Color photovoltaic module and preparation method thereof

Abstract

The invention discloses a color photovoltaic module which comprises a first glass substrate, a first dielectric film layer and a solar cell, the first dielectric film layer is deposited on the first glass substrate, and the solar cell is connected with the first dielectric film layer through an organic polymer. The first glass substrate, the first dielectric film layer and the solar cell are distributed in a layered manner; the first dielectric film layer is of a multi-layer structure, and the refractive indexes of multiple layers of the first dielectric film layer change. The invention also discloses a preparation method of the color photovoltaic module. According to the invention, the aesthetic effect of the photovoltaic module is improved, and the power generation income of the color photovoltaic module is improved.

Description

Technical Field

[0001] The present invention relates to the field of photovoltaic technology, and in particular to a color photovoltaic component and a preparation method thereof. Background Art

[0002] With the rapid development of economy and the continuous advancement of technology, the global demand for energy has increased significantly. However, traditional fossil fuels, such as coal, oil and natural gas, will produce certain pollutants and greenhouse gases during use, which will in turn cause environmental problems such as acid rain and greenhouse effect, threatening natural ecology and human health. Therefore, it is particularly important to develop and utilize sustainable clean energy, among which solar energy has become the focus of development due to its inexhaustible and pollution-free characteristics.

[0003] As a new energy technology, colored photovoltaic modules cater to this trend. Different from traditional photovoltaic modules, colored photovoltaic modules not only have the function of power generation, but also can be used as building materials to provide rich color choices and aesthetics, meet the requirements of photovoltaic building integration (BIPV), and make the building have both ecological functions and technological beauty.

[0004] In the development process of modern society, consumers' aesthetic standards are constantly improving, and designers' demand for color and diversity of building appearance is growing. Therefore, traditional black photovoltaic modules can no longer meet the needs of the market, and there is an urgent need to introduce diversity and aesthetic elements into photovoltaic buildings to highlight the uniqueness of the building. However, traditional photovoltaic modules are usually limited by the color of solar cells, resulting in a single color, which in turn affects the realization of architectural diversity. In addition, traditional crystalline silicon photovoltaic modules and thin-film solar cell modules have obvious metal grids, which reduces the aesthetics of BIPV products. In contrast, the development of colored photovoltaic modules with flat surfaces and rich colors will not only help promote aesthetic breakthroughs, but also enhance safety and improve the acceptance and application breadth of BIPV products in the market. In addition, colored bifacial photovoltaic modules can significantly increase power generation compared to single-sided modules in facade applications; colored bifacial photovoltaic modules help improve the power generation efficiency of the entire photovoltaic system, providing new possibilities for the development of photovoltaic building integration.

[0005] Therefore, technicians in this field are committed to providing a colored photovoltaic module and a preparation method thereof to improve the aesthetics of the photovoltaic module and increase the power generation income of the photovoltaic module. Summary of the invention

[0006] In view of the defects in the prior art, the technical problem to be solved by the present invention is how to provide a photovoltaic module and a preparation method thereof that can improve the aesthetics and power generation benefits.

[0007] To achieve the above-mentioned purpose, the present invention provides a color photovoltaic module, comprising a first glass substrate, a first dielectric film layer, and a solar cell, wherein the first dielectric film layer is deposited on the first glass substrate, the solar cell is connected to the first dielectric film layer through an organic polymer, and the first glass substrate, the first dielectric film layer, and the solar cell are distributed in layers; the first dielectric film layer is a multi-layer structure, and the refractive index of the multiple layers of the first dielectric film layer changes.

[0008] Preferably, the first glass substrate is ultra-white tempered glass with a light transmittance of not less than 90%.

[0009] Furthermore, the first dielectric film layer is formed by alternately depositing materials with different refractive indices.

[0010] Furthermore, it also includes a black substrate, and the black substrate is connected to the solar cell through an organic polymer.

[0011] Furthermore, the black substrate is a hollow structure, and the black substrate is hollowed out according to the structure of the solar cell.

[0012] Preferably, it further comprises a second glass substrate and a second dielectric film layer, wherein the second dielectric film layer is deposited on the second glass substrate, the second dielectric film layer is connected to the black substrate via an organic polymer, and the second dielectric film layer is a multilayer structure with a varying refractive index.

[0013] Preferably, the second glass substrate is the same as the first glass substrate, and the second dielectric film layer is the same as the first dielectric film layer.

