Display panel and display device

Abstract

The invention provides a display panel and a display device. The problem that in the prior art, the yield of a display panel is low is solved. The display panel comprises a substrate; the signal line is positioned on one side of the substrate; the at least one insulating layer is located on the side, away from the substrate, of the signal line and comprises a hole; the first electrode is located on the side, away from the substrate, of the insulating layer and makes contact with the signal line through the hole; the distance between the first electrode and the signal line is 0-5 micrometers in the direction perpendicular to the section of the substrate.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel and a display device. Background Art

[0002] Organic Light Emitting Diode (OLED) is considered to be the next generation of flat panel display technology after liquid crystal. It is popular among users for its excellent color and image quality. As users' demand for display increases, the reliability of OLED display panels needs to be further improved. Summary of the invention

[0003] In view of this, embodiments of the present application provide a display panel and a display device, which solve the problem of low reliability of display panels in the prior art.

[0004] The first aspect of the present application provides a display panel, comprising: a substrate; a signal line, located on one side of the substrate; at least one insulating layer, located on the side of the signal line away from the substrate, the insulating layer comprising a hole; and a first electrode, located on the side of the insulating layer away from the substrate, the first electrode contacts the signal line through the hole; wherein, in the cross-sectional direction perpendicular to the substrate, the distance between the first electrode and the signal line is 0-5um. The advantage is that by setting the distance between the first electrode and the signal line to 0-5um, the depth of the hole in the insulating layer is reduced, thereby ensuring that the film layer subsequently formed in the hole, such as at least one of the pixel definition layer and the isolation material layer, can have a sufficient film thickness in the hole, thereby providing protection for the first electrode in the hole, avoiding the subsequent etching process from causing voids on the isolation structure layer and the pixel definition layer, and damaging the first electrode, thereby improving the yield of the display panel.

[0005] In combination with the first aspect, in some possible implementations, the thickness difference between the insulating layer and the signal line is greater than or equal to 0 microns and less than 1 micron; the thickness difference between the insulating layer and the signal line is greater than or equal to 0.2 microns and less than 0.7 microns; the thickness difference between the insulating layer and the signal line is 0.3 microns or 0.5 microns.

[0006] In combination with the first aspect, in some possible implementations, in a cross-sectional direction perpendicular to the substrate, the angle between the hole sidewall and the substrate is greater than 0° and less than or equal to 60°; preferably, the angle is greater than or equal to 50° and less than or equal to 70°. The advantage is that it further ensures that the thickness of the pixel definition layer and the isolation structure layer on the hole sidewall is sufficient.

[0007] In combination with the first aspect, in some possible implementations, the thickness of the insulating layer is greater than 0 micrometers and less than or equal to 5 micrometers; preferably, at least one insulating layer includes one insulating layer; preferably, at least one insulating layer includes a plurality of insulating layers stacked in a direction away from the substrate; preferably, the insulating layer includes a planarization layer. The advantage is that the thickness of the insulating layer is thinner than the conventional thickness, which is conducive to reducing the depth of the hole, thereby ensuring that the pixel definition layer and the isolation structure layer on the sidewall of the hole are of sufficient thickness.

[0008] In combination with the first aspect, in some possible implementations, the opening diameter of the hole is greater than 3 microns. The advantage is that the opening area of ​​the hole H is larger than the conventional opening area, which is conducive to the pixel definition layer and the isolation structure layer climbing on the side wall of the hole to avoid the formation of voids.

[0009] In combination with the first aspect, in some possible implementations, the display panel further includes an isolation structure layer disposed on one side of the substrate, located on the side of the first electrode facing away from the substrate, and the orthographic projection of the hole on the substrate at least partially overlaps with the orthographic projection of the isolation structure layer on the substrate; preferably, the portion of the first electrode located in the hole encloses a first groove, and the opening of the first groove is located on the side of the first electrode facing away from the substrate; preferably, the portion of the isolation structure layer located in the first groove encloses a second groove, and the opening of the second groove is located on the side of the isolation structure layer facing away from the substrate. The advantage is that the isolation structure layer can provide protection for the first electrode in the subsequent etching process.

[0010] In combination with the first aspect, in some possible implementations, the isolation structure layer includes an isolation opening, an orthographic projection of the isolation opening on the substrate and an orthographic projection of the hole on the substrate do not overlap, and the isolation opening exposes a portion of the first electrode.

[0011] In combination with the first aspect, in some possible implementations, the display panel further includes a light-emitting layer and a second electrode stacked in sequence on a side of the first electrode facing away from the substrate; preferably, the second electrode and the isolation structure layer are overlapped.

[0012] In combination with the first aspect, in some possible implementations, the display panel further includes a plurality of spaced packaging parts, which are located on the side of the isolation structure layer and the second electrode away from the substrate, and the packaging part includes a main body sub-part and an extension sub-part; the orthographic projection of the main body sub-part on the substrate covers the orthographic projection of the second electrode on the substrate, and the extension sub-part is connected to the main body sub-part and extends from the isolation opening to the side of the isolation structure layer away from the substrate; preferably, the lengths of the extension sub-parts are different in the direction parallel to the substrate; preferably, the orthographic projection of some extension sub-parts on the substrate overlaps at least partially with the orthographic projection of the hole on the substrate; preferably, the orthographic projection of some extension sub-parts on the substrate covers the orthographic projection of the hole on the substrate; or, part of the boundary of the orthographic projection of some extension sub-parts on the substrate is located within the orthographic projection range of the hole on the substrate. The advantage is that the packaging part can provide protection for the isolation structure layer in the hole, thereby further avoiding etching damage to the pixel definition layer and the isolation structure layer in the hole, and improving the yield of the display panel. The advantage is that it avoids the overhanging area of ​​the packaging part above the isolation structure layer being too large, and the organic packaging layer is not completely filled, which makes the packaging part easy to break, thereby further improving the yield of the display panel.

