Tail gas emission system of boron diffusion equipment and boron diffusion equipment

Abstract

The invention discloses a tail gas emission system of boron diffusion equipment and the boron diffusion equipment, and belongs to the field of tail gas treatment. The tail gas emission system is provided with a gas inlet main port and a gas exhaust main port, the tail gas emission system comprises a filtering device set, the filtering device set comprises at least one filtering device, a processing channel extending in the vertical direction is formed in a filtering container of the filtering device, and a plurality of partition plates arranged at intervals in the vertical direction are arranged in the processing channel; the at least two partition plates are suitable for being immersed in the liquid adsorption solvent in the filtering container, at least one side edge of any partition plate is separated from the inner wall of the treatment channel to form an air vent, the at least two adjacent air vents suitable for being immersed in the liquid adsorption solvent are arranged in a staggered mode in the vertical direction, and an air inlet pipe of the filtering device extends into the lower portion of the filtering container. The length of the treatment channel and the retention time of the tail gas in the treatment channel can be increased, and the contact time of the tail gas and the liquid adsorption solvent is prolonged, so that the removal efficiency of impurities in the tail gas is improved.

Description

Technical Field

[0001] The present application belongs to the technical field of tail gas treatment, and in particular, relates to a tail gas emission system of a boron expansion device and a boron expansion device. Background Art

[0002] During the operation of the boron expansion equipment, the tail gas generated by the vacuum furnace usually contains solid particles, harmful gases and other substances that need to be treated. In order to protect the environment and reduce tail gas pollution, these tail gases need to be effectively treated. Traditional tail gas treatment methods have the problems of poor treatment effect, high energy consumption and complex operation, and need to be improved. Summary of the invention

[0003] The present application aims to solve at least one of the technical problems existing in the prior art. To this end, the present application proposes a tail gas emission system and a boron expansion device for a boron expansion device, which can increase the length of a treatment channel and the residence time of the tail gas in the treatment channel, increase the contact time between the tail gas and the liquid adsorption solvent, and thus improve the efficiency of removing impurities in the tail gas.

[0004] In a first aspect, the present application provides an exhaust gas emission system of a boron expansion device, the exhaust gas emission system having an air intake port and an exhaust port, the air intake port being suitable for being connected to an air outlet of a vacuum furnace of the boron expansion device, and the exhaust gas emission system comprising:

[0005] A filter device group includes at least one filter device, wherein the filter container of the filter device forms a processing channel extending vertically, and a plurality of partitions arranged in a vertically spaced relationship are arranged in the processing channel, at least two of the partitions are suitable for being immersed in the liquid adsorption solvent in the filter container, at least one side edge of any of the partitions is spaced from the inner wall of the processing channel to form an air vent, at least two adjacent air vents suitable for being immersed in the liquid adsorption solvent are arranged in a vertically staggered manner, the air inlet pipe of the filter device extends into the lower part of the filter container, the inlet of the filter device group is used to be connected to the main air inlet port, and the outlet of the filter device group is used to be connected to the main exhaust port.

[0006] According to the exhaust gas emission system of the boron expansion equipment provided in the embodiment of the present application, a processing channel is arranged with a vertical extension and at least partially bent in a serpentine shape, and a filtering device is provided in which at least part of the processing channel is immersed in a liquid adsorption solvent. The length of the processing channel and the residence time of the exhaust gas in the processing channel can be increased, and the contact time between the exhaust gas and the liquid adsorption solvent can be increased, thereby improving the efficiency of removing impurities in the exhaust gas, so that the residual B2O3 in the exhaust gas can be adsorbed, and the pollution of B2O3 deposition to the rear-end diaphragm pump and the tail exhaust pipe can be reduced, thereby extending the maintenance period of the entire system and reducing the maintenance cost.

[0007] According to one embodiment of the present application, the union of the projections of the plurality of partitions in the vertical direction covers the projection of the processing channel in the vertical direction;

[0008] and / or,

[0009] The area of ​​any of the partitions is larger than the flow area of ​​the corresponding vent;

[0010] and / or,

[0011] The vents corresponding to any two adjacent partitions are staggered in the vertical direction;

[0012] and / or,

[0013] The partitions are arranged to extend in a horizontal direction.

[0014] According to one embodiment of the present application, the tail gas emission system of the boron expansion equipment further includes:

[0015] A protector, through which the air inlet pipe of the filter device is connected to the main air inlet;

[0016] and / or,

[0017] The terminal processor is used to connect the exhaust pipe of the filter device to the exhaust main port.

[0018] According to one embodiment of the present application, when the exhaust gas emission system includes the protector and the terminal processor, the exhaust gas emission system further includes:

[0019] A bypass pipeline, both ends of which are connected to the protector and the terminal processor respectively.

[0020] According to one embodiment of the present application, the tail gas emission system of the boron expansion equipment further includes:

[0021] A main water pipe, the inlet of which is used to be connected to a water source, and the outlet of which is connected to the filter container.

[0022] According to one embodiment of the present application, an adsorption filler is provided on the upper portion of the filtration container, and the adsorption filler is separated from the liquid surface of the liquid adsorption solvent.

[0023] According to one embodiment of the present application, there is at least one partition between the adsorption filler and the liquid surface of the liquid adsorption solvent.

[0024] According to one embodiment of the present application, the filter device group includes a plurality of the filter devices connected in series.

[0025] According to one embodiment of the present application, the filter device group includes: a first filter device, the filter container of the first filter device is provided with an atomizer, the atomizer is used to form atomized gas in the processing channel, and the atomizer is separated from the liquid surface of the liquid adsorption solvent.

[0026] According to an embodiment of the present application, the atomizer is provided between two adjacent partitions located above the liquid surface of the liquid adsorption solvent in the first filtering device.

[0027] According to one embodiment of the present application, the tail gas emission system of the boron expansion equipment further includes:

[0028] A circulation pump is connected between the bottom of the first filtering device and the atomizer.

[0029] According to one embodiment of the present application, the filter device group further includes: a second filter device, the second filter device is connected in series downstream of the first filter device, and a plurality of the partitions are provided above the liquid level of the liquid adsorption solvent in the second filter device.

[0030] In a second aspect, the present application provides a boron expansion device, comprising:

[0031] Vacuum furnace;

[0032] For example, in the tail gas emission system of the boron expansion equipment described in any of the above embodiments, the main air inlet of the tail gas emission system is connected to the air outlet of the vacuum furnace.

