Polymer cleaning device for reaction cavity of semiconductor equipment

Abstract

The utility model discloses a polymer cleaning device for a reaction cavity of semiconductor equipment, and belongs to the technical field of semiconductor integrated circuit manufacturing. Comprising a dust collector and a handheld handle, the dust collector is communicated with the handheld grab handle through a corrugated pipe, an adsorption opening is formed in one end of the handheld grab handle, and the interior of the adsorption opening is communicated with the corrugated pipe; a cleaning fixing part is movably installed on one side of the handheld grab handle, a cleaning workpiece is clamped between the cleaning fixing part and the handheld grab handle, and the cleaning end of the cleaning workpiece is located on one side of the adsorption opening; the polymer cleaning device for the reaction cavity of the semiconductor equipment achieves the effect of quickly removing dust when the polymer is cleaned.

Description

Technical Field

[0001] The present application relates to the technical field of semiconductor integrated circuit manufacturing, and in particular to a polymer cleaning device for a semiconductor equipment reaction chamber. Background Art

[0002] The working principle of the dry oxide layer etcher in the semiconductor wafer manufacturing plant is to introduce reaction gas into the reaction chamber in a vacuum environment, form plasma by adding radio frequency power, and etch the silicon wafer placed flat on the lower electrode to form the required pattern. At the same time, part of the by-products generated during the reaction process are deposited on the parts in the chamber to form polymers. In order to ensure the product yield, the equipment personnel will regularly clean the polymers in the reaction chamber.

[0003] However, the removal of polymers in the reaction chamber of existing semiconductor equipment is generally done manually by stripping and cleaning, and then wiping with a clean cloth. During the cleaning process, polymer dust will diffuse in and around the chamber for a long time, affecting the cleanliness of the working environment.

[0004] Therefore, it is necessary to provide a semiconductor equipment reaction chamber polymer cleaning device to solve the above problems.

[0005] It should be noted that the above information disclosed in this background technology section is only for understanding the background technology of the present application concept, and therefore, it may contain information that does not constitute the prior art. Summary of the invention

[0006] Based on the above problems existing in the prior art, the problem to be solved by the present application is: to provide a polymer cleaning device for a reaction chamber of a semiconductor device to achieve the effect of rapid dust removal when cleaning polymers.

[0007] The technical solution adopted by the present application to solve the technical problem is: a semiconductor equipment reaction chamber polymer cleaning device, comprising a dust collector and a handheld handle; the dust collector and the handheld handle are connected through a bellows, one end of the handheld handle is provided with a suction port, and the interior of the suction port is connected to the bellows;

[0008] A cleaning fixture is movably installed on one side of the handheld handle, a cleaning workpiece is clamped between the cleaning fixture and the handheld handle, and the cleaning end of the cleaning workpiece is located on one side of the adsorption port; thus, the operator manipulates the handheld handle to make the cleaning workpiece remove the polymer, and at the same time, starts the dust collector to collect dust in the reaction chamber through the adsorption port at the handheld handle; the cleaning workpiece can be a blade workpiece, a brush workpiece, or a scouring pad workpiece according to operational requirements.

[0009] Furthermore, a mounting seat is provided on one side of the handheld handle, and a placement groove is provided on the end face of the mounting seat; the cleaning fixture is in a horizontal L-shape, and a connecting seat is provided on the short side end face of the cleaning fixture, and the connecting seat and the placement groove are installed by mortise and tenon joints; thereby, the mounting seat eliminates the horizontal degree of freedom of the cleaning fixture.

[0010] Furthermore, the mounting seat is connected to the connecting seat via a rotating shaft; thus, the cleaning fixture can be rotated around the mounting seat to open for quick replacement of different cleaning workpieces. The quick replacement device for cleaning tools saves a lot of time and improves work quality and efficiency.

[0011] Furthermore, the mounting seat and the connecting seat are connected by plugging and unplugging.

[0012] Furthermore, buckle locks are provided on both sides of the handheld handle, and buckles are provided on both sides of the cleaning fixture, and the buckle locks and buckles on the same side are a matching structure; thus, the buckle lock formed by the buckle locks and the buckles eliminates the rotational freedom of the cleaning fixture.

