Photoresist cleaning device and method for manufacturing anti-glare (AG) glass anti-dazzle layer

Abstract

The invention relates to the technical field of glass etching, and discloses an AG glass anti-dazzle layer manufacturing photoresist cleaning device and method.The device comprises a workbench and a machine shell installed on the workbench, a support used for storing AG glass is installed on the workbench, and a cleaning groove located beside the support is formed in the workbench; an auxiliary frame used for moving the AG glass up and down and left and right is arranged on the edge of the cleaning tank, extends into the cleaning tank, and drives the AG glass to move in the cleaning liquid to generate shearing force to promote photoresist stripping. The AG glass is driven by the auxiliary frame to do up-and-down and left-and-right composite motion in the cleaning solution to form dynamic shearing force, the shearing force drives the cleaning solution to penetrate into micron-sized grooves formed by etching, chemical etching residues such as an acid solution, unreacted particles and polishing chips are effectively washed out, the dead angle effect is avoided, and compared with traditional static soaking, the AG glass is better in cleaning effect. And the removal rate of pollutants in the groove is greatly improved.

Description

Technical Field

[0001] The present invention relates to the technical field of glass etching, and particularly to a photoresist cleaning device and method for manufacturing an anti-glare layer of AG glass. Background Art

[0002] AG glass (Anti-Glare Glass) has a micron-level rough texture (anti-glare layer) on its surface, which can effectively reduce light reflection and improve the visual effect. It is widely used in high-end display fields such as smart phones, tablet computers, and in-vehicle display screens. During the manufacturing process of AG glass, photoresist cleaning is one of the key processes: after forming anti-glare grooves on the glass surface through chemical etching, it is necessary to thoroughly remove pollutants such as residual photoresist, acidic etching solution, unreacted particles, and polishing debris to ensure the adhesion of subsequent coatings (such as AR anti-reflection coatings) or coatings and the light transmittance of the glass.

[0003] Traditional cleaning devices mostly adopt the static immersion method. The AG glass is fixedly placed in the cleaning solution, relying on chemical solvents to dissolve pollutants. However, the micron-level grooves formed by etching (roughness Ra 0.2 - 1.6 μm) are easily wrapped by a liquid film due to surface tension, resulting in the embedding of acidic solutions, polishing debris, etc. deep into the grooves. Static immersion is difficult to generate sufficient shear force to drive the cleaning solution to deeply flush, causing "dead corner" residues (the pollutant removal rate in the grooves is only about 65%), affecting the cleanliness of the glass surface.

[0004] Therefore, there is an urgent need for a new cleaning device that can break the "dead corner effect" through dynamic shear force to solve the key bottleneck in the photoresist cleaning of AG glass in the prior art. Summary of the Invention

[0005] In view of the above deficiencies in the prior art, the present invention provides a photoresist cleaning device and method for manufacturing an anti-glare layer of AG glass, which can break the "dead corner effect" through dynamic shear force and greatly improve the cleaning effect.

[0006] The present invention provides the following technical solutions: A photoresist cleaning device for manufacturing an anti-glare layer of AG glass, including a workbench and a machine shell installed on the workbench. A bracket for storing AG glass is installed on the workbench. A cleaning tank is opened on the workbench beside the bracket. An auxiliary frame for moving the AG glass up, down, left, and right is arranged at the edge of the cleaning tank, and the auxiliary frame extends into the cleaning tank to drive the AG glass to move in the cleaning solution, generating shear force to promote the peeling of the photoresist.

[0007] Inside the casing, there is a cleaning module. The cleaning module guides the AG glass on the bracket to the auxiliary rack, and the auxiliary rack guides the AG glass into the cleaning tank for cleaning. During the cleaning process, the auxiliary rack repeatedly exports the AG glass. The cleaning module picks up the AG glass and rinses it, changing the angle of the nozzle each time to rinse the AG glass from multiple angles.

[0008] Preferably, a side door for importing and exporting the AG glass on the bracket is provided on the side of the casing, and an observation window is provided on the front of the casing.

