High-precision electroplating grinding wheel

Abstract

The invention discloses a high-precision electroplating grinding wheel which comprises a base body and a grinding layer arranged on the outer layer of the base body. The preparation method of the electroplating grinding wheel comprises the steps that the base body is subjected to oil removal; shielding and clamping; preparing an electroplating solution; and electroplating and forming. The electroplating device is provided with an automatic abrasive compensation device and a vibration device; when the grinding layer is electroplated, a more efficient electroplating system is adopted, lauryl sodium sulfate, boric acid, saccharin and 1, 4-butanediol are added into the electroplating system, and the electroplating efficiency is improved; the automatic compensation device is used for adding the grinding material with the same amount of electroplating consumption into the electroplating liquid, so that the proportion of the grinding material to the electroplating system is kept constant, and the electroplated grinding material is more uniform.

Description

Technical Field

[0001] The invention relates to the technical field of electroplated grinding wheels, and in particular to a high-precision electroplated grinding wheel. Background Art

[0002] As metal-bonded superhard abrasive tools, electroplated superhard tools occupy an irreplaceable position in the market because of their low production cost, low investment, ability to be made into complex shapes, high precision, high abrasive density, and ability to achieve high-speed grinding.

[0003] The grinding layer of the hub-type nickel-based dicing knife in the prior art combines the abrasive with the substrate by electroplating. The consumption of abrasive in the traditional electroplating solution will cause the ratio of abrasive to the electroplating system to continue to decrease, resulting in uneven abrasive and affecting the cutting quality.

[0004] Therefore, how to provide a high-precision electroplated grinding wheel to solve the problems existing in the prior art is of great significance to its application. Summary of the invention

[0005] In view of this, the purpose of the present application is to provide a high-precision electroplated grinding wheel to solve the problem that the consumption of abrasive in the traditional electroplating solution will lead to a continuous decrease in the ratio of abrasive to the electroplating system, thereby causing uneven abrasive and affecting cutting quality.

[0006] To achieve the above object, the present invention provides the following technical solutions:

[0007] A high-precision electroplated grinding wheel comprises a base body and a grinding layer arranged on the outer layer of the base body;

[0008] The preparation method of the electroplated grinding wheel comprises the following steps:

[0009] S1: Degreasing the substrate;

[0010] S2: shielding clamping;

[0011] S3: preparing electroplating solution;

[0012] S4: Electroplating molding.

[0013] Preferably, the electroplating solution further comprises silicon carbide and an electroplating system, the electroplating system is a nickel sulfate system, and the abrasive is diamond or CBN.

[0014] Preferably, in the electroplating system, nickel chloride hexahydrate is 30-55 g / L, cobalt sulfate is 15-20 g / L, nickel sulfate heptahydrate is 220-400 g / L, sodium dodecyl sulfate is 0.2-0.5 g / L, boric acid is 20-60 g / L, saccharin is 0.5-1.1 g / L, 1,4-butanediol is 0.3-0.7 g / L, and the rest is water.

[0015] Preferably, 100L of the electroplating system contains 0.36-18g of abrasive and 2-4g of silicon carbide.

[0016] Preferably, the temperature during the electroplating is 23-65°C.

[0017] Preferably, the particle size of the abrasive is 120-130 mesh.

[0018] Preferably, the current in S4 is 0.5-4A / dm2, and the electroplating time is 2-4 hours.

[0019] Preferably, the electroplating device is equipped with an automatic abrasive compensation device and a vibration device.

[0020] Preferably, the automatic compensation device is used to add an amount of abrasive equal to the amount consumed in electroplating to the electroplating solution, and the vibration device is used to maintain the uniformity of the abrasive in the electroplating solution.

