Preparation method of sensor probe for detecting optical environmental pollution deposition

Abstract

The invention discloses a preparation method of a sensor probe for detecting optical environment pollution deposition, and belongs to the technical field of pollution detection.The preparation method comprises the steps that the surface of a QCM chip is coated with silicon dioxide colloid in a dip-coating mode, and the sensor probe with a silicon dioxide film on the surface is obtained; the mass density of the environmental pollutant surface deposited on the surface of the silicon dioxide film is detected through a sensor probe, so that the deposition of the organic pollutants in the optical environment is detected. The sensor probe prepared by the invention is high in molecular pollution sensitivity and good in stability, and can be used for early warning damage of optical elements in an optical system.

Description

Technical Field

[0001] The present invention belongs to the technical field of pollution detection, and more specifically, to a method for preparing a sensor probe for detecting pollution deposition in an optical environment. Background Art

[0002] The laser system is usually operated in a normal pressure or low vacuum environment. Molecular contamination and micro-nano-scale particle contamination are unavoidable during operation. These contaminants are easily enriched on the surface of optical components, resulting in a decrease in optical transmittance and serious damage to the optical components, causing the laser system to be unable to operate stably.

[0003] At present, the methods that may be used for real-time pollution detection include chromatography-mass spectrometry equipment, surface acoustic wave sensors, and micro-nano fiber optic sensors. Chromatography-mass spectrometry is a semi-quantitative method for testing volume concentration. It is large in size and complicated to operate, which is not conducive to long-term online use. Surface acoustic wave sensors are devices that sense sound waves on the surface of crystals. The measured information is reflected by the change in the speed or frequency of the surface acoustic wave in the surface acoustic wave device and converted into an electrical signal output. The general central operating frequency is several hundred MHz to GHz. The sensitivity is extremely high, but it is extremely sensitive to temperature and is difficult to eliminate in actual applications with micro-temperature changes such as normal pressure and vacuum. Micro-nano fiber optic sensors are a kind of sensor that uses external pollution to adsorb on the film layer of the micro-nano fiber cone area. The change in the film thickness causes the change in the evanescent field, thereby stimulating the change in the photoelectric sensor signal. It has high sensitivity and is suitable for testing spatial volume concentration. However, the sensor is sensitive to temperature and difficult to calibrate. It is not mature enough at present. The quartz crystal microbalance sensor is a device that senses sound waves inside a crystal. When the mass of material on the surface of the quartz crystal microbalance chip changes, the thickness of the device will change, thereby causing a change in the resonant frequency. Since the dielectric constant and piezoelectric constant of the crystal have good temperature stability, its detection output results are relatively stable and highly reliable. Summary of the invention

[0004] An object of the present invention is to solve at least the above problems and / or disadvantages and to provide at least the advantages which will be described hereinafter.

[0005] In order to achieve these purposes and other advantages according to the present invention, a method for preparing a sensor probe for detecting optical environmental pollution deposition is provided, comprising:

[0006] Colloid silica is coated on the surface of the QCM chip by pulling and coating to obtain a sensor probe with a silica film on the surface. The surface mass density of environmental pollutants deposited on the surface of the silica film is detected by the sensor probe, thereby realizing the detection of optical environmental organic pollutant deposition.

[0007] Preferably, the method specifically comprises the following steps:

[0008] Step 1: First, soak the QCM chip in alkaline solution and clean it with ultrasonic wave, then rinse it with deionized water, and finally blow it dry with clean nitrogen;

[0009] Step 2: Fix the QCM chip on the coating fixture, immerse the QCM chip in silica colloid, pull the QCM chip at a certain speed, and evenly coat the silica colloid on the surface of the QCM chip;

[0010] Step 3: Place the QCM chip coated with silica colloid in an ammonia treatment box and a hexamethyldisilazane treatment box for post-treatment, and place it in a polytetrafluoroethylene box and store it in a Class 100 clean room after treatment;

[0011] Step 4: Install the post-processed QCM chip on the QCM probe and measure the frequency change of the QCM probe within a certain period of time to ensure that it does not exceed 1 Hz. The sensor probe is now ready.