[0033] According to the boron expansion equipment provided in the embodiment of the present application, by setting up a tail gas emission system, the tail gas emission system is provided with a treatment channel arranged with a vertical extension and at least partially bent in a serpentine shape, and the treatment channel is at least partially immersed in a filtering device in the liquid adsorption solvent. The length of the treatment channel and the residence time of the tail gas in the treatment channel can be increased, and the contact time between the tail gas and the liquid adsorption solvent can be increased, thereby improving the efficiency of removing impurities in the tail gas, so that the residual B2O3 in the tail gas can be adsorbed, and the pollution of B2O3 deposition to the rear-end diaphragm pump and the tail exhaust pipe can be reduced, thereby extending the maintenance period of the entire system and reducing the maintenance cost.

[0034] Additional aspects and advantages of the present application will be given in part in the description below, and in part will become apparent from the description below, or will be learned through the practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] The above and / or additional aspects and advantages of the present application will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0036] Figure 1This is one of the structural schematic diagrams of the boron expansion device provided in the embodiment of the present application;

[0037] Figure 2 This is the second structural schematic diagram of the boron expansion equipment provided in the embodiment of the present application.

[0038] Reference numerals:

[0039] Filter device 1, filter container 2, partition 21, adsorption filler 22, first filter device 3, atomizer 31, circulation pump 32, second filter device 4, bypass pipe 5, main water pipe 6, protector 7, end processor 8, vacuum furnace 9. DETAILED DESCRIPTION

[0040] The embodiments of the present application are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application, and cannot be understood as limiting the present application.

[0041] Reference below Figure 1 and Figure 2 The exhaust gas emission system and the boron expansion device of the boron expansion device according to the embodiments of the present application are described.

[0042] like Figure 1 and Figure 2 As shown, the exhaust gas emission system of the boron expansion equipment in the embodiment of the present application has a main air inlet and a main air outlet, and the main air inlet is suitable for being connected to the air outlet of the vacuum furnace 9 of the boron expansion equipment.

[0043] The exhaust gas system has an air inlet connected to the exhaust port of the vacuum furnace 9 of the boron expansion equipment, and the exhaust gas system is used to treat the exhaust gas discharged from the exhaust port of the vacuum furnace 9 so that the exhaust gas meets the emission standards. The exhaust port of the exhaust gas system is suitable for connecting to the tail pipe or the outside world to discharge the treated exhaust gas.

[0044] The exhaust gas emission system includes: a filter device group, the filter device group includes at least one filter device 1, the filter container 2 of the filter device 1 forms a processing channel extending vertically, and a plurality of partitions 21 arranged vertically spaced apart are arranged in the processing channel, at least two partitions 21 are suitable for being immersed in the liquid adsorption solvent in the filter container 2, at least one side edge of any partition 21 is spaced from the inner wall of the processing channel to form an air vent, at least two adjacent air vents suitable for being immersed in the liquid adsorption solvent are staggered vertically, the air inlet pipe of the filter device 1 extends into the lower part of the filter container 2, the inlet of the filter device group is used to be connected to the main air inlet, and the outlet of the filter device group is used to be connected to the main exhaust port.

[0045] Among them, the filter device group includes one or more filter devices 1. When the filter device group includes multiple filter devices 1, the multiple filter devices 1 can be connected in series to improve the filtering effect, or the multiple filter devices 1 can be connected in parallel to perform targeted treatment on exhaust gas containing different pollutants to improve the treatment effect.

[0046] A processing channel is formed in the filter device 1, and the air inlet pipe of the filter device 1 extends into the lower part of the filter container 2. The exhaust gas can flow from bottom to top along the processing channel. The exhaust gas enters from the lower part of the filter container 2 along the processing channel, and the exhaust gas passes through the liquid adsorption solvent from bottom to top. The gas and solid impurities in the exhaust gas are adsorbed, absorbed and precipitated by the liquid adsorption solvent, and the exhaust gas temperature is reduced by the liquid adsorption solvent.

[0047] The exhaust gas enters the filter device 1 through the main air inlet, and at least two adjacent air vents in the liquid adsorption solvent are staggered in the vertical direction, that is, at least two adjacent partitions 21 are staggered, so that at least part of the processing channel is bent to form a serpentine shape. Due to the existence of the partition 21 and the staggered arrangement of the partition 21, the exhaust gas will change its flow direction multiple times in the processing channel of the liquid adsorption solvent, thereby increasing the length of the processing channel and the residence time of the exhaust gas in the processing channel, increasing the contact time between the exhaust gas and the liquid adsorption solvent, and thus improving the impurity removal efficiency in the exhaust gas.

[0048] Among them, multiple partitions 21 can all be located in the liquid adsorption solvent, or some partitions 21 can be located in the liquid adsorption solvent, and some partitions 21 can be located on the liquid surface of the liquid adsorption solvent, that is, at least part of the processing channel has the liquid adsorption solvent, so that the exhaust gas needs to pass through the liquid adsorption solvent, and pollutants such as boric oxide in the exhaust gas remain in the filtering device 1.

[0049] Two adjacent vents suitable for immersion in the liquid adsorption solvent are staggered vertically, that is, the part of the treatment channel located in the liquid adsorption solvent has at least one bend and reversal, which increases the contact area and contact time between the exhaust gas and the liquid adsorption solvent, reduces the flow rate and temperature of the exhaust gas, and improves the exhaust gas treatment effect.

[0050] In this embodiment, in the case of limited space or liquid accumulation, a serpentine treatment channel is formed by adding staggered partitions 21 in the liquid accumulation bottle, forcing the exhaust gas in the water and the air above the water to take an S-shaped route, which can increase the running path of the exhaust gas in the filter bottle, increase the movement time of the exhaust gas in the water, and improve the treatment effect of the exhaust gas.

[0051] Among them, according to the different designs of the position of the partition 21, the running path and moving time of the exhaust gas can be increased by 1 to 10 times, such as 3 times, 4 times, 5 times or 6 times. According to experimental data, a 30cm high liquid adsorption solvent can achieve or even exceed the liquid accumulation effect of a 90 to 180cm high liquid adsorption solvent, and during the serpentine direction change of the exhaust gas, the path extension and collision will break up the bubble state of the exhaust gas, thereby increasing the contact area and contact time between the exhaust gas and the accumulated liquid, thereby improving the system's cooling, adsorption and dissolution capabilities for the exhaust gas, and improving the filtration efficiency.

