Chemical vapor deposition equipment reaction system, use method and transportation system

Abstract

The invention relates to the technical field of clean rooms, in particular to a chemical vapor deposition equipment reaction system, a using method and a transportation system, and the transportation system comprises a reaction container, two moving rails and two driving devices. And the reaction container is used for providing a reaction space for a chemical vapor deposition reaction. The two moving tracks are arranged on two sides of the preset motion trail of the reaction container in parallel. And the two driving devices are arranged on the two moving tracks respectively, move along the moving tracks and are used for bearing the reaction container so as to drive the reaction container to move along a preset movement track to be conveyed to a target position, and the driving devices can also unload the reaction container at the target position. The reaction container is lifted from the two sides of the reaction container through the two driving devices, the reaction container is driven to be transported along the moving rail, and the reaction container is put down after reaching the target position, so that the reaction container moves among the stations in the reaction system, and the working requirements of the chemical vapor deposition equipment are met.

Description

Technical Field

[0001] This patent relates to the field of chemical vapor deposition, and in particular to a chemical vapor deposition equipment reaction system, a use method, and a transportation system. Background Art

[0002] Silicon carbide is a representative ceramic material that has been widely used in the entire industrial field due to its excellent physical, chemical and electrical properties.

[0003] In recent years, as the development of semiconductor processing components using silicon carbide materials has been actively progressing, the importance of silicon carbide materials has been increasing. In particular, silicon carbide materials are widely used as components for etching processes in semiconductor process components due to their high plasma resistance.

[0004] Silicon carbide materials used for semiconductor etching process parts are made by the traditional method of manufacturing silicon carbide. Since the quality and performance cannot be met by this method, it is manufactured by chemical vapor deposition.

[0005] Chemical vapor deposition of silicon carbide uses a mixture of Si-containing gases such as SiH4, SiCl2, SiCl4 and C-containing gases such as C2H2, CH4, C3H8 as raw material gases, or CH3SiCl3, CH3SiH3,

[0006] (CH3)3SiH) etc. There are some deposition methods using monolithic raw materials, and the manufacture of silicon carbide materials by chemical vapor deposition has the disadvantage of low productivity because the process is carried out in a batch heating furnace.

[0007] In order to improve the efficiency of the reaction, the intermittent heating furnace needs to be replaced by a continuous one, but how to transport the reaction container in the continuous reaction system has become a major problem. Summary of the invention

[0008] In order to solve or at least partially solve the above technical problems, this patent provides a chemical vapor deposition equipment reaction system and a use method and a transportation system.

[0009] The patent provides a transport system for a chemical vapor deposition equipment reaction system, including: a reaction vessel, two moving rails and two driving devices. The reaction vessel is used to provide a reaction space for a chemical vapor deposition reaction. The two moving rails are arranged parallel to each other on both sides of a preset motion trajectory of the reaction vessel. Two driving devices are respectively arranged on the two moving rails and move along the moving rails. The two driving devices are used to carry the reaction vessel to drive the reaction vessel to move along the preset motion trajectory to a target position. The driving devices can also unload the reaction vessel at the target position.

[0010] Preferably, the driving device comprises: a moving assembly and a lifting mechanism. The moving assembly is arranged on a moving track and moves along the moving track. The lifting mechanism is arranged on the moving assembly and moves along the moving track with the moving assembly; the lifting mechanism can abut against the reaction container and lift the reaction container so that the reaction container is suspended in the air and moves with the moving assembly.

[0011] Preferably, a connection assembly is provided on the outer surface of the reaction container, and a connection groove is provided on the connection assembly; the lifting mechanism includes: a lifting assembly and a docking assembly. The docking assembly is provided on the lifting assembly, and the lifting assembly drives the docking assembly to move up and down. The docking assembly includes: a bearing component. A docking pin is provided on the bearing component, and the docking pin corresponds to the connection groove and is inserted into the docking groove; the bearing component is used to support the connection assembly to carry the reaction container.

[0012] Preferably, the docking assembly further comprises a first sensor, which is communicatively connected to a control module of a chemical vapor deposition equipment reaction system and is used to send a connection signal to the control module after detecting that the docking pin is movably connected to the docking groove.