[0013] Furthermore, a threaded hole is provided on one side of the cleaning fixing piece close to the handheld handle, and a bolt is installed on the inner wall of the threaded hole through a threaded connection, and one end of the bolt passes through the threaded hole to press against the cleaning workpiece; thus, the bolt presses the cleaning workpiece against the handheld handle to fix the cleaning workpiece, and can also adapt to the installation of cleaning workpieces of different thicknesses.

[0014] Furthermore, a dust collection box is clamped at one end of the dust collector; thus, the dust collection box can store dust in the reaction chamber.

[0015] Furthermore, a handle is fixedly mounted on the top of the dust collector; thus, the handle facilitates the operator to control the position of the dust collector.

[0016] The beneficial effect of the present application is that a semiconductor equipment reaction chamber polymer cleaning device provided in the present application is provided with a handheld handle and a cleaning fixture. The cleaning fixture can assemble the cleaning workpiece on the handheld handle, thereby achieving efficient dust recovery while cleaning the polymer, greatly reducing the possibility of dust contamination of the equipment.

[0017] In addition to the above-described purposes, features and advantages, the present application also has other purposes, features and advantages. The present application will be further described in detail with reference to the drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The drawings in the specification, which constitute a part of the present application, are used to provide further understanding of the present application. The illustrative embodiments of the present application and their descriptions are used to explain the present application and do not constitute improper limitations on the present application.

[0019] In the attached picture:

[0020] Figure 1 This is an overall schematic diagram of a semiconductor equipment reaction chamber polymer cleaning device in the present application;

[0021] Figure 2 for Figure 1 Assembly drawing of the middle hand grip, cleaning fixture and cleaning workpiece;

[0022] Figure 3 for Figure 2 A side view schematic diagram of the overall structure;

[0023] Figure 4 for Figure 2 A three-dimensional diagram of the middle hand grip;

[0024] Figure 5 for Figure 2 A three-dimensional schematic diagram of a cleaning fixture;

[0025] Among them, the reference numerals in the figure are:

[0026] 1. Dust collector; 2. Bellows; 3. Handle; 31. Suction port; 32. Mounting seat; 321. Placement slot; 33. Lock; 4. Cleaning fixture; 41. Connecting seat; 42. Threaded hole; 43. Bolt; 5. Dust collection box; 6. Handle; 7. Cleaning workpiece. DETAILED DESCRIPTION

[0027] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0028] In order to enable those skilled in the art to better understand the solution of the present application, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present application.

[0029] Embodiment 1:

[0030] like Figure 1-2 Figure 5 As shown, the present application provides a semiconductor equipment reaction chamber polymer cleaning device, which is used in semiconductor production, referring to Figure 1, comprising a dust collector 1 and a handheld handle 3; the dust collector 1 and the handheld handle 3 are connected via a bellows 2, one end of the handheld handle is provided with an adsorption port 31, the interior of the adsorption port 31 is connected with the bellows 2; a vacuum cleaner motor is provided inside the dust collector 1, the vacuum cleaner motor rotates at a high speed, and sucks air from the adsorption port 31;

[0031] Reference Figure 2 A cleaning fixture 4 is movably installed on one side of the handheld handle 3, and a cleaning workpiece 7 is clamped between the cleaning fixture 4 and the handheld handle 3, and the cleaning end of the cleaning workpiece 7 is located on one side of the adsorption port 31; therefore, the cleaning workpiece 7 can be a blade workpiece, a brush workpiece, or a scouring pad workpiece according to operation requirements; the operator manipulates the handheld handle 3 to make the cleaning workpiece 7 remove the polymer, and at the same time, starts the dust collector 1 to collect dust in the reaction chamber through the adsorption port 31 at the handheld handle 3.

[0032] in:

[0033] Reference Figure 2 , Figure 3 , Figure 4 , Figure 5 A mounting seat 32 is provided on one side of the hand-held handle 3, and a placement groove 321 is provided on the end face of the mounting seat 32; the cleaning fixture 4 is a horizontal L-shape, and a connecting seat 41 is provided on the short side end face of the cleaning fixture 4, and the connecting seat 41 and the placement groove 321 are installed by mortise and tenon joints; thus, the mounting seat 32 eliminates the horizontal degree of freedom of the cleaning fixture 4.

