Display panel and display device

Abstract

The application discloses a display panel and a display device. The display panel comprises a first area and a second area. The light transmittance of the first area is less than that of the second area. The display panel further comprises a substrate, an isolation structure and a light-emitting device. The isolation structure is arranged on one side of the substrate. The isolation structure comprises a first isolation structure in the first area and a plurality of structure groups in the second area. The first isolation structure forms an isolation opening. Each structure group comprises a plurality of second isolation structures. The gaps between at least some adjacent second isolation structures in one of the adjacent structure groups are arranged in a staggered manner with the gaps between at least some adjacent second isolation structures in the other structure group. At least part of the structure of the light-emitting device is arranged in the isolation opening. The display panel provided by the application aims to improve the yield of the display panel.

Description

Technical Field

[0001] This application belongs to the field of display technology, and in particular relates to a display panel and display device. Background Technology

[0002] Organic light-emitting diodes (OLEDs) and flat panel displays based on light-emitting diodes (LEDs) are widely used in various consumer electronics products such as mobile phones, televisions, laptops, and desktop computers due to their advantages such as high image quality, energy saving, thin body, and wide range of applications, becoming the mainstream of display devices.

[0003] In traditional display panel manufacturing, a fine metal mask (FMM) is typically used to pattern the light-emitting pixels. FMM technology is mature and has extensive mass production experience. However, FMM technology also suffers from limitations in precision, high development costs, and long development cycles. Fine metal maskless technology eliminates the limitations of traditional OLED processes on display size, resolution, and other screen performance characteristics, offering advantages such as high performance, full-size display, and agile delivery. Patents CN118251982A, CN116648095A, CN117062489A, CN118742138A, CN118678783A, CN118660598A, CN118675450A, CN118824188A, and CN118781966A describe relevant aspects of fine metal maskless technology and are provided for reference.

[0004] However, the current yield rate of OLED display products needs to be improved. Summary of the Invention

[0005] This application provides a display panel and a display device, which aim to improve the manufacturing yield of the display panel.

[0006] An embodiment of the first aspect of this application provides a display panel. The display panel includes a first region and a second region, wherein the light transmittance of the first region is less than that of the second region. The display panel further includes a substrate, an isolation structure, and a light-emitting device. The isolation structure is disposed on one side of the substrate and includes a first isolation structure located in the first region and a plurality of structural groups located in the second region. The first isolation structure encloses an isolation opening. The structural groups include a plurality of second isolation structures, and the gaps between at least a portion of adjacent second isolation structures in one group are offset from the gaps between at least a portion of adjacent second isolation structures in another group. At least a portion of the light-emitting device is located within the isolation opening.

[0007] According to an embodiment of the first aspect of this application, the structure group includes a plurality of second isolation structures spaced apart along a first direction, the structure group is arranged sequentially along a second direction, and at least some of the structure groups have a different distance between the second isolation structure near the edge of the second region along the first direction and the edge of the second region along the first direction, and the first direction, the second direction and the thickness direction intersect each other.

[0008] According to an embodiment of the first aspect of this application, the structure group includes a plurality of first structure groups and a plurality of second structure groups, which are alternately arranged along a second direction. The distance between the second isolation structure near the edge of the second region along the first direction in the first structure group and the edge of the second region along the first direction is different from the distance between the second isolation structure near the edge of the second region along the first direction in the second structure group and the edge of the second region along the first direction.

[0009] According to an embodiment of the first aspect of this application, the second isolation structure is formed by extending the orthographic projection shape of the substrate along the first direction, and the dimension of the second isolation structure in one of the first structure group and the second structure group along the first direction is larger than the gap dimension of two adjacent second isolation structures in the other along the first direction.

[0010] According to an embodiment of the first aspect of this application, the dimensions of the second isolation structure in the first structure group along the first direction are the same as the dimensions of the second isolation structure in the second structure group along the first direction.

[0011] According to an embodiment of the first aspect of this application, the edge of the second region includes at least one of a straight edge and an arcuate edge.

[0012] According to an embodiment of the first aspect of this application, the shape of the second region includes one or more combinations of rectangle, square, circle and runway shape.

[0013] According to an embodiment of the first aspect of this application, the edge of the second region includes an arc-shaped edge, the structure group includes a third structure group, and a plurality of second isolation structures in the third structure group are arranged sequentially along the extension direction of the arc-shaped edge.

[0014] According to the first aspect of this application, the virtual connection lines of the centroids of multiple isolated structures within the third structural group are set to match the shape of the arc-shaped edge.

[0015] According to an embodiment of the first aspect of this application, the edge of the second region further includes a straight edge, and the structure group further includes a fourth structure group, wherein a plurality of second isolation structures in the fourth structure group are sequentially arranged along the extending direction of the straight edge. The gap size between at least some adjacent second isolation structures in the third structure group is different from the gap size between at least some adjacent second isolation structures in the fourth structure group.

[0016] According to an embodiment of the first aspect of this application, the gap size between at least some adjacent second isolation structures in the third structural group is smaller than the gap size between at least some adjacent second isolation structures in the fourth structural group.

[0017] According to an embodiment of the first aspect of this application, the number of third structural groups includes multiple groups, which are arranged sequentially along a direction away from the arcuate edge. The gap size between adjacent second isolation structures in the third structural group closer to the arcuate edge is larger than the gap size between adjacent second isolation structures in the third structural group farther from the arcuate edge.

[0018] According to an embodiment of the first aspect of this application, the extension dimension of the second isolation structure in the third structure group near the arcuate edge of the plurality of third structure groups is greater than the extension dimension of the second isolation structure in the third structure group away from the arcuate edge of the plurality of third structure groups.

[0019] According to an embodiment of the first aspect of this application, the gap between adjacent second isolation structures in one of the multiple structural groups is connected to the gap between adjacent second isolation structures in the other.

[0020] According to the first aspect of the present application, the first isolation structure and the second isolation structure are arranged at intervals.

[0021] According to an embodiment of the first aspect of this application, the isolation structure includes a first isolation portion and a second isolation portion located on the side of the first isolation portion away from the substrate, wherein the second isolation portion protrudes from the first isolation portion toward the isolation opening.

[0022] According to an embodiment of the first aspect of this application, the isolation structure further includes a conductive portion located on the side of the first isolation portion facing the substrate, the conductive portion protruding from the first isolation portion toward the isolation opening.

[0023] According to an embodiment of the first aspect of this application, in the direction away from the substrate, the light-emitting device includes a first electrode, a light-emitting unit, and a second electrode stacked sequentially, the material of the isolation structure includes a conductive material, and the second electrode is connected to the isolation structure.

