Adjusting structure applied to high-density plasma side coil
By designing an adjustable high-density plasma side coil structure, the problem that traditional equipment cannot adjust the position of the side coil is solved, and the plasma distribution and electromagnetic field strength are improved, thereby improving the uniformity and stability of the deposition process, and solving the problem of clamping. Problems of breakage and hollowness.
Patent Information
- Application Number
- CN202323421986.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2023-12-14
- Publication Date
- 2024-12-31
- Estimated Expiration
- 2033-12-14
AI Technical Summary
Traditional equipment cannot adjust the position of the coil side of high-density plasma, resulting in the inability to adjust the plasma distribution effectively, affecting the improvement of process parameters, especially when small-sized grooves are deposited, the problem of pinch and cavity is easily formed.
A structure including a base, reaction chamber, ceramic dome, side coil, clamping block, adjustment ring and compression bracket is designed. By matching the adjustment ring and clamping block, the up and down movement and fixing of the side coil is achieved, and the changes are changed. Electromagnetic field distribution to improve process effect.
By adjusting the position and height of the side coil, the plasma distribution and electromagnetic field strength can be effectively improved, the filling uniformity and stability of the process can be improved, and the problem that traditional equipment cannot adjust the position of the side coil is simplified and the operation process is simplified.
Smart Images
Figure CN222281917U_ABST
Abstract
Description
Technical Field
[0001] The utility model belongs to the technical field of semiconductor equipment, and in particular relates to an adjustment structure applied to a high-density plasma side coil. Background Art
[0002] As the size of chip devices decreases, when depositing trenches below 0.8um (8000A), PECVD no longer has good step coverage, often forming pinch-offs and voids. This is mainly caused by the different deposition rates at the gap opening and the gap bottom. In order to solve the problem of PECVD deposition voids, HDP (high-density plasma) was developed.
[0003] When the initial deposition is completed and the partially filled holes have not been pinched off, an etching process is immediately carried out to reopen the gap entrance, and then deposition is performed again to complete the filling of the entire gap. The most core control parameter of the HDP process is D / S, where D is the deposition rate and S is the sputtering rate. By controlling the size of D / S, the filling situation can be changed. However, adjusting and improving the sputtering uniformity has become a major difficulty in HDP, and the improvement by adjusting the process parameters is negligible. The RF power excites the electromagnetic field through the RF coil (side coil), and the reaction gas is ionized in the cavity to form plasma under the action of the coupled electromagnetic field. Therefore, the design of the RF coil is directly related to the intensity and spatial distribution of the electromagnetic field, which in turn affects the plasma state and process results. Traditional equipment cannot adjust the position of the side coil to change the plasma distribution, so it is not ideal for improving the HDP process parameters. Utility Model Content
[0004] Based on the technical problems existing in the prior art, the utility model proposes an adjustment structure for a high-density plasma side coil. The utility model solves the problems that the prior art does not make much improvement by adjusting process parameters, and only the power of the side coil and the distribution of plasma have a greater impact on it, and the existing equipment cannot adjust the side coil position to change the plasma distribution.
[0005] In order to achieve the above-mentioned purpose, the utility model adopts the following technical scheme: an adjustment structure for a high-density plasma side coil, comprising a base, a reaction chamber is provided on the base, a ceramic dome is installed above the reaction chamber of the base, a side coil is sleeved on the arc surface of the ceramic dome, a plurality of clamping blocks are clamped on the arc surface of the side coil, an adjustment ring for adjusting the position of the clamping block is clamped on one side of the clamping block, a clamping bracket is slidably connected to one side of the adjustment ring, and a threaded hole is provided at one end of the clamping bracket.
[0006] The effect achieved by the above components is: when it is necessary to adjust the height of the side coil to change the electromagnetic field distribution in the center and surrounding areas of the reaction chamber to improve the process effect, the adjustment ring can be pulled up and down first, so that the adjustment ring drives the clamping block to move up and down, and at the same time drives the side coil to move up and down, so as to achieve the effect of adjusting the height of the side coil. When the height of the side coil is adjusted to an appropriate level, the clamping bracket is directly pushed to make the side coil rest on the ceramic dome, and then the clamping bracket is fixed with screws.
[0007] Preferably, a screw hole is provided in the adjusting ring, and a top screw is threadedly connected inside the screw hole of the adjusting ring.
[0008] The effect achieved by the above components is: the top screw can be directly rotated so that the lower end of the top screw is against the base, and the top screw drives the adjustment ring to move up and down with the help of the thread, thereby achieving a more stable effect of adjusting the height of the side coil.
[0009] Preferably, a slot is provided on one side of the adjusting block close to the clamping block, and a protrusion is provided on the clamping block at a position corresponding to the slot of the adjusting block, and the protrusion of the clamping block is clamped in the slot of the adjusting block.
