Sewage treatment equipment for grinding machine

Abstract

The utility model relates to the technical field of grinding and polishing machines, in particular to grinding machine sewage treatment equipment which comprises a sewage tank, the sewage tank is provided with a suction device used for feeding grinding liquid in a polishing machine into the sewage tank, and a plurality of partition assemblies are arranged in the sewage tank in the sewage flowing direction. The sewage tank is divided into a settling chamber, an adsorption chamber and a filtering chamber by the partition assemblies, and a pumping device used for feeding grinding liquid in the filtering chamber into the polishing machine is arranged on the sewage tank. The polishing liquid has the effect of guaranteeing the cleanliness of the polishing liquid, so that the repeated service life is prolonged.

Description

Technical Field

[0001] The present application relates to the technical field of grinding and polishing machines, and in particular to grinding machine wastewater treatment equipment. Background Art

[0002] Grinding and polishing machines are also called grinders, and are often used for mechanical grinding, polishing and waxing. The working principle is: the motor drives the sponge or wool polishing disc installed on the polishing machine to rotate at high speed. Due to the combined effect of the polishing disc and the polishing agent and the friction with the surface to be polished, the paint surface pollution, oxide layer and shallow marks can be removed. The speed of the polishing disc is generally 1500-3000r / min, and most of them are stepless speed change, which can be adjusted at any time according to the needs during construction.

[0003] Our company has previously developed a translational magnetic rolling and polishing machine and applied for relevant patents. The patent announcement number is CN216802983U, which includes a machine body, in which a magnetic rolling and polishing assembly and a translation assembly for driving the magnetic rolling and polishing assembly to translate are arranged; the translation assembly includes a transverse slide rail arranged on the machine body, a support frame is arranged on the transverse slide rail, a transverse driving member for driving the support frame to move along the transverse slide rail is arranged on the machine body, a longitudinal slide rail is arranged on the support frame, a support plate is arranged on the longitudinal slide rail, a longitudinal driving member for driving the support plate to move along the longitudinal slide rail is arranged on the support frame, and the magnetic rolling and polishing assembly is arranged on the support plate.

[0004] With respect to the above-mentioned related technologies, the inventors found that after the above-mentioned roller polishing machine polishes the product, the polishing liquid in its polishing barrel will contain product grinding chips and steel needles, resulting in a reduction in the number of reuses and life of the polishing liquid. Utility Model Content

[0005] In order to solve the above technical problems, the present application provides a grinder wastewater treatment device, which has the advantage of ensuring the cleanliness of the grinding fluid, thereby increasing its repeated service life.

[0006] In order to achieve the above object, the technical solution of the utility model is as follows:

[0007] A grinder sewage treatment device comprises a sewage tank, wherein the sewage tank is provided with a pumping device for sending the grinding liquid in the polishing machine into the sewage tank, a plurality of partition components are arranged in the sewage tank along the sewage flow direction, and the plurality of partition components divide the sewage tank into a sedimentation chamber, an adsorption chamber and a filtration chamber, and the sewage tank is provided with a pumping device for sending the grinding liquid in the filtration chamber into the polishing machine.

[0008] The above technical solution is implemented so that the liquid passes through the sedimentation chamber, adsorption chamber and filtration chamber in sequence and is then extracted by the extraction device. After the polishing liquid falls into the sedimentation chamber, the grinding particles with high internal density are carried on the bottom wall of the adsorption chamber, and then the polishing liquid can quickly enter the adsorption chamber, so that the small suspended particles in the polishing can be adsorbed, and then further filtered after passing through the filtration chamber, and then extracted by the extraction pump for use, so that the polishing liquid is clean after multi-stage filtration, thereby increasing the service life.

[0009] As a preferred solution of the present application, a feed port is provided on the sewage tank, a primary filter device is provided on the feed port, and an output pipe of the suction device is connected to the primary filter device.

[0010] By implementing the above technical solution, the polishing fluid needs to be initially filtered by the primary filter device before entering the sewage tank.

[0011] As a preferred solution of the present application, the primary filtration device includes a water filter box, and a pull-out drawer is provided on the water filter box, and filter cotton is provided in each of the drawers.

[0012] By implementing the above technical solution, the large particles in the polishing liquid or the residual grinding needles are adsorbed by the filter cotton to achieve a preliminary filtering effect; and the pull-out drawer design facilitates the replacement of the filter cotton to ensure the filtering effect.

