Quartz pendulous reed forming method

Abstract

The invention relates to the technical field of quartz pendulous reed processing, in particular to a quartz pendulous reed forming method. The method includes preparing corrosive liquid; the covered first quartz plate is soaked in corrosive liquid, the first quartz plate corrodes the first forming part under the condition of first rotation, and a second quartz plate with a first through opening with first corrosion allowance is obtained; the covered second quartz plate is soaked in the corrosive liquid, under the condition of second rotation of the second quartz plate, a second forming part reaches a second corrosion allowance, and a third quartz plate with a formed first flexible beam is obtained; the covered third quartz plate is soaked in corrosive liquid, the first corrosion allowance and the second corrosion allowance of the third quartz plate are removed under the condition of third rotation, the first through opening is formed into a target through opening, the first flexible beam is formed into a target flexible beam, the third forming part is formed into a target boss, and the quartz pendulous reed is obtained. Therefore, the problem that the performance of the quartz pendulous reed is reduced due to an existing quartz pendulous reed forming method is solved.

Description

Technical Field

[0001] The invention relates to the technical field of quartz pendulum processing, and in particular to a quartz pendulum forming method. Background Art

[0002] The quartz accelerometer is a mechanical pendulum accelerometer that is currently used in multiple models of inertial navigation and inertial guidance systems of the company. The quartz pendulum is a key component of the quartz flexible accelerometer's sensitive inertial force to measure acceleration, and is the core sensitive component of the accelerometer that directly senses the acceleration signal.

[0003] At present, the method for making a quartz pendulum is to clean the quartz pendulum substrate, use a laser cutting machine to cut the quartz substrate shape, and obtain Figure 1 After the shape is formed, the quartz glass sheet is clamped and protected by the corrosion beam protection tooling and the corrosion boss protection tooling, and then placed in the corrosion liquid to etch the quartz swing beam, etch the boss and adjust the stiffness, etc., and can be taken out on time for disassembly and cleaning to obtain the quartz swing sheet. The method for making the quartz swing sheet is to cut the quartz substrate into shape by a laser cutting machine, and then use the tooling protection to etch it by hydrofluoric acid. This method has the following defects:

[0004] 1) The quartz pendulum is cut by laser. The principle of laser cutting is that the laser beam scans the surface of the material to quickly heat the material to the melting point, thereby achieving the purpose of cutting. This method will cause the stress of the quartz glass itself to increase, making the stress of the quartz pendulum too large. For sensitive devices, it affects the performance of the quartz flexible accelerometer.

[0005] 2) This processing method causes the flexible beam to be uneven. When the quartz pendulum is installed in the quartz flexible accelerometer and an impact test is performed, it is easy to cause the flexible beam to break, causing the quartz flexible accelerometer to be scrapped, affecting the reliability and qualification rate of the product.

[0006] 3) Hydrofluoric acid is a highly corrosive weak acid with poor corrosion stability. During the corrosion process, due to the instability of hydrofluoric acid, the quartz pendulum cannot be corroded at a stable and uniform speed, resulting in an asymmetric shape of the quartz pendulum, inconsistency between the front and back, and irregularity of the finished product after corrosion, affecting product performance. Summary of the invention

[0007] In order to solve the problem that the existing quartz pendulum forming method causes the performance of the quartz pendulum to be reduced, the present invention provides a quartz pendulum forming method, comprising the following steps:

[0008] Prepare corrosive fluid;

[0009] Performing a first covering on the surface of the first quartz plate to reserve a first forming portion, immersing the first quartz plate in the etching solution, and etching the first forming portion under a first rotating condition until a second quartz plate having a first opening formed with a first etching margin is obtained;

[0010] Performing a second covering on the surface of the second quartz plate to reserve a second forming portion, immersing the second quartz plate in the etching solution, and etching the second forming portion under the second rotation condition until the second forming portion reaches a second etching margin, thereby obtaining a third quartz plate formed with a first flexible beam;

[0011] Perform a third covering on the third formed part of the third quartz plate; immerse the third quartz plate in the etching liquid, and under the condition of a third rotation, the third quartz plate etches the surface of the third quartz plate until the first etching remainder and the second etching remainder are removed, the first through port is formed into a target through port, the first flexible beam is formed into a target flexible beam, and the third formed part is formed into a target boss, the thickness of the target boss is greater than the thickness of the flexible beam, and a quartz pendulum plate is obtained.

