Glue uniformizing, developing and cleaning all-in-one machine

Abstract

The invention discloses a glue uniformizing, developing and cleaning all-in-one machine, and relates to the technical field of glue uniformizing and developing machines, the glue uniformizing, developing and cleaning all-in-one machine comprises a main box body and a substrate conveying mechanism, a feeding cavity and a processing cavity are arranged in the main box body, and the processing cavity comprises a cleaning cavity, a glue uniformizing cavity, a heating cavity, an exposure cavity and a developing cavity which are arranged in sequence; a feeding platform is arranged in the feeding cavity, and a feeding mechanism is arranged on the feeding platform; a cleaning platform is arranged in the cleaning cavity, and a cleaning mechanism is arranged on the cleaning platform; a glue uniformizing platform is arranged in the glue uniformizing cavity, and a glue uniformizing mechanism is arranged on the glue uniformizing platform; a heating platform is arranged in the heating cavity, and a heating mechanism is arranged on the heating platform; an exposure platform is arranged in the exposure cavity, and an exposure mechanism is arranged on the exposure platform; a developing platform is arranged on the developing cavity, and a developing mechanism is arranged on the developing platform; and the substrate conveying mechanism drives the substrate to be conveyed among the cavities. Pollution caused by workers can be reduced, and the quality of finished substrates is improved.

Description

Technical Field

[0001] The invention relates to the technical field of coating and developing machines, and in particular to a coating, developing and cleaning all-in-one machine. Background Art

[0002] At present, the coating device and developing device of the coating and developing equipment are independently set up and not integrated into one. In the process of coating, developing and transporting the substrate, there is much human participation. The particles or dust carried by the workers can easily contaminate the substrate and affect the quality of the finished product.

[0003] Therefore, a coating, developing and cleaning all-in-one machine is provided to solve the above problems existing in the prior art. Summary of the invention

[0004] The purpose of the present invention is to provide a coating, developing and cleaning all-in-one machine to solve the problems existing in the above-mentioned prior art, reduce the pollution caused by the staff and improve the quality of the finished substrate.

[0005] To achieve the above object, the present invention provides the following solutions:

[0006] The present invention provides a coating, developing and cleaning all-in-one machine, comprising:

[0007] A main box body, wherein a loading chamber and a processing chamber are arranged in the main box body, and the processing chamber includes a cleaning chamber, a glue-spreading chamber, a heating chamber, an exposure chamber and a developing chamber which are arranged in sequence, and the cleaning chamber is arranged close to the loading chamber; a loading platform is arranged in the loading chamber, and a loading mechanism is arranged on the loading platform for loading the substrate; a cleaning platform is arranged in the cleaning chamber, and a cleaning mechanism is arranged on the cleaning platform for cleaning the substrate; a glue-spreading platform is arranged in the glue-spreading chamber, and a glue-spreading mechanism is arranged on the glue-spreading platform for spreading glue on the substrate; a heating platform is arranged in the heating chamber, and a heating mechanism is arranged on the heating platform for heating the substrate; an exposure platform is arranged in the exposure chamber, and an exposure mechanism is arranged on the exposure platform for exposing the substrate; a developing platform is arranged on the developing chamber, and a developing mechanism is arranged on the developing platform for developing the substrate;

[0008] The substrate transport mechanism is used to drive the substrate to be transported between the loading platform, the cleaning platform, the coating platform, the heating platform, the exposure platform and the developing platform.

[0009] Preferably, the substrate transport mechanism comprises a guide rail and a transport mechanical arm, wherein the guide rail is arranged at one side of the processing chamber and extends from the loading chamber to the developing chamber, and the front end of the guide rail is close to the loading chamber; the transport mechanical arm is slidably arranged on the guide rail, and a fork plate is arranged on the transport mechanical arm, and the transport mechanical arm can drive the fork plate to extend under the substrate to lift the substrate for transport;

[0010] Among them, the loading chamber, the cleaning chamber, the glue spreading chamber, the heating chamber, the exposure chamber and the developing chamber are all provided with automatic opening and closing doors on one side close to the guide rail for the transport robot arm to pass through.

[0011] Preferably, a first sensing device is also provided at any of the automatic opening and closing doors, and the first sensing device is used to sense the transport robot arm, and the first sensing device is connected to the controller signal; when the first sensing device senses the transport robot arm, and the transport robot arm needs to pass through the corresponding automatic opening and closing door, the controller controls the corresponding automatic opening and closing door to open to allow the transport robot arm to pass through.

[0012] Preferably, the loading platform, the cleaning platform, the glue spreading platform, the heating platform, the exposure platform and the developing platform are all provided with a second sensing device, and the second sensing device is used to sense the substrate, and the second sensing device is connected to the controller signal, when the second sensing device senses that the substrate is in place, the controller controls the corresponding loading mechanism, the cleaning mechanism, the glue spreading mechanism, the heating mechanism, the exposure mechanism or the developing mechanism to work.

[0013] Preferably, the loading mechanism includes a loading position, a first lifting mechanism and a first fixing mechanism, the bottom of the loading position is installed on the top of the loading platform through the first lifting mechanism, the loading position is used to support the substrate, and the first fixing mechanism is provided on the loading position for fixing the substrate.

[0014] Preferably, the loading mechanism further includes a flipping mechanism, which includes an active rotating mechanism and a passive rotating mechanism, wherein the active rotating mechanism and the passive rotating mechanism are respectively located on both sides of the loading platform, and are used to clamp both sides of the substrate and drive the substrate to flip.

[0015] Preferably, the active rotating mechanism comprises a main rotating base, a first linear driving mechanism, a first fixed seat, a driving shaft, a first driving motor and a first substrate clamping fixture, the main rotating base is arranged on the loading platform, and the first fixed seat is slidably arranged on the main rotating base, the driving shaft is rotatably mounted on the first fixed seat, the end of the driving shaft away from the passive rotating mechanism is connected to the first driving motor, the end of the driving shaft close to the passive rotating mechanism is connected to the first substrate clamping fixture, the first linear driving mechanism is connected to the first fixed seat, and can drive the first fixed seat to slide close to or away from the passive rotating mechanism;

[0016] The passive rotating mechanism includes a secondary rotating base, a second linear driving mechanism, a second fixed seat, a driven shaft and a second substrate clamping tool. The secondary rotating base is arranged on the loading platform, and the secondary rotating base is provided with the second fixed seat, the driven shaft is rotatably mounted on the second fixed seat, and the end of the driven shaft close to the active rotating mechanism is connected to the second substrate clamping tool, and the first substrate clamping tool and the second substrate clamping tool are respectively used to clamp the two sides of the substrate; the second linear driving mechanism is connected to the second fixed seat, and can drive the second fixed seat to slide close to or away from the active rotating mechanism.

[0017] Preferably, the cleaning mechanism comprises a cleaning robot arm and a spray nozzle, the cleaning robot arm is arranged on the cleaning platform, the cleaning robot arm is provided with the spray nozzle, the spray nozzle is connected to a liquid storage container through a liquid supply pipe, the liquid storage container is used to store cleaning liquid, and the spray nozzle can spray the cleaning liquid onto the surface of the substrate to clean the substrate;

[0018] The cleaning mechanism also includes a drying component, which includes an air outlet nozzle. The air outlet nozzle is arranged on the cleaning robot arm and is connected to an air source through an air supply pipe. The air outlet nozzle can blow air toward the substrate to dry the substrate.

[0019] Preferably, the cleaning platform is further provided with a cleaning tank, a carrying mechanism is provided in the cleaning tank, the carrying mechanism is used to carry the substrate and drive the substrate to rotate, and a pin mechanism is provided on the carrying mechanism, the pin mechanism is used to lift the substrate;

[0020] Wherein, a drain port is also provided at the bottom of the cleaning tank, and the drain port is connected to a waste liquid bucket through a drain pipe, and an overflow position sensor is provided on the waste liquid bucket.

