Flaky fine metal mask plate

Abstract

The utility model discloses a sheet-shaped fine metal mask which comprises two ends, an evaporation operation area is arranged between the two ends, the evaporation operation area is composed of a plurality of grid-shaped evaporation units, a separation area is arranged between every two adjacent evaporation units, the number of the separation areas is an odd number, and the number of the separation areas is larger than that of the grid-shaped evaporation units. The partition area comprises a middle partition area, and an upper partition area and a lower partition area which are symmetrically distributed by taking the middle partition area as a symmetry center, double-sided thinning areas are arranged at the positions, close to the evaporation units, of the two ends, and the thickness of the double-sided thinning areas is 1t; the thickness of the upper partition area is lt; the middle partition area is thick. After evaporation, a deposition evaporation film which is basically uniform in thickness and size is formed on the substrate, so that the quality performance of a product is improved, and the produced product can be used by high-end customers.

Description

Technical Field

[0001] The present application relates to the field of evaporation, and in particular to a sheet-shaped fine metal mask. Background Art

[0002] Organic electroluminescent devices (OLEDs) are gradually increasing their share in the display panel field due to their advantages such as high brightness, color saturation, lightness, and flexibility.

[0003] In the manufacturing process of OLED and AMOLED, evaporation is one of the key processes that determine the performance of OLED or AMOLED. The mask that cooperates with the evaporation system is the key to determine the performance of the evaporation system. The structure of the mask is as follows: Figure 1 The mask includes Frame 1, FMASK Sheet 2 and FMM Sheet 3. Frame 1 is a metal frame that stabilizes the structure. FMM Sheet 3 is a mask that forms small hole evaporation pixels. FMASK Sheet 2 is a spacer. FMASK Sheet 2 includes Howlling 21 and Cover 22. When assembling the mask, first weld each Howlling 21 to Frame 1, then weld Cover 22 to Frame 1, and finally weld FMM Sheet 3 to Frame 1 to form a structure like this. Figure 1 The structure of FMM Sheet3 is as follows. Figure 2 The FMM Sheet 3 includes two end heads 31 , and a vapor deposition operation area 32 is disposed between the two end heads 31 . The vapor deposition operation area 32 is composed of a plurality of grid-shaped vapor deposition units 321 , and a partition area 322 is disposed between two adjacent vapor deposition units 321 .

[0004] The size of the evaporation unit 321 of the early FMM Sheet3 is the same as the size of the product screen required by the customer. For the mobile phone screen, the size of the evaporation unit 321 is equal to the size of the mobile phone screen. However, in actual production, the evaporation unit 321 of this size is used for evaporation. The final product formed by the substrate after the evaporation process has color spots or abnormal color in local areas when the screen is illuminated, and cannot be a good product and cannot be used. In order to solve this problem, engineers conducted research and found that the reason for this phenomenon is that the mask belongs to the category of metal structural parts. Before the evaporation process is applied to the metal structural parts, there is a processing process to form stress distribution. The welding stress of metal structural parts is usually divided into transverse stress, longitudinal stress and welding stress related to the thickness of the structural parts according to their direction of action. If the stress distribution is uneven, the metal structural parts will be deformed. During the processing, the type and process of stress change are as follows: Among them, the transverse stress is a stress that is perpendicular to the weld axis, and the longitudinal stress is parallel to the weld axis. The reason for the welding stress in different directions is mainly because the local high temperature generated during the welding process causes uneven heating of the metal raw materials. And at different temperatures, the metal raw materials near the solder joints are mainly affected by thermal stress, while the metal raw materials far from the solder joints are mainly affected by compressive stress. Therefore, after the processing is completed, the four corners of the bowl are convex and the middle is concave, so that in the evaporation process, the thickness of the evaporation film deposited on the substrate is different, which makes the product become defective and unusable. In order to eliminate these stresses, engineers design a reasonable assembly sequence, welding sequence and welding direction on the one hand, specifically: a. The welds with larger shrinkage are ranked first in welding to ensure that their overall stress is minimized; b. The welding should be symmetrically distributed during the welding process, so that the stress interaction between the welds offsets the deformation of the surface metal structure; c. The segmented desoldering method is used during the desoldering process to ensure that the metal structure is heated evenly; d. Select the correct welding direction. On the other hand, the deformation is compensated and pre-deformation is performed, specifically by changing the size of the evaporation unit 321 so that the size of the evaporation unit 321 in the parallel direction with Cover22 is less than the size of the product screen.

