Multi-arc ion plating cathode device and multi-arc ion plating method

Abstract

The invention discloses a multi-arc ion plating cathode device which comprises an arc cathode mounting seat, and the arc cathode mounting seat comprises a first side and a second side opposite to the first side; the first side is used for mounting and supporting a target material; the arc striking needle is mounted on the arc cathode mounting seat and extends out of the first side of the arc cathode mounting seat, and a gap is formed between the arc striking needle and the target material mounted and supported on the first side; the adjustable magnet group is mounted on the second side of the arc cathode mounting seat, the adjustable magnet group comprises a permanent magnet, a coaxial electromagnetic coil, a yoke and an electromagnetic coil power supply, and the electromagnetic coil power supply is electrically connected to the input end and the output end of the coaxial electromagnetic coil; the arc power supply is electrically connected to the arc cathode mounting seat and the arc striking needle; according to the technical scheme, the technical problem that an existing cathode is difficult to strike an arc on a diamagnetic target or is difficult to maintain after arc striking can be effectively solved.

Description

Technical Field

[0001] The invention relates to the technical field of cold field induced arc discharge, in particular to a multi-arc ion plating cathode device and a multi-arc ion plating method. Background Art

[0002] DMMattox first invented ion plating technology in 1963, referred to as ion plating (Ion Plating). Arc Ion Plating technology is a development form of ion plating technology, which was gradually developed and improved in the later period; specifically, the cathode of Arc Ion Plating refers to the arc target, which is a key component in the coating process. After years of research and exploration, the cathode of this technology mainly participates in the following processes: free arc → permanent magnetic field controls arc spot movement → increases coaxial electromagnetic field to control and accelerate arc spot movement → electromagnetic coil deflection magnetic filtration.

[0003] At present, this technology has shown its wide application value in the fields of tools, molds and important equipment parts. Through cathodic arc ion plating technology, various types of film layers can be deposited on these key components to give them specific properties and functions.

[0004] The deposition of hard film layers can significantly improve the hardness and wear resistance of tools, molds and equipment parts, making them more durable in harsh working environments and extending their service life. The formation of heat-resistant film layers can enhance the stability and reliability of parts under high temperature conditions and prevent performance degradation or damage caused by high temperature. The addition of decorative film layers can not only beautify the appearance of the product, but also play a certain protective role.

[0005] In cathodic arc ion plating technology, the selection of target material is crucial. Target materials such as titanium, chromium, titanium aluminum, chromium aluminum, nickel-based alloys, and cobalt-based alloys are widely used in this technology. These targets have their own unique physical and chemical properties and can meet the needs of different application scenarios. For example, titanium targets can form a film layer with high hardness and corrosion resistance; chromium targets have good wear resistance and oxidation resistance.

[0006] However, when the target material is high-purity copper (or other diamagnetic target materials), the existing technology faces some challenges. Due to the characteristics of diamagnetic target materials such as copper, existing cathodes have difficulties in arc initiation and arc maintenance. Because copper is diamagnetic, the magnetic field generated by traditional cathodes is not concentrated and has low intensity, making it difficult to initiate an arc on these diamagnetic target materials. Even if the arc is initiated successfully by chance, the temperature of the target material at the strong magnetic point will rise, and the arc will soon go out and cannot be maintained.

[0007] This makes the existing technology unable to be used for copper plating normally, limiting the application of this technology in certain specific fields. In order to solve this problem, it is necessary to further research and develop new cathode structures or arc starting methods to achieve effective coating of diamagnetic targets such as high-purity copper. This will provide new opportunities for expanding the application scope of cathode arc ion plating technology and bring new possibilities for the development of related industries. Summary of the invention

[0008] In view of the above technical problems, the present invention proposes a multi-arc ion plating cathode device and a multi-arc ion plating method, which can effectively solve the technical problems that the existing cathode is difficult to strike an arc with an antimagnetic target material or difficult to maintain the arc after striking.

[0009] The technical solution used in the present invention is: a multi-arc ion plating cathode device, characterized in that it includes an arc cathode mounting seat, the arc cathode mounting seat includes a first side and a second side arranged opposite to the first side; the first side is used to install and support a target material; an arc-starting needle, which is installed on the arc cathode mounting seat and extends out of the first side of the arc cathode mounting seat, and there is a gap between the arc-starting needle and the target material installed and supported by the first side; an adjustable magnet group, which is installed on the second side of the arc cathode mounting seat, and the adjustable magnet group includes a permanent magnet, a coaxial electromagnetic coil, a yoke iron and an electromagnetic coil power supply, and the electromagnetic coil power supply is electrically connected to the input end and the output end of the coaxial electromagnetic coil; an arc power supply, which is electrically connected to the arc cathode mounting seat and the arc-starting needle.

[0010] Furthermore, the adjustable magnet group also includes an electromagnetic coil bracket, which is circumferentially arranged around the permanent magnet and has an opening that leaks out the two poles of the permanent magnet. The coaxial electromagnetic coil is wound on the electromagnetic coil bracket, and the yoke is fixedly arranged at the opening of the electromagnetic coil bracket on the side of the arc cathode mounting seat.