[0013] In combination with the first aspect, in some possible implementations, in the thickness direction of the substrate, part of the extended sub-portion and the isolation structure layer are spaced apart; preferably, the display panel also includes an organic encapsulation layer, which is located on the side of the encapsulation portion facing away from the substrate; the organic encapsulation layer partially fills the gap between the extended sub-portion and the isolation structure layer; preferably, the orthographic projection of the organic encapsulation layer on the substrate covers the orthographic projections of the isolation structure layer and the encapsulation portion on the substrate; preferably, the display panel also includes an inorganic encapsulation layer, which is located on the side of the organic encapsulation layer facing away from the substrate; and / or the inorganic encapsulation layer is located between the organic encapsulation layer and the encapsulation portion; preferably, the inorganic encapsulation layer is located on the side of the organic encapsulation layer facing away from the substrate, and the orthographic projection of the inorganic encapsulation layer on the substrate covers the orthographic projection of the organic encapsulation layer on the substrate.

[0014] In combination with the first aspect, in some possible implementations, the display panel also includes a stacked residual light-emitting layer and / or a residual second electrode, which is located between the isolation structure layer and the extended sub-portion, the residual light-emitting layer is located on the side of the residual second electrode close to the isolation structure layer, and the orthographic projection of either the residual light-emitting layer and the residual second electrode on the substrate is located between the orthographic projection of the hole on the substrate and the orthographic projection of the isolation opening on the substrate; preferably, the light-emitting layer and the residual light-emitting layer, the second electrode and the residual second electrode are respectively disconnected at the isolation structure layer.

[0015] In combination with the first aspect, in some possible implementations, the display panel also includes a pixel definition layer, which is located on the side of the isolation structure layer close to the substrate, and part of the pixel definition layer is located in the hole; preferably, the orthographic projection of the isolation structure layer on the substrate is located within the orthographic projection range of the pixel definition layer on the substrate; preferably, the pixel definition layer encloses a pixel opening, and the orthographic projection of the pixel opening on the substrate is located within the orthographic projection range of the isolation opening on the substrate.

[0016] In combination with the first aspect, in some possible implementations, the isolation structure layer includes a first part and a second part stacked together, the first part is located on a side of the second part close to the substrate, and the second part protrudes from the side of the first part; preferably, the isolation structure layer also includes a third part, located on a side of the first part away from the second part, and the orthographic projection of the first part on the substrate is located within the range of the orthographic projection of the third part on the substrate; preferably, the first part includes a conductive part.

[0017] According to a second aspect of the present application, there is provided a display panel, comprising: a substrate, a signal line, located on one side of the substrate; at least one insulating layer, located on the side of the signal line facing away from the substrate, the insulating layer comprising a hole; an isolation structure layer, located on the side of the insulating layer facing away from the substrate, an orthographic projection of part of the isolation structure layer on the substrate at least partially overlaps with an orthographic projection of the hole on the substrate, the isolation structure layer comprising an isolation opening; and a packaging portion, located on the side of the isolation structure layer facing away from the substrate, the orthographic projection of the packaging portion on the substrate at least partially overlaps with the orthographic projection of the hole on the substrate.

[0018] The third aspect of the present application provides a display panel, comprising: a substrate; a signal line located on one side of the substrate; an insulating layer located on the side of the signal line facing away from the substrate, the insulating layer comprising a hole, wherein in a cross-sectional direction perpendicular to the substrate, an angle between a side wall of the hole and the substrate is greater than 0° and less than or equal to 70°; and a first electrode located on the side of the insulating layer facing away from the substrate, a portion of the first electrode being located in the hole and in contact with the signal line.

[0019] In combination with the third aspect, in some possible implementations, the angle is greater than or equal to 50° and less than or equal to 70°; preferably, the angle is any one of 53°, 55°, 58°, 60°, 63°, and 65°.

[0020] A fourth aspect of the present application provides a display device, comprising a display panel provided by any of the above embodiments.

[0021] According to the display panel and display device provided by the embodiments of the present application, the insulating layer covers the signal line, a hole is provided in the insulating layer, and part of the first electrode is located in the hole and contacts the signal line. By setting the distance between the first electrode and the signal line to be 0-5um in the cross-sectional direction perpendicular to the substrate, the connection via between the first electrode and the signal line, that is, the depth of the hole in the insulating layer is reduced, thereby ensuring that the film layer subsequently formed in the hole has a sufficient film thickness, thereby providing protection for the first electrode in the hole, avoiding damage to the first electrode in the subsequent etching process, and improving the yield of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] By describing the embodiments of the present application in more detail in conjunction with the accompanying drawings, the above and other purposes, features and advantages of the present application will become more apparent. The accompanying drawings are used to provide a further understanding of the embodiments of the present application and constitute a part of the specification. Together with the embodiments of the present application, they are used to explain the present application and do not constitute a limitation of the present application. In the accompanying drawings, the same reference numerals generally represent the same components or steps.

[0023] Figure 1 A schematic diagram of the top structure of a display panel provided in one embodiment of the present application.

[0024] Figure 2a The first embodiment of the present application provides Figure 1 The cross-sectional structure diagram of the display panel along line A1A2 is shown.

[0025] Figure 2b for Figure 2a The enlarged view of a local film layer of the display panel is shown.

