Silicon material cleaning device

Abstract

The invention relates to the technical field of cleaning, and particularly discloses a silicon material cleaning device which comprises a pretreatment mechanism, the pretreatment mechanism comprises a dust removal assembly, a cleaner and a feeding assembly, and the dust removal assembly comprises an air inlet, an air outlet, a sealing plate, a filter cartridge, a blowback valve and an ash bucket; the cleaner is arranged adjacent to the dust removal assembly, and the feeding assembly is arranged on the outer side of the cleaner. The cleaning mechanism comprises a conveying assembly, a cleaning shell, a power assembly and a plurality of treatment boxes; an opening and closing valve is arranged below each treatment box; the conveying assembly comprises a conveying support, a first motor, a first transmission shaft, a first driving gear, a plurality of conveying rods, a first belt and a driven gear. The defects of insufficient automation degree and incomplete cleaning in silicon material cleaning in the prior art are overcome.

Description

Technical Field

[0001] The invention relates to the field of cleaning, and in particular to a silicon material cleaning device. Background Art

[0002] Silicon materials have a wide range of applications, covering a wide range of fields from traditional building materials to high-tech semiconductor materials. Silicon materials need to be cleaned when they are used. These cleaning processes are critical to ensuring the surface quality and performance of silicon wafers, because contaminants on the surface of silicon wafers can seriously affect the performance and reliability of devices.

[0003] In the prior art, the silicon material cleaning step is incomplete, which will lead to incomplete cleaning of the silicon material, and the silicon material cannot meet the use standards when used. At the same time, the silicon material in the prior art is not automated enough during cleaning, which wastes manpower. Summary of the invention

[0004] 1. Technical issues to be resolved

[0005] The problem to be solved by the present invention is to provide a silicon material cleaning device to overcome the defects of insufficient automation and incomplete cleaning in the silicon material cleaning in the prior art.

[0006] (II) Technical solution

[0007] In order to solve the technical problem, the present invention provides a silicon material cleaning device, comprising:

[0008] A pre-treatment mechanism, the pre-treatment mechanism comprises a dust removal component, a cleaner and a feeding component, the dust removal component comprises an air inlet, an air outlet, a sealing plate, a filter cartridge, a back-blowing valve and an ash hopper, the air inlet is arranged at one end above the dust removal component, the air outlet is arranged at the other end above the dust removal component, the filter cartridge is arranged adjacent to the air inlet, one end of the filter cartridge is connected to the dust removal component, the other end of the filter cartridge is connected to the sealing plate, the back-blowing valve is arranged at the other end of the dust removal component, and the ash hopper is arranged at the lower end of the filter cartridge;

[0009] The cleaner is arranged adjacent to the dust removal component, and the feeding component includes a feeding bracket and a feeding gripper. The feeding bracket is arranged on the outside of the cleaner, and the feeding gripper is slidably connected to the feeding bracket.

[0010] A cleaning mechanism, the cleaning mechanism comprising a transport assembly, a cleaning shell, a power assembly, and a plurality of processing boxes, the plurality of processing boxes are respectively an immersion degreasing box, an ultrasonic rinsing box, a first rinsing and flushing box, a second rinsing and flushing box, a first pickling box, a second pickling box, a third rinsing and flushing box, a fourth rinsing and flushing box, a fifth rinsing and flushing box, and an immersion spraying box, the transport assemblies are respectively arranged at both ends of the cleaning shell, the cleaning shell is connected to two rack rods, and the power assembly is slidably connected to the rack rods;

[0011] An on-off valve is provided below each processing box, the on-off valve comprising a valve body, a handle, a second transmission shaft, a cam, a telescopic rod and a roller, the handle is connected to the second transmission shaft, the second transmission shaft is connected to the cam, the telescopic rod is hinged to the roller, the roller is rollingly connected to the cam, a first opening is provided on the valve body, and the telescopic rod is arranged adjacent to the first opening;

[0012] The transport assembly includes a transport bracket, a first motor, a first transmission shaft, a first driving gear, a plurality of transport rods, a first belt and a passive gear. The first motor is connected to the transport bracket, the first transmission shaft is connected to the output end of the first motor, the first driving gear is connected to the first transmission shaft, the transport rods are hinged to the transport bracket at equal intervals, the passive gear is connected to the transport bracket, one end of the first belt is connected to the first driving gear, the other end of the first belt is connected to the passive gear, the first motor drives the transport rod to rotate, and the plurality of transport rods are connected by a second belt.