[0012] According to one embodiment of the present invention, the etching solution includes hydrofluoric acid and glacial acetic acid, and the mass ratio of the hydrofluoric acid to the glacial acetic acid is 9:4.

[0013] According to an embodiment of the present invention, the quartz plate is suspended in the vertical direction and immersed in the etching solution, the horizontal surface of the quartz plate is inclined to be parallel to the vertical direction, and the peripheral side surface of the quartz plate is inclined to be parallel to the horizontal direction.

[0014] According to an embodiment of the present invention, the rotation includes clockwise rotation, counterclockwise rotation or alternating clockwise rotation and counterclockwise rotation.

[0015] According to an embodiment of the present invention, the alternating clockwise rotation and counterclockwise rotation includes: after the clockwise rotation stops for a first time, the counterclockwise rotation is performed; after the counterclockwise rotation stops for a second time, the clockwise rotation is performed.

[0016] According to one embodiment of the present invention, the corrosion rate of the quartz plate corroded by the corrosive liquid is calculated. The corrosion rate is calculated by taking a quartz plate and measuring the thickness of the quartz plate as h. 1 , the diameter of the quartz plate is d 1 The quartz plate is suspended in the vertical direction and immersed in the etching solution. The quartz plate is subjected to surface etching under the condition of rotation. During the etching time t 1 Then, the thickness of the quartz sheet is measured as h 2, measure the diameter of the quartz plate as d 2 ;

[0017] The corrosion rate includes the corrosion rate of the horizontal surface of the quartz plate and the corrosion rate of the side surface of the quartz plate;

[0018] The quartz plate horizontal corrosion rate v 1 The calculation formula is: 1 =(h 1 -h 2 ) / t 1 ;

[0019] The quartz plate side corrosion rate v 2 The calculation formula is: 2 =(d 1 -d 2 ) / t 1 .

[0020] According to one embodiment of the present invention, the preset thickness h of the horizontal surface of the quartz sheet to be etched is obtained, and the etching rate v of the horizontal surface of the quartz sheet is calculated according to the etching rate v of the horizontal surface of the quartz sheet. 1 Obtain the time t for etching the horizontal surface of the quartz sheet to a preset thickness h, and the calculation formula of the time t is: t = h / v 1 ;

[0021] Get the preset thickness h of the quartz plate side that needs to be etched 0 , according to the quartz plate side corrosion rate v 2 Get the preset thickness h of the side of the quartz sheet corroded 0 Time t 0 , time t 0 The calculation formula is: 0 =h 0 / v 2 .

[0022] According to one embodiment of the present invention, during the process of immersing the first quartz plate in the etching solution, when the first etching amount required for etching is 1 / 3 to 2 / 3 of the first etching margin, the first quartz plate is taken out, and after calculating the first etching rate of the etching solution, the first quartz plate is immersed in the etching solution;

[0023] During the process of immersing the second quartz plate in the etching solution, when the second etching amount required for etching is 1 / 3 to 2 / 3 of the second etching margin, the second quartz plate is taken out, and after calculating the second etching rate of the etching solution, the second quartz plate is immersed in the etching solution.

[0024] During the process of immersing the third quartz plate in the etching solution, when the etching reaches 1 / 3 to 2 / 3 of the first etching margin and the second etching margin, the third quartz plate is taken out, and after calculating the third etching rate of the etching solution, the third quartz plate is immersed in the etching solution.

[0025] According to an embodiment of the present invention, the required etching time for the first corrosion allowance is consistent with the required etching time for the second corrosion allowance.

[0026] According to an embodiment of the present invention, the temperature of the etching solution is 25-35°C.

[0027] According to one embodiment of the present invention, the first covering and the second covering method comprises the following steps:

[0028] Adhere the film with the required forming parts reserved to the two end surfaces of the quartz plate;

[0029] The first clamping plate is used to clamp the two end surfaces of the quartz plate through the film.

[0030] According to one embodiment of the present invention, the third covering method comprises the following steps:

[0031] Adhere the third forming part on both end surfaces of the third quartz plate with rubber pads;

[0032] The second clamping plate is used to clamp the two ends of the third quartz plate through the rubber pad.

