MoTiNi target material and preparation method and application thereof

Abstract

The invention relates to a MoTiNi target material and a preparation method and application thereof, the preparation method of the MoTiNi target material comprises the following steps: (1) Mo powder, Ti powder and Ni powder are sequentially subjected to premixing treatment and powder mixing treatment, obtained MoTiNi alloy powder is subjected to cold isostatic pressing treatment, and a MoTiNi alloy blank is obtained; and (2) the MoTiNi alloy blank obtained in the step (1) is sequentially subjected to splicing, degassing, first hot isostatic pressing treatment and second hot isostatic pressing treatment, and the MoTiNi target material is obtained after machining. According to the preparation method, the cold isostatic pressing and sectional type hot isostatic pressing treatment are combined, so that the prepared MoTiNi target material has relatively high density and purity, large-size batch production can be realized, and the high-performance requirement of a flat panel display panel can be met.

Description

Technical Field

[0001] The invention relates to the technical field of target material preparation, and in particular to a MoTiNi target material and a preparation method and application thereof. Background Art

[0002] At present, the improvement of the size and quality of flat display panels has put forward higher requirements on the purity, density and size of the target material. The performance of pure Mo target material is good, but the corrosion resistance and density of the film sputtered from pure Mo target material need to be improved. In the prior art, metals such as Ti, Ni, Nb, W, and Ta are usually added to Mo to improve the corrosion resistance and density of the target material. However, the size of the target material for flat display panels is usually large, and the traditional rolling method to expand the size of the target material is costly and not suitable for large-scale production. Therefore, it is of great significance to prepare a large-sized, high-purity and high-density MoTiNi target material.

[0003] CN 104532201A discloses a method for preparing a molybdenum-titanium alloy sputtering target plate, wherein Mo powder and Ti powder are mixed evenly and then cold isostatically pressed, a preform is evacuated and then sintered in a helium atmosphere to obtain a sintered blank, and finally machined into a finished product. The molybdenum-titanium alloy target material obtained by this method is conventionally obtained, and the size is limited, which is difficult to meet the production of large-size Mo alloy targets.

[0004] CN 115637412A discloses a molybdenum alloy target and its manufacturing process. The mass percentage of each component of the molybdenum alloy target formula is: Mo 55-65%, Ni 15-25%, Ti 15-25%, Re 0.1-5%, W 0.1-2%, Nb 0.1-2%, Mn 0.1-0.2%, Co 0.1-0.2%, cold isostatic pressing is used to press the embryo, then hot isostatic pressing is used for sintering, and then mechanical processing and binding. The manufacturing process provided by the invention can improve the temperature resistance, oxidation resistance and etching performance of the molybdenum alloy target, but the purity, density and other properties of the target need to be improved.

[0005] CN 103740979A discloses a method for preparing a high-density, large-size, and high-uniformity molybdenum-titanium alloy target material, comprising the following steps: 1) adding a solvent and a binder to Mo powder and Ti powder and grinding them into slurry; 2) spraying and granulating the slurry with a sprayer, wherein the inlet temperature is 250-300°C and the nozzle speed is 8000-12000rpm to obtain Mo-Ti composite powder, and pressing the powder into a blank with regular size; 3) loading a plurality of blanks into a sheath, and filling 50-250μm Mo-Ti composite powder into the space between adjacent blanks to form a uniform composite powder layer, wherein the thickness of the composite powder layer is 0.5-1mm, and ensuring that the gap between the inner wall of the sheath on any side and the outer wall of the adjacent blank is less than or equal to 0.5mm; 4) welding and degassing the sheath and then hot isostatic pressing the sheath, wherein the processing conditions are 750-900°C, 120-160MPa, and the heat preservation and pressure holding time is 4-6h, and then the sheath is removed. This method improves the performance of the target material only by adding metallic Ti, and has certain limitations on the performance improvement effects such as the purity and density of the target material.

[0006] Therefore, in view of the shortcomings of the prior art, it is necessary to provide a large-size, high-density and high-purity MoTiNi target. Summary of the invention

[0007] The object of the present invention is to provide a MoTiNi target material and a preparation method and application thereof. The MoTiNi target material prepared by the preparation method has high density and purity, can be mass-produced in large sizes, and can meet the high performance requirements of a flat display panel.