[0013] As described above in the silicon material cleaning device, optionally, there are two filter cartridges, the two filter cartridges are arranged side by side along the vertical plane of the dust removal component, and there are two back-blow valves, the back-blow valves are aligned with the filter cartridges on the horizontal plane.

[0014] As the silicon material cleaning device mentioned above, optionally, the power assembly includes a first fixed plate, a second fixed plate, a third fixed plate and a first movable plate, the first fixed plate is movably connected to the rack rod, the first fixed plate is connected to the second fixed plate through a bracket, the second fixed plate is connected to the third fixed plate through a telescopic support rod, an electric push rod is arranged on the third fixed plate, the electric push rod is connected to the first movable plate, the first movable plate is arranged between the second fixed plate and the third fixed plate, a grab hook is arranged on the first movable plate, and the electric push rod drives the grab hook to retract and retract.

[0015] As described above in the silicon material cleaning device, optionally, the grab hook is used to transport a material box, and the material box has a second opening.

[0016] As the silicon material cleaning device mentioned above, optionally, the first fixed plate has a driving mechanism, and the driving mechanism includes a second motor, a third transmission shaft and a second driving gear. The third transmission shaft is connected to the output end of the second motor, the second driving gear is connected to the third transmission shaft, the second driving gear is meshed with the rack rod, and the second motor drives the power assembly to move on the rack rod.

[0017] As described above, the silicon material cleaning device may optionally include a liquid supply component, wherein the liquid supply component includes a high-purity water tank, a degreasing agent tank and a chemical tank, the high-purity water tank is connected to the first opening in the opening and closing valve provided on the immersion degreasing tank, the ultrasonic rinsing tank, the first rinsing and flushing tank, the second rinsing and flushing tank, the third rinsing and flushing tank, the fourth rinsing and flushing tank, the fifth rinsing and flushing tank and the immersion spraying tank, the degreasing agent tank is connected to the immersion degreasing tank, and the chemical tank is connected to the first pickling tank and the second pickling tank.

[0018] As described above in the silicon material cleaning device, optionally, the cleaning mechanism includes a PLC cabinet.

[0019] As described above, the silicon material cleaning device can optionally include a drying mechanism, the transport assembly is connected to the drying mechanism, the drying mechanism includes a drying shell, a fan and a steam heating tank, the drying shell is connected to the rack rod, the power assembly is displaced on the rack rod, and the fan is connected to the drying shell.

[0020] As the silicon material cleaning device mentioned above, optionally, the drying shell includes a plurality of dewatering tanks and drying tanks arranged in sequence, the fan is arranged adjacent to the dewatering tank, and the steam heating tank is connected to the drying tank.

[0021] As described above in the silicon material cleaning device, optionally, a material identification mechanism is provided on the drying system.

[0022] (III) Beneficial effects

[0023] The present invention provides a silicon material cleaning device, which has the following beneficial effects:

[0024] (1) The present invention is provided with a pre-treatment mechanism. The dust removal component in the pre-treatment mechanism can input air from the air inlet when working, and the air is filtered by the filter cartridge and output from the air outlet. When the dust removal component is self-cleaning, air can be blown to the filter cartridge through the back-blowing valve. The dust in the filter cartridge can be blown away by the back-blowing airflow, and the dust falls into the ash hopper under the action of gravity. The cleaner in the pre-treatment mechanism can pre-clean the silicon material and the dust on the surface of the silicon material. At the same time, the loading component can control the placement of the silicon material in the cleaner. This design can effectively improve the cleanliness of the working environment of the silicon material cleaning device, and perform self-cleaning (back-blowing valve) when the filter cartridge needs to be cleaned, which is convenient and fast, and reduces labor costs. At the same time, the pre-treatment mechanism can also perform preliminary cleaning of dust, burrs, etc. on the surface of the silicon material, thereby avoiding the influence of excessive dust on the subsequent process.