[0011] Furthermore, the electromagnetic coil support includes a first contact surface that contacts the second side of the arc cathode mounting seat, and the yoke is installed in the opening of the electromagnetic coil support in an embedded manner to expose a second contact surface that contacts the second side of the arc cathode mounting seat, and the first contact surface is flush with the second contact surface.

[0012] Furthermore, the N pole of the permanent magnet is close to the second side of the arc cathode mounting seat, and the permanent magnet is adsorbed on the yoke according to the direction of the magnetic field.

[0013] Furthermore, at least part of the target material mounting area of ​​the arc cathode mounting seat has a mounting groove, and the multi-arc ion plating cathode device also includes a cooling water channel, which is arranged in the mounting groove so that the cooling water channel contacts and cools the target material, and a first sealing portion is arranged in the side mounting gap between the cooling water channel and the mounting groove.

[0014] Furthermore, it also includes a shielding cover and a target material clamping strip; the shielding cover and the target material clamping strip are arranged around the target material installation area, the target material clamping strip has a clamping recess, the clamping recess is used to cooperate with the installation of the target material, and the shielding cover is pressed on the upper surface of the target material clamping strip.

[0015] Furthermore, an insulating layer is provided on the first side of the arc cathode mounting seat, a first mounting portion is provided around the shielding cover on a side of the insulating layer close to the arc striking needle, and a second sealing portion is installed in the first mounting portion; a second mounting portion is provided around the shielding cover on a side of the insulating layer away from the arc striking needle or the insulating layer contact surface of the arc cathode mounting seat, and a third sealing portion is installed in the second mounting portion.

[0016] Furthermore, the height of the insulating layer is lower than the height of the shielding cover and higher than the height of the target material pressing strip.

[0017] Furthermore, the arc-starting needle is mounted on the arc cathode mounting seat through an arc-starting needle mounting seat, the insulating layer has a mounting hole, the arc-starting needle mounting seat extends out of the insulating layer through the mounting hole, and the arc power supply is electrically connected to the arc-starting needle mounting seat.

[0018] According to another aspect of the present invention, a multi-arc ion plating method is also proposed, which is applied to the above-mentioned multi-arc ion plating cathode device, including adjusting the current of the electromagnetic coil power supply to be controlled at (2-20)A; turning on the arc power supply and setting the current to be between (200-400)A; controlling the arc starting needle to successfully start the arc, increasing the current of the electromagnetic coil power supply; and increasing the working voltage and working current of the arc power supply.

[0019] In the present invention, by cleverly adding a yoke structure to the adjustable magnet group, this measure brings about a significant change in the magnetic field generated by the cathode device; under the action of the yoke, the distribution of the cathode magnetic field undergoes a fundamental change, thereby forming a concentrated unique magnetic field; this carefully designed magnetic field creates favorable conditions for the arc striking process, and after the arc striking is successful, the arc spot can move stably in the target material magnetic field area; by adjusting the current of the electromagnetic coil power supply and the working voltage and working current of the power supply, the magnetic field component and the ablation speed can be flexibly controlled. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1Schematic diagram of cathode magnetic field distribution in the prior art.

[0021] Figure 2 This is a schematic diagram of the cathode structure provided by the present invention.

[0022] Figure 3 This is a structural diagram of the adjustable magnet group in the cathode structure provided by the present invention.

[0023] Figure 4 This is a schematic diagram of the cathode magnetic field provided by the present invention.

[0024] Figure numerals: 11-first magnetic flux line; 12-first target material; 13-first coaxial electromagnetic coil; 14-first permanent magnet; 2-cathode device; 22-insulating layer; 23-arc cathode mounting seat; 24-target material clamping strip; 241-clamping recess; 25-cooling water flow channel; 26-adjustable magnet group; 261-electromagnetic coil support; 262-permanent magnet; 263-coaxial electromagnetic coil; 264-electromagnetic coil power supply; 265-yoke; 27-target material; 281-first sealing part; 282-second sealing part; 283-third sealing part; 29-arc power supply; 210-arcing needle resistance; 211-arcing needle; 212-arcing needle mounting seat; 213-magnetic flux line; 214-arc spot moving trajectory; 215-cathode emission electron trajectory; 216-target ablation area; 217-arc spot; 218-shielding cover; 3-anode. DETAILED DESCRIPTION

[0025] The present application will be described in detail below with reference to the accompanying drawings and in combination with embodiments. It should be noted that the embodiments and features in the embodiments of the present application can be combined with each other without conflict.

[0026] The following will be combined with the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0027] Those skilled in the art should understand that, in the disclosure of the present invention, the orientation or position relationship indicated by the terms "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc. are based on the orientation or position relationship shown in the drawings, which are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, the above terms should not be understood as limiting the present invention.

