Moving support of chemical vapor deposition equipment

Abstract

The utility model relates to the technical field of chemical vapor deposition, in particular to a chemical vapor deposition equipment moving support which comprises a base and two sets of opposite supporting frames installed on the base, each supporting frame comprises two supporting rods which are oppositely and fixedly connected to one side of the base, and the opposite faces of the two sets of supporting frames are provided with placing plates; a containing plate is arranged on the base, a loading tray is placed on the containing plate, a connecting support for connecting the two sets of supporting frames together is arranged at the top ends of the supporting frames, an ultrasonic vibration instrument with the output end connected with the supporting frames is arranged on one side of the base, a substrate to be coated is placed on the loading tray, and then the base is installed in a bin body of chemical vapor deposition equipment. Then, the ultrasonic vibration instrument is intermittently started, so that in the coating process, the vibrated to-be-coated film moves up and down, the bottom surface of the to-be-coated substrate can also be in contact with sediments in a solution, and the to-be-coated substrate can be coated without turning over the bottom surface of the to-be-coated substrate; therefore, the purpose of improving the coating efficiency of the chemical vapor deposition equipment is achieved.

Description

Technical Field

[0001] The present application relates to the technical field of chemical vapor deposition, and in particular to a moving support of a chemical vapor deposition device. Background Art

[0002] Chemical vapor deposition is an important thin film preparation technology. According to the physical state of the reaction medium, chemical vapor deposition can be divided into two types: gas phase chemical vapor deposition and liquid phase chemical vapor deposition. Gas phase chemical vapor deposition uses gaseous reactants to directly deposit on the solid surface at high temperature; liquid phase chemical vapor deposition is to react gaseous reactants with chemical substances in the solution to generate deposits, and then precipitate the deposits from the solution to the solid surface.

[0003] In the prior art, a two-stage deposition method is usually used for chemical vapor deposition of substrates to be coated, that is, when the coating of the substrates to be coated in the chamber of the chemical vapor deposition equipment is half completed, the chamber door is opened, the substrates to be coated are turned over and then coated for the second time. Each group of substrates to be coated needs to be turned over and then coated for the second time, which is very troublesome and inefficient. Therefore, a moving bracket for chemical vapor deposition equipment is required. Utility Model Content

[0004] In view of the deficiencies in the prior art, the purpose of the present application is to provide a motion bracket for chemical vapor deposition equipment to solve the technical problem of low coating efficiency of chemical vapor deposition equipment in the prior art.

[0005] The above-mentioned purpose of the present application is achieved through the following technical solutions: a moving bracket of a chemical vapor deposition equipment, including a base and two groups of opposite support frames installed on the base, the support frames include two support rods fixedly connected to one side of the base, and the opposite sides of the two groups of support frames are installed with mutually horizontal placement plates, and the placement plates are placed on the loading trays. The top of the support frame is provided with a connecting bracket that connects the two groups of support frames together, and an ultrasonic vibrator with an output end connected to the support frame is fixed on one side of the base.

[0006] By adopting the above technical scheme, the substrate to be coated is placed on the loading tray, and then the base is installed in the chamber of the chemical vapor deposition equipment, and then the ultrasonic vibrator is started intermittently. Because the connecting bracket connects the two sets of support frames, the ultrasonic vibrator only needs to vibrate one support rod to vibrate the entire moving bracket, so that the substrate to be coated on the loading tray will be vibrated at intervals. In this way, during the coating process, the vibrated substrate to be coated will move up and down on the loading tray, so that the bottom surface of the substrate to be coated can also contact the sediment in the solution during the coating process, so that the substrate to be coated can be coated without turning over the bottom surface, thereby achieving the purpose of improving the coating efficiency of the chemical vapor deposition equipment, and the mutually horizontal placement plates can make the loading tray more stable.

[0007] Furthermore, a plurality of discharge pits are provided on the loading tray, and ejector pins extend upward from the discharge pits.

[0008] By adopting the above technical scheme, although the ultrasonic vibrator, the loading tray and the support frame are arranged so that the substrate to be coated can be coated without turning over the bottom surface, the bottom surface of the substrate to be coated contacts the loading tray again after the vibration is completed, which makes the bottom surface of the substrate to be coated press the loading tray to squeeze the sediment on the side of the bottom surface of the substrate to be coated but not completely attached out of the bottom surface of the substrate to be coated, so that the coating on the bottom surface of the substrate to be coated is incomplete. The arrangement of the discharge pit and the ejector pin solves this technical problem, and the substrate to be coated is placed in the discharge pit, so that the ejector pin supports the substrate to be coated so that it has a certain distance from the bottom of the discharge pit, so that when the substrate to be coated moves up and down due to vibration, the bottom surface will not completely contact the discharge tray, thereby making the coating of the substrate to be coated more complete and improving the coating effect of the chemical vapor deposition equipment.

