Liquid medicine treatment system

Abstract

The utility model discloses a liquid medicine treatment system, which is characterized in that a chemical plating bath unit, a cleaning unit and a drying unit are arranged in the conveying direction of a conveying unit, and a first liquid supply unit is used for providing liquid medicine for the chemical plating bath unit so as to carry out liquid medicine treatment on a substrate; the second liquid supply unit provides a water source for the cleaning unit to clean the substrate, so that the substrate is subjected to liquid medicine treatment in an automatic mode, the manufacturing procedure is simplified, manual operation is not needed, the production efficiency is improved, the production cost is reduced, and meanwhile, the quality and consistency of a perovskite buried interface are improved.

Description

Technical Field

[0001] The present application relates to the technical field of perovskite solar cells, and in particular to a liquid medicine processing system. Background Art

[0002] In recent years, solar cells made of organic-inorganic halide perovskite materials have attracted widespread attention from the industry due to their simple preparation method, high conversion efficiency and low preparation cost.

[0003] At present, large-area modules in perovskite solar cells adopt an inverted structure. Among the inverted perovskite cells, inverted (trans) perovskite solar cells have attracted much attention due to their low energy consumption, simple structure and high cost performance. The performance of inverted perovskite solar cells depends largely on the hole transport layer (HTL) of the inverted perovskite solar cell and its contact with the bottom of the perovskite layer. The bottom contact plays an important role in the inverted structure. It not only acts as an electron barrier but also as a buried bottom interface for perovskite growth. Therefore, the treatment of the buried bottom interface of the perovskite in the inverted structure becomes particularly important.

[0004] Chemical treatment of the hole transport layer interface is one of the effective ways to improve the perovskite buried interface. At present, the chemical treatment of the perovskite buried interface of the transverse small battery or component usually requires manual operation, which is not only inconvenient, but also poses a safety hazard. Utility Model Content

[0005] The utility model aims to provide a liquid medicine treatment system to solve the technical problem that liquid medicine treatment of perovskite buried bottom interface of small inverse batteries or components requires manual operation, the process is cumbersome and automation cannot be achieved.

[0006] To achieve the above-mentioned purpose, the utility model provides a liquid treatment system, comprising: a conveying unit, which is composed of at least a plurality of conveying rollers and is used to convey a substrate; a chemical plating bath unit, which is arranged in the conveying direction of the conveying unit; a first liquid supply unit, which is connected to the chemical plating bath unit, and the first liquid supply unit comprises a first liquid supply tank, a first conveying pipeline and a first discharge pipeline, one end of the first conveying pipeline is connected to the first liquid supply tank, and the other end is connected to the chemical plating bath unit; one end of the first discharge pipeline is connected to the chemical plating bath unit, and the other end is connected to the first liquid supply tank or Idle; a cleaning unit, the cleaning unit is arranged in the conveying direction of the conveying unit and is located downstream of the chemical plating bath unit; a second liquid supply unit, the second liquid supply unit is connected to the cleaning unit, the second liquid supply unit includes a second liquid supply tank, a second conveying pipeline and a second discharge pipeline, one end of the second conveying pipeline is connected to the second liquid supply tank, and the other end is connected to the cleaning unit; one end of the second discharge pipeline is connected to the cleaning unit, and the other end is connected to the second liquid supply tank or idle; and a drying unit, the drying unit is arranged in the conveying direction of the conveying unit and is located downstream of the cleaning unit.

[0007] In some embodiments, the chemical plating bath unit includes: a processing unit, which is arranged in the conveying direction of the conveying unit to spray the substrate with chemical liquid; and a reaction unit, which is arranged in the conveying direction of the conveying unit and is located downstream of the processing unit to control the reaction time of the chemical liquid on the substrate; and / or the cleaning unit includes a first cleaning unit, which is arranged in the conveying direction of the conveying unit and is located downstream of the chemical plating bath unit; the first cleaning unit includes a first cleaning chamber and at least one second spray assembly, and the second spray assembly is arranged in the first cleaning chamber and faces the substrate; wherein the chemical liquid processing system also includes a second pump, a second filter, a second flowmeter and a second valve arranged in sequence on the second conveying pipeline, wherein the second pump is connected to the second liquid supply tank, and the second flowmeter is connected to the second spray assembly.

[0008] In some embodiments, the processing unit includes a processing chamber and at least one first spray assembly, the first spray assembly is disposed in the processing chamber and facing the substrate, each of the spray assemblies includes a first nozzle and a second nozzle, the axial direction of the first nozzle is set to form a first angle α with the conveying direction of the conveying unit, the axial direction of the second nozzle is set to form a second angle β with the conveying direction of the conveying unit, and the angle of the first angle α is smaller than the angle of the second angle β.

[0009] In some embodiments, the liquid medicine processing system also includes a first pump, a first filter, a first valve and a first flow meter which are sequentially arranged on the first delivery pipeline, wherein the first pump is connected to the first liquid supply tank, and the first flow meter is connected to the first spray assembly.

[0010] In some embodiments, the liquid medicine processing system also includes a first three-way valve and a second three-way valve arranged on the first discharge pipeline, the first end of the first three-way valve is connected to the first liquid supply unit, the second end of the first three-way valve is connected to the processing unit, and the third end of the first three-way valve is idle; the first end of the second three-way valve is connected to the first liquid supply unit, the second end of the second three-way valve is connected to the reaction unit, and the third end of the second three-way valve is idle.

