Miniature CVD furnace suitable for in-situ analysis

Abstract

The utility model provides a miniature CVD furnace suitable for in-situ analysis, and the miniature CVD furnace comprises a flange support I, a flange support II, a heating furnace assembly, an optical microscope, an adjusting assembly and a circuit control assembly.Compared with the prior art, the miniature CVD furnace has the beneficial effects that a heating element I and a heating element II are mounted in the heating furnace assembly; the heating element I and the heating element II both take silicon nitride ceramics as matrixes and tungsten filaments as heating sources, can quickly heat up to 1100 DEG C, have the characteristics of instant high temperature, high speed, high efficiency and long service life, ensure the normal work of the heating element I and the heating element II, prolong the service life of the heating element I and the heating element II, reduce the frequency of maintenance and replacement, adjust the arrangement of components, and improve the production efficiency. The purpose of accurately adjusting the distance between the first heating part and the second heating part can be achieved, the gap between the first heating part and the second heating part can be adjusted, new materials with different thicknesses can be generated by adjusting the distance between the first heating part and the second heating part through the adjusting assembly, and research is facilitated.

Description

Technical Field

[0001] The invention belongs to the technical field of material preparation, and in particular relates to a micro CVD furnace suitable for in-situ analysis. Background Art

[0002] At present, chemical vapor deposition (CVD), as a traditional thin film preparation technology, refers to a method of synthesizing coatings or nanomaterials by reacting chemical gases or vapors on the surface of a substrate. It is the most widely used technology in the semiconductor industry for depositing a variety of materials, including a wide range of insulating materials, most metal materials and metal alloy materials. In recent decades, with the advancement of science and technology, chemical vapor deposition has developed into atmospheric pressure chemical vapor deposition, plasma-assisted chemical deposition, laser-assisted chemical deposition, metal organic compound deposition, etc. CVD technology has been widely used in many aspects such as protective film layers, microelectronics technology, solar energy utilization, optical fiber communication, superconducting technology, and preparation of new materials. With the increasing expansion of its application scope and the continuous improvement of its role and economic benefits, chemical vapor deposition has become an extremely important modern material forming technology.

[0003] During the CVD process, the electric heater needs to withstand high temperature and maintain stable performance. However, the high temperature may damage or degrade the material and structure of the electric heater, thus affecting its normal operation and service life. Regular maintenance and replacement are required, which will increase the cost of subsequent maintenance of the equipment. Therefore, we hope to develop a new type of micro CVD furnace to solve the above technical problems. Summary of the invention

[0004] In view of the shortcomings of the prior art, the object of the present invention is to provide a micro CVD furnace suitable for in-situ analysis to solve the problems raised in the above background technology.

[0005] The present invention is implemented by the following technical scheme: a micro CVD furnace suitable for in-situ analysis, comprising: a flange bracket 1, a flange bracket 2, a heating furnace assembly, an optical microscope, an adjustment assembly and a circuit control assembly, wherein the flange bracket 1 is fixed to the right end of the heating furnace assembly, and the left end of the heating furnace assembly is fixedly connected to the upper end of the flange bracket 2;

[0006] The heating furnace assembly is placed at the lower side of the optical microscope, and the optical microscope is connected to the circuit control assembly through heating wires and thermocouple wires. An adjustment assembly is installed at the lower side of the second flange bracket. In actual use, the optical microscope is an upright reflection and transmission metallographic microscope system with a USB digital image camera and a five-fold objective lens turntable. Through the optical observation window on the quartz cavity, the two-dimensional thin film growth on the surface of the chip inside can be observed in situ.

[0007] As a preferred embodiment, the specifications of flange bracket one are the same as those of flange bracket two, and flange bracket two includes a telescopic rod, a fixing sleeve and a fixing head. A fixing sleeve is welded to the upper end of the telescopic rod, and the fixing sleeve is fixedly connected to one end of the heating furnace assembly through the fixing head.