[0009] Furthermore, a rotating disc is provided on the bottom surface of the base, a mounting seat is provided on the bottom surface of the rotating disc, a driving motor fixedly connected to the mounting seat is provided between the mounting seat and the rotating disc, an output end of the driving motor is fixedly connected to the rotating disc, the base is sleeved on the output end of the driving motor and is located above the rotating disc, a raised arc portion is provided around the periphery of the rotating disc, and a raised portion is provided on the bottom surface of the base for cooperating with the raised arc portion to make the base move up and down.

[0010] By adopting the above technical scheme, the effect of the ultrasonic vibrator vibrating the substrate to be coated is very small, so that the amplitude of the up and down movement of the substrate to be coated is not very large, so that the coating completion time is longer, and the arrangement of the rotating disk, the driving motor, and the raised arc portion and the raised portion solves this technical problem. The driving motor is started to control the rotation of the rotating disk, and the raised arc portion extends upward around the rotating disk. During the rotation of the rotating disk, the raised arc portion intermittently contacts the raised portion on the bottom surface of the base. When the raised arc portion contacts the raised portion, the base moves upward along the output end of the driving motor, and then the rotating disk continues to rotate, the raised arc portion disengages from the raised portion, causing the base to slide down, so that the bracket on the base can also move up and down with the base, so that the substrate to be coated can move up and down in the solution, so that it contacts the sediment in the solution faster, thereby shortening the coating completion time and improving the coating efficiency of the chemical vapor deposition equipment.

[0011] Furthermore, a plurality of through holes are provided in the discharge pit.

[0012] By adopting the above technical solution, the multiple through holes can reduce the resistance when the base moves up and down, making the up and down movement more convenient.

[0013] Furthermore, the placement plates are provided in multiple groups and are evenly distributed on the two groups of support frames.

[0014] By adopting the above technical solution, multiple groups of placement plates can place multiple loading trays so that the entire bracket can place more substrates to be coated at one time for coating, thereby improving the coating efficiency of the chemical vapor deposition equipment.

[0015] Furthermore, the connecting bracket includes a clamping rod located between two support rods, the clamping rod is located between the two support rods of the support frame, and the clamping notch for clamping the charging tray is formed on the clamping rod.

[0016] By adopting the above technical solution, the loading tray is clamped by the clamping notch, so that the loading tray will not separate from the support frame when the base moves up and down, so that the substrate to be coated can be better coated. The loading tray is connected by the clamping rod to connect the two sets of support frames together.

[0017] Furthermore, the support rod is made of a heat-resistant and corrosion-resistant material.

[0018] Furthermore, the ultrasonic vibrator is waterproof and high temperature resistant.

[0019] In summary, the present application includes at least one of the following beneficial technical effects.

[0020] By setting up the support frame, loading tray, connecting bracket and ultrasonic vibrator, it is achieved to place the substrate to be coated on the loading tray, then install the base in the chamber of the chemical vapor deposition equipment, and then start the ultrasonic vibrator intermittently. Because the connecting bracket connects the two sets of support frames, the ultrasonic vibrator only needs to vibrate one support rod to vibrate the entire moving bracket, so that the substrate to be coated on the loading tray will be vibrated at intervals. In this way, during the coating process, the vibrated substrate to be coated will move up and down on the loading tray, so that the bottom surface of the substrate to be coated can also contact the sediment in the solution during the coating process, so that the substrate to be coated can be coated without turning over the bottom surface, thereby achieving the purpose of improving the coating efficiency of the chemical vapor deposition equipment.

[0021] By arranging the ejector pin, the rotating disc, the driving motor, the raised arc portion and the raised portion, the substrate to be coated is placed in the discharge pit, so that the ejector pin supports the substrate to be coated so that it has a certain distance from the bottom of the discharge pit, so that when the substrate to be coated moves up and down due to vibration, the bottom surface will not completely contact the discharge disc, thereby making the coating of the substrate to be coated more complete, thereby improving the coating effect of the chemical vapor deposition equipment, and starting the driving motor to control the rotation of the rotating disc. During the rotation of the rotating disc, the raised arc portion of the rotating disc intermittently contacts the raised portion on the bottom surface of the base, and when the raised arc portion contacts the raised portion, the base moves upward along the output end of the driving motor, and then the rotating disc continues to rotate, the raised arc portion disengages from the raised portion, causing the base to slide down, so that the bracket on the base can also move up and down with the base, so that the substrate to be coated can move up and down in the solution, so that it contacts the sediment in the solution faster, thereby shortening the coating completion time, and improving the coating efficiency of the chemical vapor deposition equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is the overall structure diagram of the embodiment;

[0023] Figure 2 yes Figure 1 Enlarged view of part A in the middle;

[0024] Figure 3 It is another view of the overall structure of the embodiment;

[0025] Figure 4 yes Figure 3 Enlarged view of part B in the middle.