[0052] At the same time, the partition 21 of the gas part above the liquid surface of the liquid adsorption solvent can also play a gas-liquid separation effect, which can significantly reduce the liquid content in the tail gas after the system. Tests have proved that a small amount of liquid in the tail gas helps to improve the sealing of the pump, improve the performance of the pump, and is of great help in reducing the pump speed and increasing the service life of the pump.

[0053] In the related art, conventional cooling liquid bottles and fiber filters are used for the operation of boron expansion equipment. The operating state of the boron expansion equipment depends entirely on whether the tail exhaust of the equipment is blocked. If the tail exhaust is blocked, the pressure in the furnace tube will rise, and the vacuum degree required by the process cannot be guaranteed. In addition, the filter elements of conventional cooling liquid bottles and fiber filters are relatively expensive and consumed quickly, and can only filter larger B2O3 particles, which can easily cause the filtering effect of the original boron expansion tail exhaust to be unsatisfactory, resulting in blockage of the tail exhaust pipe, which needs to be replaced and cleaned regularly (about 10 to 15 days). In addition, the boron expansion equipment is blocked by B2O3, which affects the uptime of the boron expansion equipment, causing the process pressure of the boron expansion equipment to be unstable, the film formation uniformity is poor, and it cannot be used normally. In addition, the diaphragm of the diaphragm pump will reduce its service life due to residual B2O3 deposition. At the same time, the leakage of chlorine and boron oxide in the tail gas will release trace boric acid and hydrogen chloride gas in the air. The above gases are corrosive and polluting, causing the metal parts of the tail exhaust system equipment to rust and corrode, and the electrical aging speed is accelerated. In addition, the leaked gas is seriously harmful to the human body. At the same time, during the tail discharge modification process, boric oxide was hydrolyzed to remain in the liquid accumulating bottle. However, the boric oxide was in the form of bubbles, and the contact area with water was insufficient, resulting in insufficient dissolution of the boric oxide, and the white B2O3 powder in the tail discharge accumulated in the pipeline.

[0054] According to the exhaust gas emission system of the boron expansion equipment provided in the embodiment of the present application, a filtering device 1 is provided, and the filtering device 1 is arranged with a processing channel which extends vertically and is at least partially bent in a serpentine shape, and at least a part of the processing channel is immersed in a liquid adsorption solvent. This can increase the length of the processing channel and the residence time of the exhaust gas in the processing channel, increase the contact time between the exhaust gas and the liquid adsorption solvent, thereby improving the efficiency of removing impurities in the exhaust gas, so that the residual B2O3 in the exhaust gas can be adsorbed, and the pollution of the rear-end diaphragm pump and the tail pipe caused by B2O3 deposition is reduced, thereby extending the maintenance period of the entire system and reducing the maintenance cost.

[0055] In some embodiments, Figure 1 and Figure 2 As shown, the filter device group includes a plurality of filter devices 1 connected in series.

[0056] The filter device group includes a plurality of filter devices 1, which are connected in series. The number of filter devices 1 may be 2 or more, thereby enabling multiple treatments of the exhaust gas and increasing the treatment effect of harmful substances in the exhaust gas.

[0057] In some embodiments, the spacing between two adjacent partitions 21 can be between 10 mm and 50 mm, for example, 10 mm, 15 mm, 25 mm, or 40 mm, which can be specifically determined according to the height of the container. A smaller spacing can be used between two adjacent partitions 21 to improve the water vapor separation efficiency.

[0058] In some embodiments, the height of the filter container 2 is not less than 50 cm, for example 50 cm, 60 cm, 70 cm, 80 cm or longer. Designing and installing a plurality of matching partitions 21 in the longer filter container 2 can increase the path and duration of the exhaust gas, while reducing the flow resistance of the exhaust gas and improving the exhaust gas treatment effect.

[0059] In some embodiments, a union of projections of the plurality of partitions 21 along the vertical direction covers a projection of the processing channel along the vertical direction.

[0060] In this embodiment, along the vertical projection direction, the union of the vertical projections of multiple partitions 21 covers the vertical projection of the processing channel, so that the flow path of the exhaust gas in the processing channel is affected by the partition 21, and there is no uncontrolled area, thereby increasing the number of bends in the processing channel, extending the length of the processing channel and the residence time of the exhaust gas in the processing channel, and improving the exhaust gas treatment effect.

[0061] In some embodiments, the area of ​​any baffle 21 is larger than the flow area of ​​the corresponding vent.

[0062] In this embodiment, the area of ​​the partition 21 is larger than the flow area of ​​the vent, that is, the partition 21 is larger than half of the cross-sectional area of ​​the processing channel, that is, the shielding area of ​​the partition 21 is larger than the flow area of ​​the vent, which means that more exhaust gas will be guided by the partition 21 to the liquid adsorption solvent, and the smaller vent area can control and reduce the flow rate of the exhaust gas, which is beneficial to the adsorption reaction and improves the exhaust gas treatment effect.

[0063] In some embodiments, the vents corresponding to any two adjacent partitions 21 are staggered in the vertical direction.

[0064] In this embodiment, two adjacent vents are staggered vertically, and the processing channel changes direction vertically at each partition 21. The processing channel extends vertically in a serpentine shape, further increasing the length of the processing channel, increasing the contact area and contact time between the exhaust gas and the liquid adsorption solvent, reducing the flow rate and temperature of the exhaust gas, and improving the exhaust gas treatment effect.

[0065] In some embodiments, the partition 21 extends in a horizontal direction.

[0066] In this embodiment, the processing channel extends vertically, and the partition 21 is arranged in a horizontal direction perpendicular to the processing channel, which can maximize the length of the processing channel, improve the exhaust gas treatment effect, and make the partition 21 easier to process and install.

[0067] In some embodiments, the union of the vertical projections of the plurality of partitions 21 covers the vertical projection of the processing channel, and the area of ​​any partition 21 is larger than the flow area of ​​the corresponding vent.

[0068] In this embodiment, along the vertical projection direction, the union of the vertical projections of multiple partitions 21 covers the vertical projection of the processing channel, so that the flow path of the exhaust gas in the processing channel is affected by the partition 21, and there is no uncontrolled area, so that the number of bends of the processing channel can be increased, the length of the processing channel and the residence time of the exhaust gas in the processing channel can be extended, and the treatment effect of the exhaust gas is improved; at the same time, the area of ​​the partition 21 is larger than the flow area of ​​the vent, that is, the partition 21 is larger than half of the cross-sectional area of ​​the processing channel, that is, the blocking area of ​​the partition 21 is larger than the flow area of ​​the vent, which means that more exhaust gas will be guided to the liquid adsorption solvent by the partition 21, and the smaller vent area can control and reduce the flow rate of the exhaust gas, which is beneficial to the adsorption reaction and improves the treatment effect of the exhaust gas.