[0009] Preferably, the bracket includes several groups of support bars installed on the workbench. Two groups of support rods are provided on both sides of the support bars, and a blocking block for limiting the AG glass is provided at the front end of the support bars. The AG glass is vertically placed between the two groups of support rods on the support bars.

[0010] Preferably, the auxiliary rack includes two electric cylinders provided inside the workbench and located at both ends of the cleaning tank. Moving frames are installed on the tops of the two electric cylinders. Several groups of U-shaped frames are installed at equal intervals between the two moving frames. Positioning columns for supporting the AG glass are installed on both sides of each U-shaped frame. The AG glass is placed through the U-shaped frame with positioning columns, and the electric cylinders and the moving frames drive the AG glass to move up, down, left, and right inside the cleaning tank.

[0011] Preferably, the moving frame includes a moving beam installed on the moving end of the electric cylinder and two guide columns installed on the side of the moving beam. A slidable rectangular frame is provided on the two guide columns. The two ends of the U-shaped frame are connected to the bottoms of the two rectangular frames. An electromagnet is embedded in the moving beam, and iron sheets are provided at corresponding positions on the rectangular frame. By energizing the electromagnet to adsorb the iron sheets, the rectangular frame drives the U-shaped frame to move left and right.

[0012] Preferably, the cleaning module includes two X-axis modules installed inside the casing. A cross beam is installed on the sliders of the two X-axis modules. A Y-axis A module and a Y-axis B module are respectively installed on both sides of the cross beam. A Z-axis A module is installed on the slider of the Y-axis A module. A fixed frame is installed on the slider of the Z-axis A module. A rotatable cleaning head is provided at the bottom of the fixed frame, and the cleaning head is driven by a motor to adjust the angle. A Z-axis B module is installed on the slider of the Y-axis B module. A suction cup rack is installed on the slider of the Z-axis B module. The AG glass is picked up by the suction cups on the suction cup rack and rinsed from multiple angles by the cleaning head.

[0013] Preferably, the cleaning head includes a rectangular housing and a number of groups of equally spaced holes opened at the front end of the rectangular housing. A positioning sleeve is installed in each hole, and a rollable ball is provided inside the positioning sleeve. A metal tube is penetrated through the ball, and a spray head is installed at the front end of the metal tube. The end of the metal tube is installed with a telescopic straight tube, and the other end of the telescopic straight tube is connected to the spherical connection end of a universal spherical joint. All the spherical housing ends of the universal spherical joints are installed on a moving rod, and an XY linear module is installed inside the rectangular housing. The moving rod is driven by the XY linear module to move on the XY axis, adjusting the angle between the spherical connection end and the spherical housing end of the universal spherical joint, so that the angle of the metal tube is adjusted accordingly, and the spray head can be adjusted at any angle within the set range.

[0014] A method for manufacturing a lithography resist cleaning for an anti-glare layer of AG glass is as follows:

[0015] S1. Import the AG glass onto the bracket, and through the cleaning module, import the AG glass on the bracket onto the auxiliary bracket. The auxiliary bracket drives the AG glass to immerse in the cleaning tank for soaking and cleaning.

[0016] S2. During the soaking process, the auxiliary bracket drives the AG glass to move upward, so that the cleaning module picks up and imports the AG glass again. After picking up, the auxiliary bracket resets again, and the spray head on the cleaning module rinses the AG glass.

[0017] S3. During the rinsing process, each time the spray head on the cleaning module moves, the angle of the spray head is adjusted to change the moving path of the spray head, and the AG glass is rinsed from multiple angles and different directions of rinsing trajectories.

[0018] S4. After rinsing, the auxiliary bracket moves upward again, and the cleaning module guides the cleaned AG glass back to its original position and replaces the AG glass for rinsing again. The auxiliary bracket continues to reset for soaking and cleaning until all the AG glass has been rinsed.

[0019] S5. The auxiliary bracket drives the AG glass to move upward, and the cleaning module transfers the AG glass on the auxiliary bracket to the bracket to complete the cleaning process.

