Chemical integrated gas chamber

Abstract

The utility model provides an integrated gas chamber for chemicals, which comprises a main body frame, a plurality of gas chambers, a plurality of gas chambers, a plurality of gas chambers, a plurality of gas chambers, a gas chamber, a gas chamber, a gas chamber and a gas chamber, and is characterized in that the main body frame comprises a first frame, a second frame and a third frame, the drawer type gas module is detachably connected in the second frame; the electric control chamber is mounted in the third frame; the drawer type gas module comprises a drawer frame, a gas distribution pipeline and a monitoring device; and the chemical barrel is connected with the gas distribution pipeline to output gas to the outside. Through the design of the detachable drawer type gas module, the gas module can be mounted and replaced more conveniently, and the output requirements of different chemicals are met.

Description

Technical Field

[0001] The utility model relates to a gas chamber, which belongs to a chemical integrated gas chamber. Background Art

[0002] In the manufacture of large-scale integrated circuits (ICs), a large amount of high-purity chemicals are required, such as RCA cleaning, wet etching, etc. With the continuous advancement of IC process technology, the requirements for particle control in the production and packaging of high-purity electronic-grade chemicals are becoming increasingly higher.

[0003] Integrated circuit (IC) manufacturing has become one of the most advanced and largest industries in the world. Photolithography technology plays a very important role in the production of ultra-large-scale integrated circuits (IC). In the manufacture of integrated circuits (IC), the geometric pattern on the mask master needs to be transferred to the photoresist film on the substrate surface first, and then the image on the photoresist film is copied to the substrate surface through a series of processing technologies from exposure to etching to form a permanent pattern. The typical micro-processing process includes substrate pretreatment, glue coating, pre-baking, exposure, development, cleaning, post-baking, etching, and degumming to obtain the desired permanent pattern. That is, before the graphic processing, the silicon wafer is first dried and processed, and then the photoresist is evenly coated. After pre-baking, the photoresist solvent is removed and the exposure circuit pattern is formed on the silicon wafer through step-down projection exposure. Then, after development, the exposed part is removed and the unexposed part is retained. After post-baking, the photoresist film is more firmly adhered. Then, wet etching is used to permanently retain the circuit pattern on the silicon wafer. Thermal diffusion and ion implantation are used for doping at the same time, and finally a stripper is used to remove the photoresist film to form a permanent IC design pattern on the silicon wafer.

[0004] In the process of manufacturing integrated circuits or semiconductor discrete devices, multiple or even dozens of photolithography processes are often required, and each photolithography process needs to complete the above process cycle. The technology of photoresist is complex and there are many varieties. The quality of the photoresist mixing, filtering and supply system directly affects the CMP process effect. Photoresist should not produce large particles, crystallization, photosensitivity and other problems during pre-mixing and use. In order to solve such problems, people have been seeking a more ideal technical solution for safe operation mode.

[0005] Most of the equipment in the domestic photoresist mixing and filtering supply system is imported. With the rapid development of the domestic semiconductor industry, the upstream fine chemical industry has also developed supporting equipment. In order to solve such problems, people have been looking for a more ideal technical solution that is both accurate and convenient.

[0006] With the continuous development of my country's semiconductor industry, there are more and more chemical varieties, and the domestic requirements for chemical supply processes and supply processes are becoming more and more stringent, and the precision is getting higher and higher. In the prior art, the switching of chemical modules usually needs to be carried out in the gas chamber, but due to the limited position of the gas chamber, the assembly of the chemical pipeline is inconvenient, which affects the assembly accuracy. Utility Model Content

[0007] The utility model aims to provide a chemical integrated gas chamber to solve the problems in the background technology.

[0008] In order to achieve the above object, the utility model provides the following technical solutions:

[0009] A chemical integrated gas chamber, comprising:

[0010] A main frame, comprising a first frame, a second frame and a third frame for placing chemical barrels, wherein the second frame is located below the third frame;

[0011] A drawer-type gas module, detachably connected to the second frame;

[0012] An electric control room, installed in the third frame;

[0013] The drawer-type gas module includes a drawer frame, a gas distribution pipeline and a monitoring device; the chemical barrel outputs gas to the outside by connecting to the gas distribution pipeline.