[0069] In some embodiments, the union of the vertical projections of the plurality of partitions 21 covers the vertical projection of the processing channel, and the vents corresponding to any two adjacent partitions 21 are staggered in the vertical direction.

[0070] In this embodiment, along the vertical projection direction, the union of the vertical projections of multiple partitions 21 covers the vertical projection of the processing channel, so that the flow path of the exhaust gas in the processing channel is affected by the partition 21, and there is no uncontrolled area, thereby increasing the number of bends of the processing channel, extending the length of the processing channel and the residence time of the exhaust gas in the processing channel, and improving the treatment effect of the exhaust gas; at the same time, two adjacent vents are staggered vertically, and the processing channel reverses vertically at each partition 21, and the processing channel extends vertically in a serpentine shape, further increasing the length of the processing channel, increasing the contact area and contact time between the exhaust gas and the liquid adsorption solvent, reducing the flow rate of the exhaust gas and the temperature of the exhaust gas, and improving the treatment effect of the exhaust gas.

[0071] In some embodiments, the union of the vertical projections of the plurality of partitions 21 covers the vertical projection of the processing channel, and the partitions 21 are arranged extending in the horizontal direction.

[0072] In this embodiment, along the vertical projection direction, the union of the vertical projections of multiple partitions 21 covers the vertical projection of the processing channel, so that the flow path of the exhaust gas in the processing channel is affected by the partition 21, and there is no uncontrolled area, thereby increasing the number of bends in the processing channel, extending the length of the processing channel and the residence time of the exhaust gas in the processing channel, and improving the treatment effect of the exhaust gas; at the same time, the processing channel extends vertically, and the partition 21 is arranged in a horizontal direction perpendicular to the processing channel, which can maximize the length of the processing channel, improve the treatment effect of the exhaust gas, and make the partition 21 easier to process and install.

[0073] In some embodiments, the area of ​​any partition 21 is larger than the flow area of ​​the corresponding vent, and the vents corresponding to any two adjacent partitions 21 are staggered in the vertical direction.

[0074] In this embodiment, the area of ​​the partition 21 is larger than the flow area of ​​the vent, that is, the partition 21 is larger than one-half of the cross-sectional area of ​​the processing channel, that is, the shielding area of ​​the partition 21 is larger than the flow area of ​​the vent, which means that more exhaust gas will be guided to the liquid adsorption solvent by the partition 21, while the smaller vent area can control and reduce the flow rate of the exhaust gas, which is conducive to the adsorption reaction and improves the treatment effect of the exhaust gas. At the same time, two adjacent vents are staggered in the vertical direction, and the processing channel is reversed at each partition 21 in the vertical direction. The processing channel is serpentine and extends vertically, further increasing the length of the processing channel, increasing the contact area and contact time between the exhaust gas and the liquid adsorption solvent, reducing the flow rate and temperature of the exhaust gas, and improving the treatment effect of the exhaust gas.

[0075] In some embodiments, the area of ​​any partition 21 is larger than the flow area of ​​the corresponding vent, and the partition 21 extends in a horizontal direction.

[0076] In this embodiment, the area of ​​the partition 21 is larger than the flow area of ​​the vent, that is, the partition 21 is larger than one-half of the cross-sectional area of ​​the processing channel, that is, the shielding area of ​​the partition 21 is larger than the flow area of ​​the vent, which means that more exhaust gas will be guided to the liquid adsorption solvent by the partition 21, and the smaller vent area can control and reduce the flow rate of the exhaust gas, which is beneficial to the adsorption reaction and improves the treatment effect of the exhaust gas; at the same time, the processing channel extends vertically, and the partition 21 is arranged in a horizontal direction perpendicular to the processing channel, which can maximize the length of the processing channel, improve the treatment effect of the exhaust gas, and make the partition 21 easier to process and install.

[0077] In some embodiments, the vents corresponding to any two adjacent partitions 21 are staggered in the vertical direction, and the partitions 21 are extended in the horizontal direction.

[0078] In this embodiment, two adjacent air vents are staggered vertically, and the processing channel changes direction vertically at each partition 21. The processing channel extends vertically in a serpentine shape, which further increases the length of the processing channel, increases the contact area and contact time between the exhaust gas and the liquid adsorption solvent, reduces the flow rate and temperature of the exhaust gas, and improves the treatment effect of the exhaust gas. At the same time, the processing channel extends vertically, and the partition 21 is arranged in a horizontal direction perpendicular to the processing channel, which can maximize the length of the processing channel, improve the treatment effect of the exhaust gas, and make the partition 21 easier to process and install.

[0079] In some embodiments, the union of the vertical projections of multiple partitions 21 covers the vertical projection of the processing channel, the area of ​​any partition 21 is larger than the flow area of ​​the corresponding vent, and the vents corresponding to any two adjacent partitions 21 are staggered vertically.

[0080] In this embodiment, along the vertical projection direction, the union of the vertical projections of multiple partitions 21 covers the vertical projection of the processing channel, so that the flow path of the exhaust gas in the processing channel is affected by the partition 21, and there is no uncontrolled area, thereby increasing the number of bends in the processing channel, extending the length of the processing channel and the residence time of the exhaust gas in the processing channel, and improving the treatment effect of the exhaust gas; at the same time, the area of ​​the partition 21 is larger than the flow area of ​​the vent, that is, the partition 21 is larger than one-half of the cross-sectional area of ​​the processing channel, that is, the shielding area of ​​the partition 21 is larger than the vent. The flow area of ​​the air port means that more exhaust gas will be guided to the liquid adsorption solvent by the partition 21, while the smaller air port area can control and reduce the flow rate of the exhaust gas, which is beneficial to the adsorption reaction and improves the treatment effect of the exhaust gas; two adjacent air ports are staggered vertically, and the treatment channel is reversed vertically at each partition 21. The treatment channel is serpentine and extends vertically, which further increases the length of the treatment channel, increases the contact area and contact time between the exhaust gas and the liquid adsorption solvent, reduces the flow rate and temperature of the exhaust gas, and improves the treatment effect of the exhaust gas.

[0081] In some embodiments, the union of the vertical projections of multiple partitions 21 covers the vertical projection of the processing channel, the area of ​​any partition 21 is larger than the flow area of ​​the corresponding vent, and the partitions 21 are extended in the horizontal direction.

