High-stability and high-vacuum gate valve for semiconductor equipment

Abstract

The utility model discloses a high-stability high-vacuum gate valve for semiconductor equipment, which relates to the technical field of semiconductor equipment and comprises a main valve body and a valve plate, a mounting frame is mounted in the middle of the lower end of the main valve body, a pneumatic rod is arranged in the mounting frame, the valve plate is mounted at the upper end of the pneumatic rod, and limit sliders are additionally arranged on two sides of the outside of the valve plate. A sheet inlet is formed in the main valve body, a limiting cavity is formed in the main valve body, limiting sliding grooves are formed in the two sides of the interior of the limiting cavity, meanwhile, a sealing rubber pad is additionally arranged at the upper end of the interior of the limiting cavity, mounting blocks are additionally arranged on the two sides of the exterior of the main valve body, and mounting bolts are connected into the mounting blocks. According to the high-stability and high-vacuum gate valve for the semiconductor equipment, through the arrangement of the valve plate, the problem that most gate valves are mostly used for opening or closing the sheet inlet, the stability of the valve plate in the moving process is poor, and consequently the sealing performance of the gate valves in the using process is ordinary is solved, and the overall practicability of the gate valves is conveniently improved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor equipment, in particular to a high-stability and high-vacuum gate valve for semiconductor equipment. Background Art

[0002] Semiconductor vacuum equipment generally consists of two parts: a transmission module and a process module. The transmission module is responsible for transferring the wafers that need to be etched to the inside of the reaction chamber, and then the process module including the reaction chamber processes them to obtain the desired products. Among them, the gate valve is a very important component, which connects or isolates the transmission module and the process module. In order to ensure the stability of the process and prevent corrosive gases from entering the transmission module and causing unnecessary corrosion under special circumstances, the gate valve needs to have good sealing performance. In order to improve the efficiency of semiconductor equipment, a gate valve is needed, but the existing gate valve still has the following shortcomings:

[0003] When the existing gate valves are used, since most of the gate valves are used to open or close the film inlet, and the valve plate is prone to poor stability during movement, the sealing of the gate valve is generally poor during use, resulting in reduced practicality and reduced efficiency of the gate valve.

[0004] Therefore, in view of this, research and improvement are conducted on the existing structure and defects, and a high-stability and high-vacuum gate valve for semiconductor equipment is proposed. Utility Model Content

[0005] The utility model aims to provide a high-stability and high-vacuum gate valve for semiconductor equipment to solve the problems raised in the above-mentioned background technology.

[0006] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a high-stable and high-vacuum gate valve for semiconductor equipment, comprising a main valve body and a valve plate, a mounting frame is installed in the middle of the lower end of the main valve body, and a pneumatic rod is arranged inside the mounting frame, and a valve plate is installed on the upper end of the pneumatic rod, and limit sliding blocks are added on both sides of the outside of the valve plate, a film inlet is opened inside the main valve body, and a limit cavity is arranged inside the main valve body, and limit sliding grooves are opened on both sides of the limit cavity, and a sealing rubber pad is added to the upper end of the limit cavity, mounting blocks are added on both sides of the outside of the main valve body, and mounting bolts are connected inside the mounting blocks, mounting docking grooves are opened on both sides of the rear of the main valve body, and a mounting docking block is added in the middle of the rear of the mounting frame.

[0007] Furthermore, the installation frame and the main valve body are distributed vertically, and the installation frame is threadedly connected to the main valve body.

[0008] Furthermore, the pneumatic rod and the valve plate are vertically distributed, and the valve plate is slidably connected to the main valve body through the pneumatic rod.

[0009] Furthermore, the number of the limit sliding blocks is two, and the two limit sliding blocks are symmetrically arranged on both sides of the outside of the valve plate with respect to the front center axis of the valve plate.

[0010] Furthermore, the outer dimensions of the limiting sliding block match the inner dimensions of the limiting sliding groove, and the valve plate is slidably connected to the limiting sliding groove via the limiting sliding block.

[0011] Furthermore, the sealing rubber pad is embedded in the limiting cavity, and the sealing rubber pad is threadedly connected to the limiting cavity.

[0012] Furthermore, the number of the mounting docking grooves is two, and the two mounting docking grooves are symmetrically arranged on both sides of the rear of the main valve body with respect to the front center axis of the main valve body.

[0013] Furthermore, the outer side of the mounting docking block is flush with the outer side of the mounting frame, and the mounting docking block is threadedly connected to the mounting frame.