[0008] As a preferred embodiment, the heating furnace assembly includes a sealing flange, a heating element 1, a heating element 2 and a quartz cavity, the left end and the right end of the quartz cavity are respectively sealed with a sealing flange through a fixed head, four ceramic electrodes are welded on each of the sealing flanges, a thermocouple is installed on each of the sealing flanges, and a φ6.35mm ferrule joint is installed on each of the sealing flanges;

[0009] A heating element 1 is slidably installed inside the left side of the quartz cavity, a column block is fixed on the left side of the heating element 1, a magnetic block 3 is embedded and installed on the lower side of the column block, and the magnetic block 3 is an arc plate structure. In actual use, two ferrule joints, one as an air inlet joint and the other as an exhaust joint, are connected to an external air supply device.

[0010] As a preferred embodiment, a heating element 2 is fixed inside the right side of the quartz cavity, the specifications of the heating element 1 are the same as those of the heating element 2, a chip is placed on the upper side of the left end of the heating element 2, the heating element 1 and the heating element 2 are both a ceramic electric heating plate, an optical observation window is provided on the upper side of the quartz cavity, the chip is located directly below the optical observation window, and the optical observation window is located directly below the objective lens of the optical microscope;

[0011] A shielding member is slidably installed on the left side of the upper end of the quartz cavity, and the shielding member includes a magnetic block 1, a magnetic block 2 and a shielding plate. The magnetic block 1 is fixedly connected to the upper side of the left end of the shielding plate, and the magnetic block 2 is magnetically connected to the magnetic block 1. The magnetic block 2 is placed on the outer wall of the quartz cavity, and the magnetic block 1 is placed on the inner wall of the quartz cavity. The shielding plate has an arc structure as a whole, and the horizontal cross-section of the shielding plate has a Z-shaped structure. In actual use, the heating element 1 and the heating element 2 are both based on silicon nitride ceramics and tungsten wires as heat sources. The tungsten wires are buried in the silicon nitride matrix. The heating plate is formed into an integral body through a hot pressing and sintering process and then is made of a grinding and welding wire. The heating plate can quickly heat up to 1100°C and has the characteristics of instantaneous high temperature, fast speed, high efficiency, long life, etc. The gap between the heating element 1 and the heating element 2 can be adjusted, and the heating temperature is controlled by a circuit control component. The circuit control component has a programmable dual temperature control unit for independently controlling the two heating elements 1 and 2, and has overheating and thermocouple damage protection functions.

[0012] As a preferred embodiment, the adjustment assembly includes a mounting seat, a vertical rod, a sliding rod and an adsorption member, the mounting seat is fixed to the upper side of the lower end of the telescopic rod by bolts, the vertical rod is integrally provided on the right side of the upper end of the mounting seat, a sliding rod is welded on the right side of the top end of the vertical rod, a limiting rod is welded on the upper right side of the vertical rod, the limiting rod is placed directly below the sliding rod, the length of the limiting rod is greater than the length of the sliding rod, and a reinforcing rod is obliquely welded between the lower side of the right end of the limiting rod and the right side of the lower end of the vertical rod;

[0013] The front and rear sides of the slide bar are respectively provided with a strip-shaped guide slot, and the right end of each guide slot penetrates the right end of the slide bar to the right. A sliding cavity is provided inside the slide bar, and the upper end of the sliding cavity penetrates upward to form a strip-shaped through slot, and the right end of the strip-shaped through slot penetrates the right end of the slide bar to the right. The cross-section of the sliding cavity is a regular hexagonal structure, and an adsorption part is slidably installed on the upper side of the slide bar.

