Plasma air inlet structure and thin film deposition equipment

Abstract

The invention discloses a plasma gas inlet structure and thin film deposition equipment, the plasma gas inlet structure comprises a gas inlet base and a cooling water channel, the gas inlet base is used for allowing dissociation gas to enter, the gas inlet base comprises a pipe part and a seat part, the pipe part is arranged above the seat part, the gas inlet base is provided with the cooling water channel, and the cooling water channel is communicated with the pipe part. And the cooling water channel passes through the seat part and the pipe part. The cooling water channel is formed in the whole air inlet base and passes through the base part and the pipe part, so that a water cooling function is added to the pipe part, the influence of high-temperature corrosion caused by high-temperature remote plasma on the pipe part is reduced, particulate matter pollution is reduced, and the service life of parts is prolonged.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor technology, and in particular to a plasma gas inlet structure and a thin film deposition device. Background Art

[0002] In the semiconductor manufacturing process, especially for high-density plasma chemical vapor deposition (HDPCVD) equipment, it is crucial to maintain a pollution-free environment, because any tiny impurities may affect the performance and reliability of the final product. The clean recipe is one of the key steps to ensure this environment. It uses active species generated by a remote plasma source (RPS) to remove residues on the chamber wall to ensure purity during the deposition process.

[0003] However, when performing the cleaning process, the fluoride ions dissociated from the RPS flow through the RPS tube (Tube) below, the top module (top block), and enter the chamber from the back of the ceramic nozzle (baffle), which brings significant technical challenges. Specifically, when high-temperature fluoride ions pass through the RPS tube, since there is a water cooling system designed inside the top block, it can theoretically absorb some of the heat to protect the equipment from damage. However, in actual operation, it was found that the water cooling efficiency of the top block was not enough to cope with the large amount of heat load brought by the fluoride ions, causing the RPS tube to be in a high temperature state for a long time. This continuous high temperature not only accelerates the aging and corrosion of the RPS tube material, but may also cause particulate pollution, which in turn affects the quality and production yield of semiconductor devices. Summary of the invention

[0004] The embodiments of the present invention provide a plasma gas inlet structure and a thin film deposition device, aiming to solve the problem that the existing RPS tube fails due to high temperature corrosion.

[0005] In a first aspect, the present invention provides a plasma gas intake structure, comprising: an intake base and a cooling water channel for supplying dissociated gas, the intake base comprising a tube portion and a seat portion, the tube portion being arranged above the seat portion, the intake base being provided with the cooling water channel, and the cooling water channel passing through the seat portion and the tube portion.

[0006] Furthermore, the tube portion and the seat portion are an integral structure.

[0007] Furthermore, the cooling water channel includes an annular water channel, a lower water inlet and an upper water outlet. The annular water channel is opened inside the side walls of the tube portion and the seat portion along the circumference of the air inlet base, the lower water inlet is opened on the outer wall of the seat portion and communicates with the annular water channel, and the upper water outlet is opened on the outer wall of the tube portion and communicates with the annular water channel.

[0008] Furthermore, the outer diameter of the tube portion is the same as the outer diameter of the seat portion.

[0009] Furthermore, the annular water channel penetrates up and down along the axial direction of the air intake base inside the side walls of the tube portion and the seat portion.

[0010] Furthermore, the seat portion is provided with a third air inlet channel extending radially thereof, and the side wall of the seat portion is provided with a closed cut-off area for avoiding the third air inlet channel to cut off part of the annular water channel, and the annular water channel and the third air inlet channel are in an open-loop structure on the same horizontal cross-section.

[0011] Further, the third air inlet passage comprises an axial section and a radial section, the radial section is opened along the radial direction of the seat portion, the axial section is opened along the axial direction of the seat portion, and the axial section is vertically connected to the radial section.

[0012] Furthermore, a fixing portion is provided at the top of the tube portion, and a plurality of grooves for fixing are provided at intervals along the circumferential side wall of the fixing portion.

[0013] Furthermore, the tube portion is provided with a first air inlet passage along its axial direction, and the seat portion is provided with a second air inlet passage along its axial direction, and the first air inlet passage is connected to the second air inlet passage.

[0014] In a second aspect, the present invention further provides a thin film deposition device, comprising the plasma gas inlet structure of the first aspect.

