Absorption tower for continuous sodium hypochlorite production

Abstract

The invention discloses an absorption tower for continuous sodium hypochlorite production, and relates to the technical field of sodium hypochlorite production, the absorption tower comprises a tower body, the top in the tower body is provided with a spraying mechanism, the bottom of the tower body is communicated with a gas inlet pipe, the tower body is internally provided with a filler layer, and the filler layer is located between the spraying mechanism and the gas inlet pipe; the spraying mechanism comprises a water inlet pipe and a nozzle, the water inlet pipe is fixedly mounted on the tower wall of the tower body, one end of the water inlet pipe extends into the tower body, the nozzle is mounted at the end, located in the tower body, of the water inlet pipe, and the end, located outside the tower body, of the water inlet pipe is communicated with the liquid caustic soda storage tank through a pipeline. The invention aims to solve the problem that the reaction process is influenced due to the poor contact area of liquid caustic soda and chlorine in the production of sodium hypochlorite in the prior art. The device has the advantages that the nozzles make circumferential diffusion movement in the circumferential direction through the diffusion mechanism, the contact area of chlorine and liquid is increased, the reaction process of the absorption tower is accelerated, and therefore the production efficiency is improved.

Description

Technical Field

[0001] The invention relates to the technical field of sodium hypochlorite production, in particular to an absorption tower for continuous sodium hypochlorite production. Background Art

[0002] Sodium hypochlorite is an inorganic chlorine-containing disinfectant, commonly used as a bleaching agent in pulp, textiles and chemical fibers, and as a water purifier, bactericide, disinfectant, etc. in water treatment. In the production of sodium hypochlorite, a primary or secondary absorption process is generally adopted, by using 15%~18% sodium hydroxide solution to absorb chlorine gas and react to generate sodium hypochlorite.

[0003] In the prior art, in the production of sodium hypochlorite, alkali solution and industrial water are generally mixed into liquid alkali within the target concentration. Chlorine gas enters from the bottom of the tail chlorine absorption tower, and is fully contacted with the liquid alkali flowing down from the top of the tower in the tower. It circulates through the sodium hypochlorite circulation tank to react and produce qualified sodium hypochlorite. Among them, the contact area between liquid and gas affects the reaction process of the absorption tower.

[0004] In view of the above technical problems, the present invention discloses an absorption tower for continuous sodium hypochlorite production. The present invention has the advantages of increasing the contact area between chlorine and liquid by arranging a nozzle at the top of the tower and making the nozzle perform circular diffusion motion in the circumferential direction through a diffusion mechanism, thereby accelerating the reaction process of the absorption tower, thereby improving production efficiency, etc. Summary of the invention

[0005] The purpose of the present invention is to overcome the shortcomings of the prior art and provide an absorption tower for continuous sodium hypochlorite production to solve the technical problems in the prior art that the contact area between liquid alkali and chlorine gas is poor and affects the reaction process in the production of sodium hypochlorite. The present invention has the advantages of making the nozzle present a circular diffusion motion in the circumferential direction through a diffusion mechanism, increasing the contact area between chlorine gas and liquid, thereby accelerating the reaction process of the absorption tower, thereby improving production efficiency, etc.

[0006] The present invention is achieved through the following technical solutions: The present invention discloses an absorption tower for continuous sodium hypochlorite production, comprising a tower body, a spraying mechanism is arranged on the top of the tower body, an air inlet pipe is arranged at the bottom of the tower body, a packing layer is arranged inside the tower body, and the packing layer is located between the spraying mechanism and the air inlet pipe; The spraying mechanism includes a water inlet pipe and a spray nozzle. The water inlet pipe is fixedly installed on the tower wall of the tower body. One end of the water inlet pipe extends to the inside of the tower body. The end of the water inlet pipe located inside the tower body is equipped with a spray nozzle. The end of the water inlet pipe located outside the tower body is connected to the liquid alkali storage tank through a pipeline. The nozzle is connected to the water inlet pipe through a hose, and the nozzle moves and sprays in the tower body through a diffusion mechanism.