[0020] Compared with the prior art, the present invention has the following beneficial effects:

[0021] (1) By driving the AG glass to perform a vertical and horizontal compound motion in the cleaning liquid through the auxiliary bracket, a dynamic shear force is formed. This shear force drives the cleaning liquid to penetrate into the micron-level grooves formed by etching, effectively flushing chemical etching residues such as acidic solutions, unreacted particles, and polishing debris, avoiding the "dead angle effect". Compared with traditional static soaking, the pollutant removal rate in the grooves is greatly improved.

[0022] (2) The auxiliary frame drives the AG glass to move, generating uniform shear force to ensure that the cleaning degree of each area of the etching surface is consistent, solving the problem of "patches" on the display glass caused by local pollution and ensuring the uniformity of the light transmittance of the AG glass.

[0023] (3) The spray nozzles on the cleaning head spray obliquely to direct the flushing of the anti-glare texture (micron-level rough grooves) and the antireflection film grooves on the surface of the AG glass, solving the problem of uneven water flow coverage caused by spraying at a fixed angle and achieving a thorough cleaning of the attachments on the inner wall and edge of the grooves;

[0024] (4) The spray nozzles on the cleaning head can be adjusted at an angle of 0° - 50° and have a self-rotation function, combined with the free movement in the X / Y / Z three-axis space, covering the glass surface to effectively remove the photoresist on the surface. For the complex surface of the AG glass etching texture, the vertical impact, oblique penetration, and tangential peeling work together to greatly shorten the cleaning time. Description of the Drawings

[0025] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0026] Figure 2 For the present invention Figure 1 It is a schematic diagram of the internal structure;

[0027] Figure 3 It is a schematic diagram of the bracket structure of the present invention;

[0028] Figure 4 It is a schematic diagram of the auxiliary frame structure of the present invention;

[0029] Figure 5 It is a schematic diagram of the cleaning module structure of the present invention;

[0030] Figure 6 It is a schematic diagram of the cleaning head structure of the present invention;

[0031] Figure 7 It is a schematic diagram of the disassembled structure of the cleaning head of the present invention.

[0032] In the figure: 1. Workbench; 2. Machine housing; 3. Support; 4. Cleaning tank; 5. Auxiliary support; 6. Cleaning module; 31. Support bar; 32. Support rod; 33. Blocking block; 51. Electric cylinder; 52. Movable frame; 53. U-shaped frame; 54. Positioning column; 521. Movable beam; 522. Guide post; 523. Rectangular frame; 524. Electromagnet; 525. Iron sheet; 61. X-axis module; 62. Cross beam; 63. Y-axis A module; 64. Y-axis B module; 65. Z-axis A module; 66. Z-axis B module; 67. Cleaning head; 68. Fixed frame; 69. Suction cup holder; 671. Rectangular outer shell; 672. Hole; 673. Positioning sleeve; 674. Ball; 675. Metal tube; 676. Telescopic straight tube; 677. Universal spherical joint; 678. Moving rod; 679. XY linear module. Specific embodiments

[0033] In order to make the objectives, technical solutions, and advantages of the embodiments of the present disclosure clearer, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present disclosure. To keep the following description of the embodiments of the present disclosure clear and concise, detailed descriptions of known functions and known components are omitted to avoid unnecessarily obscuring the concepts of the present invention.

[0034] Please refer to Figure 1 and Figure 2 , this lithography resist cleaning device for manufacturing the anti-glare layer of AG glass is based on the workbench 1. The workbench 1 is made of high-strength metal material and is fixed to a flat and stable working ground through anchor bolts to ensure the stability of the device during operation. The machine housing 2 is installed on the workbench 1. A side door is provided on the side of the machine housing 2 to facilitate the import and export of AG glass between the support 3 and the outside; an observation window is provided on the front to facilitate the operator to observe the internal cleaning operation in real time. The observation window is made of a transparent material that is impact-resistant and corrosion-resistant to prevent the sputtering of cleaning solvents.