[0033] In order to solve the problem that the existing quartz pendulum forming method leads to reduced performance of the quartz pendulum, the present invention has the following advantages:

[0034] 1. In the present invention, the quartz plate is rotated to drive the corrosive liquid to rotate, so that when the corrosive liquid rotates, the movement speed of the corrosive medium is accelerated, thereby increasing the corrosion speed of the corrosive liquid and further improving the work efficiency. In the forming step of the quartz pendulum of the present invention, no photolithography means such as laser cutting is involved, which ensures that the performance of the quartz pendulum is not affected. According to the shape of the required quartz pendulum, the quartz pendulum is etched into the required structure in sequence through multiple etchings, thereby improving the precision of the formed shape of the quartz pendulum. By controlling the first corrosion margin and the second corrosion margin, it is ensured that each time the quartz plate is corroded, the corrosion amount of the quartz plate is carried out within the control range, thereby further improving the precision of the formed shape of the quartz pendulum. The present invention solves the problem of high stress, poor impact resistance and irregular external dimensions of the quartz pendulum caused by the method in the production of the quartz pendulum. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] Figure 1 A flowchart of forming a swing piece in an embodiment is shown;

[0036] Figure 2 A schematic diagram of a top view of a second quartz plate according to an embodiment is shown;

[0037] Figure 3 A schematic diagram of a top view of a third quartz plate of an embodiment is shown;

[0038] Figure 4 A schematic diagram of the top view of a quartz pendulum according to an embodiment is shown;

[0039] Figure 5 Shows Figure 4 Schematic diagram of the side structure.

[0040] Figure markings: 1 - second quartz plate; 2 - first port; 3 - third quartz plate; 4 - second port; 5 - first flexible beam; 6 - quartz pendulum plate; 7 - target port; 8 - target flexible beam; 9 - target boss. DETAILED DESCRIPTION

[0041] The present disclosure will now be discussed with reference to several exemplary embodiments. It should be understood that these embodiments are discussed only to enable those skilled in the art to better understand and thus implement the present disclosure, rather than implying any limitation on the scope of the present disclosure.

[0042] As used herein, the term "including" and its variants are to be interpreted as open-ended terms meaning "including but not limited to". The term "based on" is to be interpreted as "based at least partially". The terms "one embodiment" and "an embodiment" are to be interpreted as "at least one embodiment". The term "another embodiment" is to be interpreted as "at least one other embodiment". The orientation or position relationship indicated by the terms "upper", "lower", "left", "right", "front", "back", "top", "bottom", "inner", "outer", "vertical", "horizontal", "lateral", "longitudinal" and the like is based on the orientation or position relationship shown in the accompanying drawings. These terms are mainly for better describing the present application and its embodiments, and are not used to limit the indicated devices, elements or components to have a specific orientation, or to be constructed and operated in a specific orientation. In addition, the above-mentioned part terms can be used to express other meanings in addition to indicating orientation or positional relationship. For example, the term "upper" may also be used to express a certain dependency or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in this application can be understood according to the specific circumstances. In addition, the terms "installed", "set", "provided with", "connected" and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection, or an electrical connection; it can be directly connected, or indirectly connected through an intermediate medium, or it can be an internal connection between two devices, elements or components. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to the specific circumstances. In addition, the terms "first", "second", etc. are mainly used to distinguish different devices, elements or components (the specific types and structures may be the same or different), and are not used to indicate or imply the relative importance and quantity of the indicated devices, elements or components. Unless otherwise specified, "plurality" means two or more.

[0043] This embodiment discloses a method for forming a quartz pendulum. Figure 1 As shown, the following steps are included:

[0044] Prepare corrosive fluid;

[0045] Performing a first covering on the surface of the first quartz plate to reserve a first forming portion, immersing the first quartz plate in the etching solution, and etching the first forming portion under a first rotating condition until a second quartz plate having a first opening formed with a first etching margin is obtained;

[0046] Performing a second covering on the surface of the second quartz plate to reserve a second forming portion, immersing the second quartz plate in the etching solution, and etching the second forming portion under the second rotation condition until the second forming portion reaches a second etching margin, thereby obtaining a third quartz plate formed with a first flexible beam;

[0047] Perform a third covering on the third formed part of the third quartz plate; immerse the third quartz plate in the etching liquid, and under the condition of a third rotation, the third quartz plate etches the surface of the third quartz plate until the first etching remainder and the second etching remainder are removed, the first through port is formed into a target through port, the first flexible beam is formed into a target flexible beam, and the third formed part is formed into a target boss, the thickness of the target boss is greater than the thickness of the flexible beam, and a quartz pendulum plate is obtained.