[0024] According to an embodiment of the first aspect of this application, the display panel further includes a pixel definition layer, which is located on one side of the substrate. The pixel definition layer includes a pixel limiting portion that surrounds a pixel opening formed in communication with an isolation opening.

[0025] According to an embodiment of the first aspect of this application, the second region includes a first opening, and a second isolation structure surrounds and forms the first opening.

[0026] An embodiment of the first aspect of this application also provides a display panel. The display panel includes a first region and a second region, the light transmittance of the first region being less than that of the second region. The display panel further includes: a substrate; an isolation structure disposed on one side of the substrate, the isolation structure including a first isolation structure located in the first region and a plurality of structural groups located in the second region, the first isolation structure enclosing an isolation opening, the structural groups including a plurality of second isolation structures, the gap between at least a portion of adjacent second isolation structures in one of adjacent structural groups being misaligned with the gap between at least a portion of adjacent second isolation structures in another; a pixel definition layer located on one side of the substrate, the pixel definition layer including a pixel defining portion enclosing a pixel opening communicating with the isolation opening; and a light-emitting device, at least a portion of the structure of the light-emitting device being located within the isolation opening.

[0027] According to an embodiment of the first aspect of this application, the structure group includes a plurality of second isolation structures spaced apart along a first direction, the structure group is arranged sequentially along a second direction, and at least some of the structure groups have a different distance between the second isolation structure near the edge of the second region along the first direction and the edge of the second region along the first direction, and the first direction, the second direction and the thickness direction intersect each other.

[0028] According to an embodiment of the first aspect of this application, the structure group includes a plurality of first structure groups and a plurality of second structure groups, which are alternately arranged along a second direction. The distance between the second isolation structure near the edge of the second region along the first direction in the first structure group and the edge of the second region along the first direction is different from the distance between the second isolation structure near the edge of the second region along the first direction in the second structure group and the edge of the second region along the first direction.

[0029] An embodiment of the second aspect of this application provides a display device, which includes a display panel of any of the above embodiments.

[0030] In a display panel and display device provided in this application embodiment, a second isolation structure is provided in the second region to improve the uniformity of the pattern density in the first and second regions, thereby improving the display uniformity of each region of the display screen. During the fabrication process, a photolithography process is employed. The photolithography material needs to be uniformly placed within a preset region. By staggering the gaps between adjacent second isolation structures in adjacent structure groups, the photolithography material can uniformly fill the second region, improving the uniformity of the photolithography material thickness in the first and second regions. This reduces the possibility of abnormalities such as photolithography material explosion in the second region, improving the yield of subsequent structures and thus increasing the overall fabrication yield of the display panel. Attached Figure Description

[0031] To more clearly illustrate the technical solutions of the embodiments of this application, the drawings used in the embodiments of this application will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0032] Figure 1 This is a schematic diagram of the structure of a display panel according to an embodiment of this application;

[0033] Figure 2 This is an enlarged structural diagram of an isolation structure in a second region of a display panel according to an embodiment of this application;

[0034] Figure 3 This is a partial cross-sectional schematic diagram of a second region in a display panel according to an embodiment of this application;

[0035] Figure 4 This is a partial cross-sectional schematic diagram of a first region in a display panel according to an embodiment of this application;

[0036] Figure 5 This is an enlarged structural diagram of the isolation structure in the second area of ​​a display panel according to another embodiment of this application;

[0037] Figure 6 This is an enlarged structural diagram of the isolation structure in the second area of ​​a display panel according to another embodiment of this application;

[0038] Figure 7 This is a partial cross-sectional schematic diagram of the second region in another embodiment of the present application display panel;

[0039] Figure 8 This is a partial cross-sectional schematic diagram of the first region in another embodiment of the present application display panel.

[0040] Explanation of reference numerals in the attached figures:

[0041] AA, first region; NA, second region; 10, substrate;

[0042] 20. Pixel definition layer; 21. Pixel limiting part; 22. Pixel opening;

[0043] 30. Isolation structure; 30a. Isolation opening; 30b. First opening; 31. First isolation structure; 32. Second isolation structure; G. Structure group; G1. First structure group; G2. Second structure group; G3. Third structure group; G4. Fourth structure group; 33. First isolation part; 34. Second isolation part; 35. Conductive part;

[0044] 40. Light-emitting device; 41. First electrode; 42. Light-emitting unit; 43. Second electrode; L, virtual connection; X, first direction; Y, second direction; Z, thickness direction. Detailed Implementation

[0045] The features and exemplary embodiments of various aspects of this application will now be described in detail. To make the objectives, technical solutions, and advantages of this application clearer, the application will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only configured to explain this application and are not configured to limit this application. For those skilled in the art, this application can be implemented without some of these specific details. The following description of the embodiments is merely to provide a better understanding of this application by illustrating examples of this application.

[0046] It should be noted that, in this document, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising..." does not exclude the presence of additional identical elements in the process, method, article, or apparatus that includes the element.

[0047] It should be understood that when describing the structure of a component, when referring to a layer or region as being "above" or "on top of" another layer or region, it can mean that it is directly above the other layer or region, or that it contains other layers or regions between it and the other layer or region. Furthermore, if the component is flipped over, that layer or region will be located "below" or "under" the other layer or region.

[0048] This application provides a display panel and a display device. The following description, in conjunction with the accompanying drawings, will illustrate various embodiments of the display panel and the display device.

[0049] Figure 1 This is a schematic diagram of the structure of a display panel according to an embodiment of this application. Figure 2 This is an enlarged structural diagram of the isolation structure in the second region of a display panel according to an embodiment of this application. Figure 3 This is a partial cross-sectional schematic diagram of a second region in a display panel according to an embodiment of this application. Figure 4This is a partial cross-sectional schematic diagram of a first region in a display panel according to an embodiment of this application.

[0050] In the figure, the X direction is the first direction X, the Y direction is the second direction Y, and the Z direction is the thickness direction Z of the display panel. The first direction X and the second direction Y intersect the thickness direction Z of the display panel in pairs. Optionally, the first direction X and the second direction Y can be perpendicular to the thickness direction Z of the display panel in pairs.

[0051] like Figures 1 to 4 As shown, an embodiment of the first aspect of this application provides a display panel. The display panel includes a first region AA and a second region NA. The light transmittance of the first region AA is less than that of the second region NA. The display panel also includes a substrate 10, an isolation structure 30, and a light-emitting device 40. The isolation structure 30 is disposed on one side of the substrate 10. The isolation structure 30 includes a first isolation structure 31 located in the first region AA and a plurality of structure groups G located in the second region NA. The first isolation structure 31 encloses an isolation opening 30a. The structure group G includes a plurality of second isolation structures 32. The gap between at least a portion of adjacent second isolation structures 32 in one adjacent structure group G is offset from the gap between at least a portion of adjacent second isolation structures 32 in another adjacent structure group G. At least a portion of the structure of the light-emitting device 40 is located within the isolation opening 30a.

