Saturation treatment method of auxiliary heating sleeve, saturated auxiliary heating sleeve and coating equipment

Abstract

The invention relates to a saturation treatment method of an auxiliary heating sleeve, a saturated auxiliary heating sleeve and coating equipment. The method comprises the steps that the auxiliary heating sleeve is cleaned and then installed in a heating device, and protective gas is introduced under the constant-pressure condition; the preparation method comprises the following steps: introducing silane with the concentration of 500 sccm to 1500 sccm and ammonia gas with the concentration of 3000 sccm to 7000 sccm, and carrying out first-step deposition for 300 to 400 seconds; 300 sccm to 1300 sccm of silane and 4000 sccm to 8000 sccm of ammonia gas are introduced, second-step deposition is carried out for 50 s to 250 s, and the flow of the silane in the second-step deposition is smaller than that in the first-step deposition; 100 sccm to 1100 sccm of silane and 4500 sccm to 8500 sccm of ammonia gas are introduced, third-step deposition is carried out for 250 s to 350 s, and the flow of the silane in the third-step deposition is smaller than that in the second-step deposition; after vacuumizing, introducing laughing gas under a constant-pressure condition; the laughing gas of 4500 sccm to 5500 sccm and the trimethyl aluminum gas of 40 sccm to 100 sccm are introduced, and the fourth step of deposition is carried out for 100 s to 300 s; and after vacuumizing, introducing protective gas under a constant-pressure condition. The auxiliary heating sleeve subjected to saturation treatment is used in coating equipment for battery passivation, EL black edges caused by auxiliary heating pollution can be reduced, and the yield of batteries is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of solar cells, and in particular to a saturation treatment method of an auxiliary heating sleeve, a saturated auxiliary heating sleeve, and a coating device. Background Art

[0002] The essence of the rapid development of the photovoltaic industry is the reduction of the cost per kilowatt-hour. In the past decade, the photovoltaic industry has undergone a transformation from single crystal to polycrystalline, introduced diamond wire cutting, double-sided technology, half-cell technology, multi-busbar technology, and gradually increased the size, and other technological innovations, all of which are essentially to reduce the cost per kilowatt-hour. As the size of components has reached its limit and gradually stabilized, to further reduce the cost per kilowatt-hour, batteries that improve efficiency and reduce costs will become the main way.

[0003] P-type passivated emitter and back contact (PERC) cells are one of the latest high-efficiency solar cells. They have replaced aluminum back field cells and become the mainstream product of high-efficiency photovoltaic cells. PERC achieves the passivation of carrier recombination centers by depositing ultra-thin aluminum oxide and silicon nitride double-layer films (back passivation) on the back of single-crystal or multi-crystal cells to improve the conversion efficiency of cells. In order to achieve high efficiency and high yield production, a "two-in-one" device that completes two layers of film in the same device at one time has been completed. With the high requirements for coating uniformity, the equipment needs to add auxiliary heating sleeve heating to achieve rapid heating and more uniform heating. However, since the added auxiliary heating sleeve has a certain lifespan, after replacement, auxiliary heating pollution will occur, causing the bottom of the cell and the part close to the auxiliary heating sleeve to have edge dark pollution (EL black edge) problems. Summary of the invention

[0004] Based on this, it is necessary to provide a saturation treatment method for an auxiliary heating sleeve, a saturated auxiliary heating sleeve, and a coating equipment to address the above problems; the auxiliary heating sleeve after saturation treatment is used in the coating equipment for passivation of battery cells, which can greatly reduce the EL black edge problem of the battery cells, thereby improving the yield of the battery cells.

[0005] A saturation treatment method for an auxiliary heating sleeve comprises the following steps:

[0006] Clean the auxiliary heating sleeve;

[0007] Install the cleaned auxiliary heating sleeve into the heating device and introduce protective gas under constant pressure;

[0008] 500 sccm-1500 sccm of silane and 3000 sccm-7000 sccm of ammonia are introduced to perform the first step of deposition, and the deposition time is 300s-400s;

[0009] 300 sccm-1300 sccm of silane and 4000 sccm-8000 sccm of ammonia are introduced to carry out the second step of deposition, and the deposition time is 50 s-250 s, wherein the silane flow rate in the second step of deposition is less than the silane flow rate in the first step of deposition;

[0010] 100 sccm-1100 sccm of silane and 4500 sccm-8500 sccm of ammonia are introduced to perform the third step of deposition, and the deposition time is 250 s-350 s, wherein the silane flow rate in the third step of deposition is less than the silane flow rate in the second step of deposition;

[0011] After evacuating the vacuum, nitrous oxide is introduced under constant pressure;

[0012] 4500sccm-5500sccm of laughing gas and 40sccm-100sccm of trimethylaluminum gas are introduced to carry out the fourth step of deposition, and the deposition time is 100s-300s;

[0013] After evacuation, protective gas is introduced under constant pressure conditions.