[0028] The present invention will be specifically described below in conjunction with the accompanying drawings:

[0029] like Figure 1 As shown, it is a cathode device used in the current market. A first coaxial electromagnetic coil 13 is wound around the circumference of the first permanent magnet 14, which generates a diffuse first magnetic flux line 11 upward; the first magnetic flux line 11 passes through a first target material 12 arranged above the first permanent magnet 14, and it mainly presents the following characteristics:

[0030] First, in terms of magnetic field types, there are currently two main forms: "single permanent magnet front and back adjustment" and "permanent magnet front and back adjustment + coaxial electromagnetic coil". As introduced in "Modern Plasma Coating Technology", these two magnetic field forms occupy a dominant position in the current market. They provide the necessary magnetic field environment for the operation of the cathode device through different magnetic field adjustment methods.

[0031] Secondly, the intensity of the horizontal magnetic field component on the target surface is usually in the range of 2-5 mT. This intensity range affects the performance of the cathode device to a certain extent. The appropriate magnetic field intensity can ensure that the cathode device reaches a relatively ideal working state during operation.

[0032] Third, from the distribution of magnetic induction lines, it appears to be diffuse, such as Figure 1 As shown. The cathode used in the prior art has a series of problems due to the distribution and strength of the magnetic field. First, it performs poorly in arc initiation and cannot be properly initiated. Even if the arc is initiated successfully by chance, it is difficult to maintain for a long time. This is mainly because copper has anti-magnetism, which makes the traditional cathode face great difficulties in the arc initiation process. Once the arc is initiated successfully by chance, the anti-magnetic material will show magnetism opposite to the direction of the magnetic field under the action of a strong magnetic field, resulting in a local temperature increase on the surface of the target material. Specifically, the anti-magnetic material will be subjected to a force opposite to the direction of the magnetic field in a strong magnetic field, which will cause the arc spot on the surface of the target material to move unevenly, aggravate the local overheating phenomenon, and thus affect the quality and uniformity of the coating. The temperature of the target material at the strong magnetic point will rise rapidly, causing the arc light to extinguish quickly and unable to maintain a stable working state. This is because the increase in the temperature of the target material at the strong magnetic point will change the stability of the arc, thereby affecting the maintenance of the arc. Specifically, the increase in the temperature of the target material at the strong magnetic point will cause the arc discharge characteristics to change, thereby affecting the stability of the arc, and may cause the arc to extinguish or become unstable. This situation greatly limits the practical application effect of the cathode device.

[0033] In patent CN 110042349 A, the principle is the same as that of the existing circular multi-arc ion plating. Its innovation lies in: compared with the fixed magnetic field of the traditional circular multi-arc ion plating, it realizes the movement of the strong magnetic point position on the target surface by controlling and adjusting the operation of multiple electromagnets evenly arranged on the back of the multi-arc cathode rectangular target, so that the arc position on the target surface moves with the movement of the strong magnetic point on the target surface. Its disadvantages are: 1. The number of electromagnets required is large, the mechanical structure is complex, and the manufacturing cost is high; 2. Because it is necessary to control the continuous changes of the currents of multiple magnets, its control system is complex, the control accuracy requirements are high, and the cost of the control part is high; 3. Because copper has anti-magnetism, successful arcing requires a magnetic field of a certain strength, and the volume of the electromagnet is generally large, occupying a certain space. This patented technology can extend the arcing time to a certain extent. In actual application, in order to meet the requirements of successful arcing, the electromagnet occupies a large space, and the target area of ​​multiple point arcing is very large. After the arc light is extinguished, multiple pits are etched on the target. Theoretically, as long as the target material is infinite and there are enough electromagnets, the arc striking time required for industrial applications can be achieved by constantly changing the strong magnetic point. However, due to the limitations of space and manufacturing costs, cathode arc ion plating cannot be realized industrially on antimagnetic materials such as high-strength copper.

[0034] like Figure 2-3 As shown, it is a schematic diagram of the cathode structure provided by the present invention, the cathode device 2 includes an arc cathode mounting seat 23, the arc cathode mounting seat 23 includes a first side and a second side arranged opposite to the first side; the first side is used to install and support the target material 27; the cathode device 2 also includes an arc-starting needle 211, the arc-starting needle 211 is installed on the arc cathode mounting seat 23 through the arc-starting needle mounting seat 212 and extends out of the first side of the arc cathode mounting seat, and there is a gap between the arc-starting needle 211 and the target material 27 installed and supported by the first side; the cathode device 2 also includes an adjustable magnet group 26, the adjustable magnet group 26 is installed on the arc On the second side of the cathode mounting seat 26, the adjustable magnet group 26 includes a permanent magnet 262, a coaxial electromagnetic coil 263, a yoke 265 and an electromagnetic coil power supply 264, and the electromagnetic coil power supply 264 is electrically connected to the input end and the output end of the coaxial electromagnetic coil 263; in the embodiment of the present application, the input end and the output end of the coaxial electromagnetic coil 263 are respectively the winding starting point and the end point of the coaxial electromagnetic coil 263; the cathode device 2 also includes an arc power supply 29, and the arc power supply 29 is connected to the arc cathode mounting seat 23 and the arc starting needle 211 or the arc starting needle mounting seat 212 to form an electrical circuit.