[0052] The display panel includes a first region AA and a second region NA. The first region AA is the main area of ​​the display panel used to achieve the display effect, and the second region NA is the main area of ​​the display panel used to achieve the light-sensing effect. In the subsequently formed display device, the display device may include light-sensing elements such as an under-display camera and a fingerprint sensor. The light-sensing elements may be disposed on the backlight side of the display panel and correspondingly located at the second region NA. The shape and specific positional relationship of the first region AA and the second region NA are not limited in this embodiment. Optionally, the first region AA may surround the second region NA.

[0053] In a display panel provided in this application embodiment, the substrate 10 may include a substrate and other film layers sequentially stacked on the substrate. The term "stacked" here refers to the other film layers being sequentially stacked along the substrate thickness direction Z. The thickness direction Z of the other film layers located on one side of the substrate, as well as the thickness direction Z of the isolation structure 30 and the light-emitting device 40, is generally consistent with the thickness direction Z of the substrate 10 itself. Therefore, for ease of description, the thickness direction Z of the substrate 10, the thickness direction Z of the display panel, and the thickness direction Z of other film layers mentioned later in this application embodiment are all shown in the same direction. Optionally, the substrate may be a rigid substrate, such as a glass substrate. Alternatively, the substrate may be a flexible substrate, such as an organic material including polyimide. Optionally, the substrate 10 may also include a pixel circuit, which can provide a driving current to the light-emitting device 40, so that the light-emitting device 40 emits light in response to the driving current.

[0054] The light-emitting device 40 is a structure in the display panel that provides the light-emitting function. The light-emitting device 40 includes, but is not limited to, a red light-emitting device 40 for emitting red light, a green light-emitting device 40 for emitting green light, and a blue light-emitting device 40 for emitting blue light.

[0055] An isolation structure 30 is disposed on one side of the substrate 10, and a first isolation structure 31 surrounds and forms an isolation opening 30a. At least a portion of the structure of the light-emitting device 40 is located within the isolation opening 30a. The first isolation structure 31 can be used to participate in dividing the sub-pixels of the display panel.

[0056] Optionally, the first isolation structure 31 may be in the form of a grid, and the hollow area in the grid-shaped first isolation structure 31 may form an isolation opening 30a to facilitate the division of sub-pixels of the display panel by the isolation structure 30.

[0057] Multiple structural groups G within the second region NA can be arranged in a single direction, or in multiple directions. Alternatively, each structural group G can be arranged around the centroid of the second region NA. Of course, any position within the second region NA can also be used as the center of arrangement.

[0058] For example, when multiple structure groups G are arranged in a single direction, adjacent structure groups G are two structure groups G that are adjacent along the single direction. When multiple structure groups G are arranged around the centroid of the second region NA, adjacent structure groups G are two structure groups G that are adjacent in the direction from the centroid to the edge of the second region NA.

[0059] Optionally, when multiple structure groups G are arranged in a single direction, the multiple second isolation structures 32 within structure group G can be arranged in the intersecting directions of the arrangement direction of structure group G. When multiple structure groups G are arranged around the centroid of the second region NA, the line connecting the centroids of the multiple second isolation structures 32 within structure group G can form an arc or circle centered on the centroid of the second region NA.

[0060] The gaps between at least some adjacent second isolation structures 32 in one of the adjacent structural groups G are staggered with the gaps between at least some adjacent second isolation structures 32 in the other. This can be understood as follows: the two adjacent structural groups G are a first structural group G and a second structural group G, respectively. The gap between two adjacent second isolation structures 32 in the first structural group G can be called the first gap, and the gap between two adjacent second isolation structures 32 in the second structural group G can be called the second gap. The first gap and the second gap are staggered. Here, "staggered" means that the first gap and the second gap are offset from each other along the arrangement direction of the first structural group G and the second structural group G. In the subsequent fabrication process, photolithography is used. The photolithography material is placed in the first region AA and the second region NA through liquid flow. The first gap and the second gap are staggered, which can generate more eddies and turbulence when the photolithography material flows in the second region NA. This increases the fluidity of the photolithography material and promotes more uniform coverage of the photolithography material in the second region NA. This reduces the phenomenon of bubble formation in the second region NA, thereby reducing the possibility of abnormal phenomena such as delamination during the curing process and improving the yield of photolithography.

[0061] In some embodiments, the gaps between any adjacent second isolation structures 32 within one of the adjacent structure groups G are misaligned with the gaps between any adjacent second isolation structures 32 within the other. In other embodiments, the gaps between a subset of adjacent second isolation structures 32 within one of the adjacent structure groups G are misaligned with the gaps between any adjacent second isolation structures 32 within the other.

[0062] In a display panel provided in this application embodiment, a second isolation structure 32 is provided in the second region NA, which can improve the uniformity of pattern density in the first region AA and the second region NA, thereby improving the display uniformity of each region of the display screen. During the fabrication process, a photolithography process is employed. The photolithography material needs to be uniformly placed within a preset area. By staggering the gaps between adjacent second isolation structures 32 in adjacent structure groups G, the photolithography material can uniformly fill the second region NA, improving the uniformity of the photolithography material thickness in the first region AA and the second region NA. This reduces the possibility of abnormalities such as photolithography material explosion in the second region NA, improving the yield of subsequent structures and thus increasing the overall fabrication yield of the display panel.

[0063] like Figures 1 to 4 As shown, in some optional embodiments, the structure group G includes a plurality of second isolation structures 32 spaced apart along the first direction X. The structure group G is arranged sequentially along the second direction Y. At least some of the structure groups G have different distances between the second isolation structures 32 near the edge of the second region NA along the first direction X and the edge of the second region NA along the first direction X. The first direction X, the second direction Y and the thickness direction Z intersect each other.

[0064] Multiple second isolation structures 32 in structure group G are spaced apart along the first direction X, and structure group G is arranged sequentially along the second direction Y, such that multiple second isolation structures 32 are arranged sequentially along the first direction X, and multiple second isolation structures 32 are arranged alternately along the second direction Y.

[0065] For example, a first structure group G, a second structure group G, a third structure group G, a fourth structure group G, ..., an Nth structure group G are arranged sequentially along the second direction Y. The distance between the second isolation structure 32 in the i-th structure group G that is closest to the edge of the second region NA along the first direction X and the edge of the second region NA along the first direction X is the i-th distance. The distance between the second isolation structure 32 in the (i+1)-th structure group G that is closest to the edge of the second region NA along the first direction X and the edge of the second region NA along the first direction X is the (i+1)-th distance. The i-th distance and the (i+1)-th distance are different. Optionally, the i-th distance can be greater than or less than the (i+1)-th distance. Here, "the second isolation structure 32 in the structure group G that is closest to the edge of the second region NA along the first direction X" can be understood as two second isolation structures 32 at each end of the structure group G along the first direction X. One of the two opposite edges of the second region NA along the first direction X is closest to one of these two second isolation structures 32 and farthest from the other.