[0005] The FMM Sheet3 that has undergone the above-mentioned pre-deformation is used in vapor deposition, and the final product formed by the substrate after the vapor deposition process can become a good product for general customers to use. However, after such an FMM Sheet3 is used in the vapor deposition process, the film thickness and size of the vapor deposition film deposited on the substrate are not uniform. The film thickness and size of the vapor deposition film at the center position are basically the same as the film thickness and size required by the customer, and the film thickness of the vapor deposition film far from the center position is thicker than the film thickness at the center position, but the film size is smaller than that at the center position. Specifically, the farther away from the center position, the thicker the film thickness and the smaller the film size, which cannot meet the requirements of high-end customers.

[0006] The above background technology is for facilitating the understanding of the present invention and is not a known technology disclosed to the general public before the application of the present invention. Utility Model Content

[0007] Based on the above problems, the present application provides an FMM Sheet, which is used to form a deposited evaporated film with basically uniform thickness and size on the substrate after evaporation, thereby improving the quality and performance of the product, and the products produced can be used by high-end customers.

[0008] An FMM Sheet comprises two end caps, a vapor deposition operation area is arranged between the two end caps, the vapor deposition operation area is composed of a plurality of grid-shaped vapor deposition units, a partition area is arranged between two adjacent vapor deposition units, the number of the partition areas is odd, the partition area comprises a middle partition area and an upper partition area and a lower partition area symmetrically distributed with the middle partition area, double-sided thinning areas are arranged at positions adjacent to the two end caps and the vapor deposition units, and the thickness of the double-sided thinning area is less than the thickness of the upper partition area and less than the thickness of the middle partition area.

[0009] Optionally, in the upper separation zone, the thickness away from the middle separation zone is less than the thickness adjacent to the middle separation zone, and it gradually becomes thinner; the thickness of the double-sided thinning zone is less than the thickness of the lower separation zone < the thickness of the middle separation zone, and in the lower separation zone, the thickness away from the middle separation zone is less than the thickness adjacent to the middle separation zone, and it gradually becomes thinner.

[0010] Optionally, the number of the partitions is 3, the lower surface of the upper partition, the lower surface of the lower partition, and the lower surface of the middle partition are in the same plane, the upper surface of the upper partition and the upper surface of the lower partition are in the same plane, and the upper surface of the upper partition and the upper surface of the lower partition are lower than the upper surface of the middle partition.

[0011] Optionally, the number of the partitions is 5, 7 or 9.

[0012] The utility model also provides an FMM Sheet.

[0013] An FMM Sheet comprises two end caps, a vapor deposition operation area is arranged between the two end caps, the vapor deposition operation area is composed of a plurality of grid-shaped vapor deposition units, a partition area is arranged between two adjacent vapor deposition units, the number of the partition areas is an even number, the partition area comprises a symmetrically distributed upper partition area and a lower partition area, and double-sided thinning areas are arranged at positions adjacent to the two end caps and the vapor deposition units, the thickness of the double-sided thinning areas is less than the thickness of the upper partition area, and the thickness of the double-sided thinning areas is less than the thickness of the lower partition area.

[0014] Optionally, in the upper partition area, the thickness away from the axis of FMM Sheet3 is less than the thickness close to the axis of FMM Sheet3, and the thickness gradually becomes thinner; in the lower partition area, the thickness away from the axis of FMM Sheet3 is less than the thickness close to the axis of FMM Sheet3, and the thickness gradually becomes thinner.