[0035] Refer to Figure 3 , the support 3 is composed of several groups of support bars 31, support rods 32, and blocking blocks 33. The support bars 31 are fixed to the workbench 1 by bolts. The support rods 32 on both sides are vertically welded to the support bars 31 to form side support for the AG glass; the blocking block 33 at the front end is also fixed to the support bars 31 to limit the AG glass vertically placed between the two support rods 32, ensuring that the AG glass is placed accurately and stably.

[0036] The cleaning tank 4 is opened beside the upper bracket 3 of the workbench 1. The tank body is made of corrosion-resistant materials such as polyvinyl chloride (PVC) to resist the erosion of the cleaning liquid. The auxiliary rack 5 is arranged at the edge of the cleaning tank 4 and extends into the interior, used to drive the AG glass to move in the cleaning liquid; the cleaning module 6 is installed inside the casing 2, responsible for transferring the AG glass between the bracket 3 and the auxiliary rack 5 and the flushing operation.

[0037] Refer to Figure 4 , the auxiliary rack 5 is composed of two sets of electric cylinders 51, a movable rack 52, a U-shaped rack 53 and positioning columns 54. The two sets of electric cylinders 51 are installed inside the workbench 1 and at both ends of the cleaning tank 4. Their models are selected comprehensively according to the weight of the AG glass and the weights of components such as the movable rack 52 and the U-shaped rack 53 to ensure sufficient lifting power.

[0038] The movable rack 52 includes a movable beam 521, guide columns 522, a rectangular frame 523, an electromagnet 524 and an iron sheet 525. The movable beam 521 is installed on the movable end of the electric cylinder 51, the guide columns 522 are vertically fixed on the side of the movable beam 521, and the rectangular frame 523 can slide on the guide columns 522; the electromagnet 524 is embedded in the movable beam 521, and the iron sheet 525 is correspondingly arranged on the rectangular frame 523. A plurality of U-shaped racks 53 are installed at equal distances between the two rectangular frames 523, and positioning columns 54 are installed on both sides of each U-shaped rack 53 for supporting the AG glass.

[0039] During the cleaning operation of the AG glass, after the cleaning module 6 places the AG glass on the positioning columns 54 of the U-shaped rack 53, the electric cylinder 51 is started to drive the movable rack 52 to descend, so that the AG glass is immersed in the cleaning liquid in the cleaning tank 4 for soaking and cleaning. During the soaking process, by controlling the on-off of the electromagnet 524, the rectangular frame 523 is driven to move left and right on the guide columns 522, combined with the lifting action of the electric cylinder 51, to drive the AG glass to move up, down, left and right in the cleaning liquid, generating a shear force to promote the stripping of the photoresist.

[0040] When the cleaning module 6 needs to rinse the AG glass, the electric cylinder 51 drives the movable rack 52 to move up, so that the AG glass is removed from the cleaning liquid, facilitating the picking operation of the cleaning module 6; after the rinsing is completed, the auxiliary rack 5 descends and resets again, immersing the AG glass back into the cleaning liquid for continued soaking and cleaning.

[0041] When the glass can move up, down, left and right in the cleaning liquid, a dynamic shear force is generated between the liquid and the glass surface. The turbulence generated by this mechanical force can drive the cleaning liquid into the microscopic grooves formed by etching, washing away chemical etching residues such as acidic solutions, unreacted particles and polishing debris.

[0042] The etched surface is more likely to adsorb grease / particles due to the increased roughness. The shear force directly strips the embedded pollutants through fluid impact, avoiding the "dead corner effect" during static soaking.

[0043] The uniform shear force ensures that the cleaning degree of each area of the etched surface is consistent, avoiding problems such as "patches" on the display screen glass caused by local contamination resulting in differences in light transmittance.

[0044] The change in surface energy after etching may reduce hydrophilicity. Dynamic cleaning promotes the complete removal of pollutants and restores the adhesion of the coating or film.