[0026] Figure 3 The second embodiment of the present application provides Figure 1 The cross-sectional structure diagram of the display panel along line A1A2 is shown.

[0027] Figure 4 The third embodiment of the present application provides Figure 1 The cross-sectional structure diagram of the display panel along line A1A2 is shown.

[0028] Figure 5 The fourth embodiment of the present application provides Figure 1 The cross-sectional structure diagram of the display panel along line A1A2 is shown.

[0029] Figure 6 The fifth embodiment of the present application provides Figure 1 The cross-sectional structure diagram of the display panel along line A1A2 is shown.

[0030] Figure 7 A schematic diagram of the structure of a display device provided in one embodiment of the present application. DETAILED DESCRIPTION

[0031] In the related technologies, in order to overcome the limitation of fine metal mask technology on the size of display panel, in recent years, the technology of using isolation structure layer instead of fine metal mask to isolate OLED evaporation organic film layer or cathode during evaporation has attracted much attention. Compared with the previous fine metal mask technology, this process has the advantages of lower cost, no lateral leakage and lower power consumption. It is a high-end display technology for realizing OLED display high PPI, special-shaped display and other applications, and is also the trend of future OLED technology development.

[0032] The preparation process using the isolation structure layer requires patterning for different color sub-pixels one by one. Since the isolation structure layer is thinner at the anode via, especially at the anode via climbing, during the multiple patterning processes of the sub-pixels, the isolation structure layer at the anode via is easily etched to form a void, thereby losing the anode below, or causing defects such as a cathode and anode short circuit.

[0033] In view of this, an embodiment of the present application provides a display panel and a display device, which ensures that the film layer subsequently formed in the hole has sufficient film thickness by reasonably setting the relevant dimensions of the anode via, thereby providing protection for the first electrode in the hole, avoiding damage to the first electrode in the subsequent etching process, and improving the yield of the display panel.

[0034] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0035] In the accompanying drawings, the sizes of layers and regions may be exaggerated for clarity of illustration. It is understood that when a structure is referred to as being "on or under" another structure, the structure may be directly on or under the other structure, or there may be intermediate structures. The same reference numerals always indicate the same structure. The structures mentioned herein include any of a film layer, an element, a device, a component, and an assembly.

[0036] When a structure is referred to as being “connected” to another structure, the structure may be directly connected to the other structure or indirectly connected to the other structure with one or more intervening structures interposed therebetween.

[0037] A first aspect of the present application provides a display panel. Figure 1 A schematic diagram of the top structure of a display panel provided in one embodiment of the present application. Figure 2a The first embodiment of the present application provides Figure 1The cross-sectional structure diagram of the display panel along line A1A2 is shown. Figure 2b for Figure 2a The enlarged view of the local film layer of the display panel is shown. Figure 1 , Figure 2a and Figure 2b As shown, the display panel includes: a substrate 11, a signal line 12, at least one insulating layer 13 and a first electrode 14. The signal line 12 is located on one side of the substrate 11. The insulating layer 13 is located on the side of the signal line 12 away from the substrate 11. The insulating layer 13 includes a hole H. The first electrode 14 is located on the side of the insulating layer 13 away from the substrate 11, and the first electrode 14 contacts the signal line 12 through the hole H. In the cross-sectional direction perpendicular to the substrate 11, the distance between the first electrode 14 and the signal line 12 is 0-5um. Exemplarily, the distance between the first electrode 14 and the signal line 12 is 3 microns or 3.5 microns. The advantage is that the connection via between the first electrode 14 and the signal line 12, that is, the depth of the hole H in the insulating layer 13 is reduced, thereby ensuring that the film layer subsequently formed in the hole H has a sufficient film thickness, thereby providing protection for the first electrode 14 in the hole H, avoiding damage to the first electrode 14 in the subsequent etching process, and improving the yield of the display panel.

[0038] The substrate may be a glass-based substrate.

[0039] In some embodiments, the substrate 11 may include an organic resin material such as epoxy resin, triazine, silicone resin or polyimide. For example, the substrate 11 may be a FR4 type printed circuit board (PCB), or may be a flexible PCB that is easily deformed.

[0040] In some embodiments, the substrate 11 may include a ceramic material such as silicon nitride, aluminum nitride or aluminum oxide, or may include a metal or a metal compound. For example, the substrate 11 may be a metal core printed circuit board (MCPCB) or a metal-base copper-clad laminate (MCCL).

[0041] The signal line 12 is a power signal line. Exemplarily, the first electrode 14 is an anode, and the signal line 12 is a high-voltage power signal line; the first electrode 14 is a cathode, and the signal line 12 is a low-voltage power signal line.

[0042] The display panel may further include a pixel circuit, a scanning signal line, a data signal line, an initialization signal line, etc., located between the substrate 11 and the insulating layer 13. The pixel circuit is, for example, a 7T1C pixel circuit, an 8T1C pixel circuit, etc.

[0043] The insulating layer 13 may be a single film layer or a composite film layer of multiple film layers. As mentioned herein, the single film layer may be an organic layer or an inorganic layer, and the composite film layer may include at least one of an organic layer and an inorganic layer. Exemplarily, the organic layer may include a planarization layer, and the material of the inorganic layer may include silicon nitride, silicon oxide, silicon oxynitride, etc.