[0007] Furthermore, the diffusion mechanism includes a diffusion disk, a diffusion guide groove, a rotating shaft, a driving component, a swing rod, a moving block and a guide column. The diffusion disk is located above the packing layer in the tower body. A rotating shaft is rotatably arranged at the center of the diffusion disk, and both ends of the rotating shaft extend to the top and bottom of the diffusion disk respectively. One end of the rotating shaft located above the diffusion disk extends to the top of the tower body and is transmission-connected to the driving component. A swing rod is fixedly arranged on the side wall of one end of the rotating shaft located below the diffusion disk. A moving block is slidingly arranged on the swing rod along the length direction. A guide column is fixedly connected to the top of the moving block. A diffusion guide groove is concavely provided on the lower end surface of the diffusion disk. One end of the guide column on the top of the moving block is movably inserted into the inside of the diffusion guide groove, and the nozzle is fixedly installed on the bottom surface of the moving block.

[0008] Furthermore, the diffusion guide groove is configured as a spiral groove extending from a point close to the outer circumference of the diffusion disk toward the center of the diffusion disk, and a guide ball is fixedly provided at one end of the guide column located inside the diffusion guide groove.

[0009] Furthermore, the guide column includes a plug-in part, a telescopic part and a snap part, the plug-in part is used to be inserted into the interior of the diffusion guide groove, the guide ball is fixedly arranged on the top of the plug-in part, the telescopic part is arranged between the plug-in part and the moving block, and the telescopic part is positioned by the snap part, and a slope is arranged at the end of the diffusion guide groove close to the center of the circle, and the bottom wall of the diffusion guide groove smoothly transitions to the surface of the diffusion disk through the slope, and a reset spring is arranged on one side of the moving block to rebound the moving block toward the outer circumference of the diffusion disk.

[0010] Furthermore, the telescopic part includes a sleeve, an insertion rod and an elastic support member. The sleeve is configured to be cylindrical and fixedly arranged on the top of the moving block. The sleeve has an opening at one end facing upward. The insertion rod is slidably inserted into the interior of the sleeve. The insertion part is fixedly arranged on the top of the insertion rod, and the insertion rod rebounds toward the diffusion disk through the elastic support member.

[0011] Furthermore, the buckle part includes a pin, a socket and a push pin. The outer wall of the plug rod is movably connected with the pin, and one end of the pin passes through the outer wall of the plug rod and extends to the outside of the plug rod. The inner wall of the sleeve is provided with a socket, and the socket and the pin on the outer wall of the plug rod are arranged in the same direction. The end of the pin located on the outside of the plug rod is plugged into the socket, and the pin also rebounds toward the socket through an external push spring. The socket penetrates the tube wall of the sleeve, and a push pin is slidably provided on one side of the inner part of the socket close to the outer circumference of the sleeve, and the thickness of the push pin is the same as that of the tube wall. The push pin slides within the inner part of the socket through a limit block and a limit groove.

[0012] Furthermore, a trigger ring is fixedly provided on one side of the diffusion disc provided with the diffusion guide groove, and the inner diameter of the trigger ring is larger than the diameter of the outermost circle of the diffusion guide groove. The trigger ring is used to limit the movement of the sleeve in the radial direction.

[0013] Furthermore, the ejector pin on the outer wall of the sleeve is arranged on a side of the outer wall of the sleeve facing the inner ring of the trigger ring.