[0066] Optionally, the distance between the second isolation structure 32 in the (i+2)th structure group G, which is close to the edge of the second region NA along the first direction X, and the edge of the second region NA along the first direction X is the (i+2)th distance. The absolute value of the difference between the ith distance and the (i+1)th distance is equal to the absolute value of the difference between the (i+1)th distance and the (i+2)th distance. Of course, they can also be different. Optionally, the ith distance, the (i+1)th distance, and the (i+2)th distance can also gradually increase or gradually decrease.

[0067] In some embodiments, the distances between the second isolation structure 32 near the edge of the second region NA along the first direction X within a plurality of structure groups G are all different. In other embodiments, the distances between the second isolation structure 32 near the edge of the second region NA along the first direction X within a subset of the plurality of structure groups G are all different.

[0068] The embodiments of this application, through the above-described settings, facilitate the increase of different arrangement methods for structural groups G, improve the display uniformity of the second region NA and the first region AA, enhance the display effect, and simultaneously increase turbulence and disturbance effects, thereby improving the yield of subsequent fabrication processes.

[0069] like Figures 1 to 4 As shown, in some optional embodiments, the structure group G includes a plurality of first structure groups G1 and a plurality of second structure groups G2, which are alternately arranged along the second direction Y. The distance between the second isolation structure 32 in the first structure group G1 near the edge of the second region NA along the first direction X and the edge of the second region NA along the first direction X is different from the distance between the second isolation structure 32 in the second structure group G2 near the edge of the second region NA along the first direction X and the edge of the second region NA along the first direction X.

[0070] For example, the multiple first structure groups G1 are the first first structure group G1, the second first structure group G1, the third first structure group G1, ..., the Nth first structure group G1. The multiple second structure groups G2 are the first second structure group G2, the second second structure group G2, the third second structure group G2, ..., the Nth second structure group G2. Along a single direction, they are sequentially the first first structure group G1, the first second structure group G2, the second first structure group G1, the second second structure group G2, ..., the Nth first structure group G1, and the Nth second structure group G2.

[0071] The distance between the second isolation structure 32, located near the edge of the second region NA along the first direction X within the first structure group G1, and the edge of the second region NA along the first direction X within the second structure group G2, is a first distance. The distance between the second isolation structure 32, located near the edge of the second region NA along the first direction X within the second structure group G2, and the edge of the second region NA along the first direction X is a second distance. The first distance and the second distance are different. Optionally, the first distance can be greater than or less than the second distance.

[0072] Along the second direction Y, the first distance and the second distance are alternately set so that multiple second isolation structures 32 close to the edge of the second region NA along the first direction X together form a sawtooth shape.

[0073] The embodiments of this application, through the above-described settings, make the pattern near the edge of the second region NA along the first direction X regular, thereby improving the uniformity of light, improving the light-sensing accuracy of the photosensitive device in the display device, and improving the overall performance of the display panel.

[0074] like Figures 1 to 4 As shown, in some optional embodiments, the second isolation structure 32 extends in the orthographic projection shape of the substrate along the first direction X, and the size of the second isolation structure 32 in one of the first structure group G1 and the second structure group G2 along the first direction X is larger than the gap size of two adjacent second isolation structures 32 along the first direction X in the other.

[0075] For example, the dimension of the second isolation structure 32 in the first structural group G1 along the first direction X is a first dimension, and the gap dimension between two adjacent second isolation structures 32 in the second structural group G2 along the first direction X is a second dimension. The first dimension is larger than the second dimension, so that the gap between the second isolation structure 32 in the first structural group G1 and the two adjacent second isolation structures 32 in the second structural group G2 is relatively disposed along the second direction Y. Optionally, the dimension of the second isolation structure 32 in the first structural group G1 along the first direction X and the dimension of the second isolation structure 32 in the second structural group G2 along the first direction X can be the same, or they can be different.

[0076] In this embodiment of the application, through the above-described configuration, the second isolation structure 32 can block the gap between adjacent second isolation structures 32 within the adjacent structure group G, thereby increasing turbulence, enhancing the fluidity of the photolithography material, and at the same time, more precisely controlling the flow path and speed of the photolithography material, thereby improving the preparation yield of subsequent processes.

[0077] In some alternative embodiments, the dimensions of the second isolation structure 32 in the first structure group G1 along the first direction X are the same as those of the second isolation structure 32 in the second structure group G2 along the first direction X, thereby simplifying the manufacturing process of the second isolation structure 32 and improving production efficiency.

[0078] Figure 5 This is an enlarged structural diagram of the isolation structure in the second region of a display panel according to another embodiment of this application. Figure 6 This is an enlarged structural diagram of the isolation structure in the second region of a display panel according to another embodiment of this application.

[0079] like Figures 1 to 6 As shown, in some alternative embodiments, the edge of the second region NA includes at least one of a straight edge and an arcuate edge.

[0080] In some embodiments, the edge of the second region NA includes a straight edge. For example, the orthographic projection shape of the second region NA onto the substrate is a rectangle, a square, a trapezoid, a triangle, or other shapes.

[0081] In some embodiments, the edge of the second region NA includes an arc-shaped edge. For example, the orthographic projection shape of the second region NA onto the substrate is circular, racetrack-shaped, or an irregular structure with an arc-shaped edge. Optionally, the arc-shaped edge can be circular, elliptical, or wavy.

[0082] Optionally, the shape of the second region NA includes one or more combinations of rectangles, squares, circles, and runway shapes.

[0083] The embodiments of this application, through the above-described settings, facilitate increased flexibility in the arrangement of the second region NA and broaden the applicability of the display panel.

[0084] like Figure 1 , Figures 3 to 6 As shown, in some optional embodiments, the edge of the second region NA includes an arc-shaped edge, the structure group G includes a third structure group G3, and a plurality of second isolation structures 32 within the third structure group G3 are arranged sequentially along the extension direction of the arc-shaped edge.

[0085] For example, the edge of the second region NA is arc-shaped, and the multiple second isolation structures 32 in the third structure group G3 are arranged sequentially along the extension direction of the arc edge.

[0086] Optionally, the number of third structure groups G3 may include one or more.

