Pressure regulation and control method and device and semiconductor process equipment

Abstract

The invention discloses a pressure regulation and control method and device and semiconductor process equipment, and relates to the technical field of semiconductor manufacturing, and the method comprises the steps: obtaining an actual pressure value of a target cavity according to a preset frequency; comparing each actual pressure value with a preset target pressure value; if the actual pressure value is equal to the preset target pressure value, the current opening adjusting amount of the flow controller is kept unchanged; if the actual pressure value is not equal to the preset target pressure value, executing the following steps: calculating a deviation value between the actual pressure value and the preset target pressure value according to the actual pressure value and the preset target pressure value; according to the deviation value, the opening degree adjusting amount of the flow controller is determined; and adjusting the actual pressure value to reach a preset target pressure value based on the opening adjusting amount. According to the pressure regulation and control method and device and the semiconductor process equipment, the actual pressure value of the target cavity can be automatically and accurately regulated, manual regulation is not needed, and the control precision and efficiency are improved.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor manufacturing technology, and in particular to a pressure control method, device and semiconductor process equipment. Background Art

[0002] In semiconductor manufacturing, many critical processes (such as thin film deposition and etching) require highly controllable vacuum or low-pressure chambers. Precise chamber pressure control is crucial because it directly affects the mean free path of gas molecules, reaction rates, plasma stability, film uniformity, and etch profile. Even small pressure fluctuations can cause process results (such as film thickness, composition, etch rate, and uniformity) to deviate significantly from target, resulting in wafer defects and even scrap. Therefore, a high-precision, fast-response pressure control system is a core technical foundation for ensuring process repeatability and yield.

[0003] Traditional methods for regulating chamber pressure involve manually adjusting the opening of the inflation valve or using an MFC (Mass Flow Controller) with front and rear diaphragm valves to control the inflation volume. However, manual adjustment of the inflation valve opening suffers from poor control accuracy and delayed response (typical delay >5s), making it incapable of handling sudden changes in process gas flow (e.g., ±30% flow fluctuation). While using an MFC with front and rear diaphragm valves can achieve open-loop control, control accuracy is also limited. For example, at a set value of 10 Torr (a widely used unit of pressure in vacuum technology), the measured chamber pressure fluctuation range reaches ±15%. A mature and effective solution for precisely controlling the MFC opening to automatically and stably maintain a fixed chamber pressure remains unavailable. Furthermore, both approaches suffer from poor system coordination, lacking a linkage mechanism between the inflation and exhaust systems, and are prone to pressure fluctuations during switching (typical overshoots can reach 20%).

[0004] Furthermore, during processes such as degassing (heating and degassing), maintaining a constant chamber pressure is crucial for ensuring process quality. Improper chamber pressure control, either excessively high or low, can lead to process anomalies and compromise product quality. In scientific research, industrial production, and other fields requiring extremely stable chamber pressure, such as etching and coating processes in semiconductor manufacturing, even small fluctuations in chamber pressure can severely impact product quality.

[0005] Therefore, the prior art lacks a pressure control method, device, and semiconductor process equipment that can automatically and accurately control the cavity pressure to maintain it at a preset pressure value, so as to improve control accuracy and efficiency and ensure process quality. Summary of the Invention

[0006] The present invention aims to, to a certain extent, address one of the technical problems in the related art. To this end, the present invention provides a pressure control method, apparatus, and semiconductor process equipment that can automatically and accurately adjust the actual pressure value of a target cavity without manual adjustment, thereby improving control accuracy and efficiency.

[0007] In order to achieve the above object, the present invention adopts the following technical solutions: A pressure control method comprising: According to the preset frequency, the actual pressure value of the target cavity is obtained; Compare each actual pressure value with the preset target pressure value; if the actual pressure value is equal to the preset target pressure value, keep the current opening adjustment of the flow controller unchanged; if the actual pressure value is not equal to the preset target pressure value, perform the following steps: Calculate the deviation between the actual pressure value and the preset target pressure value according to the actual pressure value and the preset target pressure value; According to the deviation value, determine the opening adjustment amount of the flow controller; Based on the opening adjustment amount, the actual pressure value is adjusted to reach the preset target pressure value.

[0008] Optionally, determining an opening adjustment amount of the flow controller according to the deviation value includes: comparing the deviation value with a preset valve switching threshold; If the deviation value is greater than the preset valve switching threshold, the fast / slow pumping valve group is controlled to enter the fully open state, and the current opening adjustment amount of the flow controller is kept unchanged; If the deviation value is less than the preset valve switching threshold, the opening adjustment amount of the flow controller is analyzed and calculated based on the deviation value.

[0009] Optionally, analyzing and calculating the opening adjustment amount of the flow controller according to the deviation value includes: Adopting the self-tuning algorithm, analyzing and calculating the proportional coefficient, and calculating the product of the proportional coefficient and the deviation value as the first adjustment item; Selecting a preset time period as an integration time, calculating the integral of the deviation value within the preset time period, and calculating the product of the quotient of the proportional coefficient and the integration time and the integral of the deviation value within the preset time period as a second adjustment item; Analyze and calculate the rate of change of the deviation value at adjacent moments, and use the self-tuning algorithm to analyze and calculate the differential time, and calculate the product of the rate of change, differential time and proportional coefficient as the third adjustment item; Calculate the sum of the first adjustment item, the second adjustment item, and the third adjustment item as the adjustment coefficient, and analyze and calculate the target flow value based on the deviation value; According to the adjustment coefficient and target flow value, the opening adjustment amount of the flow controller is analyzed and calculated.

[0010] Optionally, the self-tuning algorithm is a hybrid self-tuning algorithm, including: A first-order inertial pure lag mathematical model including time constant and gain parameters is constructed using the recursive least square method. The improved particle swarm algorithm is used to optimize the mathematical model for a preset number of iterations to obtain the target parameters; The mathematical model is optimized using target parameters.

[0011] Optionally, before adopting the target parameter to optimize the mathematical model, the method further includes: The target parameters and historical parameters are mixed and output for verification according to preset weights. When the root mean square error value of the verification result decreases by more than a first preset deviation value compared with the root mean square error value of the historical result, the target parameters are enabled.

[0012] Optionally, the method further includes: When using mathematical models for analysis and calculation, a pre-trained long short-term memory network model is used to predict the trend of the actual results output by the mathematical model; When the deviation between the predicted result and the actual result exceeds a second preset deviation value, the mathematical model automatically fine-tunes the target parameters.

[0013] Optionally, the method further includes: Updating the preset target pressure value to obtain an updated preset target pressure value; Calculate the deviation between the actual pressure value and the updated preset target pressure value or the pressure difference between the preset target pressure value before the update and the preset target pressure value after the update; Determine whether the deviation value or pressure difference value is greater than a preset critical threshold; If the deviation value or the pressure difference value is greater than a preset critical threshold, switching of the target cavity is executed, wherein the preset critical threshold is greater than a preset valve switching threshold.