[0025] (2) The present invention is provided with a cleaning mechanism, which has a transport component. The pre-treated silicon material can be placed in a material box, which is transported to a suitable position by the transport component. The power component grabs the material box and cleans the material box in a processing box. The processing box includes an immersion degreasing box, an ultrasonic rinsing box, a first rinsing and flushing box, a second rinsing and flushing box, a first pickling box, a second pickling box, a third rinsing and flushing box, a fourth rinsing and flushing box, a fifth rinsing and flushing box, and an immersion spraying box, which are arranged in sequence. The immersion degreasing box can be connected to high-purity water and degreasing agent, which can dissolve the organic matter in the silicon material and needs to be heated; the ultrasonic rinsing box can use ultrasonic waves to remove the organic matter that is not completely dissolved, and heated high-purity water is placed in it; the first rinsing and flushing box can remove the degreasing agent on the surface of the silicon material; the second rinsing and flushing box can completely remove the grease on the surface of the silicon material; the first pickling box can remove the surface metal ions of the silicon material; the second pickling box can re-correct the silicon material; the third rinsing and flushing box, the fourth rinsing and flushing box, and the fifth rinsing and flushing box can remove the residual acid on the surface of the silicon material; the immersion spraying box can re-correct the silicon material.

[0026] (3) The power assembly of the present invention includes an electric push rod and a second motor. The electric push rod is used to drive the first movable plate to move downward to pick up / store the material box. The second motor can drive the second driving gear to drive the power assembly to move on the rack rod.

[0027] (4) The present invention pre-dries the cleaned silicon material by using a dewatering tank in the drying mechanism in conjunction with a fan, and completely dries the silicon material by using a drying tank in conjunction with a steam heating tank. The material identification mechanism can identify whether the silicon material is cleaned and count the cleaned silicon material. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0029] Figure 1 This is a three-dimensional diagram of a silicon material cleaning device of the present invention;

[0030] Figure 2 A three-dimensional diagram of a cleaning mechanism of a silicon material cleaning device according to the present invention;

[0031] Figure 3 This is a front view of a cleaning mechanism of a silicon material cleaning device of the present invention;

[0032] Figure 4 It is a partial schematic diagram of a cleaning mechanism of a silicon material cleaning device of the present invention;

[0033] Figure 5 A cross-sectional view of an on-off valve of a silicon material cleaning device of the present invention;

[0034] Figure 6 A three-dimensional diagram of a power assembly of a silicon material cleaning device according to the present invention;

[0035] Figure 7 It is a partial schematic diagram of a power assembly of a silicon material cleaning device of the present invention;

[0036] Figure 8 This is a structural schematic diagram of a pretreatment mechanism of a silicon material cleaning device of the present invention;

[0037] Fig. 9 This is a schematic structural diagram of a dust removal component of a silicon material cleaning device of the present invention;

[0038] Fig.10 The present invention is a schematic diagram of the drying mechanism structure of a silicon material cleaning device.

[0039] The names of the components corresponding to the reference numerals in the figure are: 1. pretreatment mechanism; 11. dust removal assembly; 12. cleaner; 13. feeding assembly; 14. air inlet; 15. air outlet; 16. sealing plate; 17. filter cartridge; 18. backflush valve; 19. ash hopper; 20. feeding bracket; 21. feeding gripper; 3. cleaning mechanism; 31. transportation assembly; 32. cleaning shell; 33. power assembly; 34. immersion degreasing box; 35. ultrasonic rinsing box; 36. first rinsing and flushing box; 37. second rinsing and flushing box; 38. first pickling box; 39. second pickling box; 40. third rinsing and flushing box; 41. fourth rinsing and flushing box; 42. fifth rinsing and flushing box; 43. immersion spray box; 44. rack rod; 45. opening and closing valve; 46. valve body; 47. twist handle; 48. second transmission shaft; 49. cam; 50. telescopic rod; 51. roller; 52. first opening; 53. transport bracket; 54. first motor; 55. first transmission shaft; 56. first driving gear; 57. transport rod; 58. first belt; 59. passive gear; 60. second belt; 61. first fixed plate; 62. second fixed plate; 63. third fixed plate; 64. first movable plate; 65. telescopic support rod; 66. electric push rod; 67. grab hook; 68. material box; 69. second opening; 7. driving mechanism; 71. second motor; 72. third transmission shaft; 73. second driving gear; 8. liquid supply assembly; 81. high-purity water tank; 82. degreasing agent tank; 83. chemical tank; 84. PLC cabinet; 85. drying mechanism; 86. drying shell; 87. fan; 88. steam heating tank; 89. dewatering tank; 90. drying tank. DETAILED DESCRIPTION

[0040] The present application is described in detail below with reference to the accompanying drawings and specific embodiments.