[0014] In one or more embodiments, a first partition is provided between the second frame and the third frame, and a second partition is provided between the first frame and the second frame.

[0015] In one or more embodiments, a sound-absorbing shell is installed on the second partition.

[0016] In one or more embodiments, the first partition is provided with an air pipe and wire channel.

[0017] In one or more embodiments, a bottom plate leveling bracket is provided at the bottom end of the second frame.

[0018] In one or more embodiments, a high efficiency air filter is provided at the top of the main frame.

[0019] In one or more embodiments, a plurality of exhaust devices are provided at the top of the main frame.

[0020] In one or more embodiments, an adjustable bottom angle is provided at the bottom end of the main frame.

[0021] The beneficial effect of the utility model is that the utility model can make the installation and replacement of the gas module more convenient and meet the output requirements of different chemicals through the detachable drawer-type gas module design.

[0022] The above description is only an overview of the technical solution of the utility model. In order to more clearly understand the technical means of the utility model and implement it according to the contents of the specification, the preferred embodiments of the utility model are described in detail as follows. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 This is a schematic diagram of the three-dimensional structure of a chemical integrated gas chamber according to an embodiment of the present utility model;

[0024] Figure 2 This is a structural schematic diagram of a drawer-type gas module entering a main frame as shown in an embodiment of the utility model;

[0025] Figure 3 for Figure 1 Schematic diagram of the three-dimensional structure of the middle drawer type gas module;

[0026] Figure 4 A perspective view of a chemical integrated gas chamber according to an embodiment of the present invention;

[0027] Figure 5 It is a cross-sectional view of a chemical integrated gas chamber shown in one embodiment of the present invention.

[0028] Reference numerals:

[0029] 1-main frame, 101-exhaust device, 102-high efficiency air filter, 103-first baffle, 104-second baffle, 105-trachea and wire channel, 106-silencer housing, 107-adjustable bottom angle, 110-first frame, 120-second frame, 121-bottom plate leveling bracket, 130-third frame;

[0030] 2-drawer type gas module, 201-drawer frame, 202-gas distribution pipeline, 203-monitoring device;

[0031] 3- Chemical barrels. DETAILED DESCRIPTION

[0032] The technical solution of the utility model will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0033] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", and "third" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance.

[0034] Spatially relative terms such as "below", "beneath", "beneath", "above", "above", "to the left", "to the left", "to the right", "to the right", may be used herein for convenience of description to describe the relationship of one component or feature shown in the figures to other components or features. It should be understood that the spatially relative terms are intended to include different orientations of the components in use and operation in addition to the orientations shown in the figures. For example, if the components in the drawings are turned over, then the components or features described as "below" or "beneath" or "below" the other components will be oriented as "above" the other components or features. Thus, the exemplary terms "below" and "below" may include both up and down orientations. "To the left" and "to the left" may include both left and right orientations.

[0035] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0036] In addition, the technical features involved in the different embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

[0037] Figure 1 and Figure 4 A chemical integrated gas chamber according to an embodiment of the present invention is shown, comprising: a main frame 1, comprising a first frame 110, a second frame 120 and a third frame 130, wherein the second frame 120 is located below the third frame 130; see Figure 5, wherein the first frame 110 is “U”-shaped for engaging the chemical barrel 3 , the second frame 120 is located below the third frame 130 , and the first frame 110 is located on the right side of the second frame 120 and the third frame 130 .

[0038] See also Figure 2 The drawer-type gas module 2 is detachably connected to the second frame 120 ; the electric control room is installed in the third frame 130 ; the electric control room is used to control the operation of the drawer-type gas module 2 .

