Pure water utilization device of silicon material cleaning machine

Abstract

A pure water utilization device of a silicon material cleaning machine relates to the technical field of silicon material cleaning and is characterized in that an overflow water flow collecting mechanism is mounted on an ultrasonic cleaning tank body, the water inlet end of the overflow water flow collecting mechanism corresponds to an overflow tank in position, and a communicating frame is positioned on the ultrasonic cleaning tank body and fixedly connected with the ultrasonic cleaning tank body; an inner groove of the communicating frame is communicated with the overflow groove of the ultrasonic cleaning groove body, a water collecting frame is installed on the communicating frame, and a water inlet of the water collecting frame is communicated with a water outlet of the communicating frame; according to the pure water utilization device of the silicon material cleaning machine, pure water overflowing out of the ultrasonic cleaning tank body is collected through the overflowing water flow collecting mechanism, the collected overflowing pure water can be supplied to other ultrasonic cleaning tank bodies to be used, waste of water resources is avoided, and meanwhile, the utilization rate of the pure water is improved. The silicon material entering the ultrasonic cleaning tank body is detected through the microwave sensor, and when the silicon material is not cleaned, water injection can be stopped, so that a worker can operate conveniently.

Description

Technical Field

[0001] The utility model relates to the technical field of silicon material cleaning, in particular to a pure water utilization device for a silicon material cleaning machine. Background Art

[0002] A large amount of pure water is required in the cleaning process of silicon materials, and pure water needs to be supplied for a long time. During cleaning, the pure water in the ultrasonic cleaning tank will overflow due to long-term injection. The overflowed pure water will be directly discharged through the drain tank, causing a waste of water resources. Utility Model Content

[0003] In order to overcome the deficiencies in the background technology, the utility model discloses a pure water utilization device for a silicon material cleaning machine. The utility model collects pure water overflowing from an ultrasonic cleaning tank body through an overflow water flow collection mechanism. The collected overflow pure water can be supplied to other ultrasonic cleaning tank bodies for use, thereby avoiding waste of water resources. At the same time, the silicon material entering the ultrasonic cleaning tank body is detected through a microwave sensor. When the silicon material is not being cleaned, water injection can be stopped, thereby facilitating operation by staff.

[0004] In order to achieve the purpose of the utility model, the utility model adopts the following technical solutions:

[0005] A pure water utilization device for a silicon material cleaning machine comprises an ultrasonic cleaning tank body provided with an overflow tank, an overflow water flow collecting mechanism installed on the ultrasonic cleaning tank body, and a water inlet end of the overflow water flow collecting mechanism corresponds to the position of the overflow tank.

[0006] The overflow water flow collection mechanism includes a connecting frame, a water collecting frame and a confluence pipe. The connecting frame is located on the ultrasonic cleaning tank body and is fixedly connected, and the inner groove on the connecting frame is connected to the overflow groove of the ultrasonic cleaning tank body. The connecting frame is installed with a water collecting frame, and the water inlet of the water collecting frame is connected to the drain outlet of the connecting frame. The water collecting frames are connected through the confluence pipe.

[0007] The bottom of the connecting frame is flush with the lower side of the overflow tank of the ultrasonic cleaning tank body.

[0008] The water collecting frame is in a triangular shape.

[0009] A microwave sensor is installed in the ultrasonic cleaning tank.

[0010] The microwave sensor is located on the upper side of the overflow tank of the ultrasonic cleaning tank body.

[0011] Due to the adoption of the above technical solution, the utility model has the following beneficial effects:

[0012] The utility model discloses a pure water utilization device for a silicon material cleaning machine, which collects pure water overflowing from an ultrasonic cleaning tank body through an overflow water flow collection mechanism. The collected overflow pure water can be supplied to other ultrasonic cleaning tank bodies for use, thereby avoiding waste of water resources. At the same time, a microwave sensor is used to detect silicon materials entering the ultrasonic cleaning tank body. When the silicon materials are not cleaned, water injection can be stopped, thereby facilitating operation by staff. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 It is a three-dimensional structural schematic diagram of the utility model;

[0014] Figure 2 It is a side view of the utility model;

[0015] 1. Ultrasonic cleaning tank body; 2. Overflow water collection mechanism; 201. Connecting frame; 202. Water collecting frame; 203. Converging pipe; 3. Microwave sensor. DETAILED DESCRIPTION

[0016] The present invention can be explained in detail through the following embodiments. The purpose of disclosing the present invention is to protect all technical improvements within the scope of the present invention.