[0015] Optionally, the number of the separation zones is 2, the lower surface of the upper separation zone and the lower surface of the lower separation zone are in the same plane, the upper surface of the upper separation zone and the upper surface of the lower separation zone are in the same plane, the lower surface of the double-sided thinning zone is lower than the lower surface of the upper separation zone, and the upper surface of the double-sided thinning zone is flush with the upper surface of the upper separation zone.

[0016] Optionally, the number of the partitions is 4, 6 or 8.

[0017] The utility model also provides a mask plate.

[0018] A mask plate comprises a Frame, an FMASK Sheet and an FMM Sheet. The FMM Sheet comprises two end caps, a vapor deposition operation area is arranged between the two end caps, the vapor deposition operation area is composed of a plurality of grid-shaped vapor deposition units, a partition area is arranged between two adjacent vapor deposition units, the number of the partition areas is an even number, the partition area comprises a symmetrically distributed upper partition area and a lower partition area, double-sided thinning areas are arranged at positions adjacent to the two end caps and the vapor deposition units, the thickness of the double-sided thinning areas is less than the thickness of the upper partition area, the thickness of the double-sided thinning areas is less than the thickness of the lower partition area, in the upper partition area, the thickness away from the axis of FMM Sheet 3 is less than the thickness near the axis of FMM Sheet 3, and the thickness gradually becomes thinner, and in the lower partition area, the thickness away from the axis of FMM Sheet 3 is less than the thickness near the axis of FMM Sheet 3, and the thickness gradually becomes thinner.

[0019] Optionally, the number of the separation zones is 2, the lower surface of the upper separation zone and the lower surface of the lower separation zone are in the same plane, the upper surface of the upper separation zone and the upper surface of the lower separation zone are in the same plane, the lower surface of the double-sided thinning zone is lower than the lower surface of the upper separation zone, and the upper surface of the double-sided thinning zone is flush with the upper surface of the upper separation zone.

[0020] Utility model principle and beneficial effects:

[0021] The inventor of the present application has found through research that the reasons why the film thickness is thicker and the film size is smaller as the film is farther from the center are as follows:

[0022] When the substrate is undergoing the evaporation process, the positions of the substrate, mask, and heat source are as follows: Figure 3 , Figure 3In the figure, the substrate 4 is located above the mask 5, and the evaporation source 6 is located below the mask 5. During evaporation, the substrate 4 and the mask 5 are fixed, and the evaporation source 6 moves from one end to the other end below the two (the moving direction is parallel to Howlling21), and the organic material (deposition material) evaporates from the evaporation source 6 and is deposited upward onto the substrate 4, forming a vapor-deposited film on the substrate 4.

[0023] Therefore, during the process of evaporation deposition of organic materials, due to the repeated uneven heating and cooling of the mask 5 by the evaporation source 6, the large temperature gradient near the heating area (heat is in the form of radiation, the temperature is high at the center and low at the distance from the center), and the difference in thermal properties between the deposition layer and the mask 5, etc., a large temperature gradient is generated in the thickness direction and plane area of ​​the organic material heating area. Therefore, during the heating period caused by the heating of the organic material, due to the uneven temperature distribution, the heating area is heated and expanded, and the performance of the FMM Sheet3 in the high temperature area changes significantly, and the yield limit is reduced. The high yield limit and elastic modulus of the FMM Sheet3 around the heating area limit the expansion of the material in the heating area. Once the thermal stress exceeds the yield stress, plastic compressive strain is generated on the surface of the heating area, resulting in a small amount of material accumulation on the surface of the FMM Sheet3. During the cooling process, the temperature gradient decreases rapidly. As the temperature of the surface material decreases, the heating area begins to shrink, generating a large tensile stress, which will cause the FMM Sheet3 to bend and deform toward the evaporation source 6. Therefore, in the background technology, "the farther away from the center position, the thicker the film thickness, the smaller the film size, so that" is due to thermal stress resulting in uneven film thickness and size.