[0021] Preferably, the glue spreading mechanism comprises a glue spreading arm, a glue arm support and a glue arm driving mechanism, wherein the glue arm support is arranged on the glue spreading platform, the glue arm driving mechanism is arranged on the glue arm support and connected to the glue spreading arm, and the glue arm driving mechanism can drive the glue spreading arm to move up and down and rotate;

[0022] Among them, a glue liquid channel is arranged along the length direction of the glue spreading arm, and a glue liquid outlet is arranged at one end of the glue spreading arm, and the glue liquid outlet is connected to the glue liquid channel, the other end of the glue spreading arm is connected to the glue arm driving mechanism, and is connected to a glue storage container through a glue liquid tube, the glue storage container is used to store photoresist, and the glue spreading arm is used to apply the photoresist to the substrate.

[0023] Preferably, the glue-splitting platform is further provided with a glue-splitting groove, a bearing mechanism is provided in the glue-splitting groove, the bearing mechanism is used to bear the substrate and drive the substrate to rotate, and a pin mechanism is provided on the bearing mechanism, the pin mechanism is used to lift the substrate;

[0024] Wherein, a glue-splitting scraper is also arranged in the glue-splitting groove, and the glue-splitting scraper is connected to a scraper driving mechanism, and the scraper driving mechanism can drive the glue-splitting scraper to move up and down and rotate; during the glue-splitting process, the glue-splitting scraper is located above the supporting mechanism, and a gap is left between the glue-splitting scraper and the substrate on the supporting mechanism, and the glue-splitting scraper is used to scrape the photoresist on the substrate evenly;

[0025] The glue-splitting platform is also provided with a glue-splitting cover, which can be buckled on the top of the glue-splitting groove, and the glue-splitting cover is connected to a second lifting mechanism, which can drive the glue-splitting cover to move up and down;

[0026] The bottom of the glue leveling tank is also provided with a glue discharge port, the glue discharge port is connected to a waste glue barrel through a glue discharge pipe, and the waste glue barrel is provided with an overflow position sensor.

[0027] Preferably, the heating mechanism is a heating plate, and the heating plate is laid on the heating platform;

[0028] The exposure mechanism is an exposure machine, and the exposure machine is arranged on the exposure platform.

[0029] Preferably, the developing mechanism comprises a developing arm and a fixing arm;

[0030] Wherein, the developing arm is provided with a developing nozzle, the developing nozzle is connected to a developing liquid storage container through a developing liquid inlet pipe, the developing liquid storage container is used to store the developing liquid, and the developing nozzle can spray the developing liquid on the substrate; the developing arm is slidably arranged on the developing platform, and the developing arm is connected to a developing arm driving mechanism, and the developing arm driving mechanism can drive the developing arm to slide on the developing platform;

[0031] A fixing nozzle is arranged on the fixing arm, and the fixing nozzle is connected to a fixing liquid storage container through a fixing liquid inlet pipe. The fixing liquid storage container is used to store the fixing liquid, and the fixing nozzle can spray the fixing liquid on the substrate; the fixing arm is slidably arranged on the developing platform, and the fixing arm is connected to a fixing arm driving mechanism, and the fixing arm driving mechanism can drive the fixing arm to slide on the developing platform.

[0032] Preferably, the developing platform is further provided with a developing tank, a carrying mechanism is provided in the developing tank, the carrying mechanism is used to carry the substrate and drive the substrate to rotate, and a ejector mechanism is provided on the carrying mechanism, the ejector mechanism is used to lift the substrate;

[0033] Wherein, a waste outlet is also arranged at the bottom of the developing tank, the waste outlet is connected to a collecting bucket, and an overflow position sensor is arranged on the collecting bucket.

[0034] Preferably, the carrying mechanism comprises a loading tray, a second driving motor and a third lifting mechanism, the output shaft of the second driving motor is connected to the third lifting mechanism, the top of the third lifting mechanism is connected to the loading tray, the second driving motor can drive the loading tray to rotate, the third lifting mechanism can drive the loading tray to move up and down, and the loading tray is also provided with a second fixing mechanism for fixing the substrate;

[0035] The ejector mechanism is arranged on the loading plate.

[0036] Compared with the prior art, the present invention has achieved the following technical effects:

[0037] In the present invention, a loading chamber and a processing chamber are arranged in the main box body, and the processing chamber includes a cleaning chamber, a glue spreading chamber, a heating chamber, an exposure chamber and a developing chamber which are arranged in sequence, and the cleaning chamber is arranged close to the loading chamber; a loading platform is arranged in the loading chamber, and a loading mechanism is arranged on the loading platform; a cleaning platform is arranged in the cleaning chamber, and a cleaning mechanism is arranged on the cleaning platform; a glue spreading platform is arranged in the glue spreading chamber, and a glue spreading mechanism is arranged on the glue spreading platform; a heating platform is arranged in the hot chamber, and a heating mechanism is arranged on the heating platform; an exposure mechanism is arranged in the exposure chamber, and a developing platform is arranged on the developing chamber, and a developing mechanism is arranged on the developing platform.

[0038] In the present invention, a loading mechanism, a cleaning mechanism, a glue spreading mechanism, a heating mechanism, an exposure mechanism and a developing mechanism are integrated into a main box. The substrate is transferred between the various mechanisms by a substrate transportation mechanism to complete the loading, cleaning, glue spreading, heating, exposure and development processes of the substrate. During the entire working process, there is no human intervention, which reduces the pollution caused by the staff and improves the quality of the finished product. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0040] Figure 1 This is a schematic diagram of the distribution of the cavities in the main box in an embodiment of the present invention;

[0041] Figure 2 It is a front schematic diagram of the main box body in an embodiment of the present invention;

[0042] Figure 3 It is a structural schematic diagram of a feeding mechanism in an embodiment of the present invention;

[0043] Figure 4 This is a schematic diagram of the structure of the cleaning mechanism in an embodiment of the present invention;

[0044] Figure 5 It is a structural schematic diagram of the glue-splitting mechanism in an embodiment of the present invention;

[0045] Figure 6 This is a schematic diagram of the arrangement of a glue spreading cover in an embodiment of the present invention;

[0046] Figure 7 A schematic diagram of the structure of a developing mechanism in an embodiment of the present invention;

[0047] Figure 8 Schematic diagram of the structure of the developing arm in the embodiment of the present invention.

[0048] In the figure: 100-main box; 1-feeding cavity; 101-feeding platform; 102-feeding station; 103-first fixing mechanism; 104-main rotating base; 105-first fixing seat; 106-first driving motor; 107-first substrate clamping tool; 108-secondary rotating base; 109-second substrate clamping tool; 110-second fixing seat; 111-driven shaft; 2-cleaning cavity; 201-cleaning tank; 202-cleaning robot arm; 203-spray nozzle; 204-air outlet nozzle; 3-glue-spreading cavity; 301-glue-spreading tank; 302-glue-spreading arm; 303-lower support; 304-upper support; 305- Glue spreading arm motor; 306-upper support lifting mechanism; 307-glue spreading cover; 308-output shaft; 309-carrying tray; 310-thrust mechanism; 311-vertical support column; 312-horizontal support arm; 4-heating chamber; 401-heating plate; 5-exposure chamber; 6-developing chamber; 601-developing platform; 602-developing tank; 603-developing arm; 604-fixing arm; 605-developing nozzle; 7-guide rail; 8-chemical cabinet; 9-electric control cabinet; 10-slider; 11-transport robot arm; 12-fork plate; 13-substrate; 14-entry and exit door; 15-box door; 16-visual window; 17-leveling foot. DETAILED DESCRIPTION

[0049] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0050] The purpose of the present invention is to provide a coating, developing and cleaning all-in-one machine to solve the problems existing in the above-mentioned prior art, reduce the pollution caused by the staff and improve the quality of the finished substrate.