[0011] In some embodiments, the cleaning unit also includes a second cleaning unit, which is arranged in the conveying direction of the conveying unit and is located downstream of the first cleaning unit; the liquid medicine processing system also includes a third liquid supply tank, a third conveying pipeline and a third discharge pipeline, one end of the third conveying pipeline is connected to the third liquid supply tank, and the other end is connected to the second cleaning unit; one end of the third discharge pipeline is connected to the second cleaning unit, and the other end is connected to the second liquid supply tank or is idle; the second cleaning unit includes a second cleaning chamber and at least one third spray assembly, and the third spray assembly is arranged in the second cleaning chamber and faces the substrate; wherein, the liquid medicine processing system also includes a third filter, a third liquid supply valve, a third valve and a third flow meter which are sequentially arranged on the third conveying pipeline, the third filter is connected to the third liquid supply tank, and the third flowmeter is connected to the third spray assembly.

[0012] In some embodiments, the liquid medicine processing system also includes: a third three-way valve arranged on the second discharge pipeline, the first end of the third three-way valve is connected to the second liquid supply unit, the second end of the third three-way valve is connected to the first cleaning unit, and the third end of the third three-way valve is idle; a fourth three-way valve arranged on the third discharge pipeline, the first end of the fourth three-way valve is connected to the second liquid supply unit, the second end of the fourth three-way valve is connected to the second cleaning unit, and the third end of the fourth three-way valve is idle.

[0013] In some embodiments, the liquid treatment system further includes: a lifting mechanism, which is disposed below the conveying unit and located at the end of the chemical plating bath unit to lift and lower the substrate; the movement mode of the lifting mechanism includes vertical lifting or oblique lifting.

[0014] In some embodiments, the drying unit includes a drying chamber and at least one wind knife, the wind knife is arranged in the drying chamber and faces the substrate, and the axial direction of the wind knife is set at a third angle γ with the conveying direction of the conveying unit, 0°<γ<30°.

[0015] In some embodiments, the medical liquid treatment system also includes: a first waste liquid discharge pipeline and a first overflow pipeline, one end of the first waste liquid discharge pipeline is connected to the first liquid supply tank, and the other end is idle, one end of the first overflow pipeline is connected to the first liquid supply tank, and the other end is connected to the first waste liquid discharge pipeline; a second waste liquid discharge pipeline and a second overflow pipeline, one end of the second waste liquid discharge pipeline is connected to the second liquid supply tank, and the other end is idle, one end of the second overflow pipeline is connected to the second liquid supply tank, and the other end is connected to the second waste liquid discharge pipeline; the first liquid supply tank is used to store medical liquid; the second liquid supply tank is used to store a first cleaning liquid; the third liquid supply tank is used to store a second cleaning liquid.

[0016] The technical effect of the utility model is to provide a liquid treatment system, which arranges a chemical plating bath unit, a cleaning unit and a drying unit in the conveying direction of the conveying unit, and provides liquid to the chemical plating bath unit through a first liquid supply unit to perform liquid treatment on a substrate, and provides a water source to the cleaning unit through a second liquid supply unit to perform cleaning treatment on the substrate, so that the substrate is treated with liquid in an automated manner, the process is simplified, and manual operation is not required, thereby improving production efficiency and reducing production costs, while improving the quality and consistency of the perovskite buried interface. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] The technical solution and other beneficial effects of the present application will be made apparent by describing in detail the specific implementation methods of the present application in conjunction with the accompanying drawings.

[0018] Figure 1 A schematic diagram of the structure of a liquid medicine processing system provided in an embodiment of the present application.

[0019] Figure 2 It is a schematic structural diagram of the first liquid supply unit and the chemical plating bath unit of the present application.

[0020] Figure 3 This is a structural schematic diagram of the second liquid supply unit and the cleaning unit of the present application.

[0021] Figure 4 This is a schematic structural diagram of the two nozzles of the first spray assembly provided in an embodiment of the present application, respectively forming an angle.

[0022] Figure 5 This is a schematic diagram of the structure of the drying unit provided in an embodiment of the present application.

[0023] Figure 6 for Figure 5 Schematic diagram showing that the axis of the wind knife forms an angle with the transport direction of the substrate.

[0024] Figure 7 A schematic diagram of the structure of the lifting mechanism provided in an embodiment of the present application for tilting and lifting a substrate.

[0025] The components of the attached drawings are identified as follows:

[0026] 1 film feeding unit; 110 film feeding chamber; 2 chemical plating bath unit; 21 processing unit; 210 processing chamber; 11 first spray assembly; 111 first nozzle; 112 second nozzle; 22 reaction unit; 220 reaction chamber; 3 cleaning unit; 31 first cleaning unit; 310 first cleaning chamber; 32 second cleaning unit; 320 second cleaning chamber; 4 drying unit; 410 drying chamber; 5 film discharging unit; 510 film discharging chamber; 6 conveying unit; 7 first liquid supply unit; 113 The first liquid supply tank; 114 the first delivery pipeline; 115 the first pump; 116 the first filter; 117 the first valve; 118 the first flow meter; 119 the first liquid supply valve; 120 the first discharge pipeline; 121 the first three-way valve; 122 the second three-way valve; 123 the liquid supply pipeline; 124 the first liquid supply valve; 125 the second liquid supply valve; 126 the liquid supply filter; 127 the first liquid level sensor; 128 the first exhaust gas exhaust valve; 129 the first waste liquid exhaust pipeline; 130 the first an overflow pipeline; 8 a second liquid supply unit; 311 a second liquid supply tank; 312 a second delivery pipeline; 313 a second spray assembly; 314 a second pump; 315 a second filter; 316 a second flow meter; 317 a second valve; 318 a second liquid supply valve; 319 a second discharge pipeline; 321 a third three-way valve; 322 a clean water supply pipeline; 323 a first clean water supply valve; 324 a second clean water supply valve; 325 a second liquid level sensor; 326 a second exhaust gas discharge valve; 327 a second waste liquid discharge pipeline; 328 second overflow pipeline; 329 third liquid supply tank; 330 third delivery pipeline; 331 third filter; 332 third liquid supply valve; 333 third valve; 334 third flow meter; 335 third discharge pipeline; 336 fourth three-way valve; 3201 third spray assembly; 410 drying chamber; 411 air knife; 412 drying pipeline; 413 drying filter; 414 first drying valve; 415 second drying valve; 416 drying flow valve; 9 lifting mechanism; 100 substrate. DETAILED DESCRIPTION