[0013] Preferably, a mounting groove is provided at the top of the docking pin, the first sensor is arranged in the mounting groove, and a part of the first sensor is exposed in the mounting groove. The docking pin extends into the docking groove, the first sensor abuts against the groove top of the docking groove and activates to send a connection signal to the control module.

[0014] Preferably, the moving assembly further comprises: a sliding wheel. A rolling groove is arranged on the wheel rim of the sliding wheel, and the track of the moving track is inserted into the rolling groove so that the sliding wheel moves along the moving track.

[0015] A chemical vapor deposition equipment reaction system, characterized in that the reaction system includes the transportation system of the chemical vapor deposition equipment reaction system mentioned above. The chemical vapor deposition equipment reaction system also includes: a reaction base and a control module. The reaction base, two movable tracks are both arranged on the reaction base, and a reaction groove is arranged at the position of the reaction base corresponding to the workstation, and the reaction groove is located between the two movable tracks. The reaction groove is used to accommodate a reaction container that has reached the target position. The control module is communicatively connected with the driving device, and is used to control the driving device to drive the reaction container to move along the movable track.

[0016] Preferably, the reaction system further comprises: an in-place sensor module. The in-place sensor module is arranged in the reaction tank, and the in-place sensor module is communicatively connected with the control module. The in-place sensor module is used to send a first in-place signal to the control module after the reaction container reaches directly above the reaction tank. The in-place sensor module is also used to send a preparation signal to the control module after the reaction container is placed in the reaction tank.

[0017] Preferably, the driving device is provided with a positioning groove. The reaction base is also provided with at least two positioning components. The positioning component includes a telescopic portion and a positioning portion, the positioning portion is fixed on the telescopic portion, and the telescopic portion drives the positioning portion to move, so that the driving device is inserted into the positioning groove to position the driving device after the driving device reaches the target position. A second sensor is provided on the positioning portion, and the second sensor is communicatively connected with the control module, and is used to send a second positioning signal to the control module when the positioning portion is inserted into the positioning groove.

[0018] A method for using a chemical vapor deposition equipment reaction system, comprising:

[0019] In response to the start signal, the two driving devices are started, so that the two driving devices are respectively connected to the reaction container from both sides of the reaction container at the initial position and lift the reaction container.

[0020] In response to the connection signal, the driving device is driven to drive the reaction container to move along the moving track toward the target position.

[0021] In response to the first in-position signal, the driving device is controlled to place the reaction container at the target position, and then the two driving devices are driven to move along the moving track to leave the target position.

[0022] Preferably, in response to the first in-position signal, the step of controlling the driving device to place the reaction container at the target position specifically includes:

[0023] In response to the first in-position signal sent to the control module after the in-position sensor module detects the reaction container, the driving device is controlled to stop moving.

[0024] The positioning assembly is activated to connect the positioning assembly with the driving device.

[0025] In response to the second in-position signal, the lifting mechanism of the driving device is controlled to descend to put down the reaction container.

[0026] In response to the preparation signal, the lifting mechanism is controlled to further descend so that the driving device is separated from the reaction container.

[0027] Compared with the prior art, the present application uses a driving device to drive the reaction container to move along the moving track, so as to realize the movement of the reaction container between various stations in the reaction system. And the reaction container can be positioned at the station of the reaction container, so as to ensure that the posture of the reaction container is accurate after the reaction container moves to the station. The reaction container with accurate posture can be connected to the gas supply pipeline of the gas supply component to ensure the smooth progress of gas supply to promote the reaction. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] In order to more clearly illustrate the implementation of this patent, the following is a brief introduction to the relevant drawings. It can be understood that the drawings described below are only used to illustrate some implementations of this patent, and ordinary technicians in this field can also obtain many other technical features and connection relationships not mentioned in this article based on these drawings.