[0014] The present invention also provides a method for preparing a colored photovoltaic module, comprising:

[0015] Performing surface etching on a glass substrate to form a glass substrate;

[0016] Pre-treating the glass substrate;

[0017] Depositing a dielectric film layer on the surface of the glass substrate;

[0018] A glass substrate, a dielectric film layer, a solar cell sheet and an organic adhesive film are stacked and laminated in order to obtain a color photovoltaic module.

[0019] Furthermore, when depositing the dielectric film layer, dielectric materials with different refractive indices are sputtered layer by layer in an argon environment.

[0020] Furthermore, it also includes: manufacturing a black substrate with a hollow structure according to the structure of the solar cell.

[0021] The present invention has at least the following beneficial technical effects:

[0022] The colored photovoltaic module of the present invention utilizes a colored dielectric film layer to reflect specific visible light, thereby improving the black appearance of a traditional photovoltaic module and expanding the application scenarios of the photovoltaic module in the fields of construction and transportation; a hollow black substrate is utilized to achieve uniform colorization, thereby improving the overall aesthetic effect of the colored module; the colored photovoltaic module can be expanded into a double-sided structure, thereby increasing the power generation income of the photovoltaic module.

[0023] The concept, specific structure and technical effects of the present invention will be further described below in conjunction with the accompanying drawings to fully understand the purpose, characteristics and effects of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 is a schematic structural diagram of a colored double-sided photovoltaic module according to an embodiment of the present invention;

[0025] Figure 2 is a schematic structural diagram of a black substrate according to an embodiment of the present invention;

[0026] Figure 3 is a graph showing the reflectivity variation of the light silver-grey dielectric film layer at different wavelengths according to an embodiment of the present invention;

[0027] Figure 4 1 is a graph showing the reflectivity variation of the sky blue dielectric film layer at different wavelengths according to an embodiment of the present invention. DETAILED DESCRIPTION

[0028] The following describes the preferred embodiments of the present invention to make its technical content clearer and easier to understand. The present invention can be embodied in many different forms of embodiments, and the protection scope of the present invention is not limited to the embodiments mentioned in the text.

[0029] In the drawings, components with the same structure are indicated by the same numerical reference numerals, and components with similar structures or functions are indicated by similar numerical reference numerals. The size and thickness of each component shown in the drawings are arbitrarily shown, and the present invention does not limit the size and thickness of each component. In order to make the illustration clearer, the thickness of the components is appropriately exaggerated in some places in the drawings.

[0030] The present invention provides a colored photovoltaic module, which uses a dielectric film layer to reflect specific visible light to achieve the colorization of the photovoltaic module, thereby improving the black appearance of the traditional photovoltaic module. The dielectric film layer is formed by the alternating deposition of multiple layers of materials with different refractive indices. By adjusting the refractive index combination of the materials or by changing the thickness of the corresponding film layer, different spectral reflection curves can be achieved, thereby achieving efficient component color adjustment to meet the actual needs of different application scenarios. The dielectric film layer of the present invention is optimized and designed to minimize the reflection of the photovoltaic response band on the basis of achieving the target color, ensure a higher current output, achieve a higher photoelectric conversion efficiency, and broaden its application scenarios.

[0031] The dielectric film layer of the present invention can be used on one side of a solar cell to form a single-sided colored photovoltaic module; it can also be used on both sides of a solar cell to form a double-sided colored photovoltaic module. The double-sided colored photovoltaic module can further increase the power generation and improve the power generation efficiency of the photovoltaic system.

[0032] As Figure 1 shown in the structural schematic diagram of the colored double-sided photovoltaic module of this embodiment, the colored double-sided photovoltaic module is formed by laminating a glass substrate, a dielectric film layer, a solar cell, a black substrate, and an organic polymer in layers. The glass substrates and dielectric film layers on both sides of the solar cell have the same structure, so the same reference numerals are used. In Figure 1 the view direction shown, from top to bottom in sequence are: glass substrate 1, dielectric film layer 2, organic polymer 3, solar cell 4, organic polymer 3, black substrate 5, organic polymer 3, dielectric film layer 2, glass substrate 1, thus obtaining the colored double-sided photovoltaic module.

[0033] In this embodiment, the glass substrate 1 is ultra-clear tempered glass with a thickness of 5 mm, a refractive index of 1.4 < n1 < 1.6 at 550 nm, and a light transmittance of not less than 90%.