[0041] The following describes the implementation methods of the present application through specific examples, and those skilled in the art can easily understand other advantages and effects of the present application from the contents disclosed in this specification. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. The present application can also be implemented or applied through other different specific implementation methods, and the details in this specification can also be modified or changed in various ways based on different viewpoints and applications without departing from the spirit of the present application. It should be noted that, in the absence of conflict, the following embodiments and the features in the embodiments can be combined with each other. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in the field without making creative work belong to the scope of protection of the present application.

[0042] It should be noted that various aspects of the embodiments within the scope of the appended claims are described below. It should be apparent that the aspects described herein can be embodied in a wide variety of forms, and any specific structure and / or function described herein is merely illustrative. Based on the present application, it should be understood by those skilled in the art that an aspect described herein can be implemented independently of any other aspect, and two or more of these aspects can be combined in various ways. For example, any number and aspect described herein can be used to implement the device and / or practice the method. In addition, other structures and / or functionalities other than one or more of the aspects described herein can be used to implement this device and / or practice this method.

[0043] It should also be noted that the illustrations provided in the following embodiments are only schematic illustrations of the basic concept of the present application. The drawings only show components related to the present application rather than being drawn according to the number, shape and size of components in actual implementation. In actual implementation, the type, quantity and proportion of each component may be changed arbitrarily, and the component layout may also be more complicated.

[0044] Additionally, in the following description, specific details are provided to facilitate a thorough understanding of the examples. However, it will be understood by those skilled in the art that the examples can be practiced without these specific details.

[0045] The technical solutions provided by various embodiments of the present application are described below in conjunction with the accompanying drawings.

[0046] See also Figures 1 to 10 The present invention provides a silicon material cleaning device, comprising: a pretreatment mechanism 1, a cleaning mechanism 3, a liquid supply component 8 and a drying mechanism 85. The pretreatment mechanism 1 is used to remove dust from the working environment and clean the surface of the silicon material. The cleaning mechanism 3 is used to further clean and deburr the pretreated silicon material, so that the silicon material meets the production needs. The liquid supply component 8 is used to provide chemicals and pure water support to the cleaning mechanism 3. The drying mechanism 85 is used to dry the silicon material after cleaning by the cleaning mechanism 3.

[0047] exist Figures 1 to 10 In an optional embodiment, the pretreatment mechanism 1 includes a dust removal component 11, a cleaner 12 and a feeding component 13.

[0048] It should be noted that the dust removal component 11 is used to remove dust from the working environment. In an optional embodiment, the cleaner 12 may have a water gun connected to a cleaning liquid to clean the silicon material. The loading component 13 can place the silicon material into the cleaner 12 and take it out after the cleaner 12 cleans the silicon material.

[0049] Further, the dust removal assembly 11 includes an air inlet 14, an air outlet 15, a sealing plate 16, a filter cartridge 17, a blowback valve 18 and an ash hopper 19. The air inlet 14 is arranged at one end above the dust removal assembly 11, the air outlet 15 is arranged at the other end above the dust removal assembly 11, the filter cartridge 17 is arranged adjacent to the air inlet 14, one end of the filter cartridge 17 is connected to the dust removal assembly 11, the other end of the filter cartridge 17 is connected to the sealing plate 16, the blowback valve 18 is arranged at the other end of the dust removal assembly 11, and the ash hopper 19 is arranged at the lower end of the filter cartridge 17.

[0050] Furthermore, there are two filter cartridges 17 , which are arranged side by side along the vertical plane of the dust removal assembly 11 , and there are two back-blow valves 18 , which are aligned with the filter cartridges 17 on the horizontal plane.