[0027] The technical solutions in the embodiments of the present application will be described clearly and completely below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the present application.

[0028] In the description of the present application, it should be understood that the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the present application, "plurality" means two or more, unless otherwise clearly and specifically defined.

[0029] In the description of this application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, an electrical connection, or mutual communication; it can be a direct connection, or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0030] To solve the technical problem that the liquid treatment of the buried interface of perovskite in small inverted batteries or components requires manual operation, the process is cumbersome, and automation cannot be achieved. The embodiment of the present application provides a liquid treatment system, by arranging the chemical plating bath unit, the cleaning unit and the drying unit in the conveying direction of the conveying unit, and providing liquid to the chemical plating bath unit through the first liquid supply unit to treat the substrate with liquid, and providing water to the cleaning unit through the second liquid supply unit to clean the substrate, so that the substrate is treated with liquid in an automated manner, the process is simplified, no manual operation is required, and the quality and consistency of the buried interface of the perovskite are improved while improving production efficiency and reducing production costs. The following is a detailed description.

[0031] like Figure 1 As shown, a liquid treatment system is provided, which includes a film feeding unit 1, a chemical plating bath unit 2, a cleaning unit 3, a drying unit 4, a film discharging unit 5, a first liquid supply unit 7 and a second liquid supply unit 8 along the conveying direction of the conveying unit 6.

[0032] The conveying unit 6 is composed of at least a plurality of conveying rollers and is used to convey a substrate 100. Guide rollers are provided on both sides of the conveying rollers, which can convey the substrate 100 along a preset route.

[0033] The film feeding unit 1 includes a film feeding chamber 110 . The height of the conveying roller in the film feeding chamber 110 is consistent with the height of the upstream conveyor belt. The film feeding chamber 110 is mainly used to receive the upstream substrate 100 .

[0034] The chemical plating bath unit 2 is arranged in the conveying direction of the conveying unit 6. The chemical plating bath unit 2 is used to perform liquid treatment on the substrate 100 to achieve pretreatment of the substrate 100 before film formation to avoid subsequent film formation failure or poor film formation effect on the substrate 100.

[0035] like Figures 1 to 3 As shown, the first liquid supply unit 7 is connected to the chemical plating bath unit 2, and the first liquid supply unit 7 includes a first liquid supply tank 113, a first delivery pipeline 114 and a first discharge pipeline 120. The first liquid supply tank 113 is used to store liquid medicine. One end of the first delivery pipeline 114 is connected to the first liquid supply tank 113, and the other end is connected to the chemical plating bath unit 2, so that the first liquid supply tank 113 delivers liquid medicine to the chemical plating bath unit 2. One end of the first discharge pipeline 120 is connected to the chemical plating bath unit 2, and the other end is connected to the first liquid supply tank 113. In this way, the first liquid supply tank 113 can be used to transport liquid medicine to the chemical plating bath unit 2, and the liquid medicine used to process the substrate 100 can be recovered to the first liquid supply tank 113 for recycling, saving liquid medicine. Alternatively, one end of the first exhaust pipe 120 is connected to the chemical plating bath unit 2, and the other end is idle, so that the chemical liquid after processing the substrate 100 can be discharged from the chemical plating bath room, avoiding the chemical liquid after processing the substrate 100 from being recovered to the first liquid supply tank 113, so as to improve the cleanliness of the substrate 100 by improving the cleanliness of the chemical liquid.

[0036] The second liquid supply unit 8 is connected to the cleaning unit 3, and the second liquid supply unit 8 includes a second liquid supply tank 311, a second delivery pipeline 312 and a second discharge pipeline 319. The second liquid supply tank 311 is used to store the first cleaning liquid, and the first cleaning liquid can be pure water. One end of the second delivery pipeline 312 is connected to the second liquid supply tank 311, and the other end is connected to the cleaning unit 3, so that the second liquid supply tank 311 delivers clean water to the cleaning unit 3. One end of the second discharge pipeline 319 is connected to the second liquid supply tank 311, and the other end is connected to the cleaning unit 3, so that the clean water used for processing the substrate 100 can be recycled to the second liquid supply tank 311 for recycling and water saving. One end of the second discharge pipeline 319 is connected to the cleaning unit 3, and the other end is idle, so that the clean water used for processing the substrate 100 can be discharged from the cleaning unit 3, avoiding the clean water after processing the substrate 100 to be recycled to the second liquid supply tank 311, so as to improve the cleanliness of the clean water to improve the cleanliness of the substrate 100.

[0037] like Figure 1As shown, the drying unit 4 is disposed in the conveying direction of the conveying unit 6 and is located downstream of the cleaning unit 3. The drying unit 4 is mainly used to dry the substrate 100.