[0048] When carrying out this embodiment, the through-port, flexible beam and boss can be of any shape according to the requirements. The through-port is a structure formed by penetrating the quartz pendulum, the flexible beam is a structure with a smaller thickness than the quartz pendulum, and the boss is a structure with a larger thickness than the quartz pendulum. Based on this, this embodiment first etches out the through-port, and then etches out the flexible beam and the boss in sequence. Specifically, a corrosive liquid is prepared, and the surface of the first quartz plate except the first forming part is first covered, and only the first forming parts of the two end surfaces of the first quartz plate are exposed. The first quartz plate is immersed in the prepared corrosive liquid, and the first quartz plate rotates in the corrosive liquid in a manner of rotating around the axis of the corrosive liquid, so that when the first quartz plate rotates, the first quartz plate drives the corrosive liquid to rotate. During the rotation of the first quartz plate, the corrosive liquid contacts the first forming part, and the corrosive liquid corrodes the first forming part until the corrosive liquid corrodes and removes the first forming part. After the first forming part is corroded and removed, the first forming part forms a first opening at the first quartz plate shape, and the first opening has a first corrosion margin, that is, a second quartz plate with a first opening is obtained, and the second quartz plate is as follows Figure 2 The second quartz plate is taken out from the etching liquid, and the second quartz plate is processed. After the surface of the second quartz plate is free of liquid, the second forming part of the second quartz plate is determined, and the surface of the second quartz plate except the second forming part is covered with a second cover, and only the first forming parts of the two end surfaces of the first quartz plate are exposed. The second quartz plate is immersed in the etching liquid, and the second quartz plate is immersed in the etching liquid in a rotating state. The etching liquid contacts the second forming part, and the etching liquid corrodes the second forming part until the thickness of the second forming part is reduced to become a first flexible beam with a second etching margin, and a third quartz plate is obtained. The third quartz plate is as shown in FIG. Figure 3As shown. The third quartz plate is taken out from the etching liquid, and the third quartz plate is processed. After there is no etching liquid on the surface of the third quartz plate, the third forming part of the third quartz plate is determined, and the third forming parts of the two end surfaces of the third quartz plate are subjected to the third covering. The third quartz plate is immersed in the etching liquid, and the third quartz plate is immersed in the etching liquid in a rotating state. The etching liquid contacts the parts except the third forming part, and the etching liquid corrodes the parts except the third forming part. The thickness of the third quartz plate is reduced, the first corrosion margin and the second corrosion margin are corroded and removed, the horizontal plane area of ​​the first opening is increased to form the target opening, the thickness of the first flexible beam is reduced to form the target flexible beam, and the covered third forming part is not corroded, so that the thickness of the third forming part is greater than the thickness of other positions of the third quartz plate, so that the third forming part forms a target boss on the third quartz plate, and the thickness of the target flexible beam is less than the thickness of other parts of the third quartz plate except the target boss, and the target boss is less than the thickness of the target flexible beam, thereby obtaining a quartz pendulum. The quartz pendulum is as shown in Figure 4 and Figure 5 shown.

[0049] In this embodiment, the parameters of the etching liquid immersed in the first quartz plate, the second quartz plate and the third quartz plate are the same, or the etching liquid immersed in the three quartz plates is the same etching liquid, so as to avoid different corrosion stability caused by different etching liquids, reduce the influence of the uncertain factors of the etching liquid on the corrosion of the quartz plate, and when it is the same etching liquid, there is no need to prepare a new etching liquid, so as to improve work efficiency. The etching liquid is driven to rotate by the rotation of the quartz plate, so that the movement speed of the etching medium is accelerated when the etching liquid rotates, thereby increasing the corrosion speed of the etching liquid and further improving work efficiency. In the forming step of the quartz pendulum of this embodiment, no photolithography means such as laser cutting is involved, so as to ensure that the performance of the quartz pendulum is not affected. In this embodiment, according to the shape of the required quartz pendulum, the quartz pendulum is etched out of the required structure in turn through multiple etchings, so as to improve the precision of the formed shape of the quartz pendulum. Through the control of the first etching margin and the second etching margin, it is ensured that the etching amount of the quartz plate is carried out within the control range each time the quartz plate is etched, so as to further improve the precision of the formed shape of the quartz pendulum.