[0029] Figure 1 It is a three-dimensional schematic diagram of a transport system of a chemical vapor deposition equipment reaction system according to an embodiment of the present patent;

[0030] Figure 2 It is a three-dimensional schematic diagram of a transport system of a chemical vapor deposition equipment reaction system according to an embodiment of the present patent;

[0031] Figure 3 It is a three-dimensional schematic diagram of a transport system of a chemical vapor deposition equipment reaction system according to an embodiment of the present patent;

[0032] Figure 4 is a schematic diagram of a chemical vapor deposition equipment reaction system according to an embodiment of the present patent;

[0033] Figure 5 is a schematic diagram of a chemical vapor deposition equipment reaction system according to an embodiment of the present patent;

[0034] Figure 6 It is a schematic diagram of the structure of a driving device of an embodiment of the present patent;

[0035] Figure 7 It is a schematic diagram of the structure of a driving device of an embodiment of the present patent;

[0036] Figure 8 It is a method of using a chemical vapor deposition equipment reaction system in an embodiment of the present patent;

[0037] Fig. 9 It is a control module diagram of a chemical vapor deposition equipment reaction system in an embodiment of the present patent;

[0038] Fig.10 This is a signal flow module diagram of a chemical vapor deposition equipment reaction system in an implementation mode of this patent.

[0039] Description of reference numerals:

[0040] 1. Reaction container; 11. Connection assembly; 111. Connection groove; 2. Driving device; 21. Lifting mechanism; 211. Docking assembly; 212. Lifting assembly; 2111. Bearing component; 2112. Docking pin; 23. Moving assembly; 231. Sliding wheel; 232. Positioning groove; 3. Moving track; 4. Work station; 5. Reaction base; 51. Positioning assembly. DETAILED DESCRIPTION

[0041] The patent is described in detail below in conjunction with the accompanying drawings.

[0042] refer to Figure 4 and Figure 5 , shown is the chemical vapor deposition equipment reaction system, the reaction system is set up with three stations, in which the reaction container will be pre-treated, gas supplied and heated respectively. When the reaction container passes through the three different stations in turn, the chemical vapor deposition work can be completed. At the same time, Figure 4 and Figure 5 It is not difficult to conclude that gates are set between the three stations to isolate the three stations from each other to avoid mutual interference during the reaction process. Therefore, in order for the reaction container to successfully complete chemical vapor deposition, it is necessary to allow the reaction container to complete the chemical vapor deposition work through the three stations in sequence.

[0043] And we pass Figure 5 It can be seen that a docking pipe is provided on the side wall of the reaction vessel. When the reaction vessel is located at the second station, a docking pipe is provided on its side wall for connecting the gas supply equipment. This docking process is crucial because it determines whether the reaction vessel can be smoothly connected to the gas supply equipment. In short, the orientation of the reaction vessel needs to facilitate the docking of the gas supply equipment with it. In order to ensure smooth docking between the gas supply pipeline and the reaction vessel, the side wall of the reaction vessel should be kept perpendicular to the gas supply pipeline of the gas supply equipment. In this way, the gas can enter the reaction vessel smoothly and effectively to meet the gas conditions required for the reaction.

[0044] In view of this, an embodiment of the present invention provides a transportation system for a chemical vapor deposition equipment reaction system to solve the above problems.

[0045] First embodiment

[0046] like Figure 1 , Figure 2 The first embodiment of the present application shows that a transportation system of a chemical vapor deposition equipment reaction system includes: a reaction container, two movable tracks and two driving devices. The reaction container is used to provide a reaction space for a chemical vapor deposition reaction. The two movable tracks are arranged parallel to each other on both sides of a preset motion trajectory of the reaction container. Two driving devices are respectively arranged on the two movable tracks and move along the movable tracks. The two driving devices are used to carry the reaction container to drive the reaction container to move along the preset motion trajectory to a target position. The driving devices can also unload the reaction container at the target position.

[0047] Two moving rails are arranged in parallel, along the preset moving track of the reaction container, and are spaced from each other. Two driving devices are respectively located on both sides of the reaction container, and are used to lift the reaction device. The reaction container is located between the two moving rails so that the driving devices are respectively connected thereto. When the two driving devices are connected to the reaction container, they move together along their respective moving rails, so that the reaction container moves along the preset moving track. When the reaction container reaches the target station, the driving device will put it down. Since the two driving devices are respectively located on both sides of the reaction container, they jointly carry the reaction container, so the movement speed of the reaction container on both sides during the movement depends on the movement speed of the driving device, and the movement speed of the driving device is relatively easy to control, so as to ensure that the posture of the reaction container does not deviate during the movement, thereby ensuring the accuracy of the reaction container after movement.