[0044] In one embodiment, the thickness difference between the insulating layer 13 and the signal line 12 is greater than or equal to 0 micrometers and less than 1 micrometer. For example, the thickness difference between the insulating layer 13 and the signal line is greater than or equal to 0.2 micrometers and less than or equal to 0.7 micrometers. Exemplarily, the thickness difference between the insulating layer 13 and the signal line 12 is, for example, 0.3 micrometers or 0.5 micrometers. The advantage is that the depth of the hole H in the insulating layer 13 is reduced, thereby ensuring that the film layer subsequently formed in the hole H has sufficient film thickness, and it is not easy to form a cavity, further protecting the first electrode 14, thereby improving the yield of the display panel.

[0045] like Figure 2a and Figure 2b As shown, the display panel further includes an isolation structure layer 15 disposed on one side of the substrate 11, which is located on the side of the insulating layer 13 away from the substrate 11, and the orthographic projection of the hole H on the substrate 11 at least partially overlaps with the orthographic projection of the isolation structure layer 15 on the substrate 11. The advantage is that the isolation structure layer can provide protection for the first electrode in the subsequent etching process.

[0046] In the hole H, the first electrode 14 and the isolation structure layer 15 are stacked, and the first electrode 14 and the isolation structure layer 15 adapt to the shape of the hole H to form a depression in the hole H. Specifically, the portion of the first electrode 14 located in the hole H encloses a first groove G1, and the opening of the first groove G1 is located on the side of the first electrode 14 facing away from the substrate 11. The portion of the isolation structure layer 15 located in the first groove G1 encloses a second groove G2, and the opening of the second groove G2 is located on the side of the isolation structure layer 15 facing away from the substrate 11.

[0047] In one embodiment, the isolation structure layer 15 includes an isolation opening, and the isolation opening exposes at least a portion of the first electrode 14. The orthographic projection of the isolation opening on the substrate 11 and the orthographic projection of the hole H on the substrate 11 do not overlap.

[0048] The partition structure layer 15 has the function of isolating the film layer above it. In the present embodiment, the partition structure layer 15 includes a first part 151 and a second part 152 stacked, the first part 151 is located on the side of the second part 152 close to the substrate 11, and the second part 152 protrudes from the side of the first part 151. In this case, the cross-sectional shape of the partition structure layer 15 is an inverted trapezoid. Exemplarily, the first part 151 can be designed as an independent film layer, that is, there is no physical interface inside the first part 151, and each part is composed of the same material. Alternatively, the first part 151 can be designed to be composed of at least two film layers stacked. For example, the first part 151 is formed by stacking two conductive film layers. The materials of the two conductive film layers can be molybdenum and aluminum, respectively, and the conductive film layer composed of molybdenum is located between the substrate 11 and the conductive film layer composed of aluminum. The material of the second part 152 can be an organic material, an inorganic material, or a metal material. In the case where the second part 152 is a metal material, the material of the second part 152 can be titanium. In one embodiment, the first part 151 includes a conductive part. For example, the first portion 151 is entirely a conductive structure, or a portion of the first portion 151 is a conductive structure.

[0049] For example, the cross-sectional shape of the partition structure layer 15 may also be an inverted trapezoid. The partition structure layer 15 may be an independent film layer, that is, there is no physical interface inside the partition structure layer 15, and each part is made of the same material.

[0050] Exemplarily, the partition structure layer 15 may further include a third portion 153, which is located on the side of the first portion 151 close to the substrate 11. The orthographic projection of the first portion 151 on the substrate 11 is located within the orthographic projection range of the third portion 153 on the substrate 11. Exemplarily, the cross-sectional shape of the partition structure layer 15 is an I-shape. Exemplarily, the material of the third portion 153 may be molybdenum.

[0051] For the composition, preparation and other contents of the partition structure layer, please refer to patents PCT / CN2023 / 134518, 202311499823.9, 202310479495.X, 202310707209.0, 202311346196.5, and 202310692671.8.

[0052] The display panel may further include a pixel definition layer 16, which is located between the isolation structure layer 15 and the insulating layer 13. Part of the pixel definition layer 16 is located in the hole H. In this case, in the hole H, the first electrode 14, the pixel definition layer 16 and the isolation structure layer 15 are stacked in sequence, and the first electrode 14, the pixel definition layer 16 and the isolation structure layer 15 form a depression in the hole H to adapt to the shape of the hole H. Specifically, the portion of the first electrode 14 located in the hole H encloses a first groove G1, and the opening of the first groove G1 is located on the side of the first electrode 14 away from the substrate 11. The portion of the pixel definition layer 16 located in the first groove G1 encloses a third groove G3, and the opening of the third groove G3 is located on the side of the pixel definition layer 16 away from the substrate 11. The portion of the isolation structure layer 15 located in the third groove G3 encloses a second groove G2, and the opening of the second groove G2 is located on the side of the isolation structure layer 15 away from the substrate 11. The orthographic projection of the isolation structure layer 15 on the substrate 11 is located within the orthographic projection range of the pixel definition layer 16 on the substrate. The pixel definition layer 16 encloses a pixel opening, and the orthographic projection of the pixel opening on the substrate 11 is within the orthographic projection range of the isolation opening on the substrate 11. Exemplarily, the material of the pixel definition layer 16 is an insulating material, such as an inorganic material containing Si, such as SiO, SiN, SiON, etc.

[0053] The display panel further includes a light-emitting layer 17 and a second electrode 18 stacked sequentially on the side of the first electrode 14 facing away from the substrate 11. The first electrode 14, the light-emitting layer 17 and the second electrode 18 constitute a sub-pixel. The second electrode 18 overlaps the isolation structure layer 15. Exemplarily, the first electrode 14 is an anode and the second electrode 18 is a cathode; or the first electrode 14 is a cathode and the second electrode 18 is an anode. The material of the anode includes a metal oxide, a metal or a composite structure of multilayer materials, such as ITO / Ag / ITO. The cathode material is, for example, a magnesium-silver alloy.

