High-hardness anti-dazzle antibacterial glass combining uniform micro-nano structure design and dehydration condensation chemical reaction and ARAFAGAM process of high-hardness anti-dazzle antibacterial glass

Abstract

The invention relates to the technical field of glass cover plate coating, in particular to high-hardness anti-dazzle antibacterial glass combining uniform micro-nano structure design and dehydration condensation chemical reaction and an ARAFAGAM technology of the high-hardness anti-dazzle antibacterial glass. The surface of a glass substrate is sequentially covered with a double-layer TiO2 film layer, an etching layer, an antibacterial layer and an MgF2 film layer from inside to outside. Compared with the prior art, the technology for transforming the AR coating technology is combined with the AF technology, the AG technology and the AM technology, so that the hardness after the AR technology is remarkably improved, and the glass which is excellent in hardness and wear resistance, oleophobic, hydrophobic, oil-stain-resistant, fingerprint-resistant, anti-dazzle and antibacterial is prepared by combining the technology with other technologies. Meanwhile, the 4A process is combined, so that multiple properties coexist.

Description

Technical Field

[0001] The present application relates to the technical field of glass cover coating, and in particular to a high-hardness anti-glare antibacterial glass and its ARAFAGAM process which utilizes a uniform micro-nano structure design combined with a dehydration condensation chemical reaction. Background Art

[0002] AR (Anti-Reflection) glass is anti-reflective glass. By applying an optical coating on one or both sides of the glass, its reflectivity can be reduced and its transmittance increased. The maximum transmittance can be increased to more than 99% and the reflectivity to less than 1%. By increasing the transmittance of the glass, the content of the display screen is clearer. The AR process can be realized by magnetron sputtering or thermal evaporation technology, usually using two materials with high and low refractive indices to cross-stack. AF (Anti-Fingerprint) glass is anti-fouling and anti-fingerprint glass. AF anti-fouling and anti-fingerprint glass is based on the lotus leaf principle. A layer of nanochemical material is coated on the outer surface of the glass to reduce the surface tension of the glass to the minimum, and the contact area between dust and the glass surface is reduced by 90%, making it have strong hydrophobic, anti-oil and anti-fingerprint capabilities; so that the video glass panel can maintain a smooth and bright effect for a long time. The process is realized by vacuum evaporating a layer of AF material on the glass or by PVD process to improve its wear resistance. The disadvantage of the traditional AR process is that the hardness is not improved enough, and the anti-oil and anti-fingerprint capabilities are not strong. However, the products manufactured by the traditional AF process do not have enough reflectivity. AM technology (Anti-Microbial) is an antibacterial technology that aims to inhibit or kill bacteria through different mechanisms and methods, thereby achieving the purpose of preventing and treating bacteria. Summary of the invention

[0003] The technical problem solved by the present invention is to provide a high-hardness anti-glare antibacterial glass and its ARAFAGAM process which utilizes a uniform micro-nano structure design and a dehydration condensation chemical reaction to solve the problems mentioned in the above-mentioned background technology.

[0004] The manufacturing method of glass coating provided by the present invention grows a layer of TiO2 film on the bottom surface of the glass by thermal evaporation, and then grows another layer of TiO2 film after polishing by HF etching, and then realizes AG etching by spraying frosting liquid on the other side of the glass, forms an antibacterial film by spraying antibacterial liquid on the surface of the uniform micro-nano structure, and then evaporates a layer of MgF2 material by magnetron sputtering, and combines the two layers of film together by dehydration condensation reaction. Furthermore, in the manufacturing method of the above-mentioned high-performance glass, the glass is cut, edged, and cleaned before thermal evaporation.

[0005] Furthermore, in the above-mentioned method for manufacturing high-performance glass, before thermal evaporation, vacuum is first performed for about an hour to reduce the pressure to the pressure required for the experiment.

[0006] Furthermore, the manufacturing method of the high-performance glass mentioned above manufactures the first layer of the high-performance glass by using TiO2 pellets for evaporation. The thermal evaporation rate is stabilized at about 0.2A / s by adjusting the power, and the pre-evaporation is performed for fifteen minutes.

[0007] Furthermore, in the method for manufacturing the high-performance glass, after the pre-evaporation is completed, the evaporation rate is maintained at the same rate as the pre-evaporation, and a 25-30 nm TiO2 film layer is evaporated on the glass using TiO2 pills.

[0008] Furthermore, in the manufacturing method of the high-performance glass, after the evaporation is completed, the surface just coated is immersed in 24% HF, and the etching time is about 1.5 minutes.

[0009] Furthermore, in the method for manufacturing the high-performance glass, the etched glass is placed in cold water.