[0051] When the dust removal assembly 11 is working, external air can enter from the air inlet 14, be filtered under the action of the filter cartridge 17, and flow out through the air outlet 15. When the dust removal assembly 11 needs to be self-cleaned, the backflush valve 18 is activated to backflush the filter cartridge 17, and the dust after backflush can enter the ash hopper 19 under the action of gravity.

[0052] Further, the cleaner 12 is disposed adjacent to the dust removal assembly 11, and the feeding assembly 13 includes a feeding bracket 20 and a feeding gripper 21, the feeding bracket 20 is disposed outside the cleaner 12, and the feeding gripper 21 is slidably connected to the feeding bracket 20. In an optional embodiment, the feeding gripper 21 can be extended up and down, thereby playing a role in facilitating material collection / discharging.

[0053] exist Figures 1 to 10 In an optional embodiment, the cleaning mechanism 3 includes a transport component 31, a cleaning shell 32, a power component 33, and a plurality of processing boxes. The transport component 31 can transport a material box 68 storing silicon material, and the material box has a second opening, which can ensure that liquid is immersed in the material box.

[0054] Furthermore, the cleaning mechanism 3 includes a PLC cabinet 84. The PLC cabinet 84 can control the cleaning mechanism 3.

[0055] Furthermore, the multiple processing boxes are respectively arranged in sequence: an immersion degreasing box 34, an ultrasonic rinsing box 35, a first rinsing and flushing box 36, a second rinsing and flushing box 37, a first pickling box 38, a second pickling box 39, a third rinsing and flushing box 40, a fourth rinsing and flushing box 41, a fifth rinsing and flushing box 42, and an immersion spraying box 43.

[0056] It should be noted that the silicon material cleaning device includes a liquid supply component 8, which includes a high-purity water tank 81, a degreasing agent tank 82 and a chemical tank 83. The high-purity water tank 81 is connected to the immersion degreasing tank 34, the ultrasonic rinse tank 35, the first rinse and flushing tank 36, the second rinse and flushing tank 37, the third rinse and flushing tank 40, the fourth rinse and flushing tank 41, the fifth rinse and flushing tank 42 and the first opening 52 in the opening and closing valve 45 provided on the immersion spray tank 43, the degreasing agent tank 82 is connected to the immersion degreasing tank 34, and the chemical tank 83 is connected to the first pickling tank 38 and the second pickling tank 39.

[0057] Among them, the water storage tank contains pure water, the degreasing agent tank 82 contains degreasing agent, and the chemical tank 83 contains nitric acid and hydrofluoric acid. At the same time, the liquid supply component 8 is also provided with a high-purity water return tank, and the high-purity water in the immersion degreasing tank 34, the ultrasonic rinsing tank 35, the first rinsing and flushing tank 36, the second rinsing and flushing tank 37, the third rinsing and flushing tank 40, the fourth rinsing and flushing tank 41, the fifth rinsing and flushing tank 42 and the immersion spraying tank 43 can flow back to the high-purity water return tank after use.

[0058] The liquid supply assembly 8 is also provided with a degreasing agent return tank, into which the degreasing agent in the immersion degreasing tank 34 can flow back after use. The liquid supply assembly 8 is also provided with a chemical return tank, into which the nitric acid and hydrofluoric acid used in the first pickling tank 38 and the second pickling tank 39 can flow back.

[0059] The transport components 31 are respectively arranged at two ends of the cleaning housing 32 . Two rack rods 44 are connected to the cleaning housing 32 . The power component 33 is slidably connected to the rack rods 44 .

[0060] Furthermore, an on-off valve 45 is provided below each treatment box, and the on-off valve 45 includes a valve body 46, a handle 47, a second transmission shaft 48, a cam 49, a telescopic rod 50 and a roller 51. The handle 47 is connected to the second transmission shaft 48, the second transmission shaft 48 is connected to the cam 49, the telescopic rod 50 is hinged to the roller 51, the roller 51 is rollingly connected to the cam 49, a first opening 52 is provided on the valve body 46, and the telescopic rod 50 is arranged adjacent to the first opening 52. The on-off valve 45 can play a role in safety protection.

