Inner container structure for chemical vapor deposition equipment

Abstract

The utility model discloses a liner structure for chemical vapor deposition equipment, which comprises a liner body and a cover body, one end of the liner body is provided with a first opening, the other end of the liner body is an open end, the cover body can be matched and covered at the position of the open end, the cover body is provided with a second opening, at least one barrier strip is fixed on the inner wall of the liner body, and the barrier strip is fixed on the inner wall of the liner body. And the barrier strip extends along the length of the liner body. According to the utility model, the uniformity of chemical vapor deposition can be effectively improved, and various properties of materials are optimized.

Description

Technical Field

[0001] The utility model relates to the technical field of chemical vapor deposition devices, in particular to an inner tank structure for chemical vapor deposition equipment. Background Art

[0002] In order to further improve the electrochemical properties of carbon negative electrode materials for batteries, it is usually necessary to use chemical vapor deposition to regulate the pore type. During chemical vapor deposition, the carbon material is placed in a gall body for chemical vapor deposition equipment, and then a protective gas and a carbon source gas are introduced into the interior through an opening at one end of the gall body. Chemical vapor deposition is performed under high temperature conditions. During the deposition process, the gall body rotates under the drive of the chemical vapor deposition equipment, and the carbon material inside the gall body rotates accordingly. However, since the inner wall of the gall body in the prior art is a smooth surface, the carbon material is unevenly contacted with the gas during the rotation process, and the carbon material on the surface is prone to excessive deposition, while the carbon material inside is prone to insufficient deposition. Utility Model Content

[0003] The utility model aims to provide an inner tank structure for chemical vapor deposition equipment in view of the technical defect that the carbon material and the carbon source gas are not in uniform contact during chemical vapor deposition in the prior art.

[0004] The technical solution adopted to achieve the purpose of this utility model is:

[0005] A liner structure for chemical vapor deposition equipment comprises a liner body and a cover body, wherein one end of the liner body is provided with a first opening, and the other end is an open end, the cover body can be matched to cover the position of the open end, the cover body is provided with a second opening, and at least one baffle is fixed on the inner wall of the liner body, and the baffle extends along the length of the liner body.

[0006] In the above technical solution, the gallbladder body is a cylindrical gallbladder body, and the cover body includes a cylindrical cover and a cylindrical protrusion coaxially fixed on one side of the cylindrical cover, the outer diameter of the cylindrical cover is the same as the outer diameter of the cylindrical gallbladder body, the outer wall of the protrusion and the corresponding inner wall of the gallbladder body are both rough surfaces, and the second opening coaxially penetrates the cylindrical cover and the protrusion.

[0007] In the above technical solution, the materials of the bladder body and the cover body are both graphite.

[0008] In the above technical solution, both the first opening and the second opening are circular openings, and the diameter of the first opening is greater than the diameter of the second opening.

[0009] In the above technical solution, two or more baffles are provided, and the two or more baffles are distributed in a ring matrix with the axis of the bladder body as the axis.

[0010] In the above technical solution, the baffle is a rectangular bar structure.

[0011] In the above technical solution, one end of the baffle extends to the inner wall end of the bladder body, and the other end is spaced from the open end to avoid the protrusion.

[0012] In the above technical solution, the height of the baffle is one third to one half of the inner diameter of the bladder body.

[0013] In the above technical solution, the side of the baffle and the inner wall of the bladder body are rounded.

[0014] Another aspect of the present invention is a chemical vapor deposition device, comprising a rotary kiln cylinder and an inner tank structure for the chemical vapor deposition device disposed inside the rotary kiln cylinder.

[0015] Compared with the prior art, the beneficial effects of the utility model are:

[0016] 1. The baffle on the inner wall of the tank body can continuously break up the carbon particles during the rotation process to prevent their accumulation, which causes some carbon particles to be unable to fully contact with the carbon source gas, thereby effectively improving the uniformity of chemical vapor deposition and improving the quality of material processing.

[0017] 2. The utility model has a simple structure, low processing cost, high adaptability, is suitable for various rotary kilns, and is easy to market and promote. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 Shown is a top view of the liner.

