Thin film deposition radio frequency device based on pulse modulation technology
By introducing pulse modulation technology and specific structural design into the radio frequency device, the problems of device movement and exhaust gas treatment are solved, the flexible movement of the device and exhaust gas purification are realized, and the quality and environmental protection of film deposition are improved.
Patent Information
- Application Number
- CN202420836535.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-22
- Publication Date
- 2024-12-13
- Estimated Expiration
- 2034-04-22
AI Technical Summary
The existing RF devices have huge structures and are time-consuming and labor-intensive during the movement and use of the process, and the exhaust gas generated during processing has an impact on the environment and requires external equipment to deal with it.
A thin film deposition radio frequency device based on pulse modulation technology is designed, including device cabinet group, auxiliary components and radio frequency components. It adopts structures such as tripods, self-locking universal wheels and fixed frame groups to achieve flexible movement of the device and purification of exhaust gases. deal with.
The device realizes the flexible movement and stable support of the device through the structure of the self-locking universal wheel. It uses vacuum pump and filter box system to purify exhaust gas, reduces the impact on the environment, and stabilizes the target material through the sliding connection of the fixing frame group, improving the The mass of film deposition.
Smart Images
Figure CN222160337U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of thin film deposition radio frequency, in particular to a thin film deposition radio frequency device based on pulse modulation technology. Background Art
[0002] Pulse modulation has two meanings. One is the process in which the parameters of the pulse itself (amplitude, width, phase) change with the signal. When the pulse amplitude changes with the signal, it is called pulse amplitude modulation; when the pulse phase changes with the signal, it is called pulse phase modulation. Similarly, there are pulse width modulation, double pulse interval modulation, pulse code modulation, etc. The difference between the two meanings is that in the former, the pulse itself is the carrier, and in the latter, the high-frequency oscillation is the carrier. Generally speaking, pulse modulation usually refers to the former.
[0003] The thin film deposition RF device is a conventional device used in the sputtering process. The sputtering process generally uses two processing methods: DC sputtering and RF sputtering. Both DC sputtering and RF sputtering use electric fields to accelerate ions, and then let these ions hit the target material, so that the atoms of the target material are "sputtered" out and deposited on the substrate to form a thin film. The main difference between the two methods is the type of electric field used, namely DC electric field and RF electric field.
[0004] Among them, RF sputtering can be used for insulator target materials. The positive ions in the RF discharge plasma are used to bombard the target material, sputter out the target atoms and deposit them on the grounded substrate surface. In RF sputtering, an RF electric field is used, and the direction of the electric field changes periodically. This means that even if the target material is an insulator, enough electrons and ions can be generated under the action of the electric field to maintain a stable sputtering process. Therefore, if you want to sputter an insulator material, you usually need to use RF sputtering.
[0005] The structure of conventional RF devices is relatively large, and the process of moving the device requires external equipment to cooperate, which is time-consuming and labor-intensive. At the same time, the device will produce exhaust gas during the processing process, which will affect the surrounding environment and require external equipment to process before it can be discharged.
[0006] Therefore, in view of this, the existing structure and defects are studied and improved, and a thin film deposition radio frequency device based on pulse modulation technology is proposed. Utility Model Content
[0007] The purpose of the utility model is to provide a thin film deposition radio frequency device based on pulse modulation technology to solve the problems raised in the above background technology.
[0008] To achieve the above object, the present utility model provides the following technical solutions: A thin-film deposition radio frequency device based on pulse modulation technology, including a device cabinet group and an auxiliary component. Triangular brackets are symmetrically installed on the left and right sides of the bottom of the device cabinet group, and moving components are installed on some of the triangular brackets close to the vertical central axis of the device cabinet group. Moreover, a radio frequency component is installed on the top of the device cabinet group, and a fixed bracket group is installed inside the radio frequency component. The auxiliary component is connected to one side of the radio frequency component. The auxiliary component includes a recovery filter box, a one-way valve pipe, and a vacuum pump. A one-way valve pipe is vertically connected to one side of the recovery filter box, and a vacuum pump is connected to the bottom of the recovery filter box.
[0009] Furthermore, the device cabinet group includes an electric control cabinet group, guide rails, and a protective door. Guide rails are symmetrically installed on the upper and lower sides of the front side elevation of the electric control cabinet group, and a protective door is slidably connected between the guide rails.
[0010] Furthermore, the moving component includes a support pile, a damping rotating frame, and a self-locking universal wheel. Damping rotating frames are symmetrically installed on the left and right sides of the lower end of the support pile, and self-locking universal wheels are installed at the bottom of the damping rotating frames.