[0051] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the present invention is further described in detail below with reference to the accompanying drawings and specific embodiments.

[0052] Embodiment 1

[0053] like Figure 1-Figure 8 As shown, this embodiment provides a coating, developing and cleaning all-in-one machine, which mainly includes:

[0054] The main box 100 is a closed box, and a loading chamber 1 and a processing chamber are arranged therein. The processing chamber includes a cleaning chamber 2, a coating chamber 3, a heating chamber 4, an exposure chamber 5 and a developing chamber 6 arranged in sequence. The cleaning chamber 2 is arranged close to the loading chamber 1; a loading platform 101 is arranged in the loading chamber 1, and a loading mechanism is arranged on the loading platform 101 for loading the substrate 13; a cleaning platform is arranged in the cleaning chamber 2, and a cleaning mechanism is arranged on the cleaning platform for cleaning the substrate 13. The coating chamber 3 is provided with a coating platform, and a coating mechanism is provided on the coating platform for coating the substrate 13; the heating chamber 4 is provided with a heating platform, and a heating mechanism is provided on the heating platform for heating the substrate 13; the exposure chamber 5 is provided with an exposure platform, and an exposure mechanism is provided on the exposure platform for exposing the substrate 13; the developing chamber 6 is provided with a developing platform 601, and a developing mechanism is provided on the developing platform 601 for developing the substrate 13;

[0055] The substrate transport mechanism is used to drive the substrate 13 to be transported between the loading platform 101 , the cleaning platform, the coating platform, the heating platform, the exposure platform and the developing platform 601 .

[0056] It should be noted that the glue spreading, developing and cleaning all-in-one machine in this embodiment has a controller, which can perform data processing and control the above-mentioned feeding mechanism, cleaning mechanism, glue spreading mechanism, heating mechanism, exposure mechanism and developing mechanism; wherein, the controller can be selected according to specific work needs, for example, a PLC controller can be used.

[0057] In this embodiment, the loading mechanism, cleaning mechanism, glue spreading mechanism, heating mechanism, exposure mechanism and developing mechanism are integrated into a main box 100, and the substrate 13 is transferred between the various mechanisms through the substrate transportation mechanism to complete the loading, cleaning, glue spreading, heating, exposure and development processes of the substrate 13. During the entire working process, there is no human intervention, which reduces the pollution caused by the staff and improves the quality of the finished product.

[0058] Further, it needs to be explained that the substrate 13 in this embodiment mainly refers to a large-sized glass substrate, such as a square glass substrate with a side length of 500 mm. The all-in-one coating, developing and cleaning machine in this embodiment can be applied to process the above-mentioned large-sized glass substrate.

[0059] In this embodiment, the substrate transport mechanism mainly includes a guide rail 7 and a transport mechanical arm 11. The guide rail 7 is arranged on one side of the processing chamber and extends from the loading chamber 1 to the developing chamber 6. The front end of the guide rail 7 (the end away from the developing chamber 6) is close to the loading chamber 1. The transport mechanical arm 11 is slidably arranged on the guide rail 7. The transport mechanical arm 11 is provided with a fork plate 12. The transport mechanical arm 11 can drive the fork plate 12 to extend under the substrate 13 to lift the substrate 13 for transport. Among them, two fork plates 12 can be arranged side by side, and the two fork plates 12 are used to extend into the bottom two sides of the substrate 13 respectively, and lift the substrate 13 from both sides to improve stability. Moreover, a limit block is arranged at the end of the fork plate 12 (the end away from the transport mechanical arm 11) and the outer side of the fork plate 12. When the fork plate 12 lifts the substrate 13, the limit block is located at the outer edge of the substrate 13 to limit it to prevent the substrate 13 from falling.

[0060] In this embodiment, the loading chamber 1, the cleaning chamber 2, the glue spreading chamber 3, the heating chamber 4, the exposure chamber 5 and the developing chamber 6 are all provided with automatic opening and closing doors on the side close to the guide rail 7 for allowing the transport robot arm 11 to pass through.

[0061] In this embodiment, the guide rail 7 is preferably arranged at the rear side of the processing chamber, wherein Figure 2 As shown, what is shown is the front side of the main box body 100, and the "rear side" refers to the side facing away from the front side of the main box body 100.

[0062] In this embodiment, a first sensing device is also provided at any of the automatic opening and closing doors, and the first sensing device is used to sense the position of the transporting mechanical arm 11, and the first sensing device is connected to the controller signal; when the first sensing device senses the transporting mechanical arm 11, and the transporting mechanical arm 11 needs to pass through the corresponding automatic opening and closing door, the controller controls the corresponding automatic opening and closing door to open, so that the transporting mechanical arm 11 can pass through. The first sensing device can be selected as needed, for example, it can be an infrared sensor, a photoelectric switch, or an image recognition device such as a camera.

[0063] In this embodiment, it should be noted that the transporting mechanical arm 11 can be selected as needed, as long as it can realize the transportation of the substrate 13 between various chambers. For example, when the front and rear widths of the loading chamber 1 and the processing chamber are consistent, the guide rail 7 can be set along the entire length of the main box 100, which is also located at the rear side of the loading chamber 1. At this time, the transporting mechanical arm 11 only needs to drive the fork plate 12 to move forward and backward to realize the placement of the substrate 13 into each chamber or the removal of the substrate 13 from each chamber; at this time, the transporting mechanical arm 11 includes a fixed base and a linear drive mechanism, the fixed base is slidably set on the guide rail 7 through the slider 10, and the slider 10 can be driven to move along the guide rail 7 by a transmission belt or a screw mechanism, or a walking wheel can be set at the bottom of the slider 10, and the walking wheel is driven by a motor to rotate to realize the movement of the slider 10 on the guide rail 7; and the linear drive mechanism is connected to the fork plate 12 to drive the fork plate 12 to move forward and backward, wherein the linear drive mechanism can select an electric push rod, a hydraulic rod or a linear motor as needed.

[0064] Alternatively, the volume of the loading chamber 1 can be set larger to facilitate the staff to enter the loading chamber 1, so as to place the unprocessed substrate 13 on the loading mechanism, or take out the processed substrate 13; at this time, the front and rear widths of the loading chamber 1 are greater than the front and rear widths of the processing chamber, and the rear side of the loading chamber 1 protrudes backward relative to the processing chamber. The guide rail 7 is only arranged close to the loading chamber 1 but does not extend into the loading chamber 1. A switch door is arranged on the rear side of the loading chamber 1 close to the cleaning chamber 2. When the transport robot 11 transports the substrate 13 between the loading chamber 1 and the cleaning chamber 2, it needs to turn; therefore, the transport robot 11 can also include a rotating platform, and the bottom of the fixed base is rotatably arranged on the slider 10 through the rotating platform to realize the turning of the transport robot 11.

[0065] Alternatively, a transport robot arm 11 with other structures may be selected according to work requirements.

[0066] In this embodiment, the cleaning platform, the glue-spreading platform, the heating platform, the exposure platform and the developing platform 601 can be independently arranged, or the above-mentioned multiple platforms can be integrated into an integral machine, and a partition is arranged on the integral machine to separate the above-mentioned multiple sealed cavities. Furthermore, the loading platform 101, the cleaning platform, the glue-spreading platform, the heating platform, the exposure platform and the developing platform 601 can all be made of stainless steel frames and sheet metal plates to improve the overall strength and corrosion resistance and extend the service life.