[0021] Compared with the prior art, the present invention has the following beneficial effects:

[0022] 1. The present invention adopts a more efficient electroplating system when electroplating the grinding layer, and sodium dodecyl sulfate, boric acid, saccharin, and 1,4-butanediol are added to the electroplating system to improve the electroplating efficiency;

[0023] 2. In the present invention, an automatic compensation device is used to add an amount of abrasive consumed by electroplating to the electroplating solution, so that the ratio of the abrasive to the electroplating system remains constant, thereby making the abrasive after electroplating more uniform.

[0024] The above description is only an overview of the technical solution of the present application. In order to more clearly understand the technical means of the present application so that it can be implemented in accordance with the contents of the specification, and to make the above and other purposes, features and advantages of the present application more obvious and easy to understand, the following is a detailed description of the preferred embodiments of the present application in conjunction with the accompanying drawings as follows.

[0025] Based on the detailed description of the specific embodiments of the present application in combination with the accompanying drawings below, those skilled in the art will become more aware of the above and other objects, advantages and features of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the drawings required for use in the embodiments or the prior art descriptions are briefly introduced below. Obviously, the drawings described below are some embodiments of the present application. For ordinary technicians in this field, other drawings can also be obtained based on these drawings without creative work. In all drawings, similar elements or parts are generally identified by similar reference numerals. In the drawings, each element or part is not necessarily drawn according to the actual scale.

[0027] Figure 1 It is a structural schematic diagram of the present invention.

[0028] In the figure: 100, substrate; 200, grinding layer. DETAILED DESCRIPTION

[0029] To make the purpose, technical scheme and advantages of the embodiment of the present application clearer, the technical scheme in the embodiment of the present application will be clearly and completely described below in conjunction with the accompanying drawings in the embodiment of the present application. Obviously, the described embodiment is a part of the embodiment of the present application, rather than all of the embodiments. In the following description, specific details such as specific configuration and components are provided only to help fully understand the embodiments of the present application. Therefore, it should be clear to those skilled in the art that various changes and modifications can be made to the embodiments described herein without departing from the scope and spirit of the present application. In addition, for clarity and brevity, the description of known functions and structures is omitted in the embodiment.

[0030] In addition, the present application may repeat reference numerals and / or letters in different examples. This repetition is for the purpose of simplicity and clarity, and does not in itself indicate the relationship between the various embodiments and / or settings discussed.

[0031] The term "and / or" in this article is only a description of the association relationship of associated objects, indicating that there can be three relationships. For example, A and / or B can mean: A exists alone, B exists alone, and A and B exist at the same time. The term " / and" in this article describes another type of association object relationship, indicating that there can be two relationships. For example, A / and B can mean: A exists alone, and A and B exist alone. In addition, the character " / " in this article generally indicates that the previous and next associated objects are in an "or" relationship.

[0032] It should also be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprises" or any other variations thereof are intended to cover non-exclusive inclusions.

[0033] See also Figure 1 , the present invention provides a technical solution for a high-precision electroplated grinding wheel: comprising a base 100 and a grinding layer 200 arranged on the outer layer of the base 100;

[0034] The preparation method of the electroplated grinding wheel comprises the following steps:

[0035] S1: Degreasing the substrate;

[0036] S2: shielding clamping;

[0037] S3: preparing electroplating solution;

[0038] S4: Electroplating molding.

[0039] The electroplating solution also includes silicon carbide and an electroplating system, the electroplating system is a nickel sulfate system, and the abrasive is diamond or CBN.

[0040] In the electroplating system, nickel chloride hexahydrate is 30-55 g / L, cobalt sulfate is 15-20 g / L, nickel sulfate heptahydrate is 220-400 g / L, sodium dodecyl sulfate is 0.2-0.5 g / L, boric acid is 20-60 g / L, saccharin is 0.5-1.1 g / L, 1,4-butanediol is 0.3-0.7 g / L, and the rest is water.

[0041] The 100L electroplating system contains 0.36-18g abrasive and 2-4g silicon carbide.

[0042] The temperature during electroplating is 23 to 65°C.

[0043] The particle size of the abrasive is 120-130 mesh.