[0045] Refer to Figure 5 , the cleaning module 6 is composed of an X-axis module 61, a cross beam 62, a Y-axis A module 63, a Y-axis B module 64, a Z-axis A module 65, a Z-axis B module 66, a fixing frame 68, a cleaning head 67 and a suction cup frame 69. The two X-axis modules 61 are installed inside the housing 2, and their sliders carry the cross beam 62 to achieve the movement of the cross beam 62 in the X-axis direction; the Y-axis A module 63 and the Y-axis B module 64 are respectively installed on both sides of the cross beam 62 to drive the Z-axis A module 65 and the Z-axis B module 66 to move in the Y-axis direction; a fixing frame 68 is installed on the slider of the Z-axis A module 65, and the cleaning head 67 at the bottom of the fixing frame 68 can be driven by a motor to rotate and adjust the angle; a suction cup frame 69 is installed on the slider of the Z-axis B module 66, and the suction cup frame 69 is equipped with multiple suction cups for picking up AG glass.

[0046] During the cleaning of AG glass, the suction cups on the suction cup frame 69, through the principle of vacuum adsorption, move above the bracket 3 under the coordinated movement of the Z-axis B module 66, the Y-axis B module 64 and the X-axis module 61, descend and pick up the AG glass, and then place the AG glass on the U-shaped frame 53 of the auxiliary frame 5.

[0047] At the same time, the suction cup frame 69 picks up the AG glass soaked on the U-shaped frame 53 and rinses the AG glass through the rinsing trajectories of the cleaning head 67 from multiple angles and different directions. After rinsing, the suction cup frame 69 places the AG glass back on the auxiliary frame 5, and the auxiliary frame 5 descends to immerse the AG glass in the cleaning liquid again for soaking; repeat the above steps until all AG glass is cleaned. Finally, the suction cup frame 69 transfers the cleaned AG glass back to the bracket 3 to complete the entire cleaning process.

[0048] Refer to Figure 6 and Figure 7, the cleaning head 67 includes a rectangular housing 671, holes 672, a positioning sleeve 673, balls 674, a metal tube 675, a telescopic straight tube 676, a universal spherical joint 677, a moving rod 678, and an XY linear module 679. A number of groups of equidistantly distributed holes 672 are opened at the front end of the rectangular housing 671. A positioning sleeve 673 is installed in each hole 672. The balls 674 roll in the positioning sleeve 673. The metal tube 675 passes through the balls 674, with a nozzle installed at the front end and connected to the telescopic straight tube 676 at the end. The telescopic straight tube 676 is connected to the spherical end of the universal spherical joint 677. The spherical housing ends of multiple universal spherical joints 677 are installed on the moving rod 678. The XY linear module 679 is installed inside the rectangular housing 671 and is used to drive the moving rod 678 to move in the XY-axis direction. The XY linear module 679 drives the moving rod 678 to move on the XY axis, adjusting the angle of the universal spherical joint 677. At this time, the position of the spherical housing end of the universal spherical joint 677 moves but the angle remains unchanged, while the angle of the spherical end changes due to the position of the spherical housing end, driving the angle of the telescopic straight tube 676 to change and not affecting the angle adjustment through telescoping. The metal tube 675 rolls in the positioning sleeve 673 through the balls 674, thereby changing the angle of the nozzle at the front end of the metal tube 675. The cleaning solvent flows through the universal spherical joint 677 to the telescopic straight tube 676 and is introduced into the metal tube 675, and finally sprays out from the nozzle.

[0049] After the auxiliary frame 5 removes the AG glass from the cleaning solution, the suction cup frame 69 picks up the AG glass again. At this time, the cleaning head 67 moves to a suitable position above the AG glass driven by the Z-axis A module 65, the Y-axis A module 63, and the X-axis module 61. The XY linear module 679 drives the moving rod 678 to move on the XY axis to adjust the angle of the universal spherical joint 677, thereby changing the angles of the metal tube 675 and the nozzle. At the same time, the cleaning head 67 rotates itself driven by a motor to achieve multi-angle adjustment of the nozzle within a set range. During the flushing process, the angle is adjusted and the moving path is changed each time the nozzle moves, and the AG glass is flushed from multiple angles and different flushing trajectories in different directions to ensure that the photoresist is fully cleaned.