[0014] In one embodiment, the ammonia flow rate in the second deposition step is greater than or equal to the ammonia flow rate in the first deposition step;

[0015] And / or, the ammonia flow rate in the third deposition step is greater than the ammonia flow rate in the first deposition step.

[0016] In one embodiment, the first deposition time is greater than the second deposition time;

[0017] and / or, the time of the first deposition step is greater than the time of the third deposition step;

[0018] And / or, the time of the second deposition step is less than or equal to the time of the third deposition step.

[0019] In one embodiment, in the first deposition step, the temperature is 280° C.-480° C., the pressure is 1200 mTorr-2200 mTorr, the power is 8000 W-18000 W, the ineffective pulse width is 7 ms-13 ms, and the effective pulse width is 40 ms-100 ms;

[0020] and / or, in the second step of deposition, the temperature is 280° C.-480° C., the pressure is 1200 mTorr-2200 mTorr, the power is 10000 W-20000 W, the ineffective pulse width is 7 ms-13 ms, and the effective pulse width is 30 ms-90 ms;

[0021] and / or, in the third step of deposition, the temperature is 280° C.-480° C., the pressure is 1200 mTorr-2200 mTorr, the power is 10000 W-20000 W, the ineffective pulse width is 7 ms-13 ms, and the effective pulse width is 40 ms-100 ms;

[0022] And / or, in the fourth step of deposition, the temperature is 280° C.-480° C., the pressure is 800 mTorr-1800 mTorr, the power is 5000 W-10000 W, the ineffective pulse width is 7 ms-13 ms, and the effective pulse width is 90 ms-150 ms.

[0023] In one embodiment, when the auxiliary heating sleeve is a used auxiliary heating sleeve, the cleaning process at least includes acid cleaning and alkaline cleaning;

[0024] Alternatively, when the auxiliary heating sleeve is an unused auxiliary heating sleeve, the cleaning process includes ethanol cleaning.

[0025] In one embodiment, in the step of installing the cleaned auxiliary heating sleeve into the heating device and introducing the protective gas under constant pressure conditions, the pressure is 1200mTorr-2200mTorr, the flow rate of the protective gas is 4500sccm-5500sccm, the temperature is 280℃-480℃, and the time is 40s-60s.

[0026] In one embodiment, after evacuating the vacuum, in the step of introducing nitrous oxide under constant pressure conditions, the pressure is 800mTorr-1800mTorr, the nitrous oxide flow rate is 4000sccm-6000sccm, the temperature is 280°C-480°C, and the time is 10s-30s.

[0027] In one embodiment, after evacuating the vacuum, in the step of introducing the protective gas under constant pressure conditions, the pressure is 1000mTorr-10000mTorr, the flow rate of the protective gas is 5000sccm-15000sccm, the temperature is 280℃-480℃, and the time is 20s-40s.

[0028] A saturated auxiliary heat sleeve is produced by the saturation treatment method of the auxiliary heat sleeve as described above, wherein the surface of the saturated auxiliary heat sleeve has a coating, and the thickness of the coating is 100nm-200nm.

[0029] A coating device comprises a heating device, wherein the heating device comprises the saturated auxiliary heating sleeve as described above.

[0030] The saturation treatment method described in the present invention performs four-step deposition on the auxiliary heating sleeve before work. Under the synergistic effect of the specific gas flow rate and the deposition time during the four-step deposition process, a dense coating with a specific thickness is formed on the surface of the auxiliary heating sleeve. On the one hand, during the process of passivation coating of the battery cell, the absorption of the coating gas by the auxiliary heating sleeve can be effectively reduced, thereby ensuring the high efficiency and high yield of the passivation coating of the battery cell; on the other hand, it can effectively avoid the problem of local high temperature, reduce the sintering reaction speed of the bottom of the battery cell close to the auxiliary heating sleeve, make the sintering more uniform, and thus reduce the proportion of EL black edges appearing when the battery cell is sintered.