[0087] Optionally, when there are multiple third structure groups G3, the gap between at least a portion of the adjacent second isolation structures 32 in one of the adjacent third structure groups G3 is misaligned with the gap between at least a portion of the adjacent second isolation structures 32 in the other.

[0088] Optionally, the dimensions of the second isolation structures 32 in the plurality of third structure groups G3 may be the same or different. Optionally, the second isolation structure 32 may be extended in a single direction (such as the first direction X or the second direction Y) or extended in the direction of the arc edge.

[0089] In these alternative embodiments, the arrangement described above can increase the arrangement area of ​​the second isolation structure 32, improve the arrangement flexibility of the second isolation structure 32, improve the uniformity of the graphic density in the first region AA and the second region NA, and improve the display effect of the display panel.

[0090] In some embodiments, the virtual connection line L of the centroid of the plurality of isolation structures 30 within the third structure group G3 is set to match the shape of the arc-shaped edge.

[0091] For example, the shape of the arc edge is an arc, and the virtual connection line L of the centroids of the multiple isolation structures 30 in the third structure group G3 is an arc; the shape of the arc edge is an elliptical arc, and the virtual connection line L of the centroids of the multiple isolation structures 30 in the third structure group G3 is an elliptical arc; the shape of the arc edge is wavy, and the virtual connection line L of the centroids of the multiple isolation structures 30 in the third structure group G3 is wavy.

[0092] like Figure 1 , Figures 3 to 5 As shown, in some optional embodiments, the edge of the second region NA also includes a straight edge, and the structure group G further includes a fourth structure group G4, in which a plurality of second isolation structures 32 are sequentially arranged along the extension direction of the straight edge. The gap size between at least some adjacent second isolation structures 32 in the third structure group G3 is different from the gap size between at least some adjacent second isolation structures 32 in the fourth structure group G4.

[0093] Exemplarily, the straight edge extends along the first direction X, and a plurality of second isolation structures 32 within the fourth structure group G4 extend along the first direction X. Optionally, the gap size between at least some adjacent second isolation structures 32 within the third structure group G3 may be greater than or less than the gap size between at least some adjacent second isolation structures 32 within the fourth structure group G4. In some examples, the gap size between any adjacent second isolation structures 32 within the third structure group G3 is different from the gap size between any adjacent second isolation structures 32 within the fourth structure group G4. In other examples, the gap size between any adjacent second isolation structures 32 within the third structure group G3 is different from the gap size between a portion of adjacent second isolation structures 32 within the fourth structure group G4. In still other examples, the gap size between a portion of adjacent second isolation structures 32 within the third structure group G3 is different from the gap size between any adjacent second isolation structures 32 within the fourth structure group G4. In still other examples, the gap size between at least some adjacent second isolation structures 32 within the third structure group G3 is different from the gap size between at least some adjacent second isolation structures 32 within the fourth structure group G4.

[0094] The embodiments of this application, through the above-described configuration, facilitate increased arrangement flexibility of the second isolation structure 32, increase turbulence, improve the fluidity of the photolithography material, and simultaneously enhance the display and photosensitivity of the second region NA.

[0095] In some alternative embodiments, the gap size between at least some of the adjacent second isolation structures 32 in the third structure group G3 is smaller than the gap size between at least some of the adjacent second isolation structures 32 in the fourth structure group G4.

[0096] In some examples, the gap size between any adjacent second isolation structures 32 within the third structural group G3 is smaller than the gap size between any adjacent second isolation structures 32 within the fourth structural group G4. In other examples, the gap size between any adjacent second isolation structures 32 within the third structural group G3 is smaller than the gap size between a portion of adjacent second isolation structures 32 within the fourth structural group G4. In still other examples, the gap size between a portion of adjacent second isolation structures 32 within the third structural group G3 is smaller than the gap size between any adjacent second isolation structures 32 within the fourth structural group G4. In still other examples, the gap size between at least a portion of adjacent second isolation structures 32 within the third structural group G3 is smaller than the gap size between at least a portion of adjacent second isolation structures 32 within the fourth structural group G4.

[0097] like Figure 1 , Figures 3 to 5As shown, in some optional embodiments, the number of third structure groups G3 includes multiple groups, which are arranged sequentially along a direction away from the arcuate edge. The gap size between adjacent second isolation structures 32 in the third structure group G3 near the arcuate edge is larger than the gap size between adjacent second isolation structures 32 in the third structure group G3 away from the arcuate edge.

[0098] For example, along the direction away from the curved edge, the multiple third structure groups G3 are sequentially the first third structure group G3, the second third structure group G3, the third third structure group G3, ..., the Mth third structure group G3. The gap size between adjacent second isolation structures 32 in the first third structure group G3 is the third size, the gap size between adjacent second isolation structures 32 in the second third structure group G3 is the fourth size, the gap size between adjacent second isolation structures 32 in the third third structure group G3 is the fifth size, and the gap size between adjacent second isolation structures 32 in the Mth third structure group G3 is the Mth size. The third size is greater than the fourth size, greater than the fifth size, ... greater than the Mth size.

[0099] In these alternative embodiments, the radius of the arc of the virtual connection L between the centroids of the plurality of second isolation structures 32 in the third structure group G3 is smaller the further away from the arc edge, so as to reduce the arrangement space of the third structure group G3 away from the arc edge. The above-mentioned arrangement in the embodiments of this application is beneficial to increasing the arrangement space of the third structure group G3, while also increasing the size of the second isolation structure 32, improving the turbulence effect, improving the fluidity of the photolithography material, increasing the density of the second isolation structure 32, and improving the display uniformity.

[0100] In some embodiments, the extension dimension of the second isolation structure 32 within the third structure group G3 near the arcuate edge is greater than the extension dimension of the second isolation structure 32 within the third structure group G3 away from the arcuate edge.

[0101] For example, along the direction away from the curved edge, the plurality of third structure groups G3 are sequentially the first third structure group G3, the second third structure group G3, the third third structure group G3, ..., the Mth third structure group G3. The extension dimension of the second isolation structure 32 in the first third structure group G3 is the first extension dimension, the extension dimension of the second isolation structure 32 in the second third structure group G3 is the second extension dimension, the extension dimension of the second isolation structure 32 in the third third structure group G3 is the third extension dimension, ..., the extension dimension of the second isolation structure 32 in the Mth third structure group G3 is the Mth extension dimension. The first extension dimension is greater than the second extension dimension, greater than the third extension dimension, ... greater than the Mth extension dimension.

[0102] The embodiments of this application, through the above-described configuration, are beneficial in reducing the number of second isolation structures 32 near the arc-shaped edge and increasing the number of second isolation structures 32 far from the arc-shaped edge. This is beneficial in ensuring the misalignment of the gaps between adjacent third structure groups G3 in multiple third structure groups G3, while increasing the arrangement space of the second isolation structures 32, further increasing turbulence, improving the fluidity of the photolithography material, and improving the preparation yield of subsequent fabrication processes.