[0038] The sheet discharging unit 5 is disposed in the conveying direction of the conveying unit 6 and is located downstream of the drying unit 4. The sheet discharging unit 5 transports the dried substrate 100 to the next process.

[0039] In one embodiment, the chemical plating bath unit 2 includes a processing unit 21 and a reaction unit 22. The processing unit 21 is arranged in the conveying direction of the conveying unit 6, and the processing unit 21 performs a liquid spraying process on the substrate 100. The reaction unit 22 is arranged in the conveying direction of the conveying unit 6 and is located downstream of the processing unit 21. After the substrate 100 is fully sprayed with liquid in the processing unit 21, the liquid carried by the substrate 100 will be conveyed to the reaction unit 22. By setting the conveying speed of the conveying unit 6, for example, setting the conveying speed of the conveying roller, the residence time of the liquid on the substrate 100 is limited, thereby controlling the reaction time of the liquid on the substrate 100.

[0040] The processing unit 21 includes a processing chamber 210 and at least one first spray assembly 11. The first spray assembly 11 is disposed in the processing chamber 210 and faces the substrate 100. The first spray assembly 11 can be fixed on the wall of the processing chamber 210 by a fixing member.

[0041] like Figure 4 As shown, each spray assembly includes a first nozzle 111 and a second nozzle 112. The axial direction of the first nozzle 111 is set at a first angle α with the conveying direction of the conveying unit 6, and the axial direction of the second nozzle 112 is set at a second angle β with the conveying direction of the conveying unit 6. The angle of the first angle α is smaller than the angle of the second angle β. Among them, 10°≤α≤60°, 60°≤β≤90°, so that the use of two first nozzles 111 and second nozzles 112 with different angles can make each position of the substrate 100 be sprayed. Among them, α can be any value of 10°, 15°, 30°, 45°, 55°, and 60°, and is not specifically limited here. β can be any value of 60°, 65°, 70°, 75°, 80°, 85°, and 90°, and is not specifically limited here.

[0042] like Figure 2As shown, the liquid medicine treatment system further includes a first pump 115, a first filter 116, a first valve 117 and a first flow meter 118 which are sequentially arranged on the first delivery pipeline 114, wherein the first pump 115 is connected to the first liquid supply tank 113, and the first flow meter 118 is connected to the processing unit 21. The first pump 115 can extract the liquid medicine from the first liquid supply tank 113 to the first spray assembly 11, and deliver the liquid medicine to the two nozzles of the first spray assembly 11 through the first filter 116, and spray the liquid medicine onto the substrate 100 through the first nozzle 111 and the second nozzle 112. At the same time, the liquid medicine spraying flow rate can be controlled by manually adjusting the opening of the first valve 117, and the flow rate of the liquid medicine acting on the substrate 100 is recorded by the first flow meter 118 to avoid excessive or insufficient spraying on the substrate 100. The number of the first valve 117 can be one, and one first valve 117 controls the flow rate of at least two nozzles. Of course, the number of the first valves 117 may also be set according to the number of nozzles in the first spray assembly 11 , that is, one first valve 117 corresponds to one nozzle.

[0043] The liquid medicine processing system further includes a first liquid supply valve 119 disposed on the first delivery pipeline 114. The first liquid supply valve 119 is disposed between the first pump 115 and the first liquid supply tank 113 and is used to open or close the first liquid supply tank 113. The first liquid supply valve 119 is equivalent to the main switch of the first delivery pipeline 114. When other components are abnormal or need maintenance (for example, when the filter element of the first filter 116 is replaced), the first liquid supply valve 119 can be closed to maintain other components.

[0044] The liquid medicine treatment system also includes a first three-way valve 121 and a second three-way valve 122 arranged on the first discharge pipeline 120. The first end of the first three-way valve 121 is connected to the first liquid supply unit 7, the second end of the first three-way valve 121 is connected to the processing chamber 210 of the processing unit 21, and the third end of the first three-way valve 121 is idle. By opening the first end and the second end of the first three-way valve 121, the excess liquid medicine sprayed on the substrate 100 can be recovered from the processing chamber 210 to the first liquid supply tank 113 to save the amount of liquid medicine. Alternatively, when the cleanliness requirement of the liquid medicine is high, the liquid medicine can be discharged as waste liquid by opening the first end and the third end of the first three-way valve 121. The first end of the second three-way valve 122 is connected to the first liquid supply unit 7, the second end of the second three-way valve 122 is connected to the reaction unit 22, and the third end of the second three-way valve 122 is idle. By opening the first end and the second end of the second three-way valve 122, the liquid medicine flowing from the substrate 100 to the reaction chamber 220 of the reaction unit 22 can be recovered to the first liquid supply unit 7 to save the amount of liquid medicine. Alternatively, by opening the first end and the third end of the second three-way valve 122, the liquid medicine can be discharged as waste liquid.

[0045] The liquid medicine processing system further includes a liquid medicine supply pipeline 123 connected to the first liquid supply tank 113, and a first liquid medicine supply valve 124, a second liquid medicine supply valve 125, and a liquid medicine supply filter 126. Along the direction of liquid medicine supply, the liquid medicine supply filter 126, the first liquid medicine supply valve 124, and the second liquid medicine supply valve 125 are sequentially arranged on the liquid medicine supply pipeline 123. The liquid medicine supply pipeline 123 transfers the liquid medicine obtained according to the formula outside the first liquid supply tank 113 to the first liquid supply tank 113. Among them, the first liquid medicine supply valve 124 is a manual valve, and the second liquid medicine supply valve 125 is a pneumatic valve.