[0015] The present invention provides a plasma air intake structure and a thin film deposition device. The plasma air intake structure comprises: an air intake base and a cooling water channel. The air intake base is used for supplying dissociated gas intake. The air intake base comprises a pipe part and a seat part. The pipe part is arranged above the seat part. The cooling water channel is opened on the entire air intake base. The cooling water channel passes through not only the seat part but also the pipe part, so that the pipe part has a water cooling function, reduces the high-temperature corrosion effect of the high-temperature remote plasma on the pipe part, reduces particulate pollution, and prolongs the service life of parts. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other accompanying drawings can be obtained based on these accompanying drawings without paying any creative work.

[0017] Figure 1 A schematic diagram showing the existing assembly of the Tube and top block is shown;

[0018] Figure 2A cross-sectional schematic diagram showing the existing assembly of the tube and the top block;

[0019] Figure 3 A cross-sectional schematic diagram of a plasma inlet structure according to an embodiment of the present invention is shown;

[0020] Figure 4 A schematic diagram of the three-dimensional structure of a plasma inlet structure according to an embodiment of the present invention is shown;

[0021] Figure 5 A schematic side view of a plasma inlet structure according to an embodiment of the present invention is shown;

[0022] Figure 6 Shown Figure 5 AA cross-sectional diagram of ;

[0023] Reference numerals:

[0024] 1. Inlet base; 11. Tube; 111. First inlet channel; 12. Seat; 121. Second inlet channel; 122. Third inlet channel; 1221. Radial section; 1222. Axial section; 123. Closed cut-off area; 13. Fixing part; 131. Groove; 2. Cooling water channel; 21. Annular water channel; 22. Lower water inlet; DETAILED DESCRIPTION

[0025] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0026] The directional terms mentioned in the present invention, such as "upper", "lower", "front", "back", "left", "right", "inner", "outer", "side", etc., are only referenced to the directions of the attached drawings. Therefore, the directional terms used are used to illustrate and understand the present invention, but are not used to limit the present invention. In addition, in the drawings, structures with similar or identical structures are represented by the same reference numerals.

[0027] Reference Figure 1 and Figure 2In the high-density plasma chemical vapor deposition (HDP CVD) process, performing the cleaning process is a key step to ensure the cleanliness of the chamber. This process relies on a remote plasma source (RPS) to dissociate fluoride ions, which then flow through the tube (tube) and top block (seat) below the RPS, and finally flow into the chamber from the back of the ceramic nozzle (baffle) for cleaning. In this process, the high-temperature fluoride ions dissociated by the RPS will bring a lot of heat when flowing through the tube. Although the topblock is water-cooled, the water cooling of the topblock has very limited cooling capacity for the tube, causing high-temperature corrosion failure of the tube and causing particle pollution problems.

[0028] To this end, an embodiment of the present invention proposes a plasma air intake structure and a thin film deposition device, which solves the problem that the existing RPS pipe fails due to high-temperature corrosion. A cooling water channel is set to pass through the pipe to cool the pipe, thereby improving the cooling capacity and reducing the impact of high-temperature corrosion.

[0029] The embodiment of the present invention solves the above-mentioned high temperature corrosion problem, and the specific ideas are as follows:

[0030] An air intake base is designed, which includes a top block and a tube. A cooling water channel is set on the entire air intake base so that the cooling water channel passes not only through the top block but also through the tube, so that the tube can also have a water cooling function. When high-temperature fluoride ions flow through the tube, the cooling water channel can take away a large amount of heat, greatly improving the cooling capacity of the tube, improving the problem of low cooling capacity of the tube by the top block water cooling alone, and making the water cooling function act on the tube closer to the RPS, reducing the high-temperature corrosion of the tube caused by high-temperature remote plasma, optimizing the problem of particulate pollution, and extending the service life of components.