[0014] As a preferred embodiment, the adsorption component includes a sleeve 1, a sleeve 2, a slide bar, and a magnet block 4. The sleeve 1 is slidably mounted on the outer wall of the limit rod. The upper end of the sleeve 1 is fixedly connected to the lower end of the sleeve 2 through a connecting rod 1. The upper end of the sleeve 2 is fixedly connected to the lower end of the magnet block 4 through a connecting rod 2. A sponge sheet is bonded to the upper side of the magnet block 4. The thickness of the sponge sheet is less than 1 mm. The magnet block 4 and the magnet block 3 are magnetically attracted to each other. The magnet block 4 is placed on the lower outer wall of the quartz cavity, and the magnet block 3 is placed inside the quartz cavity.

[0015] As a preferred embodiment, a slide bar is respectively arranged on the front inner wall and the rear inner wall of the second slide sleeve, and each of the slide bars is slidably installed in a guide slot. A guide column is arranged inside the second slide sleeve, and the guide column includes a prism and a connecting plate. A connecting plate is arranged on the upper end of the prism, and the upper end of the connecting plate is welded to the top inner wall of the second slide sleeve;

[0016] The cross section of the prism is a regular hexagonal structure. The prism is slidably installed inside the sliding cavity. The thickness of the connecting plate matches the thickness of the strip-shaped through groove. The axis of the prism is colinear with the axis of the second sliding sleeve. The center of the prism is penetrated from left to right to form a threaded hole.

[0017] A bearing seat is installed on the upper side of the right end of the limiting rod, and an adjusting screw is rotatably installed on the upper end of the bearing seat. The left end of the adjusting screw is threadedly connected to the prism through a threaded hole. The left end of the adjusting screw extends into the interior of the sliding rod and does not directly contact the sliding rod.

[0018] After adopting the above technical scheme, the beneficial effects of the present invention are as follows: by installing the heating element 1 and the heating element 2 in the heating furnace assembly, the heating element 1 and the heating element 2 are both based on silicon nitride ceramics and use tungsten wire as a heat source, and can quickly heat up to 1100°C, and have the characteristics of instantaneous high temperature, fast speed, high efficiency and long life. In this way, the sample can reach a high temperature state instantly, and the instantaneous change of the sample can be studied. The material and process of the heating element 1 and the heating element 2 enable them to withstand high temperature environments and maintain stable performance, thereby ensuring the normal operation of the heating element 1 and the heating element 2 and improving their service life, and reducing the frequency of maintenance and replacement;

[0019] The setting of the adjustment component can achieve the purpose of accurately adjusting the distance between heating element one and heating element two, so that the gap between heating element one and heating element two can be adjusted. The distance between heating element one and heating element two can be adjusted by adjusting the adjustment component to generate new materials of different thicknesses, which is convenient for research. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0021] Figure 1 The present invention is a schematic diagram of the overall structure of a micro CVD furnace suitable for in-situ analysis.

[0022] Figure 2 It is a schematic diagram of the connection between a heating furnace assembly of a micro CVD furnace suitable for in-situ analysis of the present invention and a broken bracket 1 and a flange bracket 2.

[0023] Figure 3 for Figure 2 A is an enlarged schematic diagram.

[0024] Figure 4 The present invention is a schematic diagram of a second structure of a heating element of a micro CVD furnace suitable for in-situ analysis.

[0025] Figure 5 The present invention is a schematic diagram of a heating element structure of a micro CVD furnace suitable for in-situ analysis.

[0026] Figure 6 The schematic diagram of the regulating component structure of a micro CVD furnace suitable for in-situ analysis according to the present invention.

[0027] Figure 7 The schematic diagram of the adsorption structure of a micro CVD furnace suitable for in-situ analysis according to the present invention.

[0028] Figure 8 The present invention is a schematic diagram of a guide column structure of a micro CVD furnace suitable for in-situ analysis.

[0029] Fig. 9 It is a schematic diagram of the cross-sectional structure of an optical observation window of a micro CVD furnace suitable for in-situ analysis of the present invention.