[0008] In order to achieve the purpose of the invention, the present invention adopts the following technical solutions:

[0009] In a first aspect, the present invention provides a method for preparing a MoTiNi target, the preparation method comprising the following steps:

[0010] (1) premixing and mixing Mo powder, Ti powder and Ni powder in sequence, and cold isostatic pressing the obtained MoTiNi alloy powder to obtain a MoTiNi alloy billet;

[0011] (2) The MoTiNi alloy billet obtained in step (1) is subjected to splicing, degassing, a first hot isostatic pressing treatment, and a second hot isostatic pressing treatment in sequence, and the MoTiNi target is obtained after machining.

[0012] The preparation method of the MoTiNi target material provided by the present invention comprises the following steps: firstly, the raw material powder is premixed so that the prepared MoTiNi alloy powder is evenly dispersed, which is beneficial to the improvement of the quality of the finished product; and the cold isostatic pressing is combined with the segmented hot isostatic pressing treatment so that the prepared MoTiNi target material has high density and purity, can be mass-produced in large sizes, and can meet the high performance requirements of a flat display panel.

[0013] Preferably, the average particle size of the Mo powder in step (1) is 5-8 μm, for example, 5 μm, 5.5 μm, 6 μm, 7 μm or 8 μm, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0014] Preferably, the average particle size of the Ti powder in step (1) is 10-300 μm, for example, 10 μm, 50 μm, 100 μm, 200 μm or 300 μm, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0015] Preferably, the average particle size of the Ni powder in step (1) is 5-10 μm, for example, 5 μm, 6 μm, 8 μm, 9 μm or 10 μm, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0016] Preferably, the premixing process and powder mixing process in step (1) are both carried out in an argon atmosphere.

[0017] Preferably, the premixing process and the powder mixing process in step (1) are both carried out in a three-dimensional powder mixer.

[0018] Preferably, the premixing time in step (1) is 3-6 hours, for example, 3 hours, 3.5 hours, 4 hours, 5 hours or 6 hours, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0019] Preferably, the time for the powder mixing treatment in step (1) is 24-48 hours, for example, 24 hours, 30 hours, 36 hours, 42 hours or 48 hours, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0020] Preferably, the pressure of the cold isostatic pressing treatment in step (1) is 200-300 MPa, for example, 200 MPa, 220 MPa, 250 MPa, 280 MPa or 300 MPa, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0021] Preferably, the cold isostatic pressing treatment time in step (1) is 10-20 min, for example, 10 min, 12 min, 15 min, 18 min or 20 min, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0022] Preferably, the length after splicing in step (2) is ≥ 2 m, for example, it can be 2 m, 3 m, 4 m, 5 m or 6 m, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0023] Preferably, after the splicing in step (2) and before degassing, the method further includes placing the MoTiNi alloy billet into a stainless steel sheath.

[0024] Preferably, the degassing temperature in step (2) is 500-600°C, for example, 500°C, 520°C, 550°C, 580°C or 600°C, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0025] Preferably, the degassing time in step (2) is 24-36 hours, for example, 24 hours, 28 hours, 32 hours or 36 hours, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0026] Preferably, the vacuum degree of the stainless steel sheath during the degassing in step (2) is 1×10 -3 Pa to 1×10 -2 Pa, for example, can be 1×10 -3 Pa, 2×10 -3 Pa, 5×10 -3 Pa, 8×10 -3 Pa or 1×10 -2 Pa, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0027] Preferably, the temperature of the first hot isostatic pressing treatment in step (2) is 850-1000°C, for example, 850°C, 900°C, 950°C, 980°C or 1000°C, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0028] Preferably, the pressure of the first hot isostatic pressing treatment in step (2) is 120-180 MPa, for example, 120 MPa, 130 MPa, 150 MPa, 160 MPa or 180 MPa, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0029] Preferably, the time for the first hot isostatic pressing treatment in step (2) is 1-3 hours, for example, 1 hour, 1.5 hours, 2 hours, 2.5 hours or 3 hours, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0030] Preferably, the temperature of the second hot isostatic pressing treatment in step (2) is 900-1050°C, for example, it can be 900°C, 920°C, 950°C, 1000°C or 1050°C, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0031] Preferably, the pressure of the second hot isostatic pressing treatment in step (2) is 120-180 MPa, for example, 120 MPa, 130 MPa, 150 MPa, 160 MPa or 180 MPa, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0032] Preferably, the time for the second hot isostatic pressing treatment in step (2) is 2-3 h, for example, 2 h, 2.2 h, 2.5 h, 2.8 h or 3 h, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0033] As a preferred technical solution of the preparation method of the present invention, the preparation method comprises the following steps:

