Mask plate cleaning device system

Abstract

The utility model provides a cleaning device system of a mask plate, which comprises a filtering device, a nano bubble supply device and a cleaning chamber which are connected in sequence, and a nano bubble spraying device is arranged in the cleaning chamber. According to the cleaning device system of the mask plate, the mask plate is cleaned through microbubbles, the cleaning effect is enhanced, and energy consumption, risks and cost are reduced.

Description

Technical Field

[0001] The utility model belongs to the technical field of mask plate processing equipment, and in particular relates to a mask plate cleaning device system. Background Art

[0002] With the rapid development of the modern electronics industry, the processing technology of mobile phone back panel textures, flat panel displays, and integrated circuit board micro-nano structures has become increasingly critical. At present, the mainstream method for mass production of display panels is vacuum evaporation, and vacuum evaporation must use mask evaporation technology. In the dry process, masks are used to attach red, green, and blue light color molecules or metal materials to small areas. The evaporation material will be deposited on the mask plate. When producing on the production line, the mask plate needs to be cleaned after several evaporation to prevent the mask plate from changing in accuracy due to material attachment.

[0003] When using solvent to remove the film layer deposited on the mask plate, the film layer undergoes an ionization or decomposition process, and is subsequently rinsed with deionized water to replace the surface solution and residual particles. It is usually supplemented by ultrasonic and pump circulation functions to enhance the rinsing ability.

[0004] CN 116550692A discloses a mask plate cleaning system and method, the system comprising: a first machine platform for carrying a mask plate; an image acquisition device for acquiring a surface image of the mask plate to be cleaned and determining foreign matter adhesion information on the surface to be cleaned; and an ultrasonic cleaning device for cleaning the surface to be cleaned using ultrasonic waves according to the foreign matter adhesion information.

[0005] However, the above method consumes a large amount of water in the sink during the cleaning process, and the service life is about 40 pieces. In addition, the industry-recognized brand of ultrasonic waves is expensive and is limited by the international situation, and the trade of ultrasonic components is unstable.

[0006] In summary, how to provide a highly efficient cleaning method that is superior to ultrasonic components is a technical problem that needs to be solved urgently. Utility Model Content

[0007] In view of the shortcomings of the prior art, the utility model aims to provide a cleaning device system for a mask plate. The cleaning device system uses microbubbles to clean the mask plate, thereby enhancing the cleaning effect and reducing energy consumption, risk and cost.

[0008] To achieve this purpose, the utility model adopts the following technical solutions:

[0009] The utility model provides a cleaning device system for a mask plate, the cleaning device system comprising a filtering device, a nano bubble supply device and a cleaning chamber which are sequentially connected;

[0010] A nano bubble spraying device is arranged in the cleaning chamber.

[0011] The cleaning device system of the utility model uses foam as a cleaning agent to clean the mask plate. The principle of cleaning the mask plate provided by the device system of the utility model is as follows: (1) Microbubble water is a pure water solution obtained by a nanobubble supply device. The pure water solution is composed of water molecules and a small amount of hydrogen ions and hydroxide ions generated by ionization. The surface of 30 micrometers to 200 nanometers of bubbles usually carries hydroxide and is negatively charged. Because the surface of the nanobubble is negatively charged, it will attract positively charged particles and colloids away from the surface of the object; (2) According to the Young-Laplace equation, a tiny bubble with a diameter of 10μm will receive a pressure of 0.3 atmospheres. When high-density bubbles are generated, they burst in water and remove foreign matter from the surface of the mask plate. At the same time, at the moment of bursting, due to the drastic change of the disappearance of the gas-liquid interface, a large number of hydroxyl free radicals are stimulated to form alkaline substances to dissolve the attachments. (3) For the same volume, microbubbles have a larger contact interface, and the area is the cube of the number of bubbles. The particle size of microbubbles is extremely small, with an average particle size of 130 to 150 nanometers. Microbubble cleaning can directly penetrate into the pore structure, remove particulate matter and colloids, and accelerate the reaction rate.

[0012] Therefore, the device system of the utility model can efficiently remove particles, colloids and alkaline substances on the surface of the mask plate.

[0013] As a preferred technical solution of the utility model, the nano bubble spraying device includes spray pipes arranged oppositely.

[0014] Preferably, the spray pipe is connected to the nanobubble supply device through a nanobubble supply control pipeline.