[0035] In the embodiment of the present application, the cathode device 2 (multi-arc ion plating cathode device) plays a vital role in the fields of plasma plating and the like. Among them, the arc cathode mounting seat 23, as one of the key components, has a stable structure and clear functional divisions. Its first side is carefully designed to install and strongly support the target material 27, ensuring that the target material can maintain a stable position during operation, providing a reliable material basis for the coating process.

[0036] The arc-starting needle 211 plays a key role in initiating the arc in the entire device. It is movably mounted on the arc cathode mounting seat 23 through the arc-starting needle mounting seat 212. For example, the arc-starting needle mounting seat 212 is connected to a cylinder and an electromagnetic drive mechanical mechanism, and accurately extends out of the first side of the arc cathode mounting seat. Such a layout allows an appropriate gap to be maintained between the arc-starting needle 211 and the target material 27 mounted and supported on the first side. The size of this gap is carefully designed to ensure that the arc is initiated under appropriate conditions, while avoiding the problem of arc instability caused by a gap that is too small or difficulty in arc initiation due to a gap that is too large.

[0037] The adjustable magnet group 26 is one of the core components of the cathode device 2. It is installed on the second side of the arc cathode mounting seat 26, providing an adjustable magnetic field environment for the entire device. The adjustable magnet group 26 is mainly composed of a permanent magnet 262, a coaxial electromagnetic coil 263, a yoke 265 and an electromagnetic coil power supply 264. The electromagnetic coil power supply 264 is stably electrically connected to the input and output ends of the coaxial electromagnetic coil 263, and the intensity and distribution of the magnetic field can be flexibly adjusted by accurately controlling the size and direction of the current. The permanent magnet 262 provides a basic magnetic field framework for the device, and cooperates with the coaxial electromagnetic coil 263 to achieve fine adjustment of the magnetic field. The yoke 265 plays a role in optimizing the magnetic field distribution and improving the magnetic field efficiency.

[0038] The arc power supply 29 plays an important role in providing electric energy in the cathode device 2. It is electrically connected to the arc cathode mounting seat 23 and the arc-starting needle 211 or the arc-starting needle mounting seat 212 to form a complete electric circuit. This electric circuit ensures that after the arc is successfully struck, the required electric energy can be continuously and stably provided to the arc, ensuring the smooth progress of the coating process.

[0039] In the embodiment of the present application, the addition of the yoke 265 further optimizes the magnetic field distribution and improves the utilization efficiency of the magnetic field, so that the magnetic field can act more concentratedly on the target material and the arc striking area, thereby enhancing the stability of the arc.

[0040] like Figure 4 As shown in FIG. 2 , the magnetic field principle diagram of the cathode device 2 of the present invention is shown. The yoke 265 causes a fundamental change in the originally diffusely distributed magnetic field. As a result, the following is formed: Figure 4 The magnetic flux lines 213 shown are distributed in a specific shape and direction. Between the anode 3 and the target 27, due to the effect of the magnetic field, a cathode emission electron trajectory 215 is generated. The electrons move at high speed along this channel, injecting a strong power into the arc striking process. When the arc is successfully struck, the arc spot 217 begins to move in the magnetic field area of ​​the target 27, forming a unique arc spot moving trajectory 214. As the arc spot 217 moves, a target ablation area 216 is gradually formed on the target 217.

[0041] At the same time, by changing the current of the electromagnetic coil power supply 264, the change of the magnetic field can be further controlled. When the current changes, the magnetic field will also be adjusted accordingly. This change directly affects the speed at which the arc spot 217 moves in the magnetic field area of ​​the target material 27. The technician can accurately adjust the current size according to actual needs, thereby achieving precise control of the moving speed of the arc spot 217.

[0042] Control of arc spot motion trajectory:

[0043]

[0044] in,

[0045] Arc spot movement speed.

[0046] The electric field strength between the cathode target surface and the anode 3;

[0047] The speed of electron movement;

[0048] B → : The component of the magnetic field parallel to the target surface

[0049] e: electron charge.

[0050] like Figure 4 As shown, the arc spot moves rapidly to the target ablation area 216 where the horizontal component of the magnetic field of the adjustable magnet group 26 is the largest under the interaction of the three-dimensional electric field and the magnetic field of the present invention;

[0051] like Figure 4 The arc spot moving speed V is proportional to the electric field strength E between the cathode target surface and the anode 3, the electron movement speed υ, and the component B of the magnetic field in the direction parallel to the target surface.