[0024] The present application eliminates the influence caused by thermal stress by changing the thickness of each separation area of ​​FMM Sheet3. After evaporation, a deposited evaporated film with basically uniform thickness and size is formed on the substrate, thereby improving the quality and performance of the product. The products produced can be used by high-end customers. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 This is a schematic diagram of the mask structure of the utility model background technology;

[0026] Figure 2 This is a schematic diagram of the FMM Sheet of the background technology of the utility model;

[0027] Figure 3 It is a schematic diagram of the evaporation operation principle;

[0028] Figure 4-5 It is a structural diagram of an existing FMM Sheet, wherein Figure 4 It is a top view schematic diagram. Figure 5 It is a side view schematic diagram;

[0029] Figure 6-7 It is a structural diagram of another existing FMM Sheet, wherein Figure 6 It is a top view schematic diagram. Figure 7 It is a side view schematic diagram;

[0030] Figure 8-9 This is a schematic diagram of the structure of an FMM Sheet of the utility model, wherein Figure 8 It is a top view schematic diagram. Fig. 9 It is a side view schematic diagram;

[0031] Figure 10-11 This is a schematic diagram of another FMM Sheet structure of the utility model, wherein Fig.10 It is a top view schematic diagram. Fig.11 It is a side view schematic diagram;

[0032] Fig.12 It is a schematic top view of another structural diagram of an FMM Sheet with an odd number of partitions of the utility model;

[0033] Fig.13 This is a schematic top view of the structure diagram of another FMM Sheet with an even number of separation areas according to the present invention. DETAILED DESCRIPTION

[0034] The present application will be further described below in conjunction with the accompanying drawings.

[0035] In the description of the present utility model, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "longitudinal", "lateral", "horizontal", "inside", "outside", "front", "back", "top", "bottom" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, or the positions or positional relationships in which the utility model product is usually placed when in use, and are only for the convenience of describing the present utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present utility model. In addition, the terms "first", "second", "third" and the like are only used to distinguish the description, and cannot be understood as indicating or implying relative importance.

[0036] In the description of the present invention, it is also necessary to explain that, unless otherwise clearly specified and limited, the terms "set", "open", "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0037] Please refer to Figure 4-5 , Figure 4-5 It is a structural diagram of an existing FMM Sheet, wherein Figure 4 It is a top view schematic diagram. Figure 5 It is a side view schematic diagram.

[0038] like Figure 4-5 An FMM Sheet 3 includes two end heads 31 , a vapor deposition operation area 32 is disposed between the two end heads 31 , the vapor deposition operation area 32 is composed of a plurality of grid-shaped vapor deposition units 321 , and a partition area 322 is disposed between two adjacent vapor deposition units 321 .

[0039] Figure 4 and Figure 5 For FMM Sheet3 in which the number of partition areas 322 is odd, when the number of partition areas 322 is odd (at this time the number of evaporation units 321 is even, which is the number of partition areas 322 plus 1), the partition areas 322 include a middle partition area 3221 and an upper partition area 3222 and a lower partition area 3223 symmetrically distributed with respect to the middle partition area 3221, and the thickness of the upper partition area 3222 = the thickness of the middle partition area 3221 = the thickness of the lower partition area 3223.

[0040] Please refer to Figure 6-7 , Figure 6-7 It is a structural diagram of another existing FMM Sheet, wherein Figure 6 It is a top view schematic diagram. Figure 7 It is a side view schematic diagram.

[0041] An FMM Sheet 3 includes two end heads 31 , a vapor deposition operation area 32 is arranged between the two end heads 31 , the vapor deposition operation area 32 is composed of a plurality of grid-shaped vapor deposition units 321 , and a separation area 322 is arranged between two adjacent vapor deposition units 321 .

[0042] Figure 6 and Figure 7 For FMM Sheet3 in which the number of partition areas 322 is even, when the number of partition areas 322 is even (at this time the number of evaporation units 321 is odd, which is the number of partition areas 322 plus 1), the partition areas 322 include symmetrically distributed upper partition areas 3222 and lower partition areas 3223, and the thickness of the upper partition area 3222 = the thickness of the lower partition area 3223.