[0103] like Figures 1 to 6 As shown, in some optional embodiments, the gap between adjacent second isolation structures 32 in one of the multiple structural groups G is connected to the gap between adjacent second isolation structures 32 in the other.

[0104] For example, two adjacent structural groups G are the first structural group G and the second structural group G. The gap between adjacent second isolation structures 32 in the first structural group is the first gap, and the gap between adjacent second isolation structures 32 in the second structural group G is the second gap. The first gap and the second gap are connected, thereby increasing the flow space of the photolithography material, reducing the possibility of generating bubbles during the curing process of the photolithography material, and further reducing the possibility of abnormal phenomena such as photolithography material explosion, and improving the preparation yield of subsequent processes.

[0105] like Figures 1 to 4 As shown, in some optional embodiments, the first isolation structure 31 and the second isolation structure 32 are spaced apart, thereby reducing the possibility that the first isolation structure 31 will block the second region NA and improving the light transmittance of the second region NA.

[0106] Optionally, when the first isolation structure 31 is a conductive structure, the first isolation structure 31 and the second isolation structure 32 are insulated from each other.

[0107] As shown in the figure, in some alternative embodiments, in the direction away from the substrate 10, the light-emitting device 40 includes a first electrode 41, a light-emitting unit 42 and a second electrode 43 stacked in sequence.

[0108] The display panel provided in some embodiments of this application may be an organic light-emitting diode (OLED) display panel.

[0109] Optionally, the light-emitting unit 42 may include a hole injection layer (HIL), a hole transport layer (HTL), a light-emitting structure, an electron injection layer (EIL), and an electron transport layer (ETL).

[0110] Optionally, the first electrode 41 and the second electrode 43 can serve as pixel electrodes of the display panel. One of the first electrode 41 and the second electrode 43 can serve as an anode, and the other can serve as a cathode to drive the light-emitting unit 42 to emit light. In this embodiment, the first electrode 41 is used as the anode of the display panel, and the second electrode 43 is used as the cathode of the display panel for illustrative purposes.

[0111] In some optional embodiments, the material of the isolation structure 30 includes a conductive material, and the second electrode 43 can be connected to the isolation structure 30 so that the second electrodes 43 of adjacent light-emitting devices 40 can be electrically connected through the isolation structure 30. That is, the second electrodes 43 of adjacent light-emitting devices 40 can be interconnected through the isolation structure 30 to form a surface electrode, so as to facilitate the control of the second electrode 43 in the display panel.

[0112] Figure 7 This is a partial cross-sectional schematic diagram of the second region in another embodiment of the present application display panel. Figure 8 This is a partial cross-sectional schematic diagram of the first region in another embodiment of the present application display panel.

[0113] like Figures 1 to 8 As shown, in some optional embodiments, the isolation structure 30 may include a first isolation portion 33 and a second isolation portion 34 located on the side of the first isolation portion away from the substrate 10, the second isolation portion being disposed protruding from the first isolation portion 33 toward the isolation opening 30a.

[0114] By providing the second isolation portion 34 protruding from the first isolation portion 33 toward the isolation opening 30a, the second isolation portion 34 can block at least part of the material used to prepare the light-emitting unit 42 and the second electrode 43 when the light-emitting unit 42 and the second electrode 43 of the display panel are vapor-deposited, thereby isolating the light-emitting unit 42 and the second electrode 43 between adjacent sub-pixels. This facilitates the formation of multiple spaced light-emitting units 42 and the second electrode 43, eliminating the need for a high-precision mask when vapor-depositing the light-emitting unit 42 and the second electrode 43 of the display panel. For example, it eliminates the need for a high-precision fine metal mask (FMM) when vapor-depositing the light-emitting unit 42 and the second electrode 43, thereby significantly reducing the manufacturing cost of the display panel.

[0115] Optionally, the material of the isolation structure 30 may include a conductive material, and the second electrode 43 may be connected to the first isolation portion 33, so that the second electrodes 43 of adjacent light-emitting devices 40 can be electrically connected through the first isolation portion 33.

[0116] Optionally, the isolation structure 30 may further include a conductive portion 35 located on the side of the first isolation portion 33 facing the substrate 10, the conductive portion protruding from the first isolation portion 33 toward the isolation opening 30a. Optionally, the second electrode 43 may be connected to the conductive portion 35.

[0117] By making the conductive part 35 protrude from the first isolation part 33 toward the isolation opening 30a, it is easier to connect the second electrode 43 and the conductive part 35, and the connection area between the second electrode 43 and the conductive part 35 can be increased, thereby reducing the resistance of the display panel.

[0118] like Figure 8 As shown, in some optional embodiments, the display panel further includes a pixel definition layer 20, which is located on one side of the substrate 10. The pixel definition layer 20 includes a pixel defining portion 21, which surrounds a pixel opening 22 formed in communication with the isolation opening 30a.

[0119] Optionally, a portion of the structure of the light-emitting device 40 may be located within the pixel opening 22. For example, one part of the structure of the light-emitting device may be located within the pixel opening 22, while another part of the structure of the light-emitting device 40 may extend out of the pixel opening 22 and be located within the isolation opening 30a.

[0120] In these optional embodiments, the pixel definition layer 20 can also be used to participate in dividing the sub-pixels of the display panel. The pixel definition portion 21 in the pixel definition layer 20 exposes a portion of the first electrode 41. During the fabrication of the isolation structure 30, the pixel definition portion 21 can first cover the entire first electrode 41 to reduce the etching of the first electrode 41 by the etching material of the isolation structure 30, thereby improving the reliability of the first electrode 41. After the isolation structure 30 is fabricated, the pixel definition portion 21 is etched to expose a portion of the first electrode 41, and then the light-emitting unit 42 and the second electrode 43 are fabricated on the side of the exposed first electrode facing away from the substrate 10.

[0121] like Figure 7 As shown, in some optional embodiments, the second region NA includes a first opening 30b, which is enclosed by the second isolation structure 32 to form the first opening 30b, thereby increasing the light transmittance of the second region NA, improving the light-sensing effect of the photosensitive device in the display device, and improving the reliability of the display panel.