[0054] The sub-pixel may be an organic light-emitting diode (OLED), a micro light-emitting diode (Micro LED), a quantum dot light-emitting diode (QLED), etc. The sub-pixel may be a light-emitting device of various colors, such as a red light-emitting device R, a green light-emitting device G, a blue light-emitting device B, etc.

[0055] Exemplarily, the display panel may further include at least one of a hole injection layer, a hole transport layer, and an electron blocking layer located between the anode and the light-emitting layer 17 , and at least one of an electron injection layer, an electron transport layer, and a hole blocking layer located between the cathode and the light-emitting layer 17 .

[0056] like Figure 2aand Figure 2b As shown, the display panel may further include a plurality of independent and spaced encapsulation parts 21, which are located on the side of the isolation structure layer 15 and the second electrode 18 away from the substrate 11. The orthographic projection of the encapsulation part 21 on the substrate 11 covers the orthographic projection of the isolation opening on the substrate 11. Furthermore, the plurality of light-emitting layers 17 are spaced apart, the plurality of second electrodes 18 are spaced apart, the plurality of encapsulation parts 21 correspond to the plurality of light-emitting layers 17 one by one, and the plurality of encapsulation parts 21 correspond to the plurality of second electrodes 18 one by one.

[0057] The orthographic projection of the encapsulation portion 21 on the substrate 11 does not overlap with the orthographic projection of the hole H on the substrate 11. Exemplarily, the encapsulation portion 21 includes a main body sub-portion 211 and an extension sub-portion 212. The orthographic projection of the main body sub-portion 211 on the substrate 11 covers the orthographic projection of the second electrode 18 on the substrate 11. The extension sub-portion 212 is connected to the main body sub-portion 211, and the extension sub-portion 212 extends from the isolation opening to the side of the isolation structure layer 15 away from the substrate 11.

[0058] According to the display panel provided by this embodiment, the insulating layer covers the signal line, a hole is provided in the insulating layer, the hole exposes part of the signal line, and part of the first electrode is located in the hole and contacts the signal line. By setting the thickness difference between the insulating layer and the signal line to be greater than or equal to 0 micrometers and less than 1 micrometer, the depth of the hole in the insulating layer is reduced, thereby ensuring that the film layer subsequently formed in the hole, such as at least one of the pixel definition layer and the isolation material layer, can have a sufficient film thickness in the hole, and it is not easy to form a cavity, further protecting the first electrode, thereby improving the yield of the display panel.

[0059] In one embodiment, Figure 2b As shown, in the cross-sectional direction perpendicular to the substrate 11, the angle α between the side wall of the hole H and the substrate 11 is greater than 0° and less than or equal to 70°. For example, the angle α between the side wall of the hole H and the substrate 11 is 15°, 25°, 35°, 45°, 55°, 60°, 65°, 70°, etc. Exemplarily, the angle α is greater than or equal to 50° and less than or equal to 70°. The advantage is that a gentle slope is formed on the side wall of the hole H, which reduces the flatness of the film layer on the side wall of the hole H. Further, a smaller angle can provide a larger effective hole area. For example, α is 35°, which can provide better stability of the side wall of the hole H while maintaining a relatively large hole area, and is suitable for a variety of semiconductor devices. A larger angle helps to reduce defects formed during the manufacturing process of the hole H, such as etching pits or side wall roughness. For example, α is 70°, which can provide better smoothness of the side wall of the hole H and reduce manufacturing defects. Setting the angle α to be greater than or equal to 50° and less than or equal to 70° is beneficial to uniform etching and improves the side wall quality.

[0060] In one embodiment, Figure 2bAs shown, the thickness D1 of the insulating layer 13 is greater than 0 microns and less than or equal to 5 microns. For example, the thickness D1 of the insulating layer 13 is 0 microns, 0.5 microns, 2 microns, 3.5 microns, 4 microns, 5 microns, etc. The advantage is that the thickness of the insulating layer 13 is thinner than the conventional thickness, which is conducive to reducing the depth of the hole, thereby ensuring that the pixel definition layer and the isolation structure layer on the side wall of the hole H are thick enough. Furthermore, a thinner insulating layer 13 can further reduce the depth of the hole H, and a thicker insulating layer 13 can further ensure the insulation performance and improve the structural stability of the hole H.

[0061] In one embodiment, Figure 2b As shown, the opening diameter S of the hole H is greater than 3 microns. For example, the opening area S of the hole H is 3.1 microns, 3.3 microns, 3.5 microns, 3.7 microns, 4 microns, etc. The advantage is that the opening area of ​​the hole H is larger than the conventional opening area, which is conducive to the pixel definition layer and the isolation structure layer climbing on the side wall of the hole to avoid the formation of voids.

[0062] Figure 3 The second embodiment of the present application provides Figure 1 The cross-sectional structure diagram of the display panel along line A1A2 is shown. Figure 3 The difference between the display panel shown in FIG. 2 and the display panel shown in FIG. 2 is that in this embodiment, the thickness difference between the insulating layer 13 and the signal line 12 is equal to 0 micrometers, that is, the thickness of the insulating layer 13 and the signal line 12 are equal. The advantage is that the depth of the hole H in the insulating layer 13 is reduced, thereby ensuring that the film layer subsequently formed in the hole H has a sufficient film thickness, and it is not easy to form a cavity, further protecting the first electrode 14, thereby improving the yield of the display panel.