[0026] Figure numerals: 1. base; 10. raised portion; 2. support frame; 20. support rod; 21. placement plate; 3. loading tray; 30. discharge pit; 31. ejector pin; 32. through hole; 4. connecting bracket; 40. clamping rod; 41. clamping notch; 5. ultrasonic vibrator; 6. rotating disc; 60. mounting seat; 61. driving motor; 62. raised arc portion. DETAILED DESCRIPTION

[0027] The present application is further described in detail below with reference to the accompanying drawings.

[0028] Example, see Figure 1 , Figure 2 , Figure 3 , Figure 4 The chemical vapor deposition equipment motion bracket comprises a base 1 and two sets of opposite support frames 2 mounted on the base 1, the support frames 2 comprising two support rods 20 fixedly connected to one side of the base 1, mutually horizontal placement plates 21 are installed on the opposite sides of the two sets of support frames 2, a loading tray 3 is placed on the placement plate 21, a connecting bracket 4 for connecting the two sets of support frames 2 together is provided on the top of the support frame 2, an ultrasonic vibrator 5 whose output end is connected to the support frame 2 is fixed on one side of the base 1, a substrate to be coated is placed on the loading tray 3, and then the base 1 is installed in the warehouse of the chemical vapor deposition equipment, Then, the ultrasonic vibrator 5 is started intermittently. Since the connecting bracket 4 connects the two groups of support frames 2, the ultrasonic vibrator 5 only needs to vibrate one support rod 20 to vibrate the entire moving bracket, so that the substrate to be coated on the loading tray 3 will be vibrated at intervals. In this way, during the coating process, the vibrated substrate to be coated will move up and down on the loading tray 3, so that the bottom surface of the substrate to be coated can also contact the sediment in the solution during the coating process, so that the substrate to be coated can be coated without turning over the bottom surface, thereby achieving the purpose of improving the coating efficiency of the chemical vapor deposition equipment.

[0029] Although the ultrasonic vibrator 5, the loading tray 3 and the support frame 2 can be used to coat the substrate without turning over the bottom surface, the bottom surface of the substrate to be coated contacts the loading tray 3 again after the vibration is completed. This causes the bottom surface of the substrate to be coated to press the loading tray 3 to squeeze the sediment on the side of the bottom surface of the substrate to be coated but not completely attached out of the bottom surface of the substrate to be coated, resulting in incomplete coating on the bottom surface of the substrate to be coated. A plurality of discharge pits 30 are provided on the loading tray 3, and a ejector pin 31 extends upward from the discharge pit 30. The substrate to be coated is placed in the discharge pit 30, so that the ejector pin 31 supports the substrate to be coated at a certain distance from the bottom of the discharge pit 30. In this way, when the substrate to be coated moves up and down due to the vibration, the bottom surface will not completely contact the discharge tray, thereby making the coating of the substrate to be coated more complete and improving the coating effect of the chemical vapor deposition equipment.

[0030] Moreover, the effect of the ultrasonic vibrator 5 on the substrate to be coated is very small, so that the amplitude of the up and down movement of the substrate to be coated is not very large, so that the coating is completed in a longer time. In order to solve this technical problem, in this embodiment, a rotating disk 6 is provided on the bottom surface of the base 1, and a mounting seat 60 is provided on the bottom surface of the rotating disk 6. A driving motor 61 fixedly connected to the mounting seat 60 is provided between the mounting seat 60 and the rotating disk 6. The output end of the driving motor 61 is fixedly connected to the rotating disk 6. The base 1 is sleeved on the output end of the driving motor 61 and is located above the rotating disk 6. A raised arc portion 62 is provided on the periphery of the rotating disk 6, and the raised arc portion 62 extends upward. A raised portion 10 for cooperating with the raised arc portion 62 to make the base 1 move up and down is provided on the bottom surface of the base 1. The driving motor is started 61 controls the rotation of the rotating disk 6. During the rotation of the rotating disk 6, its raised arc portion 62 intermittently contacts the raised portion 10 on the bottom surface of the base 1. When the raised arc portion 62 contacts the raised portion 10, the base 1 moves upward along the output end of the driving motor 61. Then the rotating disk 6 continues to rotate and the raised arc portion 62 disengages from the raised portion 10 to make the base 1 slide down. In this way, the bracket on the base 1 can also move up and down with the base 1. In this way, the substrate to be coated can move up and down in the solution, so that it can contact the sediment in the solution faster, thereby shortening the time for coating to be completed, and improving the coating efficiency of the chemical vapor deposition equipment. A plurality of through holes 32 are provided in the discharge pit 30. The plurality of through holes 32 can reduce the resistance of the base 1 when it moves up and down, making it more convenient to move up and down.