[0067] In this embodiment, the bottom of the main box 100 is further provided with a leveling foot 17, and the main box 100 can be kept level as a whole by adjusting the leveling foot 17; wherein, the main box 100 is preferably a rectangular box, and a plurality of leveling feet 17 are provided on the four sides of the bottom thereof, and the main box 100 is supported by the plurality of leveling feet 17 to improve the overall stability.

[0068] In this embodiment, if Figure 2 As shown, the cleaning chamber 2, the coating chamber 3, the heating chamber 4, the exposure chamber 5 and the developing chamber 6 are all closed chambers, and are all provided with a door 15 that can be opened and closed on the front, so as to facilitate equipment maintenance, etc.; wherein, the door 15 can be provided with two layers, and a visual window 16 can be provided on the upper door 15, so as to facilitate observation by the staff. The front of the loading chamber 1 is provided with an access door 14, so as to facilitate the staff to directly enter the loading chamber 1, so as to take and place the substrate 13 and perform equipment maintenance, etc., and the access door 14 can also be provided with a visual window 16.

[0069] In this embodiment, the loading platform 101, the cleaning platform, the glue-spreading platform, the heating platform, the exposure platform and the developing platform 601 are all provided with a second sensing device, which is used to sense the substrate 13, and the second sensing device is connected to the controller signal. When the second sensing device senses that the substrate 13 is in place, the controller controls the corresponding loading mechanism, the cleaning mechanism, the glue-spreading mechanism, the heating mechanism, the exposure mechanism or the developing mechanism to work. The second sensing device can be selected as needed, for example, it can be an infrared sensor, a photoelectric switch, or an image recognition device such as a camera.

[0070] In this embodiment, if Figure 3 As shown, the loading mechanism mainly includes a loading platform 102, a first lifting mechanism and a first fixing mechanism 103. The bottom of the loading platform 102 is installed on the top of the loading platform 101 through the first lifting mechanism. The loading platform 102 is used to support the substrate 13, and the loading platform 102 is provided with the first fixing mechanism 103 for fixing the substrate 13. In this embodiment, the first lifting mechanism can drive the loading platform 102 to move upward to support the substrate 13, or drive the loading platform 102 to move downward to provide space for the flipping of the substrate 13. The first lifting mechanism can be selected according to specific work needs, for example, an electric push rod or a hydraulic rod can be selected.

[0071] In this embodiment, the first fixing mechanism 103 mainly includes a clamping block, and there are multiple clamping blocks arranged along the circumference of the loading platform 102. The substrate 13 is clamped and fixed by multiple clamping blocks to improve stability; wherein, the loading platform 102 is preferably a rectangular structure, and one or two clamping blocks are arranged on each of its four sides, or only two clamping blocks are arranged on each of its two long sides (perpendicular to the fork plate 12). It should be noted that the above-mentioned clamping blocks should be staggered from the fork plate 12 to facilitate the placement and removal of the substrate 13. Further, the inner side of the clamping block can protrude inward to form a support platform, the height of the support platform is lower than the overall height of the clamping block, and the edge of the substrate 13 can be placed on the support platform; and the clamping block can be made of softer materials such as plastic and rubber to prevent the substrate 13 from being damaged, or a protective cushion layer made of softer materials such as plastic and rubber can be set at the contact between the clamping block and the substrate 13.

[0072] In this embodiment, the loading mechanism also includes a flipping mechanism, which includes an active rotating mechanism and a passive rotating mechanism, and the active rotating mechanism and the passive rotating mechanism are respectively located on both sides of the loading platform 102, for clamping both sides of the substrate 13 and driving the substrate 13 to flip; when one side of the substrate 13 is processed, the substrate 13 is re-conveyed to the loading chamber 1, and when the transport robot arm 11 drives the substrate 13 to the position, the first lifting mechanism drives the loading platform 102 to rise to receive the substrate 13, and then the transport robot arm 11 drives the fork plate 12 to retract, and the flipping mechanism clamps both sides of the substrate 13; then, the first lifting mechanism drives the loading platform 102 to descend, providing space for the flipping of the substrate 13, and the flipping mechanism drives the substrate 13 to flip. After the flipping is completed, the first lifting mechanism drives the loading platform 102 to rise to receive the substrate 13, the flipping mechanism releases the substrate 13, and the transport robot arm 11 drives the fork plate 12 to extend under the substrate 13 to lift the substrate 13, and then drives the substrate 13 to pass through the above-mentioned multiple cavities in sequence to complete the processing of the other side of the substrate 13.

[0073] Specifically, the active rotating mechanism includes a main rotating base 104, a first linear driving mechanism, a first fixed seat 105, a driving shaft, a first driving motor 106 and a first substrate clamping tool 107. The main rotating base 104 is arranged on the loading platform 101, and the first fixed seat 105 is slidably arranged on the main rotating base 104, the active shaft is rotatably installed on the first fixed seat 105, the end of the active shaft away from the passive rotating mechanism is connected to the first driving motor 106, the end of the active shaft close to the passive rotating mechanism is connected to the first substrate clamping tool 107, the first linear driving mechanism is connected to the first fixed seat 105, and can drive the first fixed seat 105 to slide close to or away from the passive rotating mechanism;

[0074] The passive rotating mechanism includes a secondary rotating base 108, a second linear driving mechanism, a second fixed seat 110, a driven shaft 111 and a second substrate clamping tool 109. The secondary rotating base 108 is arranged on the loading platform 101, and the secondary rotating base 108 is provided with the second fixed seat 110, the driven shaft 111 is rotatably mounted on the second fixed seat 110, and the driven shaft 111 is connected to the second substrate clamping tool 109 at one end of the driven shaft 111 close to the active rotating mechanism, and the first substrate clamping tool 107 and the second substrate clamping tool 109 are respectively used to clamp the two sides of the substrate 13; the second linear driving mechanism is connected to the second fixed seat 110, and can drive the second fixed seat 110 to slide close to or away from the active rotating mechanism.

[0075] In this embodiment, when the flipping mechanism is working, the first linear drive mechanism and the second linear drive mechanism drive the first substrate clamping tool 107 and the second substrate clamping tool 109 to approach each other to clamp the substrate 13; after the loading platform 102 is lowered, the first drive motor 106 can drive the active shaft to rotate, thereby driving the substrate 13 to flip, and in this process, the driven shaft 111 rotates with it; after the flipping is completed, the loading platform 102 rises to receive the substrate 13, and the first substrate clamping tool 107 and the second substrate clamping tool 109 on both sides move away from each other, and the fork plate 12 is driven by the transport robot arm 11 to extend to the lower side of the substrate 13 to support the substrate 13; this embodiment can drive the substrate 13 to flip over by setting a flipping mechanism to process the upper and lower surfaces of the substrate 13.

[0076] Among them, the first linear drive mechanism and the second linear drive mechanism can be selected according to specific work needs, such as selecting a linear motor or a hydraulic cylinder; the first substrate clamping tool 107 and the second substrate clamping tool 109 have the same structure, mainly including a clamping arm, one side of the clamping arm is connected to the active shaft or the driven shaft 111, and the other side is provided with a plurality of clamping blocks, and the clamping blocks are provided with clamping grooves for clamping one of the edges of the substrate 13; and clamping plates are provided at both ends of the clamping arm, which can clamp the two ends of the edge of the substrate 13 to improve the clamping effect.

[0077] Furthermore, it should be noted that other flipping mechanisms can be selected according to work needs. For example, the use of the first linear drive mechanism and the second linear drive mechanism can be eliminated, and instead a telescopic structure such as an electric push rod or a hydraulic rod can be set on the active shaft and the driven shaft 111 to drive the first substrate clamping tool 107 and the second substrate clamping tool 109 to move respectively.