[0061] Furthermore, the power assembly 33 includes a first fixed plate 61, a second fixed plate 62, a third fixed plate 63 and a first movable plate 64. The first fixed plate 61 is movably connected to the rack rod 44. The first fixed plate 61 is connected to the second fixed plate 62 through a bracket. The second fixed plate 62 is connected to the third fixed plate 63 through a telescopic support rod 65. An electric push rod 66 is arranged on the third fixed plate 63. The electric push rod 66 is connected to the first movable plate 64. The first movable plate 64 is arranged between the second fixed plate 62 and the third fixed plate 63. A grab hook 67 is arranged on the first movable plate 64. The electric push rod 66 drives the grab hook 67 to retract.

[0062] Furthermore, a driving mechanism 7 is provided on the first fixed plate 61, and the driving mechanism 7 includes a second motor 71, a third transmission shaft 72 and a second driving gear 73. The third transmission shaft 72 is connected to the output end of the second motor 71, the second driving gear 73 is connected to the third transmission shaft 72, and the second driving gear 73 is meshed with the rack rod 44. The second motor 71 drives the power assembly 33 to move on the rack rod 44.

[0063] Furthermore, the transport assembly 31 includes a transport bracket 53, a first motor 54, a first transmission shaft 55, a first driving gear 56, a plurality of transport rods 57, a first belt 58 and a passive gear 59. The first motor 54 is connected to the transport bracket 53, the first transmission shaft 55 is connected to the output end of the first motor 54, the first driving gear 56 is connected to the first transmission shaft 55, the transport rod 57 is hinged to the transport bracket 53 at equal intervals, the passive gear 59 is connected to the transport bracket 53, one end of the first belt 58 is connected to the first driving gear 56, and the other end of the first belt 58 is connected to the passive gear 59. The first motor 54 drives the transport rod 57 to rotate, and the plurality of transport rods 57 are connected by a second belt 60.

[0064] exist Figures 1 to 10 In an optional embodiment, the silicon material cleaning device includes a drying mechanism 85, the transport component 31 is connected to the drying mechanism 85, the drying mechanism 85 includes a drying shell 86, a fan 87 and a steam heating tank 88, the drying shell 86 is connected to a rack rod 44, the power component 33 is displaced on the rack rod 44, and the fan 87 is connected to the drying shell 86.

[0065] Furthermore, the drying shell 86 includes a plurality of dewatering tanks 89 and a drying tank 90 arranged in sequence, the fan 87 is arranged adjacent to the dewatering tank 89 , and the steam heating tank 88 is connected to the drying tank 90 .

[0066] Furthermore, the drying system is provided with a material identification mechanism, which can identify the quantity and quality of the dried material.

[0067] A silicon material cleaning device of the present invention has the following specific steps:

[0068] By providing the pretreatment mechanism 1, the dust removal component 11 in the pretreatment mechanism 1 can input air from the air inlet 14 when working, and the air is filtered by the filter cartridge 17 and output from the air outlet 15. When the dust removal component 11 is self-cleaning, air can be blown to the filter cartridge 17 through the back-blowing valve 18, and the dust in the filter cartridge 17 can be blown away by the back-blowing airflow, and the dust falls into the ash hopper 19 under the action of gravity. The cleaner 12 in the pretreatment mechanism 1 can pre-clean the silicon material and the dust on the surface of the silicon material. At the same time, the loading component 13 can control the placement of the silicon material in the cleaner 12. This design can effectively improve the cleanliness of the working environment of the silicon material cleaning device, and perform self-cleaning (back-blowing valve 18) when the filter cartridge 17 needs to be cleaned, which is convenient and fast, reducing labor costs. At the same time, the pretreatment mechanism 1 can also perform preliminary cleaning of dust, burrs, etc. on the surface of the silicon material, thereby avoiding excessive dust from affecting the subsequent process.