[0014] In addition, the present invention also provides a pressure control device, comprising: a pressure acquisition module, a pressure control module and a pressure regulation module; wherein, The pressure acquisition module is connected to the target cavity and is used to obtain the actual pressure value of the target cavity according to the preset frequency and output it to the pressure control module; The pressure control module is connected to the pressure acquisition module and is used to compare each actual pressure value with the preset target pressure value, generate a corresponding comparison result, and generate a corresponding control signal based on the comparison result or the comparison result and the preset valve switching threshold; The pressure regulating module is connected to the pressure control module and the target cavity respectively, and is used to adjust the actual pressure value of the target cavity to reach the target pressure value according to the control signal.

[0015] Optionally, the pressure control module includes: a programmable logic control module, a proportional-integral-differential control module and an industrial computer module.

[0016] The programmable logic control module is connected to the pressure acquisition module and the pressure regulation module respectively, and is used to compare each actual pressure value with the preset target pressure value. If the comparison result shows that the two are equal, a steady-state control signal is generated. If the comparison result shows that the two are not equal, the deviation between the actual pressure value and the preset target pressure value is calculated, and the deviation is compared with the preset valve switching threshold to generate a corresponding normal regulation control signal or flow calculation signal; The proportional-integral-differential control module is connected to the programmable logic control module and the pressure regulation module respectively, and is used to analyze and calculate the target flow value according to the flow calculation signal when the deviation value is less than the preset valve switching threshold, and generate the opening adjustment amount according to the target flow value and output it to the pressure regulation module; The industrial computer module is connected to the programmable logic control module and is used to set a preset target pressure value and a preset valve switching threshold, as well as to visually display preset option information.

[0017] Optionally, the pressure regulating module includes: a flow controller and a fast / slow air extraction valve group.

[0018] The flow controller is connected to the pressure control module and the target cavity respectively, and is used to adjust the actual pressure value of the target cavity to the target pressure value according to the opening adjustment amount output by the pressure control module; The fast / slow air pumping valve group is connected to the pressure control module and the target cavity respectively, and is used to enable the fast / slow air pumping valve group to enter a fully open state when the deviation value is greater than the preset valve switching threshold; and to enable the fast / slow air pumping valve group to enter a half-open state when the deviation value is less than the preset valve switching threshold or the actual pressure value is equal to the preset target pressure value.

[0019] Optionally, the flow controller includes: a mass flow controller, a first diaphragm valve and a second diaphragm valve.

[0020] The mass flow controller is connected to the pressure control module and is used to adjust the opening according to the opening adjustment amount output by the pressure control module; The first diaphragm valve is connected to the gas source module and the mass flow controller respectively, and the second diaphragm valve is connected to the mass flow controller and the target cavity respectively. It is used to inflate the target cavity through the first diaphragm valve and the second diaphragm valve after the mass flow controller adjusts the opening so that the actual pressure value reaches the preset target pressure value.

[0021] Optionally, the device further includes: an air source module and / or an air pump module.

[0022] The gas source module is connected to the flow controller and is used to inflate the target cavity through the flow controller; The air pump module is connected to the fast / slow air pumping valve group and is used to pump out the gas in the target cavity through the fast / slow air pumping valve group.

[0023] Optionally, the device further comprises: a target cavity, a slide rail, a storage module and a sensing module; wherein, The target cavity includes a main cavity and an auxiliary cavity, wherein a sealing door is provided between the main cavity and the auxiliary cavity; when the sealing door is opened, the main cavity and the auxiliary cavity are connected; when the sealing door is closed, the main cavity and the auxiliary cavity are sealed and isolated from each other; The slide rails are embedded in the bottom inner surfaces of the main cavity and the auxiliary cavity; The storage module is slidably disposed on the slide rail and is connected to the pressure control module. After receiving the cavity switching control signal generated by the pressure control module, it slides along the slide rail through the sealing door from the main cavity to the auxiliary cavity or from the auxiliary cavity to the main cavity; The sensing module is arranged on the slide rail and is used to open or close the sealing door accordingly when the storage module reaches or leaves a preset position.

[0024] Optionally, the pressure control module is connected to the placement module and is used to generate a cavity switching control signal and output it to the placement module when the deviation value or the pressure difference between two adjacent preset target pressure values ​​is greater than a preset critical threshold; wherein the preset critical threshold is greater than the preset valve switching threshold.

[0025] Optionally, the proportional-integral-differential control module includes: a proportional unit, a differential unit, an integral unit and a central control unit.

[0026] The proportional unit is connected to the central control unit and is used to analyze and calculate the proportional coefficient using a self-tuning algorithm, and calculate the product of the proportional coefficient and the deviation value as the first adjustment item based on the proportional coefficient and the deviation value; The differential unit is connected to the central control unit and is used to select a preset time period as the integral time, calculate the integral of the deviation value within the preset time period, and calculate the product of the quotient of the proportional coefficient and the integral time and the integral of the deviation value within the preset time period as the second adjustment item.

[0027] The integration unit is connected to the central control unit and is used to analyze and calculate the rate of change of the deviation value at adjacent moments based on the deviation value; analyze and calculate the differential time using a self-tuning algorithm; and calculate the product of the rate of change, differential time and proportional coefficient as the third adjustment item based on the rate of change, differential time and proportional coefficient. The central control unit is respectively connected to the programmable logic control module and the pressure regulation module, and is used to receive the deviation value, the proportional coefficient, the first adjustment item, the second adjustment item and the third adjustment item; when the deviation value is less than the preset valve switching threshold, the target flow value is analyzed and calculated according to the flow calculation signal; the first adjustment item, the second adjustment item and the third adjustment item are added together to obtain the adjustment coefficient; and according to the target flow value and the adjustment coefficient, the opening adjustment amount is generated and output to the pressure regulation module.

[0028] Furthermore, the present invention also provides a semiconductor process equipment comprising any of the above-mentioned pressure regulating devices.

[0029] The pressure control method, device, and semiconductor process equipment provided by the present invention obtain the actual pressure value of the target cavity according to a preset frequency; compare each actual pressure value with the preset target pressure value; if the actual pressure value is equal to the preset target pressure value, maintain the current opening adjustment amount of the flow controller unchanged; if the actual pressure value is not equal to the preset target pressure value, perform the following steps: calculate the deviation between the actual pressure value and the preset target pressure value based on the actual pressure value and the preset target pressure value; determine the opening adjustment amount of the flow controller based on the deviation value; and adjust the actual pressure value to the preset target pressure value based on the opening adjustment amount. The pressure control method, device, and semiconductor process equipment of the present invention can automatically and accurately adjust the actual pressure value of the target cavity without manual adjustment, thereby improving control accuracy and efficiency.

[0030] These features and advantages of the present invention will be further disclosed in the following detailed description and accompanying drawings. The preferred embodiments and means of the present invention will be fully illustrated in conjunction with the accompanying drawings, but are not intended to limit the technical solutions of the present invention. Furthermore, although multiple features, elements, and components may be present in each of the following text and accompanying drawings, they may be labeled with different symbols or numbers for convenience, but all represent components with the same or similar structure or function. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] The present invention will be further described below in conjunction with the accompanying drawings: Figure 1a A schematic diagram of a process flow of the pressure control method provided by the present invention; Figure 1b Another schematic diagram of the process of the pressure control method provided by the present invention; Figure 2a A schematic diagram of a circuit module structure of the pressure control device provided by the present invention; Figure 2b A schematic diagram of another circuit module structure of the pressure control device provided by the present invention; Figure 2c A schematic diagram of another circuit module structure of the pressure control device provided by the present invention; Figure 2d A schematic structural diagram of a target cavity in the pressure regulating device provided by the present invention; Figure 2e This is another schematic diagram of the circuit module structure of the pressure control device provided by the present invention. DETAILED DESCRIPTION

[0032] The following describes embodiments of the present invention in detail, examples of which are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described in the embodiments are intended to explain the present invention and are not to be construed as limiting the present invention.