[0034] The organic polymer 3 uses an organic adhesive film (POE) with a thickness of 0.95 mm.

[0035] The solar cell 4 is a conventional photovoltaic power generation cell.

[0036] The dielectric film layer 2 is formed by alternately depositing materials with different refractive indices. According to the application requirements of different scenarios, the refractive index combination of the materials and the thickness of the corresponding film layers can be adjusted to achieve color adjustment.

[0037] The black substrate 5 has a hollow structure. As Figure 2 shown, the black substrate 5 is hollowed out according to the structure of the solar cell 4 to ensure filling the gaps of the solar cell 4. By using the hollowed black substrate 5, the color uniformity is achieved, and the overall aesthetic effect of the colored module is improved.

[0038] For the colored double-sided photovoltaic module of this embodiment, removing the dielectric film layer 2 and the glass substrate 1 on one side of the black substrate 5 can obtain a single-sided colored photovoltaic module.

[0039] The present invention also provides a preparation method for a colored photovoltaic module, including the following processes: surface etching of a glass substrate to form a glass substrate; pretreatment of the glass substrate; deposition of a dielectric film layer on the surface of the glass substrate; making a black substrate with a hollow structure according to the structure of the solar cell; laminating the glass substrate, the dielectric film layer, the solar cell, and the organic adhesive film in sequence to obtain a colored photovoltaic module.

[0040] The present invention also provides specific embodiments of a light silver-grey colored double-sided photovoltaic module and a sky blue colored double-sided photovoltaic module.

[0041] Example 1

[0042] The light silver-gray colored double-sided photovoltaic module with a 7-layer structure in this embodiment has the following specific structure: air / / glass substrate / / high refractive index layer H with a thickness of 205±5nm / / low refractive index layer L with a thickness of 60±5nm / / high refractive index layer H with a thickness of 75±5nm / / low refractive index layer L with a thickness of 55±5nm / / high refractive index layer H with a thickness of 130±5nm / / low refractive index layer L with a thickness of 10±5nm / / high refractive index layer H with a thickness of 130±5nm / / organic film / / solar cell / / organic film / / black substrate / / organic film / / same light silver-gray dielectric film layer / / glass substrate, the light silver-gray dielectric film layer includes the following arranged layer by layer:

[0043] The first dielectric material layer (H): made of high refractive index material TiO2 (n at 550nm) H =2.44) formed a high refractive index layer H with a thickness of 207nm;

[0044] The second dielectric material layer (L): made of low refractive index material SiO2 (n at 550nm) L =1.46) formed low refractive index layer L, thickness is 59nm;

[0045] The third dielectric material layer (H): made of high refractive index material TiO2 (n at 550nm) H =2.44) formed a high refractive index layer H with a thickness of 75nm;

[0046] The fourth dielectric material layer (L): made of low refractive index material SiO2 (n at 550nm) L =1.46) formed low refractive index layer L, thickness is 56nm;

[0047] The fifth dielectric material layer (H): made of high refractive index material TiO2 (n at 550nm) H =2.44) formed a high refractive index layer H with a thickness of 129nm;

[0048] The sixth dielectric material layer (L): made of low refractive index material SiO2 (n at 550nm) L =1.46) formed low refractive index layer L, thickness is 9nm;

[0049] The seventh dielectric material layer (H): made of high refractive index material TiO2 (n at 550nm) H =2.44) and has a high refractive index layer H with a thickness of 129 nm.

[0050] The preparation of light silver-grey colored bifacial photovoltaic modules comprises the following steps:

[0051] (1) Glass surface etching

[0052] The glass substrate is cleaned to remove surface dirt and grease; then, the glass surface is treated with a chemical etchant (such as hydrofluoric acid) to form the desired rough texture by controlling the etching time and chemical concentration; finally, it needs to be thoroughly cleaned to remove residual chemicals to obtain a glass substrate.

[0053] (2) Substrate pretreatment

[0054] The glass substrate is initially cleaned and dried with a neutral detergent and deionized water; then it is placed in a transition chamber of a coating device and the surface of the glass substrate is secondarily cleaned by bombardment with an ion source.