[0069] By providing a cleaning mechanism 3, the cleaning mechanism 3 has a transport component 31, and the pre-treated silicon material can be placed in a material box 68, and the material box 68 is transported to a suitable position under the action of the transport component 31, and the power component 33 grabs the material box 68 and cleans the material box 68 in the processing box. The processing box includes an immersion degreasing box 34, an ultrasonic rinsing box 35, a first rinsing and flushing box 36, a second rinsing and flushing box 37, a first pickling box 38, a second pickling box 39, a third rinsing and flushing box 40, a fourth rinsing and flushing box 41, a fifth rinsing and flushing box 42, and an immersion spraying box 43. The immersion degreasing box 34 can be connected to high-purity water and a degreasing agent, which can dissolve the organic matter in the silicon material and needs to be heated; the ultrasonic rinsing box 35 can use ultrasonic waves to remove the organic matter that is not completely dissolved, and heated high-purity water is placed in it; the first rinsing and flushing box 36 can remove the degreasing agent on the surface of the silicon material; the second rinsing and flushing box 37 can completely remove the grease on the surface of the silicon material; the first pickling box 38 can remove the surface metal ions of the silicon material; the second pickling box 39 can re-calibrate the silicon material; the third rinsing and flushing box 40, the fourth rinsing and flushing box 41, and the fifth rinsing and flushing box 42 can remove the residual acid on the surface of the silicon material; the immersion spraying box 43 can re-correct the silicon material.

[0070] The power assembly 33 includes an electric push rod 66 and a second motor 71 . The electric push rod 66 is used to drive the first movable plate 64 to move downward to take / store the material box 68 . The second motor 71 can drive the second driving gear 73 to drive the power assembly 33 to move on the rack rod 44 .

[0071] The cleaned silicon material is pre-dried by the dewatering tank 89 in the drying mechanism 85 in cooperation with the fan 87, and the silicon material is completely dried by the drying tank 90 in cooperation with the steam heating tank 88. The material identification mechanism can identify whether the silicon material is cleaned and count the cleaned silicon material.

[0072] The same and similar parts between the various embodiments in this specification can be referenced to each other, and each embodiment focuses on the differences from other embodiments.

[0073] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any changes or substitutions that can be easily thought of by a person skilled in the art within the technical scope disclosed in the present application should be included in the protection scope of the present application. Therefore, the protection scope of the present application shall be based on the protection scope of the claims.

Claims

1. A silicon material cleaning device, characterized in that: include: A pretreatment mechanism (1), the pretreatment mechanism (1) comprising a dust removal component (11), a cleaner (12) and a feeding component (13), the dust removal component (11) comprising an air inlet (14), an air outlet (15), a sealing plate (16), a filter cartridge (17), a backflush valve (18) and an ash hopper (19), the air inlet (14) being arranged at one end above the dust removal component (11), the air outlet (15) being arranged at the other end above the dust removal component (11), the filter cartridge (17) being arranged adjacent to the air inlet (14), one end of the filter cartridge (17) being connected to the dust removal component (11), the other end of the filter cartridge (17) being connected to the sealing plate (16), the backflush valve (18) being arranged at the other end of the dust removal component (11), and the ash hopper (19) being arranged at the lower end of the filter cartridge (17); The cleaner (12) is arranged adjacent to the dust removal assembly (11), and the feeding assembly (13) comprises a feeding bracket (20) and a feeding gripper (21), wherein the feeding bracket (20) is arranged on the outside of the cleaner (12), and the feeding gripper (21) is slidably connected to the feeding bracket (20); A cleaning mechanism (3), the cleaning mechanism (3) comprising a transport assembly (31), a cleaning shell (32), a power assembly (33), and a plurality of processing boxes, the plurality of processing boxes being respectively an immersion degreasing box (34), an ultrasonic rinsing box (35), a first rinsing and flushing box (36), a second rinsing and flushing box (37), a first pickling box (38), a second pickling box (39), a third rinsing and flushing box (40), a fourth rinsing and flushing box (41), a fifth rinsing and flushing box (42), and an immersion spraying box (43), the transport assembly (31) being respectively arranged at both ends of the cleaning shell (32), the cleaning shell (32) being connected to two rack rods (44), and the power assembly (33) being slidably connected to the rack rod (44); An on-off valve (45) is provided below each processing box, the on-off valve (45) comprising a valve body (46), a handle (47), a second transmission shaft (48), a cam (49), a telescopic rod (50) and a roller (51), the handle (47) being connected to the second transmission shaft (48), the second transmission shaft (48) being connected to the cam (49), the telescopic rod (50) being hinged to the roller (51), the roller (51) being rollingly connected to the cam (49), the valve body (46) being provided with a first opening (52), the telescopic rod (50) being arranged adjacent to the first opening (52); The transport assembly (31) comprises a transport support (53), a first motor (54), a first transmission shaft (55), a first driving gear (56), a plurality of transport rods (57), a first belt (58) and a driven gear (59); the first motor (54) is connected to the transport support (53); the first transmission shaft (55) is connected to the output end of the first motor (54); the first driving gear (56) is connected to the first transmission shaft (55); the transport rods (57) are hinged to the transport support (53) at equal intervals; the driven gear (59) is connected to the transport support (53); one end of the first belt (58) is connected to the first driving gear (56); the other end of the first belt (58) is connected to the driven gear (59); the first motor (54) drives the transport rod (57) to rotate; and the plurality of transport rods (57) are connected via a second belt (60).