[0014] The present invention has the following advantages: The present invention provides a packing layer inside the tower body, and the packing layer is located between the tower body spraying mechanism and the air inlet pipe, so that the liquid flows along the packing surface through the packing layer to form a liquid film, which is dispersed in the continuously flowing gas to increase the contact area, and by providing a diffusion mechanism, the nozzle is made to move in a spiral centripetal direction in the circumferential direction, so that the solution sprayed by the nozzle can be evenly diffused and sprinkled on the packing layer in the circumferential direction, so that the nozzle not only sprays at a fixed point on the packing layer, but the nozzle can move along the radial centripetal of the tower body, so that the solution is evenly sprayed on the packing layer, thereby increasing the spraying area of ​​the solution, further increasing the contact area between the solution and the gas, accelerating its reaction speed, and thus improving production efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a schematic diagram of the overall structure of the present invention; Figure 2 It is a schematic diagram of the internal structure of the absorption tower of the present invention; Figure 3 This is a structural schematic diagram of a diffusion plate provided with a diffusion groove on one side of the present invention; Figure 4 For the present invention Figure 3 A local enlarged structural schematic diagram; Figure 5 It is a schematic diagram of the structure of the diffusion plate and the guide column of the present invention; Figure 6 For the present invention Figure 5 A schematic diagram of the local enlarged structure at B; Figure 7 It is a structural schematic diagram of the connection state between the sleeve and the insertion rod when the guide ball of the present invention is in the guide groove; Figure 8 It is a structural schematic diagram of the present invention in which the guide ball is separated from the guide groove sleeve and connected to the insertion rod; Fig. 9 For the present invention Figure 7 A schematic diagram of the local enlarged structure at D; Fig.10 For the present invention Figure 7 Schematic diagram of the local enlarged structure at C.

[0016] In the figure: 1, tower body; 2, spraying mechanism; 3, air inlet pipe; 4, liquid alkali storage tank; 5, delivery pump; 6, diffusion mechanism; 7, slide; 8, slide rod; 9, guide ball; 10, ramp; 11, dovetail plug; 12, dovetail groove; 13, movable hole; 14, through hole; 15, external top spring; 16, limit block; 17, limit groove; 18, trigger ring; 19, reset spring; 20, packing layer; 201, water inlet pipe; 202, Nozzle; 601, diffusion disk; 602, diffusion guide groove; 603, rotating shaft; 604, driving component; 605, swing rod; 606, moving block; 607, guide column; 671, plug-in part; 672, telescopic part; 673, snap-on part; 721, sleeve; 722, plug rod; 723, elastic support member; 731, latch; 732, socket; 733, ejector pin; 7311, limit disk; 7312, plug-in column. DETAILED DESCRIPTION

[0017] The following is a detailed description of an embodiment of the present invention. This embodiment is implemented on the premise of the technical solution of the present invention, and a detailed implementation method and a specific operation process are given. However, the protection scope of the present invention is not limited to the following embodiments. In the description of the present invention, words indicating directions or positional relationships such as "front", "rear", "left", and "right" are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as a limitation on the present invention.

[0018] The embodiment discloses a continuous sodium hypochlorite production absorption tower, such as Figure 1-Figure 10 As shown, it includes a tower body 1, wherein, as Figure 1-Figure 2 As shown, a spraying mechanism 2 is provided at the top of the tower body 1, and the spraying mechanism 2 is used to spray the liquid alkali solution toward the inside of the tower, and an air inlet pipe 3 is provided at the bottom of the tower body 1, and the air inlet pipe 3 is used to discharge chlorine gas toward the inside of the tower body 1, so that the chlorine gas enters from the bottom of the tower body 1 and moves from bottom to top, and the spraying mechanism 2 sprays the liquid alkali solution from top to bottom, so that the chlorine gas in the tower is fully contacted with the liquid alkali flowing down from the top of the tower in countercurrent, and in order to increase the contact area, a packing layer 20 is provided inside the tower body 1, and the packing layer 20 is located between the spraying mechanism 2 of the tower body 1 and the air inlet pipe 3, and then the liquid flows along the surface of the packing through the packing layer 20 to form a liquid film, which is dispersed in the continuously flowing gas to increase the contact area; The liquid alkali solution inside the absorption tower is supplied through the liquid alkali storage tank 4 , the liquid alkali storage tank 4 and the tower body 1 are connected by a pipeline, and are pumped by a delivery pump 5 .

[0019] like Figure 1-Figure 4As shown, the spraying mechanism 2 includes a water inlet pipe 201 and a nozzle 202, wherein the water inlet pipe 201 is fixedly installed on the tower wall of the tower body 1, and one end of the water inlet pipe 201 extends to the interior of the tower body 1, and the end of the water inlet pipe 201 located inside the tower body 1 is installed with the nozzle 202, the spray hole of the nozzle 202 faces downward, and the end of the water inlet pipe 201 located outside the tower body 1 is connected to the liquid alkali storage tank 4 through a pipeline.