[0012] Preferably, in the step 2, the concentration of silica colloidal body is 5%-20%.

[0013] Preferably, the central operating frequency of the QCM chip is 5kHz-20kHz.

[0014] Preferably, in step 1, the alkali solution is an organic or inorganic weak alkaline aqueous solvent, including ethylenediamine, ammonia water or sodium hydroxide solution, with a concentration of 5%, a pH of 10-11, an ultrasonic frequency of ≥40kHz, and a cleaning time of 10-40 minutes.

[0015] Preferably, in the step 2, the silica colloidal body is obtained by mixing ethanol and tetraethyl orthosilicate and subjecting them to a hydrolysis and polycondensation reaction under the action of aqueous ammonia, and the concentration of the silica colloidal body is 1-5%.

[0016] Preferably, the preparation method of the silica colloid comprises:

[0017] Tetraethyl orthosilicate, anhydrous ethanol and aqueous ammonia are mixed to obtain a solution, the solution is sealed in a reactor, and stirred at 40-60° C. for 8-16 hours, and then aged at room temperature for 12-36 hours to obtain silica colloidal body; wherein the volume ratio of tetraethyl orthosilicate, anhydrous ethanol and aqueous ammonia is 10-15:100-150:1-10.

[0018] Preferably, in step three, the ammonia concentration in the ammonia treatment box is 1-6%, the hexamethyldisilazane concentration is 1%-6%, the ammonia treatment box is placed for 12-36 hours, and the hexamethyldisilazane treatment box is placed for 12-36 hours.

[0019] Preferably, in the step 2, the coating pulling speed is 50 cm / min-120 cm / min.

[0020] Preferably, in step 4, the time for determining that the frequency change of the QCM chip does not exceed 1 Hz is within 2 minutes.

[0021] A method for verifying the adsorption result of an organic pollutant by a sensor probe, comprising:

[0022] First, the refractive index n of the silicon dioxide film obtained by pulling and coating on the surface of the QCM chip is measured. 1 The porosity f of silica in the film can be calculated according to the following formula: SiO2 :

[0023]

[0024] Among them, n air is the refractive index of air, f air is the air volume fraction, is the refractive index constant of silicon dioxide,

[0025] When the organic pollutants are filled into the silicon dioxide film, the refractive index n of the silicon dioxide film filled with organic pollutants is measured. 2 At the same time, the volume fraction of organic pollution f can be calculated according to the following formula org :

[0026]

[0027] Among them, n org is the refractive index of organic pollutants, f a ' ir is the volume fraction of air after filling with organic pollutants,

[0028] According to the thickness h of the plated silicon dioxide film and the density ρ of the organic pollutants, the surface mass density m of the organic pollutants can be obtained, that is:

[0029] m=ρ×f org ×h

[0030] The calculated surface mass density of organic pollutants was compared with the detection results of the QCM chip to verify the adsorption of organic pollutants.

[0031] In order to improve the sensitivity of the QCM chip in the sensor probe to pollutant detection, the silica colloid in step 2 is replaced with a modified silica colloid doped with ZnO, wherein the preparation method of the modified silica colloid doped with ZnO includes:

[0032] S1. Select ZnO powder with a particle size distribution of 20 to 80 nm, add it to anhydrous ethanol, and ultrasonically disperse it for 20 to 40 minutes at an ultrasonic frequency of 40 to 80 kHz to obtain a ZnO ethanol dispersion; wherein the mass volume ratio of ZnO powder to anhydrous ethanol is 1 to 10 g: 50 to 150 mL;

[0033] S2. Add ammonia water to the ethanol dispersion, adjust the pH to 8-11, then heat to 40-70° C., add polyacrylic acid, stir at a speed of 200-600 rpm for 5-10 min, and ultrasonically disperse for 30-50 min at an ultrasonic frequency of 60-90 kHz to obtain a highly dispersed ZnO dispersion; wherein the mass ratio of polyacrylic acid to ZnO is 1-5:10-100;

[0034] S3. Mix tetraethyl orthosilicate, highly dispersible ZnO dispersion, anhydrous ethanol and aqueous ammonia to obtain a mixed system, seal the mixed system in a reactor, and stir at 40-60° C. for 8-16 hours, and then age at room temperature for 12-36 hours to obtain silica colloidal body; wherein the volume ratio of tetraethyl orthosilicate, highly dispersible ZnO dispersion, anhydrous ethanol and aqueous ammonia is 10-15:1-5:100-150:1-10.