[0039] See also Figure 3 The drawer-type gas module 2 includes a drawer frame 201, a gas distribution pipeline 202 and a monitoring device 203; the chemical barrel 3 outputs gas to the outside by connecting the gas distribution pipeline 202. The monitoring device 203 is used to record gas usage, pressure, temperature and other parameters, and provide real-time monitoring and traceability. A pressure gauge head is also provided outside the main frame 1 to connect the monitoring device 203 for displaying pressure and real-time monitoring. The gas distribution pipeline 202 is a pipeline system for transporting, distributing and controlling gas flow. Such a pipeline system can be used in various occasions, including industry, laboratories, medical facilities, etc. The pipeline material of the gas distribution pipeline is usually stainless steel, copper, or special alloy. Those skilled in the art can choose according to the nature of the gas, the pressure requirements and the use environment of the pipeline, which is not limited here. The gas distribution pipeline also includes valves and regulators for controlling the flow, pressure and direction of the gas. These devices ensure accurate control of the gas flow through the electric control room. The gas distribution pipeline system is also equipped with safety devices, such as pressure relief valves, leak detectors, etc., to ensure that safety measures can be taken quickly when necessary.

[0040] By designing the gas module to be detachable, the problem of directly installing and setting the gas distribution pipe in the main frame 1 in the prior art is solved. The gas module can be disassembled, installed separately, and then put back into the main frame 1 to meet different output requirements of chemicals.

[0041] The following is further explained and illustrated in conjunction with specific embodiments.

[0042] In one embodiment, a first partition plate 103 is disposed between the second frame 120 and the third frame 130 , and a second partition plate 104 is disposed between the first frame 110 and the second frame 120 .

[0043] See also Figure 5 In order to reduce the noise of the gas distribution pipe when it is working, a sound-absorbing shell 106 is installed on the second partition plate 104.

[0044] See also Figure 4 The first partition plate 103 is provided with a gas pipe and electric wire channel 105 for connecting the drawer type gas module 2 with the electric control room.

[0045] In a preferred embodiment, in order to ensure that the drawer-type gas module 2 is installed horizontally, a bottom plate leveling bracket 121 is provided at the bottom end of the second frame 120 .

[0046] In one embodiment, in order to reduce the odor of the chemical barrel 3, a high efficiency air filter 102 is provided at the top of the main frame 1. A plurality of exhaust devices 101 are provided at the top of the main frame 1. The high efficiency air filter 102 cooperates with the exhaust device 101 to greatly reduce the odor generated by chemical leakage and improve production safety.

[0047] In a preferred embodiment, in order to keep the main frame 1 level, an adjustable bottom angle 107 is provided at the bottom end of the main frame 1. The horizontality of the main frame 1 is corrected by adjusting the adjustable bottom angle.

[0048] The utility model can make the installation and replacement of the gas module more convenient through the design of the detachable drawer-type gas module 2, thereby meeting different output requirements of chemicals.

[0049] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0050] The above-mentioned embodiments only express several implementation methods of the utility model, and the description is relatively specific and detailed, but it cannot be understood as limiting the scope of the utility model patent. It should be pointed out that for ordinary technicians in this field, several modifications and improvements can be made without departing from the concept of the utility model, which all belong to the protection scope of the utility model. Therefore, the protection scope of the utility model patent shall be based on the attached claims.

Claims

1. A chemical integrated gas chamber, characterized in that: include: A main frame, comprising a first frame, a second frame and a third frame for placing chemical barrels, wherein the second frame is located below the third frame; A drawer-type gas module, detachably connected to the second frame; An electric control room, installed in the third frame; The drawer-type gas module includes a drawer frame, a gas distribution pipeline and a monitoring device; the chemical barrel outputs gas to the outside by connecting to the gas distribution pipeline.

2. The chemical integrated gas chamber according to claim 1, characterized in that: A first partition is provided between the second frame and the third frame, and a second partition is provided between the first frame and the second frame.

3. The chemical integrated gas chamber according to claim 2, characterized in that: A sound-absorbing shell is installed on the second partition.

4. The chemical integrated gas chamber according to claim 2, characterized in that: The first partition is provided with an air pipe and electric wire channel.

5. The chemical integrated gas chamber according to claim 1, characterized in that: A bottom plate leveling bracket is provided at the bottom end of the second frame.

6. The chemical integrated gas chamber according to claim 1, characterized in that: A high efficiency air filter is arranged on the top of the main frame.

7. The chemical integrated gas chamber according to claim 1, characterized in that: A plurality of exhaust devices are arranged on the top of the main frame.

8. The chemical integrated gas chamber according to claim 1, characterized in that: An adjustable bottom angle is arranged at the bottom end of the main frame.

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