[0031] The treatment method is not only applicable to unused auxiliary heating sleeves, but also to used auxiliary heating sleeves. The auxiliary heating sleeves after saturation treatment are used in the coating equipment for passivation of battery cells, which can greatly reduce the EL black edge problem of the battery cells, thereby improving the yield of the battery cells, and can realize the reuse of the auxiliary heating sleeves, thereby reducing production costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 The EL black edge image of the passivated cell was prepared for the blank control group;

[0033] Figure 2 This is a surface image of the passivated cell obtained in Example 1. DETAILED DESCRIPTION

[0034] For ease of understanding of the present invention, the present invention will be described in more detail below. However, it should be understood that the present invention can be implemented in many different forms and is not limited to the embodiments or examples described herein. On the contrary, the purpose of providing these embodiments or examples is to make the understanding of the disclosure of the present invention more thorough and comprehensive.

[0035] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art of the present invention. The terms used in the specification of the present invention herein are only for the purpose of describing specific implementation methods or embodiments and are not intended to limit the present invention.

[0036] The present invention provides a saturation treatment method for an auxiliary heating sleeve, comprising the following steps:

[0037] S1, cleaning the auxiliary heating sleeve;

[0038] S2, installing the cleaned auxiliary heating sleeve into the heating device, and introducing protective gas under constant pressure;

[0039] S3, introducing 500 sccm-1500 sccm of silane and 3000 sccm-7000 sccm of ammonia to perform the first step of deposition, with a deposition time of 300 s-400 s;

[0040] S4, introducing 300 sccm-1300 sccm of silane and 4000 sccm-8000 sccm of ammonia to perform a second step of deposition, the deposition time is 50 s-250 s, wherein the silane flow rate in the second step of deposition is less than the silane flow rate in the first step of deposition;

[0041] S5, introducing 100 sccm-1100 sccm of silane and 4500 sccm-8500 sccm of ammonia to perform the third step of deposition, the deposition time is 250 s-350 s, wherein the silane flow rate in the third step of deposition is less than the silane flow rate in the second step of deposition;

[0042] S6, after evacuating the vacuum, introducing laughing gas under constant pressure;

[0043] S7, introducing 4500sccm-5500sccm of laughing gas and 40sccm-100sccm of trimethylaluminum gas to perform the fourth step of deposition, and the deposition time is 100s-300s;

[0044] S8, after evacuation, introduce protective gas under constant pressure conditions.

[0045] In step S1, when the auxiliary heating sleeve is a used auxiliary heating sleeve, the cleaning treatment includes at least acid cleaning and alkaline cleaning, which can remove impurities such as silicon nitride on the surface of the used auxiliary heating sleeve; when the auxiliary heating sleeve is an unused auxiliary heating sleeve, the cleaning treatment includes ethanol cleaning, which can remove impurities such as grease attached to the surface of the unused auxiliary heating sleeve.

[0046] In one embodiment, when the auxiliary heating sleeve is a used auxiliary heating sleeve, the solvent used for pickling is selected from hydrofluoric acid solution and / or hydrochloric acid solution, wherein the concentration of the hydrofluoric acid solution is preferably 10%-30%, the concentration of the hydrochloric acid solution is preferably 5%-20%, and further preferably a mixed solution of a hydrofluoric acid solution with a concentration of 10%-30% and a hydrochloric acid solution with a concentration of 5%-20%, and the pickling time is preferably 1000s-3000s; the solvent used for alkali washing is selected from sodium hydroxide solution, the concentration of the sodium hydroxide solution is preferably 10%-20%, and the alkali washing time is preferably 500s-1000s.

[0047] More preferably, the used auxiliary heating sleeve is firstly acid-washed, then alkaline-washed, and finally water-washed, wherein the water-washing time is preferably 1000s-2000s.

[0048] In another embodiment, when the auxiliary heating sleeve is an unused auxiliary heating sleeve, it can be first cleaned with ethanol and then washed with water, wherein the concentration of the ethanol solution is preferably 20%-50%, the ethanol cleaning time is preferably 3600s-7200s, and the water washing time is preferably 1000s-2000s.

[0049] In step S2, preferably, the pressure is 1200mTorr-2200mTorr, the flow rate of the protective gas is 4500sccm-5500sccm, the temperature is 280°C-480°C, and the time is 40s-60s.

[0050] Specifically, the protective gas is preferably nitrogen.