[0020] In order to further increase the contact area between liquid alkali and chlorine gas, thereby accelerating the reaction process and improving production efficiency, in this embodiment, the nozzle 202 is connected to the water inlet pipe 201 through a hose, and a diffusion mechanism 6 is provided so that the nozzle 202 can be moved and sprayed in the tower, so that the sprayed solution can be evenly distributed in the tower, and the sprayed solution is prevented from being fixed at one point. The diffusion mechanism 6 allows the nozzle 202 to move in a spiral centripetal motion in the circumferential direction, so that the solution sprayed by the nozzle 202 can be evenly diffused in the circumferential direction and sprinkled on the packing layer 20. The nozzle 202 can move centrifugally along the radial direction of the tower body 1, thereby increasing the contact area between the solution and the gas and accelerating its reaction speed, thereby improving production efficiency.

[0021] like Figure 1-Figure 6 As shown, the diffusion mechanism 6 includes a diffusion disk 601, a diffusion guide groove 602, a rotating shaft 603, a driving component 604, a swing rod 605, a moving block 606 and a guide column 607, wherein the diffusion disk 601 is arranged inside the tower body 1, and the diffusion disk 601 is located above the inside of the tower body 1 and above the packing layer 20, and a rotating shaft 603 is rotatably arranged at the center of the diffusion disk 601, and the two ends of the rotating shaft 603 extend to the top and the bottom of the diffusion disk 601 respectively, and a driving component 604 is installed on the top of the tower body 1, and the driving component 604 is configured to be driven by a motor, and one end of the rotating shaft 603 located above the diffusion disk 601 extends to the top of the tower body 1 and is in transmission connection with the driving component 604, and then the rotating shaft 603 is driven to rotate by the driving component 604; In addition, a swing rod 605 is fixedly provided on the side wall of one end of the rotating shaft 603 located below the diffusion disk 601. The swing rod 605 is specifically located below the diffusion disk 601, and the swing rod 605 is configured to extend from the rotating shaft 603 along the radial direction of the diffusion disk 601 toward the outer circumference of the diffusion disk 601. A moving block 606 is slidably provided on the swing rod 605, and the moving block 606 slides along the length direction of the swing rod 605. Specifically, a slide groove 7 is provided inside the swing rod 605 along the length direction, and a slide rod 8 is fixedly provided inside the slide groove 7, and the moving block 606 is slidably inserted into the slide groove 7, and the moving block 606 is slidably sleeved on the outside of the slide rod 8. Through the limiting of the slide groove 7 and the slide rod 8, the moving block 606 can move along the radial direction of the diffusion disk 601. It should be noted that the slide groove 7 runs through the upper and lower end surfaces of the swing rod 605. The top of the movable block 606, that is, the side facing the diffusion disk 601, is fixedly connected with a guide column 607. Correspondingly, a diffusion guide groove 602 is opened on the lower end surface of the diffusion disk 601, that is, the side facing the movable block 606, and the diffusion guide groove 602 is specifically configured as a spiral groove extending from a point close to the outer circumference of the diffusion disk 601 toward the center of the diffusion disk 601. The diffusion guide groove 602 is concavely configured on the surface of the diffusion disk 601, and one end of the guide column 607 on the top of the movable block 606 is slidably inserted into the interior of the diffusion guide groove 602. Specifically, a guide ball 9 is fixedly provided at one end of the guide column 607 located in the diffusion guide groove 602, and the nozzle 202 is fixedly installed on the bottom surface of the movable block 606.