[0078] In this embodiment, if Figure 4 As shown, the cleaning mechanism includes a cleaning robot arm 202 and a spray nozzle 203. The cleaning robot arm 202 is disposed on the cleaning platform. The spray nozzle 203 is disposed on the cleaning robot arm 202. The spray nozzle 203 is connected to a liquid storage container through a liquid supply pipe. The liquid storage container is used to store cleaning liquid. The spray nozzle 203 can spray the cleaning liquid onto the surface of the substrate 13. The cleaning robot arm 202 drives the spray nozzle 203 to move, so that different positions of the substrate 13 can be cleaned. Among them, the robot arm can be selected according to specific work needs, such as a commonly used four-axis robot arm, which can drive the spray nozzle 203 to move up and down, forward and backward, left and right, and rotate to achieve comprehensive cleaning of the surface of the substrate 13; or other types of robot arms can also be selected.

[0079] Furthermore, the liquid storage container can be selected as a liquid storage tank or a liquid storage barrel as needed, and the cleaning liquid is supplied by a pressure tank; specifically, the liquid storage container is connected to the liquid inlet of the pressure tank through a liquid supply pipe, and a liquid supply pump is provided on the liquid supply pipe, and the cleaning liquid is pumped into the pressure tank through the liquid supply pump, and the liquid outlet of the pressure tank is connected to the spray nozzle 203, and the cleaning liquid is pushed to flow to the spray nozzle 203 by the gas in the pressure tank, and then sprayed out to clean the surface of the substrate 13; the pressure tank is also provided with a pressure detection element such as a pressure gauge or a pressure detection sensor, which can detect the gas pressure in the pressure tank, and the pressure detection element is connected to the controller signal, and the controller is connected to the liquid supply pump signal. The controller controls the switch of the liquid supply pump according to the pressure data to replenish the pressure tank, realize stable liquid supply, and avoid repeated switching of the liquid supply pump. Further, the pipeline between the liquid outlet of the pressure tank and the spray nozzle 203 is also equipped with a back-sucking valve to realize the back-sucking function of the cleaning liquid.

[0080] In this embodiment, the cleaning mechanism also includes a drying component, which includes an air outlet nozzle 204. The air outlet nozzle 204 is arranged on the cleaning robot arm 202 and is connected to an air source through an air supply pipe. The air outlet nozzle 204 can blow air toward the substrate 13 to dry the substrate 13; wherein the air source can be selected according to specific needs, such as selecting a fan or a compressed gas tank.

[0081] The liquid supply pipe connected to the spray nozzle 203 and the air supply pipe connected to the air outlet nozzle 204 are preferably hoses so as to follow the movement of the cleaning robot arm 202 .

[0082] In this embodiment, a cleaning tank 201 is further provided on the cleaning platform, and a carrying mechanism is provided in the cleaning tank 201, and the carrying mechanism is used to carry the substrate 13 and drive the substrate 13 to rotate to improve the cleaning and drying effects; and a pin mechanism 310 is provided on the carrying mechanism, and the pin mechanism 310 is used to lift the substrate 13 to facilitate the taking and placing of the substrate 13.

[0083] Furthermore, a drain port is provided at the bottom of the cleaning tank 201, and the drain port is connected to a waste liquid bucket through a drain pipe. The waste liquid bucket is located below the cleaning tank 201. The waste liquid generated during the cleaning process is discharged into a dedicated waste liquid bucket through the drain port by liquid gravity. The waste liquid bucket is provided with an overflow position sensor that can detect the liquid level of the waste liquid, so as to facilitate timely dumping of the waste liquid bucket. A sealing cover is provided at the barrel mouth of the waste liquid bucket for sealing, and a pipeline joint can be provided on the sealing cover to connect with the drain pipe.

[0084] In this embodiment, a glue-spreading platform is provided with a glue-spreading groove 301, and a carrying mechanism is provided in the glue-spreading groove 301. The carrying mechanism is used to carry the substrate 13 and drive the substrate 13 to rotate so that the photoresist applied by the glue-spreading mechanism can be evenly coated on the surface of the substrate 13; and a pin mechanism 310 is provided on the carrying mechanism, and the pin mechanism 310 is used to lift the substrate 13 to facilitate the taking and placing of the substrate 13.

[0085] Furthermore, a glue-scraping plate is also provided in the glue-scraping groove 301, and the glue-scraping plate is connected to a scraper driving mechanism, and the scraper driving mechanism can drive the glue-scraping plate to move up and down and rotate; during the glue-scraping process, the glue-scraping plate is located above the substrate 13 on the carrying mechanism, and there is a gap between the glue-scraping plate and the substrate 13, and the gap is the thickness of the photoresist. The glue-scraping plate is driven up and down by the scraper driving mechanism to adjust the glue-scraping thickness, and the photoresist on the substrate 13 can be scraped evenly by the glue-scraping plate, further ensuring that the photoresist coating on the surface of the substrate 13 is even. Before and after the glue-scraping is completed, the scraper driving mechanism can drive the glue-scraping plate to rotate so that it avoids the top of the carrying mechanism, thereby facilitating the placement and placement of the substrate 13 and the glue-scraping mechanism to drip glue.

[0086] Among them, the scraper driving mechanism can be selected according to needs, for example, it may include a scraper lifting mechanism and a scraper motor. The scraper lifting mechanism can be an electric push rod and a hydraulic rod, etc., and a scraper motor is arranged on the top. The output shaft of the scraper motor is vertically upward and connected to the glue scraper, so that the scraper driving mechanism can drive the glue scraper to move up and down and rotate.

[0087] In this embodiment, if Figure 6 As shown, a glue spreading cover 307 is also provided on the glue spreading platform, and the glue spreading cover 307 can be buckled on the top of the glue spreading groove 301, and the glue spreading cover 307 is connected to a second lifting mechanism, and the second lifting mechanism can drive the glue spreading cover 307 to move up and down; when glue is dripping or the substrate 13 is taken in and placed, the second lifting mechanism drives the glue spreading cover 307 to rise, and when glue is spread, the glue spreading cover 307 is driven down and buckled on the top of the glue spreading groove 301 to prevent external factors from affecting the glue spreading process. Among them, the second lifting mechanism may include a vertical support column 311, a vertical slide rail is arranged on the vertical support column 311, a horizontal support arm 312 is slidably arranged on the vertical slide rail, one end of the horizontal support arm 312 is slidably arranged on the vertical slide rail, and the other end is connected to the glue-spreading cover 307, and the horizontal support arm 312 is connected to a vertical driving mechanism such as a hydraulic rod and a screw motor, which can drive it to rise and fall, and then drive the glue-spreading cover 307 to rise and fall; or, other lifting mechanisms can be selected according to work requirements.

[0088] In this embodiment, the bottom of the glue-splitting tank 301 is also provided with a glue discharge port, which is connected to a waste glue bucket through a glue discharge pipe. The waste glue bucket is located below the glue-splitting tank 301. The waste liquid generated during the glue-splitting process is discharged into a dedicated waste glue bucket through the glue discharge port by gravity. The waste glue bucket is provided with an overflow sensor that can detect the level of the waste liquid and facilitates the timely dumping of the waste glue bucket. A sealing cover is provided at the barrel mouth of the waste glue bucket for sealing, and a pipeline joint can be provided on the sealing cover to connect with the glue discharge pipe.