[0030] In the figure, 100-flange bracket one;

[0031] 200-optical microscope;

[0032] 300-, flange bracket 2, 310- telescopic rod, 320- fixed sleeve, 330- fixed head;

[0033] 400-heating furnace assembly, 410-ceramic sealed electrode, 420-sealing flange, 430-heating element 1, 431-magnetic block 3, 432-column block, 440-heating element 2, 450-quartz cavity, 451-optical observation window, 460-shielding element, 461-magnetic block 1, 462-magnetic block 2, 463-shielding plate, 470-wafer;

[0034] 500-adjustment assembly, 510-mounting seat, 520-vertical rod, 530-sliding rod, 540-adsorption piece, 541-sliding sleeve 1, 542-sliding sleeve 2, 543-sliding bar, 544-magnetic block 4, 550-guide column, 551-prism, 552-threaded hole, 553-connecting plate, 560-adjusting screw, 570-bearing seat, 580-reinforcement rod, 590-limit rod;

[0035] 600-Circuit Control Assembly. DETAILED DESCRIPTION

[0036] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0037] See also Figures 1 to 9 The present invention provides a technical solution: a micro CVD furnace suitable for in-situ analysis, comprising: a flange bracket 100, a flange bracket 2 300, a heating furnace assembly 400, an optical microscope 200, an adjustment assembly 500 and a circuit control assembly 600, wherein the flange bracket 100 is fixed to the right end of the heating furnace assembly 400, and the left end of the heating furnace assembly 400 is fixedly connected to the upper end of the flange bracket 2 300;

[0038] The heating furnace assembly 400 is placed at the lower side of the optical microscope 200. The optical microscope 200 is connected to the circuit control assembly 600 through heating wires and thermocouple wires. An adjustment assembly 500 is installed at the lower side of the flange bracket 300. In actual use, the optical microscope 200 is an upright reflection and transmission metallographic microscope system with a USB digital image camera and a five-fold objective lens turntable. Through the optical observation window 451 on the quartz cavity 450, the two-dimensional thin film growth on the surface of the chip 470 inside can be observed in situ.

[0039] The specifications of flange bracket 100 are the same as those of flange bracket 2 300. Flange bracket 2 300 includes a telescopic rod 310, a fixing sleeve 320 and a fixing head 330. The fixing sleeve 320 is welded to the upper end of the telescopic rod 310, and the fixing sleeve 320 is fixedly connected to one end of the heating furnace assembly 400 through the fixing head 330.

[0040] See also Figures 1 to 5 The heating furnace assembly 400 includes a sealing flange 420, a heating element 1 430, a heating element 2 440 and a quartz cavity 450. The left and right ends of the quartz cavity 450 are respectively sealed with a sealing flange 420 through a fixed head 330. Four ceramic electrodes 410 are welded on each sealing flange 420. A thermocouple is installed on each sealing flange 420. A ferrule joint of φ6.35 mm is installed on each sealing flange 420.

[0041] A heating element 430 is slidably installed inside the left side of the quartz chamber 450, a column block 432 is fixed to the left side of the heating element 430, a magnetic block 431 is embedded and installed on the lower side of the column block 432, and the magnetic block 431 is an arc plate structure. In actual use, one of the two ferrule connectors is used as an air inlet connector and the other is used as an exhaust connector to connect to the external air supply equipment.

[0042] A second heating element 440 is fixed inside the right side of the quartz cavity 450. The specifications of the first heating element 430 are the same as those of the second heating element 440. A wafer 470 is placed on the upper side of the left end of the second heating element 440. The first heating element 430 and the second heating element 440 are both a ceramic electric heating sheet. An optical observation window 451 is provided on the upper side of the quartz cavity 450. The wafer 470 is located directly below the optical observation window 451. The optical observation window 451 is located directly below the objective lens of the optical microscope 200.