[0010] Furthermore, the manufacturing method of the high-performance glass mentioned above repeats the above work, re-evacuates the glass and then evaporates a 25-30nm TiO2 film layer on the glass just etched at the same power and for the same time.

[0011] Furthermore, in the manufacturing method of the high-performance glass, 5.5g CaF2, 9.5g Na2SiF6, 145g NH4HF2, 9g CaSO4, 9.5g NH4HSO4 and 5g suspending agent are used to prepare the frosting liquid required for anti-glare, and the aging time of the frosting liquid is 6h.

[0012] Furthermore, in the manufacturing method of the high-performance glass, the prepared frosting liquid is sprayed on the side of the glass without coating, the frosting time of the panel is 8 minutes, and the etching is 10-15nm.

[0013] Furthermore, the manufacturing method of the high-performance glass described above uses alcohol ether solvent, silicon oxide compound and antibacterial material to prepare an antibacterial liquid, wherein the silicon oxide compound in the antibacterial liquid includes vinyl silicon oxide compound, and the antibacterial material includes organic antibacterial additive and inorganic antibacterial additive, the weight percentage of alcohol ether solvent is 60% to 90%, the weight percentage of the silicon oxide compound is 3% to 15%, and the weight percentage of the antibacterial material is 7% to 25%, wherein the weight percentage of the organic antibacterial additive is 1% to 12% of the whole, and the weight percentage of the inorganic antibacterial additive is 6% to 13% of the whole. Furthermore, the silicon oxide compound also includes epoxy silicon oxide compound, and the weight ratio of the vinyl silicon oxide compound to the epoxy silicon oxide compound is 1:0.4 to 1:2.5. The organic antibacterial additive is vanillin, and the inorganic antibacterial additive is metal nano ions with an antibacterial effective amount, and the metal nano ions are selected from the group consisting of silver ions, copper ions and zinc ions. The alcohol ether solvent includes propylene glycol methyl ether and ethylene glycol methyl ether, and the boiling point of the alcohol ether solvent is higher than 90° C. The antibacterial layer is attached to the surface of the etching layer by one of evaporation, sputtering, printing or spraying, and the thickness of the antibacterial layer ranges from 30 to 40 nm.

[0014] Furthermore, in the manufacturing method of the high-performance glass, radio frequency magnetron sputtering technology is used on the side sprayed with the antibacterial liquid, and the gas introduced is pure argon gas. Before magnetron sputtering, the glass is first evacuated to the pressure required for the experiment.

[0015] Furthermore, the above-mentioned method for manufacturing high-performance glass uses a MgF2 target material with a target power of 50W and pre-sputtering for 15 minutes.

[0016] Furthermore, in the method for manufacturing the high-performance glass, the sputtering power is maintained the same as that of the pre-sputtering, the sputtering is performed for 15 minutes, the pure argon gas is maintained, and the MgF2 film layer is sputtered to a thickness of 12 to 18 nm. Beneficial effects: Compared with the prior art, the invention provides a new process that transforms the AR coating process and combines it with the AF, AG, and AM processes, which significantly improves the hardness after the AR process, and combines it with other processes to prepare glass with excellent hardness and wear resistance, and is oleophobic, hydrophobic, anti-greasy, anti-fingerprint, anti-glare, and antibacterial. The overall hardness of the glass is improved, and multiple properties are achieved by combining the 4A process. It can be used for conventional and high-demand products, has a wider range of applications, and is more suitable for industrial production. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 The structural diagram of the glass cover plate of the present invention is In the figure, 1 is the antibacterial MgF2 film layer, 2 is the etching layer, 3 is the glass layer, 4 is the TiO2 film layer after etching, and 5 is the TiO2 film layer.

Claims

1. A high-hardness anti-glare antibacterial glass cover plate and its ARAFAGAM process using a combination of uniform micro-nano structure design and dehydration condensation chemical reaction, characterized in that: The invention comprises a glass substrate and a functional layer covering the surface of the glass substrate, wherein the functional layer comprises a double-layer TiO2 film layer, an etching layer, an antibacterial layer and a MgF2 film layer, and the double-layer TiO2 film layer, the etching layer, the antibacterial layer and the MgF2 film layer are alternately covered on the surface of the glass substrate from the inside to the outside.

2. According to claim 1, a high-hardness anti-glare antibacterial glass cover plate and its ARAFAGAM process using a combination of uniform micro-nano structure design and dehydration condensation chemical reaction, characterized in that: The TiO2 film has two layers, while the other films have only one layer.

3. The high-hardness anti-glare antibacterial glass cover and its ARAFAGAM process using a combination of uniform micro-nano structure design and dehydration condensation chemical reaction according to claim 1, characterized in that: The thickness of the TiO2 film layer is 25-30 nm.