[0035] The present invention includes at least the following beneficial effects: the present invention prepares a sensor probe by cleaning, coating, and post-processing a quartz crystal microbalance (QCM) chip, and then realizes online real-time detection of environmental pollution based on the QCM sensor. The probe prepared by this method has high sensitivity to molecular contamination and good stability, and can provide early warning for damage to optical components in the optical system.

[0036] The technical solution of the present invention for coating a silica sol-gel film on the surface of a QCM chip by pulling has the same adsorption mechanism for organic pollutants as that of a QCM chip without coating. The present invention relies on the porosity of the membrane layer to be filled under the action of organic pollution and follows a certain rule, while the latter mainly relies on random probability or external factors such as low temperature to condense pollutants on the surface of the QCM chip.

[0037] When the present invention relies on the porosity of the film layer to adsorb organic pollutants, when the coating process and the post-treatment method are certain, the interaction between the organic pollutants and the QCM chip will be consistent with the adsorption method of the organic pollutants by the optical elements in the optical system, so that the concentration of the adsorbed organic pollutants can be quickly obtained through the QCM sensor.

[0038] The present invention dopes ZnO into silica colloid, and the ZnO is pre-dispersed twice, firstly ultrasonically dispersed in anhydrous ethanol, then adjusted with ammonia water for pH, and then ultrasonically dispersed with polyacrylic acid as a dispersant to obtain a highly dispersed ZnO dispersion liquid with low agglomeration and uniform distribution; the highly dispersed ZnO dispersion liquid is used as a carrier for ZnO doping, which not only makes the silica colloid and ZnO mixed and dispersed more uniformly to obtain uniform ZnO-doped modified silica colloid, but also pulls and plates the ZnO-doped modified silica colloid on the surface of a QCM chip, further improving the sensitivity of the QCM chip to pollutant detection.

[0039] Other advantages, objectives and features of the present invention will be embodied in part through the following description, and in part will be understood by those skilled in the art through study and practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] Figure 1 This is a schematic diagram of the structure of using a probe with a QCM chip to detect environmental pollution in the present invention;

[0041] Figure 2 Frequency-time comparison of the sensor probe for detecting optical environmental pollution deposition prepared in Examples 1 and 2 of the present invention and a common QCM chip. DETAILED DESCRIPTION

[0042] The present invention is further described in detail below in conjunction with the accompanying drawings so that those skilled in the art can implement the invention with reference to the description.

[0043] It should be understood that the terms such as “having”, “including” and “comprising” used herein do not exclude the existence or addition of one or more other elements or combinations thereof.

[0044] Example 1

[0045] This embodiment provides a method for preparing a sensor probe for detecting optical environmental pollution deposition. The central operating frequency of the QCM chip used in this embodiment is 10 kHz, and the method includes the following steps:

[0046] Step 1: First, soak the QCM chip in a sodium hydroxide solution with a concentration of 5% and a pH of 11 and use ultrasonic cleaning. The ultrasonic cleaning frequency is 40kHz and the cleaning time is 20 minutes. Then, rinse with deionized water and finally blow dry the QCM chip with clean nitrogen.

[0047] Step 2: fix the QCM chip on the coating fixture, immerse the QCM chip in silica colloid, pull the QCM chip at a speed of 100 cm / min, and evenly coat the silica colloid on the surface of the QCM chip, wherein the concentration of the silica colloid is 2%; wherein the preparation method of the silica colloid comprises:

[0048] 10 mL of ethyl orthosilicate and 100 mL of anhydrous ethanol were mixed with 5 mL of aqueous ammonia to obtain a solution, the solution was sealed in a reactor, and stirred at 40° C. for 12 h, and then aged at room temperature for 24 h to obtain silica colloidal sol.