[0052] In the embodiment of the present application, the adjustable magnet group 26 also includes an electromagnetic coil support 261, which is circumferentially arranged around the permanent magnet 262. In the embodiment of the present application, the circumferential arrangement refers to a circumferential arrangement, which is not necessarily a circular circumference, and can be arranged around the permanent magnet 262 in a rectangular, elliptical or other shape. The electromagnetic coil support 261 has an opening that leaks out the two poles of the permanent magnet 262 to ensure that the magnetic field can be effectively dissipated and transmitted. The coaxial electromagnetic coil 263 is wound on the electromagnetic coil support 261, so that the yoke 265 is fixedly set at the opening of the electromagnetic coil support 261 on the side of the arc cathode mounting seat 23. This process requires highly precise operation to ensure that the enameled wire is evenly wound on the electromagnetic coil support 261 to form a stable and efficient electromagnetic Coil; in the embodiment of the present application, the electromagnetic coil bracket 261 and the yoke 265 are assembled into a whole by welding or riveting. This connection method ensures that in actual applications, the two can work together stably and will not be easily separated due to external forces or magnetic fields; then the enameled wire is wound around the electromagnetic coil bracket 261 to form a coaxial electromagnetic coil 263, so that the coaxial electromagnetic coil 263 will be wound around the magnet 262. In the embodiment of the present application, the yoke 265 is arranged above the N pole of the permanent magnet 262, so that the magnetic flux lines 213 pass through the yoke 265 and are gathered to the coaxial electromagnetic coil 263 to move in the winding area to form a target ablation area 216, so that the yoke 265 can better interact with the magnetic field and guide the direction of the magnetic flux lines. Specifically, the yoke 265 is arranged above the N pole of the permanent magnet 262 (close to the second side of the arc cathode mounting seat 23). Preferably, the permanent magnet 262 is adsorbed on the yoke 265 in the direction of the magnetic field. At this time, the magnetic flux lines 213 pass through the yoke 265 and are gathered to the area wound by the coaxial electromagnetic coil 263. The gathering and guiding effect of the magnetic field enhances and concentrates the magnetic field in a specific area, creating favorable conditions for forming the target ablation area 216.

[0053] In the embodiments of the present application, Figure 2-3 As shown, the electromagnetic coil support 261 includes a first contact surface that contacts the second side of the arc cathode mounting seat 23 (the side close to the adjustable magnet group 26), and the yoke 265 is installed in an embedded manner on the opening of the electromagnetic coil support 251 around the permanent magnet 262 to expose the second contact surface that contacts the second side of the arc cathode mounting seat 23, and the first contact surface is flush with the second contact surface.

[0054] In the embodiment of the present application, the yoke 265 and the electromagnetic coil support 251 are arranged flush with the contact surface relative to the mounting seat 23, which makes it easier to contact the arc cathode mounting seat 23 without leaving a gap, and it is also easier to be arranged as an integrated structure by welding or the like.

[0055] In the embodiments of the present application, Figure 2As shown, a mounting groove is specially provided in the target material mounting area of ​​the arc cathode mounting seat 23, and this design provides space for the subsequent placement of the cooling water channel 25; the cooling water channel 25 in the cathode device 2 is precisely arranged in the mounting groove, and its position design enables the cooling water channel 25 to be in close contact with the target material 27 to be installed after the target material is installed; this contact mode ensures the heat transfer efficiency between the cooling water channel 25 and the target material 27; at the same time, a first sealing portion 281 is also provided in the side installation gap between the cooling water channel 25 and the mounting groove; the existence of this sealing portion effectively prevents the leakage of the cooling water flow, thereby ensuring the stable operation of the cooling system.

[0056] In the embodiment of the present application, the close contact between the cooling water flow channel 25 and the target material 27 provides a direct and efficient cooling method for the target material 27. During the operation of the equipment, the target material 27 will generate a large amount of heat due to the bombardment of high-energy particles and other reasons, and the presence of the cooling water flow channel 25 can quickly take away the heat and maintain the temperature of the target material 27 within a suitable range, which not only prolongs the service life of the target material 27, but also ensures the stable operation of the equipment and reduces the inability to maintain the arc due to overheating.

[0057] The setting of the first sealing part 281 plays a vital role in the cooling system. It prevents the cooling water flow from leaking from the installation gap, ensures the pressure stability of the cooling water flow channel 25, and thus ensures the consistency of the cooling effect; at the same time, effective sealing also avoids the erosion and damage of the cooling water flow to the surrounding components, thereby improving the overall reliability and durability of the equipment.

[0058] In the embodiments of the present application, Figure 2 As shown, the cathode device 2 also includes a shielding cover 218 and a target material clamping strip 24; the shielding cover 218 is made of ceramic or other materials with good shielding properties. The shielding cover 218 and the target material clamping strip 24 are arranged around the target material installation area. The target material clamping strip 24 has a unique clamping recess 241, which is specially designed to match the mounting protrusion of the target material 27. When installing the target material, firstly, the mounting protrusion of the target material 27 is matched and positioned with the clamping recess 241 of the target material clamping strip 24, and then the shielding cover 218 is pressed onto the upper surface of the target material clamping strip 24. In this way, the installation and clamping operations of the target material 27 can be realized.

