Overlay alignment method of photovoltaic cell photoetching equipment

By establishing a plane coordinate system in the photovoltaic cell lithography equipment and using positioning points on the mask, efficient and accurate positioning of the mask and cell is achieved, and the problems of low alignment accuracy and long beat time in the prior art are solved.

CN119668047APending Publication Date: 2025-03-21SUZHOU HAOSHEN INTELLIGENT TECH CO LTD
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Patent Information

Application Number
CN202411889256.2
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-12-20
Publication Date
2025-03-21

AI Technical Summary

Technical Problem

In the prior art, the surface of the photovoltaic cell is completely covered with the photoresist film layer, and the alignment mark cannot be set on the cell, which makes it difficult to accurately align the mask and the cell, and the edge positioning method has problems such as low alignment accuracy and long beat time.

Method used

By establishing a planar coordinate system on the exposure table, taking pictures of the cell, obtaining the center coordinates and edge slopes, using multiple positioning points on the mask to form the center of the area overlaps with the center of the graphics area, accurately move and rotate the mask to align the center of the cell.

Benefits of technology

It realizes efficient and accurate positioning of mask plates and cell cells, improves alignment accuracy and efficiency, and overcomes the defects that alignment marks cannot be used in photovoltaic cell lithography applications.

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Abstract

The invention relates to an overlay alignment method of photovoltaic cell photoetching equipment, alignment of a mask plate and a cell piece is realized through an overlay alignment device, the overlay alignment device comprises the mask plate, the mask plate is provided with a pattern area and a plurality of positioning points, the plurality of positioning points are distributed on the pattern area in an array manner, and the pattern area is provided with a plurality of positioning points; according to the overlay alignment method, a plane-coordinate system is established on an exposure table top, a plurality of positioning points are arranged on a mask plate, and a visual camera is used for photographing the positioning points to obtain the center coordinate and the edge slope of the mask plate, so that the alignment precision of the mask plate is improved, and the alignment precision of the mask plate is improved. The method comprises the following steps: adjusting the center coordinate of a mask plate and the center coordinate and edge slope of a battery piece, adjusting the center coordinate of the mask plate to coincide with the center coordinate of the battery piece by utilizing a rotary translation alignment platform, and rotating the mask plate to enable the center axis of the mask plate to coincide with the center axis of the battery piece, thereby realizing efficient and accurate alignment of the mask plate and the battery piece. And the pattern on the mask plate can be accurately transferred to the battery piece.
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