[0049] Step 3, placing the QCM chip coated with silica colloid in an ammonia treatment box and a hexamethyldisilazane treatment box for post-treatment, wherein the ammonia concentration in the ammonia treatment box is about 2%, the hexamethyldisilazane concentration is about 2%, the ammonia treatment box is placed for 24 hours, and the hexamethyldisilazane treatment box is placed for 24 hours; after treatment, place it in a polytetrafluoroethylene box and store it in a Class 100 clean room;

[0050] Step 4: Install the post-processed QCM chip on the QCM probe to measure that the probe frequency change does not exceed 1 Hz within 2 minutes. The sensor probe is prepared. The sensor probe prepared in this embodiment is referred to as probe 3.

[0051] Example 2

[0052] This embodiment provides a method for preparing a sensor probe for detecting optical environmental pollution deposition. Take another probe and use the preparation method of Example 1 to pull and plate a silicon dioxide film on the surface of its QCM chip. The sensor probe prepared in this embodiment is referred to as probe 4.

[0053] Example 3

[0054] This embodiment provides a method for preparing a sensor probe for detecting optical environmental pollution deposition. Compared with Example 1, the silica colloid in step 2 is replaced by a modified silica colloid doped with ZnO, and the process parameters of the remaining steps are the same as those of Example 1; wherein the method for preparing the modified silica colloid doped with ZnO includes:

[0055] S1, select 5g of ZnO powder with a particle size distribution of 20-80nm, add it to 150mL of anhydrous ethanol, and ultrasonically disperse it for 40min at an ultrasonic frequency of 60kHz to obtain a ZnO ethanol dispersion;

[0056] S2, adding ammonia water to the ethanol dispersion to adjust the pH to 9, then heating to 50°C, adding 0.5 g of polyacrylic acid, stirring at a speed of 600 rpm for 10 min, and ultrasonically dispersing for 40 min at an ultrasonic frequency of 90 kHz to obtain a highly dispersible ZnO dispersion;

[0057] S3, taking 10 mL of tetraethyl orthosilicate, 5 mL of highly dispersed ZnO dispersion, 100 mL of anhydrous ethanol and 5 mL of ammonia water to mix to obtain a mixed system, sealing the mixed system in a reactor, and stirring at 40-60° C. for 12 h, and then placing it at room temperature for aging for 24 h to obtain a modified silica colloid doped with ZnO;

[0058] The QCM chip cleaned by the cleaning method in Example 1 is fixed on a coating fixture, and the QCM chip is immersed in the modified silica colloid doped with ZnO, and the QCM chip is pulled at a speed of 100 cm / min to evenly coat the modified silica colloid doped with ZnO on the surface of the QCM chip;

[0059] The QCM chip coated with the modified silica colloid doped with ZnO is placed in an ammonia treatment box and a hexamethyldisilazane treatment box for post-treatment, wherein the ammonia concentration in the ammonia treatment box is about 2%, the hexamethyldisilazane concentration is about 2%, the ammonia treatment box is placed for 24 hours, and the hexamethyldisilazane treatment box is placed for 24 hours; after the treatment, it is placed in a polytetrafluoroethylene box and stored in a Class 100 clean room;

[0060] Step 4: Install the post-processed QCM chip onto the QCM probe and measure that the probe frequency change does not exceed 1 Hz within 2 minutes. The sensor probe is now ready.