[0019] Figure 2 Shown is a bottom view of the liner.

[0020] Figure 3 Shown is a left side view of the liner.

[0021] Figure 4 Shown is a left side cross-sectional view of the inner tank.

[0022] Figure 5 Shown is a top view of the liner lid.

[0023] Figure 6 Shown is a left side view of the liner lid.

[0024] Figure 7 Shown is a front view of the liner lid.

[0025] Figure 8 Shown is a top view of the inner container of Example 3.

[0026] In the figure: 1-body, 2-cover, 3-first opening, 4-open end, 5-second opening, 6-stop bar;

[0027] 2-1-cylindrical cover, 2-2-convex part. DETAILED DESCRIPTION

[0028] The present invention is further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention.

[0029] Example 1

[0030] like Figure 1-Figure 7 As shown, an inner tank structure for chemical vapor deposition equipment includes a tank body 1 and a cover body 2, wherein one end of the tank body 1 is provided with a first opening 3, and the other end is an open end 4, and the cover body 2 can be matched to cover the position of the open end 4, and a second opening 5 is provided on the cover body 2, and at least one baffle 6 is fixed on the inner wall of the tank body 1, and the baffle 6 extends along the length of the tank body 1.

[0031] When in use, the gall body 1 is placed horizontally, the cover body 2 is opened, the carbon material is placed inside the gall body 1, and then the cover body 2 is closed at the open end 4. The entire gall body 1 is placed in the rotary kiln cylinder body and is driven to rotate by the rotary kiln cylinder body. When the chemical vapor deposition equipment heats the gall body 1, the protective gas and the carbon source gas are introduced through the first opening 3. The carbon source gas is deposited on the carbon material under high temperature conditions, and the protective gas and the carbon source gas that do not participate in the reaction are discharged from the second opening 5. The setting of the baffle 6 can continuously stir the carbon material during the rotation of the gall body 1 to prevent its accumulation and uneven deposition, thereby optimizing the vapor deposition effect.

[0032] Preferably, the gallbladder body 1 is a cylindrical gallbladder body to fit the rotary kiln cylinder. The cover body 2 includes a cylindrical cover 2-1 and a cylindrical protrusion 2-2 coaxially fixed to one side of the cylindrical cover 2-1. The outer diameter of the cylindrical cover 2-1 is the same as the outer diameter of the cylindrical gallbladder body 1 to maintain the cylindrical structure of the entire gallbladder body 1. The outer wall of the protrusion 2-2 and the corresponding inner wall of the gallbladder body 1 are both rough surfaces to increase friction and facilitate the cover body 2 to be covered on the gallbladder body 1. The second opening 5 coaxially penetrates the cylindrical cover 2-1 and the protrusion 2-2.

[0033] Preferably, the material of the bladder body 1 and the cover body 2 are both graphite to adapt to high temperature working environment.

[0034] Preferably, the first opening 3 and the second opening 5 are both circular openings, and the diameter of the first opening 3 is larger than the diameter of the second opening 5 so as to fit the rotary kiln cylinder.

[0035] Example 2

[0036] This embodiment is further optimized on the basis of the embodiment 1. In order to make the stirring more uniform, two or more baffles 6 are provided. The two or more baffles 6 are distributed in a ring matrix with the axis of the gallbladder body 1 as the axis. Figure 1 As shown, three baffles 6 are provided, and the three baffles 6 are distributed on the inner wall of the gallbladder body 1 in a ring-shaped matrix.

[0037] Preferably, the baffle 6 is a rectangular bar structure. During the rotation of the gallbladder body 1, the baffle 6 can continuously break up the carbon material, making the contact between the carbon material and the carbon source gas more uniform.

[0038] Preferably, one end of the baffle 6 extends to the inner wall end of the gallbladder body 1, and the other end is spaced apart from the open end 4 to avoid the raised portion 2-2. The baffle 6 provided throughout the entire length allows for more uniform stirring.

[0039] Preferably, the height of the baffle 6 is one third to one half of the inner diameter of the gallbladder body 1 , which can ensure the stirring effect without occupying too much space inside the gallbladder body 1 .