[0046] The liquid medicine treatment system further includes a first liquid level sensor 127, a first waste gas discharge valve 128, a first waste liquid discharge pipeline 129 and a first overflow pipeline 130. The first liquid level sensor 127 is disposed in the first liquid supply tank 113 to detect the liquid level of the first liquid supply tank 113. The first waste liquid discharge pipeline 129 is connected to the first liquid supply tank 113 and is located at the bottom of the first liquid supply tank 113. The first waste gas discharge valve 128 is disposed on the first waste liquid discharge pipeline 129 to control the opening or closing of the first liquid supply tank 113. The first waste liquid discharge pipeline 129 is connected to the first overflow pipeline 130.

[0047] During the production process, when the liquid in the first liquid supply tank 113 is lower than the low liquid level, the first liquid level sensor 127 detects a signal, the first liquid supply valve 124 is opened, and new liquid is added to the storage tank. When the liquid is added to a high liquid level, the first liquid level sensor 127 detects a signal, the liquid is fully added, and the new liquid stops supplying. The first liquid supply tank 113 recovers the excess liquid after rinsing the substrate 100, and adds an appropriate amount of liquid to the first liquid supply tank 113. When the liquid in the first liquid supply tank 113 has been used for too long and does not meet the production needs, the first waste gas exhaust valve 128 can be opened to discharge the waste liquid. After the waste liquid in the first liquid supply tank 113 is discharged, the first liquid supply valve 124 and the second liquid supply valve 125 are opened to supply new liquid to the first liquid supply tank 113. When it is added to the high liquid level, the liquid is not full and the liquid supply is stopped. When the first liquid level sensor 127 fails, the first liquid supply tank 113 continues to replenish liquid. The liquid in the first liquid supply tank 113 is overfilled and overflows to the first waste liquid discharge pipeline 129 through the first overflow pipeline 130 of the first liquid supply tank 113, thereby avoiding the risk of liquid leakage.

[0048] like Figure 1 As shown, the cleaning unit 3 includes a first cleaning unit 31 . The first cleaning unit 31 is disposed in the conveying direction of the conveying unit 6 and is located downstream of the chemical plating bath unit 2 . The first cleaning unit 31 performs a cleaning process on the substrate 100 .

[0049] like Figure 3As shown, the first cleaning unit 31 includes a first cleaning chamber 310 and at least one second spray assembly 313 . The second spray assembly 313 is disposed in the first cleaning chamber 310 and faces the substrate 100 .

[0050] The liquid medicine treatment system further includes a second pump 314, a second filter 315, a second flow meter 316 and a second valve 317 which are sequentially arranged on the second delivery pipeline 312, wherein the second pump 314 is connected to the second liquid supply tank 311, and the second valve 317 is connected to the second spray assembly 313. The second liquid supply tank 311 is used to store the first cleaning liquid, which is clean water.

[0051] The second pump 314 can pump clean water from the second liquid supply tank 311 to the second spray assembly 313, and then pass the clean water through the second filter 315 to the multiple nozzles of the second spray assembly 313, so that the liquid on the substrate 100 can be cleaned by spraying the nozzles. At the same time, the opening of the second valve 317 can be manually adjusted to control the size of the clean water spray flow rate, and the second flow meter 316 can be used to record the flow rate of the clean water acting on the substrate 100. The number of the second valves 317 can be one or more, and one second valve 317 controls the flow rate of at least two nozzles. Of course, the number of the second valves 317 can also be set according to the number of nozzles in the second spray assembly 313, that is, one second valve 317 corresponds to one nozzle.

[0052] like Figure 3 As shown, the liquid medicine processing system further includes a second liquid supply valve 318 disposed on the second delivery pipeline 312, and the second liquid supply valve 318 is disposed between the second pump 314 and the second liquid supply tank 311, and is used to open or close the second liquid supply tank 311. The second liquid supply valve 318 is equivalent to the main switch of the second delivery pipeline 312. When other components are abnormal or need maintenance (for example, when the filter element of the second filter 315 is replaced), the second liquid supply valve 318 can be closed to maintain other components.

[0053] like Figure 3 As shown, the liquid treatment system also includes a third three-way valve 321 disposed on the second discharge pipeline 319. The first end of the third three-way valve 321 is connected to the second liquid supply unit 8, the second end of the third three-way valve 321 is connected to the first cleaning chamber 310 of the first cleaning unit 31, and the third end of the third three-way valve 321 is idle. By opening the first and second ends of the third three-way valve 321, the excess clean water sprayed on the substrate 100 can be recovered from the first cleaning chamber 310 to the second liquid supply tank 311 to save the amount of clean water. Alternatively, when the cleanliness requirement of the substrate 100 is high, the clean water can be discharged as waste liquid by opening the first and third ends of the third three-way valve 321.

[0054] like Figure 3 As shown, the liquid medicine treatment system also includes a clean water supply pipeline 322 and a first clean water supply valve 323 and a second clean water supply valve 324 connected to the second liquid supply tank 311. Along the direction of clean water supply, the first clean water supply valve 323 and the second clean water supply valve 324 are sequentially arranged on the clean water supply pipeline 322. The clean water supply pipeline 322 transmits clean water from the outside of the second liquid supply tank 311 to the inside of the second liquid supply tank 311. Among them, the first clean water supply valve 323 is a manual valve, and the second clean water supply valve 324 is a pneumatic valve.