[0043] Example 1

[0044] Please refer to Figure 8-9 , Figure 8-9 This is a schematic diagram of the structure of an FMM Sheet of the utility model, wherein Figure 8It is a top view schematic diagram. Fig. 9 It is a side view schematic diagram.

[0045] like Figure 8-9 An FMM Sheet 3 includes two end heads 31 , a vapor deposition operation area 32 is disposed between the two end heads 31 , the vapor deposition operation area 32 is composed of a plurality of grid-shaped vapor deposition units 321 , and a partition area 322 is disposed between two adjacent vapor deposition units 321 .

[0046] Figure 8 and Fig. 9 The FMM Sheet3 is an FMM Sheet 3 in which the number of partitions 322 is odd. When the number of partitions 322 is odd (at this time, the number of evaporation units 321 is even, which is the number of partitions 322 plus 1), the partitions 322 include a middle partition 3221 and an upper partition 3222 and a lower partition 3223 symmetrically distributed with the middle partition 3221. Double-sided thinning zones 33 are provided at the two end heads 31 adjacent to the evaporation units 321. The thickness of the double-sided thinning zones 33 is less than the thickness of the upper partition 3222 and less than the thickness of the middle partition 3221. In the upper partition 3222, the thickness away from the middle partition 3221 is less than the thickness adjacent to the middle partition 3221, and the thickness gradually becomes thinner. The thickness of the double-sided thinning area 33 is less than the thickness of the lower partition area 3223 and less than the thickness of the middle partition area 3221 . In the lower partition area 3223 , the thickness away from the middle partition area 3221 is less than the thickness close to the middle partition area 3221 , and the thickness gradually becomes thinner.

[0047] Figure 8 and Fig. 9 In FMM Sheet3, the number of partitions 322 is 3, the lower surface of the upper partition 3222, the lower surface of the lower partition 3223, and the lower surface of the middle partition 3221 are in the same plane, the upper surface of the upper partition 3222 and the upper surface of the lower partition 3223 are in the same plane, and the upper surface of the upper partition 3222 and the upper surface of the lower partition 3223 are lower than the upper surface of the middle partition 3221.

[0048] Example 2

[0049] This embodiment is the preparation process of embodiment 1.

[0050] The FMM Sheet3 structure of Example 1 is prepared by the following process:

[0051] S1: Take Figure 4-5 FMM Sheet3.

[0052] S2: Coating a photoresist film (dry or wet) on the upper and lower surfaces of the FMM Sheet 3, exposing, developing, and etching to form the structure of Example 1 Figure 8 and Fig. 9FMM Sheet3, Figure 8 and Fig. 9 In FMM Sheet3, the middle partition area 3221 is not etched during etching, and its thickness does not change before and after etching. The upper and lower surfaces of the double-sided thinning area 33 are etched during etching. After etching, the double-sided thinning area 33 is concave on the upper surface and concave on the lower surface compared to the surrounding area.

[0053] When the number of separation areas 322 is 3, the upper surfaces of the upper separation areas 3222 and the lower separation areas 3223 are etched, while the lower surfaces of the upper separation areas 3222 and the lower separation areas 3223 are not etched. After etching, the upper surfaces of the upper separation areas 3222 and the lower separation areas 3223 are concave compared to the surrounding areas.

[0054] It should be understood by those skilled in the art that the preparation method of this embodiment is only one preparation method of the structure of Embodiment 1, and those skilled in the art can also prepare the structure of Embodiment 1 by other preparation methods.

[0055] Example 3

[0056] Please refer to Figure 10-11 , Figure 10-11 This is a schematic diagram of another FMM Sheet structure of the utility model, wherein Fig.10 It is a top view schematic diagram. Fig.11 It is a side view schematic diagram.