[0013] As a preferred solution of the present application, the partition assembly includes a lower baffle plate arranged on the bottom wall of the sewage tank, an upper baffle plate is arranged on the top wall of the sewage tank, a gap is arranged in the horizontal direction between the upper baffle plate and the lower baffle plate, and the bottom wall of the upper baffle plate is located below the top wall of the lower baffle plate.

[0014] The above technical solution is implemented so that after the polishing liquid falls into the sedimentation chamber, the grinding material with high internal density is carried on the bottom wall of the adsorption chamber, and then the polishing liquid is quickly transported from the gap between the upper baffle plate and the lower baffle plate into the next chamber, thereby blocking large particles of impurities while ensuring the forward transportation of the polishing liquid.

[0015] As a preferred solution of the present application, a plurality of installation frames are provided in the adsorption chamber, and activated carbon packages are provided in the installation frames.

[0016] The above technical solution is implemented so that the activated carbon bag can adsorb small-sized abrasive chips suspended in the polishing liquid, thereby achieving the effect of further filtering the polishing liquid.

[0017] As a preferred solution of the present application, a security filter is provided in the filter chamber.

[0018] The above technical solution is implemented to further filter out tiny impurities in the polishing liquid, thereby ensuring the cleanliness of the polishing liquid and its service life for subsequent reuse.

[0019] In summary, the present application includes at least one of the following beneficial technical effects:

[0020] 1. The liquid passes through the sedimentation chamber, adsorption chamber and filtration chamber in turn, and is then extracted by the extraction device. After the polishing liquid falls into the sedimentation chamber, the grinding particles with high internal density are carried on the bottom wall of the adsorption chamber, and then the polishing liquid can quickly enter the adsorption chamber, so that the small suspended particles in the polishing can be adsorbed, and then further filtered after passing through the filtration chamber, and then extracted by the extraction pump for use, so that the polishing liquid is clean after multi-stage filtration, thereby increasing its service life. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0022] Figure 1 It is a schematic diagram of the overall structure of an embodiment of the present application.

[0023] Figure 2 It is a schematic diagram of the structure inside the sewage tank in the embodiment of the present application.

[0024] Figure 3 It is the primary filtration device in the embodiment of the present application.

[0025] Figure numerals: 1. Sewage tank; 11. Sedimentation chamber; 12. Adsorption chamber; 13. Filtration chamber; 2. Pumping device; 3. Primary filtration device; 31. Filter box; 32. Collection plate; 33. Drawer; 4. Partition assembly; 41. Lower baffle plate; 42. Upper baffle plate; 5. Installation frame; 6. Safety filter; 7. Extraction device. DETAILED DESCRIPTION

[0026] The following is combined with Figure 1-3 This application is described in further detail.

[0027] The present application embodiment discloses a grinding machine wastewater treatment device. Figure 1The grinding machine sewage treatment equipment package includes a sewage tank 1, and a suction device 2 is provided on the sewage tank 1 for sending the polishing liquid in the polishing machine into the sewage tank 1, wherein the suction device 2 includes a suction pump and a grinding needle filter (magnetic suction type, used to adsorb the grinding needle) provided on the connecting pipeline between the suction pump and the sewage tank 1 (not shown in the figure), so that the grinding needle is separated from the polishing liquid and enters the sewage tank 1. A water inlet is provided on the top of the sewage tank 1, and a primary filter device 3 is provided at the water inlet. The output pipe of the suction device 2 is connected to the primary filter device 3, so that the polishing liquid needs to be initially filtered by the primary filter device 3 before entering the sewage tank 1.

[0028] The primary filter device 3 includes a water filter box 31, which is designed with an opening at the top. A collection plate 32 is provided in the water filter box 31, and a water outlet is provided in the collection plate 32, so that the polishing liquid will first fall into the collection plate 32, wherein the grinding needles or large pieces of grinding debris that have not been absorbed cleanly will be blocked by the collection plate 32. At this time, the polishing liquid falls, and a pull-out drawer 33 is provided on the filter box below the collection plate 32. Each drawer 33 is provided with filter cotton (not shown in the figure), so that the large particles of grinding or residual grinding needles in the polishing liquid are absorbed by the filter cotton, so as to achieve the effect of preliminary filtering. The design of the pull-out drawer 33 facilitates the replacement of the filter cotton, thereby ensuring the filtering effect.

[0029] Several partition components 4 are arranged in the sewage tank 1 along the flow direction of the sewage, and the several partition components 4 divide the sewage tank 1 into a sedimentation chamber 11, an adsorption chamber 12 and a filter chamber 13. The sewage tank is provided with an extraction device 7 for sending the polishing liquid in the filter chamber 13 into the polishing machine. Thus, the liquid passes through the sedimentation chamber 11, the adsorption chamber 12 and the filter chamber 13 in sequence, and is then extracted by the extraction device 7.