[0055] like Figure 3 As shown, the liquid treatment system further includes a second liquid level sensor 325, a second waste gas discharge valve 326, a second waste liquid discharge pipeline 327 and a second overflow pipeline 328. The second liquid level sensor 325 is disposed in the second liquid supply tank 311 to detect the liquid level of the second liquid supply tank 311. The second waste gas discharge valve 326 is disposed on the second waste liquid discharge pipeline 327, and the second waste liquid discharge pipeline 327 is connected to the second overflow pipeline 328.

[0056] During the production process, when the clean water in the second liquid supply tank 311 is lower than the low liquid level, the second liquid level sensor 325 detects a signal, the first clean water supply valve 323 is opened, and new clean water is added to the storage tank. When the clean water is added to a high liquid level, the second liquid level sensor 325 detects a signal, the clean water is fully added, and the liquid supply is stopped. The second liquid supply tank 311 recycles the excess clean water after rinsing the substrate 100, and adds an appropriate amount of clean water to the second liquid supply tank 311. When the clean water in the second liquid supply tank 311 has been used for too long and does not meet the production needs, the second waste gas exhaust valve 326 can be opened to discharge the waste liquid. After the waste liquid in the second liquid supply tank 311 is discharged, the first clean water supply valve 323 and the second clean water supply valve 324 are opened to supply clean pure water to the second liquid supply tank 311. When it is added to the high liquid level, the clean water is not full and the liquid supply is stopped. When the second liquid level sensor 325 fails, the second liquid supply tank 311 continues to replenish liquid, and the clean water in the second liquid supply tank 311 is overfilled, and overflows to the second waste liquid discharge pipeline 327 through the second overflow pipeline 328 of the second liquid supply tank 311.

[0057] In one embodiment, in order to improve the cleanliness of the substrate 100, the cleaning unit 3 further includes a second cleaning unit 32, which is disposed in the conveying direction of the conveying unit 6 and is located downstream of the first cleaning unit 31. The second cleaning unit 32 performs a secondary cleaning process on the substrate 100. The second cleaning unit 32 includes a second cleaning chamber 320 and at least one third spray assembly 3201, and the third spray assembly 3201 is disposed in the second cleaning chamber 320 and faces the substrate 100.

[0058] like Figure 3As shown, the liquid treatment system also includes a third liquid supply tank 329, a third delivery pipeline 330 and a third discharge pipeline 335. One end of the third delivery pipeline 330 is connected to the third liquid supply tank 329, and the other end is connected to the second cleaning unit 32, so that the third liquid supply tank 329 is used to store the second cleaning liquid, and the second cleaning liquid is pure water. The third liquid supply tank 329 delivers pure water to the second cleaning unit 32. One end of the third discharge pipeline 335 is connected to the second cleaning unit 32, and the other end is connected to the second liquid supply tank 311, so that the pure water used to clean the substrate 100 can be recycled to the second liquid supply tank 311 as a water source for the first cleaning of the substrate 100, which is recycled and saves resources. One end of the third discharge pipe 335 is connected to the second cleaning unit 32, and the other end is idle, so that the pure water after processing the substrate 100 can be discharged from the second cleaning unit 32, avoiding the pure water after processing the substrate 100 from being recovered to the second liquid supply tank 311, so as to improve the cleanliness of the substrate 100 by improving the cleanliness of the pure water.

[0059] like Figure 3 As shown, the liquid medicine processing system also includes a third filter 331, a third liquid supply valve 332, a third valve 333 and a third flow meter 334 which are sequentially arranged on the third delivery pipeline 330, the third filter 331 is connected to the third liquid supply tank 329, and the third flow meter 334 is connected to the third spray assembly 3201.

[0060] The pure water is further filtered through the third filter 331, and the liquid medicine on the substrate 100 is further cleaned by spraying through multiple nozzles of the third spray assembly. Among them, the number of the third filters 331 can be two or more, which is not particularly limited here. At the same time, the size of the clean water spraying flow rate can also be controlled by manually adjusting the opening of the third valve 332, and the flow rate of the pure water acting on the substrate 100 is recorded by the third flowmeter 333. The number of the third valves 333 can be one or more, and each third valve 333 controls the flow size of at least two nozzles. Of course, the number of the third valves 333 can also be set according to the number of nozzles in the third spray assembly 3201, for example, one third valve 333 corresponds to one nozzle. The third liquid supply valve 332 is a pneumatic valve used to control the opening or closing of the third liquid supply tank 329.

[0061] like Figure 3As shown, the liquid treatment system also includes a fourth three-way valve 336 disposed on the third discharge pipeline 335. The first end of the fourth three-way valve 336 is connected to the second liquid supply tank 311 of the second liquid supply unit 8, the second end of the fourth three-way valve 336 is connected to the second cleaning unit 32, and the third end of the fourth three-way valve 336 is idle. By opening the first end and the second end of the fourth three-way valve 336, the liquid in the second cleaning chamber 320 flowing from the substrate 100 to the second cleaning unit 32 can be recovered to the second liquid supply tank 311 to save the amount of clean water. Alternatively, by opening the first end and the third end of the fourth three-way valve 336, the cleaned pure water can be discharged as waste liquid to improve the cleanliness of the substrate 100.

[0062] like Figure 1 , Figure 5 and Figure 6 As shown, the drying unit 4 includes a drying chamber 410 and at least one wind knife 411. The wind knife 411 is arranged in the drying chamber 410 and faces the substrate 100. The axial direction of the wind knife 411 is arranged at a third angle γ with the conveying direction of the conveying unit 6, and 0°<γ<30°. The number of wind knives 411 is more than two, and two wind knives 411 form a group. The two wind knives 411 in a group are arranged up and down, so that the moisture on the surface of the substrate 100 can be dried quickly. Among them, γ can be any value of 10°, 15°, 20°, 25°, and 30°, and is not particularly limited here.