[0022] Therefore, through the above-mentioned arrangement, when it is necessary to spray the solution, the rotating shaft 603 can be driven to rotate by the motor, and the rotation direction matches the spreading guide groove 602, so that the guide column 607 can move centripetally along the spreading guide groove 602, so that when the rotating shaft 603 rotates, it can drive the swing rod 605 to move in the same direction. Due to the cooperation between the guide column 607 and the spreading guide groove 602, the spreading guide groove 602 can guide the guide column 607, and the guide column 607 will move centripetally along the spreading guide groove 602, thereby making the moving block 606 move evenly in the circumferential direction, and making the nozzle 202 move evenly in the circumferential direction, and the solution sprayed by the nozzle 202 can be evenly sprayed on the packing layer 20, thereby increasing the contact area between the solution and the gas, accelerating its reaction speed, and thus improving production efficiency.

[0023] When the guide post 607 moves to the end of the diffusion guide groove 602 close to the center of the circle, the guide post 607 can return to the starting point of the diffusion guide groove 602 close to the outer circumference of the diffusion disk 601 to perform a circular centripetal motion; In this embodiment, if Figure 3-Figure 6As shown, the guide column 607 is specifically configured to include a plug-in portion 671, a telescopic portion 672 and a buckle portion 673, wherein the plug-in portion 671 is used to be inserted into the interior of the diffusion guide groove 602, and the guide ball 9 is fixedly arranged on the top of the plug-in portion 671, and the telescopic portion 672 is arranged between the plug-in portion 671 and the moving block 606, and the telescopic portion 672 is positioned by the buckle portion 673. Accordingly, a slope 10 is arranged at the end of the diffusion guide groove 602 close to the center of the circle, and the bottom wall of the diffusion guide groove 602 is smoothly transitioned to the surface of the diffusion disk 601 through the slope 10, so that when the guide column 607 moves to the end of the diffusion guide groove 602 close to the center of the circle, it can move to the surface of the diffusion disk 601 through the slope 10, thereby making the telescopic portion 672 contracts and is positioned by the snap-fit ​​portion 673, so that the guide ball 9 moves to the surface of the diffusion disk 601 and disengages from the diffusion guide groove 602, thereby making it impossible for the guide column 607 to be limited and guided by the diffusion guide groove 602. At the same time, a reset spring 19 is arranged on the outside of the slide rod 8, and the reset spring 19 is arranged on the side of the moving block 606 facing the rotating shaft 603. The two ends of the reset spring 19 are respectively in contact with one side of the moving block 606 and the inner wall of one side of the slide groove 7. The reset spring 19 is used to rebound the moving block 606 toward the outer circumference of the diffusion disk 601. Therefore, after the guide ball 9 disengages from the diffusion guide groove 602, the guide column 607 can be reset and moved to the outermost circle position of the diffusion guide groove 602 through the rebound of the reset spring 19.

[0024] Specifically, Figure 5-Figure 10 As shown, the telescopic portion 672 includes a sleeve 721, a rod 722 and an elastic support member 723, wherein the sleeve 721 is fixedly arranged on the top of the moving block 606, the sleeve is cylindrical, and the sleeve 721 has an open end facing upward, and the rod 722 is slidably inserted into the interior of the sleeve 721, and the insertion of the rod 722 and the sleeve 721 is limited by the dovetail groove 12 and the dovetail plug block 11, and the plug-in portion 671 is fixedly arranged at the top of the rod 722, the other end of the rod 722 is inserted into the sleeve 721, and one end of the rod 722 located in the sleeve 721 and one end of the rod 722 inside the sleeve 721 are provided with an elastic support member 723, and the elastic support member 723 can be set as a spring, and the rod 722 is rebounded toward the direction of the diffusion disk 601 through the elastic support member 723, so that the guide ball 9 at the top of the rod 722 can be inserted into the inside of the diffusion guide groove 602.