[0050] In this embodiment, the first corrosion allowance is the difference between the size of the first opening and the size of the target opening. It can be understood that the first opening wall needs to be corroded again to obtain the size that meets the target opening. The size can be the horizontal cross-sectional area, that is, the first corrosion allowance is the difference between the horizontal cross-sectional area of ​​the first opening and the horizontal cross-sectional area of ​​the target opening. The second corrosion allowance is the difference between the size of the first flexible beam and the size of the target flexible beam. The size includes thickness and horizontal cross-sectional area, that is, the second corrosion allowance is the difference between the thickness of the first flexible beam and the thickness of the target flexible beam, and the difference between the horizontal cross-sectional area of ​​the first flexible beam and the horizontal cross-sectional area of ​​the target flexible beam. Therefore, when the second quartz is corroded, it is necessary not only to control the thickness of the first flexible beam, but also to control the horizontal cross-sectional area of ​​the first flexible beam, and then to ensure that when the third quartz sheet is corroded, the thickness of the first flexible beam and the horizontal cross-sectional area of ​​the first flexible beam are reduced at the same time, and the accuracy of the thickness and horizontal cross-sectional area of ​​the target flexible beam is guaranteed to meet the requirements.

[0051] The first covering, the second covering and the third covering include covering the side surfaces around the contour edge of the first quartz plate. If not covered, it is necessary to calculate the corrosion allowance of each corrosion of the side surfaces around the contour edge of the quartz plate to ensure that the structure of the final quartz pendulum plate meets the requirements.

[0052] In some embodiments, Figure 2-4 As shown, the target opening includes an arc opening, a circular opening and a rectangular opening. The arc opening is far away from the axis of the quartz pendulum, the arc opening is C-shaped, the circular opening is coaxial with the quartz pendulum, the rectangular opening is located between the two ends of the arc opening, and the rectangular opening is square or rectangular. The target flexible beam is located between the head and the end of the C-shaped arc opening, the rectangular opening is located in the middle of the target flexible beam, and the rectangular opening divides one target flexible beam into two flexible beams.

[0053] In some embodiments, multiple quartz plates can be etched simultaneously in the same etching solution to improve work efficiency. When multiple quartz plates are etched simultaneously, the multiple quartz plates should be the first quartz plate, the second quartz plate or the third quartz plate to ensure that the etching time is consistent.

[0054] According to one embodiment of the present invention, the etching solution includes hydrofluoric acid and glacial acetic acid, and the mass ratio of the hydrofluoric acid to the glacial acetic acid is 9:4.

[0055] In this embodiment, by setting the etching liquid to be hydrofluoric acid and glacial acetic acid in a set ratio, the stability of the etching liquid is increased, the stability of the etching liquid in the process of etching the quartz plate is improved, and the etching quality of the quartz plate is guaranteed.

[0056] In some embodiments, the pH of the etching solution is 2.1-2.4.

[0057] According to an embodiment of the present invention, the quartz plate is suspended in the vertical direction and immersed in the etching solution, the horizontal surface of the quartz plate is inclined to be parallel to the vertical direction, and the peripheral side surface of the quartz plate is inclined to be parallel to the horizontal direction.

[0058] In this embodiment, the quartz plate is immersed in the etching liquid, so that a suitable contact mode between the quartz plate and the etching liquid is provided, thereby ensuring that the etching amount of the quartz plate is consistent.

[0059] According to an embodiment of the present invention, the rotation includes clockwise rotation, counterclockwise rotation or alternating clockwise rotation and counterclockwise rotation.

[0060] In this embodiment, by rotating alternately clockwise and counterclockwise, the forming part of the quartz plate is ensured to have the same chance of contacting with the etching liquid, thereby improving the etching uniformity of the forming part of the quartz plate. At the same time, the alternating rotation promotes the acceleration of the movement speed of the etching medium, thereby further improving the working efficiency.

[0061] In some embodiments, the rotation method is to rotate the quartz plate according to the free state of the quartz plate in the corrosive liquid along the vertical direction. During the rotation of the quartz plate, the position state of the quartz plate may change, which is also conducive to the opportunity for the formed part of the quartz plate to have the same contact method with the corrosive liquid.

[0062] According to an embodiment of the present invention, the alternating clockwise rotation and counterclockwise rotation includes: after the clockwise rotation stops for a first time, the counterclockwise rotation is performed; after the counterclockwise rotation stops for a second time, the clockwise rotation is performed.

[0063] In this embodiment, by stopping for a period of time before rotating in the other direction during the alternating rotation, the corrosive liquid is changed from a rapidly flowing state to a slowly flowing state, thereby avoiding the phenomenon that the corrosive liquid reverses its rotation when in a rapidly flowing state, resulting in the liquid flow direction being difficult to control and the liquid being easy to splash. Preferably, the first time and the second time are 1s-1.5s.