[0048] In addition, if Figure 6 The driving device shown includes: a moving assembly and a lifting mechanism. The moving assembly is arranged on a moving track and moves along the moving track. The lifting mechanism is arranged on the moving assembly and moves along the moving track with the moving assembly; the lifting mechanism can abut against the reaction container and lift the reaction container so that the reaction container is suspended in the air and moves with the moving assembly.

[0049] The moving assembly causes the driving device to move along the moving track, and the lifting mechanism provided on the moving assembly also moves accordingly. Specifically, the lifting mechanism is located on both sides of the reaction vessel, and is used to lift the reaction vessel so that its bottom is kept at a certain distance from the ground. When the moving assembly moves along the track, the lifted reaction vessel also moves together. Since the reaction vessel is in a vacant state, the bottom is not affected by the friction of the ground, so the posture of the reaction container remains stable during the movement. The reaction container, which always maintains a stable posture and orientation, ensures that the reaction container can be smoothly docked with the gas supply equipment during the subsequent reaction process.

[0050] At the same time, if Figure 3 The outer surface of the reaction container is provided with a connection component, and a connection groove is provided on the connection component; the lifting mechanism includes: a lifting component and a docking component. The docking component is provided on the lifting component, and the lifting component drives the docking component to move up and down. The docking component includes: a bearing component. A docking pin is provided on the bearing component, and the docking pin corresponds to the connection groove and is inserted into the docking groove; the bearing component is used to support the connection component to carry the reaction container.

[0051] When the lifting mechanism and the reaction container are in the bearing process, the moving assembly is first responsible for moving the lifting mechanism to a position corresponding to the connecting assembly. The lifting assembly in the lifting mechanism will perform a lifting operation to push the docking assembly to move in the direction of the connecting assembly. During the movement of the docking assembly, the docking pin will gradually move and be inserted into the docking groove. In particular, the side walls of the docking pin start from the insertion end and extend obliquely in a direction away from each other. The side walls of the docking groove start from the opening end and extend obliquely in a direction close to each other. It can be seen that the cross-sectional area of ​​the insertion end of the docking pin is smaller than the cross-sectional area of ​​other parts of the body, and the cross-sectional area at the opening of the docking groove is larger than the cross-sectional area of ​​other parts in the groove. Therefore, during the insertion process, the part with the smallest cross-sectional area of ​​the docking pin will first enter the part with the largest cross-sectional area of ​​the docking groove, so that the docking pin can be inserted into the docking groove. At the same time, since the outer surface of the docking pin is an inclined surface, the groove wall of the docking groove is also an inclined surface, and the outer surface of the docking pin and the groove wall of the docking groove have the same inclination direction, so during the insertion process, the outer surface of the docking pin and the groove wall of the docking groove can guide each other, so that the docking pin can be inserted into the docking groove faster and complete the docking.

[0052] Furthermore, when the lifting assembly continues to rise, the bearing member after docking will abut against the connecting assembly. In this way, the reaction vessel connected to the connecting assembly will also be lifted. At this time, the docking pin has been inserted into the docking groove. Therefore, when the driving device moves, the bearing member and the connecting assembly not only rely on friction to remain relatively still, but also the side walls of the butt-cutting and the inner side walls of the docking groove will abut against each other, and when the driving device moves, the side walls of the docking pin and the inner side walls of the docking groove will generate an interaction force to prevent the bearing member from separating from the connecting assembly. This ensures that the driving device stably carries the reaction vessel, avoids the reaction vessel from tipping over during movement, and thus ensures safety.

