The invention provides a double-sided patterning method for a hemispherical
resonance plate electrode and a
plate electrode, and the method comprises the steps: clamping the side surface of an
electrode body by adopting an annular clamp with grids, placing the
electrode body in a film plating
machine, and plating
metal films on the front and back surfaces of the
electrode body, meanwhile, the side face of the electrode body is plated with a grid
metal strip film by adjusting the magnetron
sputtering angle and the grid-shaped clamp; the
metal films on the front and back surfaces of the electrode body are communicated through the grid metal strip films on the side surfaces; spraying glue on the surface of the coated electrode; the electrode is placed on a suction cup of a photoetching
machine, the T-shaped mark on the suction cup is aligned with the grid metal strip on the side face of the electrode, and first alignment is completed; pushing the suction cup into the photoetching
machine, and aligning the T-shaped mark on the
mask with the T-shaped mark on the suction cup to complete secondary alignment; and developing and corroding to finish the double-sided patterning for the hemispherical
resonance plate electrode. According to the technical scheme, an original
porous electrode scheme needing a pin cap lead can be simplified.