[0034] (1) Premixing Mo powder with an average particle size of 5-8 μm, Ti powder with an average particle size of 10-300 μm, and Ni powder with an average particle size of 5-10 μm in a three-dimensional powder mixer with an argon atmosphere for 3-6 h and mixing for 24-48 h; cold isostatic pressing the obtained MoTiNi alloy powder at 200-300 MPa for 10-20 min to obtain a MoTiNi alloy billet;

[0035] (2) The MoTiNi alloy billets obtained in step (1) are spliced ​​to a length of ≥2 m, and then placed in a stainless steel sheath for degassing at 500-600° C. for 24-36 h, wherein the vacuum degree of the stainless steel sheath is 1×10 -3 Pa to 1×10 -2 Pa; then a first hot isostatic pressing treatment is performed at 850-1000° C. and 120-180 MPa for 1-3 h and a second hot isostatic pressing treatment is performed at 900-1050° C. and 120-180 MPa for 2-3 h, and the MoTiNi target is obtained after machining.

[0036] In a second aspect, the present invention provides a MoTiNi target material, wherein the MoTiNi target material is prepared by the preparation method of the MoTiNi target material described in the first aspect;

[0037] In terms of atomic percentage, the MoTiNi target material comprises: 60-70 at% Mo, 30-40 at% Ti and Ni; the atomic ratio of Ti to Ni is (1.5-2):1.

[0038] Ti and Ni in the MoTiNi target material exist in the form of TiNi solid solution.

[0039] The atomic percentage of Mo in the MoTiNi target is 60-70 at%, for example, 60 at%, 62 at%, 65 at%, 68 at% or 70 at%, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0040] The total atomic percentage of Ti and Ni in the MoTiNi target is 30-40 at%, for example, 30 at%, 32 at%, 35 at%, 38 at% or 40 at%, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0041] The atomic percentages of Mo, Ti and Ni in the MoTiNi target material need to be limited within a reasonable range. Exceeding the limited range will have an adverse effect on the performance of the MoTiNi target material.

[0042] The atomic ratio of Ti to Ni is (1.5-2):1, for example, it can be 1.5:1, 1.6:1, 1.8:1, 1.9:1 or 2:1, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0043] In a third aspect, the present invention provides an application of the MoTiNi target material as described in the second aspect, wherein the MoTiNi target material is used in the field of flat display panels.

[0044] Compared with the prior art, the present invention has the following beneficial effects:

[0045] The preparation method of the MoTiNi target material provided by the present invention comprises the following steps: firstly, premixing raw material powders is performed to make the prepared MoTiNi alloy powders dispersed evenly, which is beneficial to improving the quality of the finished product; and combining cold isostatic pressing with segmented hot isostatic pressing treatment is adopted to make the prepared MoTiNi target material have high density and purity, wherein the density can reach 100% and the purity can reach 99.99%, and the target material can be mass-produced in large sizes, and can meet the high performance requirements of a flat display panel. DETAILED DESCRIPTION

[0046] The technical solution of the present invention is further described below by specific implementation methods. It should be understood by those skilled in the art that the embodiments are only to help understand the present invention and should not be regarded as specific limitations of the present invention.

[0047] Example 1

[0048] This embodiment provides a MoTiNi target material, which includes, in atomic percentage, 65 at % Mo, 35 at % Ti and 35 at % Ni; the atomic ratio of Ti to Ni is 1.8:1.