[0031] Reference Figure 1 and Figure 2In addition, at present, the connection between the Tube and the Top Block is sealed and fixed by a rubber ring and four screws. In the normal installation process, the RPS and the Tube need to be fixed together first, and then the entire RPS and Tube assembly is lifted above the Top Block for final installation. However, due to the relatively small maintenance space on the upper part of the machine cavity and the heavy weight of the RPS itself, the operation of the maintenance personnel becomes very inconvenient. During the installation process, it is easy to scratch the sealing surface under the Tube, and the disassembly and assembly of the four screws is also very difficult, increasing the risk of leakage. In order to solve the above-mentioned problem of difficult disassembly and assembly, the embodiment of the present invention has the following specific ideas: the Tube and the Top Block are designed as an integrated whole, without the need for rubber ring sealing and screw locking, thus eliminating the installation steps, reducing the risk of scratching the sealing surface during installation, improving the maintenance success rate and reducing labor costs and installation difficulty, while avoiding contact surface leakage caused by rubber ring corrosion.

[0032] In order to better understand the above technical solution, the above technical solution will be described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0033] See also Figure 1-Figure 6 An embodiment of the present invention shows a plasma gas intake structure, including: an intake base 1 and a cooling water channel 2 for supplying dissociated gas, the intake base 1 including a pipe portion 11 and a seat portion 12, the pipe portion 11 is arranged above the seat portion 12, the intake base 1 is provided with the cooling water channel 2, and the cooling water channel 2 passes through the seat portion 12 and the pipe portion 11.

[0034] Reference Figure 3Specifically, the air intake base 1 is used to supply the fluorine ions dissociated by the RPS (Remote Plasma Source) with air intake. After the RPS is dissociated, it enters the back of the ceramic nozzle (baffle) through the air intake base 1, and then flows into the chamber for cleaning. The air intake base 1 is a combination structure of a tube and a top block. The air intake base 1 includes two parts, namely a tube 11 and a seat 12. The tube 11 is the tube, and the seat 12 is the top block. The tube 11 is provided with a first air intake channel 111 along its axial direction, and the seat 12 is provided with a second air intake channel 121 along its axial direction. The first air intake channel 111 is connected to the second air intake channel 121. The first air intake channel 111 is also the air channel of the original tube, and the second air intake channel 121 is also the air channel of the original top block. The diameter of the first air inlet channel 111 is greater than the diameter of the second air inlet channel 121, and the first air inlet channel 111 and the second air inlet channel 121 are connected vertically. The tube 11 is connected to the RPS, and the seat 12 is connected to the baffle. The fluoride ions dissociated from the RPS pass through the first air inlet channel 111 and the second air inlet channel 121 in sequence and enter the back of the baffle. The cooling water channel 2 is opened on the air inlet base 1, and the cooling water channel 2 covers the entire air inlet base 1, that is, it includes both the seat 12 and the tube 11. Then the cooling water channel 2 can pass through not only the seat 12 but also the tube 11, that is, the seat 12 and the tube 11 both have water cooling function. When the dissociated gas fluoride ions pass through the tube 11, the cooling water channel 2 can cool the high-temperature fluoride ions, taking away the heat brought, and preventing the tube 11 from failing due to high-temperature corrosion. It should be noted that the cooling water channel 2 of this embodiment has various structures. No matter what the structure is, as long as it passes through the seat portion 12 and the pipe portion 11 and can provide a water cooling function for the pipe portion 11, it is not limited here.

[0035] Through this embodiment, a cooling water channel 2 is opened on the entire air intake base 1, so that the cooling water channel 2 passes through both the seat portion 12 and the tube portion 11, so that the tube portion 11 also has a water cooling function, thereby improving the problem of low cooling capacity of the Tube by the single Top block water cooling, improving the cooling capacity of the tube portion 11, reducing the high-temperature corrosion effect of the high-temperature remote plasma on the tube portion 11, reducing particle size pollution, and extending the service life of components.

[0036] Reference Figure 3In one embodiment, the tube 11 and the seat 12 are an integral structure. Specifically, the bottom of the existing Tube is a sealing surface, and the sealing surface of the Tube is fixedly installed with the upper surface of the Top Block. The connection between the Tube and the Top Block is sealed and fixed by a rubber ring and four screws. Due to the small maintenance space on the upper part of the machine cavity, this installation method is easy to scratch the sealing surface during installation, and it is difficult to tighten the screws, which poses a risk of leakage. To this end, the tube 11 and the seat 12 of this embodiment adopt an integrated design, the tube 11 is a cylindrical structure, the seat 12 is a triangular block structure, the tube 11 and the seat 12 are integrated into an air intake base 1, and the tube 11 and the seat 12 are integrally formed. In this way, the tube 11 does not need to be installed with the seat 12, and there is no need for rubber ring sealing and screw locking, thereby avoiding the risk of contact surface leakage due to rubber ring corrosion. At the same time, it also saves the installation steps, reduces the installation difficulty caused by the small maintenance space, improves the maintenance success rate and reduces labor costs.