[0122] Please see Figures 1 to 8The first aspect of this application also provides a display panel, which includes a first region AA and a second region NA. The light transmittance of the first region is less than that of the second region NA. The display panel further includes a substrate 10, an isolation structure 30, a pixel definition layer 20, and a light-emitting device 40. The isolation structure 30 is disposed on one side of the substrate 10. The isolation structure 30 includes a first isolation structure 31 located in the first region AA and a plurality of structure groups G located in the second region NA. The first isolation structure 31 encloses an isolation opening 30a. The structure group G includes a plurality of second isolation structures 32. The gap between at least a portion of adjacent second isolation structures 32 in one adjacent structure group G is offset from the gap between at least a portion of adjacent second isolation structures 32 in another adjacent structure group G. The pixel definition layer 20 is located on one side of the substrate 10. The pixel definition layer 20 includes a pixel defining portion 21, which encloses a pixel opening 22 connected to the isolation opening 30a. At least a portion of the structure of the light-emitting device 40 is located within the isolation opening 30a.

[0123] Optionally, the display panel provided in the first aspect of this application may be the display panel in any of the foregoing embodiments. Therefore, the display panel provided in the embodiments of this application may have the structure and beneficial effects of the display panel in any of the foregoing embodiments, and this application will not elaborate on it further.

[0124] For example, substrate 10 may be substrate 10 in any of the foregoing embodiments, and substrate may include substrate 10 in any of the foregoing embodiments. For example, pixel definition layer 20 may be pixel definition layer 20 in any of the foregoing embodiments, and pixel definition layer may include pixel defining portion 21 and pixel opening 22 in any of the foregoing embodiments. For example, light-emitting device 40 may be light-emitting device 40 in any of the foregoing embodiments, and light-emitting device may include first electrode 41, light-emitting unit 42 and second electrode 43 in any of the foregoing embodiments. For example, isolation structure 30 may be first isolation structure 31 and multiple structure groups G in any of the foregoing embodiments, first isolation structure 31 may enclose to form isolation opening 30a in any of the foregoing embodiments, and multiple structure groups G include multiple second isolation structures 32 arranged at intervals. Isolation structure may include first isolation portion 33, second isolation portion 34 and conductive portion 35 in any of the foregoing embodiments.

[0125] like Figures 1 to 5 As shown, in some optional embodiments, the structure group G includes a plurality of second isolation structures 32 spaced apart along the first direction X. The structure group G is arranged sequentially along the second direction Y. At least some of the structure groups in the plurality of structure groups G have different distances between the second isolation structure 32 near the edge of the second region NA along the first direction X and the edge of the second region NA along the first direction X. The first direction X, the second direction Y and the thickness direction Z intersect each other.

[0126] Multiple second isolation structures 32 in structure group G are spaced apart along the first direction X, and structure group G is arranged sequentially along the second direction Y, such that multiple second isolation structures 32 are arranged sequentially along the first direction X, and multiple second isolation structures 32 are arranged alternately along the second direction Y.

[0127] For example, a first structure group G, a second structure group G, a third structure group G, a fourth structure group G, ..., an Nth structure group G are arranged sequentially along the second direction Y. The distance between the second isolation structure 32 in the i-th structure group that is closest to the edge of the second region NA along the first direction X and the edge of the second region NA along the first direction X is the i-th distance. The distance between the second isolation structure 32 in the (i+1)-th structure group G that is closest to the edge of the second region NA along the first direction X and the edge of the second region NA along the first direction X is the (i+1)-th distance. The i-th distance and the (i+1)-th distance are different. Optionally, the i-th distance can be greater than or less than the (i+1)-th distance. Here, "the second isolation structure 32 in the structure group G that is closest to the edge of the second region NA along the first direction X" can be understood as two second isolation structures 32 at each end of the structure group G along the first direction X. One of the two opposite edges of the second region NA along the first direction X is closest to one of these two second isolation structures 32 and furthest from the other.

[0128] Optionally, the distance between the second isolation structure 32 in the (i+2)th structure group G, which is close to the edge of the second region NA along the first direction X, and the edge of the second region NA along the first direction X is the (i+2)th distance. The absolute value of the difference between the ith distance and the (i+1)th distance is equal to the absolute value of the difference between the (i+1)th distance and the (i+2)th distance. Of course, they can also be different. Optionally, the ith distance, the (i+1)th distance, and the (i+2)th distance can also gradually increase or gradually decrease.

[0129] In some embodiments, the distances between the second isolation structure 32 near the edge of the second region NA along the first direction X within the plurality of structure groups G are all different. In other embodiments, the distances between the second isolation structure 32 near the edge of the second region NA along the first direction X within a subset of the plurality of structure groups G are all different.

[0130] The embodiments of this application, through the above-described settings, facilitate the increase of different arrangement methods for structural groups G, improve the display uniformity of the second region NA and the first region AA, enhance the display effect, and simultaneously increase turbulence and disturbance effects, thereby improving the yield of subsequent fabrication processes.

[0131] In some optional embodiments, the structure group G includes a plurality of first structure groups G1 and a plurality of second structure groups G2, which are alternately arranged along the second direction Y. The distance between the second isolation structure 32 in the first structure group G1 near the edge of the second region NA along the first direction X and the edge of the second region NA along the first direction X is different from the distance between the second isolation structure 32 in the second structure group G2 near the edge of the second region NA along the first direction X and the edge of the second region NA along the first direction X.

[0132] For example, multiple first structure groups G1 are the first first structure group, the second first structure group, the third first structure group, ..., the Nth first structure group. Multiple second structure groups G2 are the first second structure group, the second second structure group, the third second structure group, ..., the Nth second structure group. Along a single direction, they are sequentially the first first structure group, the first second structure group, the second first structure group, the second second structure group, ..., the Nth first structure group, and the Nth second structure group.

[0133] The distance between the second isolation structure 32, located near the edge of the second region NA along the first direction X within the first structure group G1, and the edge of the second region NA along the first direction X within the second structure group G2, is a first distance. The distance between the second isolation structure 32, located near the edge of the second region NA along the first direction X within the second structure group G2, and the edge of the second region NA along the first direction X is a second distance. The first distance and the second distance are different. Optionally, the first distance can be greater than or less than the second distance.

[0134] Along the second direction Y, the first distance and the second distance are alternately set so that multiple second isolation structures 32 close to the edge of the second region NA along the first direction X together form a sawtooth shape.

[0135] The embodiments of this application, through the above-described settings, make the pattern near the edge of the second region NA along the first direction X regular, thereby improving the uniformity of light, improving the light-sensing accuracy of the photosensitive device in the display device, and improving the overall performance of the display panel.

[0136] An embodiment of the second aspect of this application provides a display device, which includes the display panel of any of the above embodiments. Since the display device provided by the second aspect of this application includes the display panel of any of the first aspects, it possesses the beneficial effects of the display panel of any of the first aspects, which will not be elaborated further here.

[0137] The display devices in this application include, but are not limited to, mobile phones, personal digital assistants (PDAs), tablet computers, e-books, televisions, access control systems, smart landline phones, control consoles, and other devices with display functions.