[0051] In one embodiment, after the cleaned auxiliary heating sleeve is installed in the heating device and before the protective gas is introduced under constant pressure, a constant temperature leak detection step is also included, with a pressure of 1000mTorr-10000mTorr, a temperature of 280℃-480℃, and a time of 550s-650s.

[0052] In step S3 to step S7, under the synergistic effect of the specific gas flow rate and the deposition time in the four-step deposition process, a dense coating with a specific thickness is formed on the surface of the auxiliary heating sleeve. On the one hand, during the process of passivation coating of the battery cell, the absorption of the coating gas by the auxiliary heating sleeve can be effectively reduced, ensuring the high efficiency and high yield of the passivation coating of the battery cell; on the other hand, it can effectively avoid the problem of local high temperature, reduce the sintering reaction speed at the bottom of the battery cell close to the auxiliary heating sleeve, make the sintering more uniform, and thus reduce the proportion of EL black edges appearing during the sintering of the battery cell.

[0053] Preferably, the silane flow rate in the second deposition step is 200sccm-500sccm lower than that in the first deposition step, and / or, the silane flow rate in the third deposition step is 300sccm-400sccm lower than that in the second deposition step, which is more conducive to forming a dense silicon nitride coating with a specific thickness on the surface of the auxiliary heating sleeve.

[0054] Preferably, the ammonia flow rate in the second step of deposition is greater than or equal to the ammonia flow rate in the first step of deposition, and / or, the ammonia flow rate in the third step of deposition is greater than the ammonia flow rate in the first step of deposition. Further preferably, the ammonia flow rate in the second step of deposition is within 2000 sccm higher than the ammonia flow rate in the first step of deposition, and / or, the ammonia flow rate in the third step of deposition is 500 sccm-1500 sccm higher than the ammonia flow rate in the first step of deposition, which is more conducive to forming a dense silicon nitride coating with a specific thickness on the surface of the auxiliary heating sleeve.

[0055] Preferably, the time of the first step deposition is greater than that of the second step deposition, and / or the time of the first step deposition is greater than that of the third step deposition, and / or the time of the second step deposition is less than or equal to that of the third step deposition. Further preferably, the time of the first step deposition is 50s-150s higher than that of the second step deposition, and / or the time of the first step deposition is 50s-150s higher than that of the third step deposition, and / or the time of the second step deposition is within 100s lower than that of the third step deposition, which is more conducive to the formation of a dense silicon nitride coating with a specific thickness on the surface of the auxiliary heating sleeve.

[0056] Specifically, in the first deposition step, the temperature is preferably 280°C-480°C, the pressure is preferably 1200mTorr-2200mTorr, the power is preferably 8000W-18000W, the ineffective pulse width is preferably 7ms-13ms, and the effective pulse width is preferably 40ms-100ms.

[0057] In the second step of deposition, the temperature is preferably 280°C-480°C, the pressure is preferably 1200mTorr-2200mTorr, the power is preferably 10000W-20000W, the ineffective pulse width is preferably 7ms-13ms, and the effective pulse width is preferably 30ms-90ms;

[0058] In the third step of deposition, the temperature is preferably 280°C-480°C, the pressure is preferably 1200mTorr-2200mTorr, the power is preferably 10000W-20000W, the ineffective pulse width is preferably 7ms-13ms, and the effective pulse width is preferably 40ms-100ms;

[0059] In the fourth step of deposition, the temperature is preferably 280°C-480°C, the pressure is preferably 800mTorr-1800mTorr, the power is preferably 5000W-10000W, the ineffective pulse width is preferably 7ms-13ms, and the effective pulse width is preferably 90ms-150ms.

[0060] After the third step of deposition and before the fourth step of deposition, by introducing nitrous oxide under constant pressure after evacuation, the remaining silane and ammonia in the first three steps of deposition can be removed, which is beneficial to the formation of an aluminum oxide coating on the surface of the silicon nitride coating on the surface of the auxiliary heating sleeve in the fourth step.

[0061] Specifically, after evacuating the vacuum, in the step of introducing nitrous oxide under constant pressure, the pressure is preferably 800mTorr-1800mTorr, the nitrous oxide flow rate is preferably 4000sccm-6000sccm, the temperature is preferably 280°C-480°C, and the time is preferably 10s-30s.

[0062] In step S8, the pressure is preferably 1000 mTorr-10000 mTorr, the flow rate of the protective gas is preferably 5000 sccm-15000 sccm, the temperature is preferably 280° C.-480° C., and the time is preferably 20 s-40 s.