[0011] Furthermore, the radio frequency component includes a radio frequency processing box, a control console, an observation door, and a recovery tank. A control console is installed on the top of the radio frequency processing box, an observation door is installed on the front side elevation of the radio frequency processing box, and a recovery tank is connected to one side of the radio frequency processing box.
[0012] Furthermore, the recovery tank is horizontally connected to the right side of the radio frequency processing box through a one-way valve structure, and the radio frequency processing box and the radio frequency component are electrically connected.
[0013] Furthermore, the fixed bracket group includes a placement bracket, a slider, and a limiting bracket. Sliders are installed on the left and right sides of the placement bracket, and a limiting bracket is installed on one side of the slider close to the vertical central axis of the placement bracket.
[0014] Furthermore, the placement bracket is arranged in a "U" shape, and the slider and the placement bracket are slidably connected.
[0015] Furthermore, the recovery filter box, the one-way valve pipe, and the vacuum pump are arranged inside the device cabinet group, and one end of the one-way valve pipe far from the recovery filter box penetrates through the top of the device cabinet group and is connected to the recovery tank.
[0016] The present utility model provides a thin-film deposition radio frequency device based on pulse modulation technology, having the following beneficial effects:
[0017] 1. In the utility model, since an auxiliary component is connected to one side of the radio frequency component, when the radio frequency processing box is in the process of processing, waste gas will be generated due to the processing of insulating materials, including vaporized target materials, and the redundant gas will enter the recovery tank for storage. Subsequently, under the operation of the vacuum pump, the gas inside the recovery tank will be transported from the one-way valve pipe to the inside of the recovery filter box for filtration and recovery. By using the above structure, while the residual material is recovered, the purified waste gas can be discharged, reducing the impact on the outside world and ensuring the environmental protection of the device.
[0018] 2. The utility model, through the tripod and the moving assembly installed at the bottom of the device cabinet group, is provided with a self-locking universal wheel, and the rotational property of the structure can be utilized to push the entire device in any direction on the ground, so as to move the entire device to any desired position. When the entire device needs to be placed stably, it is only necessary to flip the self-locking universal wheel upward in the vertical direction by means of the rotational property of the damping rotating frame structure, and make the tripod contact with the ground, thereby forming a stable structural support, avoiding the problem of landslide caused by the activity of the self-locking universal wheel. In addition, due to the structure of the self-locking universal wheel itself, when temporary parking is required, the locking structure carried by the self-locking universal wheel can be utilized to keep the device in a fixed state to avoid shaking.
[0019] 3. In the utility model, since a fixed frame group is installed inside the RF processing box, when the workpiece to be processed is placed in the middle of the placement frame, the limit frame connected to the slider and the placement frame is then translated up and down in the vertical direction by utilizing the structural sliding properties of the slider and the placement frame, so as to make appropriate adjustments according to the size of the target material, thereby structurally clamping the target material to ensure its structural stability during the processing. Through the use of the above structure, unnecessary structural shaking of the target material can be minimized to ensure the quality of thin film deposition after processing. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] Figure 1 This is a schematic diagram of the side view of the structure of the body of a thin film deposition radio frequency device based on pulse modulation technology of the utility model;
[0021] Figure 2 This is a schematic diagram of the internal structure of the main body of a thin film deposition radio frequency device based on pulse modulation technology of the utility model;
[0022] Figure 3 The utility model is a thin film deposition radio frequency device based on pulse modulation technology Figure 1 A schematic diagram of the enlarged structure at point A;
[0023] Figure 4 It is a schematic diagram of the three-dimensional structure of a fixing frame group of a thin film deposition radio frequency device based on pulse modulation technology according to the utility model.
[0024] In the figure: 1. device cabinet group; 101. electric control cabinet group; 102. guide rail; 103. protective door; 2. tripod; 3. moving component; 301. support pile; 302. damping rotating frame; 303. self-locking universal wheel; 4. radio frequency component; 401. radio frequency processing box; 402. control console; 403. observation door; 404. recovery tank; 5. fixed frame group; 501. placement frame; 502. slide block; 503. limit frame; 6. auxiliary component; 601. recovery filter box; 602. one-way valve pipe; 603. vacuum pump. DETAILED DESCRIPTION
[0025] The following is a further detailed description of the implementation of the present invention in conjunction with the accompanying drawings and examples. The following examples are used to illustrate the present invention, but cannot be used to limit the scope of the present invention.