[0031] The connecting bracket 4 includes a clamping rod 50 located between the two support rods 20. The clamping rod 40 is provided with a clamping notch 41 for clamping the loading tray 3. The loading tray 3 is clamped by the clamping notch 41, so that the loading tray 3 will not be separated from the supporting frame 2 when the base 1 moves up and down, so that the substrate to be coated can be better coated. The loading tray 3 is connected by the clamping rod 50, so that the two groups of supporting frames 2 are connected together.

[0032] In order to further improve the coating efficiency of the chemical vapor deposition equipment, in this embodiment, a plurality of placing plates 21 are provided and evenly distributed on two groups of support frames 2. The plurality of placing plates 21 can place a plurality of loading trays 3 so that the support as a whole can place more substrates to be coated at one time for coating, thereby improving the coating efficiency of the chemical vapor deposition equipment. The plurality of placing plates 21 can place a plurality of loading trays 3 so that the support as a whole can place more substrates to be coated at one time for coating.

[0033] The specific implementation process is as follows: the substrate to be coated is placed in the discharge pit 30 of the loading tray 3, so that the ejector pin 31 is against the substrate to be coated, and then the mounting base 60 is installed in the chamber of the chemical vapor deposition equipment, the chamber door is closed for liquid deposition, and the drive motor 61 is started at the same time, and then the ultrasonic vibrator 5 is started intermittently. After the coating is completed, the loading tray 3 is pulled out from the support frame 2, and the coated substrate on the loading tray 3 is taken out.

[0034] The embodiments of this specific implementation method are all preferred embodiments of the present application, and are not intended to limit the protection scope of the application. Therefore, all equivalent changes made based on the structure, shape, and principle of the present application should be included in the protection scope of the present application.

Claims

1. A chemical vapor deposition equipment motion support, characterized in that: The invention comprises a base (1) and two groups of supporting frames (2) mounted on the base (1) opposite to each other, wherein the supporting frames (2) comprise two supporting rods (20) fixedly connected to one side of the base (1) opposite to each other, mutually horizontal placement plates (21) being mounted on the opposite sides of the two groups of supporting frames (2), a loading tray (3) being placed on the placement plates (21), a connecting bracket (4) connecting the two groups of supporting frames (2) together being arranged at the top end of the supporting frames (2), and an ultrasonic vibrator (5) whose output end is connected to the supporting frames (2) being fixed on one side of the base (1).

2. The chemical vapor deposition equipment moving bracket according to claim 1, characterized in that: The loading tray (3) is provided with a plurality of discharge pits (30), and ejector pins (31) extend upward from the discharge pits (30).

3. The chemical vapor deposition equipment moving bracket according to claim 1, characterized in that: The bottom surface of the base (1) is provided with a rotating disk (6), the bottom surface of the rotating disk (6) is provided with a mounting seat (60), a driving motor (61) fixedly connected to the mounting seat (60) is provided between the mounting seat (60) and the rotating disk (6), the output end of the driving motor (61) is fixedly connected to the rotating disk (6), the base (1) is sleeved on the output end of the driving motor (61) and is located above the rotating disk (6), the periphery of the rotating disk (6) is provided with a raised arc portion (62), and the bottom surface of the base (1) is provided with a raised portion (10) for cooperating with the raised arc portion (62) to enable the base (1) to move up and down.

4. The chemical vapor deposition equipment moving bracket according to claim 2, characterized in that: A plurality of through holes (32) are provided in the discharge pit (30).

5. The chemical vapor deposition equipment moving bracket according to claim 1, characterized in that: The placement plates (21) are provided in multiple groups and are evenly distributed on the two groups of support frames (2).

6. The chemical vapor deposition equipment moving bracket according to claim 1, characterized in that: The connecting bracket (4) comprises a clamping rod (40) located between two supporting rods (20), and a clamping notch (41) for clamping the charging tray (3) is provided on the clamping rod (40).

7. The chemical vapor deposition equipment moving bracket according to claim 1, characterized in that: The support rod (20) is made of a heat-resistant and corrosion-resistant material.

8. The chemical vapor deposition equipment moving bracket according to claim 1, characterized in that: The ultrasonic vibrator (5) is a waterproof and high temperature resistant ultrasonic vibrator (5).

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