[0017] Combined with Figure 1~2 The pure water utilization device of a silicon material cleaning machine comprises an ultrasonic cleaning tank body 1, and an overflow tank is provided on the ultrasonic cleaning tank body 1, an overflow water flow collecting mechanism 2 is installed on the ultrasonic cleaning tank body 1, and the water inlet end of the overflow water flow collecting mechanism 2 corresponds to the position of the overflow tank. The silicon material cleaning machine is required for cleaning the silicon material, and the ultrasonic cleaning tank body 1 is located in the silicon material cleaning machine, and a plurality of ultrasonic cleaning tank bodies 1 are provided in the silicon material cleaning machine, and the plurality of ultrasonic cleaning tank bodies 1 are respectively provided with corresponding numbers, and the 5-8# ultrasonic cleaning tank bodies are The water inlet volume of the tank body 1 is respectively set to 10, 9, 6 and 5 liters. The water overflowing from the 5-8# ultrasonic cleaning tank body 1 is discharged into the sub-tank body of the 2# ultrasonic cleaning tank body 1 through the overflow water flow collecting mechanism 2, and is used by the 2# ultrasonic cleaning tank body 1. 30 liters of pure water can be saved per minute. The cleaning is carried out for 7 hours a day, and about 13m³ of pure water is saved every day. 13*30 days*12 months=4680m³ / year of pure water is saved every year. The cost of pure water is 165 yuan, and the annual cost saving is 4680*165 yuan=77220 yuan.

[0018] The overflow water flow collection mechanism 2 includes a connecting frame 201, a water collecting frame 202 and a confluence pipe 203. The connecting frame 201 is located on the ultrasonic cleaning tank body 1 and is fixedly connected, and the inner tank on the connecting frame 201 is connected to the overflow tank of the ultrasonic cleaning tank body 1. The connecting frame 201 is installed with a water collecting frame 202, and the water inlet of the water collecting frame 202 is connected to the drain outlet of the connecting frame 201. The water collecting frames 202 are connected through the confluence pipe 203, and the drain outlet of the confluence pipe 203 is connected to the auxiliary tank body of the 2# ultrasonic cleaning tank body 1.

[0019] The bottom of the connecting frame 201 is flush with the lower side of the overflow tank of the ultrasonic cleaning tank body 1 .

[0020] The water collecting frame 202 is triangular in shape, and overflowing pure water is collected by the water collecting frame 202 to prevent the overflowing water flow from being too large and the overflowing water flow collecting mechanism 2 from being discharged in time.

[0021] A microwave sensor 3 is installed in the ultrasonic cleaning tank body 1, and the microwave sensor 3 is electrically connected to the main control device in the silicon material cleaning machine. The microwave sensor 3 detects objects and transmits the detection to the main control device in the silicon material cleaning machine. The main control device in the silicon material cleaning machine controls the water inlet of the ultrasonic cleaning tank body 1.

[0022] The microwave sensor 3 is located on the upper side of the overflow tank of the ultrasonic cleaning tank body 1 to prevent the pure water in the ultrasonic cleaning tank body 1 from splashing the microwave sensor 3 and hindering the normal operation of the microwave sensor 3 .

[0023] The pure water utilization device for a silicon material cleaning machine, when in use, a worker puts the silicon material to be cleaned into the ultrasonic cleaning tank body 1, and the silicon material passes through the microwave sensor 3 when entering the ultrasonic cleaning tank body 1. The microwave sensor 3 transmits the detected information to the main control device in the silicon material cleaning machine, and the ultrasonic cleaning tank body 1 is filled with water through the main control device in the silicon material cleaning machine. When the pure water in the ultrasonic cleaning tank body 1 reaches the overflow tank, the overflowing pure water is diverted to the water collecting rack 202 through the connecting rack 201, and the pure water in the water collecting rack 202 is diverted to the auxiliary tank body of the 2# ultrasonic cleaning tank body 1 through the confluence pipe 203, so as to be used by the 2# ultrasonic cleaning tank body 1.

[0024] The parts of the present invention that are not described in detail are prior art. Although the present invention is specifically demonstrated and introduced in conjunction with the preferred implementation scheme, there are many methods and ways to implement the technical solution. The above is only a preferred implementation scheme of the present invention. However, technical personnel in the relevant field should understand that various changes can be made to the present invention in form and details without departing from the spirit and scope of the present invention as defined in the attached claims, which are all within the scope of protection of the present invention.

Claims

1. A pure water utilization device for a silicon material cleaning machine, comprising an ultrasonic cleaning tank body (1), wherein an overflow tank is provided on the ultrasonic cleaning tank body (1), wherein: An overflow water flow collecting mechanism (2) is installed on the ultrasonic cleaning tank body (1), and the water inlet end of the overflow water flow collecting mechanism (2) corresponds to the position of the overflow tank; The overflow water flow collection mechanism (2) comprises a connecting frame (201), a water collecting frame (202) and a confluence pipe (203); the connecting frame (201) is located on the ultrasonic cleaning tank body (1) and is fixedly connected thereto; the inner groove on the connecting frame (201) is connected to the overflow groove of the ultrasonic cleaning tank body (1); the connecting frame (201) is installed with a water collecting frame (202); the water inlet of the water collecting frame (202) is connected to the drain outlet of the connecting frame (201); and the water collecting frames (202) are connected to each other via the confluence pipe (203); The bottom of the connecting frame (201) is flush with the bottom surface of the overflow tank of the ultrasonic cleaning tank body (1); The water collecting frame (202) is in a triangular shape.

2. The pure water utilization device for silicon material cleaning machine according to claim 1 is characterized in that: A microwave sensor (3) is installed in the ultrasonic cleaning tank (1).

3. The pure water utilization device for silicon material cleaning machine according to claim 2 is characterized in that: The microwave sensor (3) is located on the upper side of the overflow tank of the ultrasonic cleaning tank body (1).

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