[0040] Example 3

[0041] This embodiment is further optimized on the basis of the embodiment 1 or the embodiment 2. In order to avoid the formation of a dead angle between the baffle 6 and the inner wall of the gallbladder body 1, the carbon material is stuck in the dead angle. Figure 8 As shown, the side of the baffle 6 of this embodiment is rounded to the inner wall of the gallbladder body 1. This can prevent the carbon material from being stuck at the edge of the baffle 6. The baffle 6 is provided with two symmetrically arranged.

[0042] Example 4

[0043] This embodiment provides a chemical vapor deposition device, including a rotary kiln cylinder body and an inner tank structure for the chemical vapor deposition device as described in Example 1, Example 2 or Example 3, which is arranged inside the rotary kiln cylinder body.

[0044] For ease of explanation, spatial relative terms such as "upper", "lower", "left", "right" and the like are used in the embodiments to illustrate the relationship of one element or feature shown in the figure relative to another element or feature. It should be understood that, in addition to the orientation shown in the figure, the spatial terms are intended to include different orientations of the device in use or operation. For example, if the device in the figure is inverted, the element described as being "under" other elements or features will be positioned "on" other elements or features. Therefore, the exemplary term "under" can include both upper and lower orientations. The device can be positioned in other ways (rotated 90 degrees or in other orientations), and the spatial relative descriptions used here can be interpreted accordingly.

[0045] Furthermore, relational terms such as “first” and “second” and the like are merely used to distinguish one component from another having the same name, but do not necessarily require or imply any such actual relationship or order between these components.

[0046] The above is only a preferred embodiment of the present invention. It should be pointed out that, for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principle of the present invention, and these improvements and modifications should also be regarded as the protection scope of the present invention.

Claims

1. A liner structure for chemical vapor deposition equipment, characterized in that: The invention comprises a gallbladder body and a cover body, wherein one end of the gallbladder body is provided with a first opening and the other end is an open end, the cover body can match and cover the position of the open end, the cover body is provided with a second opening, and at least one baffle is fixed on the inner wall of the gallbladder body, and the baffle extends along the length of the gallbladder body.

2. The inner tank structure for chemical vapor deposition equipment according to claim 1, characterized in that: The gallbladder body is a cylindrical gallbladder body, and the cover body includes a cylindrical cover and a cylindrical protrusion coaxially fixed on one side of the cylindrical cover. The outer diameter of the cylindrical cover is the same as the outer diameter of the cylindrical gallbladder body. The outer wall of the protrusion and the corresponding inner wall of the gallbladder body are both rough surfaces, and the second opening coaxially penetrates the cylindrical cover and the protrusion.

3. The inner tank structure for chemical vapor deposition equipment according to claim 1, characterized in that: The material of the gallbladder body and the cover body are both graphite.

4. The inner tank structure for chemical vapor deposition equipment according to claim 1, characterized in that: The first opening and the second opening are both circular openings, and the diameter of the first opening is greater than the diameter of the second opening.

5. The inner tank structure for chemical vapor deposition equipment according to claim 1, characterized in that: There are two or more baffles, and the two or more baffles are distributed in a ring matrix with the axis of the bladder body as the axis.

6. The inner tank structure for chemical vapor deposition equipment according to claim 1, characterized in that: The baffle is a rectangular parallelepiped strip structure.

7. The inner tank structure for chemical vapor deposition equipment according to claim 2, characterized in that: One end of the baffle extends to the inner wall end of the bladder body, and the other end is spaced from the open end to avoid the protrusion.

8. The inner tank structure for chemical vapor deposition equipment according to claim 1, characterized in that: The height of the baffle is one third to one half of the inner diameter of the gallbladder body.

9. The inner tank structure for chemical vapor deposition equipment according to claim 1, characterized in that: There is a rounded transition between the side surface of the baffle and the inner wall of the bladder body.

10. A chemical vapor deposition device, characterized in that: The invention comprises a rotary kiln cylinder body and an inner tank structure for a chemical vapor deposition device as claimed in any one of claims 1 to 9 arranged inside the rotary kiln cylinder body.

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