Processing method of electrochromic glass and electrochromic glass substrate

Abstract

The invention provides a processing method of electrochromic glass and an electrochromic glass substrate. The processing method comprises the following steps: S1, pretreating a tempered glass substrate; s2, the pretreated tempered glass substrate is subjected to pressurization air cooling treatment, the air pressure in the pressurization air cooling treatment process ranges from 12000 Pa to 16000 Pa till the stress of the tempered glass substrate reaches a first expected stress value, and a prepared tempered glass substrate is obtained; and S3, electrochromism processing is conducted on the surface of the prepared tempered glass substrate, annealing treatment at the temperature of 300-400 DEG C is included in the electrochromism processing process, and the stress of the prepared tempered glass substrate reaches a second expected stress value. Compared with a conventional processing preparation technology, the preparation method has the advantages that the pressure of the electrochromic glass is increased to 90 Mpa or above, so that the electrochromic glass has richer performance and wider use scenes, and meanwhile, the preparation method also has the advantages of high controllability, good repeatability, stable product quality and the like.

Description

Technical Field

[0001] The present invention relates to the technical field of electrochromic glass, and in particular to a processing method of electrochromic glass and an electrochromic glass substrate. Background Art

[0002] In the current field of materials science and building technology, electrochromic tempered glass substrates have attracted much attention due to their unique dimming and energy-saving properties. This technology has broad application prospects in many fields such as building curtain walls, automotive glass, and smart homes. However, electrochromic tempered glass substrates inevitably undergo a series of heat treatment steps during the preparation process.

[0003] The high temperature during the heat treatment process will cause the surface stress distribution of the tempered glass substrate to change. This redistribution of stress may cause the surface stress of the glass to be lower than the safety standard, thereby affecting its impact resistance. In addition, heat treatment may also change the state of glass fragments, resulting in the failure to form fine particles that meet safety requirements when the glass is broken, thereby increasing the safety risks during use. These problems not only limit the application scope of electrochromic tempered glass, but also hinder its market promotion.

[0004] In order to overcome these difficulties, the industry has tried to combine electrochromic technology with the preparation process of high-strength tempered glass. However, this attempt faces the situation of complex and difficult-to-control processing technology, which makes it difficult to achieve ideal production efficiency and product stability. What is more serious is that the frequent self-explosion phenomenon during the processing not only threatens production safety, but also greatly increases production costs, limiting the commercialization process of electrochromic tempered glass substrates. Summary of the invention

[0005] To this end, the technical problem to be solved by the present invention is to overcome the problem of low strength or easy self-explosion of electrochromic glass in the prior art, and to provide a processing method for electrochromic glass and an electrochromic glass substrate.

[0006] To solve the above technical problems, the present invention provides a method for processing electrochromic glass, which comprises the following steps: step S1, pre-treating a tempered glass substrate; step S2, pressurizing and cooling the pre-treated tempered glass substrate, wherein the wind pressure during the pressurizing and cooling process is 12000-16000Pa, until the stress of the tempered glass substrate reaches a first expected stress value, thereby obtaining a prepared tempered glass substrate; step S3, performing electrochromic processing on the surface of the prepared tempered glass substrate, wherein the electrochromic processing process includes at least one annealing treatment, and the temperature of at least one annealing treatment is 300-400°C, so that the stress of the prepared tempered glass substrate reaches a second expected stress value, wherein the first expected stress value>the second expected stress value≥90Mpa, thereby obtaining a target electrochromic glass.

[0007] In one embodiment of the present invention, in step S1, the pretreatment includes cutting, grinding and cleaning processes performed in sequence.

[0008] In one embodiment of the present invention, in step S2, the pressurized air cooling treatment uses a horizontal forced convection tempering furnace, which is provided with an air grille, the air grille faces the pretreated tempered glass substrate, and the cooling medium covers the tempered glass substrate.

[0009] In one embodiment of the present invention, in step S2, the cooling medium is one of air, argon and nitrogen; in step S2, the pressurized air cooling treatment adopts graded cooling or gradient cooling.

[0010] In one embodiment of the present invention, in step S2, the first expected stress value is not less than 120 MPa.

[0011] In one embodiment of the present invention, in step S3, the electrochromic processing is specifically: coating the prepared tempered glass substrate, and then subjecting the coated prepared tempered glass substrate to at least one annealing treatment, wherein the time of any one of the annealing treatments is not less than 2 hours, and during this process, the stress of the prepared tempered glass substrate is reduced from the first expected stress value to the second expected stress value.

[0012] In one embodiment of the present invention, in step S3, the electrochromic processing is specifically: coating the prepared tempered glass substrate, and then annealing the coated prepared tempered glass substrate twice, wherein the temperature of the first annealing treatment is lower than the temperature of the second annealing treatment.