[0034] The mounting seat 32 is connected to the connecting seat 41 via a rotating shaft; thus, the cleaning fixture 4 can be rotated around the mounting seat 32 to open for quick replacement of different cleaning workpieces 7, saving time and indirectly improving work efficiency and quality.

[0035] Buckles 33 are provided on both sides of the handheld handle 3, and buckles 44 are provided on both sides of the cleaning fixture 4. The buckles 33 and buckles 44 on the same side are a matching structure; thus, the buckle lock formed by the buckle 33 and the buckle 44 eliminates the rotational freedom of the cleaning fixture 4.

[0036] in addition:

[0037] Reference Figure 1 A dust collecting box 5 is clamped at one end of the dust collector 1 to store dust in the reaction chamber. A handle 6 is fixedly installed on the top of the dust collector 1 to facilitate the operator to control the position of the dust collector 1.

[0038] Embodiment 2: Based on Embodiment 1, a replacement scheme is proposed for the connection method between the mounting seat 32 and the connecting seat 41, as follows:

[0039] The mounting seat 32 and the connecting seat 41 are connected by plugging and pulling.

[0040] Embodiment 3: Based on Embodiments 1 and 2, the stability of the cleaning workpiece 7 is optimized as follows:

[0041] Reference Figure 2 , Figure 3 , Figure 5 A threaded hole 42 is provided on one side of the cleaning fixing member 4 close to the hand-held handle 3, and a bolt 43 is installed on the inner wall of the threaded hole 42 through a threaded connection. One end of the bolt 43 passes through the threaded hole 34 and presses against the cleaning workpiece 7; thus, the bolt 43 presses the cleaning workpiece 7 against the hand-held handle 3 to fix the cleaning workpiece 7, and can also adapt to the installation of cleaning workpieces 7 of different thicknesses.

[0042] The above description is only the preferred embodiment of the present application and is not intended to limit the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A polymer cleaning device for a semiconductor device reaction chamber, characterized in that: It comprises a dust collector (1) and a handheld handle (3); the dust collector (1) and the handheld handle (3) are connected via a bellows (2); one end of the handheld handle (3) is provided with a suction port (31), and the interior of the suction port (31) is connected to the bellows (2); A cleaning fixture (4) is movably mounted on one side of the handheld handle (3), a cleaning workpiece (7) is clamped between the cleaning fixture (4) and the handheld handle (3), and a cleaning end of the cleaning workpiece (7) is located on one side of the suction port (31).

2. The semiconductor equipment reaction chamber polymer cleaning device according to claim 1, characterized in that: A mounting seat (32) is provided on one side of the handheld handle (3), and a placement groove (321) is provided on the end surface of the mounting seat (32); the cleaning fixture (4) is in a horizontal L-shape, and a connecting seat (41) is provided on the short side end surface of the cleaning fixture (4), and the connecting seat (41) and the placement groove (321) are installed by mortise and tenon joints.

3. The semiconductor equipment reaction chamber polymer cleaning device according to claim 2, characterized in that: The mounting seat (32) and the connecting seat (41) are connected via a rotating shaft.

4. The semiconductor equipment reaction chamber polymer cleaning device according to claim 2, characterized in that: The mounting seat (32) and the connecting seat (41) are connected by plugging and unplugging.

5. A semiconductor equipment reaction chamber polymer cleaning device according to claim 3 or 4, characterized in that: Buckles (33) are provided on both sides of the handheld handle (3), and buckles are provided on both sides of the cleaning fixture (4), and the buckles (33) and buckles on the same side are in a matching structure.

6. The semiconductor equipment reaction chamber polymer cleaning device according to claim 5, characterized in that: A threaded hole (42) is provided on one side of the cleaning fixture (4) close to the hand-held handle (3); a bolt (43) is installed on the inner wall of the threaded hole (42) through a threaded connection; one end of the bolt (43) passes through the threaded hole (42) and abuts against the cleaning workpiece (7).

7. The semiconductor equipment reaction chamber polymer cleaning device according to claim 6, characterized in that: A dust collection box (5) is clamped on one end of the dust collector (1).

8. The semiconductor equipment reaction chamber polymer cleaning device according to claim 7, characterized in that: A handle (6) is fixedly mounted on the top of the dust collector (1).

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