[0025] like Figure 5-Figure 10As shown, the buckle portion 673 includes a latch 731, a plug hole 732 and a push pin 733, wherein the latch 731 is movably inserted into the outer wall of the plug rod 722. Specifically, a movable hole 13 is provided inside the plug rod 722, and a through hole 14 is provided on one side of the movable hole 13, and the through hole 14 passes through the outer wall of the plug rod 722, and the latch 731 is composed of a limiting plate 7311 with a larger diameter and a plug-in column 7312 with a smaller diameter fixedly arranged on one side of the limiting plate 7311. The limiting plate 7311 is plugged and movably inserted in the movable hole 13, and the plug-in column 7312 is plugged and movably inserted in the through hole 14, and an external push spring 15 is further provided on one side of the limiting plate 7311, and the external push spring 15 is used to rebound the limiting plate 7311 toward the through hole 14, so that the plug-in column 7312 can extend to the outside of the plug rod 722; Correspondingly, a socket 732 is opened on the inner wall of the sleeve 721, and the socket 732 and the pin 731 on the outer wall of the plug rod 722 are arranged in the same direction, and the plug post 7312 on the pin 731 is plugged into the socket 732. It should be noted that the socket 732 passes through the tube wall of the sleeve 721, and a push pin 733 is slidingly arranged on one side of the outer circumference of the sleeve 721 inside the socket 732, and the thickness of the push pin 733 is the same as that of the tube wall. The push pin 733 slides in a limited position inside the socket 732 through the limit block 16 and the limit groove 17. The outer wall of the push pin 733 close to the outer circumference of the sleeve 721 is the same as the outer wall of the sleeve 721, and is set to a concentric arc of the same size.

[0026] In addition, when the plug-in column 7312 is inserted into the interior of the socket 732, the plug-in column 7312 can push the push pin 733 toward the outer circumferential direction of the sleeve 721, so that a portion of the push pin 733 extends to the outside of the sleeve 721. When the outer wall of the push pin 733 is aligned with the outer circumferential outer wall of the sleeve 721 and is on the same curved surface, the other side end face of the push pin 733 is in contact with the outer wall of the insertion rod 722 and pushes the pin 731 into the interior of the through hole 14, so that the pin 731 is separated from the socket 732 and cannot be positioned.

[0027] It should be noted that when the guide ball 9 is located inside the diffusion guide groove 602, the pin 731 on the insertion rod 722 is misaligned with the socket 732 in the longitudinal direction, and the pin 731 is located below the socket 732. When the guide ball 9 contacts the surface of the diffusion disk 601, the socket 732 and the pin 731 are aligned with each other. The pin 731 is inserted into the socket 732 under the action of the external push spring 15 to limit the plug-in part 671, and at the same time, the push pin 733 is pushed outward, so that a part of the push pin 733 extends to the outside of the sleeve 721, and the guide ball 9 can be separated from the diffusion guide groove 602, and the guide column 607 can be moved to the starting point of the diffusion guide groove 602 through the action of the reset spring 19.

[0028] In order to unlock the buckle portion 673, when the guide post 607 moves to the starting point of the spreading guide groove 602, the guide post 607 can continue to be inserted into the spreading guide groove 602. Figure 3-Figure 4 As shown, a trigger ring 18 is fixedly arranged on one side of the diffusion disk 601 provided with the diffusion guide groove 602, and the inner diameter of the trigger ring 18 is larger than the diameter of the outermost circle of the diffusion guide groove 602, and the inner wall of the inner circle of the trigger ring 18 is located outside the outermost circle of the diffusion guide groove 602. The height of the trigger ring 18 can be configured such that the upper end surface of the trigger ring 18 is in contact with the lower end surface of the swing rod 605, so that after the guide ball 9 is separated from the diffusion guide groove 602, the sleeve 721 is moved toward the outer circumference of the diffusion disk 601 by the action of the reset spring 19, and the trigger ring 18 The radial movement of the sleeve 721 can be limited, and the specific position and size of the trigger ring 18 are configured such that when the outer circumferential outer wall of the sleeve 721 contacts the inner wall of the inner ring of the trigger ring 18, the spreading guide groove 602 close to the starting section of the outer circumference of the diffusion disk 601 is located on the motion trajectory of the guide ball 9 in circular motion as the shaft 603 rotates. In other words, when the outer circumferential outer wall of the sleeve 721 contacts the inner wall of the inner ring of the trigger ring 18, the guide ball 9 can be inserted into the starting section of the spreading guide groove 602, and then continue to move centripetally with the guidance of the spreading guide groove 602. In addition, if Figure 5 and Figure 6 As shown, the push pin 733 on the outer wall of the sleeve 721 is specifically arranged on the side of the outer wall of the sleeve 721 facing the inner circle of the trigger ring 18, so that when the sleeve 721 is reset and rebounded by the reset spring 19, the push pin 733 on the outer wall of the sleeve 721 will contact the inner wall of the inner circle of the trigger ring 18, and then the push pin 733 will be pressed into the inside of the socket 732, and the push pin 733 will make the plug 731 return to the inside of the through hole 14, and the plug 731 is separated from the socket 732 and cannot position the insertion rod 722 and the sleeve 721. Under the rebound of the elastic support member 723, the insertion rod 722 rebounds toward the direction of the diffusion disk 601, and then the insertion rod 722 is extended, so that the guide ball 9 enters the inside of the diffusion guide groove 602 and moves centripetally.