[0033] References in this specification to "one embodiment," "an example," or "an example" mean that a particular feature, structure, or characteristic described in connection with the embodiment itself can be included in at least one embodiment disclosed herein. The appearances of the phrase "in one embodiment" in various places in the specification are not necessarily all referring to the same embodiment.

[0034] As a first aspect of the present invention, a pressure control method is provided, such as Figure 1a As shown, the method includes: Step S10: obtaining the actual pressure value of the target cavity according to the preset frequency; In step S10, a vacuum gauge can be set to a preset frequency, and the actual pressure value of the target cavity can be obtained according to the preset frequency. The vacuum gauge can be a conventional vacuum gauge, and those skilled in the art can select one based on actual needs, and this is not limited here. Preferably, the vacuum gauge includes a pressure sensor with a 0.1% FS (femtosecond) accuracy.

[0035] In addition, those skilled in the art can select the preset frequency according to actual needs, and it is not limited here. Preferably, the preset frequency is 10 Hz (Hertz).

[0036] Step S11: Compare each actual pressure value with a preset target pressure value; In the present invention, using a 10 Hz frequency as an example, the vacuum gauge acquires the actual pressure value of the target chamber every 0.1 seconds (seconds) and outputs this value to the pressure control module for comparison with the preset target pressure value. This enables precise adjustment of the actual pressure value of the target chamber. In other words, the monitoring period of the present invention is 0.1 seconds.

[0037] Step S12: If the actual pressure value is equal to the preset target pressure value, the current opening adjustment amount of the flow controller is kept unchanged; If the actual pressure value is not equal to the preset target pressure value, perform the following steps: Step S13: Calculating a deviation between the actual pressure value and the preset target pressure value according to the actual pressure value and the preset target pressure value; Step S14: determining the opening adjustment amount of the flow controller according to the deviation value; Step S15: Based on the opening adjustment amount, the actual pressure value is adjusted to reach the preset target pressure value.

[0038] like Figure 1b As shown, in the present invention, step S14 may further include: Step S141: comparing the deviation value with a preset valve switching threshold; Step S142: If the deviation value is greater than the preset valve switching threshold, the fast / slow pumping valve group is controlled to enter the fully open state, and the current opening adjustment amount of the flow controller is kept unchanged; Step S143: If the deviation value is less than the preset valve switching threshold, the opening adjustment amount of the flow controller is analyzed and calculated based on the deviation value.

[0039] The preset valve switching threshold can be pre-set by the industrial computer module in the pressure control module and then output to the programmable logic control module in the pressure control module. The value of the preset valve switching threshold can be selected by those skilled in the art based on actual needs and is not limited here. It should be noted that the preset valve switching threshold can be a point value or a range value.

[0040] In step S143, the opening adjustment amount of the flow controller is analyzed and calculated based on the deviation value, specifically including: Step S1431: using a self-tuning algorithm to analyze and calculate the proportional coefficient, and based on the proportional coefficient and the deviation value, calculating the product of the proportional coefficient and the deviation value as the first adjustment item; Proportional Link: This adjusts the flow controller's opening proportionally based on the deviation between the actual pressure in the target chamber and the preset target pressure. The proportional link's function is to quickly respond to deviations, and its adjustment speed is related to the proportional coefficient. A larger proportional coefficient increases the regulation, but an excessively large proportional coefficient can cause the device to overshoot or even become unstable.

[0041] When the pressure control device is operating, the pressure acquisition module collects the actual pressure value of the target cavity in real time and transmits it to the pressure control module. The pressure control module analyzes and calculates the deviation value, then uses the self-tuning algorithm to obtain the proportional coefficient. The product of the proportional coefficient and the deviation value is then calculated as the first adjustment item output. This output value serves as part of the flow controller's opening adjustment and directly affects the flow controller's opening adjustment. For example, if the actual pressure value of the current target cavity is less than the preset target pressure value, the proportional link will output a positive adjustment signal based on the size of the deviation value and the proportional coefficient, increasing the flow controller's opening to increase the inflation volume; otherwise, the flow controller's opening will be reduced.

[0042] Step S1432: Selecting a preset time period as the integration time, calculating the integral of the deviation value within the preset time period based on the integration time, and calculating the product of the quotient of the proportional coefficient and the integration time and the integral of the deviation value within the preset time period as the second adjustment item based on the proportional coefficient, the integration time, and the integral of the deviation value within the preset time period; Integral stage: This stage integrates the deviation value to eliminate the system's steady-state error and ensure that the actual pressure in the target chamber ultimately stabilizes at the preset target pressure. Even if the proportional stage reduces the deviation to a certain level, if there is a small, persistent deviation, the integral stage will continue to accumulate the deviation over time, increasing the regulatory effect until the steady-state error is eliminated. The intensity of the integral stage's regulation is determined by the integral time. A shorter integral time increases the integral effect, but an excessively short integral time may result in slow system response or oscillation.

[0043] After each deviation calculation, the pressure control module accumulates this deviation into the integral term. The output of the integral component is calculated by multiplying the quotient of the proportional coefficient and the integral time by the integral of the deviation value within a preset time period. This output is then added to the proportional component output to adjust the flow controller's opening. For example, if the integral component output approaches the preset target pressure but still exhibits a small deviation, the integral component continues to accumulate this deviation and gradually adjusts the flow controller's opening until the actual pressure in the target chamber reaches the preset target pressure.

[0044] Step S1433: Analyze and calculate the rate of change of the deviation value between adjacent moments, and use the self-tuning algorithm to analyze and calculate the differential time, and calculate the product of the rate of change, differential time, and proportional coefficient as the third adjustment item based on the rate of change, differential time, and proportional coefficient; The differential link adjusts the flow controller's opening based on the rate of change of the deviation value. Its purpose is to predict pressure trends and adjust the flow controller's opening in advance to prevent pressure overshoot. When the deviation value changes rapidly, the differential link outputs a larger control signal to suppress over-adjustment of the flow controller's opening. When the deviation value changes more slowly, the differential link's effect weakens. The differential link's regulatory strength is determined by the differential time. A longer differential time increases sensitivity to the rate of change of the deviation value, but an excessively long differential time can easily introduce noise interference.

[0045] The pressure control module calculates the change in the deviation value between adjacent moments to approximate the rate of change of the deviation value. This is then combined with the differential time and proportional coefficient obtained by the self-tuning algorithm to calculate the output value of the differential link by multiplying the rate of change, differential time, and proportional coefficient. This output value, when added to the output values ​​of the proportional and integral links, jointly determines the final opening adjustment amount of the flow controller. For example, when the actual pressure value of the target cavity rises rapidly and approaches the preset target pressure value, the differential link outputs a reverse adjustment signal based on the rate of change of the deviation value between adjacent moments, reducing the opening adjustment amount of the flow controller in advance to prevent the actual pressure value of the target cavity from overshooting.