[0030] The partition assembly includes a lower shielding plate 41 disposed on the bottom wall of the sewage tank, an upper shielding plate 42 disposed on the top wall of the sewage tank, a gap is provided between the upper shielding plate 42 and the lower shielding plate 41 in the horizontal direction, and the bottom wall of the upper shielding plate 42 is located below the top wall of the lower shielding plate 41. Thus, after the polishing liquid falls into the sedimentation chamber 11, the grinding material with high internal density is carried on the bottom wall of the adsorption chamber 12, and the polishing liquid is rushed into the next chamber from the gap between the upper shielding plate 42 and the lower shielding plate 41, thereby preventing large particles of impurities while ensuring the forward transportation of the polishing liquid.

[0031] An installation frame 5 is provided in the adsorption chamber 12, and an activated carbon bag (not shown in the figure) is provided in the installation frame 5, so that the activated carbon bag can adsorb small-sized grinding chips suspended in the polishing liquid, thereby achieving the effect of further filtering the polishing liquid.

[0032] A security filter 6 is provided in the filter chamber 13. The filter aperture of the security filter 6 is generally selected to be 1-120 microns, so as to further filter out tiny impurities in the polishing liquid. This ensures the cleanliness of the polishing liquid and its service life for subsequent reuse. The extraction device 7 is configured as an extraction pump, and the water inlet of the pump is connected to the water outlet of the security filter 6, so that the polishing liquid is filtered by the security filter 6, thereby ensuring the cleanliness of the polishing liquid.

[0033] The implementation principle of a grinder wastewater treatment equipment in an embodiment of the present application is as follows: after the liquid passes through the sedimentation chamber 11, the adsorption chamber 12 and the filter chamber 13 in sequence, it is extracted by the extraction device 7, so that after the grinding liquid falls into the sedimentation chamber 11, its internal high-density grinding load is on the bottom wall of the adsorption chamber 12, and the grinding liquid can quickly enter the adsorption chamber 12, so that the small suspended particles in the grinding can be adsorbed, and then further filtered after passing through the filter chamber 13, and then extracted by the extraction pump for use, so that the grinding liquid is clean after multi-stage filtration, thereby increasing the service life.

[0034] The above are all preferred embodiments of the present application, and the protection scope of the present application is not limited thereto. Therefore, any equivalent changes made according to the structure, shape, and principle of the present application should be included in the protection scope of the present application.

Claims

1. Grinding machine wastewater treatment equipment, characterized by: The invention comprises a sewage tank (1), wherein the sewage tank (1) is provided with a suction device (2) for sending abrasive liquid in a polishing machine into the sewage tank (1), wherein a plurality of partition components (4) are arranged in the sewage tank (1) along the flow direction of sewage, wherein the plurality of partition components (4) divide the sewage tank (1) into a sedimentation chamber (11), an adsorption chamber (12) and a filtering chamber (13), and wherein the sewage tank is provided with a suction device (7) for sending abrasive liquid in the filtering chamber (13) into the polishing machine.

2. The grinding machine wastewater treatment equipment according to claim 1 is characterized in that: The sewage tank (1) is provided with a feed inlet, and a primary filter device (3) is provided on the feed inlet; the output pipe of the suction device (2) is connected to the primary filter device (3).

3. The grinding machine wastewater treatment equipment according to claim 2 is characterized in that: The primary filtering device (3) comprises a water filter box (31), on which a pull-out drawer (33) is arranged, and each drawer (33) is provided with filter cotton.

4. The grinding machine wastewater treatment equipment according to claim 1 is characterized in that: The partition assembly comprises a lower shielding plate (41) arranged on the bottom wall of the sewage tank, an upper shielding plate (42) arranged on the top wall of the sewage tank, a gap being arranged in the horizontal direction between the upper shielding plate (42) and the lower shielding plate (41), and the bottom wall of the upper shielding plate (42) being located below the top wall of the lower shielding plate (41).

5. The grinding machine wastewater treatment equipment according to claim 1 is characterized in that: A plurality of installation frames (5) are arranged in the adsorption chamber, and activated carbon packages are arranged in the installation frames (5).

6. The grinding machine wastewater treatment equipment according to claim 1, characterized in that: A safety filter (6) is arranged in the filter chamber (13).

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