[0044] The current in S4 is 0.5~4A / dm2, and the plating time is 2~4 hours

[0045] The electroplating device is equipped with an automatic abrasive compensation device and a vibration device.

[0046] The automatic compensation device is used to add an amount of abrasive equal to the amount consumed by electroplating to the electroplating solution, and the vibration device is used to keep the abrasive uniform in the electroplating solution.

[0047] When used specifically, the substrate 100 is first degreased, and then the part not requiring electroplating is shielded, and then the electroplating system is configured according to the ratio of 30-55 g / L nickel chloride hexahydrate, 15-20 g / L cobalt sulfate, 220-400 g / L nickel sulfate heptahydrate, 0.2-0.5 g / L sodium dodecyl sulfate, 20-60 g / L boric acid, 0.5-1.1 g / L saccharin, 0.3-0.7 g / L 1,4-butanediol, and the rest water, and then the abrasive and silicon carbide are added according to the ratio of 100 L electroplating system containing 0.36-18 g abrasive and 2-4 g silicon carbide, and then the current is 0.5-4 A / dm 2. The electroplating time is 2 to 4 hours and the temperature is 23 to 65°C. During electroplating, the automatic compensation device and the vibration device are turned on. The automatic compensation device is used to add an amount of abrasive equal to the amount consumed in electroplating to the electroplating solution so that the abrasive maintains a constant ratio, and the vibration device is used to prevent the abrasive from clumping.

[0048] The above description is only the preferred embodiment of the present invention, which does not limit the protection scope of the present invention. For those skilled in the art, the present invention can be modified and varied in various ways. Within the spirit and principle of the present invention, any change, modification, replacement, integration and parameter change of these embodiments by conventional substitution or capable of achieving the same function without departing from the principle and spirit of the present invention shall fall within the protection scope of the present invention.

Claims

1. A high-precision electroplated grinding wheel, characterized in that: It comprises a base body (100) and a grinding layer (200) arranged on the outer layer of the base body; The preparation method of the electroplated grinding wheel comprises the following steps: S1: Degreasing the substrate; S2: shielding clamping; S3: preparing electroplating solution; S4: Electroplating molding.

2. A high-precision electroplated grinding wheel as claimed in claim 1, characterized in that: The electroplating solution also includes silicon carbide and an electroplating system, the electroplating system is a nickel sulfate system, and the abrasive is diamond or CBN.

3. A high-precision electroplated grinding wheel as claimed in claim 2, characterized in that: In the electroplating system, 30-55 g / L of nickel chloride hexahydrate, 15-20 g / L of cobalt sulfate, 220-400 g / L of nickel sulfate heptahydrate, 0.2-0.5 g / L of sodium dodecyl sulfate, 20-60 g / L of boric acid, 0.5-1.1 g / L of saccharin, 0.3-0.7 g / L of 1,4-butanediol, and the rest is water.

4. A high-precision electroplated grinding wheel as claimed in claim 3, characterized in that: The 100L electroplating system contains 0.36-18g abrasive and 2-4g silicon carbide.

5. A high-precision electroplated grinding wheel as claimed in claim 4, characterized in that: The temperature during the electroplating is 23-65°C.

6. A high-precision electroplated grinding wheel as claimed in claim 5, characterized in that: The particle size of the abrasive is 120-130 mesh.

7. A high-precision electroplated grinding wheel as claimed in claim 6, characterized in that: The current in S4 is 0.5-4A / dm2, and the electroplating time is 2-4 hours.

8. A high-precision electroplated grinding wheel as claimed in claim 7, characterized in that: The electroplating device is equipped with an automatic abrasive compensation device and a vibration device.

9. A high-precision electroplated grinding wheel as claimed in claim 8, characterized in that: The automatic compensation device is used to add an amount of abrasive equal to the amount consumed by electroplating to the electroplating solution, and the vibration device is used to keep the abrasive uniform in the electroplating solution.

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