[0089] In this embodiment, if Figure 5 As shown, the glue spreading mechanism mainly includes a glue spreading arm 302, a glue arm support and a glue arm driving mechanism. The glue arm support is arranged on the glue spreading platform. The glue arm driving mechanism is arranged on the glue arm support and connected to the glue spreading arm 302. The glue arm driving mechanism can drive the glue spreading arm 302 to move up and down and rotate. Further, a glue liquid channel is arranged along the length direction of the glue spreading arm 302, and a glue liquid outlet is arranged at one end of the glue spreading arm 302, and the glue liquid outlet is connected to the glue liquid channel. The other end of the glue spreading arm 302 is connected to the glue arm driving mechanism, and a glue storage container is connected through a glue liquid tube. The glue storage container is used to store photoresist, and the glue spreading arm 302 is used to apply the photoresist to the substrate 13; wherein, the glue liquid tube is preferably a hose.

[0090] In this embodiment, the glue arm support may include an upper support 304 and a lower support 303, and the glue arm driving mechanism may include an upper support lifting mechanism 306 and a glue spreading arm motor 305. The upper support 304 is connected to the lower support 303 through an upper support lifting mechanism 306 such as a hydraulic rod or a screw motor. The upper support lifting mechanism 306 can drive the upper support 304 and the glue spreading arm 302 to move up and down to adjust the glue application height to meet different work requirements; a glue spreading arm motor 305 is installed on the upper support 304, which can drive the glue spreading arm 302 to rotate, so that the glue spreading arm 302 can be rotated to the top of the glue spreading groove 301 for glue dripping, or the glue spreading arm 302 can be rotated to stagger the glue spreading groove 301, so as to facilitate the placement of the substrate 13 and the engagement of the glue spreading cover 307.

[0091] In this embodiment, the glue storage container can be selected as needed, such as a glue bottle or glue tank, etc., and its outlet is connected to the glue spreading arm 302 through a glue liquid pipe. The glue liquid pipe is provided with a pneumatic glue pump to provide power, and the glue liquid pipe is also provided with a sucking valve to realize the sucking function of the liquid. Furthermore, the glue storage container is also equipped with a liquid level detector for detecting the liquid level of the photoresist in the glue storage container. When the liquid level is detected to be too low, the staff replenishes the photoresist in time.

[0092] In this embodiment, the heating mechanism is preferably a heating plate 401, which is laid on the heating platform. The substrate 13 is heated and dried by the heating plate 401, so that the photoresist on it can be solidified to improve the adhesion and corrosion resistance of the photoresist to the surface of the substrate 13; wherein the heating plate 401 can be selected as needed, such as a resistance heating plate or an induction heating plate. Furthermore, an exhaust port is also provided at a position near the heating plate 401 on the coating platform, and the exhaust port is connected to an exhaust fan through an exhaust pipe to extract the gas around the heating plate 401, thereby reducing the interference of gas molecules on the processing process of the substrate 13, preventing impurities such as dust in the air from being adsorbed to the surface of the substrate 13, and improving the quality of the finished product.

[0093] In this embodiment, the exposure mechanism in the exposure chamber 5 is preferably an exposure machine, and the exposure machine is arranged on the exposure platform; wherein, the exposure machine mainly includes a light source system and a light source projection system, etc., which is a mature existing technology in this field and will not be repeated in this embodiment.

[0094] In this embodiment, if Figure 7 and Figure 8 As shown, the developing mechanism mainly includes a developing arm 603 and a fixing arm 604; wherein, a developing nozzle 605 is arranged on the developing arm 603, and the developing nozzle 605 is connected to a developing liquid storage container through a developing liquid inlet pipe, and the developing liquid storage container is used to store the developing liquid, and the developing nozzle 605 can spray the developing liquid on the substrate 13; the developing arm 603 is slidably arranged on the developing platform 601, and the developing arm 603 is connected to a developing arm driving mechanism, and the developing arm driving mechanism can drive the developing arm 603 to slide on the developing platform 601;

[0095] A fixing nozzle is arranged on the fixing arm 604, and the fixing nozzle is connected to a fixing liquid storage container through a fixing liquid inlet pipe. The fixing liquid storage container is used to store the fixing liquid, and the fixing nozzle can spray the fixing liquid on the substrate 13; the fixing arm 604 is slidably arranged on the developing platform, and the fixing arm 604 is connected to a fixing arm driving mechanism, and the fixing arm driving mechanism can drive the fixing arm 604 to slide on the developing platform.

[0096] Furthermore, it should be noted that two parallel slide rails are provided on opposite sides of the developing platform 601, and the developing arm 603 and the fixing arm 604 are respectively slidably provided on the two slide rails; and the developing arm driving mechanism and the fixing arm driving mechanism can be selected as needed, for example, a linear driving mechanism such as a screw motor or a hydraulic rod can be used. Among them, the structures of the developing arm 603 and the fixing arm 604 are similar, and the developing arm 603 is taken as an example for explanation, as shown in FIG. Figure 8 As shown, the developing arm 603 may be an inverted L-shaped structure, with a nozzle bracket disposed on the top thereof, and a plurality of developing nozzles 605 disposed on the nozzle bracket to expand the spraying range of the developing solution.

[0097] In this embodiment, it should be noted that the developer and the fixer are both mature existing technologies in the field and can be selected as needed. For example, the developer can be a sodium hydroxide solution, and the fixer can be deionized water.

[0098] In this embodiment, the developer storage container and the fixer storage container can be selected as needed, such as a liquid storage tank or a liquid storage barrel, and the developer and the fixer are supplied in a pressure tank, which is similar to the supply method of the cleaning liquid, and will not be described in detail in this embodiment. Among them, the developer storage container and the fixer storage container can be provided with two sets, one for backup and one for use, to achieve non-stop liquid replenishment. Furthermore, the developer inlet pipe and the fixer inlet pipe are also equipped with a back-suction valve to achieve a back-suction function.

[0099] In this embodiment, a developing tank 602 is further provided on the developing platform 601, and a carrying mechanism is provided in the developing tank 602, and the carrying mechanism is used to carry the substrate 13 and drive the substrate 13 to rotate to ensure that the entire surface of the substrate 13 is evenly sprayed with the developer and the fixer; and a pin mechanism 310 is provided on the carrying mechanism, and the pin mechanism 310 is used to lift the substrate 13 to facilitate the taking and placing of the substrate 13.

[0100] The bottom of the developing tank 602 is also provided with a waste outlet, which is connected to a collection bucket through a waste outlet pipe. The collection bucket is located below the developing tank 602. The waste liquid generated during the developing and fixing process is discharged into a dedicated collection bucket through the waste outlet by liquid gravity. The collection bucket is provided with an overflow sensor that can detect the level of the waste liquid and facilitate timely dumping of the collection bucket. A sealing cover is provided at the barrel mouth of the collection bucket for sealing. A pipeline joint can be provided on the sealing cover to connect with the waste outlet pipe.

[0101] In this embodiment, the bearing mechanism mainly includes a loading tray 309, a second drive motor and a third lifting mechanism, the output shaft 308 of the second drive motor is connected to the third lifting mechanism, the top of the third lifting mechanism is connected to the loading tray 309, the second drive motor can drive the loading tray 309 to rotate, the third lifting mechanism can drive the loading tray 309 to move up and down, and the ejector mechanism 310 is arranged on the loading tray 309; in this embodiment, two-stage lifting can be achieved through the third lifting mechanism and the ejector mechanism 310, which is suitable for the case where the lifting height requirement is high, and because the diameter of the ejector mechanism 310 is small, if the lifting stroke is set to be long, it may lead to poor stability. In this embodiment, a third lifting mechanism is provided, and the lifting stroke of the ejector mechanism 310 can be set to be short to improve stability. Among them, the third lifting mechanism and the ejector mechanism 310 can be selected as needed, such as a hydraulic rod, an electric push rod, etc.