[0063] The liquid medicine treatment system further includes a drying pipeline 412 and a drying filter 413, a first drying valve 414, a second drying valve 415, and a drying flow valve 416 which are sequentially arranged on the drying pipeline 412. The drying filter 413 receives dry air provided by the outside, and the drying flow valve 416 is connected to the air knife 411. The drying pipeline 412 may be one or more, for example Figure 5 Two valves are shown. The first drying valve 414 is a pneumatic valve, and the second drying valve 415 is a manual valve.

[0064] like Figure 7 As shown, the liquid treatment system also includes a lifting mechanism 9, which is arranged below the conveying unit 6 and at the end of the chemical plating bath unit 2. The movement mode of the lifting mechanism 9 includes vertical lifting or oblique lifting. The vertical lifting mode of the lifting mechanism 9 allows the conveying roller to move up a certain distance, so that the liquid on the substrate 100 can drip into the chamber to dry the substrate 100 and reduce the subsequent drying time. Compared with the vertical lifting mode, the oblique lifting mode of the lifting mechanism 9 allows the substrate 100 to be tilted after the conveying roller moves up a certain distance, so that the liquid on the substrate 100 can drip into the chamber quickly.

[0065] Before the lifting mechanism 9 rises, the substrate 100 on the conveying roller has a first direction a. After the lifting mechanism 9 rises obliquely, the substrate 100 on the conveying roller has a second direction b. The angle δ between the first direction a and the second direction b is 0°<δ<30°, that is, the inclination angle of the substrate 100 is between 0° and 30°. Within this angle range, the inclination angle of the substrate 100 is neither too large nor too small. In this way, when the substrate 100 returns to a horizontal state, the lifting mechanism 9 does not need to rotate too much to quickly return to a horizontal state. Among them, δ can be any value of 10°, 15°, 20°, 25°, and 30°, and is not particularly limited here.

[0066] like Figure 1 As shown, the sheet discharging unit 5 includes a sheet discharging chamber 510. After the substrate 100 is fully dried in the drying unit 4, the substrate 100 is transferred from the drying chamber 410 to the sheet discharging chamber 510 at an angle of 0° to 30°. In addition, in the sheet discharging chamber 510, the conveying roller is restored to a horizontal state by the lifting mechanism 9, that is, the substrate 100 is transferred from the sheet discharging chamber 510 to the next process unit without tilting.

[0067] In order to more clearly illustrate the liquid medicine processing system of the embodiment of the present application, the operation sequence of the liquid medicine processing system is illustrated below.

[0068] Combination Figure 1 and Figure 7 As shown, the conveying roller of the conveying unit 6 conveys the substrate 100 to the processing unit 21; the substrate 100 is sprayed in the processing unit 21; the sprayed substrate 100 is conveyed to the reaction unit 22, and the substrate 100 is left to stand for a period of time in the reaction unit 22; after the standing, the conveying roller of the conveying unit 6 is adjusted to a range of 0° to 30° by the lifting mechanism 9, so that the substrate 100 is conveyed to the first cleaning unit 31 at an angle of 0° to 30°, and the substrate 100 is cleaned in the first cleaning unit 31. The liquid on the substrate 100 is cleaned once; if the cleanliness requirement for the substrate 100 is relatively high, the substrate 100 after the first cleaning treatment is transferred to the second cleaning unit 32 for secondary cleaning. If the cleanliness requirement for the substrate 100 is not high, it directly proceeds to the next step; the cleaned substrate 100 is transferred to the drying unit 4 for drying; the dried substrate 100 is transferred to the wafer discharge chamber 510, and the substrate 100 is adjusted to a horizontal state in the wafer discharge chamber 510, and is ready to enter the next process unit.

[0069] In the above embodiments, the description of each embodiment has its own emphasis. For parts that are not described in detail in a certain embodiment, reference can be made to the relevant descriptions of other embodiments.

[0070] The above is a detailed introduction to a liquid medicine treatment system provided in an embodiment of the present application. Specific examples are used in this article to illustrate the principles and implementation methods of the present application. The description of the above embodiments is only used to help understand the technical solution and its core idea of ​​the present application. Ordinary technicians in this field should understand that they can still modify the technical solutions recorded in the aforementioned embodiments, or replace some of the technical features therein with equivalents; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A liquid medicine treatment system, characterized in that: include: A conveying unit, which is composed of at least a plurality of conveying rollers and is used to convey a substrate; A chemical plating bath unit, wherein the chemical plating bath unit is arranged in a conveying direction of the conveying unit; A first liquid supply unit, the first liquid supply unit is connected to the chemical plating bath unit, the first liquid supply unit comprises a first liquid supply tank, a first delivery pipeline and a first discharge pipeline, one end of the first delivery pipeline is connected to the first liquid supply tank, and the other end is connected to the chemical plating bath unit; one end of the first discharge pipeline is connected to the chemical plating bath unit, and the other end is connected to the first liquid supply tank or is idle; A cleaning unit, the cleaning unit is arranged in the conveying direction of the conveying unit and is located downstream of the chemical plating bath unit; a second liquid supply unit, the second liquid supply unit is connected to the cleaning unit, the second liquid supply unit comprises a second liquid supply tank, a second delivery pipeline and a second discharge pipeline, one end of the second delivery pipeline is connected to the second liquid supply tank, and the other end is connected to the cleaning unit; one end of the second discharge pipeline is connected to the cleaning unit, and the other end is connected to the second liquid supply tank or is idle; A drying unit is arranged in the conveying direction of the conveying unit and is located downstream of the cleaning unit.