[0053] In addition, the docking assembly may also include a first sensor, which is in communication connection with the control module of the chemical vapor deposition equipment reaction system, and is used to send a connection signal to the control module after detecting that the docking pin and the docking slot are movably connected. Further, a mounting slot is provided at the top of the docking pin, and the first sensor is disposed in the mounting slot, and a portion of the first sensor is exposed in the mounting slot. The docking pin extends into the docking slot, and the first sensor abuts against the top of the docking slot and activates to send a connection signal to the control module.

[0054] In the process of docking the connecting component with the docking component, the docking pin will first be inserted into the docking groove. As the docking pin is extended, the first sensor located at the top will abut against the bottom of the docking groove, and the docking pin has been fully inserted into the docking groove, thereby completing the operation of inserting the docking pin into the docking groove. The first sensor after abutment is activated and sends a signal to the control module to indicate that the docking pin has been matched with the docking groove, and the connection between the connecting component and the docking component has been completed. When the connecting component is connected to the docking component, the lifting component continues to lift, and the bottom of the reaction vessel can be lifted off the ground. The lower surface of the reaction vessel after lifting is no longer in direct contact, so it will not be affected by friction during movement. The driving device can directly drive the reaction vessel to move along the laying direction of the moving track to ensure that the reaction vessel can smoothly reach the target station.

[0055] In addition, the moving assembly further comprises a sliding wheel. A rolling groove is arranged on the wheel rim of the sliding wheel, and the track of the moving track is inserted into the rolling groove so that the sliding wheel moves along the moving track.

[0056] When the sliding wheel moves along the moving track, the rolling groove on the sliding wheel will be stuck on the moving track. During the rolling process of the sliding wheel, the rolling groove on the sliding wheel will always be in meshing state with the moving track, thus preventing the sliding wheel from being separated from the moving track during the rolling process, thus preventing the driving device from being derailed during the movement, thereby ensuring the normal operation of the driving device.

[0057] Second embodiment

[0058] In the first embodiment, a transport system applied to a chemical vapor deposition equipment reaction system is provided to meet the movement of the reaction container between various stations in the reaction system. At the same time, the orientation of the reaction container during the movement is also guaranteed to ensure that the posture of the reaction container after arriving at the reaction station can meet the docking requirements of the gas supply equipment. However, if the chemical vapor deposition equipment reaction system is matched with the transport system, the advantages of the transport system can be further utilized.

[0059] In view of this, a chemical vapor deposition equipment reaction system is provided in a second embodiment of the present invention.

[0060] like Figure 4 , Figure 5 , Fig. 9A chemical vapor deposition equipment reaction system is shown, and the reaction system includes the transportation system of the chemical vapor deposition equipment reaction system mentioned above. The chemical vapor deposition equipment reaction system also includes: a reaction base and a control module. The reaction base, two movable tracks are both arranged on the reaction base, and a reaction groove is arranged at the position of the reaction base corresponding to the work station, and the reaction groove is located between the two movable tracks. The reaction groove is used to accommodate the reaction container that has reached the target position. The control module is communicatively connected with the driving device, and is used to control the driving device to drive the reaction container to move along the movable track.

[0061] It is not difficult to see that the two moving tracks of the transport system are both set on the reaction base, so the workstation for reacting the reaction container is naturally set on the reaction base, and the work of the reaction system can be completed on the reaction base. The reaction groove corresponding to the workstation on the reaction base can position the reaction container brought by the driven device, and the setting position of the reaction groove is the same as the projection of the reaction container on the reaction base when the reaction container can be smoothly docked with the gas supply equipment in the workstation. The groove wall of the reaction groove can act on the reaction container when the reaction container is placed to correct the orientation deviation that may occur when the reaction container is lowered, ensuring that the reaction container can be smoothly docked with the gas supply equipment.

[0062] The control module can control the driving device moving on the moving track, and control the driving device to carry the reaction container to move along the moving track. Since the two sets of driving devices cooperate to drive the reaction container to move from both sides of the reaction container, the ability of the two sets of driving devices to work together is improved through automated control, the error of the two sets of driving devices during transportation is reduced, and the posture of the reaction container during transportation is guaranteed.