[0029] The principle of the present invention is as follows: when the present invention is used, the driving component 604 is started to rotate the rotating shaft 603, and at the same time, the liquid is supplied to the nozzle 202 through the delivery pump 5, so that the solution can be sprayed toward the packing layer 20 through the nozzle 202, and the chlorine gas is discharged into the air inlet pipe 3. The chlorine gas is fully contacted with the liquid alkali flowing down from the top of the tower in the countercurrent. When the motor drives the rotating shaft 603 to rotate, the rotating shaft 603 can drive the swing rod 605 to move in the same direction. Because the guide column 607 is connected to the swing rod 605, the swing rod 605 can move in the same direction. The cooperation of the spreading guide groove 602 enables the spreading guide groove 602 to guide the guide column 607, and the guide column 607 will move centripetally along the spreading guide groove 602, thereby making the moving block 606 move evenly in the circumferential direction, so that the nozzle 202 moves and sprays evenly in the circumferential direction, and the solution sprayed by the nozzle 202 can be evenly sprayed on the packing layer 20, increasing the solution spraying area, increasing the contact area between the solution and the gas, accelerating its reaction speed, and thus improving production efficiency.

[0030] It will be apparent to those skilled in the art that the invention is not limited to the details of the exemplary embodiments described above and that the invention can be implemented in other specific forms without departing from the spirit or essential features of the invention. Therefore, the embodiments should be considered exemplary and non-limiting in all respects, and the scope of the invention is defined by the appended claims rather than the foregoing description, and it is intended that all variations falling within the meaning and scope of the equivalent elements of the claims be included in the invention. Any reference numeral in a claim should not be considered as limiting the claim to which it relates.

Claims

1. An absorption tower for continuous sodium hypochlorite production, comprising a tower body (1), characterized in that: A spray mechanism (2) is arranged at the top of the tower body (1), an air intake pipe (3) is arranged at the bottom of the tower body (1), and a packing layer (20) is arranged inside the tower body (1), and the packing layer (20) is located between the spray mechanism (2) and the air intake pipe (3); The spraying mechanism (2) comprises a water inlet pipe (201) and a spray head (202); the water inlet pipe (201) is fixedly mounted on the tower wall of the tower body (1); one end of the water inlet pipe (201) extends into the interior of the tower body (1); the end of the water inlet pipe (201) located inside the tower body (1) is equipped with the spray head (202); and the end of the water inlet pipe (201) located outside the tower body (1) is connected to the liquid alkali storage tank (4) via a pipeline; The spray head (202) is connected to the water inlet pipe (201) via a hose, and the spray head (202) moves inside the tower body (1) for spraying via a diffusion mechanism (6).

2. A continuous sodium hypochlorite production absorption tower as claimed in claim 1, characterized in that: The diffusion mechanism (6) comprises a diffusion disk (601), a diffusion guide groove (602), a rotating shaft (603), a driving component (604), a swing rod (605), a moving block (606) and a guide column (607); the diffusion disk (601) is located above the packing layer (20) in the tower body (1); a rotating shaft (603) is rotatably arranged at the center of the diffusion disk (601), and two ends of the rotating shaft (603) extend to the top and bottom of the diffusion disk (601), respectively; one end of the rotating shaft (603) located above the diffusion disk (601) extends to the top of the tower body (1) and is connected to the driving component (604) transmission connection, a swing rod (605) is fixedly provided on the side wall of one end of the rotating shaft (603) located below the diffusion disk (601), a moving block (606) is slidably provided on the swing rod (605) along the length direction, a guide column (607) is fixedly connected to the top of the moving block (606), a diffusion guide groove (602) is concavely opened on the lower end surface of the diffusion disk (601), one end of the guide column (607) on the top of the moving block (606) is movably inserted into the inside of the diffusion guide groove (602), and the nozzle (202) is fixedly installed on the bottom surface of the moving block (606).