2. The liquid medicine treatment system according to claim 1, characterized in that: The chemical plating bath unit comprises: a processing unit, the processing unit being arranged in the conveying direction of the conveying unit to perform a liquid spraying process on the substrate; and a reaction unit, the reaction unit being arranged in the conveying direction of the conveying unit and being located downstream of the processing unit to control a reaction time of the liquid on the substrate; And / or, the cleaning unit includes a first cleaning unit, which is arranged in the conveying direction of the conveying unit and is located downstream of the chemical plating bath unit; the first cleaning unit includes a first cleaning chamber and at least one second spray assembly, and the second spray assembly is arranged in the first cleaning chamber and faces the substrate; wherein the liquid treatment system also includes a second pump, a second filter, a second flow meter and a second valve which are sequentially arranged on the second conveying pipeline, wherein the second pump is connected to the second liquid supply tank, and the second valve is connected to the second spray assembly.

3. The liquid medicine treatment system according to claim 2, characterized in that: The processing unit includes a processing chamber and at least one first spray assembly, wherein the first spray assembly is disposed in the processing chamber and faces the substrate, and each of the spray assemblies includes a first nozzle and a second nozzle, wherein the axial direction of the first nozzle is disposed at a first angle to the conveying direction of the conveying unit, and the axial direction of the second nozzle is disposed at a second angle to the conveying direction of the conveying unit, and the angle of the first angle is smaller than the angle of the second angle.

4. The liquid medicine treatment system according to claim 3, characterized in that: The liquid medicine processing system also includes a first pump, a first filter, a first valve and a first flow meter which are sequentially arranged on the first delivery pipeline, wherein the first pump is connected to the first liquid supply tank, and the first flow meter is connected to the first spray assembly.

5. The liquid medicine treatment system according to claim 2, characterized in that: The liquid medicine processing system also includes a first three-way valve and a second three-way valve arranged on the first discharge pipeline, the first end of the first three-way valve is connected to the first liquid supply unit, the second end of the first three-way valve is connected to the processing unit, and the third end of the first three-way valve is idle; the first end of the second three-way valve is connected to the first liquid supply unit, the second end of the second three-way valve is connected to the reaction unit, and the third end of the second three-way valve is idle.

6. The liquid medicine treatment system according to claim 2, characterized in that: The cleaning unit further includes a second cleaning unit, which is arranged in the conveying direction of the conveying unit and is located downstream of the first cleaning unit; The liquid medicine treatment system further comprises a third liquid supply tank, a third delivery pipeline and a third discharge pipeline, one end of the third delivery pipeline is connected to the third liquid supply tank, and the other end is connected to the second cleaning unit; one end of the third discharge pipeline is connected to the second cleaning unit, and the other end is connected to the second liquid supply tank or is idle; The second cleaning unit comprises a second cleaning chamber and at least one third spray assembly, wherein the third spray assembly is disposed in the second cleaning chamber and faces the substrate; Among them, the liquid medicine processing system also includes a third filter, a third liquid supply valve, a third valve and a third flow meter which are arranged in sequence on the third delivery pipeline, the third filter is connected to the third liquid supply tank, and the third flow meter is connected to the third spray assembly.

7. The liquid medicine treatment system according to claim 6, characterized in that: The liquid medicine processing system also includes: a third three-way valve disposed on the second discharge pipeline, wherein a first end of the third three-way valve is communicated with the second liquid supply unit, a second end of the third three-way valve is communicated with the first cleaning unit, and a third end of the third three-way valve is idle; A fourth three-way valve is arranged on the third discharge pipeline, wherein a first end of the fourth three-way valve is connected to the second liquid supply tank, a second end of the fourth three-way valve is connected to the second cleaning unit, and a third end of the fourth three-way valve is idle.

8. The liquid medicine treatment system according to claim 1, characterized in that: Also includes: A lifting mechanism, the lifting mechanism is arranged below the conveying unit and located at the end of the chemical plating bath unit to perform lifting processing on the substrate; The movement mode of the lifting mechanism includes vertical lifting or oblique lifting.

9. The liquid medicine treatment system according to claim 1, characterized in that: The drying unit includes a drying chamber and at least one wind knife, wherein the wind knife is disposed in the drying chamber and faces the substrate, and the axial direction of the wind knife is disposed at a third angle γ with the conveying direction of the conveying unit, wherein 0°≤γ<30°.

10. The liquid medicine treatment system according to claim 7, characterized in that: The liquid medicine processing system also includes: a first waste liquid discharge pipeline and a first overflow pipeline, wherein one end of the first waste liquid discharge pipeline is connected to the first liquid supply tank and the other end is idle, and one end of the first overflow pipeline is connected to the first liquid supply tank and the other end is connected to the first waste liquid discharge pipeline; a second waste liquid discharge pipeline and a second overflow pipeline, wherein one end of the second waste liquid discharge pipeline is connected to the second liquid supply tank and the other end is idle, and one end of the second overflow pipeline is connected to the second liquid supply tank and the other end is connected to the second waste liquid discharge pipeline; Wherein, the first liquid supply tank is used to store the medicine liquid; the second liquid supply tank is used to store the first cleaning liquid; and the third liquid supply tank is used to store the second cleaning liquid.

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