[0014] The utility model provides a high-stability and high-vacuum gate valve for semiconductor equipment, which has the following beneficial effects:

[0015] 1. The utility model can avoid the problem that most gate valves are used to open or close the film inlet when the semiconductor equipment uses a high-stability and high-vacuum gate valve through the arrangement of the valve plate, and the valve plate is prone to poor stability during movement, resulting in the general sealing of the gate valve during use, resulting in the problem of reduced practicality of the gate valve. The pneumatic rod is fixedly installed inside the installation frame through fasteners, and the valve plate is fixedly installed at the front end of the pneumatic rod with the fasteners. The pneumatic rod operation drives the valve plate to move its position. At the same time, the internal size of the limiting cavity opened inside the main valve body matches the external size of the valve plate, so that the valve plate is limitedly installed on the main valve through the limiting cavity. The inner dimensions of the limit sliders added on both sides of the valve plate are matched with the inner dimensions of the limit grooves opened on both sides of the limit cavity, so that the stability of the valve plate during the movement inside the limit cavity is increased by the limit sliders cooperating with the limit grooves, and the film inlet opened in the main valve body is opened and closed accordingly through the movement of the valve plate, and when the valve plate moves to the top of the limit cavity, it fits tightly with the top of the valve plate through the sealing rubber pad, and the overall sealing of the valve plate after closing is increased by the setting of the sealing rubber pad, thereby providing a stable processing environment for the processing and use of semiconductor equipment, thereby increasing the convenience of the gate valve during use.

[0016] 2. The utility model can avoid the position shift of most gate valves during the installation process in the reaction chamber when using high-stability and high-vacuum gate valves in semiconductor equipment through the arrangement of the installation docking groove, which increases the labor intensity of the staff and easily affects the subsequent use of the semiconductor equipment, resulting in reduced efficiency of the gate valve. The installation block is fixedly installed on both sides of the outside of the main valve body by fasteners, and the installation bolts are installed into the inside of the installation block. The main valve body is installed and connected to the semiconductor reaction chamber equipment through the installation block and the installation bolts. At the same time, the installation docking grooves opened on both sides of the rear of the main valve body correspond to the outside of the semiconductor equipment, and the installation docking blocks arranged on the outside of the installation frame also correspond to the outside of the semiconductor equipment. The main valve body is accurately positioned outside the semiconductor equipment before the main valve body is installed through the installation docking groove and the installation docking block, thereby avoiding the position shift of the main valve body during the installation process and further improving the efficiency of the gate valve. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 This is a three-dimensional structural schematic diagram of a high-stability and high-vacuum gate valve for semiconductor equipment of the utility model;

[0018] Figure 2 This is a schematic diagram of the three-dimensional structure of the installation docking groove of a high-stability and high-vacuum gate valve for semiconductor equipment of the utility model;

[0019] Figure 3 The utility model is a schematic diagram of a three-dimensional cross-sectional structure of a valve plate of a high-stability and high-vacuum gate valve for semiconductor equipment.

[0020] In the figure: 1. main valve body; 2. mounting frame; 3. pneumatic rod; 4. valve plate; 5. limit slider; 6. valve inlet; 7. limit cavity; 8. limit slide groove; 9. sealing rubber pad; 10. mounting block; 11. mounting bolts; 12. mounting docking groove; 13. mounting docking block. DETAILED DESCRIPTION

[0021] The following is a further detailed description of the implementation of the present invention in conjunction with the accompanying drawings and examples. The following examples are used to illustrate the present invention, but cannot be used to limit the scope of the present invention.