[0102] Furthermore, when the lifting height requirement of the substrate 13 is relatively small, the third lifting mechanism may not be provided, and the output shaft 308 of the second driving motor is directly connected to the loading tray 309 .

[0103] In this embodiment, the carrier plate 309 is further provided with a second fixing mechanism for fixing the substrate 13 to prevent the substrate 13 from flying away during the rotation process; wherein the second fixing mechanism can be selected according to specific work needs, for example, it can include a plurality of clamping blocks, and the plurality of clamping blocks can clamp and fix the substrate 13 at the side edges thereof. Furthermore, a vacuum adsorption mechanism can also be provided on the carrier plate 309 to vacuum adsorb the substrate 13 to further ensure its stability.

[0104] In this embodiment, an exhaust port is provided above the cleaning chamber 2, the coating chamber 3, and the developing chamber 6, etc., and an FFU (Fan Filter Unit, i.e., a fan filter unit, mainly including a fan and a high-efficiency filter) is provided at the exhaust port. The FFU has two adjustable wind speeds and is provided with a pneumatic air valve to control the automatic exhaust switch. In this embodiment, the FFU is provided to discharge the gas from the above-mentioned cavities, reduce the influence of the gas on the processing of the substrate 13, and filter the gas to prevent the harmful gas generated during the working process from escaping directly.

[0105] Furthermore, in this embodiment, an adjustable air valve is also provided at the bottom of the main box body 100, which can control whether the equipment is exhausting air; wherein, a gas-liquid separation chamber is provided at the air inlet or outlet of the adjustable air valve, and a baffle, a wire mesh demister, a cyclone separator and other gas-liquid separation elements are installed in the gas-liquid separation chamber to achieve gas-liquid separation, so as to separate the waste liquid and gas generated during the working process.

[0106] In this embodiment, wind pressure gauges are provided in the loading chamber 1 and the processing chamber to detect wind pressure.

[0107] In this embodiment, the coating, developing and cleaning machine also includes a chemical cabinet 8 and an electric control cabinet 9. The electric control cabinet 9 is arranged in the main box 100, the controller is integrated in the electric control cabinet 9, and the electric control cabinet 9 is provided with a leakage protector to ensure the safety of electricity use; the chemical cabinet 8 is used to hold the chemicals needed during the work process, wherein the chemical cabinet 8 can also be arranged in the main box 100, or can be separately placed outside according to the actual working conditions.

[0108] In this embodiment, the coating, developing and cleaning all-in-one machine also includes a touch screen, an emergency stop switch, a fault and operating status indicator light, and a safety detection component, etc. The touch screen, the emergency stop switch, the standby button, the fault and operating status indicator light are all arranged on the front of the main box 100, and the touch screen is connected to the controller signal to facilitate the staff to control the equipment. The emergency stop switch is used to quickly cut off the power source of the equipment in an emergency, the standby button is used to put the equipment in standby mode, and the fault and operating status indicator light is used to display the working status of the equipment; the safety detection component is used to detect the working status of the equipment. When the equipment is in an abnormal state, the equipment stops working, and the fault and operating status indicator light changes to issue an alarm in time. Among them, the safety detection component can include a vacuum detection switch, a liquid leakage detection switch, etc. The vacuum detection switch can be used to detect the vacuum state of the vacuum equipment and the processing chamber, and the liquid leakage detection switch can detect whether the liquid storage container and the liquid supply pipeline are leaking.

[0109] The present invention uses specific examples to illustrate the principles and implementation methods of the present invention. The above examples are only used to help understand the method and core ideas of the present invention. At the same time, for those skilled in the art, according to the ideas of the present invention, there will be changes in the specific implementation methods and application scope. In summary, the content of this specification should not be understood as limiting the present invention.

Claims

1. A coating, developing and cleaning all-in-one machine, characterized in that: include: A main housing (100) is provided with a loading chamber (1) and a processing chamber in the main housing (100), wherein the processing chamber comprises a cleaning chamber (2), a coating chamber (3), a heating chamber (4), an exposure chamber (5) and a developing chamber (6) which are arranged in sequence, wherein the cleaning chamber (2) is arranged close to the loading chamber (1); a loading platform (101) is provided in the loading chamber (1), and a loading mechanism is provided on the loading platform (101) for loading a substrate (13); a cleaning platform is provided in the cleaning chamber (2), and a cleaning mechanism is provided on the cleaning platform for cleaning the substrate (13); ) for cleaning; a glue spreading platform is arranged in the glue spreading chamber (3), and a glue spreading mechanism is arranged on the glue spreading platform for spreading glue on the substrate (13); a heating platform is arranged in the heating chamber (4), and a heating mechanism is arranged on the heating platform for heating the substrate (13); an exposure platform is arranged in the exposure chamber (5), and an exposure mechanism is arranged on the exposure platform for exposing the substrate (13); a developing platform (601) is arranged on the developing chamber (6), and a developing mechanism is arranged on the developing platform (601) for developing the substrate (13); The substrate transport mechanism is used to drive the substrate (13) to be transported between the loading platform (101), the cleaning platform, the coating platform, the heating platform, the exposure platform and the developing platform (601).

2. The all-in-one coating, developing and cleaning machine according to claim 1, characterized in that: The substrate transport mechanism comprises a guide rail (7) and a transport mechanical arm (11); the guide rail (7) is arranged on one side of the processing chamber and extends in the direction from the loading chamber (1) to the developing chamber (6); the front end of the guide rail (7) is close to the loading chamber (1); the transport mechanical arm (11) is slidably arranged on the guide rail (7); a fork plate (12) is arranged on the transport mechanical arm (11); the transport mechanical arm (11) can drive the fork plate (12) to extend to the bottom of the substrate (13) so as to lift the substrate (13) for transport; Among them, the loading chamber (1), the cleaning chamber (2), the glue spreading chamber (3), the heating chamber (4), the exposure chamber (5) and the developing chamber (6) are all provided with automatic opening and closing doors on the side close to the guide rail (7) for allowing the transport robot arm (11) to pass through.

3. The all-in-one coating, developing and cleaning machine according to claim 2, characterized in that: A first sensing device is also provided at any of the automatic opening and closing doors, and the first sensing device is used to sense the transport robot arm (11), and the first sensing device is connected to a controller signal; when the first sensing device senses the transport robot arm (11), and the transport robot arm (11) needs to pass through the corresponding automatic opening and closing door, the controller controls the corresponding automatic opening and closing door to open so that the transport robot arm (11) can pass through.

4. The all-in-one coating, developing and cleaning machine according to any one of claims 1 to 3, characterized in that: The loading platform (101), the cleaning platform, the glue spreading platform, the heating platform, the exposure platform and the developing platform (601) are also provided with a second sensing device, the second sensing device is used to sense the substrate (13), and the second sensing device is connected to the controller signal. When the second sensing device senses that the substrate (13) is in place, the controller controls the corresponding loading mechanism, the cleaning mechanism, the glue spreading mechanism, the heating mechanism, the exposure mechanism or the developing mechanism to operate.

5. The all-in-one coating, developing and cleaning machine according to claim 1, characterized in that: The loading mechanism comprises a loading platform (102), a first lifting mechanism and a first fixing mechanism (103); the bottom of the loading platform (102) is mounted on the top of the loading platform (101) via the first lifting mechanism; the loading platform (102) is used to support the substrate (13); and the loading platform (102) is provided with the first fixing mechanism (103) for fixing the substrate (13).

6. The all-in-one coating, developing and cleaning machine according to claim 5, characterized in that: The loading mechanism also includes a flipping mechanism, which includes an active rotating mechanism and a passive rotating mechanism. The active rotating mechanism and the passive rotating mechanism are respectively located on two sides of the loading platform (102) and are used to clamp the two sides of the substrate (13) and drive the substrate (13) to flip.