[0013] In one embodiment of the present invention, the temperature of the first annealing treatment is 200-300° C., the temperature of the second annealing treatment is 300-400° C., and the time of the first annealing treatment and / or the second annealing treatment is not less than 2 hours.

[0014] In one embodiment of the present invention, in step S2 and step S3, the first expected stress value and the second expected stress value are measured by one or more of optical stress detection, acoustic wave detection, cutting detection, surface indentation detection or laser detection.

[0015] The present invention also provides an electrochromic glass substrate, which is manufactured by adopting the above-mentioned electrochromic glass processing method.

[0016] The above technical solution of the present invention has the following advantages compared with the prior art:

[0017] The processing method of the electrochromic glass and the electrochromic glass substrate of the present invention use pressurized air cooling treatment to make the surface of the electrochromic glass substrate solidify rapidly under high pressure rapid cooling, while the interior still maintains a relatively high temperature, thereby forming high pressure stress on the surface and high tensile stress inside through the temperature difference between the inside and outside, thereby achieving the purpose of greatly improving the strength of the glass substrate. At the same time, during the electrochromic heat treatment process, the nickel sulfide inside the glass can slowly undergo phase change in the range of 300-400°C, and the volume becomes smaller, thereby greatly reducing the interaction force between the nickel sulfide and the surrounding glass, thereby greatly reducing the probability of self-explosion. Compared with conventional processing and preparation technology, this application increases the electrochromic glass to more than 90Mpa, so that it has richer performance and a wider range of use scenarios. At the same time, this application also has the significant advantages of simple preparation process, high controllability, good repeatability, stable product quality, etc., providing new ideas for the processing and preparation of new special glass. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to make the contents of the present invention more clearly understood, the present invention is further described in detail below based on specific embodiments of the present invention in conjunction with the accompanying drawings.

[0019] Figure 1 It is the surface stress change of the tempered glass substrate before and after heat treatment;

[0020] Figure 2 It is the relationship between the surface stress of the tempered glass substrate and the heat treatment temperature;

[0021] Figure 3 is a flow chart of a method for processing electrochromic glass in a preferred embodiment of the present invention;

[0022] Figure 4 It is a graph showing the relationship between wind pressure and surface stress of the tempered glass substrate during the pressurized air cooling process;

[0023] Figure 5 It is a comparison of the surface stress of the tempered glass substrate before and after heat treatment in the preferred embodiment of the present invention. DETAILED DESCRIPTION

[0024] The present invention is further described below in conjunction with the accompanying drawings and specific embodiments so that those skilled in the art can better understand the present invention and implement it, but the embodiments are not intended to limit the present invention.

[0025] It is worth noting that the surface stress of tempered glass is currently required to be 90Mpa or above, but the conventional electrochromic process requires heat treatment and coating. Therefore, after heating, the surface stress of the glass substrate will be damaged to a certain extent. For details, see Figure 1 It can be seen that the surface stress of the conventional tempered glass substrate decreases by more than 10 MPa after the heat treatment. Therefore, the surface stress of the conventional tempered glass after the electrochromic treatment is difficult to meet the requirements of tempered glass.

[0026] Based on the above conclusions, the present application further explores the relationship between glass surface stress and heat treatment temperature, see Figure 2 As shown, Figure 2 a) shows the changes in glass surface stress at 0-200°C. As the treatment time increases, no obvious stress changes occur on the surface. Figure 2 b) shows the stress change of glass surface at 200-300℃. With the increase of treatment time, the surface stress begins to gradually and steadily decrease, and reaches the critical point required for tempered glass in about 2 hours; Figure 2 c) shows the stress change of glass surface stress at 300-400℃. As the treatment time increases, the surface stress decreases, and the decreasing rate is faster than that at low temperature.

[0027] Based on the above research, this application is committed to completing the electrochromic processing under the premise of ensuring that the glass substrate meets the stress requirements of tempered glass, as follows:

[0028] Embodiment 1

[0029] See also Figure 3 As shown, this embodiment provides a method for processing electrochromic glass, which includes the following steps:

[0030] Step S1, pre-treating the tempered glass substrate; in this embodiment, the pre-treating includes cutting, grinding and cleaning in sequence. The cutting process can cut the original glass plate into a substrate of a desired size and shape according to the design requirements; the grinding process can remove the edge burrs and uneven parts generated during the cutting process to ensure that the edge of the glass substrate is smooth and safe; the cleaning process can remove dust, oil stains, fingerprints and other impurities on the glass surface to ensure the cleanliness of the glass surface for subsequent processing.