[0082] In this embodiment, along the vertical projection direction, the union of the vertical projections of multiple partitions 21 covers the vertical projection of the processing channel, so that the flow path of the exhaust gas in the processing channel is affected by the partition 21, and there is no uncontrolled area, so that the number of bends of the processing channel can be increased, the length of the processing channel and the residence time of the exhaust gas in the processing channel can be extended, and the treatment effect of the exhaust gas can be improved; at the same time, the area of ​​the partition 21 is larger than the flow area of ​​the vent, that is, the partition 21 is larger than one-half of the cross-sectional area of ​​the processing channel, that is, the shielding area of ​​the partition 21 is larger than the flow area of ​​the vent, which means that more exhaust gas will be guided by the partition 21 to the liquid adsorption solvent, and the smaller vent area can control and reduce the flow rate of the exhaust gas, which is beneficial to the adsorption reaction and improves the treatment effect of the exhaust gas; at the same time, the processing channel extends vertically, and the partition 21 is arranged in a horizontal direction perpendicular to the processing channel, which can maximize the length of the processing channel, improve the treatment effect of the exhaust gas, and make the partition 21 easier to process and install.

[0083] In some embodiments, the union of the vertical projections of multiple partitions 21 covers the vertical projection of the processing channel, the vents corresponding to any two adjacent partitions 21 are staggered vertically, and the partitions 21 extend in the horizontal direction.

[0084] In this embodiment, along the vertical projection direction, the union of the vertical projections of multiple partitions 21 covers the vertical projection of the processing channel, so that the flow path of the exhaust gas in the processing channel is affected by the partition 21, and there is no uncontrolled area, so that the number of bends of the processing channel can be increased, the length of the processing channel and the residence time of the exhaust gas in the processing channel can be extended, and the treatment effect of the exhaust gas can be improved; at the same time, two adjacent vents are staggered vertically, and the processing channel is reversed vertically at each partition 21, and the processing channel is serpentinely bent and extended vertically, which further increases the length of the processing channel, increases the contact area and contact time between the exhaust gas and the liquid adsorption solvent, reduces the flow rate of the exhaust gas and the temperature of the exhaust gas, and improves the treatment effect of the exhaust gas; at the same time, the processing channel extends vertically, and the partition 21 is arranged in a horizontal direction perpendicular to the processing channel, which can maximize the length of the processing channel, improve the treatment effect of the exhaust gas, and make the partition 21 easier to process and install.

[0085] In some embodiments, Figure 1 and Figure 2 As shown, the area of ​​any partition 21 is larger than the flow area of ​​the corresponding vent, the vents corresponding to any two adjacent partitions 21 are staggered in the vertical direction, and the partitions 21 are extended in the horizontal direction.

[0086] In this embodiment, the area of ​​the partition 21 is larger than the flow area of ​​the vent, that is, the partition 21 is larger than one-half of the cross-sectional area of ​​the processing channel, that is, the shielding area of ​​the partition 21 is larger than the flow area of ​​the vent, which means that more exhaust gas will be guided to the liquid adsorption solvent by the partition 21, and the smaller vent area can control and reduce the flow rate of the exhaust gas, which is beneficial to the adsorption reaction and improves the treatment effect of the exhaust gas; at the same time, two adjacent vents are staggered vertically, and the processing channel is reversed vertically at each partition 21, and the processing channel is serpentine and extends vertically, further increasing the length of the processing channel, increasing the contact area and contact time between the exhaust gas and the liquid adsorption solvent, reducing the flow rate of the exhaust gas and the temperature of the exhaust gas, and improving the treatment effect of the exhaust gas; at the same time, the processing channel extends vertically, and the partition 21 is arranged in a horizontal direction perpendicular to the processing channel, which can maximize the length of the processing channel, improve the treatment effect of the exhaust gas, and make the partition 21 easier to process and install.

[0087] In some embodiments, the union of the vertical projections of multiple partitions 21 covers the vertical projection of the processing channel, the area of ​​any partition 21 is larger than the flow area of ​​the corresponding vent, the vents corresponding to any two adjacent partitions 21 are staggered vertically, and the partitions 21 extend in the horizontal direction.

[0088] In this embodiment, along the vertical projection direction, the union of the vertical projections of multiple partitions 21 covers the vertical projection of the processing channel, so that the flow path of the exhaust gas in the processing channel is affected by the partition 21, and there is no uncontrolled area, so that the number of bends in the processing channel can be increased, the length of the processing channel and the residence time of the exhaust gas in the processing channel can be extended, and the exhaust gas treatment effect can be improved; at the same time, the area of ​​the partition 21 is larger than the flow area of ​​the vent, that is, the partition 21 is larger than one-half of the cross-sectional area of ​​the processing channel, that is, the shielding area of ​​the partition 21 is larger than the flow area of ​​the vent, which means that more exhaust gas will be guided by the partition 21 to the liquid adsorption solvent, while the smaller vent The area can control and reduce the flow rate of the exhaust gas, which is beneficial to the adsorption reaction and improves the treatment effect of the exhaust gas; at the same time, the two adjacent air vents are staggered vertically, and the treatment channel is reversed vertically at each partition 21. The treatment channel is serpentine and extends vertically, which further increases the length of the treatment channel, increases the contact area and contact time between the exhaust gas and the liquid adsorption solvent, reduces the flow rate of the exhaust gas and the temperature of the exhaust gas, and improves the treatment effect of the exhaust gas; at the same time, the treatment channel extends vertically, and the partition 21 is arranged in a horizontal direction perpendicular to the treatment channel, which can maximize the length of the treatment channel, improve the treatment effect of the exhaust gas, and make the partition 21 easier to process and install.

[0089] In some embodiments, Figure 1 and Figure 2 As shown, the tail gas emission system of the boron expansion equipment also includes: a protector 7, and the air intake pipe of the filter device 1 is connected to the main air intake port through the protector 7.

[0090] In this embodiment, the protective device 7 can be a protective bottle or a protective tank. A space that can accommodate exhaust gas or liquid adsorption solvent is formed inside the protective device 7. The protective device 7 is arranged between the filter device 1 and the gas outlet of the vacuum furnace 9 of the boron expansion equipment, which can play a role in accumulating exhaust gas and equalizing the pressure. At the same time, when the liquid adsorption solvent flows back into the filter device 1, the protective device 7 can accommodate the backflowing liquid adsorption solvent, play a protective role, and improve the installability of the exhaust gas treatment device.

[0091] In some embodiments, the exhaust gas emission system of the boron expansion equipment further includes: a terminal processor 8, and the outlet pipe of the filter device 1 is connected to the exhaust main port through the terminal processor 8.