[0037] Reference Figure 3 and Figure 4In one embodiment, the cooling water channel 2 includes an annular water channel 21, a lower water inlet 22 and an upper water outlet. The annular water channel 21 is opened inside the side walls of the tube portion 11 and the seat portion 12 along the circumference of the air intake base 1. The lower water inlet 22 is opened on the outer wall of the seat portion 12 and is connected with the annular water channel 21. The upper water outlet is opened on the outer wall of the tube portion 11 and is connected with the annular water channel 21. Specifically, the cooling water channel 2 of this embodiment is an internal water channel, which is opened inside the side walls of the tube portion 11 and the seat portion 12. The cooling water channel 2 includes an annular water channel 21, a lower water inlet 22 and an upper water outlet. The annular water channel 21 is annular and is opened around the center of the air intake base 1. The annular water channel 21 is opened from the lower seat portion 12 to the upper tube portion 11. The annular water channel 21 can be a spiral water channel structure, a ring-shaped inner cavity structure, or other annular structures, which are not limited here. The lower water inlet 22 is provided on the outer wall of the lower seat 12 and penetrates the internal annular water channel 21, and the upper water outlet is provided on the outer wall of the upper tube 11 and penetrates the internal annular water channel 21, and there is a certain height difference between the upper water outlet and the lower water inlet 22. The lower water inlet 22 is connected to the water inlet pipe through a threaded interface, and the upper water outlet is also connected to the water outlet pipe through a threaded interface. The water inlet pipe is passed with cooling water, and the cooling water enters the seat 12 from the lower water inlet 22 of the lower seat 12, flows from bottom to top through the annular water channel 21, flows to the upper water outlet of the upper tube 11, and finally flows out through the water outlet pipe. The cooling water flows in the seat 12 and the tube 11 to take away the heat of the high-temperature dissociated gas, thereby achieving a cooling effect and reducing the influence of high-temperature corrosion. The design of the annular water channel 21 of this embodiment, which enters from the bottom and flows upward gradually, fully contacts the inner wall of the base during the process, thereby achieving a more uniform cooling effect. This can avoid local over-temperature and ensure a more uniform temperature distribution across the base. The cooling water has a lower temperature when it enters from the bottom, and as it flows upward, it gradually absorbs heat and its temperature rises. This design allows the cooling water to effectively absorb heat during the entire flow process, improving the overall efficiency of the cooling system.

[0038] In this embodiment, the outer diameter of the tube portion 11 is the same as the outer diameter of the seat portion 12. Specifically, the diameter of the existing Tube is narrow, and it is difficult to machine the cooling water channel 2 inside the side wall of the Tube, and the cooling area is small. For this reason, in this embodiment, the outer diameter of the tube portion 11 is thickened to make it the same as the outer diameter of the seat portion 12, and the outer edge contour of the tube portion 11 is flush with the outer edge contour of the seat portion 12. Specifically, the seat portion 12 is a triangular block structure as a whole, and a cylindrical step is also provided under the triangular block. The outer diameter of the tube portion 11 is the same as the outer diameter of the cylindrical step. In this way, the side wall of the tube portion 11 can be made thicker, which makes it easier to accommodate the annular water channel 21, and the area of ​​the annular water channel 21 is larger, so the cooling area is large, and the cooling efficiency is improved.

[0039] Continue to refer to Figure 3 In one embodiment, the annular water channel 21 is vertically penetrated inside the side walls of the tube portion 11 and the seat portion 12 along the axial direction of the air intake base 1. Specifically, a part of the annular water channel 21 is inside the side wall of the tube portion 11, and the other part is inside the side wall of the seat portion 12. The entire annular water channel 21 is vertically penetrated inside the air intake base 1, that is, the annular water channel 21 is a structure of an annular inner cavity. In this way, it can be ensured that the cooling water flows evenly within the height range of the entire base, so that the cooling water can fully cover the inner wall of the entire base, thereby achieving a more uniform cooling effect and avoiding local overheating. In addition, the structure of the annular inner cavity provides a larger heat exchange area, and the cooling water can fully contact the inner wall of the base during the flow process, thereby improving the heat transfer efficiency, helping to quickly take away the heat in the base, and maintaining the stability of the base temperature. In addition, the uniform cooling effect can reduce the temperature gradient inside the base, thereby reducing the thermal stress caused by uneven temperature, extending the service life of the entire base, and reducing deformation and damage caused by thermal stress.