[0064] In some embodiments, the time and / or frequency of the clockwise rotation and the counterclockwise rotation are consistent or inconsistent. Preferably, the time and / or frequency of the clockwise rotation and the counterclockwise rotation are consistent.

[0065] According to one embodiment of the present invention, the preset thickness h of the horizontal surface of the quartz sheet to be etched is obtained, and the etching rate v of the horizontal surface of the quartz sheet is calculated according to the etching rate v of the horizontal surface of the quartz sheet. 1 Obtain the time t for etching the horizontal surface of the quartz sheet to a preset thickness h, and the calculation formula of the time t is: t = h / v 1 ;

[0066] Get the preset thickness h of the quartz plate side that needs to be etched 0 , according to the quartz plate side corrosion rate v 2 Get the preset thickness h of the side of the quartz sheet corroded 0 Time t 0 , time t 0 The calculation formula is: 0 =h 0 / v 2 .

[0067] In this embodiment, the preset thickness of the horizontal surface of the quartz plate is the amount of corrosion required for the upper end face and the lower end face of the quartz plate, and the preset thickness of the side surface of the quartz plate is the amount of corrosion required for the side surface of the edge of the quartz plate contour and the amount of corrosion required for the side surface of the non-planar surface such as the side wall of the opening. After calculating the corrosion rate of the etching liquid, the time required for the required corrosion amount is obtained according to the corrosion amount, and then the time can be used to determine whether the corrosion of the quartz plate is completed.

[0068] According to one embodiment of the present invention, during the process of immersing the first quartz plate in the etching solution, when the first etching amount required for etching is 1 / 3 to 2 / 3 of the first etching margin, the first quartz plate is taken out, and after calculating the first etching rate of the etching solution, the first quartz plate is immersed in the etching solution;

[0069] During the process of immersing the second quartz plate in the etching solution, when the second etching amount required for etching is 1 / 3 to 2 / 3 of the second etching margin, the second quartz plate is taken out, and after calculating the second etching rate of the etching solution, the second quartz plate is immersed in the etching solution.

[0070] During the process of immersing the third quartz plate in the etching solution, when the etching reaches 1 / 3 to 2 / 3 of the first etching margin and the second etching margin, the third quartz plate is taken out, and after calculating the third etching rate of the etching solution, the third quartz plate is immersed in the etching solution.

[0071] In this embodiment, the first corrosion amount refers to the amount of corrosion on the first forming part of the first quartz plate, and the second corrosion amount refers to the amount of corrosion on the second forming part of the second quartz plate. The first corrosion amount and the second corrosion amount include but are not limited to the thickness, horizontal cross-sectional area, volume, etc. of the quartz plate. When the quartz plate is being corroded and the corrosion has not yet been completed, the quartz plate is taken out of the corrosive liquid, and the corrosion time is calculated again according to the corrosion rate to ensure that the corrosion amount of the quartz plate is within the preset requirements, thereby improving the corrosion accuracy of the quartz plate. It also avoids the situation in which the quartz plate is corroded within the preset requirements due to other factors during the corrosion process.

[0072] Preferably, when the second corrosion amount required for corrosion is 1 / 3 to 1.5 / 3 of the corrosion amount of the second corrosion allowance, the first quartz plate is taken out; when the second corrosion amount required for corrosion is 1 / 3 to 1.5 / 3 of the corrosion amount of the second corrosion allowance, the second quartz plate is taken out; when the corrosion reaches a thickness of 1 / 3 to 1.5 / 3 of the first corrosion allowance and the second corrosion allowance, the third quartz plate is taken out. More preferably, when the second corrosion amount required for corrosion is 1 / 3 of the corrosion amount of the second corrosion allowance, the first quartz plate is taken out; when the corrosion reaches a second corrosion amount required for corrosion is 1 / 3 of the corrosion amount of the second corrosion allowance, the second quartz plate is taken out; when the corrosion reaches a thickness of 1 / 3 of the first corrosion allowance and the second corrosion allowance, the third quartz plate is taken out.