[0092] In this embodiment, the terminal processor 8 is arranged between the filter device 1 and the exhaust main port of the exhaust emission system. The terminal processor 8 can be a sealed bottle body or a tank body. The terminal processor 8 is a spare idle processing device. A cooling medium or a serpentine processing channel can be provided in the terminal processor 8 to reduce the temperature of the exhaust gas. Alternatively, the terminal processor 8 can be an empty bottle body, so that when too much water is injected into the filter container 2, the excess water can be discharged into the terminal processor 8, thereby reducing the risk of liquid leakage in the exhaust gas treatment system and improving its safety.

[0093] In some embodiments, Figure 1 and Figure 2 As shown, the exhaust gas emission system of the boron expansion equipment also includes: a protector 7 and a terminal processor 8. The air inlet pipe of the filter device 1 is connected to the air inlet through the protector 7, and the air outlet pipe of the filter device 1 is connected to the exhaust port through the terminal processor 8.

[0094] In this embodiment, the protective device 7 can be a protective bottle or a protective tank, and a space that can accommodate tail gas or liquid adsorption solvent is formed in the protective device 7. The protective device 7 is arranged between the filter device 1 and the gas outlet of the vacuum furnace 9 of the boron expansion device, which can play a role in equalizing the pressure of the tail gas. At the same time, in the case of backflow of the liquid adsorption solvent in the filter device 1, the protective device 7 can accommodate the backflow of the liquid adsorption solvent, play a role in preventing backflow, and improve the safety of the tail gas treatment device. At the same time, the terminal processor 8 is arranged between the filter device 1 and the exhaust main port of the tail gas emission system. The terminal processor 8 can be a sealed bottle body or a tank body. The terminal processor 8 is a spare idle processing device. A cooling medium or a serpentine processing channel can be arranged in the terminal processor 8 to reduce the temperature of the tail gas, or the terminal processor 8 can be an empty bottle body, so that when too much liquid adsorption solvent is injected into the filter container 2, the excess liquid adsorption solvent can be discharged into the terminal processor 8, reducing the risk of liquid leakage in the tail gas treatment system and improving its safety.

[0095] In some embodiments, Figure 1 and Figure 2 As shown, in the case where the exhaust gas emission system includes the protector 7 and the terminal processor 8, the exhaust gas emission system also includes: a bypass pipe 5, and both ends of the bypass pipe 5 are connected to the protector 7 and the terminal processor 8 respectively.

[0096] The bypass pipe 5 is connected in parallel with the filter device 1 , and the exhaust gas discharged from the gas outlet of the vacuum furnace 9 can reach the exhaust main port through the bypass pipe 5 or the filter device group.

[0097] Among them, the exhaust gas enters the protector 7 through the air pipe, and then the short-circuit valve and the special gas valve are used to control the exhaust gas to go through the bypass pipe 5 or the filter device group according to the process requirements. Specifically, whether the exhaust gas goes through the bypass pipe 5 or the filter device group can be determined based on whether the exhaust gas meets the emission standards.

[0098] The bypass pipe 5 forms an optional flow path. The short-circuit valve is installed on the bypass pipe 5. The short-circuit valve is used to control the connection and disconnection of the bypass pipe 5. When the system detects that the exhaust gas does not contain toxic gases such as B2O3, the short-circuit valve is opened, and the exhaust gas enters the bypass pipe 5 and is quickly discharged to the tail pipe, thereby reducing the exhaust resistance, extending the service life of the diaphragm, and quickly exhausting the gas to complete the entire exhaust treatment work; when the system detects that the exhaust gas contains toxic gases such as B2O3, the short-circuit valve is closed, and the exhaust gas is purified by the filter device 1 and discharged to the tail pipe.

[0099] In some embodiments, the tail gas emission system of the boron expansion equipment further includes: a main water pipe 6 , the inlet of the main water pipe 6 is used to be connected to a water source, and the outlet of the main water pipe 6 is connected to the filter container 2 .

[0100] The main water pipe 6 is used to replenish the liquid adsorption solvent to the filter container 2 . The main water pipe 6 can be connected to one or more filter containers 2 . The main water pipe 6 can replenish the liquid adsorption solvent to one or more filter containers 2 at the same time.

[0101] In some embodiments, a control valve is provided between the main water pipe 6 and the filter container 2, and the control valve is used to control the connection or disconnection of the main water pipe 6. When the control valve is opened, the main water pipe 6 replenishes the filter container 2 with liquid adsorption solvent; when the control valve is opened, the main water pipe 6 replenishes the filter container 2 with liquid adsorption solvent.

[0102] In some embodiments, an adsorption filler 22 is disposed on the upper portion of the filtration container 2 , and the adsorption filler 22 is separated from the liquid surface of the liquid adsorption solvent.

[0103] The adsorption filler 22 is stacked above the liquid surface of the liquid adsorption solvent, and the adsorption filler 22 may be stacked Raschig rings, Pall rings or sponges, etc. The adsorption filler 22 may have the effect of adsorbing pollutants in the exhaust gas and separating water vapor.

[0104] When the adsorption material is stacked Raschig rings, when the exhaust gas passes through the adsorption filler 22, the exhaust gas can pass through the gaps between the Raschig rings or through the internal gaps of the Raschig rings. The pollutants generated by condensation or sublimation of the exhaust gas will adhere to the outer and inner walls of the Raschig rings, thereby filtering the pollutants in the exhaust gas with the help of the Raschig rings.

[0105] In this embodiment, the adsorption filler 22 needs to be replaced or cleaned regularly to improve the smoothness of the exhaust gas passing through the adsorption filler 22 and improve the exhaust gas treatment efficiency; at the same time, the adsorption filler 22 is arranged downstream of the liquid adsorption solvent, which can reduce the frequency of replacement or cleaning of the adsorption filler 22 and reduce the cost of using the adsorption filler 22.

[0106] In some embodiments, at least one partition 21 is provided between the adsorption filler 22 and the liquid surface of the liquid adsorption solvent.

[0107] In this embodiment, one or more partitions 21 are arranged above the liquid surface of the liquid adsorption solvent and between the adsorption filler 22. The main function of the partition 21 is to prevent the solid adsorption filler 22 from directly contacting the liquid adsorption solvent, thereby reducing the situation that affects the adsorption performance of the adsorption filler 22 or causes liquid contamination; at the same time, the provision of one or more partitions 21 can reduce the flow rate of the exhaust gas, thereby prolonging the contact time between the exhaust gas and the adsorption filler 22, and enhancing the treatment effect of the exhaust gas.