[0063] The processing method of the present invention is not only applicable to unused auxiliary heating sleeves, but also applicable to used auxiliary heating sleeves, thereby realizing the reuse of the auxiliary heating sleeves and reducing production costs.

[0064] The present invention provides a saturated auxiliary heating sleeve made by the saturation treatment method of the auxiliary heating sleeve as described above, wherein the surface of the saturated auxiliary heating sleeve has a coating, and the thickness of the coating is 100nm-200nm.

[0065] The present invention also provides a coating device, comprising a heating device, wherein the heating device comprises the saturated auxiliary heating sleeve as described above.

[0066] The auxiliary heating sleeve after saturation treatment is used in the coating equipment for cell passivation, which can greatly reduce the EL black edge problem of the cell, thereby improving the yield of the cell.

[0067] Hereinafter, the saturation treatment method of the auxiliary heating sleeve, the saturated auxiliary heating sleeve, and the coating equipment will be further described through the following specific embodiments.

[0068] Example 1

[0069] The used auxiliary heating sleeve was pickled for 1000s with a mixed solution of 15% hydrofluoric acid and 10% hydrochloric acid, then alkaline-washed for 500s with 15% sodium hydroxide solution, and finally washed with water for 1000s.

[0070] The cleaned auxiliary heating sleeve was installed in the heating device, and leak detection was performed for 650 seconds at 450°C and a pressure of 10000 mTorr. Then, 5000 sccm of nitrogen was introduced at 450°C and a pressure of 1700 mTorr for 50 seconds.

[0071] At 450° C., pressure of 1700 mTorr, power of 13000 W, ineffective pulse width of 8 ms, and effective pulse width of 80 ms, 1500 sccm of silane and 5000 sccm of ammonia were introduced to perform the first step of deposition for 350 s.

[0072] At 460° C., pressure of 1700 mTorr, power of 15000 W, ineffective pulse width of 8 ms, and effective pulse width of 80 ms, 1000 sccm of silane and 7000 sccm of ammonia were introduced for the second step deposition for 200 s.

[0073] At 460° C., pressure of 1700 mTorr, power of 15000 W, ineffective pulse width of 7 ms, and effective pulse width of 70 ms, 600 sccm of silane and 6500 sccm of ammonia were introduced to carry out the third step deposition for 300 s.

[0074] The system was vacuumed at 420°C for 600 s, and then 5000 sccm of nitrous oxide was introduced at 400°C and a pressure of 1300 mTorr for 20 s.

[0075] At 380° C., pressure of 1300 mTorr, power of 7500 W, ineffective pulse width of 7 ms, and effective pulse width of 120 ms, 5000 sccm of nitrous oxide and 70 sccm of trimethylaluminum gas were introduced to carry out the fourth step of deposition for 200 s.

[0076] The system was evacuated at 380° C. for 30 seconds, and then nitrogen gas was introduced at 10,000 sccm at 380° C. and a pressure of 10,000 mTorr for 30 seconds.

[0077] Example 2

[0078] The used auxiliary heating sleeve was pickled for 1500s with a mixed solution of 25% hydrofluoric acid and 10% hydrochloric acid, then alkaline-washed for 1000s with 15% sodium hydroxide solution, and finally washed with water for 1000s.

[0079] The cleaned auxiliary heating sleeve was installed in the heating device, and leak detection was performed for 650 seconds at 450°C and a pressure of 10000 mTorr. Then, 5000 sccm of nitrogen was introduced at 450°C and a pressure of 1700 mTorr for 50 seconds.

[0080] At 450° C., pressure of 1700 mTorr, power of 13000 W, ineffective pulse width of 8 ms, and effective pulse width of 80 ms, 1500 sccm of silane and 5000 sccm of ammonia were introduced to perform the first step of deposition for 400 s.

[0081] At 460° C., pressure of 1700 mTorr, power of 15000 W, ineffective pulse width of 8 ms, and effective pulse width of 80 ms, 1300 sccm of silane and 5000 sccm of ammonia were introduced to carry out the second step deposition for 250 s.

[0082] At 460° C., pressure of 1700 mTorr, power of 15000 W, ineffective pulse width of 7 ms, and effective pulse width of 70 ms, 1000 sccm of silane and 6500 sccm of ammonia were introduced to carry out the third step deposition for 300 s.

