Defoaming device for photoresist

Abstract

The utility model relates to the technical field of photoresist defoaming, and discloses a defoaming device for photoresist, which comprises a working bin, a bin cover is mounted at the top of the working bin, a defoaming component A is arranged at the top of the bin cover, and a defoaming component B is mounted in the working bin; and the defoaming assembly B comprises four elastic pieces A mounted at four corners of the bottom of the inner wall of the working bin. According to the defoaming device for the photoresist, firstly, the flowing channel is pressed down and sealed, vacuumizing operation is carried out, then, the photoresist is continuously added into the flowing channel, and the photoresist is continuously subjected to bubble removal operation in the flowing channel, so that the defoaming operation can be always carried out by the device as long as the photoresist is continuously added; the photoresist bubble removing device can continuously work for a long time, meanwhile, bubble removing adopts vacuumizing bubble removing, heating bubble removing and vibration bubble removing, and multiple bubble removing operations are used at the same time, so that the bubble removing effect on bubbles in photoresist is guaranteed.

Description

Technical Field

[0001] The utility model relates to the technical field of photoresist defoaming, in particular to a photoresist defoaming device. Background Art

[0002] Photoresist needs to form a uniform film during the photolithography process to ensure the clarity and accuracy of the pattern. However, bubbles may be generated during stirring, coating or other operations, which will affect the quality and performance of the photoresist. Therefore, it is necessary to perform a debubbling operation.

[0003] Prior art, such as publication number: CN220159288U, discloses a debubbling device for photoresist, which relates to the field of photoresist processing technology. The utility model includes a base, a plurality of telescopic rods are fixed on the upper surface of the base, and a tension spring is sleeved on the outer side of the telescopic rod; a placement plate is fixed at one end of the telescopic rod, and a placement groove is opened on the upper surface of the placement plate. The utility model uses the function of the placement plate, and the placement plate continuously moves up and down, driving the debubbling bottle to vibrate, shaking out the bubbles in the debubbling bottle, thereby achieving the purpose of debubbling. At the same time, the activity frequency of the placement plate can be adjusted by adjusting the speed of the motor, so that the staff can adjust the amplitude of the placement plate according to the situation.

[0004] With respect to the above-mentioned and existing related technologies, the inventors believe that the following defects often exist: during use, the photoresist is loaded into a debubble bottle, and after loading, the debubble bottle is placed in a device for debubble operation. Only the photoresist in one debubble bottle can be debubbled at one time, and the debubble amount at a single time is limited, and it is impossible to achieve continuous debubble operation on the photoresist. Utility Model Content

[0005] In view of the above-mentioned existing problem that, during use, the photoresist is loaded with a debubble bottle, and after loading, the debubble bottle is placed in a device for debubble operation. Only the photoresist in one debubble bottle can be debubbled at one time, the single debubble amount is limited, and the photoresist cannot be debubbled continuously, the present utility model is proposed.

[0006] Therefore, the utility model aims to provide a debubbling device for photoresist, and its purpose is to achieve continuous debubbling operation on photoresist.

[0007] In order to solve the above technical problems, the utility model provides the following technical solutions: a debubbling device for photoresist, comprising a working chamber, a chamber cover is installed on the top of the working chamber, a debubbling component A is arranged on the top of the chamber cover, and a debubbling component B is installed inside the working chamber;

[0008] The debubble assembly B includes four elastic parts A installed at the four corners of the bottom inner wall of the working chamber, and an ultrasonic generator installed on one side of the working chamber, a debubble chamber is installed on the top of the four elastic parts A, a plurality of transducers are installed at the bottom of the debubble chamber, an L-shaped discharge pipe is welded at the discharge port on the right side of the debubble chamber, and a one-way valve A is installed at the lateral end of the L-shaped discharge pipe, a discharge hose is installed at the discharge port at the bottom of the L-shaped discharge pipe, and a discharge pipe is installed at the discharge end of the discharge hose.

[0009] As a preferred solution of the debubble removal device for photoresist described in the utility model, the elastic member A includes two spring sleeves, and the two spring sleeves are welded to the bottom of the inner wall of the working chamber and the bottom of the debubble removal chamber in a relative state, and a spring body is installed between the opposite surfaces of the two spring sleeves.