[0063] Furthermore, the reaction system further includes: an in-place sensor module. The in-place sensor module is arranged in the reaction tank, and the in-place sensor module is communicatively connected with the control module. The in-place sensor module is used to send a first in-place signal to the control module after the reaction container reaches directly above the reaction tank. The in-place sensor module is also used to send a preparation signal to the control module after the reaction container is placed in the reaction tank.

[0064] When the driving device drives the reaction container to the top of the reaction tank, the in-place sensor module arranged in the reaction tank can identify the reaction container in place, and after identification, send the first in-place signal to the control module to indicate that the reaction container has reached the target station, and stop the movement of the driving device so that the reaction container remains above the reaction tank. The control room driving device lowers the reaction container and puts the reaction container into the reaction tank. When the in-place sensor module arranged in the reaction tank can abut against the lower surface of the reaction container, the surface reaction container has been put into the reaction tank. At this time, the in-place sensor module can send a signal to the control module, indicating that the reaction container is in place and the docking work between the gas supply device and the reaction container can be carried out. Specifically, the in-place sensor module is integrated with a photoelectric sensor and a pressure sensor, and the photoelectric sensor is used to detect whether the reaction container has reached the top of the reaction tank. The pressure sensor is activated by the extrusion of the reaction container after the reaction container is put into the reaction tank, and the activated pressure sensor sends a signal to the control module, indicating that the reaction container is already in the reaction tank. Of course, in other embodiments, the in-place sensor module can also be manufactured by combining other sensors to meet the requirements of identifying the reaction container and detecting whether the reaction container is placed in the reaction tank.

[0065] Third embodiment

[0066] like Figure 2 , Figure 7 , Fig. 9 In the second embodiment shown, the reaction container is identified by the in-situ sensor module disposed in the reaction tank, ensuring that the reaction container can be accurately dropped into the reaction tank to meet the reaction requirements of the subsequent reaction container. However, due to the large mass of the reaction container, the reaction tank will be impacted when the reaction container is lowered, so the in-situ sensor module disposed in the reaction tank is at risk of being damaged by the reaction container after long-term use, increasing the maintenance cost of the reaction system.

[0067] In view of this, in the third embodiment of the present invention, a positioning groove is provided on the driving device. At least two positioning components are also provided on the reaction base. The positioning component includes a telescopic portion and a positioning portion, the positioning portion is fixed on the telescopic portion, and the telescopic portion drives the positioning portion to move, so that the driving device is inserted into the positioning groove to position the driving device after the driving device reaches the target position. A second sensor is provided on the positioning portion, and the second sensor is communicatively connected with the control module, and is used to send a second positioning signal to the control module when the positioning portion is inserted into the positioning groove.

[0068] The two positioning components are set at positions corresponding to the reaction grooves. When the two positioning components can be respectively inserted into the positioning grooves corresponding to the two driving devices, the movement of the driving devices can be restricted. At this time, the reaction container carried by the driving device can be exactly at the target position in the station. Since the reaction container is transported by the driving device, the position of the reaction container is confirmed by determining the position of the driving device. The reaction container can be positioned with the help of the positioning driving device, thereby ensuring the accuracy of the position of the reaction container in the station.

[0069] In particular, if Figure 7 As shown in the present embodiment, the positioning groove is arranged at the bottom of the driving device, and the telescopic part of the positioning assembly extends upward from the bottom of the driving device so that the positioning part extends into the positioning groove, and the positioning part cooperates with the positioning groove so that the stopped driving device can remain stationary and avoid sliding of the relative moving track. The second sensor arranged on the positioning part can be activated after abutting against the bottom of the positioning groove, and sends a signal to the control module to indicate that the driving device is in place at this time. Then relatively, it means that the reaction vessel also reaches the top of the reaction tank. At this time, it is only necessary to control the driving device to put down the reaction vessel, so that the reaction vessel can be accurately placed in the reaction tank, and since the positioning assembly can limit the movement of the driving device, no shaking or deviation will occur during the process of the reaction vessel below the driving device, so it can be ensured that the subsequent gas supply equipment can accurately complete the docking work with the reaction vessel.