[0108] In some embodiments, Figure 1 As shown, there is at least one partition 21 between the adsorption fillers 22 .

[0109] In this embodiment, a partition is provided inside the adsorption filler 22, which can guide the exhaust gas, prolong the contact time between the exhaust gas and the adsorption filler 22, and enhance the treatment effect of the exhaust gas.

[0110] In some embodiments, Figure 2 As shown, the filter device group includes: a first filter device 3, the filter container 2 of the first filter device 3 is provided with an atomizer 31, the atomizer 31 is used to form atomized gas in the processing channel, and the atomizer 31 is separated from the liquid surface of the liquid adsorption solvent.

[0111] In this embodiment, the atomized gas may be fine droplets or gas generated by the liquid adsorption solvent or other liquids. The formation of the atomized gas may help increase the contact area between the tail gas and the liquid adsorption solvent, thereby enhancing the adsorption effect between the harmful substances in the tail gas and the liquid adsorption solvent. The atomizer 31 is spaced apart from the liquid surface of the liquid adsorption solvent, which can make the atomized gas form above the liquid instead of being sprayed directly into the liquid adsorption solvent.

[0112] There may be one or more atomizers 31 , and one or more atomizers 31 may be disposed in a portion of the processing channel where no liquid adsorption solvent is disposed, and the tail gas passing through the liquid adsorption solvent needs to be subjected to atomization adsorption treatment by the atomizer 31 .

[0113] In some embodiments, Figure 2 As shown, an atomizer 31 is provided between two adjacent partitions 21 located above the liquid surface of the liquid adsorption solvent in the first filtering device 3 .

[0114] In this embodiment, the atomizer 31 includes multiple ones, and an atomizer 31 is arranged between two adjacent partitions 21. Atomized steam is generated in each partition 21 above the liquid surface of the liquid adsorption solvent, further increasing the contact area and adsorption efficiency between the exhaust gas and the liquid adsorption solvent.

[0115] In some embodiments, Figure 2 As shown, the tail gas emission system of the boron expansion equipment further includes: a circulation pump 32 , and the circulation pump 32 is connected between the bottom of the first filtering device 3 and the atomizer 31 .

[0116] In this embodiment, the function of the circulation pump 32 is to extract the liquid adsorption solvent from the bottom of the first filter device 3 and supply it to the atomizer 31 so as to form atomized vapor in the atomizer 31. This circulation design can make the liquid adsorption solvent continuously used and effectively utilized, and also helps to maintain the concentration and adsorption performance of the liquid adsorption solvent.

[0117] In some embodiments, Figure 2 As shown, the filter device group further includes: a second filter device 4 , which is connected in series downstream of the first filter device 3 , and a plurality of partitions 21 are provided above the liquid surface of the liquid adsorption solvent in the second filter device 4 .

[0118] In this embodiment, if Figure 2 As shown, the second filter device 4 may be located downstream of the first filter device 3 , which means that the exhaust gas is first processed by the first filter device 3 and then enters the second filter device 4 for further processing.

[0119] In the second filtering device 4, a plurality of partitions 21 are provided above the liquid surface of the liquid adsorption solvent, so as to increase the contact area and adsorption efficiency between the tail gas and the liquid adsorption solvent.

[0120] In this embodiment, the exhaust gas emission system of the boron expansion equipment effectively improves the adsorption and removal efficiency of harmful substances in the exhaust gas by using technical means such as liquid adsorption solvent and atomizing gas, thereby achieving effective treatment of the exhaust gas of the boron expansion equipment.

[0121] The complete working process of the tail gas emission system of a boron expansion device provided in this embodiment is described below:

[0122] like Figure 1 As shown, the exhaust gas enters the protector 7 through the air pipe, and then is controlled by the short-circuit valve to go through the filter device 1 or the bypass pipe 5 according to the process requirements. The exhaust gas is controlled by the short-circuit valve to go through the filter device 1, and passes through the first filter device 3 and the second filter device 4 according to the gas travel route, and then passes through the terminal processor 8, and finally discharged through the diaphragm pump.

[0123] The filter device 1 and the terminal processor 8 are provided with a plurality of partitions 21, which are staggered to form a processing channel extending in a vertical serpentine shape, which can increase the travel path and time of the exhaust gas, and maximize the time for the pollutants in the exhaust gas to react with the liquid adsorption solvent, thereby increasing the amount of boron oxide remaining in the filter device 1. After the exhaust gas passes through the plurality of partitions 21, the exhaust gas will travel upward and encounter the adsorption filler 22, which adsorbs the pollutants in the exhaust gas, further increasing the adsorption amount of the pollutants in the exhaust gas; the plurality of partitions 21 can increase the contact area between the exhaust gas and the liquid, and at the same time play the role of gas-liquid separation, reducing the amount of water vapor and pollutants entering the next filter device 1.

[0124] The tail gas enters the next filter device 1 and repeats the above steps, leaving part of the oxide and water vapor in the next filter device 1. Finally, it is further cooled in the terminal processor 8, leaving the remaining boron oxide in the terminal processor 8, so as to retain the boron oxide in the filter device group to the maximum extent.

[0125] The complete working process of the tail gas emission system of another boron expansion device provided in this embodiment is described below:

[0126] like Figure 2 As shown, the exhaust gas enters the protector 7 through the air pipe, and then is controlled by the short-circuit valve to go through the filter device 1 or the bypass pipe 5 according to the process requirements. The exhaust gas is controlled by the short-circuit valve to go through the filter device 1, and passes through the first filter device 3 and the second filter device 4 according to the gas travel route, and then passes through the terminal processor 8, and finally discharged through the diaphragm pump.

[0127] There is a small amount of liquid adsorption solvent in the first filter device 3. The first filter device 3 is equipped with a corrosion-resistant high-pressure pump and a corrosion-resistant atomizer 31. A plurality of partitions 21 are built in the bottle of the first filter device 3. An atomizer 31 is arranged between adjacent partitions 21. The partitions 21 can extend the path and duration of the exhaust gas in the first filter device 3, and the atomizer 31 is arranged on the path that the exhaust gas must pass through to form a large amount of atomized water vapor, so that the exhaust gas and the atomized water vapor can be fully combined, greatly improving the condensation and adsorption effect of boric oxide.

[0128] The second filtering device 4 has a large amount of liquid adsorption solvent and a plurality of partitions 21. The number of partitions 21 located in the liquid adsorption solvent is increased, which can further improve the filtering efficiency of the tail gas and perform preliminary water vapor separation at the same time.