[0073] In some embodiments, during the process of immersing the first quartz plate in the etching solution, when the first etching amount is 1.5 / 3 to 2 / 3 of the first etching amount, the first quartz plate is taken out, and after calculating the first etching rate of the etching solution, the first quartz plate is immersed in the etching solution; during the process of immersing the second quartz plate in the etching solution, when the second etching amount is 1.5 / 3 to 2 / 3 of the etching amount, the second quartz plate is taken out, and after calculating the second etching rate of the etching solution, the second quartz plate is immersed in the etching solution. It is also possible to take out the quartz plate during the immersion process, calculate the etching rate, and then immerse the quartz plate in the etching solution again.

[0074] According to an embodiment of the present invention, the required etching time for the first corrosion allowance is consistent with the required etching time for the second corrosion allowance.

[0075] In this embodiment, by setting the required etching time of the first etching allowance and the required etching time of the second etching allowance to be consistent, it is ensured that when the third quartz plate is corroded, a quartz pendulum plate structure that meets the requirements can be corroded at the same time, avoiding the phenomenon of excessive corrosion or insufficient corrosion.

[0076] According to an embodiment of the present invention, the temperature of the etching solution is 25-35°C.

[0077] In this embodiment, a suitable temperature of the etching liquid of the present invention is provided, so that the stability and etching effect of the etching liquid are better. Since the etching liquid has a temperature, bubbles will appear in the etching liquid during the immersion etching of the quartz plate, and the bubbles will affect the corrosion integrity of the surface of the quartz plate. Therefore, the quartz plate is immersed and corroded by rotating, which has the effect of defoaming. Preferably, the temperature of the etching liquid during the etching process of the quartz plate should be controlled to be corroded at the same temperature, that is, the corrosion temperature remains unchanged, to avoid the influence of temperature changes on the corrosion of the quartz plate caused by other uncontrollable factors.

[0078] According to one embodiment of the present invention, the first covering and the second covering method comprises the following steps:

[0079] Adhere the film with the required forming parts reserved to the two end surfaces of the quartz plate;

[0080] The first clamping plate is used to clamp the two end surfaces of the quartz plate through the film.

[0081] In this embodiment, the film is made of rubber, and the film with the required forming parts is used to fit the two end faces of the quartz sheet, so that when the quartz sheet is corroded, only the forming parts are corroded, and the covered parts are not corroded. The film and the quartz sheet are fitted to prevent the corrosion from contacting the quartz sheet through the gap between the film and the quartz sheet, and it is also convenient for the quartz sheet to be easily disassembled after being corroded. The film is clamped with a splint to increase the contact area between the film and the quartz sheet, further avoiding the generation of gaps. This embodiment only provides a way to cover the quartz sheet, and other ways of covering the quartz sheet to only allow the corrosive liquid to corrode the formed parts are also applicable.

[0082] According to one embodiment of the present invention, the third covering method comprises the following steps:

[0083] Adhere the third forming part on both end surfaces of the third quartz plate with rubber pads;

[0084] The second clamping plate is used to clamp the two ends of the third quartz plate through the rubber pad.

[0085] In this embodiment, a rubber pad is used to fit the formed parts of the two end faces of the quartz plate, so that when the quartz plate is etched, only the parts other than the formed parts of the quartz plate are etched, and the covered parts are not etched. The rubber pad fits the quartz plate to prevent corrosion from contacting the quartz plate through the gap between the rubber pad and the quartz plate, and it is also convenient for easy disassembly after the quartz plate is etched. The rubber pad is clamped with a clamping plate to increase the contact area between the rubber pad and the quartz plate, further avoiding the generation of gaps. This embodiment only provides a way to cover the quartz plate, and other ways of covering the quartz plate to only allow the etching liquid to etch the formed parts are also applicable.

[0086] Those skilled in the art will appreciate that the above-mentioned embodiments are specific examples for implementing the present disclosure, and in actual applications, various changes may be made thereto in form and detail without departing from the scope of the present disclosure.

Claims

1. A quartz pendulum forming method, characterized in that: The steps include: Prepare corrosive fluid; Performing a first covering on the surface of the first quartz plate to reserve a first forming portion, immersing the first quartz plate in the etching solution, and etching the first forming portion under a first rotating condition until a second quartz plate having a first opening formed with a first etching margin is obtained; Performing a second covering on the surface of the second quartz plate to reserve a second forming portion, immersing the second quartz plate in the etching solution, and etching the second forming portion under the second rotation condition until the second forming portion reaches a second etching margin, thereby obtaining a third quartz plate formed with a first flexible beam; Perform a third covering on the third formed part of the third quartz plate; immerse the third quartz plate in the etching liquid, and under the condition of a third rotation, the third quartz plate etches the surface of the third quartz plate until the first etching remainder and the second etching remainder are removed, the first through port is formed into a target through port, the first flexible beam is formed into a target flexible beam, and the third formed part is formed into a target boss, the thickness of the target boss is greater than the thickness of the flexible beam, and a quartz pendulum plate is obtained.