[0010] The effect achieved by the above components is: achieving a more stable connection between the adjusting ring and the clamping block.
[0011] Preferably, the adjustment ring is made of polyimide.
[0012] The effects achieved by the above components are: firstly, the use of polyimide in the adjustment ring can make the adjustment ring resistant to high temperatures, so that when the process is used, the adjustment ring will not be deformed, ensuring that the process can be used normally.
[0013] Preferably, the adjustment ring is a ring-shaped structure, and the center of the adjustment ring coincides with the center of the side coil.
[0014] The effects achieved by the above components are: the adjusting ring adopts a ring structure to make the side coil move up and down more smoothly.
[0015] Preferably, the cross-section of the clamping bracket is "L"-shaped, the long arm end and the short arm end of the clamping bracket are both bent, and the bending position of the clamping bracket is rounded.
[0016] In summary, the beneficial effects of the utility model are:
[0017] In the utility model, when it is necessary to adjust the height of the side coil relative to the ceramic dome, the adjusting ring is first pressed to ensure that the adjusting ring is fixed in position, and then the top screw is rotated to make the top screw move up and down with the help of the thread. While adjusting the position of the top screw, the lower end of the top screw is always in contact with the base, thereby achieving the effect of adjusting the height of the side coil relative to the ceramic dome by adjusting the length of the top screw exposed from under the adjusting ring. When the adjusting ring moves, the adjusting ring will drive the clamping block and the protrusion to move with the help of the card slot. When the height of the side coil is adjusted to a suitable height, the clamping bracket is directly fixed with the help of screws. At this time, the clamping bracket will press the side coil with the adjusted height against the ceramic dome, thereby achieving the effect of fixing the height of the side coil. By setting this structure, firstly, the electromagnetic field strength and spatial distribution can be changed by changing the position of the side coil to achieve the purpose of the adjustment process. At the same time, the structure is simple to operate, which brings convenience to the operator. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] Figure 1 It is a three-dimensional structural schematic diagram of the utility model;
[0019] Figure 2 For this utility model Figure 1 A magnified image of point A;
[0020] Figure 3 For this utility model Figure 1 A top view of
[0021] Figure 4 For this utility model Figure 1 Partial structural cross-section;
[0022] Figure 5 This is the sputtering diagram of the traditional HDP process of the utility model.
[0023] Legend: 1. Ceramic dome; 2. Side coil; 3. Clamping block; 4. Adjusting ring; 5. Holding bracket; 6. Top screw; 7. Base. DETAILED DESCRIPTION
[0024] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention.
[0025] It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or indirectly on the other element. When an element is referred to as being "connected to" another element, it may be directly connected to the other element or indirectly connected to the other element. In the absence of conflict, the embodiments of the present invention and the features in the embodiments may be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.
[0026] It should be understood that the terms "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.
[0027] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present utility model, the meaning of "plurality" is more than two, unless otherwise clearly and specifically defined.
[0028] The utility model relates to an adjustment structure for a high-density plasma side coil, which includes a base, a reaction chamber is provided on the base, a ceramic dome is installed above the reaction chamber of the base, a side coil is sleeved on the arc surface of the ceramic dome, a plurality of clamping blocks are clamped on the arc surface of the side coil, an adjustment ring for adjusting the position of the clamping block is clamped on one side of the clamping block, a clamping bracket is slidably connected to one side of the adjustment ring, and a threaded hole is provided at one end of the clamping bracket. A screw hole is provided in the adjustment ring, and a top screw is threadedly connected inside the screw hole of the adjustment ring. The utility model solves the problems that the prior art has little improvement on it by adjusting process parameters, and only the power of the side coil and the distribution of plasma have a greater impact on it, and the existing equipment cannot adjust the position of the side coil to change the plasma distribution.
[0029] Reference Figure 1 As shown, the utility model provides an adjustment structure for a high-density plasma side coil, comprising a base 7 , a reaction chamber is provided on the base 7 , and a ceramic dome 1 is installed above the reaction chamber of the base 7 .
[0030] The following is a detailed description of the specific settings and functions of the entire structure.