[0046] Step S1434: adding the first adjustment item, the second adjustment item, and the third adjustment item to obtain an adjustment coefficient, and analyzing and calculating the target flow rate value based on the deviation value; Step S1435: Analyze and calculate the opening adjustment amount of the flow controller according to the adjustment coefficient and the target flow value.

[0047] It should be noted that steps S1431 to S1435 are not shown in the figure, but are only for the convenience of describing the pressure control method of the present invention.

[0048] Optionally, the self-tuning algorithm is a hybrid self-tuning algorithm, including: The recursive least square method is used to construct a first-order inertia pure lag mathematical model including time constant and gain parameters; The improved particle swarm algorithm is used to optimize the mathematical model for a preset number of iterations to obtain the target parameters; The mathematical model is optimized using target parameters.

[0049] Optionally, the self-tuning algorithm is a hybrid self-tuning algorithm, which includes: constructing a first-order inertia pure lag mathematical model including a time constant and a gain parameter using a recursive least squares method; optimizing the mathematical model using an improved particle swarm algorithm for a preset number of iterations (preferably 30 times) to obtain target parameters; and optimizing the mathematical model using the target parameters.

[0050] It should be noted that before using the target parameters to optimize the mathematical model, the target parameters of the mathematical model can also be verified. Specifically, the target parameters and historical parameters are mixed and output for verification according to a preset weight (preferably 1:9). When the root mean square error value of the verification result decreases by more than a first preset deviation value (preferably 15%) compared to the root mean square error value of the historical result, the target parameters are activated.

[0051] When using this mathematical model for analysis and calculation, a pre-trained long short-term memory network model is used to predict the trend of the actual results output by the mathematical model; when the deviation between the predicted result and the actual result exceeds a second preset deviation value (preferably 5%), the mathematical model automatically fine-tunes the target parameters.

[0052] The first-order inertia pure lag mathematical model, the improved particle swarm optimization algorithm, and the long short-term memory network model are all existing models and algorithms, and those skilled in the art may select one based on actual needs, without limitation herein. Furthermore, those skilled in the art may also adjust the preset times, preset weights, first preset deviation value, and second preset deviation value based on actual needs, without limitation herein.

[0053] The hybrid self-tuning algorithm, the optimization and verification method of the target parameters of the mathematical model, and the fine-tuning method of the target parameters of the mathematical model adopted in the embodiments of the present invention are all intended to make the output results of the proportional-integral-differential control module (i.e., the PID control system) in the pressure control module more accurate, so that the opening adjustment amount can be calculated more accurately to achieve precise regulation and control of the actual pressure value in the target cavity.

[0054] Optionally, before adopting the target parameter optimization mathematical model, the method further includes: The target parameter and the historical parameter are mixed and output for verification according to preset weights. When the root mean square error of the verification result exceeds the root mean square error of the historical parameter by a first preset deviation value, the target parameter is enabled.

[0055] In an optional embodiment, the method further includes: When using mathematical models for analysis and calculation, a pre-trained long short-term memory network model is used to predict the trend of the actual results output by the mathematical model; When the deviation between the predicted result and the actual result exceeds a second preset deviation value, the mathematical model automatically fine-tunes the target parameters.

[0056] In an optional embodiment, the method further includes: updating the preset target pressure value to obtain an updated preset target pressure value; Calculate the deviation between the actual pressure value and the updated preset target pressure value or the pressure difference between the preset target pressure value before the update and the preset target pressure value after the update; Determine whether the deviation value or pressure difference value is greater than a preset critical threshold; If the deviation value or the pressure difference value is greater than a preset critical threshold, switching of the target cavity is executed, wherein the preset critical threshold is greater than a preset valve switching threshold.

[0057] The pressure control method provided by the present invention obtains the actual pressure value of the target cavity according to a preset frequency; compares each actual pressure value with the preset target pressure value; if the actual pressure value is equal to the preset target pressure value, maintains the current opening adjustment amount of the flow controller unchanged; if the actual pressure value is not equal to the preset target pressure value, performs the following steps: calculates the deviation between the actual pressure value and the preset target pressure value based on the actual pressure value and the preset target pressure value; determines the opening adjustment amount of the flow controller based on the deviation; and adjusts the actual pressure value to the preset target pressure value based on the opening adjustment amount. The pressure control method of the present invention can automatically and accurately adjust the actual pressure value of the target cavity without manual adjustment, thereby improving control accuracy and efficiency.

[0058] As a second aspect of the present invention, a pressure regulating device is provided, such as Figure 2a As shown, the device includes: a pressure acquisition module 20, a pressure control module 21 and a pressure regulation module 22; wherein the pressure acquisition module 21 is connected to the target cavity 23, and is used to obtain the actual pressure value of the target cavity according to a preset frequency, and output it to the pressure control module 21; the pressure control module 21 is connected to the pressure acquisition module 20, and is used to compare each actual pressure value with the preset target pressure value, generate a corresponding comparison result, and generate a corresponding control signal according to the comparison result or the comparison result and the preset valve switching threshold; the pressure regulation module 22 is respectively connected to the pressure control module 21 and the target cavity 23, and is used to adjust the actual pressure value of the target cavity 23 to the target pressure value according to the control signal output by the pressure control module 21.

[0059] In the present invention, the pressure acquisition module 20 can be a conventional vacuum gauge. Those skilled in the art can select a suitable one based on practical needs, and this is not limited here. Preferably, the vacuum gauge includes a pressure sensor with a 0.1% FS accuracy. Furthermore, those skilled in the art can also select a preset frequency based on practical needs, and this is not limited here. Preferably, the preset frequency is 10 Hz.

[0060] Specifically, a preset frequency may be set through the vacuum gauge, and the actual pressure value of the target cavity may be obtained according to the preset frequency.

[0061] Alternatively, as Figure 2b As shown, the pressure control module 21 further includes: a programmable logic control module 211, a proportional-integral-differential control module 212 and an industrial computer module 213; wherein, The programmable logic control module 211 is connected to the pressure acquisition module 20 and the pressure regulation module 22 respectively, and is used to compare each actual pressure value with the preset target pressure value. If the comparison result shows that the two are equal, a steady-state control signal is generated. If the comparison result shows that the two are not equal, the deviation between the actual pressure value and the preset target pressure value is calculated, and the deviation is compared with the preset valve switching threshold to generate a corresponding normal regulation control signal or flow calculation signal. The preset valve switching threshold can be pre-set by the industrial computer module 213 and then output to the programmable logic control module 211. The value of the preset valve switching threshold can be selected by those skilled in the art based on actual needs and is not limited herein. It should be noted that the preset valve switching threshold can be a point value or a range value.

[0062] The proportional-integral-differential control module 212 is connected to the programmable logic control module 211 and the pressure regulation module 22 respectively, and is used to analyze and calculate the target flow value based on the flow calculation signal output by the programmable logic control module 211 when the deviation value is less than the preset valve switching threshold, and generate the opening adjustment value based on the target flow value and output it to the pressure regulation module 22; Optionally, the proportional-integral-differential control module 212 adopts a PID control system in the prior art. Those skilled in the art can make a selection based on actual needs, and this is not limited here. Preferably, the proportional-integral-differential control module 212 adopts a bipolar PID control system in the prior art. The present invention uses a PID control system to precisely adjust the opening of a mass flow controller (MFC) to precisely control the amount of inflation, thereby precisely controlling the actual pressure value of the target cavity to maintain it at a preset target pressure value, thereby improving the accuracy of pressure control; and the PID control system has good dynamic response performance, and can quickly respond (with a response time of less than 100ms) to changes in the actual pressure value of the target cavity, and timely adjust the opening of the MFC to ensure that the actual pressure value of the target cavity always remains at the preset target pressure value, thereby improving the stability and reliability of pressure control.