[0057] like Figure 10-11 An FMM Sheet 3 includes two end heads 31 , a vapor deposition operation area 32 is disposed between the two end heads 31 , the vapor deposition operation area 32 is composed of a plurality of grid-shaped vapor deposition units 321 , and a partition area 322 is disposed between two adjacent vapor deposition units 321 .

[0058] Fig.10 and Fig.11 For FMM Sheet3 with an even number of partition areas 322, when the number of partition areas 322 is even (at this time, the number of evaporation units 321 is odd, which is the number of partition areas 322 plus 1), the partition areas 322 include symmetrically distributed upper partition areas 3222 and lower partition areas 3223, and double-sided thinning areas 33 are provided at the two end heads 31 adjacent to the evaporation units 321, the thickness of the double-sided thinning areas 33 is less than the thickness of the upper partition area 3222, the thickness of the double-sided thinning areas 33 is less than the thickness of the lower partition area 3223, in the upper partition area 3222, the thickness away from the axis of FMM Sheet3 is less than the thickness adjacent to the axis of FMM Sheet3, and the thickness gradually becomes thinner, and in the lower partition area 3223, the thickness away from the axis of FMM Sheet3 is less than the thickness adjacent to the axis of FMM Sheet3, and the thickness gradually becomes thinner.

[0059] Fig.10 and Fig.11 In FMM Sheet3, the number of partitions 322 is 2, the lower surface of the upper partition 3222 and the lower surface of the lower partition 3223 are in the same plane, the upper surface of the upper partition 3222 and the upper surface of the lower partition 3223 are in the same plane, the lower surface of the double-sided thinning zone 33 is lower than the lower surface of the upper partition 3222, and the upper surface of the double-sided thinning zone 33 is flush with the upper surface of the upper partition 3222.

[0060] Example 4

[0061] This embodiment is the preparation process of embodiment 3.

[0062] The FMM Sheet3 structure of Example 3 is prepared by the following process:

[0063] S1: Take Figure 6-7 FMM Sheet3.

[0064] S2: Coating a photoresist film (dry or wet) on the upper and lower surfaces of the FMM Sheet 3, exposing, developing, and etching to form the structure of Example 3 Fig.10 and Fig.11 FMM Sheet 3. The upper and lower surfaces of the double-sided thinning area 33 are etched during etching. After etching, the double-sided thinning area 33 is concave on the upper surface and concave on the lower surface compared to the surrounding area.

[0065] When the number of separation areas 322 is 2, the upper surfaces of the upper separation area 3222 and the lower separation area 3223 are etched, while the lower surfaces of the upper separation area 3222 and the lower separation area 3223 are not etched. After etching, the upper surfaces of the upper separation area 3222 and the lower separation area 3223 are concave compared to the surrounding areas.

[0066] It should be understood by those skilled in the art that the preparation method of this embodiment is only one preparation method of the structure of Embodiment 1, and those skilled in the art can also prepare the structure of Embodiment 1 by other preparation methods.

[0067] Please refer to Fig.12 and 13 , Fig.12 This is a top view schematic diagram of the structure diagram of another FMM Sheet 3 of the utility model in which the partition area 322 is singular. Fig.13 This is a top view schematic diagram of the structure diagram of another FMM Sheet 3 of the present invention in which the partition area 322 is an even number.

[0068] Example 5

[0069] Will Figure 8-9 (Example 1) and Figure 4-5 The FMM Sheet3 is used for evaporation, depositing organic materials on the substrate, and detecting the thickness of the coating and the size of each coating after evaporation. Compared with the two, the coating thickness of the utility model is more uniform and the coating sizes are basically equal.

[0070] Will Figure 10-11 (Example 1) and Figure 6-7 The FMM Sheet3 is used for evaporation, depositing organic materials on the substrate, and detecting the thickness of the coating and the size of each coating after evaporation. Compared with the two, the coating thickness of the utility model is more uniform and the coating sizes are basically equal.