[0050] The spherical housing end of the universal spherical joint 677 is connected to a water pump through a pipeline, and the water pump introduces the cleaning solution in the cleaning tank 4 into the cleaning head 67 for flushing, and the dripping cleaning solvent drips into the cleaning tank 4, thus avoiding waste and also preventing the cleaning solvent from being exported.

[0051] When the glass is taken out after soaking, the contaminants attached to the surface (such as chemical etching residues, suspended particles) are easily wrapped in a liquid film due to surface tension. Through multi-angle spraying (such as 15°, 30°, and 45° alternately), the liquid film is directly impacted, and the fluid shear force is used to accelerate the detachment of the contaminants. For etched or coated glass (such as AG anti-glare texture, AR anti-reflection groove), the tilted spray can directionally flush the micron-level grooves and remove embedded particles that are difficult to reach by static soaking (cleanliness is improved by more than 40%).

[0052] The etched surface of AG glass has a micron-level rough texture, and fixed-angle spraying can easily lead to uneven water coverage in the groove. By dynamically adjusting the nozzle angle (for example, 0° vertical impact to loosen surface contaminants, 20° oblique impact to the groove sidewall, 40° tangential stripping of edge attachments), the synergistic effect of fluid mechanics in different directions is achieved. The dynamic angle and path work in synergy with the chemical cleaning agent, and the cleaning time for a single piece is shortened from 20 minutes to 9 minutes.

[0053] By driving the moving rod 678 through the XY linear module 679 and combining the angle adjustment (0°-50°) of the universal ball joint 677, the nozzle can move freely in the X / Y / Z three-axis space to cover the etched grooves, edges and holes on the surface of the AG glass. For example:

[0054] Vertical impact: removes loose surface contaminants (such as photoresist debris), improving cleaning efficiency by 40%;

[0055] Oblique penetration (15°-30°): The water flows in a turbulent state (Reynolds number Re>4000) to impact micron-sized grooves (Ra0.2-1.6μm), which is three times higher than traditional fixed spraying, and the pollutant removal rate in the groove is increased from 65% to ≥95%;

[0056] Tangential peeling (30°-50°): For glue marks or sealant residue on glass edges, the tangential water flow peeling efficiency reaches 99%.

[0057] Specific operation process of cleaning method

[0058] S1: Introduction and immersion

[0059] Import the AG glass to be cleaned onto the bracket 3, place it vertically between two groups of support rods 32 on the support bar 31, and limit it with the blocking block 33. Start the cleaning module 6. Through the coordinated movement of the X-axis module 61, Y-axis B module 64, and Z-axis B module 66, move the suction cup holder 69 above the AG glass on the bracket 3. Then, the Z-axis B module 66 descends to allow the suction cups on the suction cup holder 69 to adsorb the AG glass. After adsorption, the Z-axis B module 66 ascends, and then move the AG glass to the U-shaped frame 53 of the auxiliary frame 5 through the X-axis module 61 and Y-axis B module 64, and support the AG glass with the positioning post 54. Next, the electric cylinder 51 descends, immersing the AG glass into the cleaning tank 4 for soaking and cleaning, so that the photoresist is initially softened in the cleaning liquid.

[0060] S2: Pickup and rinsing

[0061] During the soaking process, when the set soaking time is reached, the electric cylinder 51 ascends, lifting the AG glass upward. The cleaning module 6 acts again, and through the X-axis module 61, Y-axis B module 64, and Z-axis B module 66, the suction cup holder 69 picks up the AG glass. After pickup, the electric cylinder 51 descends to reset. At the same time, the X-axis module 61, Y-axis A module 63, and Z-axis A module 65 move in coordination to move the cleaning head 67 to a suitable position of the AG glass for rinsing.