[0063] The industrial computer module 213 is connected to the programmable logic control module 211 and is used to set a preset target pressure value and a preset valve switching threshold, and to visually display preset option information.

[0064] Among them, the preset option information may include one or more of a preset frequency, a preset target pressure value, a preset valve switching threshold, a target flow value, an opening adjustment amount, etc. Technical personnel in this field can choose according to actual needs, and no limitation is made here.

[0065] Optionally, communication between the programmable logic control module 211 and the industrial computer module 213 utilizes etherCAT (Ethernet Control Automation Technology) and / or ADS (Automation Device Specification), both of which are known in the art. Persons skilled in the art may select the appropriate protocol based on actual needs, and this is not a limitation herein. Furthermore, the programmable logic control module 211 and the industrial computer module 213 may utilize circuit modules known in the art, both of which may be selected based on actual needs, and this is not a limitation herein.

[0066] like Figure 2b As shown, the pressure regulating module 22 may further include: a flow controller 221 and a fast / slow air extraction valve group 222; wherein, The flow controller 221 is connected to the pressure control module 21 and the target cavity 23 respectively, and is used to adjust the actual pressure value of the target cavity 23 to the target pressure value according to the opening adjustment value output by the pressure control module 21; Specifically, the flow controller 221 is connected to the proportional-integral-differential control module 212 in the pressure control module 21 and the target cavity 23, respectively, and is used to adjust the actual pressure value of the target cavity 23 to the target pressure value according to the opening adjustment amount output by the proportional-integral-differential control module 212 in the pressure control module 21; The fast / slow air pumping valve group 222 is respectively connected to the pressure control module 21 and the target cavity 23, and is used to, when the deviation value is greater than the preset valve switching threshold, the fast / slow air pumping valve group 222 enters a fully open state according to the normal adjustment control signal output by the pressure control module 21; and, when the deviation value is less than the preset valve switching threshold or the actual pressure value is equal to the preset target pressure value, the fast / slow air pumping valve group 222 enters a half-open state.

[0067] Among them, the fast / slow exhaust valve group 222 can choose the fast / slow exhaust valve group in the prior art. Those skilled in the art can make the selection according to actual needs, and no limitation is made here. Preferably, the fast / slow exhaust valve group 222 is a high vacuum L-shaped electric valve or a high vacuum straight-through electric valve in the prior art. It should be noted that the fast / slow exhaust valve group 222 needs to have at least two working states. The first working state is the fully open state, that is, when entering the fully open state, the gas is allowed to pass through at the maximum flow rate. At this time, the fast / slow exhaust valve group 222 has the least resistance and the gas flows most smoothly; the second working state is the half-open state, that is, when entering the half-open state, the gas flow rate is limited by reducing the gas flow channel area to achieve the purpose of controlling the gas pressure and speed.

[0068] Specifically, the fast / slow air extraction valve group 222 is respectively connected to the programmable logic control module 211 in the pressure control module 21 and the target cavity 23, and is used to make the fast / slow air extraction valve group 222 enter a fully open state according to the normal adjustment control signal output by the programmable logic control module 211 in the pressure control module 21 when the deviation value is greater than the preset valve switching threshold; and when the deviation value is less than the preset valve switching threshold or according to the steady-state control signal, the fast / slow air extraction valve group 222 enters a half-open state.

[0069] In an alternative embodiment, combining Figure 2b and Figure 2c The flow controller 221 further includes: a mass flow controller 2211, a first diaphragm valve 2212 and a second diaphragm valve 2213; wherein the mass flow controller 2211 is connected to the pressure control module 21, and is used to adjust the opening of the mass flow controller 2211 according to the opening adjustment amount output by the pressure control module 21; the first diaphragm valve 2212 is respectively connected to the gas source module 24 and the mass flow controller 2211, and the second diaphragm valve 2213 is respectively connected to the mass flow controller 2211 and the target cavity 23, and is used to inflate the target cavity 23 through the first diaphragm valve 2212 and the second diaphragm valve 2213 after the mass flow controller 2211 adjusts the opening, so that the actual pressure value reaches the preset target pressure value.

[0070] In another optional embodiment, the flow controller comprises only a mass flow controller, i.e., a mass flow controller (MFC). Compared to the method of providing a first diaphragm valve and a second diaphragm valve, this method does not require additional devices such as diaphragm valves, resulting in a simpler structure, lower cost, and easier implementation.

[0071] Specifically, the mass flow controller 2211 is connected to the proportional-integral-differential control module 212 in the pressure control module 21, and is used to adjust the opening of the mass flow controller 2211 according to the opening adjustment amount output by the proportional-integral-differential control module 212 in the pressure control module 21; the first diaphragm valve 2212 is connected to the gas source module 24 and the mass flow controller 2211 respectively, and the second diaphragm valve 2213 is connected to the mass flow controller 2211 and the target cavity 23 respectively, and is used to inflate the target cavity 23 through the first diaphragm valve 2212 and the second diaphragm valve 2213 after the mass flow controller 2211 adjusts the opening, so that the actual pressure value reaches the preset target pressure value.

[0072] In the present invention, the mass flow controller 2211, first diaphragm valve 2212, and second diaphragm valve 2213 are all conventional components. Those skilled in the art may select from a variety of suitable MFCs based on practical needs, and this is not a limitation herein. It should be noted that the mass flow controller 2211 is an MFC (Mass Flow Controller). Therefore, those skilled in the art may select a suitable MFC as a mass flow controller based on practical needs. The preferred range is 0-500 sccm (standard cubic centimeters per minute), with an accuracy of ±0.8% MFC.

[0073] In a specific embodiment of the present invention, Figure 2b and Figure 2c As shown, the device may also include: an air source module 24 and / or an air pump module 25; wherein the air source module 24 is connected to the flow controller 221, and is used to inflate the target cavity 23 through the flow controller 221; the air pump module 25 is connected to the fast / slow air extraction valve group 222, and is used to extract the gas in the target cavity 23 through the fast / slow air extraction valve group 222.

[0074] To ensure the stability of the pressure in the target cavity 23, the gas source module 24 preferably uses an inert gas source compatible with semiconductor manufacturing processes, such as nitrogen or argon. The gas pump module 24 preferably uses a vacuum gas pump system. Those skilled in the art can select the appropriate system based on actual needs, and this is not a limitation herein.