[0083] The system was vacuumed at 420°C for 600 s, and then 5000 sccm of nitrous oxide was introduced at 400°C and a pressure of 1300 mTorr for 20 s.

[0084] At 380° C., pressure of 1300 mTorr, power of 7500 W, ineffective pulse width of 7 ms, and effective pulse width of 120 ms, 5500 sccm of nitrous oxide and 90 sccm of trimethylaluminum gas were introduced to carry out the fourth step of deposition for 300 s.

[0085] The system was evacuated at 380° C. for 30 seconds, and then nitrogen gas was introduced at 10,000 sccm at 380° C. and a pressure of 10,000 mTorr for 30 seconds.

[0086] Example 3

[0087] The difference between Example 3 and Example 1 is that an unused auxiliary heating sleeve is used, and it is cleaned with 30% alcohol for 4800 seconds and then washed with water for 1500 seconds.

[0088] Example 4

[0089] The difference between Example 4 and Example 1 is that an unused auxiliary heating sleeve is used, and it is cleaned with 50% alcohol for 4800 seconds and then washed with water for 1500 seconds.

[0090] Example 5

[0091] The used auxiliary heating sleeve was pickled for 1000s with a mixed solution of 15% hydrofluoric acid and 15% hydrochloric acid, then alkaline-washed for 1000s with 10% sodium hydroxide solution, and finally washed with water for 1500s.

[0092] The cleaned auxiliary heating sleeve was installed in the heating device, and leak detection was performed for 600 seconds at 300°C and a pressure of 10000mTorr. Then, 4500sccm of nitrogen was introduced at 300°C and a pressure of 2000mTorr for 60 seconds.

[0093] At 350° C., pressure of 1500 mTorr, power of 10000 W, ineffective pulse width of 10 ms, and effective pulse width of 70 ms, 500 sccm of silane and 3000 sccm of ammonia were introduced to perform the first step of deposition for 350 s.

[0094] At 350° C., pressure of 1500 mTorr, power of 15000 W, ineffective pulse width of 12 ms, and effective pulse width of 90 ms, 300 sccm of silane and 4000 sccm of ammonia were introduced to carry out the second step deposition for 250 s.

[0095] At 400° C., pressure of 1500 mTorr, power of 20000 W, ineffective pulse width of 10 ms, and effective pulse width of 100 ms, 100 sccm of silane and 4500 sccm of ammonia were introduced to carry out the third step deposition for 350 s.

[0096] The chamber was vacuumed at 450°C for 800 seconds, and then 4000 sccm of nitrous oxide was introduced at 400°C and a pressure of 1500 mTorr for 20 seconds.

[0097] At 380° C., pressure of 1000 mTorr, power of 6500 W, ineffective pulse width of 10 ms, and effective pulse width of 100 ms, 4500 sccm of nitrous oxide and 100 sccm of trimethylaluminum gas were introduced, and the fourth step of deposition was carried out for 100 s.

[0098] The system was evacuated at 380° C. for 35 seconds, and then nitrogen gas was introduced at 10,000 sccm at 380° C. and a pressure of 10,000 mTorr for 35 seconds.

[0099] Example 6

[0100] The used auxiliary heating sleeve was pickled for 1000s with a mixed solution of 15% hydrofluoric acid and 15% hydrochloric acid, then alkaline-washed for 1000s with 10% sodium hydroxide solution, and finally washed with water for 1500s.

[0101] The cleaned auxiliary heating sleeve was installed in the heating device, and leak detection was performed for 600 seconds at 400°C and a pressure of 10000 mTorr. Then, 5500 sccm of nitrogen was introduced at 400°C and a pressure of 2000 mTorr for 40 seconds.

[0102] At 450° C., pressure of 2000 mTorr, power of 15000 W, ineffective pulse width of 8 ms, and effective pulse width of 80 ms, 1000 sccm of silane and 7000 sccm of ammonia were introduced for the first step of deposition for 300 s.

[0103] At 460° C., pressure of 2000 mTorr, power of 20000 W, ineffective pulse width of 10 ms, and effective pulse width of 80 ms, 800 sccm of silane and 7000 sccm of ammonia were introduced to carry out the second step deposition for 50 s.

[0104] At 480° C., pressure of 2000 mTorr, power of 20000 W, ineffective pulse width of 10 ms, and effective pulse width of 80 ms, 750 sccm of silane and 7000 sccm of ammonia were introduced to carry out the third step deposition for 250 s.