[0049] The preparation method of the MoTiNi target material comprises the following steps:

[0050] (1) Premixing Mo powder with an average particle size of 6 μm, Ti powder with an average particle size of 100 μm, and Ni powder with an average particle size of 8 μm in a three-dimensional powder mixer with an argon atmosphere for 4 h and mixing for 36 h; the obtained MoTiNi alloy powder was subjected to cold isostatic pressing at 250 MPa for 15 min to obtain a MoTiNi alloy billet;

[0051] (2) The MoTiNi alloy billets obtained in step (1) were spliced ​​to a length of 2 m, and then placed in a stainless steel sheath for degassing at 550° C. for 32 h. During the degassing, the vacuum degree of the stainless steel sheath was 5×10 -3 Pa; then a first hot isostatic pressing treatment was performed at 900° C. and 150 MPa for 2 h and a second hot isostatic pressing treatment was performed at 1000° C. and 150 MPa for 2.5 h, and the MoTiNi target was obtained after machining.

[0052] Example 2

[0053] This embodiment provides a MoTiNi target material, which includes, in atomic percentage, 60 at % Mo and 40 at % Ti and Ni; the atomic ratio of Ti to Ni is 1.5:1.

[0054] The preparation method of the MoTiNi target material comprises the following steps:

[0055] (1) Premixing Mo powder with an average particle size of 5 μm, Ti powder with an average particle size of 10 μm, and Ni powder with an average particle size of 5 μm in a three-dimensional powder mixer with an argon atmosphere for 3 h and mixing for 24 h; the obtained MoTiNi alloy powder was subjected to cold isostatic pressing at 200 MPa for 20 min to obtain a MoTiNi alloy billet;

[0056] (2) The MoTiNi alloy billets obtained in step (1) were spliced ​​to a length of 3 m, and then placed in a stainless steel sheath for degassing at 500° C. for 36 h. During the degassing, the vacuum degree of the stainless steel sheath was 1×10 -2 Pa; then a first hot isostatic pressing treatment was performed at 850°C and 120MPa for 3h and a second hot isostatic pressing treatment was performed at 900°C and 120MPa for 3h, and the MoTiNi target was obtained after machining.

[0057] Example 3

[0058] This embodiment provides a MoTiNi target material. In terms of atomic percentage, the MoTiNi target material includes: 70 at % Mo, 30 at % Ti and 30 at % Ni; the atomic ratio of Ti to Ni is 2:1.

[0059] The preparation method of the MoTiNi target material comprises the following steps:

[0060] (1) Premixing Mo powder with an average particle size of 8 μm, Ti powder with an average particle size of 300 μm, and Ni powder with an average particle size of 10 μm in a three-dimensional powder mixer with an argon atmosphere for 6 h and mixing for 48 h; the obtained MoTiNi alloy powder was subjected to cold isostatic pressing at 300 MPa for 10 min to obtain a MoTiNi alloy billet;

[0061] (2) The MoTiNi alloy billets obtained in step (1) were spliced ​​to a length of 4 m, and then placed in a stainless steel sheath for degassing at 600° C. for 24 h. During the degassing, the vacuum degree of the stainless steel sheath was 1×10 -3 Pa; then a first hot isostatic pressing treatment was performed at 1000° C. and 180 MPa for 1 h and a second hot isostatic pressing treatment was performed at 1050° C. and 180 MPa for 2 h, and the MoTiNi target was obtained after machining.

[0062] Example 4

[0063] This embodiment provides a MoTiNi target material. The difference between the preparation method of the MoTiNi target material and that of Embodiment 1 is that, except that the degassing temperature in step (1) is adjusted to 450° C., the rest is the same as that of Embodiment 1.

[0064] Example 5

[0065] This embodiment provides a MoTiNi target material. The difference between the preparation method of the MoTiNi target material and that of Embodiment 1 is that, except that the degassing temperature in step (1) is adjusted to 650° C., the rest is the same as that of Embodiment 1.

[0066] Example 6

[0067] This embodiment provides a MoTiNi target material. The difference between the preparation method of the MoTiNi target material and that of Embodiment 1 is that, except that the pressure of the cold isostatic pressing treatment in step (1) is adjusted to 180 MPa, the rest is the same as that of Embodiment 1.

[0068] Example 7

[0069] This embodiment provides a MoTiNi target material. The difference between the preparation method of the MoTiNi target material and that of Embodiment 1 is that, except that the pressure of the cold isostatic pressing treatment in step (1) is adjusted to 320 MPa, the rest is the same as that of Embodiment 1.