[0026] like Figures 1 to 4 As shown, a thin film deposition radio frequency device based on pulse modulation technology includes a device cabinet group 1 and an auxiliary component 6, wherein a tripod 2 is symmetrically installed on the left and right sides of the bottom of the device cabinet group 1, and a movable component 3 is installed on the tripod 2 near the vertical center axis of the device cabinet group 1, and a radio frequency component 4 is installed on the top of the device cabinet group 1, and a fixed frame group 5 is installed inside the radio frequency component 4, and the auxiliary component 6 is connected to one side of the radio frequency component 4, and the auxiliary component 6 includes a recovery filter box 601, a one-way valve pipe 602 and a vacuum pump 603, and one side of the recovery filter box 601 is vertically connected to the one-way valve pipe 602, and the bottom of the recovery filter box 601 is The part is connected to a vacuum pump 603, and the recovery filter box 601, the one-way valve pipe 602 and the vacuum pump 603 are arranged inside the device cabinet group 1, and the end of the one-way valve pipe 602 away from the recovery filter box 601 passes through the top of the device cabinet group 1 and is connected to the recovery tank 404. When the RF processing box 401 is in the process of processing, waste gas will be generated due to the processing of insulating materials, including vaporized target materials, and redundant gas will enter the recovery tank 404 for storage. Subsequently, under the operation of the vacuum pump 603, the gas inside the recovery tank 404 will be transported from the one-way valve pipe 602 to the inside of the recovery filter box 601 for filtration and recovery.
[0027] The device cabinet group 1 includes an electric control cabinet group 101, guide rails 102, and a protective door 103. Guide rails 102 are symmetrically installed on the upper and lower sides of the front side elevation of the electric control cabinet group 101, and a protective door 103 is slidably connected between the guide rails 102. The moving assembly 3 includes support piles 301, damping turntables 302, and self-locking universal wheels 303. Damping turntables 302 are symmetrically installed on the left and right sides of the lower end of the support pile 301, and self-locking universal wheels 303 are installed at the bottom of the damping turntables 302. The radio frequency assembly 4 includes a radio frequency processing box 401, a control console 402, an observation door 403, and a recovery tank 404. The control console 402 is installed on the top of the radio frequency processing box 401, and the observation door 403 is installed on the front side elevation of the radio frequency processing box 401. Moreover, a recovery tank 404 is connected to one side of the radio frequency processing box 401. The recovery tank 404 is horizontally connected to the right side of the radio frequency processing box 401 through a one-way valve structure, and the radio frequency processing box 401 and the radio frequency assembly 4 are electrically connected. Among them, by using the rotational property of the self-locking universal wheel 303 structure, the entire device can be pushed in any direction on the ground, so as to move the entire device to any required position. When the entire device needs to be stably placed, only by using the rotational property of the damping turntable 302 structure, the self-locking universal wheel 303 is turned upward in the vertical direction, and the tripod 2 is brought into contact with the ground, thereby forming a stable structural support.
[0028] The fixed frame group 5 includes a placement frame 501, sliders 502, and a limit frame 503. Sliders 502 are installed on the left and right sides of the placement frame 501, and a limit frame 503 is installed on the side of the slider 502 close to the vertical central axis of the placement frame 501. The placement frame 501 is arranged in a "U" shape, and the slider 502 and the placement frame 501 are slidably connected. Since the fixed frame group 5 is installed inside the radio frequency processing box 401, when the workpiece to be processed is placed in the middle of the placement frame 501, then by using the sliding property of the slider 502 and the placement frame 501 structure, the connected limit frame 503 is translated up and down in the vertical direction, so as to make appropriate adjustments according to the size of the target material, thereby clamping the target material structurally and ensuring its structural stability during the processing process.