[0105] The system was vacuumed at 450°C for 500 s, and then 6000 sccm of nitrous oxide was introduced at 400°C and a pressure of 1600 mTorr for 20 s.

[0106] At 400° C., pressure of 1500 mTorr, power of 8500 W, ineffective pulse width of 12 ms, and effective pulse width of 150 ms, 4500 sccm of nitrous oxide and 40 sccm of trimethylaluminum gas were introduced to carry out the fourth step of deposition for 300 s.

[0107] The system was evacuated at 400° C. for 30 seconds, and then nitrogen gas was introduced at 10,000 sccm at 400° C. and a pressure of 10,000 mTorr for 30 seconds.

[0108] Comparative Example 1

[0109] The difference between Comparative Example 1 and Example 1 is that 1000 sccm of silane and 7000 sccm of ammonia are introduced, and deposition is performed for 900 s, replacing the first three steps of deposition.

[0110] Comparative Example 2

[0111] The difference between Comparative Example 2 and Example 1 is that, in the first step of deposition, 800 sccm of silane and 5000 sccm of ammonia are introduced.

[0112] Comparative Example 3

[0113] The difference between Comparative Example 3 and Example 1 is that, in the first step of deposition, 1500 sccm of silane and 2000 sccm of ammonia are introduced.

[0114] Comparative Example 4

[0115] The difference between Comparative Example 4 and Example 1 is that the time for the first deposition step is 200 s.

[0116] Comparative Example 5

[0117] The difference between Comparative Example 5 and Example 1 is that 200 sccm of silane and 7000 sccm of ammonia are introduced in the second deposition step.

[0118] Comparative Example 6

[0119] The difference between Comparative Example 6 and Example 1 is that 1000 sccm of silane and 3000 sccm of ammonia are introduced in the second deposition step.

[0120] Comparative Example 7

[0121] The difference between Comparative Example 7 and Example 1 is that 600 sccm of silane and 3000 sccm of ammonia are introduced in the third deposition step.

[0122] Comparative Example 8

[0123] The difference between Comparative Example 8 and Example 1 is that the time of the third step deposition is 200 s.

[0124] Comparative Example 9

[0125] The difference between Comparative Example 9 and Example 1 is that the fourth step of deposition is not performed.

[0126] Comparative Example 10

[0127] The difference between Comparative Example 10 and Example 1 is that, in the fourth step of deposition, 3000 sccm of laughing gas and 70 sccm of trimethylaluminum gas are introduced.

[0128] Comparative Example 11

[0129] The difference between Comparative Example 11 and Example 1 is that, in the fourth step of deposition, 5000 sccm of laughing gas and 20 sccm of trimethylaluminum gas are introduced.

[0130] Comparative Example 12

[0131] The difference between Comparative Example 12 and Example 1 is that the time of the fourth step deposition is 60 s.

[0132] The saturated auxiliary heating sleeves prepared in Examples 1-6 and Comparative Examples 1-12 were tested for surface coating thickness, and the test results are shown in Table 1.

[0133] Table 1

[0134]

[0135]

[0136] The saturated auxiliary heating sleeves prepared in Examples 1-6 and Comparative Examples 1-12 were assembled into a heating device for use in a coating device, and a brand new auxiliary heating sleeve that had not been treated in any way was designed as a blank control group. The battery cells were passivated and coated under the same preparation conditions. The first three battery cells were passivated and coated to form finished battery products. The proportion of the EL black edge was recorded using an online EL detector. The results are shown in Table 2.

[0137] Table 2

[0138]

[0139] The EL black edge image of the passivated cell obtained in the blank control group is as follows: Figure 1 As shown, compared Figure 1 and Figure 2It can be seen that the battery cell produced without the method of the present invention has a serious EL black edge problem. Combined with Table 2, it can be proved that the method of the present invention can significantly reduce the EL black edge ratio, thereby improving the battery yield.

[0140] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0141] The above-mentioned embodiments only express several implementation methods of the present invention, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be pointed out that, for ordinary technicians in this field, several variations and improvements can be made without departing from the concept of the present invention, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention shall be subject to the attached claims.