[0010] As a preferred solution of the debubbling device for photoresist described in the utility model, an electric heating tube is installed inside the debubbling chamber, and a transverse partition is installed inside the debubbling chamber and above the transverse partition.

[0011] As a preferred solution of the debubble device for photoresist described in the utility model, wherein: a plurality of vertical partitions are installed at equal intervals on the top of the horizontal partition, and two adjacent vertical partitions are arranged in a front-to-back staggered state, and the interior of the debubble bin is divided into a flow channel by the plurality of vertical partitions, and the flow channel is always in a downward sloping state, the point where the photoresist falls in the flow channel is the highest point, and the outlet end of the flow channel is the lowest point.

[0012] As a preferred solution of the debubbling device for photoresist described in the utility model, the debubbling component A includes a vacuum pumping structure and a downward pressure sealing component installed on the top of the bin cover, and the suction end of the vacuum pumping structure and the downward pressure end of the downward pressure sealing component are both located below the bin cover.

[0013] As a preferred solution of the defoaming device for photoresist described in the utility model, the downward pressure sealing assembly includes electric telescopic rods installed at the four corners of the top of the bin cover, an upgrade connecting plate is fixedly connected between the movable ends of the four electric telescopic rods, elastic parts B are installed at the four corners of the bottom of the upgrade connecting plate, a sealing pressure plate is installed between the bottoms of the four elastic parts B, and a rubber pad is installed at the bottom of the sealing pressure plate.

[0014] As a preferred solution of the defoaming device for photoresist described in the utility model, the vacuum pumping structure includes a vacuum pump installed on the top of the chamber cover, and a cover welded to the top of the sealing pressure plate, the bottom of the sealing pressure plate and the rubber pad are penetrated with ventilation holes, and a vacuum metal hose is installed at the suction end of the vacuum pump, and the bottom end of the vacuum metal hose is fixedly connected to the air outlet end of the cover.

[0015] As a preferred solution of the defoaming device for photoresist described in the utility model, a feed connecting pipe is installed between one side of the top of the bin cover and the upgrade connecting plate, a one-way valve B is installed on the feed connecting pipe, a feed outlet pipe is installed on one side of the top of the sealing pressure plate, and a feed hose is installed between the bottom outlet of the feed connecting pipe and the top inlet of the feed outlet pipe.

[0016] Beneficial effects of the utility model:

[0017] 1. In the utility model, the electric telescopic rod is extended to move the upgrading connecting plate downward, pressing the sealing pressing plate on the top of the debubble bin. There is a rubber pad between the sealing pressing plate and the debubble bin. The rubber pad directly contacts the top of the debubble bin, reducing the gap between the sealing pressing plate and the debubble bin to ensure the sealing inside the debubble bin, thereby ensuring the vacuum effect of the debubble bin.

[0018] 2. The utility model first presses down and seals the flow channel, and performs a vacuum operation, and then continuously adds photoresist into the flow channel. The photoresist is continuously debubbled in the flow channel. It only needs to continuously add photoresist, and the device can perform the debubbling operation all the time, and can work continuously for a long time. At the same time, the debubbling adopts vacuum debubbling, heating debubbling and vibration debubbling, and multiple debubbling operations are used simultaneously to ensure the effect of debubbling bubbles in the photoresist. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the following briefly introduces the drawings required for the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative labor. Among them:

[0020] Figure 1 The utility model is a schematic diagram of the overall structure of a defoaming device for photoresist.

[0021] Figure 2 The utility model is a schematic diagram of the internal structure of a working chamber of a defoaming device for photoresist.

[0022] Figure 3 The utility model is a schematic structural diagram of the separation state of a debubbling chamber and a transverse partition of a debubbling device for photoresist.

[0023] Figure 4 The utility model is a schematic structural diagram of a defoaming component A of a defoaming device for photoresist.

[0024] Figure 5 The utility model is a schematic diagram of the structure of a rubber pad of a defoaming device for photoresist in a bottom view.