7. The all-in-one coating, developing and cleaning machine according to claim 6, characterized in that: The active rotating mechanism comprises a main rotating base (104), a first linear driving mechanism, a first fixed seat (105), a driving shaft, a first driving motor (106) and a first substrate clamping tool (107); the main rotating base (104) is arranged on the loading platform (101), and the first fixed seat (105) is slidably arranged on the main rotating base (104); the active shaft is rotatably mounted on the first fixed seat (105); an end of the active shaft away from the passive rotating mechanism is connected to the first driving motor (106); an end of the active shaft close to the passive rotating mechanism is connected to the first substrate clamping tool (107); the first linear driving mechanism is connected to the first fixed seat (105) and can drive the first fixed seat (105) to slide close to or away from the passive rotating mechanism; The passive rotating mechanism comprises a secondary rotating base (108), a second linear driving mechanism, a second fixed seat (110), a driven shaft (111) and a second substrate clamping tool (109); the secondary rotating base (108) is arranged on the loading platform (101), and the second fixed seat (110) is arranged on the secondary rotating base (108); the driven shaft (111) is rotatably mounted on the second fixed seat (110); one end of the driven shaft (111) close to the active rotating mechanism is connected to the second substrate clamping tool (109); the first substrate clamping tool (107) and the second substrate clamping tool (109) are respectively used to clamp two sides of the substrate (13); the second linear driving mechanism is connected to the second fixed seat (110) and can drive the second fixed seat (110) to slide close to or away from the active rotating mechanism.

8. The all-in-one coating, developing and cleaning machine according to claim 1, characterized in that: The cleaning mechanism comprises a cleaning mechanical arm (202) and a spray nozzle (203); the cleaning mechanical arm (202) is arranged on the cleaning platform; the cleaning mechanical arm (202) is provided with the spray nozzle (203); the spray nozzle (203) is connected to a liquid storage container via a liquid supply pipe; the liquid storage container is used to store cleaning liquid; the spray nozzle (203) can spray the cleaning liquid onto the surface of the substrate (13) to clean the substrate (13); The cleaning mechanism also includes a drying component, which includes an air outlet nozzle (204). The air outlet nozzle (204) is arranged on the cleaning robot arm (202) and is connected to an air source via an air supply pipe. The air outlet nozzle (204) can blow air toward the substrate (13) to dry the substrate (13).

9. The all-in-one coating, developing and cleaning machine according to claim 8, characterized in that: The cleaning platform is also provided with a cleaning tank (201), a carrying mechanism is provided in the cleaning tank (201), the carrying mechanism is used to carry the substrate (13) and drive the substrate (13) to rotate, and a pin mechanism (310) is provided on the carrying mechanism, the pin mechanism (310) is used to lift the substrate (13); The bottom of the cleaning tank (201) is also provided with a liquid discharge port, the liquid discharge port is connected to a waste liquid bucket, and an overflow position sensor is provided on the waste liquid bucket.

10. The all-in-one coating, developing and cleaning machine according to claim 1, characterized in that: The glue-splitting platform is also provided with a glue-splitting groove (301), and a bearing mechanism is provided in the glue-splitting groove (301), and the bearing mechanism is used to bear the substrate (13) and drive the substrate (13) to rotate, and a pin mechanism (310) is provided on the bearing mechanism, and the pin mechanism (310) is used to lift the substrate (13); A glue-splitting scraper is also provided in the glue-splitting groove (301), and the glue-splitting scraper is connected to a scraper driving mechanism, and the scraper driving mechanism can drive the glue-splitting scraper to move up and down and rotate; during the glue-splitting process, the glue-splitting scraper is located above the supporting mechanism, and a gap is left between the glue-splitting scraper and the substrate (13) on the supporting mechanism, and the glue-splitting scraper is used to scrape the photoresist on the substrate (13) evenly; The glue-splitting platform is also provided with a glue-splitting cover (307), which can be buckled on the top of the glue-splitting groove (301), and the glue-splitting cover (307) is connected to a second lifting mechanism, which can drive the glue-splitting cover (307) to move up and down; The bottom of the glue leveling tank (301) is also provided with a glue discharge port, the glue discharge port is connected to a waste glue barrel, and the waste glue barrel is provided with an overflow position sensor.

11. The all-in-one coating, developing and cleaning machine according to claim 10, characterized in that: The glue spreading mechanism comprises a glue spreading arm (302), a glue arm support and a glue arm driving mechanism, wherein the glue arm support is arranged on the glue spreading platform, the glue arm driving mechanism is arranged on the glue arm support and connected to the glue spreading arm (302), and the glue arm driving mechanism can drive the glue spreading arm (302) to move up and down and rotate; The glue spreading arm (302) is provided with a glue liquid channel running through it along its length direction, and a glue liquid outlet is provided at one end of the glue spreading arm (302), the glue liquid outlet is connected to the glue liquid channel, the other end of the glue spreading arm (302) is connected to the glue arm driving mechanism, and is connected to a glue storage container via a glue liquid tube, the glue storage container is used to store photoresist, and the glue spreading arm (302) is used to apply the photoresist to the substrate (13).

12. The all-in-one coating, developing and cleaning machine according to claim 1, characterized in that: The heating mechanism is a heating plate (401), and the heating plate (401) is laid on the heating platform; The exposure mechanism is an exposure machine, and the exposure machine is arranged on the exposure platform.

13. The all-in-one coating, developing and cleaning machine according to claim 1, characterized in that: The developing mechanism comprises a developing arm (603) and a fixing arm (604); The developing arm (603) is provided with a developing nozzle (605), the developing nozzle (605) is connected to a developing liquid storage container via a developing liquid inlet pipe, the developing liquid storage container is used to store the developing liquid, and the developing nozzle (605) can spray the developing liquid onto the substrate (13); the developing arm (603) is slidably arranged on the developing platform (601), and the developing arm (603) is connected to a developing arm driving mechanism, and the developing arm driving mechanism can drive the developing arm (603) to slide on the developing platform (601); A fixing nozzle is arranged on the fixing arm (604), and the fixing nozzle is connected to a fixing liquid storage container through a fixing liquid inlet pipe. The fixing liquid storage container is used to store the fixing liquid, and the fixing nozzle can spray the fixing liquid onto the substrate (13); the fixing arm (604) is slidably arranged on the developing platform, and the fixing arm (604) is connected to a fixing arm driving mechanism, and the fixing arm driving mechanism can drive the fixing arm (604) to slide on the developing platform.

14. The all-in-one coating, developing and cleaning machine according to claim 13, characterized in that: The developing platform (601) is also provided with a developing tank (602), a carrying mechanism is provided in the developing tank (602), the carrying mechanism is used to carry the substrate (13) and drive the substrate (13) to rotate, and a pin mechanism (310) is provided on the carrying mechanism, the pin mechanism (310) is used to lift the substrate (13); The bottom of the developing tank (602) is also provided with a waste outlet, the waste outlet is connected to a collecting bucket, and an overflow position sensor is provided on the collecting bucket.

15. The all-in-one coating, developing and cleaning machine according to claim 9, 10 or 14, characterized in that: The carrying mechanism comprises a loading tray (309), a second driving motor and a third lifting mechanism, the output shaft (308) of the second driving motor is connected to the third lifting mechanism, the top of the third lifting mechanism is connected to the loading tray (309), the second driving motor can drive the loading tray (309) to rotate, the third lifting mechanism can drive the loading tray (309) to move up and down, and the loading tray (309) is also provided with a second fixing mechanism for fixing the substrate (13); The ejector mechanism (310) is arranged on the loading tray (309).

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