle precipitation and viscosity change.