[0075] In an optional embodiment of the present invention, Figures 2a to 2d As shown, the device further includes: a target cavity 23, a slide rail 26, a storage module 27 and a sensing module (not shown in the figure); wherein the target cavity 23 further includes a main cavity 231 and an auxiliary cavity 232, wherein a sealing door 233 is provided between the main cavity 231 and the auxiliary cavity 232; when the sealing door 233 is opened, the main cavity 231 and the auxiliary cavity 232 are connected; when the sealing door 233 is closed, the main cavity 231 and the auxiliary cavity 232 are sealed and isolated from each other; the slide rail 26 is embedded in the inner surface of the bottom of the main cavity 231 and the auxiliary cavity 232 In the figure, the storage module 27 is slidably set on the slide rail 26, which is connected to the pressure control module 21 (such as the programmable logic control module 211), and is used to slide from the main cavity 231 to the auxiliary cavity 232 or from the auxiliary cavity 232 to the main cavity 231 along the slide rail 26 through the sealed door 233 after receiving the cavity switching control signal output by the pressure control module 21; the sensing module (not shown in the figure) is set at a preset position of the slide rail 26, and is used to control the opening or closing of the sealed door 233 when the storage module 27 reaches or leaves the preset position.

[0076] In this optional embodiment, the pressure control module 21 is also connected to the placement module 27, and is used to generate a cavity switching control signal and output it to the placement module 27 when the deviation value or the pressure difference between two adjacent preset target pressure values ​​is greater than a preset critical threshold; wherein the preset critical threshold is greater than the preset valve switching threshold.

[0077] Among them, the preset critical threshold and the type and preset position of the sensing module can be selected by those skilled in the art according to actual needs and are not limited here. However, it should be noted that the preset critical threshold is greater than the preset valve switching threshold.

[0078] Optionally, the sensing module may be a pressure sensor module, a laser sensor module, etc. Those skilled in the art may select the module according to actual needs, which will not be described in detail here.

[0079] During the use of the pressure control device of the present invention, when the preset target pressure value is updated, causing the deviation value or the pressure difference between two adjacent preset target pressure values ​​to change significantly, in order to improve the control accuracy, efficiency and response speed, those skilled in the art can set a preset critical threshold. When the deviation value or the pressure difference between two adjacent preset target pressure values ​​is greater than the preset critical threshold, the pressure control module 21 generates a cavity switching control signal, and the placement module 27 slides from the main cavity 231 to the auxiliary cavity 232 or from the auxiliary cavity 232 to the main cavity 231 under the control of the cavity switching control signal.

[0080] It should be understood that before the main cavity 231 slides toward the auxiliary cavity 232, the actual pressure value in the auxiliary cavity 232 must be equal to the updated preset target pressure value; and before the auxiliary cavity 232 slides toward the main cavity 231, the actual pressure value in the main cavity 231 must be equal to the updated preset target pressure value. This ensures control accuracy, efficiency, and response speed. Furthermore, the method for controlling the actual pressure value in the corresponding cavity after the preset target pressure value is updated is described in the pressure control method of the present invention and will not be further described here.

[0081] In another optional embodiment, a preset number of buffer cavities can be set between the main cavity and the auxiliary cavity, and corresponding sealing doors are set between the main cavity and its adjacent buffer cavity, the adjacent buffer cavity, and the buffer cavity and the auxiliary cavity, and the actual pressure value in the multiple buffer cavities should be equal to the updated preset target pressure value. This setting method is to prevent the pressure oscillation of the cavity caused by gas diffusion when the sealing door is opened, further improving the control accuracy, efficiency and response speed. In order to save space, multiple buffer cavities can also adopt the folding cavity in the prior art, which will not be repeated here.

[0082] In an alternative embodiment, Figures 2a to 2e As shown, the proportional-integral-differential control module 212 includes: a proportional unit 2121, an integral unit 2122, a differential unit 2123 and a central control unit 2124; wherein, The proportional unit 2121 is connected to the central control unit 2124 and is used to analyze and calculate the proportional coefficient using a self-tuning algorithm, and calculate the product of the proportional coefficient and the deviation value as a first adjustment item based on the proportional coefficient and the deviation value; Optionally, the self-tuning algorithm is a hybrid self-tuning algorithm, which includes: constructing a first-order inertia pure lag mathematical model including a time constant and a gain parameter using a recursive least squares method; optimizing the mathematical model using an improved particle swarm algorithm for a preset number of iterations (preferably 30 times) to obtain target parameters; and optimizing the mathematical model using the target parameters.

[0083] It should be noted that before using the target parameters to optimize the mathematical model, the target parameters of the mathematical model can also be verified. Specifically, the target parameters and historical parameters are mixed and output for verification according to a preset weight (preferably 1:9). When the root mean square error value of the verification result decreases by more than a first preset deviation value (preferably 15%) compared to the root mean square error value of the historical result, the target parameters are activated.

[0084] When using this mathematical model for analysis and calculation, a pre-trained long short-term memory network model is used to predict the trend of the actual results output by the mathematical model; when the deviation between the predicted result and the actual result exceeds a second preset deviation value (preferably 5%), the mathematical model automatically fine-tunes the target parameters.

[0085] The first-order inertia pure lag mathematical model, the improved particle swarm optimization algorithm, and the long short-term memory network model are all existing models and algorithms, and those skilled in the art may select one based on actual needs, without limitation herein. Furthermore, those skilled in the art may also adjust the preset times, preset weights, first preset deviation value, and second preset deviation value based on actual needs, without limitation herein.

[0086] The hybrid self-tuning algorithm, the optimization and verification method of the target parameters of the mathematical model, and the fine-tuning method of the target parameters of the mathematical model adopted in the embodiment of the present invention are all intended to make the results output by the proportional-integral-differential control module 212 more accurate, so that the opening adjustment amount can be calculated more accurately to achieve precise adjustment of the actual pressure value in the target cavity 23.

[0087] The integration unit 2122 is connected to the central control unit 2124 and is configured to select a preset time period as the integration time, calculate the integral of the deviation value within the preset time period, and calculate the product of the quotient of the proportional coefficient output by the central control unit 2124 and the integration time and the integral of the deviation value within the preset time period as the second adjustment item; In the present invention, the preset time period can be selected by those skilled in the art according to actual needs and is not limited here.

[0088] Differentiation unit 2123 is connected to central control unit 2124 and is configured to analyze and calculate the rate of change of the deviation values ​​between adjacent moments based on the deviation value output by central control unit 2124; analyze and calculate the differential time using a self-tuning algorithm; and, based on the rate of change, the differential time, and the proportional coefficient output by central control unit 2124, calculate the product of the rate of change, the differential time, and the proportional coefficient as a third adjustment term. The central control unit 2124 is respectively connected to the programmable logic control module 211 and the pressure regulation module 22, and is used to receive the deviation value, the proportional coefficient, the first adjustment item, the second adjustment item and the third adjustment item; when the deviation value is less than the preset valve switching threshold, the target flow value is analyzed and calculated according to the flow calculation signal; the first adjustment item, the second adjustment item and the third adjustment item are added together to obtain the adjustment coefficient; and according to the target flow value and the adjustment coefficient, the opening adjustment amount is generated and output to the pressure regulation module 22.

[0089] In this optional embodiment, the various adjustment items of the proportional-integral-differential control module 212 are obtained using a self-tuning algorithm or the like, which not only improves the debugging and production efficiency, but also significantly improves the control accuracy of the opening of the mass flow controller 2211 (MFC) in the flow controller 221 in the pressure regulating module 22, and also significantly improves the adaptability of the pressure control device of the present invention.