[0015] It is worth noting that the mask plate is placed between the spray pipes arranged opposite to each other.

[0016] As a preferred technical solution of the present invention, the length of the spray pipe is 200 to 1700 mm, for example, it can be 200 mm, 500 mm, 800 mm, 1100 mm, 1400 mm or 1700 mm, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0017] The length of the spray pipe of the utility model can meet the requirements of covering the size of G2.5-G6 mask plates.

[0018] As a preferred technical solution of the utility model, the spray pipe is provided with at least 5 spray heads, for example, 5, 6, 7, 8, 9, 10, 12, 14 or 16, but not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0019] Preferably, the shower head comprises a nozzle and a first guide plate and a second guide plate disposed on the nozzle;

[0020] Preferably, the angle between the first guide plate and the second guide plate is 30-45°, for example, it can be 30°, 32°, 34°, 36°, 38°, 40°, 42°, 44° or 45°, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0021] As a preferred technical solution of the utility model, a pressure gauge, a flow meter and a micro bubble water control valve are provided on the nano bubble supply control pipeline.

[0022] Preferably, the microbubble water control valve is a stainless steel control valve.

[0023] As a preferred technical solution of the utility model, the foam outlet of the nanobubble supply device is connected to the nanobubble supply control pipeline through a connecting pipeline.

[0024] Preferably, a discharge pipeline is provided at the bottom of the nanobubble supply device.

[0025] As a preferred technical solution of the utility model, a manual valve and a pneumatic valve are provided on the connecting pipeline.

[0026] As a preferred technical solution of the utility model, the inlet of the filtering device is connected to the liquid supply pipeline.

[0027] Preferably, the outlet of the filtering device is connected to the inlet of the nanobubble supplying device.

[0028] As a preferred technical solution of the utility model, a drainage pipeline is provided at the bottom of the cleaning chamber;

[0029] Preferably, a liquid level detector is provided inside the cleaning chamber.

[0030] As a preferred technical solution of the utility model, the cleaning device system also includes a liquid leakage detection sensor;

[0031] Preferably, the liquid leakage detection sensor is used to detect whether there is liquid leakage in the cleaning chamber.

[0032] In the utility model, a method for cleaning a mask plate using the mask plate cleaning device system comprises the following steps:

[0033] (1) The pure water solution is transported to the nanobubble supply device through the filtering device to generate foam;

[0034] (2) The foam obtained in step (1) is transported to a cleaning chamber, and the mask plate in the cleaning chamber is spray-cleaned.

[0035] As a preferred technical solution of the present invention, the filtration accuracy of the filtration device in step (1) is 0.22 to 0.15 μm, for example, it can be 0.15 μm, 0.16 μm, 0.17 μm, 0.18 μm, 0.19 μm, 0.2 μm, 0.21 μm or 0.22 μm, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0036] Preferably, the particle size of the foam in step (2) is 52.9 to 189.1 nm, for example, 52.9 nm, 60 nm, 80 nm, 100 nm, 120 nm, 140 nm, 160 nm, 180 nm or 189.1 nm, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0037] Preferably, the spray cleaning time in step (2) is 300 to 600 s, for example, it can be 300 s, 340 s, 380 s, 420 s, 460 s, 500 s, 540 s, 580 s or 600 s, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0038] In the cleaning method provided by the utility model, the flow rate in the spray cleaning process of step (2) is adjusted according to the actual needs of the user.

[0039] The system refers to an equipment system, a device system or a production device.

[0040] Compared with the prior art, the beneficial effects of the utility model are:

[0041] (1) The cleaning device system provided by the utility model can greatly improve the cleaning efficiency, significantly enhance the cleaning effect, and reduce energy consumption, risks and costs;

[0042] (2) The flatness of the mask plate cleaned by the cleaning device system provided by the utility model is ≤150μm, and the thickness variation is ≤2%;

[0043] (3) The cleaning device system provided by the utility model has a simple structure and is easy to industrialize and promote. BRIEF DESCRIPTION OF THE DRAWINGS

[0044] Figure 1 A schematic structural diagram of a mask cleaning device system provided in Example 1 of the utility model;

[0045] Figure 2 It is a structural schematic diagram of a nano bubble spray device;

[0046] Among them: 1 is a filtering device, 2 is a nano bubble supply device, 3 is a cleaning chamber, 4 is a spray pipe, 5 is a spray head, 6 is a nozzle, 7 is a first guide plate, 8 is a second guide plate, and 9 is a nano bubble supply control pipeline. DETAILED DESCRIPTION

[0047] It should be understood that, in the description of the present invention, the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0048] It should be noted that in the description of the present invention, unless otherwise clearly specified and limited, the terms "disposed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood by specific circumstances.