3. A continuous sodium hypochlorite production absorption tower as claimed in claim 2, characterized in that: The diffusion guide groove (602) is configured as a spiral groove extending from a point close to the outer circumference of the diffusion disk (601) toward the center of the diffusion disk (601), and a guide ball (9) is fixedly provided at one end of the guide column (607) located inside the diffusion guide groove (602).

4. A continuous sodium hypochlorite production absorption tower as claimed in claim 3, characterized in that: The guide column (607) comprises a plug-in portion (671), a telescopic portion (672) and a buckle portion (673); the plug-in portion (671) is used for being inserted into the interior of the diffusion guide groove (602); the guide ball (9) is fixedly arranged at the top of the plug-in portion (671); the telescopic portion (672) is arranged between the plug-in portion (671) and the moving block (606); and the telescopic portion (672) is positioned by the buckle portion (673); a slope (10) is arranged at the end of the diffusion guide groove (602) close to the center of the circle; the bottom wall of the diffusion guide groove (602) smoothly transitions to the surface of the diffusion disk (601) through the slope (10); and a return spring (19) is arranged on one side of the moving block (606) for rebounding the moving block (606) toward the outer circumference of the diffusion disk (601).

5. A continuous sodium hypochlorite production absorption tower as claimed in claim 4, characterized in that: The telescopic portion (672) comprises a sleeve (721), an insertion rod (722) and an elastic support member (723); the sleeve (721) is arranged in a cylindrical shape and is fixedly arranged on the top of the moving block (606); the sleeve (721) is provided with an open end facing upward; the insertion rod (722) is slidably inserted into the interior of the sleeve (721); the insertion portion (671) is fixedly arranged at the top of the insertion rod (722), and the insertion rod (722) rebounds toward the diffusion disk (601) through the elastic support member (723).

6. A continuous sodium hypochlorite production absorption tower as claimed in claim 5, characterized in that: The buckle portion (673) comprises a latch (731), a socket (732) and a push pin (733); the outer wall of the plug rod (722) is movably plugged with the latch (731), and one end of the latch (731) passes through the outer wall of the plug rod (722) and extends to the outside of the plug rod (722); the inner wall of the sleeve (721) is provided with a socket (732), and the socket (732) and the latch (731) on the outer wall of the plug rod (722) are arranged in the same direction; the latch (731) is located at the plug rod (72 2) one end of the outer portion is plugged into and matched with the socket (732), and the plug pin (731) is also rebounded toward the socket (732) by an external push spring (15). The socket (732) penetrates the tube wall of the sleeve (721), and a push pin (733) is slidably provided on one side of the inner portion of the socket (732) close to the outer circumference of the sleeve (721), and the thickness of the push pin (733) is the same as that of the tube wall. The push pin (733) is limited and slidable in the inner portion of the socket (732) by a limit block (16) and a limit groove (17).

7. A continuous sodium hypochlorite production absorption tower as claimed in claim 6, characterized in that: A trigger ring (18) is fixedly provided on one side of the diffusion disc (601) provided with the diffusion guide groove (602), and the inner diameter of the trigger ring (18) is larger than the diameter of the outermost circle of the diffusion guide groove (602). The trigger ring (18) is used to limit the movement of the sleeve (721) in the radial direction.

8. A continuous sodium hypochlorite production absorption tower as claimed in claim 7, characterized in that: The ejector pin (733) on the outer wall of the sleeve (721) is arranged on a side of the outer wall of the sleeve (721) facing the inner ring of the trigger ring (18).

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