2. A quartz pendulum forming method according to claim 1, characterized in that: The etching solution includes hydrofluoric acid and glacial acetic acid, and the mass ratio of the hydrofluoric acid to the glacial acetic acid is 9:

4.

3. A quartz pendulum forming method according to claim 1, characterized in that: The quartz plate is suspended in the vertical direction and immersed in the etching solution, the horizontal surface of the quartz plate is inclined to be parallel to the vertical direction, and the peripheral side surface of the quartz plate is inclined to be parallel to the horizontal direction.

4. A quartz pendulum forming method according to claim 1 or 3, characterized in that: The rotation includes clockwise rotation, counterclockwise rotation or alternating clockwise rotation and counterclockwise rotation.

5. A quartz pendulum forming method according to claim 4, characterized in that: The alternating clockwise and counterclockwise rotations include: the counterclockwise rotation is performed after the clockwise rotation stops for a first time; and the clockwise rotation is performed after the counterclockwise rotation stops for a second time.

6. A quartz pendulum forming method according to claim 3, characterized in that: Calculate the corrosion rate of the quartz plate by the etching liquid, the corrosion rate is calculated by: take a quartz plate, measure the thickness of the quartz plate as h1, measure the diameter of the quartz plate as d1, immerse the quartz plate in the etching liquid in a vertical direction, and perform surface etching on the quartz plate under the condition of rotation. After the etching time t1, measure the thickness of the quartz plate as h2, and measure the diameter of the quartz plate as d2; The corrosion rate includes the corrosion rate of the horizontal surface of the quartz plate and the corrosion rate of the side surface of the quartz plate; The calculation formula of the horizontal surface corrosion rate v1 of the quartz plate is: v1 = (h1-h2) / t1; The calculation formula of the quartz plate side corrosion rate v2 is: v2 = (d1-d2) / t1.

7. A quartz pendulum forming method according to claim 6, characterized in that: Obtain the preset thickness h of the horizontal surface of the quartz sheet that needs to be etched, and obtain the time t for etching the preset thickness h of the horizontal surface of the quartz sheet according to the etching rate v1 of the horizontal surface of the quartz sheet. The calculation formula of the time t is: t=h / v1; The preset thickness h0 of the side of the quartz sheet that needs to be etched is obtained, and the time t0 for etching the preset thickness h0 of the side of the quartz sheet is obtained according to the etching rate v2 of the side of the quartz sheet. The calculation formula of the time t0 is: t0=h0 / v2.

8. A quartz pendulum forming method according to claim 1, characterized in that: During the process of immersing the first quartz plate in the etching solution, when the first etching amount required for etching is 1 / 3 to 2 / 3 of the first etching margin, the first quartz plate is taken out, and after calculating the first etching rate of the etching solution, the first quartz plate is immersed in the etching solution; During the process of immersing the second quartz plate in the etching solution, when the second etching amount required for etching is 1 / 3 to 2 / 3 of the second etching margin, the second quartz plate is taken out, and after calculating the second etching rate of the etching solution, the second quartz plate is immersed in the etching solution. During the process of immersing the third quartz plate in the etching solution, when the etching reaches 1 / 3 to 2 / 3 of the first etching margin and the second etching margin, the third quartz plate is taken out, and after calculating the third etching rate of the etching solution, the third quartz plate is immersed in the etching solution.

9. A quartz pendulum forming method according to claim 1, characterized in that: The required etching time for the first corrosion allowance is consistent with the required etching time for the second corrosion allowance.

10. A quartz pendulum forming method according to claim 1, characterized in that: The temperature of the etching solution is 25-35°C.

11. A quartz pendulum forming method according to claim 1, characterized in that: The first covering and the second covering method comprises the following steps: Adhere the film with the required forming parts reserved to the two end surfaces of the quartz plate; The first clamping plate is used to clamp the two end surfaces of the quartz plate through the film.

12. A quartz pendulum forming method according to claim 1, characterized in that: The third covering method comprises the following steps: Adhere the third forming part on both end surfaces of the third quartz plate with rubber pads; The second clamping plate is used to clamp the two ends of the third quartz plate through the rubber pad.

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