Etching liquid copper recovery device

Abstract

The utility model discloses an etching liquid copper recovery device which comprises a tank body, supporting legs connected to the lower end face of the tank body, a transverse partition plate arranged on the upper side of an inner cavity of the tank body, a filter screen arranged in the partition plate and used for filtering waste liquid, a cleaning plate arranged on the upper side of the filter screen and used for cleaning the filter screen, and a sieve plate arranged on the lower side of the inner cavity of the tank body. According to the waste material recycling device, waste etching liquid can be filtered when waste materials are added, so that impurities and residues are prevented from entering the tank body to influence recycling work, meanwhile, the cleaning plate and the brush are used for cleaning the waste materials, and the waste materials can be recycled. And impurity residues filtered on the upper side of the filter screen can be cleaned, so that the impurity residues enter a collecting tank and are stored to facilitate subsequent treatment, and the influence of the impurity residues on filter holes is avoided.

Description

Technical Field

[0001] The utility model relates to the technical field related to copper recovery of etching liquid, and in particular to a copper recovery device for etching liquid. Background Art

[0002] Etching liquid is a raw material for copperplate engraving. It is a liquid that is engraved by corroding the characteristics of the material, including acidic copper chloride, alkaline copper chloride, ferric chloride and other types. However, a large amount of failed etching waste liquid will be generated during the etching production process, among which the alkaline etching waste liquid contains copper ions, ammonium cations, tetraammine copper ions, etc., so it is particularly important to recover copper from the waste etching liquid; the existing treatment method for etching waste liquid mainly uses chemical precipitation method, and regenerated copper sulfate solution is added to the etching waste liquid to separate copper from the waste liquid. However, before the etching waste liquid is initially treated for copper extraction, the waste liquid may contain some impurities and residues generated during the etching process, and the recovery device lacks a structure to treat it in advance, which leads to the residue affecting the copper extraction efficiency and quality of the waste etching liquid.

[0003] Therefore, we propose an etching solution copper recovery device to solve the above problems. Utility Model Content

[0004] The utility model aims to solve the shortcomings in the prior art and proposes an etching liquid copper recovery device.

[0005] In order to achieve the above purpose, the utility model adopts the following technical solutions:

[0006] A copper recovery device for etching liquid comprises a tank body, a leg is connected to the lower end surface of the tank body, a transverse partition is arranged on the upper side of the inner cavity of the tank body, a filter screen for filtering waste liquid is arranged in the partition, a cleaning plate for cleaning the filter screen is arranged on the upper side of the filter screen, a sieve plate is arranged on the lower side of the inner cavity of the tank body, a stirring rod is rotatably connected between the sieve plate and the filter screen, and a lifting worm for adjusting the height of the sieve plate is arranged on the upper side of the sieve plate.

[0007] Preferably, a discharge pipe is connected to the lower end surface of the tank body.

[0008] Preferably, a group of limiting grooves are opened on the inner wall of the tank body, and limiting blocks are connected to the side walls of the partition corresponding to the positions of the limiting grooves, and the limiting blocks extend into the limiting grooves to cooperate with them.

[0009] Preferably, the cleaning plate is rotatably connected to the filter screen, a brush is connected to the lower end surface of the cleaning plate, the brush is in contact with the filter screen, and a collecting groove is provided in the inner wall of the partition plate located outside the filter screen.

[0010] Preferably, a taking opening is provided on the side wall of the tank body, the taking opening cooperates with the position of the sieve plate, and a sealing plate is provided inside the taking opening to close it.

[0011] Preferably, a blade is connected to the side wall of the stirring rod, and the stirring rod and the cleaning plate rotate coaxially.

[0012] Preferably, an adjustment ring is connected to the inner wall of the tank body located on the upper side of the taking port, the inner wall of the adjustment ring is provided with threads, the lifting worm extends into the adjustment ring and is threadedly engaged with the adjustment ring, and the lower end of the lifting worm is rotatably connected to the screen plate.

[0013] Compared with the prior art, the beneficial effects of the utility model are:

[0014] When the utility model is in use, the etching waste liquid can be filtered when adding waste materials through the action of the arranged partition and filter screen, so as to prevent impurities and residues from entering the tank body and affecting the recycling work. At the same time, the impurities and residues after filtering on the upper side of the filter screen can be cleaned by the action of the cleaning plate and the brush, so that the impurities and residues enter the collecting tank and are stored for subsequent processing, thereby preventing the impurities and residues from affecting the filter holes. At the same time, after the recycling is completed, the lifting worm rotates and cooperates with the adjusting ring, so that the copper block can be driven to move up and separate from the waste liquid through the sieve plate, so that the user can take out the recycled copper block conveniently. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0016] Figure 2 This is a schematic diagram of the cross-sectional structure of the utility model;

[0017] Figure 3 It is a schematic diagram of the inner cavity structure of the tank body of the utility model.

[0018] In the figure: 1-tank body, 101-discharge pipe, 2-partition, 201-limiting groove, 202-limiting block, 3-filter, 4-cleaning plate, 401-brush, 402-collecting tank, 5-sieve plate, 501-access port, 502-sealing plate, 6-stirring rod, 601-blade plate, 7-lifting worm, 701-adjusting ring. DETAILED DESCRIPTION

[0019] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0020] In the description of the present invention, "plurality" means two or more than two, unless otherwise clearly and specifically defined.

[0021] In the description of the present utility model, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "provided with", "set / connected", "connected", etc. should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

[0022] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all of the embodiments.