[0040] Continue to refer to Figure 3 In one embodiment, the third air inlet channel 122 includes an axial section 1222 and a radial section 1221. The radial section 1221 is opened along the radial direction of the seat 12, and the axial section 1222 is opened along the axial direction of the seat 12. The axial section 1222 is vertically connected to the radial section 1221. Specifically, the third air inlet channel 122 is an air inlet channel for the precursor silane (SiH4). The third air inlet channel 122 is opened on the seat 12, enters from the side wall of the seat 12 and is discharged from the bottom of the seat 12. Specifically, the third air inlet channel 122 includes two sections, namely a horizontal radial section 1221 and a vertical axial end. One end of the radial section 1221 passes through the outer side wall of the seat 12, and the other end of the radial section 1221 is vertically connected to one end of the axial section 1222. The other end of the axial section 1222 passes through the bottom of the seat 12. The bottom of the seat 12 is provided with threads for connecting to a baffle, and the bottom of the seat 12 is connected to the back of a ceramic nozzle (baffle) through the threads, so that the precursor enters the baffle through the third air inlet channel 122 and flows into the chamber to participate in deposition.

[0041] Reference Figure 3 and Figure 5 as well as Figure 6In one embodiment, the seat portion 12 is provided with a third air inlet channel 122 extending radially thereof, and the side wall of the seat portion 12 is provided with a closed cut-off area 123 for avoiding the third air inlet channel 122 to cut off part of the annular water channel 21, and the annular water channel 21 and the third air inlet channel 122 are in an open-loop structure on the same horizontal cross-section. Specifically, since the seat portion 12 is provided with the third air inlet channel 122, the third air inlet channel 122 has a radial section 1221 extending radially in the seat portion 12, and the radial section 1221 hinders the opening of the annular water channel 21. Therefore, the annular water channel 21 is provided with a closed cut-off area 123 for avoiding the radial section 1221 at the position where it intersects with the radial section 1221. Specifically, in combination with Figure 3 and Figure 6 As shown, Figure 3 is a cross-sectional view of the air intake base 1, Figure 6 is a top view of the air intake base 1, Figure 6 The middle annular water channel 21 is in the shape of an annular ring. In the annular ring, there are two fan-shaped areas sandwiched by straight lines, which are radial sections 1221 of the third air inlet channel 122. The annular water channel 21 changes from a full-circle structure to an open-loop non-full-circle structure here. After going down and avoiding the structure of the radial section 1221 of the third air inlet channel 122, the annular water channel 21 changes to a full-circle structure again. Figure 3 As shown, the annular water channel 21 is cut off at the position of the radial section 1221, and the cut-off area is the closed cut-off area 123. Here, the seat 12 is a closed structure, thus avoiding the radial section 1221 and separating the annular water channel 21 at this position from top to bottom. Although the annular water channel 21 is cut off into two parts, the annular water channel 21 on the other side is still connected, so the annular water channel 21 is still connected as a whole. By cutting off part of the annular water channel 21, the integrity and patency of the precursor channel can be ensured, the water channel can be prevented from interfering with the flow of the precursor gas, and the uniform distribution and stable supply of the precursor gas can be ensured. Moreover, although the annular water channel 21 is partially cut off, it is still connected as a whole, and the cooling water can still flow evenly throughout the base to ensure the cooling effect.

[0042] Reference Figure 4In one embodiment, a fixing portion 13 is provided at the top of the tube 11, and a plurality of grooves 131 for fixing are provided at intervals along the circumferential side wall of the fixing portion 13. Specifically, a fixing portion 13 for connecting and fixing with the RPS is provided at the top of the tube 11. In the existing Tube, the RPS is fixed to the Tube by opening a screw hole on the fixing portion 13. However, in this embodiment, since an annular water channel 21 is opened inside the side wall of the tube 11, if the fixing portion 13 at the top is fixed by screws passing through the screw holes, the annular water channel 21 below will be interfered with. For this reason, in this embodiment, the screw holes are replaced by grooves 131 to achieve fixing. Specifically, a plurality of grooves 131 are opened on the side wall of the fixing portion 13, and the plurality of grooves 131 are distributed at intervals along the circumference of the fixing portion 13, and are connected and fixed with the RPS through the plurality of grooves 131. Through this embodiment, the grooves 131 are used to fix with the RPS, so as to ensure the stability and reliability of the connection with the RPS without affecting the annular water channel 21 below.