[0022] like Figures 1 to 3As shown, a high-stability and high-vacuum gate valve for semiconductor equipment includes a main valve body 1 and a valve plate 4. A mounting frame 2 is installed in the middle of the lower end of the main valve body 1, and a pneumatic rod 3 is arranged inside the mounting frame 2, and a valve plate 4 is installed on the upper end of the pneumatic rod 3. At the same time, limit sliders 5 are added on both sides of the outside of the valve plate 4. A film inlet 6 is opened inside the main valve body 1, and a limit cavity 7 is arranged inside the main valve body 1, and limit sliding grooves 8 are opened on both sides of the limit cavity 7. At the same time, a sealing rubber pad 9 is added on the upper end of the limit cavity 7. The mounting frame 2 and the main valve body 1 are connected. The pneumatic rod 3 and the valve plate 4 are vertically distributed, and the valve plate 4 is slidably connected to the main valve body 1 through the pneumatic rod 3. There are two limit sliders 5, and the two limit sliders 5 are symmetrically arranged on both sides of the outside of the valve plate 4 with the front center axis of the valve plate 4. The external dimensions of the limit slider 5 match the internal dimensions of the limit slide 8, and the valve plate 4 is slidably connected to the limit slide 8 through the limit slider 5. The sealing rubber pad 9 is embedded in the limit cavity 7, and the sealing rubber pad 9 is threadedly connected with the limiting cavity 7, and the pneumatic rod 3 is fixedly installed in the installation frame 2 through the fasteners, and the valve plate 4 is fixedly installed at the front end of the pneumatic rod 3 with the fasteners. The operation of the pneumatic rod 3 drives the valve plate 4 to move the position, and at the same time, the internal size of the limiting cavity 7 opened in the main valve body 1 matches the external size of the valve plate 4, so that the valve plate 4 is limitedly installed in the main valve body 1 through the limiting cavity 7, and the external size of the limiting sliders 5 added on both sides of the outside of the valve plate 4 matches the internal size of the limiting slide grooves 8 opened on both sides of the inside of the limiting cavity 7. The limiting slider 5 cooperates with the limiting groove 8 to increase the stability of the valve plate 4 during the movement inside the limiting cavity 7, and the movement of the valve plate 4 enables the film inlet 6 opened in the main valve body 1 to be opened and closed accordingly. When the valve plate 4 moves to the top of the limiting cavity 7, it fits tightly with the top of the valve plate 4 through the sealing rubber pad 9, and the setting of the sealing rubber pad 9 increases the overall sealing of the valve plate 4 after closing, thereby providing a stable processing environment for the processing and use of semiconductor equipment, thereby increasing the convenience of the gate valve during use.

[0023] like Figure 1 and Figure 2As shown, mounting blocks 10 are additionally provided on both sides of the outside of the main valve body 1, and mounting bolts 11 are connected inside the mounting blocks 10, mounting docking grooves 12 are opened on both sides of the rear of the main valve body 1, and a mounting docking block 13 is additionally provided in the middle of the rear of the mounting frame 2. There are two mounting docking grooves 12, and the two mounting docking grooves 12 are symmetrically arranged on both sides of the rear of the main valve body 1 with the front center axis of the main valve body 1. The outer side of the mounting docking block 13 is flush with the outer side of the mounting frame 2, and the mounting docking block 13 is threadedly connected to the mounting frame 2, and the mounting blocks 10 are fixedly installed on both sides of the outside of the main valve body 1 by fasteners, and The mounting bolts 11 are installed into the mounting block 10, and the main valve body 1 is installed and connected to the semiconductor reaction chamber equipment through the mounting block 10 and the mounting bolts 11. At the same time, the mounting docking grooves 12 opened on both sides of the rear of the main valve body 1 correspond to the outside of the semiconductor equipment, and the mounting docking blocks 13 arranged on the outside of the mounting frame 2 also correspond to the outside of the semiconductor equipment. The main valve body 1 is accurately positioned outside the semiconductor equipment through the mounting docking grooves 12 and the mounting docking blocks 13 before the main valve body 1 is installed, thereby avoiding the position deviation of the main valve body 1 during the installation process and further improving the use efficiency of the gate valve.