[0062] S3: Multi-angle rinsing

[0063] During the rinsing process, after each movement of the cleaning head 67, the XY linear module 679 drives the moving rod 678 to move on the XY axis, adjusting the angle of the universal spherical joint 677, thereby changing the angle of the nozzle at the front end of the metal tube 675. At the same time, change the movement path of the cleaning head 67, and rinse the AG glass from multiple angles and different directions of rinsing trajectories to ensure that the photoresist can be fully stripped.

[0064] S4: Replacement and cyclic cleaning

[0065] After rinsing is completed, the electric cylinder 51 ascends again, and the cleaning module 6 guides the cleaned AG glass back to its original position on the bracket 3, and then picks up a new AG glass from the bracket 3 for rinsing again. The auxiliary frame 5 continues to reset for soaking and cleaning, and operates in this cycle until all AG glasses are rinsed.

[0066] S5: Cleaning end

[0067] When all AG glasses are rinsed, the electric cylinder 51 lifts the AG glass upward, and the cleaning module 6 transfers the AG glass on the auxiliary frame 5 to the bracket 3, completing the entire cleaning process. The operator can observe the cleaning process and results through the observation window on the front of the machine case 2 to ensure the smooth progress of the cleaning work.

[0068] The above embodiments are only exemplary embodiments of the present invention and are not intended to limit the present invention. The protection scope of the present invention is defined by the claims. Those skilled in the art can make various modifications or equivalent substitutions within the essence and protection scope of the present invention, and such modifications or equivalent substitutions should also be regarded as falling within the protection scope of the present invention.

Claims

1. An AG glass anti-glare layer manufacturing photoresist cleaning device, characterized in that: It includes a workbench (1) and a casing (2) installed on the workbench (1). A bracket (3) for storing AG glass is installed on the workbench (1). A cleaning tank (4) is provided on the workbench (1) beside the bracket (3). An auxiliary frame (5) for moving the AG glass up, down, left, and right is arranged at the edge of the cleaning tank (4), and the auxiliary frame (5) extends into the cleaning tank (4). By driving the AG glass to move in the cleaning liquid, a shear force is generated to promote the peeling of the photoresist. A cleaning module (6) is arranged inside the casing (2). The AG glass on the bracket (3) is introduced onto the auxiliary frame (5) by the cleaning module (6). The auxiliary frame (5) introduces the AG glass into the cleaning tank (4) for cleaning. During the cleaning process, the auxiliary frame (5) repeatedly exports the AG glass. The cleaning module (6) picks up the AG glass and rinses the AG glass. The angle of the nozzle is changed each time for rinsing, and the AG glass is rinsed from multiple angles.

2. The lithographic resist cleaning device for manufacturing an anti-glare layer of AG glass according to claim 1, wherein: A side door for introducing and exporting the AG glass on the bracket (3) is arranged on the side of the casing (2), and an observation window is arranged on the front of the casing (2).

3. An AG glass anti-glare layer manufacturing photoresist cleaning device according to claim 1, characterized in that: The bracket (3) includes several groups of support bars (31) installed on the workbench (1). Two groups of support rods (32) are arranged on both sides of the support bar (31). A blocking block (33) for limiting the AG glass is arranged at the front end of the support bar (31), and the AG glass is vertically placed between the two groups of support rods (32) on the support bar (31).

4. A lithographic resist cleaning device for manufacturing an anti-glare layer of AG glass according to claim 1, characterized in that: The auxiliary frame (5) includes two groups of electric cylinders (51) arranged inside the workbench (1) at both ends of the cleaning tank (4). Moving frames (52) are installed at the tops of the two groups of electric cylinders (51). Several groups of equally spaced U-shaped frames (53) are installed between the two moving frames (52). Positioning columns (54) for supporting the AG glass are installed on both sides of each U-shaped frame (53). The AG glass is placed by the U-shaped frame (53) with the positioning column (54), and the electric cylinder (51) and the moving frame (52) drive the AG glass to move up, down, left, and right inside the cleaning tank (4).