[0031] Reference Figures 2 to 5 As shown, in this embodiment: the arc surface of the ceramic dome 1 is sleeved with a side coil 2, and the arc surface of the side coil 2 is clamped with a plurality of clamping blocks 3, and one side of the clamping block 3 is clamped with an adjustment ring 4 for adjusting the position of the clamping block 3, and one side of the adjustment ring 4 is slidably connected with a clamping bracket 5, and one end of the clamping bracket 5 is provided with a threaded hole. When it is necessary to adjust the height of the side coil 2 to change the electromagnetic field distribution in the center and surrounding areas of the reaction chamber to improve the process effect, the adjustment ring 4 can be pulled up and down first, so that the adjustment ring 4 drives the clamping block 3 to move up and down, and at the same time drives the side coil 2 to move up and down, so as to achieve the effect of adjusting the height of the side coil 2; when the height of the side coil 2 is adjusted appropriately, the clamping bracket 5 is directly pushed to make the side coil 2 rest against the ceramic dome 1, and then the clamping bracket 5 is fixed with screws. A screw hole is provided in the adjusting ring 4, and a top screw 6 is connected to the screw hole of the adjusting ring 4 through a thread; the top screw 6 can be directly rotated so that the lower end of the top screw 6 is against the base 7, and the top screw 6 drives the adjusting ring 4 to move up and down with the help of the thread, thereby achieving a more stable effect of adjusting the height of the side coil 2. A card slot is provided on the side of the adjusting ring close to the clamping block 3, and a protrusion is provided at the position of the clamping block 3 corresponding to the card slot of the adjusting block. The protrusion of the clamping block 3 is stuck in the card slot of the adjusting ring, so that the connection between the adjusting ring 4 and the clamping block 3 is more stable. The adjusting ring 4 is made of polyimide. First, the adjusting ring 4 uses polyimide to make the adjusting ring 4 resistant to a high temperature of 270 degrees, so that when the process is adopted, the adjusting ring 4 will not be deformed, ensuring that the process can be used normally. The adjusting ring 4 is an annular structure, and the center of the adjusting ring 4 coincides with the center of the side coil 2. The annular structure of the adjusting ring 4 can make the side coil 2 move up and down more smoothly. The cross section of the clamping bracket 5 is in an "L" shape, the long arm end and the short arm end of the clamping bracket 5 are both bent, and the bending position of the clamping bracket 5 is rounded.
[0032] Working principle: when it is necessary to adjust the height of the side coil 2 relative to the ceramic dome 1, first press the adjusting ring 4 to ensure that the adjusting ring 4 does not move, and then rotate the top screw 6 to make the top screw 6 move up and down with the help of the thread. While adjusting the position of the top screw 6, the lower end of the top screw 6 is always in contact with the base 7, thereby achieving the effect of adjusting the height of the side coil 2 relative to the ceramic dome 1 by adjusting the length of the top screw 6 exposed from under the adjusting ring 4; when the adjusting ring 4 moves, the adjusting ring 4 will drive the clamping block 3 to move together with the protrusion with the help of the card slot. When the height of the side coil 2 is adjusted to a suitable height, the clamping bracket 5 is directly fixed with the help of screws. At this time, the clamping bracket 5 will press the side coil 2 with the adjusted height against the ceramic dome 1, thereby achieving the effect of fixing the height of the side coil 2. By setting this structure, first, the electromagnetic field strength and spatial distribution can be changed by changing the position of the side coil 2 to achieve the purpose of the adjustment process. At the same time, the structure is simple to operate, which brings convenience to the operator.
[0033] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected" and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood by specific circumstances.
[0034] The above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.
Claims
1. An adjustment structure for a high-density plasma side coil, comprising a base (7), characterized in that: A reaction chamber is provided on the base (7), a ceramic dome (1) is installed above the reaction chamber of the base (7), a side coil (2) is sleeved on the circular arc surface of the ceramic dome (1), a plurality of clamping blocks (3) are clamped on the circular arc surface of the side coil (2), an adjustment ring (4) for adjusting the position of the clamping block (3) is clamped on one side of the clamping block (3), a clamping bracket (5) is slidably connected to one side of the adjustment ring (4), and a threaded hole is provided at one end of the clamping bracket (5).
2. The adjustment structure for high-density plasma side coil according to claim 1, characterized in that: A screw hole is provided in the adjusting ring (4), and a top screw (6) is threadedly connected inside the screw hole of the adjusting ring (4).
3. The adjustment structure for high-density plasma side coil according to claim 1, characterized in that: A slot is provided on one side of the adjustment ring close to the clamping block (3); a convex block is provided at a position of the clamping block (3) corresponding to the slot of the adjustment block; the convex block of the clamping block (3) is clamped in the slot of the adjustment block.
4. The adjustment structure for high-density plasma side coil according to claim 1, characterized in that: The adjusting ring (4) is made of polyimide.
5. The adjustment structure for high-density plasma side coil according to claim 1, characterized in that: The adjustment ring (4) is a ring-shaped structure, and the center of the adjustment ring (4) coincides with the center of the side coil (2).
6. The adjustment structure for high-density plasma side coil according to claim 1, characterized in that: The cross section of the clamping bracket (5) is in an "L" shape, the long arm end and the short arm end of the clamping bracket (5) are both bent, and the bending position of the clamping bracket (5) is rounded.