[0031] Step S2, subjecting the pretreated tempered glass substrate to pressurized air cooling treatment, wherein the air pressure during the pressurized air cooling treatment is 12000Pa, until the stress of the tempered glass substrate reaches the first expected stress value, thereby obtaining a prepared tempered glass substrate; in this embodiment, the pressurized air cooling treatment adopts a horizontal forced convection tempering furnace, wherein a wind grid is provided inside the furnace, wherein the wind grid faces the pretreated tempered glass substrate, and the cooling medium covers the tempered glass substrate to ensure the uniformity of the cooling effect; in different embodiments, the wind grid needs to be adjusted according to parameters such as the size and thickness of the glass substrate to improve its operating efficiency. Furthermore, the cooling medium in this embodiment is air, which adopts gradient cooling to improve the cooling speed and uniformity of the glass substrate.

[0032] Further, see Figure 4 As shown, based on the wind pressure setting of 12000Pa, the first expected stress value in this embodiment can be stably maintained at 120Mpa and above.

[0033] Step S3, performing electrochromic processing on the surface of the prepared tempered glass substrate, including at least one annealing process during the electrochromic processing, and the temperature of at least one of the annealing processes is 300-400°C, so that the stress of the prepared tempered glass substrate reaches a second expected stress value, wherein the first expected stress value>the second expected stress value≥90Mpa, and the target electrochromic glass is obtained. Furthermore, the electrochromic processing is specifically: coating the prepared tempered glass substrate, and then performing at least one annealing process on the coated prepared tempered glass substrate, and the time of any one of the annealing processes is not less than 2 hours. During this process, the stress of the prepared tempered glass substrate is reduced from the first expected stress value to the second expected stress value.

[0034] Specifically, in this embodiment, the prepared tempered glass substrate after coating is annealed twice, and the two annealing treatments are performed for 2 hours each, thereby avoiding excessive decrease in the surface stress of the glass substrate. Furthermore, experiments have found that the order of heat treatment also has an impact on the final glass surface stress. The use of a low temperature followed by a high temperature treatment can further reduce the loss of surface stress of the glass substrate. Based on this, the temperature of the first annealing treatment in this embodiment is lower than the temperature of the second annealing treatment, specifically: the temperature of the first annealing treatment is 200-300°C, and the temperature of the second annealing treatment is 300-400°C. See Figure 5 As shown in the figure, after the above processing, the surface stress of the glass substrate can be stabilized above 95Mpa, which is Figure 1 Compared with the conventional treatment method shown, the surface stress is significantly improved and can meet the requirements of tempered glass.

[0035] It is worth noting that in step S2 and step S3 of this embodiment, the first expected stress value and the second expected stress value are measured by one or more of optical stress detection, acoustic wave detection, cutting detection, surface indentation detection or laser detection. The specific method can be flexibly adjusted according to actual detection needs, and the present invention does not impose specific restrictions on this.

[0036] Embodiment 2

[0037] This embodiment provides another method for processing electrochromic glass, which includes the following steps:

[0038] Step S1, pre-processing the tempered glass substrate; in this embodiment, the pre-processing includes cutting, grinding and cleaning processes performed in sequence.

[0039] Step S2, subjecting the pretreated tempered glass substrate to pressurized air cooling treatment, wherein the air pressure during the pressurized air cooling treatment is 16000 Pa, until the stress of the tempered glass substrate reaches the first expected stress value, thereby obtaining a prepared tempered glass substrate. Furthermore, the cooling medium in this embodiment is argon gas, which is processed by a graded cooling method to improve the cooling speed and uniformity of the glass substrate. In other embodiments, the cooling medium may also be set to other gases such as nitrogen, and the present invention does not make specific restrictions on this.

[0040] Furthermore, based on the wind pressure setting of 16000Pa, the first expected stress value in this embodiment can be stably maintained at 130Mpa and above.

[0041] Step S3, performing electrochromic processing on the surface of the prepared tempered glass substrate, including at least one annealing treatment during the electrochromic processing, and the temperature of at least one of the annealing treatments is 300-400° C., so that the stress of the prepared tempered glass substrate reaches a second expected stress value, wherein the first expected stress value>the second expected stress value≥90Mpa, to obtain a target electrochromic glass.

[0042] Embodiment 3

[0043] This embodiment provides another method for processing electrochromic glass, which includes the following steps:

[0044] Step S1, pre-processing the tempered glass substrate; in this embodiment, the pre-processing includes cutting, grinding and cleaning processes performed in sequence.

[0045] Step S2, performing a pressurized air cooling treatment on the pretreated tempered glass substrate, wherein the air pressure during the pressurized air cooling treatment is 14000 Pa, until the stress of the tempered glass substrate reaches a first expected stress value, thereby obtaining a prepared tempered glass substrate.

[0046] Furthermore, based on the wind pressure setting of 14000Pa, the first expected stress value in this embodiment can be stably maintained at about 130Mpa.