[0043] A shielding member 460 is slidably installed on the left side of the upper end of the quartz cavity 450. The shielding member 460 includes a magnetic block 1 461, a magnetic block 2 462 and a shielding plate 463. The magnetic block 1 461 is fixedly connected to the upper side of the left end of the shielding plate 463. The magnetic block 2 462 is magnetically connected to the magnetic block 1 461. The magnetic block 2 462 is placed on the outer wall of the quartz cavity 450, and the magnetic block 1 461 is placed on the inner wall of the quartz cavity 450. The shielding plate 463 has an arc-shaped structure as a whole, and the horizontal cross-section of the shielding plate 463 has a Z-shaped structure. In actual use, the heating element 1 430 and the heating element 2 440 are both based on silicon nitride ceramics. The heating plate is made of tungsten wire as a heat source, which is buried in a silicon nitride matrix. The heating plate is formed into an integral body through a hot pressing and sintering process and then ground and welded with a wire. The temperature can be quickly raised to 1100°C, and it has the characteristics of instantaneous high temperature, fast speed, high efficiency, and long life. The gap between the heating element 1 430 and the heating element 2 440 can be adjusted, and the heating temperature is controlled by a circuit control component 600. The circuit control component 600 is equipped with a programmable dual temperature control unit for independently controlling the two heating elements 1 430 and 440, and has overheating and thermocouple damage protection functions.

[0044] As the first embodiment of the present invention, in actual use, the position of the heater 1 430 on the left side of the quartz chamber 450 is first adjusted by the adjustment component 500 according to the demand. At this time, the position of the heater 2 440 remains unchanged on the right side of the quartz chamber 450. The wafer 470 is located on the upper left side of the heater 2 440, that is, directly below the optical observation window 451 on the upper side of the quartz chamber 450. The optical observation window 451 is located directly below the objective lens of the optical microscope 200. After the spacing between the heater 1 430 and the heater 2 440 is adjusted;

[0045] The external vacuum equipment is turned on to vacuum the quartz cavity 450, and the vacuuming is stopped after the vacuuming reaches the required value of the test (the external vacuum equipment is connected to the quartz cavity 450 through a professional vacuum joint, and the specific connection method and the professional vacuum joint are both existing technologies and are not described in detail here), and then the gas required for the test is delivered to the inside of the quartz cavity 450 through a ferrule joint, and the other ferrule joint is kept in a sealed state. After the delivered gas reaches the required value of the test, the user controls the ceramic electrodes 410 on the sealing flanges 420 at both ends of the quartz cavity 450 to be energized through the circuit control component 600, so that the heating element 1 430 and the heating element 2 440 start to be energized for heating (the connection between the heating element 1 430 and the heating element 2 440 and the corresponding ceramic electrodes 410 is existing technology, and its power supply principle and heating working principle are not described in detail here), and the heating element 1 430 and the heating element 2 440 are quickly heated to the required temperature of the test, up to 1100°C;

[0046] Before heating element 1 430 and heating element 2 440, the user can manually move magnetic block 2 462 to the right. Under the magnetic attraction of magnetic block 2 462, magnetic block 1 461 located inside quartz cavity 450 follows to the right and simultaneously drives baffle plate 463 connected thereto to the right, thereby covering optical observation window 451. After heating is completed, magnetic block 1 461 is moved to the left again, driving baffle plate 463 to move to the left, so that optical microscope 200 can normally observe the changes of the sample located on chip 470 through optical observation window 451. After preparing the sample, open the sealing flange 420 on the right of quartz cavity 450, take out heating element 2 440 inside, and obtain the sample.

[0047] By installing heating element 1 430 and heating element 2 440 in the heating furnace assembly 400, heating element 1 430 and heating element 2 440 are both based on silicon nitride ceramics and use tungsten wire as a heat source. They can quickly heat up to 1100°C and have the characteristics of instantaneous high temperature, fast speed, high efficiency and long life. In this way, the sample can reach a high temperature state instantly, and the instantaneous changes of the sample can be studied. The material and process of heating element 1 430 and heating element 2 440 enable them to withstand high temperature environment and maintain stable performance, thereby ensuring the normal operation of heating element 1 430 and heating element 2 440, improving their service life, and reducing the frequency of maintenance and replacement.