[0059] The embodiments of the present application can provide the following beneficial effects: precise installation: the pressing recess 241 of the target material pressing strip 24 cooperates with the installation protrusion of the target material 27 to provide precise positioning for the installation of the target material 27; this design ensures the position accuracy of the target material 27 during the installation process, and avoids the performance degradation or failure of the equipment caused by inaccurate installation; stable pressing: the shielding cover 218 is pressed on the upper surface of the target material pressing strip 24, providing a stable pressing force for the target material 27; this pressing method can effectively prevent the target material 27 from loosening or displacement during the operation of the equipment, ensuring the stable operation of the equipment; the stable pressing force can also reduce the gap between the target material 27 and other components, ensuring the shield Shielding effect, further optimizing the performance of the equipment; Shielding protection: The shielding cover 218 made of shielding materials such as ceramics can effectively shield external electromagnetic interference and other adverse effects; this is crucial to improving the stability and reliability of the equipment; The shielding cover 218 can also prevent the target material 27 from being polluted and damaged by the external environment, thereby extending the service life of the target material; Convenient operation: The design of this embodiment makes the installation and pressing process of the target material 27 more convenient and quick; the operator only needs to match the installation protrusion of the target material 27 with the pressing recess 241, and then press on the shielding cover 218 to complete the installation operation; This simple operation method not only improves work efficiency, but also reduces the difficulty of operation and the error rate.

[0060] In an embodiment of the present application, an insulating layer 22 is provided on the first side of the arc cathode mounting seat 23, and a first mounting portion is provided around the shielding cover 218 on the side of the insulating layer 22 close to the arc striking needle 211, and a second sealing portion 282 is installed in the first mounting portion; a second mounting portion is provided around the shielding cover 218 on the side of the insulating layer 22 away from the arc striking needle 211 or the insulating layer contact surface of the arc cathode mounting seat 23 (the surface in contact with the insulating layer 22), and a third sealing portion 283 is installed in the second mounting portion.

[0061] In an embodiment of the present application, the height of the insulating layer 22 is lower than the height of the shielding cover 218 and higher than the height of the target material clamping strip 24; preferably, the side of the insulating layer 22 away from the arc-starting needle 211 (the lower bottom surface) is flush with the target material mounting surface of the cathode mounting seat 23, so that the shielding cover has a higher shielding height for the target material 27 to be installed, and since the height of the target material clamping strip 24 is the lowest, the shielding cover 218 presses the target material clamping strip 24 downward over the insulating layer 22, and the shielding effect is better; the arc-starting needle 211 is installed on the arc cathode mounting seat 23 through the arc-starting needle mounting seat 212, the insulating layer 22 has a mounting hole, the arc-starting needle mounting seat 212 extends out of the insulating layer 22 through the mounting hole, and the arc power supply 29 is electrically connected to the arc-starting needle mounting seat 23 through the arc-starting needle resistor 210.

[0062] In the embodiment of the present application, the arc cathode mounting seat 23 includes a vacuum chamber, and the vacuum chamber is sealed using the second sealing portion 282 and the third sealing portion 283 . The insulating layer 22 covers the upper surface of the arc cathode mounting seat 23 to seal and insulate it.

[0063] In an embodiment of the present application, the negative pole of the arc power supply 29 is electrically connected to the vacuum chamber of the arc cathode mounting seat 23, and the vacuum chamber of the arc cathode mounting seat 23 is electrically connected to the ground terminal via the positive pole of the arc power supply 29; in other embodiments of the present application, the vacuum chamber of the arc cathode mounting seat 23 may also be directly electrically connected to the ground terminal; the cathode device 2 provided in the embodiment of the present application generates a negative voltage during the coating process, and generates an electron charge e that moves toward the anode 3. In an embodiment of the present application, the anode 3 is electrically connected to the ground terminal.

[0064] In the embodiment of the present application, in the cathode electromagnet of arc ion plating, the yoke 265 is added to effectively enhance the magnetic field strength, because the yoke 265 is a magnetic conductive material, which can guide and concentrate the magnetic lines of force. When the current passes through the coil of the electromagnet, a magnetic field is generated, and the yoke 265 is like a "channel" of the magnetic field, which gathers the magnetic lines of force and makes the magnetic field more concentrated in the required area, such as where the arc spot is generated, and the magnetic field strength is enhanced, so as to better confine the plasma, strengthen the arc and avoid the arc from being extinguished.

[0065] In an embodiment of the present application, a multi-arc ion plating method is also provided, which is applied to the above-mentioned multi-arc ion plating cathode device 2, and its main process includes: adjusting the current control of the electromagnetic coil power supply 264 to (2-20) A; turning on the arc power supply 29, and setting the current to between (200-400) A; controlling the arc starting needle 211 to start the arc successfully, and increasing the current of the electromagnetic coil power supply 264; the working voltage and working current of the arc power supply 29.