[0070] Fourth embodiment

[0071] like Figure 8 , Fig.10 Based on the transport system of the chemical vapor deposition equipment reaction system in the second embodiment and the third embodiment, the fourth embodiment of the present invention further provides a method for using the chemical vapor deposition equipment reaction system. The method for using the chemical vapor deposition equipment reaction system includes:

[0072] In response to the start signal, the two driving devices are started, so that the two driving devices are respectively connected to the reaction container from both sides of the reaction container at the initial position and lift the reaction container.

[0073] In response to the connection signal, the driving device is driven to drive the reaction container to move along the moving track toward the target position.

[0074] In response to the first in-position signal, the driving device is controlled to place the reaction container at the target position, and then the two driving devices are driven to move along the moving track to leave the target position.

[0075] When the reaction system needs to be used, the reaction vessel needs to be moved between the various stations in the reaction system to enable different stations of the reaction vessel to perform different tasks. The reaction vessel is between two moving tracks. The two driving devices can lift the reaction vessel from both sides of the reaction vessel respectively, so that the lower surface of the reaction vessel is vacated, thereby preventing the lower surface of the reaction vessel from being affected by friction during use. The reaction vessel moves to the target position driven by the synchronous movement of the driving devices on both sides, and since the driving devices can drive the reaction container to move from both sides of the reaction container respectively, the movement speed of both sides of the reaction container depends on the driving devices, making it easier to keep the movement speeds on both sides of the reaction container the same, reducing the possibility of the reaction container shifting during movement. When the first in-position signal is received, it indicates that the reaction container has reached the target station, and the driving device is controlled to lower the reaction container to the target position and wait for the reaction. At this time, in order to avoid the reaction work in the station affecting the driving device, it is necessary to drive the driving device away from the station and return to the initial position. And we refer to Figure 4 and Figure 5 It can be seen that there are three stations in the reaction system. After the driving device moves the reaction container in the second station to the third station, the reaction container originally in the first station can be moved to the second station, and then a new reaction container can be moved to the first station. At this time, the three stations of the reaction system can process the internal reaction system at the same time, thereby improving the working efficiency of the reaction system.

[0076] In addition, in response to the first in-position signal, the step of controlling the driving device to place the reaction container at the target position specifically includes:

[0077] In response to the first in-position signal sent to the control module after the in-position sensor module detects the reaction container, the driving device is controlled to stop moving.

[0078] The positioning assembly is activated to connect the positioning assembly with the driving device.

[0079] In response to the second in-position signal, the lifting mechanism of the driving device is controlled to descend to put down the reaction container.

[0080] In response to the preparation signal, the lifting mechanism is controlled to further descend so that the driving device is separated from the reaction container.

[0081] The in-place sensor module identifies and locates the reaction container, and the positioning assembly locates the drive device, which ensures that the reaction container moves to the exact target position. After reaching the target position, the drive device is controlled to move the reaction container down to the exact position. This ensures that the reaction container can be accurately placed in the workstation and that the reaction is carried out normally.

[0082] Finally, it should be noted that ordinary technicians in this field can understand that in order to make readers better understand this patent, the implementation methods of this patent propose many technical details. However, even without these technical details and various changes and modifications based on the above-mentioned implementation methods, the technical solutions claimed for protection by the claims of this patent can be basically realized. Therefore, in practical applications, various changes can be made to the above-mentioned implementation methods in form and details without departing from the spirit and scope of this patent.

Claims

1. A transport system for a chemical vapor deposition equipment reaction system, characterized in that: The transportation system comprises: A reaction container, used to provide a reaction space for chemical vapor deposition reaction; Two moving rails are arranged parallel to each other on both sides of the preset motion track of the reaction container; Two driving devices are respectively arranged on the two moving rails and move along the moving rails. The two driving devices are used to carry the reaction containers to drive the reaction containers to move along a preset motion trajectory to a target position. The driving devices can also unload the reaction containers at the target position.

2. The transport system of the chemical vapor deposition equipment reaction system according to claim 1, characterized in that: The driving device comprises: A moving component is arranged on the moving track and moves along the moving track; The lifting mechanism is arranged on the moving component and moves along the moving track with the moving component; the lifting mechanism can abut against the reaction container and lift the reaction container so that the reaction container is suspended in the air and moves with the moving component.