Claims

1. A saturation treatment method for an auxiliary heating sleeve, characterized in that: The steps include: Clean the auxiliary heating sleeve; Install the cleaned auxiliary heating sleeve into the heating device and introduce protective gas under constant pressure; 500 sccm-1500 sccm of silane and 3000 sccm-7000 sccm of ammonia are introduced to perform the first step of deposition, and the deposition time is 300s-400s; 300 sccm-1300 sccm of silane and 4000 sccm-8000 sccm of ammonia are introduced to carry out the second step of deposition, and the deposition time is 50 s-250 s, wherein the silane flow rate in the second step of deposition is less than the silane flow rate in the first step of deposition; 100 sccm-1100 sccm of silane and 4500 sccm-8500 sccm of ammonia are introduced to perform the third step of deposition, and the deposition time is 250 s-350 s, wherein the silane flow rate in the third step of deposition is less than the silane flow rate in the second step of deposition; After evacuating the vacuum, nitrous oxide is introduced under constant pressure; 4500sccm-5500sccm of laughing gas and 40sccm-100sccm of trimethylaluminum gas are introduced to carry out the fourth step of deposition, and the deposition time is 100s-300s; After evacuation, protective gas is introduced under constant pressure conditions.

2. The saturation treatment method of the auxiliary heating sleeve according to claim 1, characterized in that: The ammonia flow rate in the second step of deposition is greater than or equal to the ammonia flow rate in the first step of deposition; And / or, the ammonia flow rate in the third deposition step is greater than the ammonia flow rate in the first deposition step.

3. The saturation treatment method of the auxiliary heating sleeve according to claim 1, characterized in that: The time of the first step deposition is greater than that of the second step deposition; and / or, the time of the first deposition step is greater than the time of the third deposition step; And / or, the time of the second deposition step is less than or equal to the time of the third deposition step.

4. The saturation treatment method of the auxiliary heating sleeve according to any one of claims 1 to 3, characterized in that: In the first deposition step, the temperature is 280°C-480°C, the pressure is 1200mTorr-2200mTorr, the power is 8000W-18000W, the invalid pulse width is 7ms-13ms, and the valid pulse width is 40ms-100ms; and / or, in the second step of deposition, the temperature is 280° C.-480° C., the pressure is 1200 mTorr-2200 mTorr, the power is 10000 W-20000 W, the ineffective pulse width is 7 ms-13 ms, and the effective pulse width is 30 ms-90 ms; and / or, in the third step of deposition, the temperature is 280° C.-480° C., the pressure is 1200 mTorr-2200 mTorr, the power is 10000 W-20000 W, the ineffective pulse width is 7 ms-13 ms, and the effective pulse width is 40 ms-100 ms; And / or, in the fourth step of deposition, the temperature is 280° C.-480° C., the pressure is 800 mTorr-1800 mTorr, the power is 5000 W-10000 W, the ineffective pulse width is 7 ms-13 ms, and the effective pulse width is 90 ms-150 ms.

5. The saturation treatment method of the auxiliary heating sleeve according to claim 1, characterized in that: When the auxiliary heating sleeve is a used auxiliary heating sleeve, the cleaning process at least includes acid cleaning and alkali cleaning; Alternatively, when the auxiliary heating sleeve is an unused auxiliary heating sleeve, the cleaning process includes ethanol cleaning.

6. The saturation treatment method of the auxiliary heating sleeve according to claim 1, characterized in that: In the step of installing the cleaned auxiliary heating sleeve into the heating device and introducing the protective gas under constant pressure conditions, the pressure is 1200mTorr-2200mTorr, the flow rate of the protective gas is 4500sccm-5500sccm, the temperature is 280℃-480℃, and the time is 40s-60s.

7. The saturation treatment method of the auxiliary heating sleeve according to claim 1, characterized in that: After evacuating the vacuum, the step of introducing nitrous oxide under constant pressure conditions includes a pressure of 800mTorr-1800mTorr, a nitrous oxide flow rate of 4000sccm-6000sccm, a temperature of 280°C-480°C, and a time of 10s-30s.

8. The saturation treatment method of the auxiliary heating sleeve according to claim 1, characterized in that: After evacuation, the protective gas is introduced under constant pressure conditions, with a pressure of 1000mTorr-10000mTorr, a flow rate of 5000sccm-15000sccm, a temperature of 280°C-480°C, and a time of 20s-40s.

9. A saturated auxiliary heat sleeve obtained by the saturation treatment method of an auxiliary heat sleeve according to any one of claims 1 to 8, characterized in that: The surface of the saturated auxiliary heat sleeve is coated with a film, and the thickness of the film is 100nm-200nm.

10. A coating device, characterized in that: It comprises a heating device, wherein the heating device comprises the saturated auxiliary heating sleeve as described in claim 9.

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