[0048] See also Figure 1 as well as Figures 6 to 8 The adjustment assembly 500 includes a mounting seat 510, a vertical rod 520, a sliding rod 530 and an adsorption member 540. The mounting seat 510 is fixed to the upper side of the lower end of the telescopic rod 310 by bolts. A vertical rod 520 is integrally provided on the right side of the upper end of the mounting seat 510. A sliding rod 530 is welded to the right side of the top of the vertical rod 520. A limiting rod 590 is welded to the upper right side of the vertical rod 520. The limiting rod 590 is placed directly below the sliding rod 530. The length of the limiting rod 590 is greater than the length of the sliding rod 530. A reinforcing rod 580 is welded obliquely between the lower right side of the limiting rod 590 and the lower right side of the vertical rod 520.

[0049] A strip-shaped guide groove is respectively provided inwardly on the front and rear sides of the slide bar 530, and the right end of each guide groove penetrates the right end of the slide bar 530 to the right. A sliding cavity is provided inside the slide bar 530, and the upper end of the sliding cavity penetrates upward to form a strip-shaped through groove, and the right end of the strip-shaped through groove penetrates the right end of the slide bar 530 to the right. The cross-section of the sliding cavity is a regular hexagonal structure, and an adsorption part 540 is slidably installed on the upper side of the slide bar 530.

[0050] The adsorption component 540 includes a sleeve 1 541, a sleeve 2 542, a slide bar 543, and a magnet 4 544. The sleeve 1 541 is slidably mounted on the outer wall of the limit rod 590. The upper end of the sleeve 1 541 is fixedly connected to the lower end of the sleeve 2 542 through a connecting rod 1. The upper end of the sleeve 2 542 is fixedly connected to the lower end of the magnet 4 544 through a connecting rod 2. A sponge sheet is bonded to the upper side of the magnet 4 544. The thickness of the sponge sheet is less than 1 mm. The magnet 4 544 and the magnet 3 431 are magnetically attracted to each other. The magnet 4 544 is placed on the lower outer wall of the quartz cavity 450, and the magnet 3 431 is placed inside the quartz cavity 450.

[0051] A slide bar 543 is respectively arranged on the front inner wall and the rear inner wall of the second slide sleeve 542, and each slide bar 543 is slidably installed in a guide slot. A guide column 550 is arranged inside the second slide sleeve 542, and the guide column 550 includes a prism 551 and a connecting plate 553. The upper end of the prism 551 is provided with a connecting plate 553, and the upper end of the connecting plate 553 is welded to the top inner wall of the second slide sleeve 542;

[0052] The cross section of the prism 551 is a regular hexagonal structure. The prism 551 is slidably installed inside the sliding cavity. The thickness of the connecting plate 553 matches the thickness of the strip-shaped through groove. The axis of the prism 551 is colinear with the axis of the second sliding sleeve 542. A threaded hole 552 is formed through the center of the prism 551 from left to right.

[0053] A bearing seat 570 is installed on the upper side of the right end of the limiting rod 590, and an adjusting screw 560 is rotatably installed on the upper end of the bearing seat 570. The left end of the adjusting screw 560 is threadedly connected to the prism 551 through a threaded hole 552. The left end of the adjusting screw 560 extends to the inside of the sliding rod 530 and does not directly contact the sliding rod 530.

[0054] As a second embodiment of the present invention, based on the above-mentioned first embodiment, when the adjustment component 500 is used to adjust the position of the heating element 1 430, the user manually rotates the adjusting screw 560 installed on the upper side of the bearing seat 570 at the right end of the limiting rod 590, and the adjusting rod rotates clockwise or counterclockwise, which can make the guide column 550 move left or right inside the sliding rod 530, thereby driving the sliding sleeve 2 542 on the sliding rod 530 to move left or right. The sliding strip 543 on the inner wall of the sliding sleeve cooperates with the guide sliding groove, which can make the sliding sleeve 2 542 slide smoothly without circumferential rotation. In addition, the sliding sleeve 1 541 cooperates with the limiting rod 590, which can improve the stability of the movement of the entire adsorption element 540.