[0063] Figure 4 The third embodiment of the present application provides Figure 1 The cross-sectional structure diagram of the display panel along line A1A2 is shown. Figure 4 The display panel and FIG. 2 are shown Figure 3 The difference between the display panels shown is that, in this embodiment, the lengths of the extending sub-portions 212 in the direction parallel to the substrate 11 are different.

[0064] In one embodiment, the orthographic projection of the partial extension sub-portion 212 on the substrate 11 at least partially overlaps with the orthographic projection of the hole H on the substrate 11. Exemplarily, the orthographic projection of the partial extension sub-portion 212 on the substrate 11 covers the orthographic projection of the hole H on the substrate 11. Alternatively, a portion of the boundary of the orthographic projection of the partial extension sub-portion 212 on the substrate 11 is located within the orthographic projection range of the hole H on the substrate 11. In this case, the encapsulation portion 21 can provide protection for the isolation structure layer 15 in the hole H, thereby further preventing the pixel definition layer 16 and the isolation structure layer 15 in the hole H from being etched and damaged, thereby improving the yield of the display panel.

[0065] In one embodiment, Figure 4 As shown, in the thickness direction of the substrate 11, part of the extended sub-portion 212 and the isolation structure layer 15 are spaced apart, that is, there is a gap between the extended sub-portion 212 in the hole H and the isolation structure layer 15 but they are not in contact, and the extended sub-portion 212 in the hole H is suspended on the side of the isolation structure layer 15 away from the substrate 11.

[0066] Exemplarily, the display panel further includes an organic encapsulation layer 22 located on a side of the encapsulation portion 21 facing away from the substrate 11 ; the organic encapsulation layer 22 partially fills the space between the extension sub-portion 212 and the isolation structure layer 15 .

[0067] Exemplarily, the orthographic projection of the organic encapsulation layer 22 on the substrate 11 covers the orthographic projections of the isolation structure layer 15 and the encapsulation portion 21 on the substrate 11 .

[0068] Exemplarily, the display panel further includes at least one inorganic encapsulation layer 23. At least one inorganic encapsulation layer 23 is located on the side of the organic encapsulation layer 22 away from the substrate 11; and / or, at least one inorganic encapsulation layer 23 is located between the organic encapsulation layer 22 and the encapsulation portion 21. For example, the display panel includes an inorganic encapsulation layer 23, which is located on the side of the organic encapsulation layer 22 away from the substrate, and the orthographic projection of the inorganic encapsulation layer 23 on the substrate 11 covers the orthographic projection of the organic encapsulation layer 22 on the substrate 11. For another example, the display panel includes an inorganic encapsulation layer 23, which is located between the organic encapsulation layer 22 and the encapsulation portion 21. For another example, the display panel includes two inorganic encapsulation layers, one inorganic encapsulation layer is located on the side of the organic encapsulation layer 22 away from the substrate, and the other inorganic encapsulation layer is located between the organic encapsulation layer 22 and the encapsulation portion 21.

[0069] In one embodiment, Figure 4 As shown, the display panel also includes a stacked residual light-emitting layer 31 and / or a residual second electrode 32. The residual light-emitting layer 31 and the residual second electrode 32 are located between the isolation structure layer 15 and the extension sub-portion 212. The residual light-emitting layer 31 is located on the side of the residual second electrode 32 close to the isolation structure layer 15. The orthographic projection of either the residual light-emitting layer 31 or the residual second electrode 32 on the substrate 11 is located between the orthographic projection of the hole H on the substrate 11 and the orthographic projection of the isolation opening on the substrate 11. The residual light-emitting layer 31 and the light-emitting layer 17 are formed by disconnecting the light-emitting material layer prepared by the same film-forming process at the isolation structure layer 15. The residual second electrode 32 and the second electrode 18 are formed by disconnecting the isolation material layer prepared by the same film-forming process at the isolation structure layer 15.

[0070] Figure 5 The fourth embodiment of the present application provides Figure 1 The cross-sectional structure diagram of the display panel along line A1A2 is shown. Figure 5The display panel and Figure 4 The difference between the display panel shown is that, in this embodiment, in the direction from the centroid Q of the isolation opening to the hole H, the edge portion of the orthographic projection of the encapsulation part 21 on the substrate 11 is located within the orthographic projection range of the hole H on the substrate 11, that is, the coverage range of the encapsulation part 21 does not exceed the hole H. This has the advantage of preventing the encapsulation part 21 from having an excessively large suspended area above the isolation structure layer 15, and incomplete filling of the organic encapsulation layer 22, which may cause the encapsulation part 21 to be easily broken, thereby further improving the yield of the display panel.

[0071] It should be noted that the centroid Q of the isolation opening is not a physical structure, but a virtual structure for the convenience of description.

[0072] Figure 6 The fifth embodiment of the present application provides Figure 1 The cross-sectional structure diagram of the display panel along line A1A2 is shown. Figure 6 The display panel and Figure 4 , Figure 5 The difference of the display panel shown is that, in this embodiment, between the isolation opening and the hole H, that is, in the region F, in the thickness direction of the substrate, the isolation structure layer 15 and the encapsulation part 21 are spaced apart, that is, there is no residual light-emitting layer and residual electrode between the isolation structure layer 15 and the encapsulation part 21.

[0073] In some embodiments, the display panel further includes a pixel circuit located between the substrate 11 and the insulating layer 13. The pixel circuit may be a 7T1C pixel circuit, an 8T1C pixel circuit, etc. The electronic components in the pixel circuit are a stacked structure.