[0049] The technical solution of the utility model is further explained below with reference to the accompanying drawings and through specific implementation methods.

[0050] Example 1

[0051] This embodiment provides a Figure 1 The cleaning device system of the mask plate shown in the figure comprises a filtering device, a nano bubble supply device and a cleaning chamber which are connected in sequence; the cleaning chamber is provided with a Figure 2 The nano bubble spray device shown.

[0052] The nanobubble spraying device comprises spray pipes 4 arranged opposite to each other; the spray pipes 4 are connected to the nanobubble supplying device through a nanobubble supplying control pipeline 9 .

[0053] The length of the spray pipe 4 is 1500 mm, and at least 5 spray heads 5 are arranged on the spray pipe 4; the spray head 5 includes a nozzle 6 and a first guide plate 7 and a second guide plate 8 arranged on the nozzle 6; the angle between the first guide plate 7 and the second guide plate 8 is 35°.

[0054] The nanobubble supply control pipeline 9 is provided with a pressure gauge, a flow meter and a microbubble water control valve; the microbubble water control valve is a stainless steel control valve.

[0055] The foam outlet of the nanobubble supply device 2 is connected to the nanobubble supply control pipeline 9 through a connecting pipeline; a discharge pipeline is arranged at the bottom of the nanobubble supply device 2; and a manual valve and a pneumatic valve are arranged on the connecting pipeline.

[0056] The inlet of the filtering device 1 is connected to the liquid supply pipeline; the outlet of the filtering device 1 is connected to the inlet of the nano bubble supply device 2 .

[0057] A drainage pipeline is provided at the bottom of the cleaning chamber 3 ; a liquid level detector is provided inside the cleaning chamber 3 .

[0058] The cleaning device system further includes a liquid leakage detection sensor for detecting whether the cleaning chamber 3 is leaking liquid.

[0059] Example 2

[0060] This embodiment provides a mask cleaning device system, and the difference between the cleaning device system and the embodiment 1 is that:

[0061] In this embodiment, the included angle between the first guide plate 7 and the second guide plate 8 is adjusted to 50°.

[0062] Example 3

[0063] This embodiment provides a mask cleaning device system, and the difference between the cleaning device system and the embodiment 1 is that:

[0064] In this embodiment, the first guide plate 7 and the second guide plate 8 are omitted.

[0065] Comparative Example 1

[0066] This comparative example provides a mask cleaning device system, which differs from Example 1 only in that:

[0067] In this comparative example, the nanobubble supply device 2 is omitted.

[0068] Application Example 1

[0069] This application example provides a cleaning method using the cleaning device system of the mask provided in Example 1, and the cleaning method comprises the following steps:

[0070] (1) The pure water solution is transported to the nanobubble supply device through the filter device 1 to generate bubbles;

[0071] Wherein, the filtering accuracy of the filtering device is 0.2 μm;

[0072] (2) transporting the foam obtained in step (1) to a cleaning chamber to spray clean the mask plate in the cleaning chamber;

[0073] The particle size of the foam is 100-180 nm, and the spray cleaning time is 450 s.

[0074] Application Example 2

[0075] This application example provides a cleaning method using the cleaning device system of the mask provided in Example 1, and the cleaning method comprises the following steps:

[0076] (1) The pure water solution is transported to the nanobubble supply device through the filter device 1 to generate bubbles;

[0077] Wherein, the filtering accuracy of the filtering device is 0.22 μm;

[0078] (2) transporting the foam obtained in step (1) to a cleaning chamber to spray clean the mask plate in the cleaning chamber;

[0079] The particle size of the foam is 52.9-189.1 nm, and the spray cleaning time is 600 s.