[0055] The movement of the sleeve 2 542 will drive the magnetic block 4 544 on its upper side to move left or right. The magnetic block 4 544 and the magnetic block 3 431 are attracted to each other by magnetic force. Therefore, when the magnetic block 4 544 moves, the magnetic block 3 431 will follow the movement, thereby driving the entire column block 432 to move, thereby achieving the purpose of driving the heating element 1 430 to move, and adjusting the distance between the heating element 1 430 and the heating element 2 440. A sponge sheet is set on the upper side of the magnetic block 4 544 to reduce the damage of the magnetic block 4 544 to the outer wall of the quartz cavity 450 when it moves (the inner walls of the magnetic blocks 1 461 and 2 462 directly connected to the quartz cavity 450 can also be fixed with the same sponge sheet). In order to ensure the accuracy of the distance adjustment, the outer wall of the sliding rod 530 or the limiting rod 590 can be set with scale lines to improve the accuracy of the distance adjustment.

[0056] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A micro CVD furnace suitable for in-situ analysis, comprising: Flange bracket one (100), flange bracket two (300), a heating furnace assembly (400), an optical microscope (200), an adjustment assembly (500) and a circuit control assembly (600), characterized in that the flange bracket one (100) is fixed to the right end of the heating furnace assembly (400), and the left end of the heating furnace assembly (400) is fixedly connected to the upper end of the flange bracket two (300); The heating furnace assembly (400) is placed on the lower side of the optical microscope (200), the optical microscope (200) is connected to the circuit control assembly (600) via a heating wire and a thermocouple wire, and an adjustment assembly (500) is installed on the lower side of the second flange bracket (300).

2. A micro CVD furnace suitable for in-situ analysis as claimed in claim 1, characterized in that: The specifications of the flange bracket 1 (100) are the same as those of the flange bracket 2 (300). The flange bracket 2 (300) comprises a telescopic rod (310), a fixing sleeve (320) and a fixing head (330). The fixing sleeve (320) is welded to the upper end of the telescopic rod (310), and the fixing sleeve (320) is fixedly connected to one end of the heating furnace assembly (400) via the fixing head (330).

3. A micro CVD furnace suitable for in-situ analysis as claimed in claim 1, characterized in that: The heating furnace assembly (400) comprises a sealing flange (420), a heating element 1 (430), a heating element 2 (440) and a quartz cavity (450); the left end and the right end of the quartz cavity (450) are respectively sealed with a sealing flange (420) through a fixed head (330); four ceramic electrodes (410) are welded on each of the sealing flanges (420); a thermocouple is installed on each of the sealing flanges (420); and a φ6.35 mm ferrule joint is installed on each of the sealing flanges (420); A heating element 1 (430) is slidably installed inside the left side of the quartz cavity (450), a column block (432) is fixed on the left side of the heating element 1 (430), and a magnetic block 3 (431) is embedded and installed on the lower side of the column block (432), and the magnetic block 3 (431) is an arc plate structure.

4. A micro CVD furnace suitable for in-situ analysis as claimed in claim 3, characterized in that: A second heating element (440) is fixed inside the right side of the quartz cavity (450); the specifications of the first heating element (430) are the same as those of the second heating element (440); a chip (470) is placed on the upper left side of the second heating element (440); both the first heating element (430) and the second heating element (440) are ceramic electric heating plates; an optical observation window (451) is provided on the upper side of the quartz cavity (450); the chip (470) is located directly below the optical observation window (451); and the optical observation window (451) is located directly below the objective lens of the optical microscope (200); A shielding member (460) is slidably mounted on the left side of the upper end of the quartz cavity (450), and the shielding member (460) comprises a first magnetic block (461), a second magnetic block (462) and a shielding plate (463), the first magnetic block (461) is fixedly connected to the upper left end of the shielding plate (463), the second magnetic block (462) is magnetically connected to the first magnetic block (461), the second magnetic block (462) is placed on the outer wall of the quartz cavity (450), the first magnetic block (461) is placed on the inner wall of the quartz cavity (450), the shielding plate (463) is in an arc-shaped structure as a whole, and the horizontal cross section of the shielding plate (463) is in a Z-shaped structure.