[0074] A second aspect of the present application provides another display panel. Figure 1-Figure 6 The display panel shown in any of the figures includes a substrate 11, a signal line 12, at least one insulating layer 13, an isolation structure layer 15 and a packaging part 21. The signal line 12 is located on one side of the substrate 11. The insulating layer 13 is located on the side of the signal line 12 away from the substrate 11. The insulating layer 13 includes a hole H. The isolation structure layer 15 is located on the side of the insulating layer 13 away from the substrate 11, and the orthographic projection of a part of the isolation structure layer 15 on the substrate 11 at least partially overlaps with the orthographic projection of the hole H on the substrate 11. The packaging part 21 is located on the side of the isolation structure layer 15 away from the substrate 11, and the orthographic projection of the packaging part 21 on the substrate 11 and the orthographic projection of the hole H on the substrate 11 at least partially overlap.

[0075] The isolation structure layer 15 includes an isolation opening, and the orthographic projection of the isolation opening on the substrate 11 does not overlap with the orthographic projection of the hole H on the substrate 11 .

[0076] According to the display panel provided in this embodiment, by arranging the orthographic projection of the packaging part 21 on the substrate and the orthographic projection of the hole H on the substrate to at least partially overlap, the packaging part 21 can be used to protect the isolation structure layer 15 in the hole H, and further including the first electrode 14 in the hole H, to prevent the first electrode 14 from being damaged by etching, thereby improving the reliability of the display panel.

[0077] The third aspect of the present application provides another display panel. Figure 1-Figure 6 The display panel shown in any of the figures includes a substrate 11, a signal line 12, an insulating layer 13 and a first electrode 14. The signal line 12 is located on one side of the substrate 11. The insulating layer 13 is located on the side of the signal line 12 away from the substrate 11. The insulating layer 13 includes a hole H. In the cross-sectional direction perpendicular to the substrate 11, the angle between the sidewall of the hole H and the substrate 11 is greater than 0° and less than or equal to 70°. The first electrode 14 is located on the side of the insulating layer 13 away from the substrate 11, and a portion of the first electrode 14 is located in the hole H and contacts the signal line 12.

[0078] In one embodiment, the angle between the sidewall of the hole H and the substrate 11 is greater than or equal to 50° and less than or equal to 70°. Exemplarily, the angle is any one of 53°, 55°, 58°, 60°, 63°, and 65°.

[0079] According to the display panel provided by this embodiment, the insulating layer covers the signal line, a hole is provided in the insulating layer, and part of the first electrode is located in the hole and contacts the signal line. By setting the angle between the side wall of the hole H and the substrate 11 to be greater than 0° and less than or equal to 70°, the slope of the side wall of the hole in the insulating layer is reduced, thereby ensuring that the film layer subsequently formed in the hole, such as at least one of the pixel definition layer and the isolation material layer, can have a sufficient film thickness on the side wall of the hole, and it is not easy to form a cavity, further protecting the first electrode, thereby improving the yield of the display panel.

[0080] A fourth aspect of the present application provides a display device. Figure 7 This is a schematic diagram of the structure of a display device provided in one embodiment of the present application. Figure 7 As shown, the display device 700 includes the display panel provided by any of the above embodiments.

[0081] The display device 700 is a product with an image display function. For example, the display device 700 can be used to display static images, such as pictures or photos. The display device 700 can also be used to display dynamic images, such as videos. In addition, the display device 700 can also have functions such as taking pictures, recording videos, fingerprint recognition, and face recognition. Accordingly, the display device 700 also includes at least one functional module for realizing the above functions, such as an under-screen camera, an under-screen fingerprint recognition sensor, etc.

[0082] The display device 700 may be a laptop computer, a mobile phone, a handheld or portable computer, a camera, a camcorder, a vehicle-mounted smart central control screen, a calculator, a smart watch, a GPS navigator, an electronic photo, an electronic billboard or sign, a projector, etc.

[0083] The basic principles of the present application are described above in conjunction with specific embodiments. However, it should be noted that the advantages, strengths, effects, etc. mentioned in the present application are only examples and not limitations, and it cannot be considered that these advantages, strengths, effects, etc. are required by each embodiment of the present application. In addition, the specific details disclosed above are only for the purpose of illustration and ease of understanding, not for limitation, and the above details do not limit the present application to being implemented by adopting the above specific details.

[0084] The above description has been given for the purpose of illustration and description. In addition, this description is not intended to limit the embodiments of the present application to the forms disclosed herein. Although multiple example aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, changes, additions and sub-combinations thereof.

Claims

1. A display panel, characterized in that: include: substrate; A signal line, located at one side of the substrate; at least one insulating layer, located on a side of the signal line facing away from the substrate, the insulating layer comprising a hole; as well as A first electrode is located on a side of the insulating layer away from the substrate, and the first electrode is in contact with the signal line through the hole; Wherein, in a cross-sectional direction perpendicular to the substrate, a distance between the first electrode and the signal line is 0-5 um.

2. The display panel according to claim 1, characterized in that: The difference in thickness between the insulating layer and the signal line is greater than or equal to 0 micrometer and less than 1 micrometer; Preferably, the thickness difference between the insulating layer and the signal line is greater than or equal to 0.2 micrometers and less than or equal to 0.7 micrometers; Preferably, the thickness difference between the insulating layer and the signal line is 0.3 micrometer or 0.5 micrometer.

3. The display panel according to claim 1, characterized in that: In a cross-sectional direction perpendicular to the substrate, an angle between the hole sidewall and the substrate is greater than 0° and less than or equal to 70°; Preferably, the angle is greater than or equal to 50° and less than or equal to 70°.