[0055] (3) Deposition to form a light silver-gray dielectric film layer

[0056] First dielectric material layer H (TiO2): A TiO2 target with a purity of 99.99% was selected for the preparation of TiO2; the pretreated glass substrate entered the coating chamber and was evacuated to a vacuum degree of 5.0×10 -5 mTorr, the sputtering power of the DC power supply is set to 300W, an inert working gas Ar with a purity of 99.99% is introduced, and the working gas pressure is 25 mTorr, and a first dielectric material layer H with a thickness of 207 nm is prepared on the pretreated glass substrate;

[0057] Second dielectric material layer L (SiO2): SiO2 target material with a purity of 99.99% was selected for the preparation of SiO2; the background vacuum of the equipment reached 5.0×10 -5 mTorr, the sputtering power of the RF power supply is set to 300W, an inert working gas Ar with a purity of 99.99% is introduced, the working gas pressure is 25mTorr, and a second dielectric material layer L with a thickness of 59nm is prepared on the first dielectric material layer;

[0058] The third dielectric material layer H (TiO2): a TiO2 target with a purity of 99.99% is selected for the preparation of TiO2; vacuum is drawn to a vacuum degree of 5.0×10 -5 mTorr, the DC power supply sputtering power is set to 300W, an inert working gas Ar with a purity of 99.99% is introduced, the working gas pressure is 25mTorr, and a third dielectric material layer H with a thickness of 75nm is prepared on the second dielectric material layer;

[0059] Fourth dielectric material layer L (SiO2): SiO2 target material with a purity of 99.99% was selected for the preparation of SiO2; the background vacuum of the equipment reached 5.0×10 -5 mTorr, the sputtering power of the RF power supply is set to 300W, an inert working gas Ar with a purity of 99.99% is introduced, and the working gas pressure is 25 mTorr, and a fourth dielectric material layer L with a thickness of 59 nm is prepared on the third dielectric material layer;

[0060] Fifth dielectric material layer H (TiO2): Select TiO2 target material with a purity of 99.99% to prepare TiO2; evacuate the vacuum to a degree of 5.0×10 -5 mTorr, the DC power supply sputtering power is set to 300W, an inert working gas Ar with a purity of 99.99% is introduced, the working gas pressure is 25mTorr, and a fifth dielectric material layer H with a thickness of 129nm is prepared on the fourth dielectric material layer;

[0061] The sixth dielectric material layer L (SiO2): SiO2 target material with a purity of 99.99% is selected for the preparation of SiO2; the background vacuum of the equipment reaches 5.0×10 -5 mTorr, the sputtering power of the RF power supply is set to 300W, an inert working gas Ar with a purity of 99.99% is introduced, the working gas pressure is 25 mTorr, and a sixth dielectric material layer L with a thickness of 9 nm is prepared on the fifth dielectric material layer;

[0062] The seventh dielectric material layer H (TiO2): a TiO2 target with a purity of 99.99% was selected for the preparation of TiO2; vacuum was drawn to a vacuum degree of 5.0×10 -5 When the sputtering power of the DC power supply is 300W, the inert working gas Ar with a purity of 99.99% is introduced, the working gas pressure is 25mTorr, and a seventh dielectric material layer H with a thickness of 129nm is prepared on the sixth dielectric material layer; thus, a light silver-gray dielectric film layer with a 7-layer structure is obtained.

[0063] (4) Making a black substrate

[0064] The black organic substrate is hollowed out according to the arrangement of the solar cells to ensure that the gaps between the solar cells are filled.

[0065] (5) Making colored bifacial photovoltaic modules

[0066] After stacking in the order of glass substrate / / light silver-grey dielectric film layer / / organic film / / solar cell / / organic film / / black substrate / / organic film / / light silver-grey dielectric film layer / / glass substrate, put into a laminator to produce a light silver-grey double-sided photovoltaic module.

[0067] Example 2

[0068] The sky blue colored double-sided photovoltaic module with a 7-layer structure in this embodiment has the following specific structure: air / / glass substrate / / high refractive index layer H with a thickness of 40±20nm / / low refractive index layer L with a thickness of 70±20nm / / high refractive index layer H with a thickness of 40±20nm / / low refractive index layer L with a thickness of 70±20nm / / high refractive index layer H with a thickness of 40±20nm / / low refractive index layer L with a thickness of 70±5nm / / high refractive index layer H with a thickness of 40±20nm / / organic film / / solar cell / / organic film / / black substrate / / organic film / / same sky blue dielectric film layer / / glass substrate, the sky blue dielectric film layer includes the following arranged layer by layer:

[0069] The first dielectric material layer (H): made of high refractive index material TiO2 (n at 550nm) H =2.44) formed a high refractive index layer H with a thickness of 40nm;