[0025] Description of reference numerals:

[0026] 1. Working chamber; 2. Chamber cover; 3. Debubble assembly A; 31. Vacuuming structure; 311. Vacuum pump; 312. Metal hose for exhaust; 313. Cover; 314. Vent; 32. Press-down sealing assembly; 321. Electric telescopic rod; 322. Upgrade connecting plate; 323. Elastic part B; 324. Sealing pressure plate; 325. Rubber pad; 33. Feed connecting pipe; 34. One-way valve B; 35. Feed hose; 36. Feed outlet pipe; 4. Debubble assembly B; 41. Elastic part A; 411. Spring sleeve; 412. Spring body; 42. Ultrasonic generator; 43. Transducer; 44. Debubble chamber; 45. Vertical partition; 46. Horizontal partition; 47. One-way valve A; 48. L-shaped discharge pipe; 49. Discharge hose; 410. Electric heating pipe. DETAILED DESCRIPTION

[0027] In order to make the above-mentioned purposes, features and advantages of the present invention more obvious and easy to understand, the specific implementation methods of the present invention are described in detail below in conjunction with the accompanying drawings.

[0028] Example 1

[0029] Reference Figure 1-5 , which is the first embodiment of the utility model, provides a debubbling device for photoresist, and the debubbling device for photoresist comprises a working chamber 1, four corners of the bottom of the working chamber 1 are welded with legs, a chamber cover 2 is installed on the top of the working chamber 1, and the chamber cover 2 is fixed to the top of the working chamber 1 by bolts. After the chamber cover 2 is removed, the device will be cleaned, a debubbling component A3 is arranged on the top of the chamber cover 2, and the working end of the debubbling component A3 is located inside the working chamber 1, and a debubbling component B4 is installed inside the working chamber 1;

[0030] The debubble assembly B4 includes four elastic parts A41 installed at the four corners of the bottom inner wall of the working chamber 1, and an ultrasonic generator 42 installed on one side of the working chamber 1. A debubble chamber 44 is installed on the top of the four elastic parts A41, and a plurality of transducers 43 are installed at the bottom of the debubble chamber 44, and the transducers 43 and the ultrasonic generator 42 are connected by wires. An L-shaped discharge pipe 48 is welded at the discharge port on the right side of the debubble chamber 44, and a one-way valve A47 is installed at the lateral end of the L-shaped discharge pipe 48. The function of the one-way valve A47 is that the pipeline here can only discharge but not enter. A discharge hose 49 is installed at the discharge port at the bottom of the L-shaped discharge pipe 48, and a discharge pipe is installed at the discharge end of the discharge hose 49, and the discharge pipe is inserted and installed at the bottom of the working chamber 1, and a control valve is installed on the discharge pipe.

[0031] First, the flow channel is pressed down to seal and vacuumed, and then photoresist is continuously added to the flow channel. The photoresist is continuously debubbled in the flow channel. The device can perform debubbling operations continuously by only adding photoresist continuously. It can work continuously for a long time. At the same time, debubbling uses vacuum debubbling, heating debubbling and vibration debubbling. Multiple debubbling operations are used simultaneously to ensure the effect of debubbling bubbles in the photoresist.

[0032] The elastic member A41 includes two spring sleeves 411 , and the two spring sleeves 411 are welded to the bottom of the inner wall of the working chamber 1 and the bottom of the defoaming chamber 44 in an opposite state, and a spring body 412 is installed between the opposite surfaces of the two spring sleeves 411 .

[0033] An electric heating tube 410 is installed inside the debubble chamber 44, and a transverse partition 46 is installed inside the debubble chamber 44 and above the transverse partition 46. The photoresist flows on the upper surface of the transverse partition 46, and the electric heating tube is located below the transverse partition 46. The transverse partition 46 is welded to the inside of the debubble chamber 44, and the photoresist will not penetrate downward. When the photoresist circulates in the flow channel, the electric heating tube 410 is turned on and heats the photoresist from the bottom of the transverse partition 46, thereby increasing the temperature of the photoresist and causing the bubbles to float up quickly and be released.

[0034] A plurality of vertical partitions 45 are installed at equal intervals on the top of the transverse partition 46, and two adjacent vertical partitions 45 are arranged in a front-to-back staggered state, and the interior of the debubble chamber 44 is divided into a flow channel by the plurality of vertical partitions 45, and the flow channel is always in a downward sloping state, with the point where the photoresist falls in the flow channel as the highest point, and the outlet end of the flow channel as the lowest point. Water flows to a lower place to accelerate the flow speed of the photoresist, avoid the photoresist from accumulating upward in the flow channel, and avoid the photoresist from spreading upward. The staggered vertical partitions 45 will prolong the time for the photoresist to flow in the debubble chamber 44, and will prolong the time for the photoresist to be vibrated, thereby improving the effect of debubbling the photoresist by ultrasonic vibration.