[0066] Specifically, the multi-arc ion plating method using the cathode device 2 of the present invention includes the following working process:

[0067] (1) The cathode device 2 is installed as a whole on the vacuum coating machine;

[0068] (2) Start the cooling water circulation system;

[0069] (3) Turn on the vacuum system and reduce the vacuum degree of the coating machine to 2.0x10E-4Pa;

[0070] (4) Argon gas is introduced into the vacuum chamber of the coating machine, and the vacuum degree of the coating machine is adjusted to 0.2-0.5x10E-1Pa;

[0071] (5) adjusting the current of the electromagnetic coil power supply 264 to 2A-20A, and adjusting the magnetic field strength in the horizontal direction of the target surface to a suitable range between 2m-30m;

[0072] (6) Turn on the arc power supply 29 and set the current to a suitable range between 200A and 400A;

[0073] (7) Arc striking process:

[0074] a. The arc striking signal is triggered, and the arc striking needle mounting seat 212 is driven by an external device such as a cylinder or an electromagnetic drive mechanism to move downward rapidly;

[0075] b. The arc-starting needle 211 is quickly lifted after touching the target surface; during the process, the current loop of the arc power supply 29 is short-circuited at the contact point between the arc-starting needle 211 and the target surface, and the resulting spark ignites the initial arc plasma;

[0076] c. The target surface produces accumulation of positive ions to form a plasma sheath;

[0077] d. After the arc needle 211 is separated from the target surface, an arc breakdown occurs between the plasma sheath and the target surface. Near the breakdown point, high-density electrons and ions recombine to emit a dazzling light, namely, an arc spot 217;

[0078] (8) Control of the motion trajectory of the arc spot 217:

[0079] a. Figure 4 As shown, the arc spot moves rapidly to the target ablation area 216 where the horizontal component of the magnetic field of the adjustable magnet group 26 is the largest under the interaction of the three-dimensional electric field and the magnetic field of the present invention;

[0080] b. Figure 4 The moving speed V of the arc spot 217 is proportional to the electric field strength E between the cathode target surface and the anode, the electron movement speed υ, and the component B of the magnetic field in the direction parallel to the target surface;

[0081] c. increasing the component B of the magnetic field in the direction parallel to the target surface (ie, increasing the current of the electromagnetic coil power supply 264);

[0082] d. Increase the electric field strength E between the cathode target surface and the anode (ie, increase the operating voltage of the arc power supply 29);

[0083] e. Increase the electron movement speed υ (ie, increase the working current of the arc power supply 29);

[0084] f. The arc spot 217 can be accelerated to move within the target ablation area 216;

[0085] g. When the arc spot 217 moves at a speed of about 30 m / s or more, the head and tail are connected to form a complete arc ring;

[0086] (9) Increasing the current of the electromagnetic coil power supply 264, the working voltage of the arc power supply 29, and the working current of the arc power supply 29 can also speed up the coating speed;

[0087] Maintain the above parameters for 5 minutes, turn off the arc power 29, turn off the vacuum system, and take out the sample after cooling is completed.

[0088] The multi-arc ion plating cathode device of the present invention has great innovative significance and practical value. By cleverly adding a yoke structure to the adjustable magnet group, this measure has brought about significant changes. Under the action of the yoke, the distribution of the cathode magnetic field has undergone a fundamental change, thereby forming a unique magnetic field. By adjusting the intensity and distribution of the magnetic field, the movement trajectory of the arc spot on the target surface can be improved and the local overheating phenomenon can be reduced. The composite magnetic field generated by the adjustable magnet group can further regulate the movement and discharge process of the arc spot. By controlling the current of the electromagnetic coil power supply, the working voltage of the arc power supply, and the working current of the arc power supply, the moving speed of the arc spot in the target ablation area can be adjusted. This carefully designed magnetic field creates favorable conditions for the arc striking process. After the arc striking is successful, the arc spot can move stably in the magnetic field area of ​​the target material and is not easy to extinguish.

[0089] Among them, changing the current of the electromagnet is a key operation. When the current changes, the magnetic field will also change accordingly. The change of the magnetic field can directly affect the speed at which the arc spot moves in the target magnetic field area. By accurately adjusting the current of the electromagnet, the arc spot movement speed can be accurately controlled to meet different process requirements.

[0090] The technology of the present invention successfully solves the problems of difficulty in arc ignition and short arc ignition time faced by traditional technologies in copper plating. In traditional technologies, due to the characteristics of anti-magnetic materials such as copper, it has been difficult to realize industrial application of cathode arc ion plating technology in copper plating and other operations. The present invention breaks this dilemma by virtue of its advantages of no space restrictions and low manufacturing cost. It not only opens up a new path for the application of cathode arc ion plating technology on anti-magnetic materials, but also fills the technical gap of cathode arc ion copper plating.

[0091] This technological breakthrough will have a profound impact on related industries. In the field of industrial manufacturing, there is a widespread demand for antimagnetic materials such as copper plating, and the emergence of this invention will greatly improve production efficiency and product quality. At the same time, it also provides strong support for the research and development and application of new materials, and promotes the technological progress of the entire industry. In the future, with the continuous improvement and promotion of this technology, it is expected to play an important role in more fields and make greater contributions to the development of social economy.