[0061] Example 4

[0062] This embodiment provides a method for preparing a sensor probe for detecting optical environmental pollution deposition. Compared with Example 1, the silica colloid in step 2 is replaced by a modified silica colloid doped with ZnO, and the process parameters of the remaining steps are the same as those of Example 1; wherein the method for preparing the modified silica colloid doped with ZnO includes:

[0063] S1, select 9g of ZnO powder with a particle size distribution of 20-80nm, add it to 150mL of anhydrous ethanol, and ultrasonically disperse it for 40min at an ultrasonic frequency of 60kHz to obtain a ZnO ethanol dispersion;

[0064] S2, adding ammonia water to the ethanol dispersion, adjusting the pH to 10, then heating to 60°C, adding 1.5 g of polyacrylic acid, stirring at a speed of 600 rpm for 10 min, and ultrasonically dispersing for 40 min at an ultrasonic frequency of 80 kHz to obtain a highly dispersible ZnO dispersion;

[0065] S3. Take 10 mL of tetraethyl orthosilicate, 5 mL of highly dispersed ZnO dispersion, 100 mL of anhydrous ethanol and 5 mL of ammonia water and mix them to obtain a mixed system. Seal the mixed system in a reactor and stir it at 40-60°C for 12 hours, then place it at room temperature for aging for 24 hours to obtain a modified silica colloid doped with ZnO.

[0066] The QCM chip cleaned by the cleaning method in Example 1 is fixed on a coating fixture, and the QCM chip is immersed in the modified silica colloid doped with ZnO, and the QCM chip is pulled at a speed of 100 cm / min to evenly coat the modified silica colloid doped with ZnO on the surface of the QCM chip;

[0067] The QCM chip coated with the modified silica colloid doped with ZnO is placed in an ammonia treatment box and a hexamethyldisilazane treatment box for post-treatment, wherein the ammonia concentration in the ammonia treatment box is about 2%, the hexamethyldisilazane concentration is about 2%, the ammonia treatment box is placed for 24 hours, and the hexamethyldisilazane treatment box is placed for 24 hours; after the treatment, it is placed in a polytetrafluoroethylene box and stored in a Class 100 clean room;

[0068] Step 4: Install the post-processed QCM chip onto the QCM probe and measure that the probe frequency change does not exceed 1 Hz within 2 minutes. The sensor probe is now ready.

[0069] Example 5

[0070] For the sensor probe prepared by the preparation method of the sensor probe for detecting optical environmental pollution deposition in Example 1 and Example 2, this embodiment provides a method for verifying the adsorption result of organic pollutants by the sensor probe, including:

[0071] First, the refractive index n of the silicon dioxide film obtained by pulling and coating on the surface of the QCM chip is measured. 1 The porosity f of silica in the film can be calculated according to the following formula: SiO2 :

[0072]

[0073] Among them, n air is the refractive index of air, f air is the air volume fraction, is the refractive index constant of silicon dioxide,

[0074] When the organic pollutants are filled into the silicon dioxide film, the refractive index n of the silicon dioxide film filled with organic pollutants is measured. 2 At the same time, the volume fraction of organic pollution f can be calculated according to the following formula org :

[0075]

[0076] Among them, n org is the refractive index of organic pollutants, f a ' ir is the volume fraction of air after filling with organic pollutants,

[0077] According to the thickness h of the plated silicon dioxide film and the density ρ of the organic pollutants, the surface mass density m of the organic pollutants can be obtained, that is:

[0078] m=ρ×f org ×h

[0079] The calculated surface mass density of organic pollutants was compared with the detection results of the QCM chip to verify the adsorption of organic pollutants.

[0080] Comparative Example 1

[0081] This comparative example provides a method for preparing a sensor probe for detecting optical environmental pollution deposition. Compared with Example 3, the method for preparing the ZnO-doped modified silica colloid used in step 2 is changed to:

[0082] 5 g of ZnO powder with a particle size distribution of 20 to 80 nm was selected and added into 150 mL of anhydrous ethanol, and ultrasonically dispersed for 40 min at an ultrasonic frequency of 60 kHz to obtain a ZnO ethanol dispersion;

[0083] Take 10 mL of tetraethyl orthosilicate, 5 mL of ZnO ethanol dispersion, 100 mL of anhydrous ethanol and 5 mL of ammonia water and mix them to obtain a mixed system. The mixed system is sealed in a reactor and stirred at 40-60° C. for 12 h, and then aged at room temperature for 24 h to obtain a modified silica colloid doped with ZnO.