[0071] The above description is only the preferred embodiment of the present application and is not intended to limit the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A sheet-shaped fine metal mask, comprising two end caps (31), a vapor deposition operation area (32) being arranged between the two end caps (31), the vapor deposition operation area (32) being composed of a plurality of grid-shaped vapor deposition units (321), a separation area (322) being arranged between two adjacent vapor deposition units (321), the number of the separation areas (322) being odd, the separation area (322) comprising a middle separation area (3221) and an upper separation area (3222) and a lower separation area (3223) being symmetrically distributed with respect to the middle separation area (3221), characterized in that: A double-sided thinning area (33) is provided adjacent to the two end caps (31) and the vapor deposition unit (321), and the thickness of the double-sided thinning area (33) is less than the thickness of the upper separation area (3222) and less than the thickness of the middle separation area (3221).

2. The sheet-shaped fine metal mask according to claim 1, characterized in that: In the upper partition area (3222), the thickness away from the middle partition area (3221) is less than the thickness adjacent to the middle partition area (3221), and the thickness gradually becomes thinner; the thickness of the double-sided thinning area (33) is less than the thickness of the lower partition area (3223) and the thickness of the middle partition area (3221); in the lower partition area (3223), the thickness away from the middle partition area (3221) is less than the thickness adjacent to the middle partition area (3221), and the thickness gradually becomes thinner.

3. The sheet-shaped fine metal mask according to any one of claims 1-2, characterized in that: The number of the partitions (322) is 3; the lower surface of the upper partition (3222), the lower surface of the lower partition (3223), and the lower surface of the middle partition (3221) are in the same plane; the upper surface of the upper partition (3222) and the upper surface of the lower partition (3223) are in the same plane; the upper surface of the upper partition (3222) and the upper surface of the lower partition (3223) are lower than the upper surface of the middle partition (3221).

4. The sheet-shaped fine metal mask according to any one of claims 1-2, characterized in that: The number of the partitions (322) is 5, 7 or 9.

5. The sheet-shaped fine metal mask according to claim 3, characterized in that: The number of the partitions (322) is 5, 7 or 9.

6. A sheet-shaped fine metal mask, comprising two end caps (31), a vapor deposition operation area (32) being arranged between the two end caps (31), the vapor deposition operation area (32) being composed of a plurality of grid-shaped vapor deposition units (321), a separation area (322) being arranged between two adjacent vapor deposition units (321), the number of the separation areas (322) being an even number, the separation area (322) comprising an upper separation area (3222) and a lower separation area (3223) being symmetrically distributed, characterized in that: A double-sided thinning area (33) is provided adjacent to the two end caps (31) and the vapor deposition unit (321), the thickness of the double-sided thinning area (33) being less than the thickness of the upper separation area (3222), and the thickness of the double-sided thinning area (33) being less than the thickness of the lower separation area (3223).

7. The sheet-shaped fine metal mask according to claim 6, characterized in that: In the upper separation zone (3222), the thickness away from the axis of the sheet-like fine metal mask is less than the thickness close to the axis of the sheet-like fine metal mask, and the thickness gradually becomes thinner. In the lower separation zone (3223), the thickness away from the axis of the sheet-like fine metal mask is less than the thickness close to the axis of the sheet-like fine metal mask, and the thickness gradually becomes thinner.

8. The sheet-shaped fine metal mask according to any one of claims 6-7, characterized in that: The number of the separation zones (322) is 2; the lower surface of the upper separation zone (3222) and the lower surface of the lower separation zone (3223) are in the same plane; the upper surface of the upper separation zone (3222) and the upper surface of the lower separation zone (3223) are in the same plane; the lower surface of the double-sided thinning zone (33) is lower than the lower surface of the upper separation zone (3222); and the upper surface of the double-sided thinning zone (33) is flush with the upper surface of the upper separation zone (3222).

9. The sheet-shaped fine metal mask according to any one of claims 6-7, characterized in that: The number of the partitions (322) is 4, 6 or 8.

10. The sheet-shaped fine metal mask according to claim 8, characterized in that: The number of the partitions (322) is 4, 6 or 8.

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