[0070] The second dielectric material layer (L): made of low refractive index material SiO2 (n at 550nm) L =1.46) formed low refractive index layer L, thickness is 72nm;

[0071] The third dielectric material layer (H): made of high refractive index material TiO2 (n at 550nm) H =2.44) formed a high refractive index layer H with a thickness of 40nm;

[0072] The fourth dielectric material layer (L): made of low refractive index material SiO2 (n at 550nm) L =1.46) formed low refractive index layer L, thickness is 72nm;

[0073] The fifth dielectric material layer (H): made of high refractive index material TiO2 (n at 550nm) H =2.44) formed a high refractive index layer H with a thickness of 40nm;

[0074] The sixth dielectric material layer (L): made of low refractive index material SiO2 (n at 550nm) L =1.46) formed low refractive index layer L, thickness is 72nm;

[0075] The seventh dielectric material layer (H): made of high refractive index material TiO2 (n at 550nm) H =2.44) and has a high refractive index layer H with a thickness of 40 nm.

[0076] The preparation of a sky-blue dielectric film colored bifacial photovoltaic module comprises the following steps:

[0077] (1) Glass surface etching

[0078] The glass substrate is cleaned to remove surface dirt and grease; then, the glass surface is treated with a chemical etchant (such as hydrofluoric acid) to form the desired rough texture by controlling the etching time and chemical concentration; finally, it needs to be thoroughly cleaned to remove residual chemicals to obtain a glass substrate.

[0079] (2) Substrate pretreatment

[0080] The glass substrate is initially cleaned and dried with a neutral detergent and deionized water; then it is placed in a transition chamber of a coating device and the surface of the glass substrate is secondarily cleaned by bombardment with an ion source.

[0081] (3) Deposition to form a sky blue dielectric film layer

[0082] First dielectric material layer H (TiO2): A TiO2 target with a purity of 99.99% was selected for the preparation of TiO2; the pretreated glass substrate entered the coating chamber and was evacuated to a vacuum degree of 5.0×10 -5 When the background vacuum is 1000 mTorr, the sputtering power of the DC power supply is set to 300w, the inert working gas Ar with a purity of 99.99% is introduced, and the working gas pressure is 25 mTorr, and a first dielectric material layer H with a thickness of 40nm is prepared on the pre-treated glass substrate;

[0083] Second dielectric material layer L (SiO2): SiO2 target material with a purity of 99.99% was selected for the preparation of SiO2; the background vacuum of the equipment reached 5.0×10 -5 mTorr, the sputtering power of the RF power supply is set to 300w, an inert working gas Ar with a purity of 99.99% is introduced, the working gas pressure is 25mTorr, and a second dielectric material layer L with a thickness of 72nm is prepared on the first dielectric material layer;

[0084] The third dielectric material layer H (TiO2): a TiO2 target with a purity of 99.99% is selected for the preparation of TiO2; vacuum is drawn to a vacuum degree of 5.0×10 -5 When the background vacuum is 1000 mTorr, the sputtering power of the DC power supply is set to 300w, and the inert working gas Ar with a purity of 99.99% is introduced. The working gas pressure is 25 mTorr, and a third dielectric material layer H with a thickness of 40nm is prepared on the second dielectric material layer;

[0085] Fourth dielectric material layer L (SiO2): SiO2 target material with a purity of 99.99% was selected for the preparation of SiO2; the background vacuum of the equipment reached 5.0×10 -5mTorr, the sputtering power of the RF power supply is set to 300w, an inert working gas Ar with a purity of 99.99% is introduced, the working gas pressure is 25mTorr, and a fourth dielectric material layer L with a thickness of 72nm is prepared on the third dielectric material layer;

[0086] Fifth dielectric material layer H (TiO2): Select TiO2 target material with a purity of 99.99% to prepare TiO2; evacuate the vacuum to a degree of 5.0×10 -5 When the background vacuum is 1000 mTorr, the sputtering power of the DC power supply is set to 300w, and the inert working gas Ar with a purity of 99.99% is introduced. The working gas pressure is 25 mTorr, and a fifth dielectric material layer H with a thickness of 40nm is prepared on the fourth dielectric material layer;