[0092] Those skilled in the art will appreciate that the accompanying drawings are only schematic diagrams of a preferred implementation scenario, and the modules or processes in the accompanying drawings are not necessarily necessary for implementing the present application. Those skilled in the art will appreciate that the modules in the devices in the implementation scenario can be distributed in the devices of the implementation scenario according to the description of the implementation scenario, or can be changed accordingly and located in one or more devices different from the present implementation scenario. The modules of the above-mentioned implementation scenario can be combined into one module, or can be further split into multiple submodules.

[0093] The above serial numbers of this application are only for description and do not represent the advantages and disadvantages of the implementation scenarios. The above disclosure is only a few specific implementation scenarios of this application, but this application is not limited to them, and any changes that can be thought of by technicians in this field should fall within the scope of protection of this application.

Claims

1. A multi-arc ion plating cathode device, characterized in that: include, An arc cathode mounting seat, the arc cathode mounting seat comprising a first side and a second side arranged opposite to the first side; the first side is used to mount and support the target material; An arc-starting needle is mounted on the arc cathode mounting seat and extends out of the first side of the arc cathode mounting seat, and there is a gap between the arc-starting needle and the target material mounted and supported by the first side; An adjustable magnet group is mounted on the second side of the arc cathode mounting seat, the adjustable magnet group includes a permanent magnet, a coaxial electromagnetic coil, a yoke and an electromagnetic coil power supply, and the electromagnetic coil power supply is electrically connected to the input end and the output end of the coaxial electromagnetic coil; An arc power supply is electrically connected to the arc cathode mounting seat and the arc starting needle.

2. A multi-arc ion plating cathode device according to claim 1, characterized in that: The adjustable magnet group also includes an electromagnetic coil support; The electromagnetic coil support is circumferentially arranged around the permanent magnet and has an opening through which the two poles of the permanent magnet are exposed. The coaxial electromagnetic coil is wound on the electromagnetic coil support. The yoke is fixedly arranged at the opening of the electromagnetic coil support on one side of the arc cathode mounting seat.

3. A multi-arc ion plating cathode device according to claim 2, characterized in that: The electromagnetic coil support includes a first contact surface that contacts the second side of the arc cathode mounting seat, and the yoke is installed in the opening of the electromagnetic coil support in an embedded manner to expose a second contact surface that contacts the second side of the arc cathode mounting seat, and the first contact surface is flush with the second contact surface.

4. A multi-arc ion plating cathode device according to claim 3, characterized in that: The N pole of the permanent magnet is close to the second side of the arc cathode mounting seat, and the permanent magnet is adsorbed on the yoke according to the direction of the magnetic field.

5. A multi-arc ion plating cathode device according to any one of claims 1 to 4, characterized in that: At least part of the target material mounting area of ​​the arc cathode mounting seat has a mounting groove, and the multi-arc ion plating cathode device also includes a cooling water channel, which is arranged in the mounting groove so that the cooling water channel contacts and cools the target material, and a first sealing portion is arranged in the side mounting gap between the cooling water channel and the mounting groove.

6. A multi-arc ion plating cathode device according to claim 5, characterized in that: It also includes a shielding cover and a target material clamping strip; the shielding cover and the target material clamping strip are arranged around the target material installation area, the target material clamping strip has a clamping recess, the clamping recess is used to cooperate with the installation of the target material, and the shielding cover is pressed on the upper surface of the target material clamping strip.

7. A multi-arc ion plating cathode device according to claim 6, characterized in that: An insulating layer is provided on the first side of the arc cathode mounting seat, a first mounting portion is provided around the shielding cover on a side of the insulating layer close to the arc striking needle, and a second sealing portion is installed in the first mounting portion; a second mounting portion is provided around the shielding cover on a side of the insulating layer away from the arc striking needle or the insulating layer contact surface of the arc cathode mounting seat, and a third sealing portion is installed in the second mounting portion.

8. A multi-arc ion plating cathode device according to claim 7, characterized in that: The height of the insulating layer is lower than the height of the shielding cover and higher than the height of the target material pressing bar.

9. A multi-arc ion plating cathode device according to claim 8, characterized in that: The arc-starting needle is installed on the arc cathode mounting seat through an arc-starting needle mounting seat, the insulating layer has a mounting hole, the arc-starting needle mounting seat extends out of the insulating layer through the mounting hole, and the arc power supply is electrically connected to the arc-starting needle mounting seat.

10. A multi-arc ion plating method, applied to the multi-arc ion plating cathode device according to any one of claims 1 to 9, characterized in that: include, Adjust the current of the electromagnetic coil power supply to be controlled at (2-20)A; Turn on the arc power supply and set the current to between (200-400) A; After the arc-starting needle is controlled to successfully start an arc, the current of the electromagnetic coil power supply is increased; Increase the operating voltage and current of the arc power supply.

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