[0024] In summary, the semiconductor device uses a high-stability and high-vacuum gate valve. When in use, first, the mounting frame 2 is fixedly installed on the middle part of the lower end of the main valve body 1 by means of fastening bolts, and the pneumatic rod 3 is fixedly installed inside the mounting frame 2 by means of fastening bolts. The pneumatic rod 3 drives the valve plate 4 to move its position. At the same time, the internal dimensions of the limiting cavity 7 opened inside the main valve body 1 match the external dimensions of the valve plate 4, so that the valve plate 4 is limitedly installed inside the main valve body 1 through the limiting cavity 7, and the external dimensions of the limiting sliders 5 added on both sides of the outside of the valve plate 4 match the internal dimensions of the limiting grooves 8 opened on both sides of the inside of the limiting cavity 7, so that the stability of the valve plate 4 during the movement inside the limiting cavity 7 is increased by means of the limiting sliders 5 and the limiting grooves 8, and the movement of the valve plate 4 enables the film inlet 6 opened inside the main valve body 1 to be opened and closed accordingly, and when the valve plate 4 moves to the top of the limiting cavity 7, the sealing The rubber pad 9 fits tightly with the top of the valve plate 4, and the setting of the sealing rubber pad 9 increases the overall sealing of the valve plate 4 after closing, thereby providing a stable processing environment for the processing and use of semiconductor equipment. Then, the mounting block 10 is fixedly installed on both sides of the outside of the main valve body 1 through fasteners, and the mounting bolts 11 are installed into the mounting block 10. The main valve body 1 is installed and connected to the semiconductor reaction chamber equipment through the mounting block 10 and the mounting bolts 11. At the same time, the mounting docking grooves 12 opened on both sides of the rear of the main valve body 1 correspond to the outside of the semiconductor equipment, and the mounting docking block 13 set on the outside of the mounting frame 2 also corresponds to the outside of the semiconductor equipment. The main valve body 1 is accurately positioned outside the semiconductor equipment before the main valve body 1 is installed through the mounting docking grooves 12 and the mounting docking block 13, thereby avoiding the position displacement of the main valve body 1 during the installation process, and further improving the use efficiency of the gate valve.

[0025] The embodiments of the present invention are provided for the purpose of illustration and description, and are not intended to be exhaustive or to limit the present invention to the disclosed forms. Many modifications and variations will be apparent to those of ordinary skill in the art. The embodiments are selected and described to better illustrate the principles and practical applications of the present invention, and to enable those of ordinary skill in the art to understand the present invention and thereby design various embodiments with various modifications suitable for specific uses.

Claims

1. A high-stability and high-vacuum gate valve for semiconductor equipment, comprising a main valve body (1) and a valve plate (4), characterized in that: A mounting frame (2) is installed in the middle of the lower end of the main valve body (1), and a pneumatic rod (3) is arranged inside the mounting frame (2), and a valve plate (4) is installed on the upper end of the pneumatic rod (3), and limit sliders (5) are added on both sides of the outside of the valve plate (4); a film inlet (6) is opened inside the main valve body (1), and a limit cavity (7) is arranged inside the main valve body (1), and limit grooves (8) are opened on both sides of the inside of the limit cavity (7), and a sealing rubber pad (9) is added to the upper end of the inside of the limit cavity (7); mounting blocks (10) are added on both sides of the outside of the main valve body (1), and mounting bolts (11) are connected inside the mounting blocks (10); mounting docking grooves (12) are opened on both sides of the rear of the main valve body (1), and a mounting docking block (13) is added in the middle of the rear of the mounting frame (2).

2. A high-stability high-vacuum gate valve for semiconductor equipment according to claim 1, characterized in that: The installation frame (2) and the main valve body (1) are distributed vertically, and the installation frame (2) and the main valve body (1) are threadedly connected.

3. A high-stability high-vacuum gate valve for semiconductor equipment according to claim 1, characterized in that: The pneumatic rod (3) and the valve plate (4) are distributed vertically, and the valve plate (4) is slidably connected to the main valve body (1) via the pneumatic rod (3).

4. A high-stability high-vacuum gate valve for semiconductor equipment according to claim 1, characterized in that: The number of the limiting slide blocks (5) is two, and the two limiting slide blocks (5) are symmetrically arranged on both sides of the outside of the valve plate (4) with respect to the front center axis of the valve plate (4).

5. The high-stability and high-vacuum gate valve for semiconductor equipment according to claim 1, characterized in that: The outer dimensions of the limiting slide block (5) match the inner dimensions of the limiting slide groove (8), and the valve plate (4) is slidably connected to the limiting slide groove (8) via the limiting slide block (5).

6. The high-stability high-vacuum gate valve for semiconductor equipment according to claim 1, characterized in that: The sealing rubber pad (9) is embedded in the limiting cavity (7), and the sealing rubber pad (9) is threadedly connected to the limiting cavity (7).

7. The high-stability high-vacuum gate valve for semiconductor equipment according to claim 1, characterized in that: The number of the mounting docking grooves (12) is two, and the two mounting docking grooves (12) are symmetrically arranged on both sides of the rear of the main valve body (1) with respect to the front center axis of the main valve body (1).

8. The high-stability high-vacuum gate valve for semiconductor equipment according to claim 1, characterized in that: The outer side of the mounting docking block (13) is flush with the outer side of the mounting frame (2), and the mounting docking block (13) is threadedly connected to the mounting frame (2).

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