[0047] Step S3, performing electrochromic processing on the surface of the prepared tempered glass substrate, including at least one annealing treatment during the electrochromic processing, and the temperature of at least one of the annealing treatments is 300-400° C., so that the stress of the prepared tempered glass substrate reaches a second expected stress value, wherein the first expected stress value>the second expected stress value≥90Mpa, to obtain a target electrochromic glass.

[0048] Embodiment 4

[0049] This embodiment provides an electrochromic glass substrate, which is manufactured by using the electrochromic glass processing method described in the first embodiment.

[0050] In summary, the electrochromic glass processing method and electrochromic glass substrate described in the present invention, through pressurized air cooling treatment, the surface of the electrochromic glass substrate is rapidly solidified under high pressure rapid cooling state, while the interior is still kept at a relatively high temperature, thereby forming high pressure stress on the surface and high tensile stress inside through the temperature difference between the inside and outside, thereby achieving the purpose of greatly improving the strength of the glass substrate. At the same time, during the electrochromic heat treatment process, the nickel sulfide inside the glass can slowly undergo phase change in the range of 300-400°C, and the volume becomes smaller, thereby greatly reducing the interaction force between the nickel sulfide and the surrounding glass, thereby greatly reducing the probability of self-explosion. Compared with conventional processing and preparation technology, this application increases the electrochromic glass to more than 90Mpa, so that it has richer performance and a wider range of use scenarios. At the same time, this application also has the significant advantages of simple preparation process, high controllability, good repeatability, stable product quality, etc., providing new ideas for the processing and preparation of new special glass.

[0051] Obviously, the above embodiments are merely examples for clear explanation and are not intended to limit the implementation methods. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all the implementation methods here. The obvious changes or modifications derived from these are still within the protection scope of the invention.

Claims

1. A method for processing electrochromic glass, characterized in that: The steps include: Step S1, pre-treating the tempered glass substrate; Step S2, performing a pressurized air cooling treatment on the pretreated tempered glass substrate, wherein the air pressure during the pressurized air cooling treatment is 12000-16000 Pa, until the stress of the tempered glass substrate reaches a first expected stress value, thereby obtaining a prepared tempered glass substrate; Step S3, performing electrochromic processing on the surface of the prepared tempered glass substrate, including at least one annealing treatment during the electrochromic processing, and the temperature of at least one of the annealing treatments is 300-400° C., so that the stress of the prepared tempered glass substrate reaches a second expected stress value, wherein the first expected stress value>the second expected stress value≥90Mpa, to obtain a target electrochromic glass.

2. The method for processing electrochromic glass according to claim 1, characterized in that: In step S1, the pretreatment includes cutting, grinding and cleaning processes performed in sequence.

3. The method for processing electrochromic glass according to claim 1, characterized in that: In step S2, the pressurized air cooling treatment adopts a horizontal forced convection tempering furnace, wherein a wind grid is provided inside the furnace, the wind grid faces the pretreated tempered glass substrate, and the cooling medium covers the tempered glass substrate.

4. The method for processing electrochromic glass according to claim 1, characterized in that: In step S2, the cooling medium is one of air, argon and nitrogen; in step S2, the pressurized air cooling treatment adopts graded cooling or gradient cooling.

5. The method for processing electrochromic glass according to claim 1, characterized in that: In step S2, the first expected stress value is not less than 120 MPa.

6. The method for processing electrochromic glass according to claim 1, characterized in that: In step S3, the electrochromic processing is specifically: coating the prepared tempered glass substrate, and then annealing the coated prepared tempered glass substrate at least once, and the time of any annealing treatment is not less than 2 hours. During this process, the stress of the prepared tempered glass substrate is reduced from the first expected stress value to the second expected stress value.

7. The method for processing electrochromic glass according to claim 1, characterized in that: In step S3, the electrochromic process specifically includes: coating the prepared tempered glass substrate, and then subjecting the coated prepared tempered glass substrate to two annealing treatments, wherein the temperature of the first annealing treatment is lower than the temperature of the second annealing treatment.

8. The method for processing electrochromic glass according to claim 7, characterized in that: The temperature of the first annealing treatment is 200-300° C., the temperature of the second annealing treatment is 300-400° C., and the time of the first annealing treatment and / or the second annealing treatment is not less than 2 hours.

9. The method for processing electrochromic glass according to claim 1, characterized in that: In step S2 and step S3, the first expected stress value and the second expected stress value are measured by one or more of optical stress detection, acoustic wave detection, cutting detection, surface indentation detection or laser detection.

10. An electrochromic glass substrate, characterized in that: The electrochromic glass is manufactured by the processing method of any one of claims 1 to 9.

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