[0043] The embodiment of the present invention further provides a thin film deposition device, comprising the plasma gas inlet structure of the above embodiment. Specifically, the plasma gas inlet structure has been described in detail in the above embodiment, and for the sake of brevity of the description, it will not be repeated here.

[0044] By adopting the plasma air intake structure of this embodiment, the seat 12 and the tube 11 are integrated into the air intake base 1, which eliminates the steps of installing the tube 11 and the seat 12, reduces the risk of scratching the sealing surface below the tube 11 during installation, improves the maintenance success rate, reduces labor costs and installation difficulty, and avoids contact surface leakage caused by rubber ring corrosion. In addition, an annular water channel 21 is opened inside the side wall of the entire air intake base 1. The annular water channel 21 enters from the bottom and exits from the top, fully flowing through the seat 12 below and the tube 11 above, so that the tube 11 also has cooling capacity, improving the problem of low cooling capacity of the tube 11 by water cooling of the seat 12 alone, so that the water cooling function also acts on the tube 11 closer to the RPS, reducing the high-temperature corrosion of the tube 11 caused by high-temperature remote plasma, reducing particle size pollution, and extending the service life of components.

[0045] The above is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can easily think of various equivalent modifications or replacements within the technical scope disclosed by the present invention, and these modifications or replacements should be included in the protection scope of the present invention. Therefore, the protection scope of the present invention shall be based on the protection scope of the claims.

Claims

1. A plasma inlet structure, characterized in that: include: An air intake base and a cooling water channel for supplying dissociated gas intake, the air intake base comprises a pipe portion and a seat portion, the pipe portion is arranged above the seat portion, the air intake base is provided with the cooling water channel, and the cooling water channel passes through the seat portion and the pipe portion.

2. The plasma inlet structure according to claim 1, characterized in that: The tube portion and the seat portion are an integral structure.

3. The plasma inlet structure according to claim 1, characterized in that: The cooling water channel includes an annular water channel, a lower water inlet and an upper water outlet. The annular water channel is opened inside the side walls of the tube portion and the seat portion along the circumference of the air inlet base. The lower water inlet is opened on the outer side wall of the seat portion and communicates with the annular water channel. The upper water outlet is opened on the outer side wall of the tube portion and communicates with the annular water channel.

4. The plasma inlet structure according to claim 3, characterized in that: The outer diameter of the tube portion is the same as the outer diameter of the seat portion.

5. The plasma inlet structure according to claim 3, characterized in that: The annular water channel penetrates vertically along the axial direction of the air intake base inside the side walls of the tube portion and the seat portion.

6. The plasma inlet structure according to claim 5, characterized in that: The seat portion is provided with a third air inlet channel extending radially thereof, and the side wall of the seat portion is provided with a closed cut-off area for avoiding the third air inlet channel to cut off part of the annular water channel, and the annular water channel and the third air inlet channel are in an open-loop structure on the same horizontal cross-section.

7. The plasma inlet structure according to claim 6, characterized in that: The third air inlet passage includes an axial section and a radial section. The radial section is opened along the radial direction of the seat portion, and the axial section is opened along the axial direction of the seat portion. The axial section is vertically connected to the radial section.

8. The plasma inlet structure according to claim 1, characterized in that: A fixing portion is provided on the top of the tube portion, and a plurality of grooves for fixing are provided at intervals along the circumferential side wall of the fixing portion.

9. The plasma inlet structure according to any one of claims 1 to 7, characterized in that: The tube portion is provided with a first air inlet passage along its axial direction, and the seat portion is provided with a second air inlet passage along its axial direction, and the first air inlet passage is connected to the second air inlet passage.

10. A thin film deposition device, characterized in that: It comprises the plasma inlet structure as described in any one of claims 1 to 9.

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