[0080] Application Example 3

[0081] This application example provides a cleaning method using the cleaning device system of the mask provided in Example 1, and the cleaning method comprises the following steps:

[0082] (1) The pure water solution is transported to the nanobubble supply device through the filter device 1 to generate bubbles;

[0083] Wherein, the filtering accuracy of the filtering device is 0.15 μm;

[0084] (2) transporting the foam obtained in step (1) to a cleaning chamber to spray clean the mask plate in the cleaning chamber;

[0085] The particle size of the foam is 160-189 nm, and the spray cleaning time is 300 s.

[0086] The flatness of the mask plate cleaned by the method provided in Application Examples 1 to 3 is ≤150μm, and the thickness variation is ≤2%. The surface of the mask plate is visually free of rust, dirt or dust; and there is no deformation after the Frame deformation inspection and the Sheet deformation inspection.

[0087] Application Example 4

[0088] This application example provides a cleaning method using the mask cleaning device system provided in Example 2. The cleaning method is the same as that in Application Example 1.

[0089] Compared with Application Example 1, the cleaning angle in the cleaning process of this application example becomes larger, that is, the cleaning range of a single nozzle becomes larger, so that dirt remains on the surface of the mask plate.

[0090] Application Example 5

[0091] This application example provides a cleaning method using the mask cleaning device system provided in Example 3. The cleaning method is the same as that in Application Example 1.

[0092] Compared with Application Example 1, this application example has no drainage plate during the cleaning process, so that the cleaning liquid from the nozzle directly impacts the mask plate during the cleaning process, resulting in a thickness change of >2%, and slight deformation after Frame deformation inspection and Sheet deformation inspection.

[0093] Comparative application example 1

[0094] This comparative application example provides a cleaning method using the cleaning device system of the mask plate provided in Comparative Example 1. The cleaning method is the same as that of Application Example 1.

[0095] Compared with Application Example 1, the nanobubble supply is omitted during the cleaning process of this comparative application example, resulting in a larger particle size of the cleaning liquid, so that the flatness of the cleaned mask plate is greater than 150μm, and the thickness change is greater than 2%; and there is no deformation after the Frame deformation inspection and the Sheet deformation inspection.

[0096] In summary, the mask plate cleaning device system provided by the utility model utilizes microbubbles to clean the mask plate, thereby enhancing the cleaning effect and reducing energy consumption, risk and cost.

[0097] The applicant declares that the above is only a specific implementation method of the present utility model, but the protection scope of the present utility model is not limited thereto. The technicians in the relevant technical field should understand that any changes or substitutions that can be easily thought of by the technicians in the relevant technical field within the technical scope disclosed in the present utility model fall within the protection scope and disclosure scope of the present utility model.

Claims

1. A mask cleaning device system, characterized in that: The cleaning device system comprises a filtering device, a nanobubble supply device and a cleaning chamber which are sequentially connected; A nano bubble spray device is provided in the cleaning chamber; The nanobubble spraying device comprises spray pipes arranged opposite to each other; the spray pipes are connected to the nanobubble supplying device through a nanobubble supplying control pipeline; the length of the spray pipes is 200 to 1700 mm; At least five spray heads are arranged on the spray pipe; the spray head comprises a nozzle and a first guide plate and a second guide plate arranged on the nozzle; the included angle between the first guide plate and the second guide plate is 30-45°.

2. The mask cleaning device system according to claim 1, characterized in that: The nanobubble supply control pipeline is provided with a pressure gauge, a flow meter and a microbubble water control valve; The micro bubble water control valve is a stainless steel control valve.

3. The mask cleaning device system according to claim 1, characterized in that: The foam outlet of the nanobubble supply device is connected to the nanobubble supply control pipeline through a connecting pipeline; A discharge pipeline is arranged at the bottom of the nano bubble supply device.

4. The mask cleaning device system according to claim 3, characterized in that: The connecting pipeline is provided with a manual valve and a pneumatic valve.

5. The mask cleaning device system according to claim 1, characterized in that: The inlet of the filtering device is connected to the liquid supply pipeline; The outlet of the filtering device is connected to the inlet of the nanobubble supplying device.

6. The mask cleaning device system according to claim 1, characterized in that: A drainage pipeline is provided at the bottom of the cleaning chamber; A liquid level detector is arranged inside the cleaning chamber.

7. The mask cleaning device system according to claim 1, characterized in that: The cleaning device system also includes a liquid leakage detection sensor; The liquid leakage detection sensor is used to detect whether the cleaning chamber is leaking.

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