[0070] Example 8

[0071] This embodiment provides a MoTiNi target material. The difference between the preparation method of the MoTiNi target material and that of Embodiment 1 is that, except that the temperature of the second hot isostatic pressing treatment in step (2) is adjusted to 850° C., the rest is the same as that of Embodiment 1.

[0072] Example 9

[0073] This embodiment provides a MoTiNi target material. The difference between the preparation method of the MoTiNi target material and that of Embodiment 1 is that, except that the temperature of the second hot isostatic pressing treatment in step (2) is adjusted to 1100° C., the rest is the same as that of Embodiment 1.

[0074] Comparative Example 1

[0075] This comparative example provides a MoTiNi target material. The difference between the preparation method of the MoTiNi target material and that of Example 1 is that there is no premixing step in step (1), and the rest is the same as that of Example 1.

[0076] Comparative Example 2

[0077] This comparative example provides a MoTiNi target material. The difference between the preparation method of the MoTiNi target material and that of Example 1 is that the first hot isostatic pressing treatment and the second hot isostatic pressing treatment in step (2) are adjusted to a single hot isostatic pressing treatment with a temperature of 1000°C, a pressure of 150 MPa, and a time of 4.5 h. The rest is the same as that of Example 1.

[0078] Comparative Example 3

[0079] This comparative example provides a MoTiNi target material, which is different from Example 1 in that the atomic percentage of Mo in the MoTiNi target material is adjusted to 55 at %, and the atomic percentage of Ti and Ni is adjusted to 45 at %, and the rest is the same as Example 1.

[0080] Comparative Example 4

[0081] This comparative example provides a MoTiNi target material, which is different from Example 1 in that the atomic percentage of Mo in the MoTiNi target material is adjusted to 75 at %, and the atomic percentage of Ti and Ni is adjusted to 25 at %, and the rest is the same as Example 1.

[0082] Comparative Example 5

[0083] This comparative example provides a MoTiNi target material, which is different from Example 1 in that the atomic ratio of Ti to Ni is adjusted to 1:1, and the rest is the same as Example 1.

[0084] Comparative Example 6

[0085] This comparative example provides a MoTiNi target material, which is different from Example 1 in that the atomic ratio of Ti to Ni is adjusted to 2.5:1, and the rest is the same as Example 1.

[0086] The MoTiNi target materials provided in Examples 1-9 and Comparative Examples 1-6 were subjected to a density test using the Archimedean drainage method and a purity test using glow discharge mass spectrometry. The results are shown in Table 1.

[0087] Table 1

[0088]

[0089]

[0090] It can be seen from Table 1 that the MoTiNi target material prepared by the preparation method provided by the present invention has high density and purity and can be mass-produced in large sizes;

[0091] By comparing Example 1 with Examples 4-9, it can be seen that if the degassing temperature or the cold isostatic pressing temperature or the second hot isostatic pressing temperature is too low, the density and purity of the MoTiNi target will be reduced; if the degassing temperature or the cold isostatic pressing temperature or the second hot isostatic pressing temperature is too high, the density and purity of the MoTiNi target will not be significantly increased, and the energy consumption cost will be increased;

[0092] By comparing Example 1 with Comparative Example 1, it can be seen that without premixing, the dispersion degree of the raw material powder will be significantly reduced, thereby reducing the density of the finished product; by comparing Example 1 with Comparative Example 2, it can be seen that the use of one-stage hot isostatic pressing treatment, compared with two-stage hot isostatic pressing treatment, will reduce the density of the MoTiNi target; by comparing Example 1 with Comparative Examples 3-6, it can be seen that when the atomic percentage of each element in the MoTiNi target exceeds the specified range, the density and purity of the MoTiNi target will be reduced, or the comprehensive properties of the MoTiNi target such as corrosion resistance and heat resistance will be negatively affected.

[0093] In summary, the preparation method of the MoTiNi target material provided by the present invention first premixes the raw material powder so that the prepared MoTiNi alloy powder is evenly dispersed, which is beneficial to improving the quality of the finished product; a combination of cold isostatic pressing and segmented hot isostatic pressing is adopted, so that the prepared MoTiNi target material has high density and purity, the density can reach 100%, and the purity can reach 99.99%, and can be mass-produced in large sizes, which can meet the high performance requirements of flat display panels.

[0094] The above description is only a specific implementation mode of the present invention, but the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily thought of by those skilled in the art within the technical scope disclosed by the present invention are within the protection scope and disclosure scope of the present invention.