[0084] The QCM chip cleaned by the cleaning method in Example 1 is fixed on a coating fixture, and the QCM chip is immersed in the modified silica colloid doped with ZnO, and the QCM chip is pulled at a speed of 100 cm / min to evenly coat the modified silica colloid doped with ZnO on the surface of the QCM chip;

[0085] The QCM chip coated with the modified silica colloid doped with ZnO is placed in an ammonia treatment box and a hexamethyldisilazane treatment box for post-treatment, wherein the ammonia concentration in the ammonia treatment box is about 2%, the hexamethyldisilazane concentration is about 2%, the ammonia treatment box is placed for 24 hours, and the hexamethyldisilazane treatment box is placed for 24 hours; after the treatment, it is placed in a polytetrafluoroethylene box and stored in a Class 100 clean room;

[0086] Step 4: Install the post-processed QCM chip onto the QCM probe and measure that the probe frequency change does not exceed 1 Hz within 2 minutes. The sensor probe is now ready.

[0087] The frequency-time variation comparison test is performed on probes 3 and 4 with probes 1 and 2 which are not coated with silica colloid. The test device is as follows: Figure 1 As shown, it includes: a vacuum chamber, the interior of which is used to accommodate probes 1 to 4;

[0088] A QCM host, which is connected to probe 1, probe 2, probe 3 and probe 4 respectively;

[0089] The vacuum unit is connected to the vacuum chamber through a pipeline and is used to evacuate the vacuum chamber.

[0090] The test pressure is 30000Pa. Probes 1, 2, 3 and 4 are placed in a vacuum chamber. Figure 2 As shown, after about 116 hours of testing, the frequency changes of probe 1 and probe 2 were 21 Hz and 20 Hz respectively;

[0091] Figure 2 In the figure, the initial frequencies of probes 1, 2, 3 and 4 are inconsistent, which is caused by the probes themselves. Different probes have different initial frequencies, and the plating of silicon dioxide film cannot change the initial frequency of the probe itself. The greater the frequency change, the higher the sensitivity of the probe to organic pollutant detection.

[0092] After about 116 hours of testing, the frequency changes of probe 3 and probe 4 were 169 Hz and 170 Hz respectively, indicating that probe 3 and probe 4 are more sensitive to organic pollutants and have good repeatability.

[0093] At the same time, the probes prepared in Example 3, Example 4 and Comparative Example 1 were subjected to frequency-time variation comparison tests according to the above test method, and the test conditions were the same as those of the above probes 1 to 4. Among them, the probes prepared in Example 3 and Example 4 were tested for about 116 hours, and the frequency variations were 285 and 292 Hz, respectively, while the frequency variation of the probe in Comparative Example 1 was 206 Hz, indicating that the QCM chip surface used a silica film plated with a highly dispersed ZnO dispersion in the silica colloid, and the detection sensitivity of pollutants was further improved.

[0094] The number of devices and processing scales described here are used to simplify the description of the present invention. Applications, modifications and variations of the present invention will be obvious to those skilled in the art.

[0095] Although the embodiments of the present invention have been disclosed as above, they are not limited to the applications listed in the specification and the implementation modes, and they can be fully applied to various fields suitable for the present invention. For those familiar with the art, additional modifications can be easily implemented. Therefore, without departing from the general concept defined by the claims and the scope of equivalents, the present invention is not limited to the specific details and the illustrations shown and described herein.

Claims

1. A method for preparing a sensor probe for detecting optical environmental pollution deposition, characterized in that: include: Colloid silica is coated on the surface of the QCM chip by pulling and coating to obtain a sensor probe with a silica film on the surface. The surface mass density of environmental pollutants deposited on the surface of the silica film is detected by the sensor probe, thereby realizing the detection of optical environmental organic pollutant deposition.