[0087] The sixth dielectric material layer L (SiO2): SiO2 target material with a purity of 99.99% is selected for the preparation of SiO2; the background vacuum of the equipment reaches 5.0×10 -5 mTorr, the sputtering power of the RF power supply is set to 300w, an inert working gas Ar with a purity of 99.99% is introduced, the working gas pressure is 25mTorr, and a sixth dielectric material layer L with a thickness of 72nm is prepared on the fifth dielectric material layer;

[0088] The seventh dielectric material layer H (TiO2): a TiO2 target material with a purity of 99.99% was selected for the preparation of TiO2; vacuum was drawn to a vacuum degree of 5.0×10 -5 When the background vacuum is mTorr, the sputtering power of the DC power supply is set to 300w, the inert working gas Ar with a purity of 99.99% is introduced, the working gas pressure is 25mTorr, and a seventh dielectric material layer H with a thickness of 40nm is prepared on the sixth dielectric material layer; that is, a sky blue dielectric film layer with a 7-layer structure is obtained.

[0089] (4) Making a black substrate

[0090] The black organic substrate is hollowed out according to the arrangement of the solar cells to ensure that the gaps between the solar cells are filled.

[0091] (5) Making colored bifacial photovoltaic modules

[0092] After stacking in the order of glass substrate / / sky blue dielectric film layer / / solar cell / / organic film / / black substrate / / organic film / / sky blue dielectric film layer / / glass substrate, put them into a laminator to produce a sky blue double-sided photovoltaic module.

[0093] The performance of the color medium film layers of Example 1 and Example 2 were tested respectively, including reflectivity and color saturation. The test results are as follows: Figure 3 and Figure 4As shown. Figure 3 and Figure 4 It can be seen that the reflection peak is basically concentrated in the spectral wavelength range of the corresponding color, while the reflectivity of the remaining wavelengths is relatively low. This characteristic ensures that the dielectric film layer can exhibit excellent color performance while maintaining a high transmittance.

[0094] The preferred specific embodiments of the present invention are described in detail above. It should be understood that a person skilled in the art can make many modifications and changes based on the concept of the present invention without creative work. Therefore, any technical solution that can be obtained by a person skilled in the art through logical analysis, reasoning or limited experiments based on the concept of the present invention on the basis of the prior art should be within the scope of protection determined by the claims.

Claims

1. A color photovoltaic module, characterized in that: The invention comprises a first glass substrate, a first dielectric film layer, and a solar cell. The first dielectric film layer is deposited on the first glass substrate. The solar cell is connected to the first dielectric film layer through an organic polymer. The first glass substrate, the first dielectric film layer, and the solar cell are distributed in layers. The first dielectric film layer is a multi-layer structure, and the refractive index of the multi-layers of the first dielectric film layer changes.

2. The color photovoltaic module according to claim 1, characterized in that: The first glass substrate is ultra-white tempered glass with a light transmittance of not less than 90%.

3. The color photovoltaic module according to claim 1, characterized in that: The first dielectric film layer is formed by alternately depositing materials with different refractive indices.

4. The color photovoltaic module according to claim 1, characterized in that: The invention also comprises a black substrate, wherein the black substrate is connected to the solar cell sheet through an organic polymer.

5. The color photovoltaic module according to claim 4, characterized in that: The black substrate is a hollow structure, and the black substrate is hollowed out according to the structure of the solar cell.

6. The color photovoltaic module according to claim 4, characterized in that: It also includes a second glass substrate and a second dielectric film layer. The second dielectric film layer is deposited on the second glass substrate. The second dielectric film layer is connected to the black substrate via an organic polymer. The second dielectric film layer is a multilayer structure with a varying refractive index.

7. The color photovoltaic module according to claim 6, characterized in that: The second glass substrate is the same as the first glass substrate, and the second dielectric film layer is the same as the first dielectric film layer.

8. The method for preparing a colored photovoltaic module according to any one of claims 1 to 7, characterized in that: include: Performing surface etching on a glass substrate to form a glass substrate; Pre-treating the glass substrate; Depositing a dielectric film layer on the surface of the glass substrate; A glass substrate, a dielectric film layer, a solar cell sheet and an organic adhesive film are stacked and laminated in order to obtain a color photovoltaic module.

9. The method for preparing a colored photovoltaic module according to claim 8, characterized in that: When depositing the dielectric film layer, dielectric materials with different refractive indices are sputtered layer by layer in an argon environment.

10. The method for preparing a colored photovoltaic module according to claim 8, characterized in that: Also includes: A black substrate with a hollow structure is manufactured according to the structure of a solar cell.

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