2. The silicon material cleaning device according to claim 1, characterized in that: There are two filter cartridges (17), which are arranged side by side along the vertical plane of the dust removal component (11); there are two back-blow valves (18), which are aligned with the filter cartridges (17) on a horizontal plane.

3. The silicon material cleaning device according to claim 1, characterized in that: The power assembly (33) comprises a first fixed plate (61), a second fixed plate (62), a third fixed plate (63) and a first movable plate (64); the first fixed plate (61) is movably connected to the rack rod (44); the first fixed plate (61) is connected to the second fixed plate (62) through a bracket; the second fixed plate (62) is connected to the third fixed plate (63) through a telescopic support rod (65); an electric push rod (66) is arranged on the third fixed plate (63); the electric push rod (66) is connected to the first movable plate (64); the first movable plate (64) is arranged between the second fixed plate (62) and the third fixed plate (63); a grab hook (67) is arranged on the first movable plate (64); the electric push rod (66) drives the grab hook (67) to retract.

4. The silicon material cleaning device according to claim 3, characterized in that: The grab hook (67) is used to transport a material box (68), and the material box (68) has a second opening (69).

5. The silicon material cleaning device according to claim 3, characterized in that: The first fixing plate (61) has a driving mechanism (7), the driving mechanism (7) comprising a second motor (71), a third transmission shaft (72) and a second driving gear (73), the third transmission shaft (72) being connected to the output end of the second motor (71), the second driving gear (73) being connected to the third transmission shaft (72), the second driving gear (73) being meshed with the rack rod (44), and the second motor (71) driving the power assembly (33) to move on the rack rod (44).

6. The silicon material cleaning device according to claim 1, characterized in that: The silicon material cleaning device comprises a liquid supply component (8), wherein the liquid supply component (8) comprises a high-purity water tank (81), a degreasing agent tank (82) and a chemical tank (83); the high-purity water tank (81) is connected to the first opening (52) in the on-off valve (45) provided on the immersion degreasing tank (34), the ultrasonic rinsing tank (35), the first rinsing and flushing tank (36), the second rinsing and flushing tank (37), the third rinsing and flushing tank (40), the fourth rinsing and flushing tank (41), the fifth rinsing and flushing tank (42) and the immersion spraying tank (43); the degreasing agent tank (82) is connected to the immersion degreasing tank (34); and the chemical tank (83) is connected to the first pickling tank (38) and the second pickling tank (39).

7. The silicon material cleaning device according to claim 1, characterized in that: The cleaning mechanism (3) comprises a PLC cabinet (84).

8. The silicon material cleaning device according to claim 1, characterized in that: The silicon material cleaning device comprises a drying mechanism (85), the transport component (31) is connected to the drying mechanism (85), the drying mechanism (85) comprises a drying shell (86), a fan (87) and a steam heating tank (88), the drying shell (86) is connected to the rack rod (44), the power component (33) is displaced on the rack rod (44), and the fan (87) is connected to the drying shell (86).

9. The silicon material cleaning device according to claim 8, characterized in that: The drying shell (86) includes a plurality of dewatering grooves (89) and a drying groove (90) arranged in sequence, the fan (87) is arranged adjacent to the dewatering groove (89), and the steam heating tank (88) is connected to the drying groove (90).

10. The silicon material cleaning device according to claim 8, characterized in that: The drying system is provided with a material identification mechanism.

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