[0090] It should be noted that Figures 2a to 2e The pressure regulating device shown is Figure 1a and Figure 1b The pressure control method shown in FIG. 1 corresponds to the pressure control method shown in FIG. 1 , and its description can refer to the description of the present invention. Figure 1a and Figure 1b The description of the pressure control method shown will not be repeated here.

[0091] In the present invention, when the proportional-integral-differential control module 212 adopts a bipolar PID control system and the flow controller adopts an MFC, the following beneficial effects are achieved: (1) Dual-mode control mechanism: The PID control system combines the fine adjustment mode and the fast pumping mode. When the deviation value / preset target pressure value is less than or equal to 3%, PID fine adjustment is applicable. When the deviation value is greater than 5% or the actual pressure value is greater than the preset valve switching threshold, the integral separation design of the integral term is disabled and the fast pumping mode is triggered at the same time. The fast pumping mode has a higher priority than the PID fine adjustment mode and has a hysteresis recovery mechanism (exit when the deviation value is less than 2%). The advantages are as follows: ① Improved dynamic stability: reduced pressure overshoot during mode switching; ② Safety redundancy design: dual-mode independent power supply circuit; Energy efficiency optimization: compared with the traditional single-mode system, the energy saving effect is significantly improved (through intelligent mode switching).

[0092] (2) PID precise adjustment: Abandoning the cumbersome traditional method of manually adjusting the valve size, the bipolar PID control system is used to automatically adjust the MFC opening to achieve automatic control of the target cavity pressure, greatly reducing manual intervention, reducing human errors, improving work efficiency and production continuity, and making operation simpler and more efficient. The PID algorithm is used to precisely control the MFC opening. Through the coordinated work of the proportional, integral, and differential links, the inflation volume is adjusted quickly and accurately according to the actual pressure value and the preset target pressure value. The proportional link quickly responds to pressure deviations, the integral link eliminates steady-state errors, and the differential link predicts pressure change trends to prevent overshoot, achieving high-precision control of the target cavity pressure and effectively reducing cavity pressure fluctuations.

[0093] (3) Dynamic adaptability: The system can flexibly meet various degas chamber pressure control requirements by adjusting the parameters of the PID control system according to different working conditions and process requirements. Whether in different production batches or facing different working environments, it can stably maintain the chamber pressure at a fixed value, showing strong adaptability and versatility.

[0094] (4) Establish a collaborative working mechanism for the inflation / exhaust system.

[0095] The pressure control device provided by the present invention comprises a pressure acquisition module connected to a target cavity, configured to obtain the actual pressure value of the target cavity according to a preset frequency and output it to a pressure control module; a pressure control module connected to a pressure acquisition module, configured to compare each actual pressure value with a preset target pressure value, generate a corresponding comparison result, and generate a corresponding control signal based on the comparison result or the comparison result and a preset valve switching threshold; and a pressure regulation module connected to the pressure control module and the target cavity, respectively, configured to adjust the actual pressure value of the target cavity to the target pressure value according to the control signal. The pressure control device of the present invention can automatically and accurately adjust the actual pressure value of the target cavity without manual adjustment, thereby improving control accuracy and efficiency.

[0096] As a third aspect of the present invention, a semiconductor process equipment is provided, comprising the pressure control device of the present invention. Those skilled in the art may select the semiconductor process equipment to which the pressure control device of the present invention is to be applied based on actual needs, and this is not limited herein.

[0097] Those skilled in the art will appreciate that all or part of the processes in the above-mentioned embodiment methods can be implemented by instructing the relevant hardware through a computer program. Accordingly, the computer program can be stored in a non-volatile computer-readable storage medium, and when the computer program is executed, it can implement the method of any of the above-mentioned embodiments. Among them, any reference to memory, storage, database or other media used in the embodiments provided in this application may include non-volatile and / or volatile memory. Non-volatile memory may include read-only memory (ROM), programmable ROM (PROM), electrically programmable ROM (EPROM), electrically erasable programmable ROM (EEPROM) or flash memory. Volatile memory may include random access memory (RAM) or external cache memory. By way of illustration and not limitation, RAM is available in many forms, such as static RAM (SRAM), dynamic RAM (DRAM), synchronous DRAM (SDRAM), double data rate SDRAM (DDRSDRAM), enhanced SDRAM (ESDRAM), Synchronous Link DRAM (SLDRAM), Rambus direct RAM (RDRAM), direct memory bus dynamic RAM (DRDRAM), and memory bus dynamic RAM (RDRAM), etc.

[0098] The above are only specific embodiments of the present invention, but the scope of protection of the present invention is not limited thereto. Those skilled in the art should understand that the present invention includes but is not limited to the contents described in the drawings and the above specific embodiments. Any modifications that do not deviate from the functional and structural principles of the present invention are intended to be included within the scope of the claims.

Claims

1. A pressure control method, characterized in that: include: According to the preset frequency, the actual pressure value of the target cavity is obtained; comparing each of the actual pressure values ​​with the preset target pressure value; If the actual pressure value is equal to the preset target pressure value, the current opening adjustment amount of the flow controller is kept unchanged; If the actual pressure value is not equal to the preset target pressure value, perform the following steps: Calculating a deviation between the actual pressure value and the preset target pressure value according to the actual pressure value and the preset target pressure value; Determining an opening adjustment amount of the flow controller according to the deviation value; Based on the opening adjustment amount, the actual pressure value is adjusted to reach the preset target pressure value.

2. The pressure control method according to claim 1, characterized in that: Determining the opening adjustment amount of the flow controller according to the deviation value includes: comparing the deviation value with a preset valve switching threshold; If the deviation value is greater than the preset valve switching threshold, the fast / slow pumping valve group is controlled to enter a fully open state, and the current opening adjustment amount of the flow controller is kept unchanged; If the deviation value is less than the preset valve switching threshold, the opening adjustment amount of the flow controller is analyzed and calculated based on the deviation value.

3. The pressure control method according to claim 2, characterized in that: The step of analyzing and calculating the opening adjustment amount of the flow controller according to the deviation value includes: Using a self-tuning algorithm, analyzing and calculating a proportional coefficient, and calculating a product of the proportional coefficient and the deviation value as a first adjustment item; selecting a preset time period as an integration time, calculating the integral of the deviation value within the preset time period, and calculating the product of the quotient of the proportional coefficient and the integration time and the integral of the deviation value within the preset time period as a second adjustment item; Analyzing and calculating the rate of change of the deviation value at adjacent moments, and using the self-tuning algorithm to analyze and calculate the differential time, and calculating the product of the rate of change, the differential time, and the proportional coefficient as a third adjustment item; Calculating the sum of the first adjustment item, the second adjustment item, and the third adjustment item as an adjustment coefficient, and analyzing and calculating a target flow value based on the deviation value; The opening adjustment amount of the flow controller is analyzed and calculated according to the adjustment coefficient and the target flow value.

4. The pressure control method according to claim 3, characterized in that: The self-tuning algorithm is a hybrid self-tuning algorithm, including: A first-order inertial pure lag mathematical model including time constant and gain parameters is constructed using the recursive least square method. The improved particle swarm algorithm is used to optimize the mathematical model for a preset number of iterations to obtain target parameters; The mathematical model is optimized using the target parameters.