4. The display panel according to claim 1, characterized in that: The thickness of the insulating layer is greater than 0 micrometer and less than or equal to 5 micrometers; Preferably, at least one of the insulating layers comprises a plurality of insulating layers stacked in a direction away from the substrate; Preferably, the insulating layer includes a planarization layer.

5. The display panel according to claim 1, characterized in that: The opening diameter of the pores is greater than 3 micrometers.

6. The display panel according to claim 1, characterized in that: It also includes an isolation structure layer disposed on one side of the substrate, wherein the orthographic projection of the hole on the substrate at least partially overlaps with the orthographic projection of the isolation structure layer on the substrate; Preferably, the portion of the first electrode located in the hole encloses a first groove, and the opening of the first groove is located on a side of the first electrode away from the substrate; Preferably, a portion of the isolation structure layer located in the first groove encloses a second groove, and an opening of the second groove is located on a side of the isolation structure layer facing away from the substrate.

7. The display panel according to claim 6, characterized in that: The isolation structure layer includes an isolation opening, an orthographic projection of the isolation opening on the substrate and an orthographic projection of the hole on the substrate do not overlap, and the isolation opening exposes a portion of the first electrode.

8. The display panel according to claim 7, characterized in that: It also includes a light-emitting layer and a second electrode sequentially stacked on a side of the first electrode facing away from the substrate; Preferably, the second electrode and the isolation structure layer are overlapped.

9. The display panel according to claim 8, characterized in that: It also includes a packaging portion, which is located on the side of the isolation structure layer and the second electrode away from the substrate; the packaging portion includes a main body sub-portion and an extension sub-portion; the orthographic projection of the main body sub-portion on the substrate covers the orthographic projection of the second electrode on the substrate, and the extension sub-portion is connected to the main body sub-portion and extends from the isolation opening to the side of the isolation structure layer away from the substrate; Preferably, in a direction parallel to the substrate, the lengths of the extension sub-portions are different; Preferably, an orthographic projection of a portion of the extension sub-portion on the substrate at least partially overlaps with an orthographic projection of the hole on the substrate; Preferably, the orthographic projection of part of the extending sub-portion on the substrate covers the orthographic projection of the hole on the substrate; Alternatively, part of the boundary of the orthographic projection of part of the extending sub-portion on the substrate is located within the range of the orthographic projection of the hole on the substrate.

10. The display panel according to claim 9, characterized in that: In the thickness direction of the substrate, part of the extension sub-portion and the isolation structure layer are arranged at intervals; Preferably, the display panel further comprises an organic encapsulation layer, which is located on a side of the encapsulation portion away from the substrate; the organic encapsulation layer partially fills the gap between the extension sub-portion and the isolation structure layer; Preferably, the orthographic projection of the organic encapsulation layer on the substrate covers the orthographic projections of the isolation structure layer and the encapsulation part on the substrate respectively; Preferably, the display panel further comprises an inorganic encapsulation layer, which is located on a side of the organic encapsulation layer away from the substrate; The orthographic projection of the inorganic encapsulation layer on the substrate covers the orthographic projection of the organic encapsulation layer on the substrate.

11. The display panel according to claim 9, characterized in that: Also included is a stacked residual light-emitting layer and / or a residual second electrode, located between the isolation structure layer and the extension sub-portion; Preferably, the light-emitting layer and the residual light-emitting layer, the second electrode and the residual second electrode are disconnected at the isolation structure layer, respectively.

12. The display panel according to claim 8, characterized in that: It also includes a pixel definition layer, which is located on a side of the isolation structure layer close to the substrate, and a portion of the pixel definition layer is located in the hole; Preferably, the orthographic projection of the isolation structure layer on the substrate is located within the orthographic projection range of the pixel definition layer on the substrate; Preferably, the pixel definition layer encloses a pixel opening, and the orthographic projection of the pixel opening on the substrate is located within the orthographic projection range of the isolation opening on the substrate.

13. The display panel according to claim 6, characterized in that: The isolation structure layer comprises a first portion and a second portion stacked together, wherein the first portion is located on a side of the second portion close to the substrate, and the second portion protrudes from a side of the first portion; Preferably, the isolation structure layer further includes a third portion, which is located on a side of the first portion away from the second portion, and an orthographic projection of the first portion on the substrate is located within the orthographic projection range of the third portion on the substrate; Preferably, the first portion includes a conductive portion.

14. A display panel, characterized in that: include: substrate; A signal line, located at one side of the substrate; at least one insulating layer, located on a side of the signal line facing away from the substrate, the insulating layer comprising a hole; An isolation structure layer, located on a side of the insulating layer away from the substrate, wherein a part of the orthographic projection of the isolation structure layer on the substrate at least partially overlaps with a part of the orthographic projection of the hole on the substrate; The encapsulation portion is located on a side of the isolation structure layer facing away from the substrate, and the orthographic projection of the encapsulation portion on the substrate and the orthographic projection of the hole on the substrate at least partially overlap.

15. A display panel, characterized in that: include: substrate; A signal line, located at one side of the substrate; an insulating layer, located on a side of the signal line away from the substrate, the insulating layer comprising a hole, wherein in a cross-sectional direction perpendicular to the substrate, an angle between a side wall of the hole and the substrate is greater than 0° and less than or equal to 70°; as well as The first electrode is located at a side of the insulating layer away from the substrate, and a portion of the first electrode contacts the signal line through the hole.

16. The display panel according to claim 15, characterized in that: The angle is greater than or equal to 50° and less than or equal to 70°; Preferably, the angle is any one of 53°, 55°, 58°, 60°, 63°, and 65°.

17. A display device, characterized in that: A display panel comprising any one of claims 1-16.

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