5. A micro CVD furnace suitable for in-situ analysis as claimed in claim 4, characterized in that: The adjustment assembly (500) comprises a mounting seat (510), a vertical rod (520), a sliding rod (530) and an adsorption member (540); the mounting seat (510) is fixed to the upper side of the lower end of the telescopic rod (310) by bolts; the vertical rod (520) is integrally arranged on the right side of the upper end of the mounting seat (510); the sliding rod (530) is welded to the right side of the top end of the vertical rod (520); a limiting rod (590) is welded to the upper right side of the vertical rod (520); the limiting rod (590) is placed directly below the sliding rod (530); the length of the limiting rod (590) is greater than the length of the sliding rod (530); a reinforcing rod (580) is obliquely welded between the lower right side of the limiting rod (590) and the lower right side of the vertical rod (520); The front and rear sides of the slide bar (530) are respectively provided with a strip-shaped guide slot, and the right end of each guide slot passes through the right end of the slide bar (530) to the right. A sliding cavity is provided inside the slide bar (530), and the upper end of the sliding cavity passes upward to form a strip-shaped through slot, and the right end of the strip-shaped through slot passes through the right end of the slide bar (530) to the right. The cross-section of the sliding cavity is a regular hexagonal structure, and an adsorption component (540) is slidably installed on the upper side of the slide bar (530).

6. A micro CVD furnace suitable for in-situ analysis as claimed in claim 5, characterized in that: The adsorption component (540) includes a sleeve 1 (541), a sleeve 2 (542), a slide bar (543), and a magnet 4 (544). The sleeve 1 (541) is slidably mounted on the outer wall of the limit rod (590). The upper end of the sleeve 1 (541) is fixedly connected to the lower end of the sleeve 2 (542) through a connecting rod 1. The upper end of the sleeve 2 (542) is fixedly connected to the lower end of the magnet 4 (544) through a connecting rod 2. A sponge sheet is bonded to the upper side of the magnet 4 (544). The thickness of the sponge sheet is less than 1 mm. The magnet 4 (544) and the magnet 3 (431) are magnetically attracted to each other. The magnet 4 (544) is placed on the lower outer wall of the quartz cavity (450), and the magnet 3 (431) is placed inside the quartz cavity (450).

7. A micro CVD furnace suitable for in-situ analysis as claimed in claim 6, characterized in that: The front inner wall and the rear inner wall of the second sliding sleeve (542) are respectively provided with a slide bar (543), and each of the slide bars (543) is slidably installed in a guide groove. A guide column (550) is provided inside the second sliding sleeve (542), and the guide column (550) includes a prism (551) and a connecting plate (553). The upper end of the prism (551) is provided with a connecting plate (553), and the upper end of the connecting plate (553) is welded to the top inner wall of the second sliding sleeve (542); The cross section of the prism (551) is a regular hexagonal structure. The prism (551) is slidably installed inside the sliding cavity. The thickness of the connecting plate (553) matches the thickness of the strip-shaped through groove. The axis of the prism (551) is colinear with the axis of the second sliding sleeve (542). The center of the prism (551) is penetrated from left to right to form a threaded hole (552). A bearing seat (570) is installed on the upper side of the right end of the limiting rod (590), and an adjusting screw (560) is rotatably installed on the upper end of the bearing seat (570). The left end of the adjusting screw (560) is threadedly connected to the prism (551) through a threaded hole (552). The left end of the adjusting screw (560) extends to the inside of the sliding rod (530) and does not directly contact the sliding rod (530).

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