2. The method for preparing a sensor probe for detecting optical environmental pollution deposition according to claim 1, characterized in that: The specific steps include: Step 1: First, soak the QCM chip in alkaline solution and clean it with ultrasonic wave, then rinse it with deionized water, and finally blow it dry with clean nitrogen; Step 2: Fix the QCM chip on the coating fixture, immerse the QCM chip in silica colloid, pull the QCM chip at a certain speed, and evenly coat the silica colloid on the surface of the QCM chip; Step 3: Place the QCM chip coated with silica colloid in an ammonia treatment box and a hexamethyldisilazane treatment box for post-treatment, and place it in a polytetrafluoroethylene box and store it in a Class 100 clean room after treatment; Step 4: Install the post-processed QCM chip on the QCM probe and measure the frequency change of the QCM probe within a certain period of time to ensure that it does not exceed 1 Hz. The sensor probe is now ready.

3. The method for preparing a sensor probe for detecting optical environmental pollution deposition according to claim 2, characterized in that: In the step 2, the concentration of silica colloid is 5%-20%.

4. The method for preparing a sensor probe for detecting optical environmental pollution deposition according to claim 2, characterized in that: The central operating frequency of the QCM chip is 5kHz-20kHz.

5. The method for preparing a sensor probe for detecting optical environmental pollution deposition according to claim 2, characterized in that: In the step 1, the alkali solution is an organic or inorganic weak alkaline aqueous solvent, including ethylenediamine, ammonia water or sodium hydroxide solution, with a concentration of 5%, a pH of 10-11, an ultrasonic frequency of ≥40kHz, and a cleaning time of 10-40 minutes.

6. The method for preparing a sensor probe for detecting optical environmental pollution deposition according to claim 2, characterized in that: In the step 2, the silica colloidal body is obtained by mixing ethanol and ethyl orthosilicate and undergoing hydrolysis and polycondensation reaction under the action of ammonia water, and the concentration of the silica colloidal body is 1 to 5%; The preparation method of silica colloidal body comprises: taking tetraethyl orthosilicate, anhydrous ethanol and ammonia water and mixing them to obtain a solution, sealing the solution in a reactor, and stirring the solution at 40-60° C. for 8-16 hours, and then placing the solution at room temperature for aging for 12-36 hours to obtain silica colloidal body; wherein the volume ratio of tetraethyl orthosilicate, anhydrous ethanol and ammonia water is 10-15:100-150:1-10.

7. The method for preparing a sensor probe for detecting optical environmental pollution deposition according to claim 2, characterized in that: In the step 3, the ammonia concentration in the ammonia treatment box is 1-6%, the hexamethyldisilazane concentration is 1%-6%, the ammonia treatment box is placed for 12-36 hours, and the hexamethyldisilazane treatment box is placed for 12-36 hours.

8. The method for preparing a sensor probe for detecting optical environmental pollution deposition according to claim 2, characterized in that: In the step 2, the pulling coating speed is 50cm / min-120cm / min.

9. The method for preparing a sensor probe for detecting optical environmental pollution deposition according to claim 2, characterized in that: In the step 4, the time during which the frequency change of the QCM chip does not exceed 1 Hz is determined to be within 2 minutes.

10. A method for verifying the adsorption result of organic pollutants by a sensor probe, wherein the sensor probe is prepared by the method for preparing a sensor probe for detecting optical environmental pollution deposition according to any one of claims 1 to 9, characterized in that: include: First, the refractive index n1 of the silicon dioxide film obtained by pulling and coating on the surface of the QCM chip is measured. The porosity f of the silicon dioxide in the film layer can be calculated according to the following formula: SiO2 : Among them, n air is the refractive index of air, f air is the air volume fraction, is the refractive index constant of silicon dioxide, When organic pollutants are filled into the silicon dioxide film, the refractive index n2 of the silicon dioxide film filled with organic pollutants is measured, and the volume fraction f of organic pollutants can be calculated according to the following formula: org : Among them, n org is the refractive index of organic pollutants, f a ' ir is the volume fraction of air after filling with organic pollutants, According to the thickness h of the plated silicon dioxide film and the density ρ of the organic pollutants, the surface mass density m of the organic pollutants can be obtained, that is: m=ρ×f org ×h The calculated surface mass density of organic pollutants was compared with the detection results of the QCM chip to verify the adsorption of organic pollutants.

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