Claims

1. A method for preparing a MoTiNi target, characterized in that: The preparation method comprises the following steps: (1) premixing and mixing Mo powder, Ti powder and Ni powder in sequence, and cold isostatic pressing the obtained MoTiNi alloy powder to obtain a MoTiNi alloy billet; (2) The MoTiNi alloy billet obtained in step (1) is subjected to splicing, degassing, a first hot isostatic pressing treatment, and a second hot isostatic pressing treatment in sequence, and the MoTiNi target is obtained after machining.

2. The preparation method according to claim 1, characterized in that: The average particle size of the Mo powder in step (1) is 5-8 μm; Preferably, the average particle size of the Ti powder in step (1) is 10-300 μm; Preferably, the average particle size of the Ni powder in step (1) is 5-10 μm.

3. The preparation method according to claim 1 or 2, characterized in that: The premixing process and powder mixing process in step (1) are both carried out in an argon atmosphere; Preferably, the premixing process and the powder mixing process in step (1) are both carried out in a three-dimensional powder mixer; Preferably, the premixing treatment time in step (1) is 3-6 hours; Preferably, the powder mixing process in step (1) is performed for 24-48 hours.

4. The preparation method according to any one of claims 1 to 3, characterized in that The pressure of the cold isostatic pressing treatment in step (1) is 200-300 MPa; Preferably, the cold isostatic pressing treatment time in step (1) is 10-20 minutes.

5. The preparation method according to any one of claims 1 to 4, characterized in that: The length after splicing in step (2) is ≥ 2m; Preferably, after the splicing in step (2) and before the degassing, the process further comprises placing the MoTiNi alloy billet into a stainless steel sheath; Preferably, the degassing temperature in step (2) is 500-600°C; Preferably, the degassing time in step (2) is 24-36 hours; Preferably, the vacuum degree of the stainless steel sheath during the degassing in step (2) is 1×10 -3 Pa to 1×10 -2 Pa.

6. The preparation method according to any one of claims 1 to 5, characterized in that: Step (2) The temperature of the first hot isostatic pressing treatment is 850-1000° C.; Preferably, the pressure of the first hot isostatic pressing treatment in step (2) is 120-180 MPa; Preferably, the time for the first hot isostatic pressing treatment in step (2) is 1-3 hours.

7. The preparation method according to any one of claims 1 to 6, characterized in that: Step (2) The temperature of the second hot isostatic pressing treatment is 900-1050° C. Preferably, the pressure of the second hot isostatic pressing treatment in step (2) is 120-180 MPa; Preferably, the time for the second hot isostatic pressing treatment in step (2) is 2-3 hours.

8. The preparation method according to any one of claims 1 to 7, characterized in that: The preparation method comprises the following steps: (1) Premixing Mo powder with an average particle size of 5-8 μm, Ti powder with an average particle size of 10-300 μm, and Ni powder with an average particle size of 5-10 μm in a three-dimensional powder mixer with an argon atmosphere for 3-6 h and mixing for 24-48 h; cold isostatic pressing the obtained MoTiNi alloy powder at 200-300 MPa for 10-20 min to obtain a MoTiNi alloy billet; (2) The MoTiNi alloy billets obtained in step (1) are spliced ​​to a length of ≥2 m, and then placed in a stainless steel sheath for degassing at 500-600° C. for 24-36 h, wherein the vacuum degree of the stainless steel sheath is 1×10 -3 Pa to 1×10 -2 Pa; then a first hot isostatic pressing treatment is performed at 850-1000° C. and 120-180 MPa for 1-3 h and a second hot isostatic pressing treatment is performed at 900-1050° C. and 120-180 MPa for 2-3 h, and the MoTiNi target is obtained after machining.

9. A MoTiNi target material, characterized in that: The MoTiNi target is prepared by the method for preparing the MoTiNi target according to any one of claims 1 to 8; In terms of atomic percentage, the MoTiNi target material comprises: 60-70 at% Mo, 30-40 at% Ti and Ni; The atomic ratio of Ti to Ni is (1.5-2):

1.

10. An application of the MoTiNi target material as claimed in claim 9, characterized in that: The MoTiNi target material is used in the field of flat display panels.

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