[0023] Reference Figure 1-3 A copper recovery device for etching liquid comprises a tank body 1, a leg is connected to the lower end surface of the tank body 1 to support the device and ensure its stability, a discharge pipe 101 is connected to the lower end surface of the tank body 1, a transverse partition 2 is arranged on the upper side of the inner cavity of the tank body 1, a group of limiting grooves 201 are opened on the inner wall of the tank body 1, and a limiting block 202 is connected to the side wall of the partition 2 corresponding to the position of the limiting groove 201, and the limiting block 202 extends into the limiting groove 201 to cooperate with it, and the two limit the overall position of the partition 2 to prevent it from shaking and causing the filtering effect to be unstable.

[0024] A filter screen 3 for filtering waste liquid is arranged in the partition 2, and a cleaning plate 4 for cleaning the waste liquid is arranged on the upper side of the filter screen 3. The cleaning plate 4 is rotatably connected to the filter screen 3, and a brush 401 is connected to the lower end surface of the cleaning plate 4. The brush 401 is in contact with the filter screen 3. A collecting groove 402 is opened in the inner wall of the partition 2 located on the outer side of the filter screen 3. The filter screen 3 can filter the etching waste liquid when adding waste material, so as to prevent impurities and residues from entering the tank body 1. The cleaning plate 4 rotates, and the brush 401 cleans the impurities and residues after filtering on the upper side of the filter screen 3, so that the impurities and residues enter the collecting groove 402 for storage.

[0025] A sieve plate 5 is provided on the lower side of the inner cavity of the tank body 1, and an access port 501 is opened on the side wall of the tank body 1. The access port 501 cooperates with the position of the sieve plate 5, and a sealing plate 502 is provided in the access port 501 to close it. The lifting worm 7 can drive the sieve plate 5 to move to the access port 501, so that the user can take out the copper block on the upper side of the sieve plate 5.

[0026] A stirring rod 6 is rotatably connected between the sieve plate 5 and the filter screen 3, and a blade 601 is connected to the side wall of the stirring rod 6. The stirring rod 6 and the cleaning plate 4 rotate coaxially. A driving motor is installed on the upper side of the partition plate 2, and the power output end of the driving motor is connected to the rotating shaft of the stirring rod 6 and the cleaning plate 4, which can drive the two to rotate synchronously. The stirring rod 6 and the blade 601 cooperate to mix the internal liquid. A lifting worm 7 for adjusting its height is arranged on the upper side of the sieve plate 5, and a driving motor is installed on the inner wall of the tank body 1. The power output end of the driving motor is connected to a worm gear, and the worm gear cooperates with the lifting worm gear to drive it to move. An adjusting ring 701 is connected to the inner wall of the tank body 1 located on the upper side of the taking port 501, and the inner wall of the adjusting ring 701 is provided with a thread. The lifting worm gear 7 extends into the adjusting ring 701 and is screwed to cooperate with it. The lower end of the lifting worm gear 7 is rotatably connected to the sieve plate 5, and the rotation of the lifting worm gear cooperates with the adjusting ring, which can drive the copper block to move up and separate the waste liquid through the sieve plate.

[0027] The above embodiments are preferred implementation modes of the present invention, but the implementation modes of the present invention are not limited by the above embodiments. Any other changes, modifications, substitutions, combinations, and simplifications that do not deviate from the spirit and principle of the present invention should be equivalent replacement methods and are included in the protection scope of the present invention.

[0028] In the description of the present invention, it is necessary to understand that the terms indicating orientation or positional relationship are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

Claims

1. An etching liquid copper recovery device, comprising a tank body (1), wherein a support leg is connected to the lower end surface of the tank body (1), characterized in that: A transverse partition (2) is arranged on the upper side of the inner cavity of the tank body (1), a filter screen (3) for filtering waste liquid is arranged inside the partition (2), a cleaning plate (4) for cleaning the filter screen (3) is arranged on the upper side of the filter screen (3), a sieve plate (5) is arranged on the lower side of the inner cavity of the tank body (1), a stirring rod (6) is rotatably connected between the sieve plate (5) and the filter screen (3), and a lifting worm (7) for adjusting the height of the sieve plate (5) is arranged on the upper side of the sieve plate (5).

2. The etching solution copper recovery device according to claim 1, characterized in that: A discharge pipe (101) is connected to the lower end surface of the tank body (1).

3. The etching solution copper recovery device according to claim 1, characterized in that: A group of limiting grooves (201) are provided on the inner wall of the tank body (1); limiting blocks (202) are connected to the side walls of the partition plate (2) corresponding to the positions of the limiting grooves (201); and the limiting blocks (202) extend into the limiting grooves (201) to cooperate therewith.

4. The etching solution copper recovery device according to claim 1, characterized in that: The cleaning plate (4) is rotatably connected to the filter screen (3); a brush (401) is connected to the lower end surface of the cleaning plate (4); the brush (401) is in contact with the filter screen (3); and a collecting groove (402) is provided in the inner wall of the partition plate (2) located outside the filter screen (3).

5. The etching solution copper recovery device according to claim 1, characterized in that: The side wall of the tank body (1) is provided with a taking opening (501), the taking opening (501) is matched with the position of the sieve plate (5), and a sealing plate (502) is provided inside the taking opening (501) to close it.

6. The etching solution copper recovery device according to claim 1, characterized in that: A blade (601) is connected to the side wall of the stirring rod (6), and the stirring rod (6) and the cleaning plate (4) rotate coaxially.

7. The etching solution copper recovery device according to claim 5, characterized in that: An adjusting ring (701) is connected to the inner wall of the tank body (1) located above the taking port (501), and the inner wall of the adjusting ring (701) is provided with threads. The lifting worm (7) extends into the adjusting ring (701) and is threadedly engaged therewith, and the lower end of the lifting worm (7) is rotatably connected to the screen plate (5).

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