5. The pressure control method according to claim 4, characterized in that: Before optimizing the mathematical model using the target parameters, the method further includes: The target parameter and the historical parameter are mixed and output for verification according to preset weights. When the root mean square error value of the verification result decreases by more than a first preset deviation value compared with the root mean square error value of the historical result, the target parameter is enabled.

6. The pressure control method according to claim 4 or 5, characterized in that: The method further comprises: When using the mathematical model for analysis and calculation, using a pre-trained long short-term memory network model to predict the trend of the actual results output by the mathematical model; When the deviation between the predicted result and the actual result exceeds a second preset deviation value, the mathematical model automatically fine-tunes the target parameter.

7. The pressure control method according to claim 1, characterized in that: The method further comprises: Updating the preset target pressure value to obtain an updated preset target pressure value; Calculating a deviation between the actual pressure value and the updated preset target pressure value or a pressure difference between the preset target pressure value before the update and the preset target pressure value after the update; Determining whether the deviation value or the pressure difference value is greater than a preset critical threshold; If the deviation value or the pressure difference value is greater than the preset critical threshold, switching of the target cavity is performed, wherein the preset critical threshold is greater than the preset valve switching threshold.

8. A pressure regulating device, characterized in that: include: Pressure acquisition module, pressure control module and pressure regulation module; among them, The pressure acquisition module is connected to the target cavity and is used to obtain the actual pressure value of the target cavity according to a preset frequency and output it to the pressure control module; The pressure control module is connected to the pressure acquisition module and is used to compare each of the actual pressure values ​​with a preset target pressure value, generate a corresponding comparison result, and generate a corresponding control signal based on the comparison result or the comparison result and a preset valve switching threshold; The pressure regulating module is connected to the pressure control module and the target cavity respectively, and is used to adjust the actual pressure value of the target cavity to reach the target pressure value according to the control signal.

9. The pressure regulating device according to claim 8, characterized in that: The pressure control module includes: a programmable logic control module, a proportional-integral-differential control module and an industrial computer module; wherein, The programmable logic control module is connected to the pressure acquisition module and the pressure regulation module respectively, and is used to compare each actual pressure value with the preset target pressure value, and if the comparison result shows that the two are equal, generate a steady-state control signal; if the comparison result shows that the two are not equal, calculate the deviation between the actual pressure value and the preset target pressure value, and compare the deviation with the preset valve switching threshold to generate a corresponding normal regulation control signal or flow calculation signal; The proportional-integral-differential control module is connected to the programmable logic control module and the pressure regulating module respectively, and is used to analyze and calculate the target flow value according to the flow calculation signal when the deviation value is less than the preset valve switching threshold, and generate an opening adjustment amount according to the target flow value and output it to the pressure regulating module; The industrial computer module is connected to the programmable logic control module, and is used to set the preset target pressure value and the preset valve switching threshold, and to visually display preset option information.

10. The pressure regulating device according to claim 8, characterized in that: The pressure regulating module includes: a flow controller and a fast / slow air pumping valve group; wherein, The flow controller is connected to the pressure control module and the target cavity respectively, and is used to adjust the actual pressure value of the target cavity to the target pressure value according to the opening adjustment amount output by the pressure control module; The fast / slow air pumping valve group is respectively connected to the pressure control module and the target cavity, and is used to enable the fast / slow air pumping valve group to enter a fully open state when the deviation value is greater than the preset valve switching threshold; and to enable the fast / slow air pumping valve group to enter a half-open state when the deviation value is less than the preset valve switching threshold or the actual pressure value is equal to the preset target pressure value.

11. The pressure regulating device according to claim 10, characterized in that: The flow controller includes: a mass flow controller, a first diaphragm valve and a second diaphragm valve; wherein, The mass flow controller is connected to the pressure control module and is used to adjust the opening according to the opening adjustment amount output by the pressure control module; The first diaphragm valve is connected to the gas source module and the mass flow controller respectively, and the second diaphragm valve is connected to the mass flow controller and the target cavity respectively, and is used to inflate the target cavity through the first diaphragm valve and the second diaphragm valve after the mass flow controller adjusts the opening, so that the actual pressure value reaches the preset target pressure value.

12. The pressure regulating device according to claim 10 or 11, characterized in that: The device further comprises: an air source module and / or an air pump module; wherein, The gas source module is connected to the flow controller and is used to inflate the target cavity through the flow controller; The air pump module is connected to the fast / slow air pumping valve group and is used to pump out the gas in the target cavity through the fast / slow air pumping valve group.

13. The pressure regulating device according to claim 8, characterized in that: The device further comprises: a target cavity, a slide rail, a storage module and a sensing module; wherein, The target cavity includes a main cavity and an auxiliary cavity, wherein a sealing door is provided between the main cavity and the auxiliary cavity; when the sealing door is opened, the main cavity and the auxiliary cavity are communicated; when the sealing door is closed, the main cavity and the auxiliary cavity are sealed and isolated from each other; The slide rail is embedded in the bottom inner surface of the main cavity and the auxiliary cavity; The storage module is slidably disposed on the slide rail and is connected to the pressure control module. After receiving a cavity switching control signal generated by the pressure control module, the storage module is configured to slide along the slide rail through the sealing door from the main cavity to the auxiliary cavity or from the auxiliary cavity to the main cavity. The sensing module is arranged on the slide rail, and is used to open or close the sealing door accordingly when the storage module reaches or leaves a preset position.

14. The pressure regulating device according to claim 13, characterized in that: The pressure control module is connected to the placement module and is configured to generate the cavity switching control signal and output it to the placement module when the deviation value or the pressure difference between two adjacent preset target pressure values ​​is greater than a preset critical threshold; wherein the preset critical threshold is greater than the preset valve switching threshold.

15. The pressure regulating device according to claim 9, characterized in that: The proportional-integral-differential control module includes: a proportional unit, a differential unit, an integral unit and a central control unit; wherein, The proportional unit is connected to the central control unit and is used to analyze and calculate the proportional coefficient using a self-tuning algorithm, and calculate the product of the proportional coefficient and the deviation value as a first adjustment item based on the proportional coefficient and the deviation value; The differential unit is connected to the central control unit and is used to select a preset time period as the integral time, calculate the integral of the deviation value within the preset time period, and calculate the product of the quotient of the proportional coefficient and the integral time and the integral of the deviation value within the preset time period as the second adjustment item. The integration unit is connected to the central control unit and is configured to analyze and calculate the rate of change of the deviation value at adjacent moments based on the deviation value; analyze and calculate the differential time using a self-tuning algorithm; and calculate the product of the rate of change, the differential time, and the proportional coefficient as a third adjustment item based on the rate of change, the differential time, and the proportional coefficient. The central control unit is respectively connected to the programmable logic control module and the pressure regulation module, and is used to receive the deviation value, the proportional coefficient, the first adjustment item, the second adjustment item and the third adjustment item; when the deviation value is less than the preset valve switching threshold, the target flow value is analyzed and calculated according to the flow calculation signal; the first adjustment item, the second adjustment item and the third adjustment item are added to obtain the adjustment coefficient; and the opening adjustment amount is generated according to the target flow value and the adjustment coefficient, and outputted to the pressure regulation module.

16. A semiconductor process equipment, characterized in that: The pressure regulating device comprises the pressure regulating device according to any one of claims 8 to 15.

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