[0029] In summary, as Figures 1 to 4 shown, when using this thin film deposition radio frequency device based on pulse modulation technology, first, when the entire device needs to be used, the self-locking universal wheels 303 at the bottom of the damping turntable 302 are rotated to the ground, so that the entire device can be flexibly pushed, thereby moving the device to the designated position. Subsequently, by using the rotational property of the damping turntable 302 structure installed on the left and right sides of the lower end of the support pile 301, the self-locking universal wheels 303 connected to its bottom are turned upward, so that the tripod 2 on one side comes into contact with the ground, and the entire device is stably placed on the ground;
[0030] Then, the observation door 403 on the front side of the RF processing box 401 where the target material is placed in advance is opened, and the target material to be processed is placed in the fixed frame group 5, and the slider 502 is slid upward along the surface of the placement frame 501 during the hair straightening process, so that the limit frame 503 connected to the slider 502 moves synchronously and is pressed down from above the target material until the limit frame 503 fits the surface of the target material and fixes it, and then the observation door 403 is closed, and the RF processing box 401 is started using the console 402 to start the processing operation;
[0031] During the operation of the device, the waste gas generated will enter the recovery tank 404. At the same time, under the operation of the vacuum pump 603, the recovery tank 404 connected to the recovery filter box 601 via the one-way valve tube 602 will gradually transport the gas inside to the recovery filter box 601 for recovery and filtration. When the recovery filter box 601 needs to be maintained, it is only necessary to push the protective door 103 on the side of the electric control cabinet group 101 along the surface of the guide rail 102 to process the recovery filter box 601 located inside the electric control cabinet group 101.
[0032] The embodiments of the present invention are provided for the purpose of illustration and description, and are not intended to be exhaustive or to limit the present invention to the disclosed forms. Many modifications and variations will be apparent to those of ordinary skill in the art. The embodiments are selected and described to better illustrate the principles and practical applications of the present invention, and to enable those of ordinary skill in the art to understand the present invention and thereby design various embodiments with various modifications suitable for specific uses.
Claims
1. A thin film deposition radio frequency device based on pulse modulation technology, comprising a device cabinet group (1) and an auxiliary component (6), characterized in that: On the left and right sides of the bottom of the device cabinet group (1), tripod supports (2) are symmetrically installed. And on some parts of the tripod supports (2) close to the vertical central axis of the device cabinet group (1), moving components (3) are installed. Moreover, a radio frequency component (4) is installed on the top of the device cabinet group (1). And a fixing frame group (5) is installed inside the radio frequency component (4). The auxiliary component (6) is connected to one side of the radio frequency component (4). The auxiliary component (6) includes a recycling filter tank (601), a one-way valve pipe (602), and a vacuum pump (603). One side of the recycling filter tank (601) is vertically connected to the one-way valve pipe (602). And the bottom of the recycling filter tank (601) is connected to the vacuum pump (603).
2. The thin film deposition radio frequency device based on pulse modulation technology according to claim 1, characterized in that: The device cabinet group (1) includes an electric control cabinet group (101), guide rails (102), and a protective door (103). On the front side elevation of the electric control cabinet group (101), guide rails (102) are symmetrically installed up and down. And a protective door (103) is slidably connected between the guide rails (102).
3. The thin film deposition radio frequency device based on pulse modulation technology according to claim 1, characterized in that: The moving component (3) includes support piles (301), damping rotating frames (302), and self-locking universal wheels (303). On the left and right sides of the lower end of the support piles (301), damping rotating frames (302) are symmetrically installed. And self-locking universal wheels (303) are installed at the bottom of the damping rotating frames (302).
4. The thin film deposition radio frequency device based on pulse modulation technology according to claim 1, characterized in that: The radio frequency component (4) includes a radio frequency processing box (401), a control console (402), an observation door (403), and a recycling tank (404). The control console (402) is installed on the top of the radio frequency processing box (401). And the observation door (403) is installed on the front side elevation of the radio frequency processing box (401). Moreover, a recycling tank (404) is connected to one side of the radio frequency processing box (401).
5. The thin film deposition radio frequency device based on pulse modulation technology according to claim 4, characterized in that: The recycling tank (404) is horizontally communicated with the right side of the radio frequency processing box (401) through a one-way valve structure. And the radio frequency processing box (401) and the radio frequency component (4) are electrically connected to each other.
6. The thin film deposition radio frequency device based on pulse modulation technology according to claim 1, characterized in that: The fixing frame group (5) includes a placement rack (501), sliders (502), and a limiting frame (503). The sliders (502) are installed on the left and right sides of the placement rack (501). And a limiting frame (503) is installed on one side of the slider (502) close to the vertical central axis of the placement rack (501).
7. The thin film deposition radio frequency device based on pulse modulation technology according to claim 6, characterized in that: The placement rack (501) is arranged in a "U"-shaped structure. And the sliders (502) and the placement rack (501) are slidably connected to each other.
8. The thin film deposition radio frequency device based on pulse modulation technology according to claim 4, characterized in that: The recycling filter tank (601), the one-way valve pipe (602), and the vacuum pump (603) are arranged inside the device cabinet group (1). And one end of the one-way valve pipe (602) far from the recycling filter tank (601) penetrates through the top of the device cabinet group (1) and is communicated with the recycling tank (404).