[0129] The terminal processor 8 is equipped with a plurality of partitions 21 with a small plate spacing, and the terminal processor 8 can further separate the liquid water vapor in the tail gas.

[0130] An embodiment of the present application also provides a boron expansion device, including: a vacuum furnace 9 and an exhaust gas emission system of the boron expansion device as in any of the above embodiments, wherein the main air inlet of the exhaust gas emission system is connected to the air outlet of the vacuum furnace 9.

[0131] According to the boron expansion equipment provided in the embodiment of the present application, by setting up an exhaust gas emission system, the exhaust gas emission system is provided with a treatment channel arranged with a vertical extension and at least partially bent in a serpentine shape, and the filter device 1 of the treatment channel is at least partially immersed in the liquid adsorption solvent. The length of the treatment channel and the residence time of the exhaust gas in the treatment channel can be increased, and the contact time between the exhaust gas and the liquid adsorption solvent can be increased, thereby improving the efficiency of removing impurities in the exhaust gas, so that the residual B2O3 in the exhaust gas can be adsorbed, and the pollution of B2O3 deposition to the rear-end diaphragm pump and the tail pipe can be reduced, thereby extending the maintenance period of the entire system and reducing the maintenance cost.

[0132] The terms "first", "second", etc. in the specification and claims of the present application are used to distinguish similar objects, and are not used to describe a specific order or sequence. It should be understood that the data used in this way can be interchangeable under appropriate circumstances, so that the embodiments of the present application can be implemented in an order other than those illustrated or described here, and the objects distinguished by "first", "second", etc. are generally of one type, and the number of objects is not limited. For example, the first object can be one or more. In addition, "and / or" in the specification and claims represents at least one of the connected objects, and the character " / " generally indicates that the objects associated with each other are in an "or" relationship.

[0133] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0134] In the description of this application, "first feature" or "second feature" may include one or more of the features.

[0135] In the description of the present application, “plurality” means two or more.

[0136] In the description of the present application, a first feature being “on” or “under” a second feature may include that the first and second features are directly in contact with each other, or may include that the first and second features are not in direct contact with each other but are in contact with each other via another feature therebetween.

[0137] In the description of the present application, “above”, “over” and “above” a first feature to a second feature includes the first feature being directly above and obliquely above the second feature, or simply means that the first feature is horizontally higher than the second feature.

[0138] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in any one or more embodiments or examples in a suitable manner.

[0139] Although the embodiments of the present application have been shown and described, those skilled in the art will appreciate that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present application, and that the scope of the present application is defined by the claims and their equivalents.

Claims

1. An exhaust gas emission system for a boron expansion device, characterized in that: The tail gas emission system has an air intake main port and an exhaust main port, wherein the air intake main port is suitable for being connected to the air outlet of the vacuum furnace of the boron expansion equipment, and the tail gas emission system comprises: A filter device group includes at least one filter device, wherein the filter container of the filter device forms a processing channel extending vertically, and a plurality of partitions arranged in a vertically spaced relationship are arranged in the processing channel, at least two of the partitions are suitable for being immersed in the liquid adsorption solvent in the filter container, at least one side edge of any of the partitions is spaced from the inner wall of the processing channel to form an air vent, at least two adjacent air vents suitable for being immersed in the liquid adsorption solvent are arranged in a vertically staggered manner, the air inlet pipe of the filter device extends into the lower part of the filter container, the inlet of the filter device group is used to be connected to the main air inlet port, and the outlet of the filter device group is used to be connected to the main exhaust port.

2. The tail gas emission system of the boron expansion equipment according to claim 1, characterized in that: The union of the projections of the plurality of partitions in the vertical direction covers the projection of the processing channel in the vertical direction; and / or, The area of ​​any of the partitions is larger than the flow area of ​​the corresponding vent; and / or, The vents corresponding to any two adjacent partitions are staggered in the vertical direction; and / or, The partitions are arranged to extend in a horizontal direction.

3. The tail gas emission system of the boron expansion equipment according to claim 1, characterized in that: Also includes: A protector, through which the air inlet pipe of the filter device is connected to the main air inlet; and / or, The terminal processor is used to connect the exhaust pipe of the filter device to the exhaust main port.

4. The tail gas emission system of the boron expansion equipment according to claim 3, characterized in that: In the case where the exhaust gas emission system includes the protector and the terminal processor, the exhaust gas emission system further includes: A bypass pipeline, both ends of which are connected to the protector and the terminal processor respectively.

5. The tail gas emission system of the boron expansion equipment according to claim 1, characterized in that: Also includes: A main water pipe, the inlet of which is used to be connected to a water source, and the outlet of which is connected to the filter container.

6. The tail gas emission system of the boron expansion equipment according to any one of claims 1 to 5, characterized in that: An adsorption filler is disposed on the upper portion of the filtration container, and the adsorption filler is spaced apart from the liquid surface of the liquid adsorption solvent.

7. The tail gas emission system of the boron expansion equipment according to claim 6, characterized in that: At least one partition is provided between the adsorption filler and the liquid surface of the liquid adsorption solvent.

8. The tail gas emission system of the boron expansion equipment according to claim 6, characterized in that: The filter device group includes a plurality of the filter devices connected in series.

9. The tail gas emission system of the boron expansion equipment according to any one of claims 1 to 5, characterized in that: The filter device group comprises: a first filter device, wherein the filter container of the first filter device is provided with an atomizer, the atomizer is used to form atomized gas in the processing channel, and the atomizer is spaced apart from the liquid surface of the liquid adsorption solvent.

10. The tail gas emission system of the boron expansion equipment according to claim 9, characterized in that: The atomizer is disposed between two adjacent partitions located above the liquid surface of the liquid adsorption solvent in the first filtering device.

11. The tail gas emission system of the boron expansion equipment according to claim 9, characterized in that: Also includes: A circulation pump is connected between the bottom of the first filtering device and the atomizer.

12. The tail gas emission system of the boron expansion equipment according to claim 9, characterized in that: The filter device group further includes: a second filter device, which is connected in series downstream of the first filter device, and a plurality of partitions are provided above the liquid surface of the liquid adsorption solvent in the second filter device.

13. A boron expansion device, characterized in that: include: Vacuum furnace; The exhaust gas emission system of the boron expansion equipment according to any one of claims 1 to 12, wherein the main air inlet of the exhaust gas emission system is connected to the air outlet of the vacuum furnace.

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