5. An AG glass anti-glare layer manufacturing photoresist cleaning device according to claim 4, characterized in that: The moving frame (52) includes a moving beam (521) installed at the moving end of the electric cylinder (51) and two guide columns (522) installed on the side of the moving beam (521). A slidable rectangular frame (523) is arranged on the two guide columns (522). The two ends of the U-shaped frame (53) are connected to the bottom of the two rectangular frames (523). An electromagnet (524) is embedded on the moving beam (521), and iron sheets (525) are arranged at corresponding positions on the rectangular frame (523). By energizing the electromagnet (524) to adsorb the iron sheet (525), the rectangular frame (523) drives the U-shaped frame (53) to move left and right.

6. The lithographic resist cleaning device for manufacturing an anti-glare layer of AG glass according to claim 1, characterized in that: The cleaning module (6) includes two X-axis modules (61) installed inside the machine housing (2), and a cross beam (62) is installed on the sliders of the two X-axis modules (61). A Y-axis A module (63) and a Y-axis B module (64) are respectively installed on both sides of the cross beam (62). A Z-axis A module (65) is installed on the slider of the Y-axis A module (63). A fixing frame (68) is installed on the slider of the Z-axis A module (65). A rotatable cleaning head (67) is provided at the bottom of the fixing frame (68). The cleaning head (67) is driven by a motor and the angle is adjusted. A Z-axis B module (66) is installed on the slider of the Y-axis B module (63). A suction cup holder (69) is installed on the slider of the Z-axis B module (66). The AG glass is picked up by the suction cups on the suction cup holder (69) and is rinsed from multiple angles by the cleaning head (67).

7. An AG glass anti-glare layer manufacturing photoresist cleaning device according to claim 6, characterized in that: The cleaning head (67) includes a rectangular housing (671) and a number of groups of equally spaced holes (672) opened at the front end of the rectangular housing (671). A positioning sleeve (673) is installed in each hole (672). A rollable ball (674) is provided inside the positioning sleeve (673). A metal tube (675) is penetrated through the ball (674). A spray head is installed at the front end of the metal tube (675). A telescopic straight tube (676) is installed at the end of the metal tube (675). The other end of the telescopic straight tube (676) is connected to the spherical connection end of a universal spherical joint (677). All the spherical housing ends of the universal spherical joints (677) are installed on a moving rod (678). An XY linear module (679) is installed inside the rectangular housing (671). The moving rod (678) is driven by the XY linear module (679) to move on the XY axes, adjusting the angle between the spherical connection end and the spherical housing end of the universal spherical joint (677), so that the angle of the metal tube (675) is adjusted accordingly, and the spray head can be adjusted at any angle within a set range.

8. A method for cleaning a photoresist in the manufacture of an anti-glare layer of AG glass, characterized in that, An AG glass anti-glare layer manufacturing photoresist cleaning device according to any one of claims 1-7, the specific operation is as follows: S1. Import the AG glass onto the bracket (3), and the cleaning module (6) imports the AG glass on the bracket (3) onto the auxiliary bracket (5). The auxiliary bracket (5) immerses the AG glass into the cleaning tank (4) for soaking and cleaning. S2. During the soaking process, the auxiliary bracket (5) moves the AG glass upward, so that the cleaning module (6) picks up and imports the AG glass again. After picking up, the auxiliary bracket (5) resets again, and the spray head on the cleaning module (6) rinses the AG glass. S3. During the rinsing process, each time the spray head on the cleaning module (6) moves, the angle of the spray head is adjusted to change the moving path of the spray head, and the AG glass is rinsed from multiple angles and different directions of rinsing trajectories. S4. After rinsing, the auxiliary bracket (5) moves upward again. The cleaning module (6) guides the rinsed AG glass back to its original position, and replaces the AG glass again for rinsing. The auxiliary bracket (5) continues to reset for soaking and cleaning until all the AG glass has been rinsed. S5. The auxiliary frame (5) moves the AG glass upward, and the cleaning module (6) transfers the AG glass on the auxiliary frame (5) to the bracket (3) to complete the cleaning process.

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