3. The transport system of the chemical vapor deposition equipment reaction system according to claim 2, characterized in that: The outer surface of the reaction container is provided with a connection component, and the connection component is provided with a connection groove; the lifting mechanism comprises: Lifting components; A docking assembly, arranged on the lifting assembly, and the lifting assembly drives the docking assembly to move up and down; The docking assembly comprises: A bearing component is provided with a docking pin, and the docking pin corresponds to the connecting groove so as to be inserted into the connecting groove; the bearing component is used to support the connecting assembly to carry the reaction container.

4. The transport system of the chemical vapor deposition equipment reaction system according to claim 3, characterized in that: The docking assembly also includes a first sensor, which is communicatively connected to a control module of the chemical vapor deposition equipment reaction system and is used to send a connection signal to the control module after detecting that the docking pin is movably connected to the docking slot.

5. The transport system of the chemical vapor deposition equipment reaction system according to claim 4, characterized in that: A mounting groove is provided on the top of the docking pin, the first sensor is arranged in the mounting groove, and a part of the first sensor is exposed from the mounting groove; The docking pin extends into the docking slot, and the first sensor abuts against the slot top of the docking slot and is activated to send a connection signal to the control module.

6. The transport system of the chemical vapor deposition equipment reaction system according to claim 2, characterized in that: The mobile component also includes: The sliding wheel has a rolling groove on its rim, and the track of the moving track is inserted into the rolling groove so that the sliding wheel moves along the moving track.

7. A chemical vapor deposition equipment reaction system, characterized in that: The reaction system comprises a transport system of a chemical vapor deposition equipment reaction system as claimed in any one of claims 1 to 6; The chemical vapor deposition equipment reaction system also includes: A reaction base, the two moving tracks are both arranged on the reaction base, a reaction tank is arranged at a position corresponding to the workstation of the reaction base, and the reaction tank is located between the two moving tracks; The reaction tank is used to accommodate the reaction container that has reached the target position; The control module is in communication with the driving device and is used to control the driving device to drive the reaction container to move along the moving track.

8. The chemical vapor deposition equipment reaction system according to claim 7, characterized in that: The reaction system further comprises: An in-situ sensor module is arranged in the reaction tank, and the in-situ sensor module is communicatively connected with the control module; The in-position sensor module is used to send a first in-position signal to the control module after the reaction container reaches directly above the reaction tank; The in-place sensor module is also used to send a preparation signal to the control module after the reaction container is placed in the reaction tank.

9. The chemical vapor deposition equipment reaction system according to claim 7, characterized in that: The driving device is provided with a positioning groove; The reaction base is also provided with: At least two positioning components, the positioning components comprising a telescopic portion and a positioning portion, the positioning portion being fixed on the telescopic portion, the telescopic portion driving the positioning portion to move, so as to insert the driving device into the positioning slot to position the driving device after the driving device reaches the target position; The positioning part is provided with a second sensor, which is communicatively connected with the control module and is used for sending a second positioning signal to the control module after the positioning part is inserted into the positioning groove.

10. A method for using a chemical vapor deposition equipment reaction system, characterized in that: include: In response to the start signal, the two driving devices are started, so that the two driving devices are respectively connected to the reaction container from both sides of the reaction container at the initial position and lift the reaction container; In response to the connection signal, the driving device is driven to drive the reaction container to move toward a target position along the moving track; In response to the first in-position signal, the driving device is controlled to place the reaction container at the target position, and then the two driving devices are driven to move along the moving track to leave the target position.

11. The method for using the chemical vapor deposition equipment reaction system according to claim 10, characterized in that: In the step of controlling the driving device in response to the first in-position signal to place the reaction container at the target position, the method specifically includes: In response to a first in-position signal sent to the control module by the in-position sensor module after the reaction container is detected, the driving device is controlled to stop moving; Starting the positioning assembly to connect the positioning assembly to the driving device; In response to a second in-position signal, controlling the lifting mechanism of the driving device to descend so as to put down the reaction container; In response to the preparation signal, the lifting mechanism is controlled to further descend so that the driving device is separated from the reaction container.

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