[0138] The embodiments described above are not exhaustive and do not limit the invention to specific examples. Clearly, many modifications and variations can be made based on the above description. These embodiments are selected and specifically described in this specification to better explain the principles and practical applications of this application, thereby enabling those skilled in the art to effectively utilize this application and its modifications. This application is limited only by the claims and their full scope and equivalents.

Claims

1. A display panel, characterized in that, The display panel includes a first region and a second region, wherein the light transmittance of the first region is less than that of the second region, and the display panel further includes: substrate; An isolation structure is disposed on one side of the substrate. The isolation structure includes a first isolation structure located in a first region and a plurality of structure groups located in a second region. The first isolation structure encloses and forms an isolation opening. The structure group includes a plurality of second isolation structures. The gap between at least a portion of the adjacent second isolation structures in one of the adjacent structure groups is staggered with the gap between at least a portion of the adjacent second isolation structures in the other group. A light-emitting device, wherein at least a portion of the structure of the light-emitting device is located within the isolation opening.

2. The display panel according to claim 1, characterized in that, The structure group includes a plurality of second isolation structures spaced apart along a first direction. The structure group is arranged sequentially along a second direction. At least some of the structure groups have second isolation structures near the edge of the second region along the first direction at different distances from the edge of the second region along the first direction. The first direction, the second direction, and the thickness direction intersect each other. Preferably, the structure group includes a plurality of first structure groups and a plurality of second structure groups, the plurality of first structure groups and the plurality of second structure groups are alternately arranged along a second direction, and the distance between the second isolation structure near the edge of the second region along the first direction in the first structure group and the edge of the second region along the first direction is different from the distance between the second isolation structure near the edge of the second region along the first direction in the second structure group and the edge of the second region along the first direction.

3. The display panel according to claim 2, characterized in that, The second isolation structure is formed by extending the orthographic projection shape of the substrate along the first direction, and the dimension of the second isolation structure in one of the first structure group and the second structure group along the first direction is larger than the gap dimension of two adjacent second isolation structures in the other group along the first direction. Preferably, the dimensions of the second isolation structure in the first structure group along the first direction are the same as the dimensions of the second isolation structure in the second structure group along the first direction.

4. The display panel according to claim 1, characterized in that, The edge of the second region includes at least one of a straight edge and an arc edge; Preferably, the shape of the second region includes one or a combination of rectangles, squares, circles, and runway shapes.

5. The display panel according to claim 4, characterized in that, The edge of the second region includes an arc-shaped edge, and the structure group includes a third structure group, wherein a plurality of the second isolation structures in the third structure group are arranged sequentially along the extension direction of the arc-shaped edge; Preferably, the virtual connecting lines of the centroids of the plurality of isolated structures within the third structural group are set to match the shape of the arc-shaped edge.

6. The display panel according to claim 5, characterized in that, The edge of the second region also includes a straight edge, and the structure group also includes a fourth structure group, in which a plurality of the second isolation structures in the fourth structure group are arranged sequentially along the extension direction of the straight edge; Wherein, the gap size between at least some adjacent second isolation structures in the third structural group is different from the gap size between at least some adjacent second isolation structures in the fourth structural group; Preferably, the gap size between at least some of the adjacent second isolation structures in the third structural group is smaller than the gap size between at least some of the adjacent second isolation structures in the fourth structural group.

7. The display panel according to claim 6, characterized in that, The number of the third structural groups includes multiple groups, and the multiple third structural groups are arranged sequentially along a direction away from the arc-shaped edge; The gap size between adjacent second isolation structures in the third structure group near the arc-shaped edge is larger than the gap size between adjacent second isolation structures in the third structure group away from the arc-shaped edge. Preferably, the extension dimension of the second isolation structure in the third structure group near the arcuate edge is greater than the extension dimension of the second isolation structure in the third structure group away from the arcuate edge.

8. The display panel according to any one of claims 1-7, characterized in that, The gap between adjacent second isolation structures in one of the multiple structural groups is connected to the gap between adjacent second isolation structures in the other.

9. The display panel according to claim 1, characterized in that, The first isolation structure and the second isolation structure are spaced apart.

10. The display panel according to claim 1, characterized in that, The isolation structure includes a first isolation portion and a second isolation portion located on the side of the first isolation portion away from the substrate, wherein the second isolation portion protrudes from the first isolation portion toward the isolation opening; Preferably, the isolation structure further includes a conductive portion located on the side of the first isolation portion facing the substrate, the conductive portion protruding from the first isolation portion toward the isolation opening; Preferably, in the direction away from the substrate, the light-emitting device includes a first electrode, a light-emitting unit, and a second electrode stacked sequentially, the material of the isolation structure includes a conductive material, and the second electrode is connected to the isolation structure.

11. The display panel according to claim 1, characterized in that, It also includes a pixel definition layer, which is located on one side of the substrate. The pixel definition layer includes a pixel defining portion that surrounds a pixel opening that is connected to the isolation opening.

12. The display panel according to claim 1, characterized in that, The second region includes a first opening, which is enclosed by the second isolation structure.

13. A display panel, characterized in that, The display panel includes a first region and a second region, wherein the light transmittance of the first region is less than that of the second region, and the display panel further includes: substrate; An isolation structure is disposed on one side of the substrate. The isolation structure includes a first isolation structure located in a first region and a plurality of structure groups located in a second region. The first isolation structure encloses and forms an isolation opening. The structure group includes a plurality of second isolation structures. The gap between at least a portion of the adjacent second isolation structures in one of the adjacent structure groups is staggered with the gap between at least a portion of the adjacent second isolation structures in the other group. A pixel definition layer is located on one side of the substrate. The pixel definition layer includes a pixel defining portion that surrounds a pixel opening connected to the isolation opening. A light-emitting device, wherein at least a portion of the structure of the light-emitting device is located within the isolation opening.

14. The display panel according to claim 13, characterized in that, The structure group includes a plurality of second isolation structures spaced apart along a first direction. The structure group is arranged sequentially along a second direction. At least some of the structure groups have second isolation structures near the edge of the second region along the first direction at different distances from the edge of the second region along the first direction. The first direction, the second direction, and the thickness direction intersect each other. Preferably, the structure group includes a plurality of first structure groups and a plurality of second structure groups, the plurality of first structure groups and the plurality of second structure groups are alternately arranged along a second direction, and the distance between the second isolation structure near the edge of the second region along the first direction in the first structure group and the edge of the second region along the first direction is different from the distance between the second isolation structure near the edge of the second region along the first direction in the second structure group and the edge of the second region along the first direction.

15. A display device, characterized in that, Includes the display panel as described in any one of claims 1 to 14.

Images