4. According to claim 1, a high-hardness anti-glare antibacterial glass cover plate and its ARAFAGAM process using a combination of uniform micro-nano structure design and dehydration condensation chemical reaction, characterized in that: The thickness of the etching layer is 10-15 nm, the thickness of the antibacterial layer is 30-40 nm, and the thickness of the MgF2 film layer is 12-18 nm.

5. According to claim 1, a high-hardness anti-glare antibacterial glass cover plate and its ARAFAGAM process using a combination of uniform micro-nano structure design and dehydration condensation chemical reaction, characterized in that: The molecules of the antibacterial layer and the MgF2 film layer described in claim 5 and claim 6 are dehydrated and condensed to generate siloxane bonds (-Si-O-Si-).

6. An AR coating process for producing the double-layer TiO2 film of claim 3, characterized in that: The following steps are involved: Select a glass substrate and cut the glass substrate into a specified size; Put the glass substrate into the cleaning chamber and clean the glass substrate with deionized water; The cleaned glass substrate is sent into a vacuum drying oven for drying; Place the glass substrate into the chamber of the thermal evaporation equipment and perform vacuum treatment with a vacuum degree of 5.0E. -4 pa, the TiO2 pellets were placed in the pellet evaporation boat, the thermal evaporation rate was stabilized at about 0.2A / S, and the pre-evaporation was performed for 15 minutes. After the pre-evaporation was completed, the same evaporation rate as the pre-evaporation was maintained to evaporate a 25-30nm TiO2 film on the glass substrate; After the evaporation is completed, the coated side is immersed in 24% HF, and the etching time is about 1.5 minutes; After etching is completed, place the etched glass in cold water; Repeat the thermal evaporation process, re-evacuate the glass and evaporate a 25~30nm TiO2 film at the same power and time on the etched glass.

7. An AG coating process for producing the etching layer of claim 4, characterized in that: The following steps are involved: The frosting liquid required for anti-glare is prepared with 5.5g CaF2, 9.5g Na2SiF6, 145g NH4HF2, 9g CaSO4, 9.5g NH4HSO4 and 5g suspending agent. The aging time of the frosting liquid is 6h. Spray the prepared frosting liquid on the uncoated side of the glass, and the frosting time of the panel is 8 minutes; An etching layer formed by an etching solution is formed on the TiO2 film layer, and the thickness of the etching layer is 10-15 nm.

8. An AM antibacterial process for producing the antibacterial layer of claim 4, characterized in that: The following steps are involved: An antibacterial liquid is prepared by using alcohol ether solvent, silicon oxide compound and antibacterial material, wherein the silicon oxide compound in the antibacterial liquid includes vinyl silicon oxide compound, and the antibacterial material includes organic antibacterial additive and inorganic antibacterial additive, the weight percentage of alcohol ether solvent is 60% to 90%, the weight percentage of the silicon oxide compound is 3% to 15%, and the weight percentage of the antibacterial material is 7% to 25%, wherein the weight percentage of the organic antibacterial additive is 1% to 12% of the whole, and the weight percentage of the inorganic antibacterial additive is 6% to 13% of the whole. Further, the silicon oxide compound also includes epoxy silicon oxide compound, and the weight ratio of the vinyl silicon oxide compound to the epoxy silicon oxide compound is 1:0.4 to 1:2.

5. The organic antibacterial additive is vanillin, and the inorganic antibacterial additive is metal nano ions with an antibacterial effective amount, and the metal nano ions are selected from the group consisting of silver ions, copper ions and zinc ions. The alcohol ether solvents include propylene glycol methyl ether and ethylene glycol methyl ether, and the boiling point of the alcohol ether solvent is higher than 90°C. The antibacterial layer is attached to the surface of the etching layer by evaporation, sputtering, printing or spraying, and the thickness of the antibacterial layer ranges from 30 to 40 nm.

9. An AF coating process for producing the MgF2 film of claim 5, characterized in that: The following steps are involved: Place it in the chamber of the magnetron sputtering equipment, perform magnetron sputtering on the frosted glass cover, and perform vacuum treatment with a vacuum degree of 8.0E -4 pa, using MgF2 target as target material, the Ar flow rate is 220sccm, the sputtering power is 50W, pre-sputtering for 15min, and sputtering for 15min while maintaining the same sputtering power as pre-sputtering, with a thickness of 12~18nm, to plate a MgF2 film on the antibacterial layer; The glass carrier is placed in an environment of at least 180° C. and baked for 60 minutes to remove the alcohol ether solvent of the antibacterial liquid, thereby making the antibacterial film non-toxic and biocompatible.

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