[0035] During use, a steady stream of photoresist falls into the highest point of the flow channel through the feed connecting pipe 33, the feed hose 35, and the feed outlet pipe 36, and the photoresist continues to flow in the flow channel. At this time, the ultrasonic generator 42 controls the transducer 43 to vibrate the debubble chamber 44. Under the action of ultrasonic vibration, the bubbles in the photoresist are gradually released and disappear, and the debubbled photoresist is discharged and collected through the L-shaped discharge pipe 48 and the discharge hose 49.

[0036] Example 2

[0037] Reference Figure 1-5 , which is the second embodiment of the utility model, and this embodiment is different from the first embodiment in that:

[0038] The debubble assembly A3 includes a vacuum pumping structure 31 and a downward pressing sealing assembly 32 installed on the top of the bin cover 2 , and the air suction end of the vacuum pumping structure 31 and the downward pressing end of the downward pressing sealing assembly 32 are both located below the bin cover 2 .

[0039] The downward pressure sealing assembly 32 includes an electric telescopic rod 321 installed at the four corners of the top of the bin cover 2, and an upgrade connecting plate 322 is fixedly connected between the movable ends of the four electric telescopic rods 321. Elastic parts B323 are installed at the four corners of the bottom of the upgrade connecting plate 322. The elastic part B323 has the same structure as the elastic part A41. A sealing pressure plate 324 is installed between the bottoms of the four elastic parts B323. A rubber pad 325 is installed at the bottom of the sealing pressure plate 324. The rubber pad 325 is installed at the bottom of the sealing pressure plate 324 by bolts. The rubber pad is installed by bolts and can be replaced. After a period of use, it is replaced with a new one. There is a rubber pad 325 between the sealing pressure plate 324 and the debubble bin 44. The rubber pad 325 directly contacts the top of the debubble bin 44 to reduce the gap between the sealing pressure plate 324 and the debubble bin 44 to ensure the sealing inside the debubble bin 44, which can ensure the effect of vacuuming the debubble bin 44.

[0040] The vacuum structure 31 includes a vacuum pump 311 installed on the top of the chamber cover 2, and a cover 313 welded to the top of the sealing pressure plate 324. The bottom of the sealing pressure plate 324 and the rubber pad 325 are penetrated with air vents 314, and the cover 313 completely covers the air vents 314. A vacuum metal hose 312 is installed at the suction end of the vacuum pump 311, and the bottom end of the vacuum metal hose 312 is fixedly connected to the outlet end of the cover 313. A through hole is penetrated in the middle of the top of the upgrade connecting plate 322 for the vacuum metal hose 312 to pass through.

[0041] A feed connecting pipe 33 is installed between one side of the top of the bin cover 2 and the upgrade connecting plate 322. The feed connecting pipe 33 is the inlet of the photoresist. A one-way valve B34 is installed on the feed connecting pipe 33. A feed outlet pipe 36 is installed on one side of the top of the sealing pressure plate 324. A feed hose 35 is installed between the bottom outlet of the feed connecting pipe 33 and the top inlet of the feed outlet pipe 36.

[0042] During use, the outlet of the un-debubbled photoresist is connected to the feed connecting pipe 33 through a pipeline, and then the electric telescopic rod 321 is controlled to extend to move the upgrade connecting plate 322 downward, pressing the sealing pressure plate 324 on the top of the debubbling bin 44. When the sealing pressure plate 324 is pressed on the top of the debubbling bin 44, the vacuum pump 311 is turned on to generate negative pressure suction, and the negative pressure suction enters the interior of the debubbling component B4 through the exhaust metal hose 312, the cover 313, and the vent 314, and the interior of the debubbling bin 44 is evacuated in advance. Thereafter, the vacuum pump 311 is always in working condition.

[0043] The remaining structures are the same as those of Example 1.

[0044] It should be noted that the above embodiments are only used to illustrate the technical solution of the utility model rather than to limit it. Although the utility model has been described in detail with reference to the preferred embodiments, ordinary technicians in the field should understand that the technical solution of the utility model can be modified or replaced by equivalents without departing from the spirit and scope of the technical solution of the utility model, which should be included in the scope of the claims of the utility model.

Claims

1. A defoaming device for photoresist, comprising a working chamber (1), a chamber cover (2) being installed on the top of the working chamber (1), characterized in that: A debubble assembly A (3) is provided on the top of the bin cover (2), and a debubble assembly B (4) is installed inside the working bin (1); The debubble assembly B (4) comprises four elastic members A (41) installed at four corners of the bottom of the inner wall of the working chamber (1), and an ultrasonic generator (42) installed on one side of the inner part of the working chamber (1); a debubble chamber (44) is installed on the top of the four elastic members A (41); a plurality of transducers (43) are installed at the bottom of the debubble chamber (44); an L-shaped discharge pipe (48) is welded at the discharge port on the right side of the debubble chamber (44), and a one-way valve A (47) is installed at the lateral end of the L-shaped discharge pipe (48); a discharge hose (49) is installed at the discharge port at the bottom of the L-shaped discharge pipe (48), and a discharge pipe is installed at the discharge end of the discharge hose (49).

2. A defoaming device for photoresist according to claim 1, characterized in that: The elastic member A (41) comprises two spring sleeves (411), and the two spring sleeves (411) are welded to the bottom of the inner wall of the working chamber (1) and the bottom of the defoaming chamber (44) in an opposing state, respectively, and a spring body (412) is installed between the opposing surfaces of the two spring sleeves (411).

3. A defoaming device for photoresist according to claim 2, characterized in that: An electric heating pipe (410) is installed inside the debubble chamber (44), and a transverse partition (46) is installed inside the debubble chamber (44) and above the transverse partition (46).

4. A defoaming device for photoresist according to claim 3, characterized in that: A plurality of vertical partitions (45) are installed at equal intervals on the top of the transverse partition (46), and two adjacent vertical partitions (45) are arranged in a front-to-back staggered state. The interior of the debubble chamber (44) is divided into a flow channel by the plurality of vertical partitions (45), and the flow channel is always in a downward sloping state, with the photoresist falling point of the flow channel being the highest point and the flow channel outlet end being the lowest point.

5. A defoaming device for photoresist according to claim 4, characterized in that: The defoaming assembly A (3) comprises a vacuum pumping structure (31) and a downward pressing sealing assembly (32) installed on the top of the bin cover (2), and the air suction end of the vacuum pumping structure (31) and the downward pressing end of the downward pressing sealing assembly (32) are both located below the bin cover (2).

6. A defoaming device for photoresist according to claim 5, characterized in that: The downward-pressing sealing assembly (32) comprises electric telescopic rods (321) installed at the four corners of the top of the bin cover (2); an upgrade connecting plate (322) is fixedly connected between the movable ends of the four electric telescopic rods (321); elastic parts B (323) are installed at the four corners of the bottom of the upgrade connecting plate (322); a sealing pressure plate (324) is installed between the bottoms of the four elastic parts B (323); and a rubber pad (325) is installed at the bottom of the sealing pressure plate (324).

7. A defoaming device for photoresist according to claim 6, characterized in that: The vacuum pumping structure (31) comprises a vacuum pump (311) installed on the top of the bin cover (2), and a cover (313) welded to the top of the sealing pressure plate (324), the bottoms of the sealing pressure plate (324) and the rubber pad (325) are both penetrated with ventilation holes (314), and a vacuum metal hose (312) is installed at the suction end of the vacuum pump (311), and the bottom end of the vacuum metal hose (312) is fixedly connected to the outlet end of the cover (313).

8. A defoaming device for photoresist according to claim 7, characterized in that: A feed connecting pipe (33) is installed between one side of the top of the bin cover (2) and the upgrading connecting plate (322), a one-way valve B (34) is installed on the feed connecting pipe (33), a feed outlet pipe (36) is installed on one side of the top of the sealing pressure plate (324), and a feed hose (35) is installed between the bottom outlet of the feed connecting pipe (33) and the top inlet of the feed outlet pipe (36).

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